WO2011158339A1 - 装置パラメータ設定支援システム - Google Patents
装置パラメータ設定支援システム Download PDFInfo
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- G—PHYSICS
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- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
- G05B13/042—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a parameter or coefficient is automatically adjusted to optimise the performance
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Definitions
- the present invention relates to an apparatus parameter setting support system that supports parameter setting for various processing apparatuses.
- the apparatus performance includes, for example, that each process is stably and appropriately processed, throughput, speed, and the like according to a predetermined processing condition (referred to as “recipe” in the present specification).
- Patent Document 1 In order to improve and stabilize the performance of the processing apparatus, in order to optimally set PID parameters for performing PID control, methods as shown in Patent Document 1 and Patent Document 2 below are used.
- a recipe is set and processing is executed according to the set recipe.
- the engineer does not set the recipe that is the premise for automatic control, the device will not function, and the device performance of the device will change depending on how the recipe is set. Is important to.
- an engineer sets each data of a recipe as an initial value, operates an actual processing device according to the recipe, confirms the throughput, corrects each data of the recipe,
- the final recipe setting is performed by repeating the operation of operating the actual processing apparatus with the corrected recipe data. Accordingly, setting of data (parameters) in the recipe is important for improving and stabilizing the device performance.
- ideal PID parameters PID parameters in an ideal state
- PID parameters in an ideal state can be set by using the method of the above-mentioned patent document.
- the throughput is confirmed by operating the actual processing device directly based on the recipe assumed by the engineer. For this reason, when setting a recipe, it is necessary to temporarily stop production of a product using an actual processing apparatus operating in a factory and operate it for a recipe setting test. Moreover, the recipe setting test is rarely performed once, and in many cases is performed a plurality of times. For this reason, while the recipe setting test is being performed, the processing apparatus cannot be used for manufacturing the product, and there is a problem that the manufacturing of the product is hindered. In addition, since it is necessary to stop the actual processing device and use it for the test, it is time consuming.
- the inventor of the present application firstly applies an appropriate parameter in automatic control (PID parameter of the PID control method and other automatic control methods) that takes into account even if there is a change in the device over time or a change in the device state.
- the device parameter setting support system has been invented.
- the inventor of the present application has invented an apparatus parameter setting support system that can set an appropriate recipe without operating an actual processing apparatus as much as possible for setting a recipe for operating the apparatus.
- a first aspect of the present invention is an apparatus parameter setting support system used in an apparatus design and manufacturing support system that supports design and manufacture of a processing apparatus, and the apparatus parameter setting support system is executed at any two points in time of an actual apparatus.
- An execution result acquisition unit that acquires a result from an EES or an apparatus controller of the device design and manufacturing support system, a parameter calculation unit that calculates a PID parameter at each time point based on the acquired execution result, and each calculated PID
- a difference calculation unit that calculates a difference between parameters; and a change value calculation unit that calculates a change value per unit period for the calculated difference.
- the calculated change value And a PID parameter stored in the device simulator to calculate a new PID parameter. Calculating a meter, to perform the PID controller in the device simulator PID parameter Do was ⁇ a device parameter setting support system.
- a second invention is an apparatus parameter setting support system used in an apparatus design / manufacturing support system for supporting design and manufacture of a processing apparatus, and the apparatus parameter setting support system is executed at least at two arbitrary times of an actual apparatus.
- An execution result acquisition unit that acquires a result from an EES or an apparatus controller of the device design and manufacturing support system, a parameter calculation unit that calculates a PID parameter at each time point based on the acquired execution result, and each calculated PID
- a waveform calculation unit that calculates a PID waveform based on a parameter, a waveform comparison unit that compares the calculated PID waveforms, and a result of the comparison that a predetermined condition is satisfied;
- a change value calculation unit for calculating a change value per unit period for the change value of In the device design / manufacturing support system, the calculated change value and the PID parameter stored in the device simulator are calculated to calculate a new PID parameter, and PID control is executed by the device simulator using the new PID parameter.
- An apparatus parameter setting support system that acquires
- the configuration of the present invention it is possible to calculate the change value of the PID parameter used for the simulation process in the apparatus simulator. Then, by passing the change value to the apparatus simulator and adding the change value to the PID parameter, it is possible to reflect the change over time and the change in the apparatus state that occur in the actual apparatus in the apparatus simulator.
- the data transmission unit passes the calculated change value of the PID parameter to the device simulator every time the unit period arrives, and the device design and manufacturing support system stores the device simulator in the device simulator. It can also be configured as a device parameter setting support system in which the change value is calculated and calculated as a new PID parameter, and PID control is executed by the device simulator using the new PID parameter.
- the data sending unit passes the calculated change value of the PID parameter to the device simulator, and the device design / manufacturing support system receives the unit period at the arrival of the unit period in the device simulator.
- the device design / manufacturing support system receives the unit period at the arrival of the unit period in the device simulator.
- a device parameter setting support system that causes the PID parameter stored in the device simulator to calculate the change value and calculate it as a new PID parameter, and cause the device simulator to execute PID control using the new PID parameter. It can also be configured.
- the calculated change value of the PID parameter may be passed to the apparatus simulator every time the unit period arrives, or may be passed at the time of calculation and automatically calculated by the apparatus simulator every time the unit period arrives.
- the parameter setting system receives an input of a PID parameter for performing a simulation that causes an error in the device simulator, passes the received PID parameter to the device simulator, and the device simulator.
- a device parameter setting support system that simulates a device trouble by executing a simulation process based on the PID parameter.
- the parameter setting system usually sets parameters for performing an appropriate simulation.
- a device trouble error state
- PID parameter that causes an error. This makes it possible to grasp the device trouble without operating the actual device.
- a third invention is an apparatus design and manufacturing support system for supporting design and manufacture of a processing apparatus
- the apparatus design and manufacturing support system includes an apparatus simulator, an apparatus controller, an EES, and a parameter setting system.
- the device simulator receives input of device layout data of a real device, and performs virtual processing by a simulation program corresponding to each layer of the real device based on the device layout data and a control command from the device controller.
- simulation processing using PID control is performed, and the device controller passes a control command for controlling a virtual processing device in the real device and the device simulator to the real device and the device simulator.
- the EES in the device simulator The execution result of the simulation processing in the ideal processing device and the execution result in the real device are respectively acquired, and the parameter setting system acquires the execution result in the real device at at least two time points, and the acquired execution Based on the result, the PID parameter used in the device simulator at each time point is calculated, the change value per unit period of the PID parameter is calculated using the calculated PID parameter, and the device simulator uses the parameter setting system.
- the apparatus design and manufacturing support system updates the PID parameter based on the change value calculated in (1).
- the change value of the PID parameter used for the simulation process in the apparatus simulator can be calculated in the same manner as the first invention described above. That is, a change with time and a change in device state that occur in an actual device can be reflected in the device simulator.
- a fourth invention is an apparatus design / manufacturing support system that supports design and manufacture of a processing apparatus
- the apparatus design / manufacturing support system includes an apparatus simulator, an apparatus controller, an EES, and a parameter setting system.
- the device simulator receives input of device layout data of a real device, and performs virtual processing by a simulation program corresponding to each layer of the real device based on the device layout data and a control command from the device controller.
- simulation processing using PID control is performed, and the device controller passes a control command for controlling a virtual processing device in the real device and the device simulator to the real device and the device simulator.
- the EES in the device simulator The execution result of the simulation processing in the ideal processing device and the execution result in the real device are respectively acquired, and the parameter setting system acquires the execution result in the real device at at least two time points, and the acquired execution Based on the results, the PID parameters used in the device simulator at each time point are calculated, the calculated PID parameters are calculated using the calculated PID parameters, and the calculated PID waveforms are compared, A change value of a PID parameter per unit period is calculated, and the device simulator is a device design and manufacturing support system that updates the PID parameter based on the change value calculated by the parameter setting system.
- the device design and manufacturing support system further includes a reproduction device, and the reproduction device corresponds to each layer of the real device based on a control command and / or an execution result in the real device.
- the simulation program can also be configured as a device design and manufacturing support system that executes simulation processing as a virtual processing device.
- a reproduction device as in the present invention, it is possible to perform a simulation process based on a control command and an execution result in the device.
- the same environment as the device can be reproduced at a remote place, for example. For example, if a failure occurs in a device, the same event as that occurring in the device can be reproduced without going to the factory where the device is installed. I can do it.
- the execution result includes position information of a material to be processed by a control command
- the reproduction apparatus performs a simulation from a material viewpoint based on the position information of the material in the execution result. It can also be configured as an apparatus design / manufacturing support system that displays processing.
- the configuration of the present invention enables not only simulation display from a bird's-eye view but also simulation display from a material viewpoint as in the past. As a result, the viewpoint is automatically changed as the material moves, and it is possible to check the operation status of the apparatus from the viewpoint of the material.
- a fifth invention is a recipe data setting method by an apparatus parameter setting support system used in an apparatus design and manufacturing support system for supporting design and manufacture of a processing apparatus, and the recipe management system is set in advance as an initial value.
- the recipe data is passed to the device controller of the device design and manufacturing support system, and the device controller passes a recipe control command to the device simulator of the device design and manufacturing support system based on the recipe data, and the device simulator Performs a simulation process based on the recipe data and sends the execution result to the device controller or EES, and the recipe management system displays the execution result stored in the device controller or EES, Accept re-input of recipe data, Device parameter setting support in which the recipe control command based on the new recipe data is passed to the device simulator by passing the received recipe data from the recipe management system to the device controller of the device design and manufacturing support system This is a recipe data setting method using the system.
