WO2011111479A1 - フォトマスク、露光装置及び液晶表示パネルの製造方法 - Google Patents

フォトマスク、露光装置及び液晶表示パネルの製造方法 Download PDF

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Publication number
WO2011111479A1
WO2011111479A1 PCT/JP2011/053117 JP2011053117W WO2011111479A1 WO 2011111479 A1 WO2011111479 A1 WO 2011111479A1 JP 2011053117 W JP2011053117 W JP 2011053117W WO 2011111479 A1 WO2011111479 A1 WO 2011111479A1
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WO
WIPO (PCT)
Prior art keywords
photomask
exposure
light
liquid crystal
substrate
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Application number
PCT/JP2011/053117
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English (en)
French (fr)
Japanese (ja)
Inventor
貴浩 平子
Original Assignee
シャープ株式会社
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Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to CN201180007634.4A priority Critical patent/CN102741746B/zh
Priority to JP2012504376A priority patent/JP5308573B2/ja
Publication of WO2011111479A1 publication Critical patent/WO2011111479A1/ja

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

Definitions

  • the present invention relates to a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel. More particularly, the present invention relates to a photomask used for alignment division by an alignment film, an exposure apparatus, and a method for manufacturing a liquid crystal display panel.
  • a photomask is used for exposing a photosensitive resin layer on a substrate, and is used for manufacturing various electronic members. In particular, it is widely used in alignment film exposure by a photo-alignment method for manufacturing a liquid crystal display panel.
  • the alignment film exposure process is an important process for forming an alignment film that controls and regulates the alignment direction of the liquid crystal molecules, and this makes it possible to manufacture a liquid crystal display panel having an excellent viewing angle. For example, by applying light from a predetermined direction through a photomask, the alignment film is given an alignment regulating force for liquid crystal molecules, and in the next step, the alignment film is selectively irradiated from different directions. A method of performing alignment division of the alignment film is used.
  • a liquid crystal display device in which at least one holding a liquid crystal has a pair of transparent substrates, and an alignment film for regulating the alignment direction of liquid crystal molecules is provided on each substrate.
  • This is a method of manufacturing, and by applying ultraviolet rays through an optical mask, the alignment film is given an alignment regulating force of liquid crystal molecules, and the alignment film is selectively irradiated with ultraviolet rays from different directions, whereby the alignment film
  • a method for manufacturing a liquid crystal display device including performing alignment division, wherein an optical mask having a light-shielding pattern surface provided with a metal-dielectric multilayer film is used, and the multilayer film transmits ultraviolet rays having a specific incident angle.
  • a method of manufacturing a liquid crystal display device characterized by being optimized is disclosed (for example, see Patent Document 1).
  • An object of this manufacturing method is to optimize the alignment division by narrowing the range of the overlapped exposure region when performing the alignment division, thereby enabling stable alignment of the alignment film.
  • a scanning exposure method in which a plurality of small photomasks are connected to reduce the running cost of the photomask. Since the photomask is small, it is usually irradiated with light such as ultraviolet rays in several times. As the number of exposure steps increases, the number of exposure stages increases accordingly.
  • FIG. 6 is a schematic plan view of a conventional photomask 111.
  • a light shielding unit 113 and a transmission unit 115 are provided, and exposure can be performed, for example, for each half-pixel width by light transmitted through the transmission unit 115.
  • an exposure process is further provided to irradiate the substrate main surface with ultraviolet rays from different directions.
  • the exposure process is classified in each light irradiation direction, and exposure is performed using a plurality of small masks.
  • the entire substrate on which the alignment film before exposure is formed in a plurality of times using a plurality of small masks when the alignment division processing is performed by performing light irradiation from two or more different directions, the entire substrate Since the exposure is performed at least two times and at least two different directions in order to divide the plurality of times into a plurality of times, at least four exposure stages are required.
  • a transfer stage for preparing for pre-exposure is provided between the exposure stages, and the entire facility becomes huge.
  • FIG. 7 conceptually shows the exposure process of such a conventional exposure apparatus.
  • FIG. 7 shows that the alignment film exposure process for alignment division is composed of four stages and a transport stage connecting them. Specifically, it is composed of four stage portions 171a, 171b, 171c, and 171d, and the substrate 130 advances along the substrate flow 181.
  • the direction of inclination with the ultraviolet ray 121 is different.
