WO2011156221A2 - Wafer backside coating process with pulsed uv light source - Google Patents

Wafer backside coating process with pulsed uv light source Download PDF

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Publication number
WO2011156221A2
WO2011156221A2 PCT/US2011/039044 US2011039044W WO2011156221A2 WO 2011156221 A2 WO2011156221 A2 WO 2011156221A2 US 2011039044 W US2011039044 W US 2011039044W WO 2011156221 A2 WO2011156221 A2 WO 2011156221A2
Authority
WO
WIPO (PCT)
Prior art keywords
coating composition
acrylate
resin
coating
pulsed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2011/039044
Other languages
English (en)
French (fr)
Other versions
WO2011156221A3 (en
Inventor
Jeffrey Gasa
Dung Nghi Phan
Jeffrey Leon
Sharad Hajela
Shengqian Kong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel Corp
Original Assignee
Henkel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel Corp filed Critical Henkel Corp
Priority to JP2013514230A priority Critical patent/JP5654672B2/ja
Priority to CN2011800281230A priority patent/CN103003936A/zh
Priority to KR1020137000413A priority patent/KR20130079478A/ko
Priority to EP11792925.7A priority patent/EP2580777A4/en
Publication of WO2011156221A2 publication Critical patent/WO2011156221A2/en
Publication of WO2011156221A3 publication Critical patent/WO2011156221A3/en
Priority to US13/707,941 priority patent/US8791033B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H10W74/476—Organic materials comprising silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H10W72/01336—Manufacture or treatment of die-attach connectors using blanket deposition in solid form, e.g. by using a powder or by laminating a foil
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07331—Connecting techniques
    • H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • H10W72/07338—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/321—Structures or relative sizes of die-attach connectors
    • H10W72/325—Die-attach connectors having a filler embedded in a matrix
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/352—Materials of die-attach connectors comprising metals or metalloids, e.g. solders
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers

Definitions

  • This invention relates to a process for coating the inactive side (backside) of a semiconductor wafer in which the coating is cured using a pulsed UV light source.
  • the semiconductor wafer may be any type, size, or thickness as required for the specific industrial use.
  • the semiconductor wafer is thin.
  • thin wafers are those about 100 microns ( ⁇ ) thick, although even thinner wafers are being introduced as warpage problems can be solved.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
  • Die Bonding (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
PCT/US2011/039044 2010-06-08 2011-06-03 Wafer backside coating process with pulsed uv light source Ceased WO2011156221A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2013514230A JP5654672B2 (ja) 2010-06-08 2011-06-03 パルスｕｖ光源によるウエハ裏面被覆方法
CN2011800281230A CN103003936A (zh) 2010-06-08 2011-06-03 使用脉冲的uv光源来涂覆晶片背面的方法
KR1020137000413A KR20130079478A (ko) 2010-06-08 2011-06-03 펄스 ｕｖ 광원을 이용한 웨이퍼 후면 코팅 공정
EP11792925.7A EP2580777A4 (en) 2010-06-08 2011-06-03 METHOD OF COATING A WAFER BACK WITH A PULSED UV LIGHT SOURCE
US13/707,941 US8791033B2 (en) 2010-06-08 2012-12-07 Wafer backside coating process with pulsed UV light source

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US35258410P 2010-06-08 2010-06-08
US61/352,584 2010-06-08

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/707,941 Continuation US8791033B2 (en) 2010-06-08 2012-12-07 Wafer backside coating process with pulsed UV light source

Publications (2)

Publication Number Publication Date
WO2011156221A2 true WO2011156221A2 (en) 2011-12-15
WO2011156221A3 WO2011156221A3 (en) 2012-04-05

Family

ID=45098589

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2011/039044 Ceased WO2011156221A2 (en) 2010-06-08 2011-06-03 Wafer backside coating process with pulsed uv light source

Country Status (7)

Country Link
US (1) US8791033B2 (https=)
EP (1) EP2580777A4 (https=)
JP (1) JP5654672B2 (https=)
KR (1) KR20130079478A (https=)
CN (1) CN103003936A (https=)
TW (1) TWI456012B (https=)
WO (1) WO2011156221A2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2942111B2 (ja) 1993-08-31 1999-08-30 東芝テック株式会社 電気掃除機
US9266192B2 (en) 2012-05-29 2016-02-23 Electro Scientific Industries, Inc. Method and apparatus for processing workpieces
US9230888B2 (en) * 2013-02-11 2016-01-05 Henkel IP & Holding GmbH Wafer back side coating as dicing tape adhesive
CN104162502A (zh) * 2013-05-16 2014-11-26 展晶科技(深圳)有限公司 光固化涂层的方法
CN112837844B (zh) * 2021-03-01 2022-07-15 佛山市瑞纳新材科技有限公司 一种有双重固化性能的hjt低温固化银浆及其制备方法