- the apparatus parameter setting support system of the present invention By using the apparatus parameter setting support system of the present invention, even if the apparatus itself changes over time or changes in apparatus state, the deviation in apparatus performance between the actual apparatus and the apparatus simulator is reduced as much as possible. Can do. In setting a recipe, an appropriate recipe can be set without using an actual processing apparatus as much as possible.
- Device parameter setting support system 2 Device simulator 3: Device controller 4: EES 5: CAD 6: Real device 7: Reproduction device 11: Recipe management system 12: Parameter setting system 20: Modeling layout unit 21: Data storage unit 22: Simulation processing unit 23: Display processing unit 30: Computing device 31: Storage device 32: Display device 33: input device 34: communication device 121: execution result acquisition unit 122: parameter calculation unit 123: difference calculation unit 124: change value calculation unit 125: data transmission unit 126: waveform calculation unit 127: waveform comparison unit
- the apparatus parameter setting support system 1 of the present invention is used in combination with an apparatus design and manufacturing support system described later.
- FIG. 1 shows an outline of each apparatus constituting the apparatus parameter setting support system 1 and the apparatus design / manufacturing support system including the apparatus parameter setting support system 1.
- the device design / manufacturing support system includes various devices such as a semiconductor manufacturing device, a flat panel manufacturing device, a solar cell manufacturing device, a MEMS (Micro Electro Mechanical Systems) manufacturing device, a biochemical automatic analyzer, a pharmaceutical manufacturing device, and a food manufacturing device. (Processing device), more specifically, it is preferably used for designing and manufacturing a processing device that operates according to a recipe (a collection of processing conditions (such as parameters) for executing a process), but is not limited thereto.
- a recipe a collection of processing conditions (such as parameters) for executing a process
- the apparatus parameter setting support system 1 includes a recipe management system 11 and a parameter setting system 12.
- the device design / manufacturing support system includes a device simulator 2, a device controller 3, an EES 4, and a device parameter setting support system 1.
- FIG. 2 schematically shows an example of a conceptual diagram of the apparatus simulator 2.
- FIG. 3 schematically shows an example of an overall conceptual diagram of the software configuration of the device design / manufacturing support system operated in association with the device parameter setting support system.
- the device simulator 2, EES 4, device controller 3, recipe management system 11, and parameter setting system 12 are realized by a computer, a predetermined arithmetic circuit, or the like.
- FIG. 4 schematically shows an example of a hardware configuration of a computer that realizes the apparatus simulator 2, EES 4, apparatus controller 3, recipe management system 11, parameter setting system 12, and the like.
- the computer stores an arithmetic device 30 such as a CPU for executing arithmetic processing of a program, a storage device 31 such as a RAM and a hard disk for storing information, processing results of the arithmetic device 30 and information stored in the storage device 31 on the Internet or LAN. And at least a communication device 34 that transmits and receives via the network.
- Each function (each unit) realized on the computer is executed when a unit (program, module, etc.) for executing the process is read into the arithmetic unit 30.
- each function reads the corresponding information from the storage device 31 and uses the read information for the processing in the arithmetic device 30 as appropriate.
- the computer may include an input device 33 such as a keyboard, a mouse, and a numeric keypad, and a display device 32 such as a monitor.
- the means in the present invention are only logically distinguished from each other in function, and may be physically or virtually the same area. Each function, computer, etc. may be arbitrarily distributed and may be integrated into one.
- the apparatus parameter setting support system 1 of the present invention is used by being combined with an apparatus design and manufacturing support system. Therefore, the configuration of the device design / manufacturing support system other than the device parameter setting support system 1 will be described first.
- the device simulator 2 accepts input of CAD data such as a machine drawing generated by the CAD 5. Also, input of operation parameters (described later) corresponding to the CAD data is received and stored as device layout data. And it is a computer which displays the simulation condition of a processing apparatus based on apparatus layout data.
- the apparatus simulator 2 includes a modeling layout unit 20, a data storage unit 21, a simulation processing unit 22, and a display processing unit 23.
- the modeling layout unit 20 receives an input of CAD data generated by the CAD 5 of the real device 6 (described later) and stores it in the data storage unit 21 described later. For example, information indicating the position information and size of each part of the processing apparatus generated by two-dimensional CAD or three-dimensional CAD is stored as CAD data.
- the modeling layout unit 20 also receives an input of initial setting of operation parameters indicating how and at what timing each of the above components is moved. In this case, a file in which the operation parameters of each component are set may be read, or input of the operation parameters of each component may be received from the input device 33.
- the operation parameters input in this way are associated with the CAD data stored in the data storage unit 21, and the CAD data and the operation parameters are stored in the data storage unit 21 as device layout data.
- This association may be handled as one (or related) device layout data by including the same identification information in each file, or integrated into one file as one device layout data. Also good.
- the CAD data read by the modeling layout unit 20 may be information (position information, information indicating size, etc.) related to all the parts constituting the processing device generated by the CAD 5, or the processing device may be Among the components to be configured, the information may be information that is unnecessary for simulation processing in the simulation processing unit 22 described later, that is, information that excludes information about components that are not displayed when the processing device is observed from the outside (the processing). It may be information on a component displayed when the apparatus is observed from the outside). In the latter case, information relating to parts that cannot be observed from the outside is reduced from the CAD data and stored in the data storage unit 21. In this case, the amount of CAD data is reduced, and the speed is not reduced during simulation processing.
- the device layout data in the modeling layout unit 20 will be described.
- the modeling layout unit 20 first registers / sets parts (objects) of each layer constituting the real device 6 with respect to the CAD data generated by the CAD 5. That is, the drawing of each part to be displayed in three dimensions is read and its layout is set. Then, the attribute of the object is set.
- the object attributes set here include object position information, operation parameters such as operation time (initially design value data), device operation specification I / O map information (for example, the number of actuators, the number of sensors, I / O map).
- operation parameters such as operation time (initially design value data)
- I / O map information for example, the number of actuators, the number of sensors, I / O map.
- the operation parameters can be set by performing this operation similarly for the devices, modules, subsystems, etc.
- device layout data including CAD data and operation parameters of the entire processing device can be generated.
- the above-described processing may be performed as it is in two dimensions.
- the data storage unit 21 stores various data such as device layout data, and necessary data is appropriately read out and used for the processing in the simulation processing unit 22 described later.
- the simulation processing unit 22 uses the device layout data stored in the data storage unit 21 to execute a simulation process according to a simulation program that simulates the real device 6 stored in advance.
- the simulation program used at this time is a simulation program of the actual device 6 designed and manufactured by the device design / manufacturing support system, and a control command (described later) from the device controller 3 during the simulation process.
- the simulation process is executed according to the above.
- FIG. 6 schematically shows a hierarchical model of the apparatus.
- the real device 6 is divided into four layers. That is, it is divided into an apparatus hierarchy, a module hierarchy, a subsystem hierarchy, and an I / O device hierarchy. Moreover, the hierarchy of the material used as the object which the real apparatus 6 manufactures is provided. Therefore, the simulation program functioning in the simulation processing unit 22 performs control processing in a total of five layers. Note that each hierarchy is composed of a program for controlling the hierarchy, and each of the programs independently receives control based on a control command from the device controller 3 to execute simulation processing.
- the device hierarchy is a layer that defines a space in which devices can be installed or objects (parts) below the module can be placed, and is composed of modules, subsystems, and I / O devices.
- the module hierarchy is a hierarchy that defines replaceable components having functions for executing processes and carrying in the apparatus, and is composed of modules, subsystems, and I / O devices.
- the subsystem hierarchy is a hierarchy that defines interchangeable components having specific functions within a module, and is composed of subsystems and I / O devices.
- the I / O device hierarchy has a minimum control function for moving the apparatus, and is a hierarchy composed of various I / O devices such as sensors and actuators. For example, there are pumps, valves, robots, shutters, lifters, power supplies, etc.
- the material hierarchy is a hierarchy indicating members supplied into the apparatus and conveyed in the apparatus. For example, there are FOUP (Front Opening Unified Unified Pod), wafer, substrate and the like.
- the apparatus has position information called material location, and the material location has information indicating whether or not material actually exists.
- the actual device 6 is actually composed of a device, a module, a subsystem, and an I / O device, and a manufacturing process for the material is performed by these devices.
- the four layers (device layer, module layer, subsystem layer, and I / O device layer) constituting the actual device 6 so as to correspond to the configuration of the actual device 6 By performing the process separately on the material layer (material layer) to be manufactured, the device controller 3 can be linked in the same manner as when the actual device 6 is actually operated. Then, the operation verification for each hierarchy is possible.
- the hierarchy can be arbitrarily divided according to the characteristics of the processing device to be designed and manufactured.
- the simulation processing unit 22 also uses PID control. That is, the simulation process is executed using the PID parameters used for PID control.
- FIG. 10 is a block diagram schematically showing a PID control mechanism in the real device 6 and the simulation processing unit 22.
- the PID control mechanism of FIG. 10 is a PID control mechanism having a two-degree-of-freedom addition function.
- SV is a target value to be a control command based on recipe information
- MV is an operation value
- PV is a “control value”
- e is a deviation
- P or “p” is proportional control
- I” or "i” is integral control
- G transfer function
- D is disturbance
- s Laplace operator ing.