  • the photo-alignment method different tilts can be imparted to the liquid crystal by irradiating light with different irradiation directions.
  • the main surface of the photomask 111 is parallel to the main surface of the substrate 130 to be exposed, and the photomask 111 transmits the irradiation light from the exposure light source for each half-pixel width. Exposure.
  • the conventional exposure apparatus has a large installation space, and each stage is provided with expensive consumables such as a plurality of photomasks and high-pressure mercury lamps, and in particular, a photomask that is different for each normal model is used. Therefore, it leads to an increase in equipment cost and running cost. That is, since a plurality of light sources (exposure light source and tracking light source) and a photomask are required for each exposure stage, the running cost of the entire apparatus is enormous. In the conventional exposure apparatus and liquid crystal display manufacturing method, there are significant problems in terms of efficiency of the production process and production space.
  • the present invention has been made in view of the above-described present situation, and an object thereof is to provide a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel that can reduce running costs and equipment. To do.
  • the present inventor conducted various studies on a photomask (exposure mask) used in the alignment film exposure process, an exposure apparatus using the photomask, and a method for manufacturing a liquid crystal display panel.
  • the conventional photomask is divided into a transmission part and a light shielding part.
  • the photomask is configured such that light incident on the photomask from the light source is irradiated to the alignment film on the substrate through the transmission part, while part of the incident light is shielded by the light shielding part. Pay attention.
  • a light reflection film layer as a reflection part on the light shielding part of the photomask, it is possible to irradiate light in two directions by irradiating light from one light source.
  • the process that had to be performed can be completed by one irradiation, and it was found that it can be omitted, and the inventors have conceived that the above problems can be solved brilliantly.
  • the direction of installation of the photomask with respect to the substrate is different from that of the conventional substrate main surface, and is substantially perpendicular to the substrate main surface (normal direction of the substrate). While the light is transmitted and directly irradiated onto the substrate, the light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position shifted by approximately half a pixel from the transmitting portion.
  • the purpose of alignment film exposure in alignment division is satisfied, and the present invention has been achieved.
  • the present invention is a photomask used to expose an alignment film for each exposure region in the substrate surface, and the photomask transmits and reflects light incident on the main surface of the photomask.
  • the photomask is characterized in that the transmitted light is irradiated toward one of the exposure regions and the reflected light is irradiated toward the other of the exposure regions.
  • a part of the photomask is a transmission part and the other part is constituted by a reflection part.
  • the photomask has a light-shielding part.
  • a light-shielding portion is provided around the periphery and the edge of the photomask.
  • the transmissive portion is preferably formed by being divided into a plurality of parts in one photomask, and usually has a form in which a plurality of slit-shaped transmissive portions are arranged at a constant direction and at a constant interval.
  • the reflection part may be formed of a member that reflects light so that the alignment film can be oriented, and the light reflection layer is preferably formed of a metal film having a high light reflectance such as an aluminum film.
  • a plurality of slit-shaped transmission parts are arranged in a predetermined direction (fixed direction) and at a predetermined interval (fixed interval), and between the plurality of transmission parts.
  • a plurality of reflective portions having substantially the same shape as the transmissive portion are arranged in a predetermined direction (constant direction) and at a predetermined interval (constant interval), and the short axis side of the slit-shaped transmissive portion and the short axis side of the reflective portion are arranged side by side
  • the both-ends of the photomask along the line form a light shielding part.
  • the photomask of the present invention As long as the light incident on the main surface of the photomask is transmitted and reflected, it has the transmissive part and the reflective part as described above.
  • a form in which a photomask is constituted by a member that transmits and reflects light at the same time, and transmission and reflection are performed in the same area in the photomask can be cited.
  • light incident from one direction is normally decomposed in two directions by transmission and reflection and irradiated in two directions, and such a form is preferable. You may make it irradiate in more directions by changing the shape of a reflection part partially.
  • the light is preferably incident from one direction, but may be incident from multiple directions.
