KR20130079478A - 펄스 uv 광원을 이용한 웨이퍼 후면 코팅 공정 - Google Patents
펄스 uv 광원을 이용한 웨이퍼 후면 코팅 공정 Download PDFInfo
- Publication number
- KR20130079478A KR20130079478A KR1020137000413A KR20137000413A KR20130079478A KR 20130079478 A KR20130079478 A KR 20130079478A KR 1020137000413 A KR1020137000413 A KR 1020137000413A KR 20137000413 A KR20137000413 A KR 20137000413A KR 20130079478 A KR20130079478 A KR 20130079478A
- Authority
- KR
- South Korea
- Prior art keywords
- coating composition
- acrylate
- resin
- coating
- pulsed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
- H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
- H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
- H10W74/476—Organic materials comprising silicon
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/013—Manufacture or treatment of die-attach connectors
- H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
- H10W72/01336—Manufacture or treatment of die-attach connectors using blanket deposition in solid form, e.g. by using a powder or by laminating a foil
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
- H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
- H10W72/07338—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/321—Structures or relative sizes of die-attach connectors
- H10W72/325—Die-attach connectors having a filler embedded in a matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/352—Materials of die-attach connectors comprising metals or metalloids, e.g. solders
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
- H10W72/351—Materials of die-attach connectors
- H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
- H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Paints Or Removers (AREA)
- Epoxy Resins (AREA)
- Die Bonding (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Formation Of Insulating Films (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US35258410P | 2010-06-08 | 2010-06-08 | |
| US61/352,584 | 2010-06-08 | ||
| PCT/US2011/039044 WO2011156221A2 (en) | 2010-06-08 | 2011-06-03 | Wafer backside coating process with pulsed uv light source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20130079478A true KR20130079478A (ko) | 2013-07-10 |
Family
ID=45098589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137000413A Abandoned KR20130079478A (ko) | 2010-06-08 | 2011-06-03 | 펄스 uv 광원을 이용한 웨이퍼 후면 코팅 공정 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8791033B2 (https=) |
| EP (1) | EP2580777A4 (https=) |
| JP (1) | JP5654672B2 (https=) |
| KR (1) | KR20130079478A (https=) |
| CN (1) | CN103003936A (https=) |
| TW (1) | TWI456012B (https=) |
| WO (1) | WO2011156221A2 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2942111B2 (ja) | 1993-08-31 | 1999-08-30 | 東芝テック株式会社 | 電気掃除機 |
| US9266192B2 (en) | 2012-05-29 | 2016-02-23 | Electro Scientific Industries, Inc. | Method and apparatus for processing workpieces |
| US9230888B2 (en) * | 2013-02-11 | 2016-01-05 | Henkel IP & Holding GmbH | Wafer back side coating as dicing tape adhesive |
| CN104162502A (zh) * | 2013-05-16 | 2014-11-26 | 展晶科技(深圳)有限公司 | 光固化涂层的方法 |
| CN112837844B (zh) * | 2021-03-01 | 2022-07-15 | 佛山市瑞纳新材科技有限公司 | 一种有双重固化性能的hjt低温固化银浆及其制备方法 |
Family Cites Families (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7008A (en) * | 1850-01-08 | Improvement in alloys for points of lightning-rods | ||
| US4010A (en) * | 1845-04-22 | Island | ||
| JPS54105774A (en) | 1978-02-08 | 1979-08-20 | Hitachi Ltd | Method of forming pattern on thin film hybrid integrated circuit |
| WO1984000506A1 (en) | 1982-07-23 | 1984-02-16 | Xenon Corp | Photomagnetic catalysis |
| JPS5959751A (ja) * | 1982-09-30 | 1984-04-05 | Dainippon Ink & Chem Inc | 粉体塗料用組成物 |
| JPH0339378A (ja) | 1989-07-05 | 1991-02-20 | Hitachi Chem Co Ltd | 接着剤組成物,電子部品のプリント基板への固定法および集積回路板の製造法 |
| CA2038117A1 (en) | 1990-03-29 | 1991-09-30 | Mahfuza B. Ali | Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith |
| EP0492828A1 (en) * | 1990-12-26 | 1992-07-01 | Dow Corning Corporation | Mixture of adhesion additives useful in UV curable compositions and compositions containing same |
| US6674158B2 (en) * | 1998-09-03 | 2004-01-06 | Micron Technology, Inc. | Semiconductor die package having a UV cured polymeric die coating |