- PID parameters Kp: proportional gain, Ti: integration time (s), Td: derivative time (s), ⁇ : derivative coefficient, ⁇ : proportional gain two degrees of freedom coefficient for one command for PID control , ⁇ : integration time 2-degree-of-freedom coefficient, and ⁇ : derivative time 2-degree-of-freedom coefficient
- Kp proportional gain
- Ti integration time
- Td derivative time
- ⁇ derivative coefficient
- ⁇ proportional gain two degrees of freedom coefficient for one command for PID control
- ⁇ integration time 2-degree-of-freedom coefficient
- ⁇ derivative time 2-degree-of-freedom coefficient
- the display processing unit 23 displays the processing result in the simulation processing unit 22 on the device simulator 2 or the display device 32 of a predetermined computer terminal.
- the device controller 3 is a computer for issuing a control command for a virtual processing device (a processing device that realizes the operation of the real device 6 inside the computer) in the real device 6 or the simulation processing unit 22, and includes a real control mode, Switching between at least two control modes of the device simulation mode is possible.
- a virtual processing device a processing device that realizes the operation of the real device 6 inside the computer
- a control command for instructing an operation or a transport route of each component constituting the device, a device or a module, (Recipe control command) indicating a processing method (processing conditions) and the like for each component constituting them.
- sequence control commands include raising and lowering the lifter.
- the recipe control command includes, for example, conditions relating to time, gas flow rate, power, temperature, and the like.
- the device controller 3 sends a sequence control command and a recipe control command to the real device 6 or the virtual processing device, and acquires an execution result for them from the real device 6 or the virtual processing device.
- the acquired data is also stored in EES 4 described later.
- the real control mode is a mode in which the real device 6 is operated by connecting to a sensor or an actuator in an actual processing device (real device 6) and sending a sequence control command and a recipe control command to the real device 6.
- execution is performed in the real device 6, the execution result is received from the real device 6.
- the device simulation mode is a mode in which the device is virtually operated by sending a sequence control command and a recipe control command to the simulation processing unit 22 of the device simulator 2. Further, when execution is performed in the simulation processing unit 22 of the apparatus simulator 2, the execution result is received from the simulation processing unit 22.
- the execution speed of the simulation process can be executed at an arbitrary execution speed such as the same speed as when the real apparatus 6 is controlled (equal magnification), 2 times, 3 times, or the like. Thereby, the time required for confirmation can be shortened.
- the device controller 3 has two cases: a case where the real device 6 and the virtual processing device are all controlled by a computer, and a case where the real device 6 and the virtual processing device are controlled by a PLC. Any of these may be used, but the control command (sequence control command, recipe control command) of the used case is sent to the actual device 6 or the device simulator 2.
- control commands are information for controlling processing in each layer in the simulation processing unit 22 of the real device 6 or the device simulator 2, and the control target is the real device. 6 and the virtual processing device are the same or substantially the same information (information having the same semantic content for control).
- the control command includes instruction information for starting control on the actual device 6 and the simulation processing unit 22 of the device simulator 2 and incidental information indicating under what conditions control is performed.
- the results of processing at each level in the simulation processing unit 22 of the real device 6 or the device simulator 2 in response to the above-described control commands are executed as execution results from the real device 6 or the simulation processing unit 22.
- the device controller 3 receives. Regardless of whether the processing is executed by the real device 6 or the virtual processing device, the execution result is the same or substantially the same information (information having the same meaning content of the execution result).
- the execution result includes information indicating that the processing for the control command has been completed (or information indicating that the processing for the control command was an error) from the simulation processing unit 22 of the actual device 6 or the device simulator 2, and And incidental information indicating whether or not such a situation has occurred.
- control commands and execution results are collectively referred to as control information.
- Control information (control command and execution result) when device controller 3 is a computer is device sequence step control information
- control information (control command and execution result) when device controller 3 is PLC is device sequence step IO. This is called a map (PLC control information).
- Recipe information (control commands and execution results) is provided regardless of whether the apparatus controller 3 is a computer or a PLC.
- the EES 4 (device engineering system) acquires detailed control information (control command and execution result) of the virtual processing device to be simulated by the simulation processing unit 22 of the real device 6 or the device simulator 2 from the device controller 3 and performs the operation. It is a computer to be analyzed (note that it may be obtained directly from the actual device 6 or the device simulator 2 without using the device controller 3).
- the data acquired here includes detailed device event data (operation logs of various devices (including parts) that make up the processing device), trace data (temporal changes in temperature, pressure, etc. of the processing device and its components or materials) Information) and context data (information indicating a material unit to be processed, such as a batch ID, a lot ID, a substrate ID, a wafer ID, a recipe ID, and recipe information).
- the context data may be included in the detailed device event data. That is, detailed device event data, trace data, and context data become control commands and execution results. Accordingly, the EES 4 has a function of collecting control commands and execution results of the real device 6 or a virtual processing device, a function of confirming their operation time, and the like. Each of these functions is data (detailed device event data, trace data, context data) indicating control information such as a control command or execution result from a virtual processing device in the real device 6 or simulation processing unit 22 controlled by the device controller 3. Data).
- the detailed device event data includes the operation of the device and its start / end time as incidental information in the control command and execution result, so that the operation time can be calculated from the difference.
- the CAD 5 is a device that generates CAD data of a drawing of the actual device 6, and may be either a two-dimensional CAD 5 that generates a two-dimensional drawing or a three-dimensional CAD 5 that generates a three-dimensional drawing.
- a two-dimensional CAD 5 that generates a two-dimensional drawing
- a three-dimensional CAD 5 that generates a three-dimensional drawing.
- the actual apparatus 6 is an actual processing apparatus, and various processing apparatuses such as a semiconductor manufacturing apparatus, a flat panel manufacturing apparatus, a solar cell manufacturing apparatus, a MEMS manufacturing apparatus, a biochemical automatic analyzer, a pharmaceutical manufacturing apparatus, and a food manufacturing apparatus.
- various processing apparatuses such as a semiconductor manufacturing apparatus, a flat panel manufacturing apparatus, a solar cell manufacturing apparatus, a MEMS manufacturing apparatus, a biochemical automatic analyzer, a pharmaceutical manufacturing apparatus, and a food manufacturing apparatus.
- the apparatus simulator 2 in the apparatus design / manufacturing support system described above the apparatus in the actual apparatus 6 is subjected to simulation processing.
- the recipe management system 11 edits and manages the recipe (data) that is the basis of the recipe control command in the device controller 3 that sends a control command (sequence control command, recipe control command) to the actual device 6 or the device simulator 2. It is a computer system for performing. An example of recipe data is shown in FIG.
- each device, each module, and each component executes each process according to a predetermined order (recipe step) in each layer constituting the real device 6 or the device simulator 2.
- the processing conditions are set such that the gas flow rate is 0.0 sccm, the power is 0 KW, and the temperature is 200 ° C. for 10 seconds. Therefore, these data are sent from the device controller 3 to the actual device 6 or the device simulator 2 as a recipe control command that is a target value.
- the gas flow rate is set to 20.0 sccm
- the power is set to 100 KW
- the temperature is set to 200 ° C. Therefore, these data are sent from the device controller 3 to the real device 6 or the device simulator 2 as a recipe control command.
- the recipe data is initially set by the engineer based on experience. Then, the set recipe data is sent from the recipe management system 11 to the apparatus controller 3. Upon receiving this, the device controller 3 sends a recipe control command to the virtual processing device based on the recipe data (a sequence control command may be sent in addition to the recipe control command). Then, based on the recipe control command and the sequence control command, the processing is executed by the virtual processing device, and the execution result (controlled value (observed value)) for the control is received by the device controller 3 (or EES4). The recipe management system 11 acquires it from the apparatus controller 3 (or EES4). The execution result is displayed as a graph in the recipe management system 11. In this graphing, a control command (target value) may be displayed together for comparison. An example is schematically shown in FIG.
- the engineer visually recognizes the graph displayed in the recipe management system 11 and corrects the recipe data, and sends it to the apparatus controller 3 again. Then, the recipe control command is sent from the apparatus controller 3 to the virtual processing apparatus, so that the execution result is obtained again via the apparatus controller 3 (or EES 4), and is displayed as a graph by the recipe management system 11. Such an operation is repeated a plurality of times until the recipe data that the engineer is satisfied with.
- the process is not directly executed by the actual apparatus 6 but is performed by the apparatus simulator 2 of the apparatus design and manufacturing support system.
- the recipe data can be set.
- the apparatus controller 3 is switched to the actual control mode for final confirmation, and the actual apparatus 6 performs control based on the recipe data.
- count of operating the real apparatus 6 can be reduced.
- the parameter setting system 12 is a system for setting the PID parameters used when the simulation processing performed by the simulation processing unit 22 and the PID control are performed by the real device 6. In the case of automatic control that does not perform PID control, the system sets parameters used in the automatic control.
- the actual device 6 operates in an initial state or immediately after maintenance in a state close to an ideal state.
- the environment changes due to deterioration of each part, accumulation of dirt, and the like.
- clogging of the gas pipe may occur in the gas flow rate control, and the evacuation speed changes in the vacuum pump.
- the parameter setting system 12 performs a process of adjusting the PID parameters in accordance with the actual environment of the actual device 6.
- an execution result at a certain point in time (detailed device event data, corresponding trace data, context data) and an execution result when a certain period of time has passed are obtained from the EES 4 or the device controller 3.
- PID parameters corresponding to the respective time points are calculated.