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7008A (en) * 1850-01-08 Improvement in alloys for points of lightning-rods
US4010A (en) * 1845-04-22 Island
JPS54105774A (en) 1978-02-08 1979-08-20 Hitachi Ltd Method of forming pattern on thin film hybrid integrated circuit
WO1984000506A1 (en) 1982-07-23 1984-02-16 Xenon Corp Photomagnetic catalysis
JPS5959751A (ja) * 1982-09-30 1984-04-05 Dainippon Ink & Chem Inc 粉体塗料用組成物
JPH0339378A (ja) 1989-07-05 1991-02-20 Hitachi Chem Co Ltd 接着剤組成物，電子部品のプリント基板への固定法および集積回路板の製造法
CA2038117A1 (en) 1990-03-29 1991-09-30 Mahfuza B. Ali Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith
EP0492828A1 (en) * 1990-12-26 1992-07-01 Dow Corning Corporation Mixture of adhesion additives useful in UV curable compositions and compositions containing same
US6674158B2 (en) * 1998-09-03 2004-01-06 Micron Technology, Inc. Semiconductor die package having a UV cured polymeric die coating
US6211320B1 (en) * 1999-07-28 2001-04-03 Dexter Corporation Low viscosity acrylate monomers formulations containing same and uses therefor
US6833629B2 (en) * 2001-12-14 2004-12-21 National Starch And Chemical Investment Holding Corporation Dual cure B-stageable underfill for wafer level
CN1317350C (zh) * 2002-11-25 2007-05-23 亨凯尔公司 B阶小片连接粘合剂
US7176044B2 (en) * 2002-11-25 2007-02-13 Henkel Corporation B-stageable die attach adhesives
KR100517075B1 (ko) * 2003-08-11 2005-09-26 삼성전자주식회사 반도체 소자 제조 방법
JP4401912B2 (ja) 2003-10-17 2010-01-20 学校法人早稲田大学 半導体多層配線板の形成方法
JP3929966B2 (ja) 2003-11-25 2007-06-13 新光電気工業株式会社 半導体装置及びその製造方法
JP2005218921A (ja) * 2004-02-03 2005-08-18 Keyence Corp 紫外線照射装置及び紫外線照射方法
KR100555559B1 (ko) 2004-03-03 2006-03-03 삼성전자주식회사 백 그라인딩 공정용 표면 보호 테이프를 이용하여 다이싱공정을 수행하는 반도체 장치의 제조 방법
JP2005268425A (ja) 2004-03-17 2005-09-29 Toshiba Corp 半導体装置およびその製造方法
JP2005320491A (ja) 2004-05-11 2005-11-17 Hitachi Chem Co Ltd 接着剤組成物、それを用いたフィルム状接着剤及び回路接続材料、並びに回路部材の接続構造及びその製造方法
KR20080042940A (ko) 2004-05-18 2008-05-15 히다치 가세고교 가부시끼가이샤 점접착 시트 및 그것을 이용한 반도체장치 및 그 제조 방법
US7560519B2 (en) 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
JP2006012914A (ja) 2004-06-22 2006-01-12 Canon Inc 集積回路チップの製造方法及び半導体装置
KR100618837B1 (ko) 2004-06-22 2006-09-01 삼성전자주식회사 웨이퍼 레벨 패키지를 위한 얇은 웨이퍼들의 스택을형성하는 방법
JP2006100728A (ja) 2004-09-30 2006-04-13 Nitto Denko Corp 保護テープ剥離方法およびこれを用いた装置
JP2006269887A (ja) * 2005-03-25 2006-10-05 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置
JP2007012810A (ja) 2005-06-29 2007-01-18 Renesas Technology Corp 半導体集積回路装置の製造方法
JP5109239B2 (ja) 2005-07-05 2012-12-26 日立化成工業株式会社 粘接着シート、粘接着シートの製造方法及び半導体装置の製造方法
KR20110002500A (ko) 2005-07-05 2011-01-07 히다치 가세고교 가부시끼가이샤 감광성 접착제, 및 이것을 이용하여 얻어지는 접착 필름, 접착 시트, 접착제층 부착 반도체 웨이퍼, 반도체장치 및 전자부품
JP5011804B2 (ja) 2005-09-06 2012-08-29 日立化成工業株式会社 回路接続材料、接続体及び回路部材の接続方法
DE102005046280B4 (de) * 2005-09-27 2007-11-08 Infineon Technologies Ag Halbleiterbauteil mit einem Halbleiterchip sowie Verfahren zur Herstellung desselben
KR20070066929A (ko) 2005-12-22 2007-06-27 닛토덴코 가부시키가이샤 제거가능한 수분산성 아크릴 접착제 조성물 및 접착 시트
US7494900B2 (en) 2006-05-25 2009-02-24 Electro Scientific Industries, Inc. Back side wafer dicing
US7482251B1 (en) 2006-08-10 2009-01-27 Impinj, Inc. Etch before grind for semiconductor die singulation
WO2008094149A1 (en) 2007-01-31 2008-08-07 Henkel Ag & Co. Kgaa Semiconductor wafter coated with a filled, spin-coatable material
US20090104448A1 (en) * 2007-10-17 2009-04-23 Henkel Ag & Co. Kgaa Preformed adhesive bodies useful for joining substrates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of EP2580777A4 *

Also Published As

Publication number Publication date
JP5654672B2 (ja) 2015-01-14
CN103003936A (zh) 2013-03-27
TWI456012B (zh) 2014-10-11
JP2013535098A (ja) 2013-09-09
TW201202359A (en) 2012-01-16
WO2011156221A3 (en) 2012-04-05
EP2580777A4 (en) 2015-06-03
EP2580777A2 (en) 2013-04-17
US20130099396A1 (en) 2013-04-25
US8791033B2 (en) 2014-07-29
KR20130079478A (ko) 2013-07-10

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