| US6211320B1 (en) * | 1999-07-28 | 2001-04-03 | Dexter Corporation | Low viscosity acrylate monomers formulations containing same and uses therefor |
| US6833629B2 (en) * | 2001-12-14 | 2004-12-21 | National Starch And Chemical Investment Holding Corporation | Dual cure B-stageable underfill for wafer level |
| CN1317350C (zh) * | 2002-11-25 | 2007-05-23 | 亨凯尔公司 | B阶小片连接粘合剂 |
| US7176044B2 (en) * | 2002-11-25 | 2007-02-13 | Henkel Corporation | B-stageable die attach adhesives |
| KR100517075B1 (ko) * | 2003-08-11 | 2005-09-26 | 삼성전자주식회사 | 반도체 소자 제조 방법 |
| JP4401912B2 (ja) | 2003-10-17 | 2010-01-20 | 学校法人早稲田大学 | 半導体多層配線板の形成方法 |
| JP3929966B2 (ja) | 2003-11-25 | 2007-06-13 | 新光電気工業株式会社 | 半導体装置及びその製造方法 |
| JP2005218921A (ja) * | 2004-02-03 | 2005-08-18 | Keyence Corp | 紫外線照射装置及び紫外線照射方法 |
| KR100555559B1 (ko) | 2004-03-03 | 2006-03-03 | 삼성전자주식회사 | 백 그라인딩 공정용 표면 보호 테이프를 이용하여 다이싱공정을 수행하는 반도체 장치의 제조 방법 |
| JP2005268425A (ja) | 2004-03-17 | 2005-09-29 | Toshiba Corp | 半導体装置およびその製造方法 |
| JP2005320491A (ja) | 2004-05-11 | 2005-11-17 | Hitachi Chem Co Ltd | 接着剤組成物、それを用いたフィルム状接着剤及び回路接続材料、並びに回路部材の接続構造及びその製造方法 |
| KR20080042940A (ko) | 2004-05-18 | 2008-05-15 | 히다치 가세고교 가부시끼가이샤 | 점접착 시트 및 그것을 이용한 반도체장치 및 그 제조 방법 |
| US7560519B2 (en) | 2004-06-02 | 2009-07-14 | Lord Corporation | Dual-stage wafer applied underfills |
| JP2006012914A (ja) | 2004-06-22 | 2006-01-12 | Canon Inc | 集積回路チップの製造方法及び半導体装置 |
| KR100618837B1 (ko) | 2004-06-22 | 2006-09-01 | 삼성전자주식회사 | 웨이퍼 레벨 패키지를 위한 얇은 웨이퍼들의 스택을형성하는 방법 |
| JP2006100728A (ja) | 2004-09-30 | 2006-04-13 | Nitto Denko Corp | 保護テープ剥離方法およびこれを用いた装置 |
| JP2006269887A (ja) * | 2005-03-25 | 2006-10-05 | Sumitomo Bakelite Co Ltd | 半導体用接着フィルム及びこれを用いた半導体装置 |
| JP2007012810A (ja) | 2005-06-29 | 2007-01-18 | Renesas Technology Corp | 半導体集積回路装置の製造方法 |
| JP5109239B2 (ja) | 2005-07-05 | 2012-12-26 | 日立化成工業株式会社 | 粘接着シート、粘接着シートの製造方法及び半導体装置の製造方法 |
| KR20110002500A (ko) | 2005-07-05 | 2011-01-07 | 히다치 가세고교 가부시끼가이샤 | 감광성 접착제, 및 이것을 이용하여 얻어지는 접착 필름, 접착 시트, 접착제층 부착 반도체 웨이퍼, 반도체장치 및 전자부품 |
| JP5011804B2 (ja) | 2005-09-06 | 2012-08-29 | 日立化成工業株式会社 | 回路接続材料、接続体及び回路部材の接続方法 |
| DE102005046280B4 (de) * | 2005-09-27 | 2007-11-08 | Infineon Technologies Ag | Halbleiterbauteil mit einem Halbleiterchip sowie Verfahren zur Herstellung desselben |
| KR20070066929A (ko) | 2005-12-22 | 2007-06-27 | 닛토덴코 가부시키가이샤 | 제거가능한 수분산성 아크릴 접착제 조성물 및 접착 시트 |
| US7494900B2 (en) | 2006-05-25 | 2009-02-24 | Electro Scientific Industries, Inc. | Back side wafer dicing |
| US7482251B1 (en) | 2006-08-10 | 2009-01-27 | Impinj, Inc. | Etch before grind for semiconductor die singulation |
| WO2008094149A1 (en) | 2007-01-31 | 2008-08-07 | Henkel Ag & Co. Kgaa | Semiconductor wafter coated with a filled, spin-coatable material |
| US20090104448A1 (en) * | 2007-10-17 | 2009-04-23 | Henkel Ag & Co. Kgaa | Preformed adhesive bodies useful for joining substrates |
-
2011
- 2011-05-24 TW TW100118180A patent/TWI456012B/zh not_active IP Right Cessation
- 2011-06-03 JP JP2013514230A patent/JP5654672B2/ja not_active Expired - Fee Related
- 2011-06-03 EP EP11792925.7A patent/EP2580777A4/en not_active Withdrawn
- 2011-06-03 WO PCT/US2011/039044 patent/WO2011156221A2/en not_active Ceased
- 2011-06-03 KR KR1020137000413A patent/KR20130079478A/ko not_active Abandoned
- 2011-06-03 CN CN2011800281230A patent/CN103003936A/zh active Pending
-
2012
- 2012-12-07 US US13/707,941 patent/US8791033B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP5654672B2 (ja) | 2015-01-14 |
| CN103003936A (zh) | 2013-03-27 |
| TWI456012B (zh) | 2014-10-11 |
| JP2013535098A (ja) | 2013-09-09 |
| TW201202359A (en) | 2012-01-16 |
| WO2011156221A3 (en) | 2012-04-05 |
| EP2580777A4 (en) | 2015-06-03 |
| EP2580777A2 (en) | 2013-04-17 |
| US20130099396A1 (en) | 2013-04-25 |
| WO2011156221A2 (en) | 2011-12-15 |
| US8791033B2 (en) | 2014-07-29 |
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St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| NORF | Unpaid initial registration fee | ||
| PC1904 | Unpaid initial registration fee |
St.27 status event code: A-2-2-U10-U14-oth-PC1904 St.27 status event code: N-2-6-B10-B12-nap-PC1904 |
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| P22-X000 | Classification modified |
St.27 status event code: A-2-2-P10-P22-nap-X000 |