- the difference in the PID parameters at these two time points is considered to be a change in the above-mentioned fixed period. Therefore, by dividing the PID parameter difference by the elapsed time from the reference time point, the change value (differentiation) of the PID parameter difference for each unit period can be calculated.
- the parameter setting system 12 adds the above change value to the PID parameter set in the apparatus simulator 2 and stores it (for example, addition, subtraction, etc.) every day. A process for reflecting the change over time in the apparatus 6 and the change in the apparatus state is executed.
- the parameter setting system 12 includes an execution result acquisition unit 121, a parameter calculation unit 122, a difference calculation unit 123, a change value calculation unit 124, and a data transmission unit 125.
- FIG. 18 shows an example of a conceptual diagram schematically showing the concept of the parameter setting system 12.
- the execution result acquisition unit 121 acquires, from the device controller 3 or the EES 4, an execution result that is a result of execution and processing of the actual device 6 based on the sequence control command and / or the recipe control command from the device controller 3. Note that the execution result acquired at this time is an execution result at least at two time points. It should be noted that the accuracy of the change value described later may be improved by acquiring the execution results at two or more time points.
- the parameter calculation unit 122 calculates the optimum PID parameter at each time point based on each execution result acquired by the execution result acquisition unit 121.
- These PID parameters can be calculated by various known methods such as the method of the above-mentioned patent document and the method based on the block diagram shown in FIG.
- the difference calculation unit 123 calculates the difference between the PID parameters at the two time points calculated by the parameter calculation unit 122.
- the change value calculation unit 124 calculates the change value (differential value) by dividing the difference between the PID parameters calculated by the difference calculation unit 123 by the unit period of the two time points. For example, when the above two time points are 90 days and the unit period is one day, the difference value of the calculated PID parameter is divided by 90 to calculate the change value per day. When the unit period is 3 days, the difference between the calculated PID parameters is divided by 30 to calculate a change value per 3 days.
- the data sending unit 125 updates the PID parameter stored in the device simulator 2 for each unit period by sending the change value per unit period calculated by the change value calculation unit 124 to the device simulator 2. For example, when the initial value of one element of the PID parameter is 0.5 and the change value per unit period (for example, one day) is 0.01, the PID parameter is updated every day. . That is, updating is performed such as 0.51 and 0.52. The update is preferably performed every unit period, but is not limited thereto.
- the data sending unit 125 does not send the change value to the device simulator 2, but sends it to any device constituting the device design / manufacturing support system, and even if the change value is sent to the device simulator 2 via the change value. good.
- execution result acquisition unit 121 when the execution result acquisition unit 121 has acquired execution results at three or more time points, it may be handled by calculating a change value at each two time points.
- the PID parameter may be set based on the waveform of the PID parameter at two time points in addition to using the difference between the two time point parameters.
- the device controller 3 sends a recipe control command (and sequence control command) to the device simulator 2 for each recipe step. Specifically, a control command whose value is changed for each recipe step is sent. Then, as shown in FIG. 9, a transient phenomenon accompanies each recipe step.
- Vcont in FIG. 9 is a target value (control command) in the cut-out waveform portion
- tw is a time (stabilization waiting time) from the start data of the trace to be regarded as stable
- VoU is a transition period
- “VoL” is the lower limit value (overshoot lower limit value) between tf-tw in the transition period
- VsU” is the stable period (tw-trigger) (End time) is the upper limit (stable period upper limit)
- VsL is the lower limit (stable period lower limit) in the stable period (tw-trigger end time)
- “Vmove” has a fluctuating value "Tr” is when the fluctuation assumed value is exceeded from the start of the waveform (response time)
- tf is the upper and lower limit value for the stable period, which is the Vs limit value.
- ts is within the set Tw time from the waveform start Setting a stable upper and lower limit values, show stable when the (stabilization time) respectively within the range of limits of Vs (Vsu and VsL).
- the PID parameters are set according to the characteristics of the recipe control command while considering them. That is, when a recipe control command is set, an optimum PID parameter can be set if the PID waveform can be calculated at the recipe step.
- the parameter setting system 12 calculates a plurality of recipe control commands specified by the recipe data for each recipe step, and graphs the PID waveform during the execution, so that changes over time and changes in the apparatus state can be detected.
- the considered PID parameters can be set as appropriate.
- the parameter setting system 12 includes a waveform calculation unit 126 and a waveform comparison unit 127 instead of the difference calculation unit 123 described above.
- An example of a conceptual diagram schematically showing the concept of the parameter setting system 12 in this case is shown in FIG.
- the waveform calculation unit 126 calculates a PID waveform at each time point based on each PID parameter calculated by the parameter calculation unit 122.
- the waveform comparison unit 127 compares the PID waveforms at the respective time points calculated by the waveform calculation unit 126, and compares and determines whether they are similar or have a change in responsiveness.
- the change value calculation unit 124 calculates the change value of the PID parameter based on the comparison of the PID waveform at each time point determined by the waveform comparison unit 127 and the determination result.
- the proportional gain Kp of the PID parameter is decreased, and when the change is decreased, the proportional gain Kp.
- the parameter setting system 12 performs setting to increase the value.
- the change value calculation unit 124 calculates the change value per unit period at the above-described two time points according to the similarity ratio (total changed ratio).
- the integration time Ti is increased and the differential time Td is decreased.
- the parameter setting system 12 performs.
- the setting is made to decrease the integration time Ti and increase the differential time Td.
- the parameter setting system 12 performs.
- the change value calculation unit 124 calculates the change value per unit period at the above two time points according to the rate at which the waveform responsiveness becomes faster and the rate at which the waveform becomes worse (the overall changed rate).
- the calculation is performed by calculating (for example, multiplying) a predetermined coefficient with respect to the changed ratio. Based on the above, it is also possible to derive the overall change rate of the PID parameter from the change rate of the waveform.
- the parameter setting system 12 sets the allowable value of tf-tr or ts-tr when the observed value (execution result for control) exceeds the limit value of the stable period as the timing for performing such change processing. This should be done when the limit value is exceeded.
- FIG. 11 schematically shows a workflow of the device design / manufacturing support system.
- mechanical design of the device is performed in the mechanical design phase
- electrical design such as wiring is performed in the electrical design phase
- software is designed in the software design phase (S100).
- mechanical design and electrical design parts are ordered after design.
- design is performed using the CAD 5, and the CAD layout data is read by the modeling layout unit 20 of the apparatus simulator 2.
- the read CAD data is stored in the data storage unit 21.
- the modeling layout unit 20 reads (or accepts input) an operation parameter initial setting file indicating at what timing the objects constituting each layer of the real device 6 are moved, and stores the data in association with CAD data.
- CAD data and operation parameters are associated with each other and stored in the data storage unit 21 as device layout data (S110).
- the software for each layer corresponding to the real device 6 for operating the processing device designed in the software design phase is read into the simulation processing unit 22 of the device simulator 2.
- the device controller 3 When the device layout data including the operation parameters is stored in the data storage unit 21 in this way, the device controller 3 is switched to the simulation mode (the user may switch manually or automatically) Or a confirmation message for switching the mode may be displayed and switching may be performed when a permission input is received from the user), and the sequence processing command and the recipe control command are sent to the simulation processing unit 22 of the apparatus simulator 2.
- the software read into the simulation processing unit 22 virtually causes the processing device to function and execute the simulation (S120). .
- the display processing unit 23 may display the state on the display device 32. Further, when the sequence control command and the recipe control command are transferred to the simulation processing unit 22, the EES 4 may acquire them as detailed device event data.
- the modeling layout unit 20 of the device simulator 2 receives input of device layout data including operation parameters (S200).
- the apparatus simulator 2 may accept input of CAD data from the CAD 5 via a network, or may accept input of CAD data via a magnetic disk, an optical disk, a magneto-optical disk, a semiconductor memory, or the like.
- the modeling layout unit 20 also receives input of an initial setting file of device layout data corresponding to CAD data, and stores them in the data storage unit 21 as device layout data.
- the device controller 3 and the device simulator 2 are connected to receive the sequence control command and the recipe control command from the device controller 3 (S210).
- the connection may be such that data can be transmitted / received by physically connecting a network cable, or data can be logically transmitted / received by connecting each other to a network such as the Internet or a LAN. It may be in a state.
- the device controller 3 may be automatically switched from the actual control mode to the simulation mode by connecting to the device simulator 2. Alternatively, the device controller 3 and the device simulator 2 may be connected by switching to the simulation mode.
- a sequence control command and a recipe control command are passed from the device controller 3 to the device simulator 2 and acquired by the simulation processing unit 22 (S220). Moreover, EES4 acquires each control command passed at this time as detailed apparatus event data. Since the sequence control command and the recipe control command are independent of each other, they may be passed at different timings or at the same timing.
- the sequence control command and the recipe control command acquired by the simulation processing unit 22 are control commands for the I / O device layer program in the simulation processing unit 22 (S230), the I / O device layer program of the simulation processing unit 22 Operates, and the processing according to the control command is executed based on the program. That is, the operation of the I / O device hierarchy of the virtual processing apparatus is started (S240).
- the simulation processing unit 22 passes the execution result to the device controller 3 as an operation completion report (S270).
- the operation completion report which is the execution result passed at this time, for example, the processing for the sequence control command has been normally completed, the processing start time, the end time, the processing time, and what kind of operation and processing are (virtually ) Information (supplementary information) such as whether the material has been performed, what kind of state the material has become, and where the material is located (location information).
- the processing for the sequence control command has not been completed normally, the processing start time, the error occurrence time, what action or processing has been performed (virtually), As a result, information such as the state of the material, the type of error, and its contents are included as incidental information. Then, the information on the state of the material as a result of the control (supplementary information) becomes information in the material layer, and the execution result is passed from the simulation processing unit 22 of the device simulator 2 to the device controller 3. Will be.
- the operation completion report for the recipe control command includes, for example, that the processing for the recipe control command has been completed normally, the processing start time, the end time, the processing time, and what processing (virtual) has been performed.
- Information such as the state (gas flow rate, temperature, power, etc.) of the device, module, or component is included. If any error has occurred, the processing for the recipe control command has not been completed normally, the processing start time, the error occurrence time, what processing (virtual) has been performed, and as a result Information such as the state of the device, module, or component (gas flow rate, temperature, power, etc.), the type of error, and its contents is included as supplementary information. Then, information on the state of the device, module, or component (supplementary information) as a result of the control becomes information in each layer (hierarchy targeted by the control command), and the execution result is the device simulator. 2 from the simulation processing unit 22 to the device controller 3.
- the sequence control command is often a control command for the I / O device hierarchy, such as raising or lowering the lifter. However, it may be a control command for a layer higher than the I / O device layer, that is, a device layer, a module layer, or a subsystem layer. Even in that case (when it is not a control command for the I / O device hierarchy), similarly to the control command for the I / O device hierarchy, the program of the simulation processing unit 22 for the hierarchy in the control command operates. The process according to the control command is executed based on the program. That is, the operation of the virtual processor hierarchy corresponding to the control command is started (S280).
- control command for which hierarchy is included in the incidental information in the control command includes information that can identify the control command for which hierarchy.
- the incidental information is different for each hierarchy, and the target hierarchy may be determined according to the type of the control command or incidental information.
- the operation of the hierarchy is virtually started when the processing by the program of the hierarchy is started, so that a timer (not shown) stored in the simulation processor 22 starts timing.
- the simulation processing unit 22 passes the execution result to the device controller 3 as an operation completion report (S310).
- the operation completion report that is the execution result passed at this time indicates that the processing for the control command has been completed normally, the processing start time, the end time, the processing time, Information (supplementary information) such as whether the operation or processing has been performed (virtually), and as a result, the state of the material, the device, the module, or the part has been included.
- Information supplementary information
- the simulation processing unit 22 receives the sequence control command and the recipe control command from the apparatus controller 3, and sequentially executes the program of the hierarchy corresponding to the control command in accordance with the control command.
- the execution result is returned to the device controller 3 as an operation completion report. While the process shown in FIG. 12 is controlled by the apparatus controller 3, the simulation processing unit 22 repeats it, and the display processing unit 23 performs the process corresponding to the simulation on the display device 32 of the apparatus simulator 2. Or, it is displayed on a predetermined computer terminal.
- the EES 4 Since the execution result in the simulation processing unit 22 of the device simulator 2 is reflected in the device controller 3, the EES 4 acquires the detailed device event data or the corresponding trace data and context data (S130). Then, by referring to the acquired execution result, it is possible to appropriately modify software or the like.
- FIG. 13 schematically shows an example of a processing list of wafers processed by the apparatus simulator 2.
- time stamps and processing times at which processing for each wafer is started and completed are displayed as a list. Since the simulation is performed using the time for the operation of the apparatus as a set value before the processing apparatus is completed, the tuning can be performed even before the processing apparatus is completed by changing the set value.
- FIG. 13 shows a display example of detailed device event data for a sequence control command, detailed device event data for a recipe control command may be displayed in the same manner.
- the actual apparatus 6 is not operated by causing the apparatus simulator 2 to execute the simulation process on the recipe data stored in the apparatus controller 3 as described above.
- the execution result (detailed device event data, corresponding trace data, and context data) can be acquired.
- the execution result (detailed device event data, corresponding trace data, and context data) is received by the recipe management system 11 and displayed in a graph (FIG. 8).
- the engineer confirms this graph, and again corrects the value (target value) of the recipe data from the recipe management system 11 and sends it to the apparatus controller 3 from the recipe management system 11 to store it as new recipe data.
- the apparatus controller 3 causes the apparatus simulator 2 to execute simulation processing based on the new recipe data, and the engineer confirms the execution result for the new recipe data.
- the engineer can improve the accuracy of the value (target value) of the recipe data without operating the actual device 6.
- the actual apparatus 6 is operated to finally confirm the recipe data. That is, the device controller 3 is switched to the actual control mode (the user may switch manually or automatically, or a mode switching confirmation message is displayed, and the permission input is accepted from the user.
- the sequence control command and the recipe control command are passed to the real device 6 which is a real machine.
- EES4 acquires each control command passed at this time as detailed apparatus event data.
- the real device 6 which is a real machine operates according to this control command.
- FIG. 14 schematically shows an example of a processing list of wafers processed by the actual apparatus 6.
- time stamps and processing times at which processing for each wafer is started and completed are displayed as a list.
- the device controller 3 passes the same or substantially the same control command in the simulation mode and the actual control mode. Therefore, in EES4, since the execution result in the simulation mode and the execution result in the actual control mode are respectively acquired, the simulation mode and the actual control mode can be easily compared by displaying them on the same screen, for example. It is also possible to make it.
- a list of the device simulator 2 (simulation mode) operating at the design value and the actual device 6 (actual control mode) that is an actual device is used to compare the processing performance of the devices and the operation and processing of the actual device 6 that is an actual device.
- Conditions can be adjusted (S150). That is, by comparing and displaying the execution results of the simulation mode and the actual control mode, the developer can verify the execution results. Then, by loading a new operation parameter (for example, operation time) reflecting the verification result into the modeling layout unit 20 of the apparatus simulator 2, it is possible to further verify in the simulation mode.
- the execution result of the simulation mode is displayed on the display device 32 such as the device simulator 2, and the device layout data is based on the result.
- the apparatus simulator 2 receives the correction input of the operation parameter (input of a new operation parameter)
- the simulation processing in the simulation processing unit 22 may be executed again.
- the time stamps and processing times for starting and ending the processing for each wafer are displayed as a list.
- the Gantt chart of the execution result in the command may be displayed in the same table. Thereby, it can confirm, comparing the state of each component of an apparatus, and the process state at that time.
- the device design and manufacturing support system further includes a reproduction device 7 that performs simulation processing.
- FIG. 15 schematically shows an apparatus design and manufacturing support system according to this embodiment.
- the reproduction device 7 is a device that reads each command such as a control command and an execution result thereof, that is, detailed device event data, trace data, and context data, and performs a simulation process based on each data.
- a computer terminal can be used as the reproduction device 7, but is not limited thereto, and any device may be used.
- This simulation process can be performed similarly to the process in the simulation processing unit 22 of the apparatus simulator 2. That is, similarly to the simulation processing unit 22, the apparatus layout data stored in advance in the reproduction apparatus 7 and the simulation program in each hierarchy in which the control target is hierarchized in the same hierarchy as the actual real apparatus 6 are stored. Based on these, simulation processing is executed in the same manner as the simulation processing unit 22.
- the reproduction device 7 performs a simulation process based on the read control command and the execution result without receiving a control command from the device controller 3.
- control commands and execution results (detailed device event data, trace data, context data, etc.)
- data stored in a storage medium such as a CD-ROM or a semiconductor memory may be read by the reproduction device 7, or the actual device 6
- the data stored in the EES 4 or the like may be acquired via a network and read by the reproduction device 7.
- FIG. 16 shows an example of a screen showing the status of the simulation process displayed on the reproduction device 7. On the left side of the screen, the status of simulation processing is displayed, and on the right side, detailed device event data (or corresponding trace data and context data) is displayed.
- the simulation process is performed by the reproduction apparatus 7
- the display when the display is performed, the execution result of the simulation process from the material viewpoint may be displayed.
- the simulation processing from the material viewpoint is not only to display the status of the simulation processing in 2D or 3D based on the execution result, but also to reproduce the display in 2D or 3D from the place where the material is located. 7 shows what to do. That is, when the simulation process is simply performed, the execution status is merely displayed in a two-dimensional or three-dimensional manner (FIG. 16 and the like). Accordingly, although the whole can be confirmed, it is not always possible to confirm the state of the material to be processed. Alternatively, even if the display can be enlarged, it is necessary to instruct to enlarge the place where the material will be located, and whenever the material moves, it is necessary to enlarge and display the place where the material is located.
- the simulation processing from the material viewpoint makes it possible to display the state of the simulation processing from the viewpoint where the material is located in two dimensions or three dimensions.
- the viewpoint position is automatically changed as the material moves, and the state of the apparatus viewed from the material can be reproduced.
- the material is a wafer
- Fig. 17 shows an example of a screen showing the status of the simulation processing from the material viewpoint.
- the status of the simulation processing from the material viewpoint is displayed, and on the right side, detailed device event data (or corresponding trace data and context data) is displayed.
- the display showing the status of the simulation processing from the viewpoint of the material specifies the position of the material based on the incidental information in the execution result of the detailed device event data, and displays it in an arbitrary direction and angle from that viewpoint. That is, position information (location information) is included in the information indicating the material state in the incidental information of the execution result, and the reproduction device 7 performs two-dimensional or three-dimensional for an arbitrary direction and angle with the position information as a viewpoint.
- the display of the device at is calculated and displayed.
- the reproduction device 7 can execute reproduction between two events accepted by the user based on the read detailed device event data. That is, it is possible to reproduce the operation of the apparatus with the detailed apparatus event data, and simultaneously display the trace data and the context data currently being processed and display the data.
- the reproduction device 7 virtually reproduces the control corresponding to the control command, and displays the execution result based on the detailed device event data, the context data and the trace data associated with the detailed device event data. At this time, it is possible to perform display from a material viewpoint by specifying which material the process is for and the position of the material in the processing apparatus.
- the reproduction apparatus 7 performs the simulation process after reflecting the processing time in the detailed apparatus event data. That is, when a certain process takes 5 seconds, the detailed apparatus event data stores the processing time as 5 seconds (or the difference between the process start time and the process end time is 5 seconds). Therefore, the simulation process is performed by reflecting the time actually required for the process. For example, the reproduction device 7 uses the processing time (or the difference between the processing start time and the processing end time) in the detailed device event data, and the processing is performed at the same time by a timer unit (not shown) in the reproduction device 7. The simulation process is performed as follows.
- the simulation processing can be performed in a time corresponding to a predetermined magnification such as 2 ⁇ speed, 3 ⁇ speed, 1/2 ⁇ speed, or 1/3 ⁇ speed.
- the detailed device event data, the trace data, and the context data include information indicating that there is an error, the time before and / or after the occurrence of the error, the detailed device event data, and the trace data
- the context data By accepting the designation of the context data, it is possible to reproduce the state before / after the error occurred with the reproduction device 7 from the material viewpoint.
- the reproduction device 7 refers to the trace data corresponding to the detailed device event data when performing reproduction in accordance with the detailed device event data, trace data, and context data described above, so that the processing device, its components, material It is also possible to visually display the temperature and pressure conditions. That is, the detailed device event data includes time information when the event is executed. Therefore, since the corresponding trace data can be identified based on the time information (the trace data is time change information, so the time information is included), the trace data is referred to, the processing device, its components, material, etc. The temperature, pressure, and other conditions can be reproduced with colors, letters and sounds.
- the temperature change of the material in color refer to the trace data specified based on the detailed device event data, and display it after coloring the material with a predetermined color corresponding to the temperature according to the time change To do.
- the temperature of the material exceeds a predetermined threshold value, the color of the material is changed to a different color (or color density) and displayed.
- the reproduction device 7 can display not only the display from the material viewpoint but also the pressure and temperature state of the material and the like can be understood.
- the pressure and temperature state of components (I / O device, etc.) constituting the device can be displayed based on the trace data as the execution result for the recipe control command. For example, you may comprise so that the process power of an I / O apparatus, gas flow volume, gas pressure, the pressure as environmental data, and temperature (pressure in an apparatus, temperature, etc.) may be displayed.
- the reproduction device 7 includes information indicating that there is an error in the detailed device event data, the trace data, and the context data, the error has occurred from the detailed device event data, the trace data, and the context data.
- the simulation processing unit 22 of the apparatus simulator 2 is configured to perform the simulation process from the material viewpoint similar to the present embodiment. You can also
- detailed device event data, trace data, context data, etc., for which simulation processing is performed by the reproduction device 7 are not limited to data acquired by the EES 4. That is, there is a possibility of log data acquired from the device controller 3 or EES 4 having a completely different data format. Therefore, when log data from the device controller 3 or EES 4 in a completely different data format is simulated by the reproduction device 7, the reproduction device 7 or EES 4 uses the data format of the log data, detailed device event data, trace data, A conversion table with various data formats such as context data is stored.
- the log data is converted into a data format such as detailed device event data, trace data, context data, and the reproduction device 7 performs a simulation process from the material viewpoint based on each data after the data format conversion. Execute. As a result, it is possible to execute a simulation process from a material viewpoint even for log data from a device that does not incorporate the device controller 3 or EES 4 of the device design and manufacturing support system of the present embodiment.
- recipe information managed and edited by the recipe management system 11 of the apparatus parameter setting support system 1 of the present invention can be set appropriately.
- the device design / manufacturing support system without operating the actual device 6 as much as possible, it is possible to execute simulation processing and predict device performance such as device throughput.
- the ideal device performance for example, throughput
- the ideal device performance for example, throughput
- the device simulator 2 does not deteriorate or accumulate dirt. For this reason, there is a large difference between the device performance (for example, throughput) in the device simulator 2 and the device performance (for example, throughput) in the actual device 6.
- the parameter setting system 12 can be set to match the device performance of the actual device 6 by changing the PID parameters used in the PID control stored in the simulation processing unit 22. To do.
- the PID parameter as the initial value (ideal state) can be obtained by using a conventional PID parameter setting method.
- the execution result acquisition unit 121 of the parameter setting system 12 obtains detailed device event data (or trace data and context data corresponding thereto) at any two points in time (preferably an initial value (ideal state) and immediately before maintenance) as EES4 or Obtained from the device controller 3 (S400).
- the parameter calculation unit 122 of the parameter setting system 12 calculates the PID parameter at each time point based on the detailed device event data (or the corresponding trace data and context data) acquired by the execution result acquisition unit 121 (S410). ).
- a conventional method can be used as a method for calculating the PID parameter.
- the difference calculating unit 123 of the parameter setting system 12 calculates the difference between the PID parameters at the respective time points calculated by the parameter calculating unit 122 (S420). Then, the change value calculation unit 124 of the parameter setting system 12 calculates the change value (differentiation) of the PID parameter difference for each unit period by dividing the difference calculated by the difference calculation unit 123 by the unit period (S430). ). As a result, for example, the change value of the difference per unit period can be calculated such as every day or every week.
- the unit period is a period that is arbitrarily set when dividing the period of two time points, such as one day, two days, three days, one week, two weeks, one month, etc. It can be set arbitrarily.
- the data sending unit 125 of the parameter setting system 12 sends the change value to the device simulator 2 for each unit period, thereby storing the change value in the device simulator 2.
- the PID parameter that has been changed is added with the change value (for example, calculated by adding, subtracting, etc.) and stored, and the process of reflecting the change over time in the actual device 6 and the change in the device state is executed (S440). ).
- the change value of the PID parameter can be updated as a new PID parameter by calculating the PID parameter stored in the device simulator 2 by sending the parameter setting system 12 to the device simulator 2 for each unit period.
- a change value for each unit period may be sent to the device simulator 2 in advance, so that the device simulator 2 automatically calculates the change value for each unit period and updates it as a new PID parameter. May be.
- FIG. 22 schematically shows an example of a screen when the parameter setting system 12 calculates PID parameters at two time points (execution result graph and PID parameter for a certain recipe control command).
- the PID parameter setting (calculation of the change value) may be performed by comparing and determining the waveforms of the PID parameters at the two time points.
- An example of the processing process of the parameter setting system 12 in this case will be described with reference to the flowchart of FIG.
- the execution result acquisition unit 121 of the parameter setting system 12 performs detailed device event data (or trace data and context corresponding thereto) at any two points in time (preferably the initial value (ideal state) and immediately before maintenance), as described above. Data) is acquired from the EES 4 or the device controller 3 (S500).
- the parameter calculation unit 122 of the parameter setting system 12 uses the detailed device event data (or the corresponding trace data and context data) acquired by the execution result acquisition unit 121 to determine the PID parameter at each time point. Is calculated (S510).
- a conventional method can be used as a method for calculating the PID parameter.
- the waveform calculating unit 126 of the parameter setting system 12 calculates the PID waveforms at the respective time points (S520). An example of the PID waveform is shown in FIG.
- the waveform comparison unit 127 compares and determines whether the PID waveform at each time point is similar or has a change in responsiveness (S530). .
- the change value calculation unit 124 calculates a similarity ratio. Then, a change value of the PID parameter (particularly the proportional gain Kp) is calculated according to the calculated similarity ratio (S550).
- the proportional gain Kp is decreased according to the calculated ratio.
- the proportional gain Kp is increased according to the calculated ratio.
- the difference X between the proportional gains Kp at two time points is obtained.
- the change value of the proportional gain Kp is calculated as X / 90.
- the proportional gain Kp of the PID parameter is changed by X / 90 per day (added, subtracted, multiplied, divided). Adjustment is performed), and the PID parameter is updated.
- the waveform comparison unit 127 compares and determines that there is a change in responsiveness (S560), the rate at which the response performance is increased or decreased is calculated. Then, according to the calculated ratio, a change value of the PID parameter (particularly, the integration time Ti and the differentiation time Td) is calculated (S570).
- the integration time Ti is increased according to the calculated ratio. Further, the derivative time Td is reduced according to the calculated ratio.
- the difference Y of the integration time Ti and the difference Z of the differentiation time Td at two time points are obtained.
- the period at the two time points is 90 days and the unit period is 1 day
- the change value of the integration time Ti is calculated as Y / 90
- the change value of the differential time Td is calculated as Z / 90.
- the integration time Ti of the PID parameters is changed by Y / 90 per day (added, subtracted, multiplied, divided). Adjustment is performed, and the differential time Td is changed by Z / 90 per day (addition, subtraction, multiplication, division, etc.) is performed. ) Adjustments are made and PID parameters are updated.
- the data sending unit 125 of the parameter setting system 12 sends the change value to the device simulator 2 for each unit period, thereby storing the change value in the device simulator 2.
- a process of reflecting the change with time in the actual device 6 and the change of the device state is executed by adding the change value to the stored PID parameter (for example, calculating by adding, subtracting, etc.) and storing it.
- the change value of the PID parameter can be updated as a new PID parameter by calculating the PID parameter stored in the device simulator 2 by sending the parameter setting system 12 to the device simulator 2 for each unit period.
- a change value for each unit period may be sent to the device simulator 2 in advance, so that the device simulator 2 automatically calculates the change value for each unit period and updates it as a new PID parameter. May be.
- the PID parameter reflecting the change with time and the change of the device state can be set in the device simulator 2.
- the parameter setting system 12 may be able to perform processing that takes into account changes over time and changes in the device state of devices, modules, and parts that do not perform PID control.
- the simulation processing unit 22 performs simulation processing for the evacuation time and event time for the vacuum device, but simulation processing may be performed in consideration of changes over time and device conditions.
- the evacuation time in the ideal state can be calculated by the mathematical formula shown in FIG. And the simulation process of a vacuum device is performed using this value.
- the vacuum apparatus can also change from the ideal state due to deterioration of the pump and valves.
- the difference between the calculated parameters is divided by the above two time periods.
- the change value of the difference per unit period can be calculated such as every day or every week.
- the unit period is a period that is arbitrarily set when dividing the period of two time points, such as one day, two days, three days, one week, two weeks, one month, etc. It can be set arbitrarily.
- FIG. 24 schematically shows an example of a screen (a graph and parameters of an execution result for a certain recipe control command) when the parameter setting system 12 calculates parameters at two time points of the vacuum apparatus.
- the parameter setting system 12 Based on the change value of the difference per unit period calculated as described above, the parameter setting system 12 adds the change value to the parameters of the vacuum apparatus set in the apparatus simulator 2 for each unit period. (For example, calculation is performed by adding, subtracting, etc.) and processing for reflecting a change with time in the actual device 6 and a change in device state is executed.
- the parameter change value is sent to the device simulator 2 by the parameter setting system 12 for each unit period so that the parameter change value can be updated as a new parameter by calculating the parameter stored in the device simulator 2.
- a change value for each unit period may be sent to the apparatus simulator 2 in advance, and the apparatus simulator 2 may automatically update the change value for each unit period and update it as a new parameter.
- the PID parameter that causes an error may be set by the parameter setting system 12, and the PID parameter may be passed to the device simulator 2 so that the behavior of the program when the device troubles can be verified. .
- the parameter setting system 12 inputs an abnormal value that causes an error in the simulation processing of the device simulator 2 as a parameter (PID parameter or the like) used by the device simulator 2 for simulation processing input by a device engineer or the like. Accept.
- the parameter setting system 12 passes the parameter having the abnormal value to the device simulator 2 (in this case, the parameter setting system 12 does not pass it directly to the device simulator 2 but passes through another device. May be).
- the apparatus simulator 2 an abnormal value that causes an abnormality is set and stored as a parameter in the simulation process.
- the device simulator 2 performs the simulation process based on the set parameters when performing the simulation process. Therefore, an error state such as a device trouble is displayed as a simulation by executing the simulation process. By confirming this, the device engineer can grasp a device trouble or the like without operating the actual device 6.
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Abstract
Description
2:装置シミュレータ
3:装置コントローラ
4:EES
5:CAD
6:実装置
7:再現装置
11:レシピ管理システム
12:パラメータ設定システム
20:モデリングレイアウト部
21:データ記憶部
22:シミュレーション処理部
23:表示処理部
30:演算装置
31:記憶装置
32:表示装置
33:入力装置
34:通信装置
121:実行結果取得部
122:パラメータ算出部
123:差分算出部
124:変化値算出部
125:データ送出部
126:波形算出部
127:波形比較部
Claims (10)
- 処理装置の設計、製造を支援する装置設計製造支援システムで用いる装置パラメータ設定支援システムであって、
前記装置パラメータ設定支援システムは、
少なくとも、実装置の任意の二時点における実行結果を、前記装置設計製造支援システムのEESまたは装置コントローラから取得する実行結果取得部と、
前記取得した実行結果に基づいて、各時点におけるPIDパラメータを算出するパラメータ算出部と、
算出したそれぞれのPIDパラメータの差分を算出する差分算出部と、
算出した差分について、単位期間あたりの変化値を算出する変化値算出部と、を有しており、
前記装置設計製造支援システムでは、前記算出した変化値と前記装置シミュレータで記憶しているPIDパラメータとを演算して新たなPIDパラメータを算出し、該新たなPIDパラメータでPID制御を該装置シミュレータで実行する、
ことを特徴とする装置パラメータ設定支援システム。 - 処理装置の設計、製造を支援する装置設計製造支援システムで用いる装置パラメータ設定支援システムであって、
前記装置パラメータ設定支援システムは、
少なくとも、実装置の任意の二時点における実行結果を、前記装置設計製造支援システムのEESまたは装置コントローラから取得する実行結果取得部と、
前記取得した実行結果に基づいて、各時点におけるPIDパラメータを算出するパラメータ算出部と、
算出したそれぞれのPIDパラメータに基づいてPID波形を算出する波形算出部と、
前記算出したそれぞれのPID波形を比較する波形比較部と、
前記比較の結果、所定の条件を充足している場合には、前記二時点での変化値について、単位期間あたりの変化値を算出する変化値算出部と、を有しており、
前記装置設計製造支援システムでは、前記算出した変化値と前記装置シミュレータで記憶しているPIDパラメータとを演算して新たなPIDパラメータを算出し、該新たなPIDパラメータでPID制御を該装置シミュレータで実行する、
ことを特徴とする装置パラメータ設定支援システム。 - 前記データ送出部は、
前記算出したPIDパラメータの変化値を前記単位期間の到来ごとに前記装置シミュレータに渡し、
前記装置設計製造支援システムは、
前記装置シミュレータで記憶しているPIDパラメータに、前記変化値を演算して新たなPIDパラメータとして算出させ、該新たなPIDパラメータでPID制御を該装置シミュレータで実行させる、
ことを特徴とする請求項1または請求項2に記載の装置パラメータ設定支援システム。 - 前記データ送出部は、
前記算出したPIDパラメータの変化値を前記装置シミュレータに渡し、
前記装置設計製造支援システムは、
前記装置シミュレータにおいて、前記単位期間の到来ごとに、前記装置シミュレータで記憶しているPIDパラメータに、前記変化値を演算して新たなPIDパラメータとして算出させ、該新たなPIDパラメータでPID制御を該装置シミュレータで実行させる、
ことを特徴とする請求項1または請求項2に記載の装置パラメータ設定支援システム。 - 前記パラメータ設定システムは、
前記装置シミュレータにおいてエラーとなるシミュレーションを行うためのPIDパラメータの入力を受け付け、
前記入力を受け付けたPIDパラメータを前記装置シミュレータに渡し、
前記装置シミュレータは、
前記PIDパラメータに基づいてシミュレーション処理を実行することで、装置トラブルをシミュレーションする、
ことを特徴とする請求項1または請求項2に記載の装置パラメータ設定支援システム。 - 処理装置の設計、製造を支援する装置設計製造支援システムであって、
前記装置設計製造支援システムは、装置シミュレータと装置コントローラとEESとパラメータ設定システムとを有しており、
前記装置シミュレータは、
実装置の装置レイアウトデータの入力を受け付け、前記装置レイアウトデータと前記装置コントローラからの制御指令とに基づいて、前記実装置の各階層に対応したシミュレーションプログラムにより、仮想的な処理装置として、PID制御を用いたシミュレーション処理を実行し、
前記装置コントローラは、
前記実装置及び前記装置シミュレータにおける仮想的な処理装置を制御するための制御指令を、前記実装置及び前記装置シミュレータに渡し、
前記EESは、
前記装置シミュレータにおける仮想的な処理装置でのシミュレーション処理の実行結果と、前記実装置における実行結果とをそれぞれ取得し、
前記パラメータ設定システムは、
少なくとも二時点における前記実装置での実行結果を取得し、
取得した実行結果に基づいて、それぞれの時点における前記装置シミュレータで用いるPIDパラメータを算出し、
算出したPIDパラメータを用いて、PIDパラメータの単位期間あたりの変化値を算出し、
前記装置シミュレータは、
前記パラメータ設定システムで算出した変化値に基づいて、前記PIDパラメータを更新する、
ことを特徴とする装置設計製造支援システム。 - 処理装置の設計、製造を支援する装置設計製造支援システムであって、
前記装置設計製造支援システムは、装置シミュレータと装置コントローラとEESとパラメータ設定システムとを有しており、
前記装置シミュレータは、
実装置の装置レイアウトデータの入力を受け付け、前記装置レイアウトデータと前記装置コントローラからの制御指令とに基づいて、前記実装置の各階層に対応したシミュレーションプログラムにより、仮想的な処理装置として、PID制御を用いたシミュレーション処理を実行し、
前記装置コントローラは、
前記実装置及び前記装置シミュレータにおける仮想的な処理装置を制御するための制御指令を、前記実装置及び前記装置シミュレータに渡し、
前記EESは、
前記装置シミュレータにおける仮想的な処理装置でのシミュレーション処理の実行結果と、前記実装置における実行結果とをそれぞれ取得し、
前記パラメータ設定システムは、
少なくとも二時点における前記実装置での実行結果を取得し、
取得した実行結果に基づいて、それぞれの時点における前記装置シミュレータで用いるPIDパラメータを算出し、
算出したPIDパラメータを用いて、それぞれの時点におけるPID波形を算出し、
算出したそれぞれのPID波形を比較することで、PIDパラメータの単位期間あたりの変化値を算出し、
前記装置シミュレータは、
前記パラメータ設定システムで算出した変化値に基づいて、前記PIDパラメータを更新する、
ことを特徴とする装置設計製造支援システム。 - 前記装置設計製造支援システムは、さらに再現装置を備えており、
前記再現装置は、
前記実装置における制御指令および/または実行結果とに基づいて、前記実装置の各階層に対応したシミュレーションプログラムにより、仮想的な処理装置としてシミュレーション処理を実行する、
ことを特徴とする請求項6または請求項7に記載の装置設計製造支援システム。 - 前記実行結果には、制御指令で処理対象となったマテリアルの位置情報を含んでおり、
前記再現装置は、
前記実行結果におけるマテリアルの位置情報に基づいて、マテリアル視点でのシミュレーション処理の表示を行う、
ことを特徴とする請求項8に記載の装置設計製造支援システム。 - 処理装置の設計、製造を支援する装置設計製造支援システムで用いる、装置パラメータ設定支援システムによるレシピのデータの設定方法であって、
レシピ管理システムは、あらかじめ初期値として設定されたレシピのデータを、前記装置設計製造支援システムの装置コントローラに渡し、
前記装置コントローラは、前記レシピのデータに基づいてレシピ制御指令を、前記装置設計製造支援システムの装置シミュレータに渡し、
前記装置シミュレータは、前記レシピのデータに基づいてシミュレーション処理を実行してその実行結果を、前記装置コントローラまたはEESに送り、
前記レシピ管理システムは、前記装置コントローラまたはEESに記憶された実行結果を表示して、前記レシピのデータの再入力を受け付け、受け付けたレシピのデータを、レシピ管理システムから、前記装置設計製造支援システムの装置コントローラに渡すことで、新たなレシピのデータに基づくレシピ制御指令が、前記装置シミュレータに渡される、
ことを特徴とする装置パラメータ設定支援システムを用いたレシピのデータの設定方法。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103543641A (zh) * | 2013-09-30 | 2014-01-29 | 中国人民解放军国防科学技术大学 | 一种舵机铰链力矩实时动态加载装置 |
CN104813323A (zh) * | 2012-09-27 | 2015-07-29 | 西门子公司 | 可编程逻辑控制器输入和输出的仿真 |
WO2019155928A1 (ja) * | 2018-02-08 | 2019-08-15 | 東京エレクトロン株式会社 | 情報処理装置、プログラム、プロセス処理実行装置及び情報処理システム |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014112990A1 (en) * | 2013-01-16 | 2014-07-24 | Siemens Aktiengesellschaft | Automated input simulation for simulated programmable logic controller |
CN103105774B (zh) * | 2013-01-30 | 2015-07-08 | 上海交通大学 | 基于改进的量子进化算法的分数阶pid控制器整定方法 |
CN109690687A (zh) * | 2016-08-10 | 2019-04-26 | 伦萨公司 | 生物药物批处理配方异常检查 |
JP6789871B2 (ja) * | 2017-03-31 | 2020-11-25 | 株式会社荏原製作所 | 半導体製造装置の動作に関する表示を制御する方法を実行するプログラム、当該方法及び半導体製造装置の動作に関する表示を行うシステム |
US11429409B2 (en) * | 2018-09-04 | 2022-08-30 | Lam Research Corporation | Software emulator for hardware components in a gas delivery system of substrate processing system |
EP4257324A1 (en) * | 2022-04-08 | 2023-10-11 | Evonik Operations GmbH | System and method for automatically setting parameters for foam production |
EP4257323A1 (en) * | 2022-04-08 | 2023-10-11 | Evonik Operations GmbH | System and method for determining parameters for foam production |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05216896A (ja) * | 1991-11-14 | 1993-08-27 | Toshiba Corp | 製造工程管理システム |
JPH0616475B2 (ja) * | 1987-04-03 | 1994-03-02 | 三菱電機株式会社 | 物品の製造システム及び物品の製造方法 |
JPH06274205A (ja) * | 1993-03-22 | 1994-09-30 | Toshiba Corp | ゲイン適応形調節装置 |
JPH06319284A (ja) * | 1992-12-10 | 1994-11-15 | Matsushita Electric Ind Co Ltd | サーボモータの制御パラメータ調整装置及び調整方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5410634A (en) * | 1984-09-19 | 1995-04-25 | Li; Chou H. | Self-optimizing method and machine |
DE3811086A1 (de) * | 1987-04-03 | 1988-10-20 | Hitachi Ltd | Pid-reglersystem |
US5475291A (en) * | 1992-12-10 | 1995-12-12 | Matsushita Electric Industrial Co., Ltd. | Adjustment device for adjusting control parameters of a servo motor and an adjustment method therefor |
US5980096A (en) * | 1995-01-17 | 1999-11-09 | Intertech Ventures, Ltd. | Computer-based system, methods and graphical interface for information storage, modeling and stimulation of complex systems |
US6144954A (en) * | 1998-01-27 | 2000-11-07 | Li; Chou H. | Automatic development of computer software |
US6173249B1 (en) * | 1998-07-24 | 2001-01-09 | Tandem Computers Incorporated | Method of determining termination of a process under a simulated operating system |
JP3437807B2 (ja) * | 1999-10-18 | 2003-08-18 | 株式会社山武 | 制御演算装置及び制御演算方法 |
US6510353B1 (en) * | 1999-11-04 | 2003-01-21 | Fisher-Rosemount Systems, Inc. | Determining tuning parameters for a process controller from a robustness map |
US6519498B1 (en) * | 2000-03-10 | 2003-02-11 | Applied Materials, Inc. | Method and apparatus for managing scheduling in a multiple cluster tool |
US7006939B2 (en) * | 2000-04-19 | 2006-02-28 | Georgia Tech Research Corporation | Method and apparatus for low cost signature testing for analog and RF circuits |
US6970750B2 (en) * | 2001-07-13 | 2005-11-29 | Fisher-Rosemount Systems, Inc. | Model-free adaptation of a process controller |
US7499766B2 (en) * | 2002-10-11 | 2009-03-03 | Invistics Corporation | Associated systems and methods for improving planning, scheduling, and supply chain management |
TW200535583A (en) * | 2003-12-26 | 2005-11-01 | Renesas Tech Corp | Mass-production transfer support system and semiconductor manufacturing system |
JP2007536634A (ja) * | 2004-05-04 | 2007-12-13 | フィッシャー−ローズマウント・システムズ・インコーポレーテッド | プロセス制御システムのためのサービス指向型アーキテクチャ |
US7260812B2 (en) * | 2004-08-02 | 2007-08-21 | Synopsys, Inc | Method and apparatus for expediting convergence in model-based OPC |
-
2010
- 2010-06-16 JP JP2010532761A patent/JP4681082B1/ja active Active
- 2010-06-16 US US13/055,334 patent/US20120323350A1/en not_active Abandoned
- 2010-06-16 WO PCT/JP2010/060167 patent/WO2011158339A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0616475B2 (ja) * | 1987-04-03 | 1994-03-02 | 三菱電機株式会社 | 物品の製造システム及び物品の製造方法 |
JPH05216896A (ja) * | 1991-11-14 | 1993-08-27 | Toshiba Corp | 製造工程管理システム |
JPH06319284A (ja) * | 1992-12-10 | 1994-11-15 | Matsushita Electric Ind Co Ltd | サーボモータの制御パラメータ調整装置及び調整方法 |
JPH06274205A (ja) * | 1993-03-22 | 1994-09-30 | Toshiba Corp | ゲイン適応形調節装置 |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104813323A (zh) * | 2012-09-27 | 2015-07-29 | 西门子公司 | 可编程逻辑控制器输入和输出的仿真 |
CN103543641A (zh) * | 2013-09-30 | 2014-01-29 | 中国人民解放军国防科学技术大学 | 一种舵机铰链力矩实时动态加载装置 |
CN103543641B (zh) * | 2013-09-30 | 2016-03-16 | 中国人民解放军国防科学技术大学 | 一种舵机铰链力矩实时动态加载装置 |
WO2019155928A1 (ja) * | 2018-02-08 | 2019-08-15 | 東京エレクトロン株式会社 | 情報処理装置、プログラム、プロセス処理実行装置及び情報処理システム |
JPWO2019155928A1 (ja) * | 2018-02-08 | 2021-03-11 | 東京エレクトロン株式会社 | 情報処理装置、プログラム、プロセス処理実行装置及び情報処理システム |
US11237544B2 (en) | 2018-02-08 | 2022-02-01 | Tokyo Electron Limited | Information processing device, program, process treatment executing device, and information processing system |
TWI774919B (zh) * | 2018-02-08 | 2022-08-21 | 日商東京威力科創股份有限公司 | 資訊處理裝置、程式、製程處理執行裝置及資訊處理系統 |
JP7183195B2 (ja) | 2018-02-08 | 2022-12-05 | 東京エレクトロン株式会社 | 情報処理装置、プログラム、プロセス処理実行装置及び情報処理システム |
US11619926B2 (en) | 2018-02-08 | 2023-04-04 | Tokyo Electron Limited | Information processing device, program, process treatment executing device, and information processing system |
Also Published As
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US20120323350A1 (en) | 2012-12-20 |
JPWO2011158339A1 (ja) | 2013-08-15 |
JP4681082B1 (ja) | 2011-05-11 |
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