  • One preferred form of the photomask of the present invention is a form in which the main surface is arranged and used so as to be substantially perpendicular to the substrate surface subjected to exposure.
  • the light irradiation direction can be decomposed in two directions so as to be substantially symmetric with respect to the normal line of the substrate main surface.
  • the process of changing the direction of irradiation which is the cause of the enlargement of the exposure equipment in the alignment division, can be performed at one time, and a remarkable effect that cannot be realized with a conventional photomask can be obtained.
  • the photomask main surface is arranged so as to be substantially perpendicular to the substrate surface to be exposed, the angle of light decomposed in two directions and irradiated to the substrate surface is the same.
  • the main surface of the photomask is inclined with respect to the substrate surface. It does not prevent it.
  • This invention is also an exposure apparatus provided with the light source which irradiates the light which exposes the photomask and alignment film of this invention.
  • a preferred form of the above exposure apparatus is a form in which a scan exposure method is performed in which a plurality of small photomasks are joined together.
  • an alignment film before exposure is formed in several steps to expose the entire substrate. Then, light such as ultraviolet rays is irradiated from a predetermined direction toward the substrate.
  • the exposure apparatus of the present invention makes it possible to perform substantially two exposures in one exposure operation, and particularly in an alignment division exposure process in which an alignment film in one pixel is divided into a plurality of alignment directions. Therefore, the production process can be made more efficient and the production space can be reduced.
  • the present invention further provides a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
  • the manufacturing method is a method for manufacturing a liquid crystal display panel including a step of exposing the alignment film using the exposure apparatus of the present invention.
  • the present invention is also a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
  • the substrate surface is divided into two or more exposure regions, the alignment film in one of the exposure regions is exposed with light transmitted through the photomask, and the alignment film in the other of the exposure regions is exposed with light reflected from the photomask.
  • the exposure area is, for example, one picture element divided into half picture elements, one half picture element having a constant orientation direction, and the other half picture element having a constant orientation direction different from the orientation direction.
  • one half picture element is used as one exposure area
  • the other half picture element is used as another exposure area.
  • the orientation of the alignment film is different for each exposure region, which improves the viewing angle of the liquid crystal display panel.
  • the exposure step irradiates light to the main surface of the photomask from an oblique direction with respect to the normal line of the main surface of the substrate to perform transmission and reflection.
  • Other configurations of the above-described photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention may be set as appropriate, and are not particularly limited as long as the effects of the present invention are not impaired.
  • the photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention not only reduce running costs and equipment, but also mask operation control because the number of scan exposures is halved in some cases. It will also help to reduce the risk of defects due to mistakes. Further, in the conventional exposure apparatus, since about half of the photomask area is shielded, a great deal of energy from the light source is wasted, but in the present invention, substantially all of the light from the light source is used. Efficient use of energy becomes possible. Note that the present invention only needs to exhibit an effect of either sufficiently reducing the running cost or reducing the equipment.
  • the running cost can be sufficiently reduced and the equipment can be reduced.
  • the production process of the liquid crystal display panel is made more efficient, and as a result, the reduction in the number of processes also contributes to higher quality.
  • FIG. 2 is a schematic plan view of a photomask according to Embodiment 1.
  • FIG. It is a cross-sectional schematic diagram which shows the usage pattern of the photomask which concerns on Embodiment 1.
  • FIG. 1 is a schematic diagram showing an exposure apparatus according to Embodiment 1.
  • FIG. 2 is a schematic plan view of a TFT substrate observed by a CCD camera of the exposure apparatus according to Embodiment 1.
  • FIG. It is a schematic diagram which shows the exposure process of the exposure apparatus which concerns on Embodiment 1.
  • FIG. It is a plane schematic diagram of a conventional photomask. It is a schematic diagram which shows the exposure process of the conventional exposure apparatus.
  • the substrate on which the thin film transistor element (TFT) is arranged is also referred to as a TFT substrate.
  • the substrate on which the color filter (CF) is disposed is also referred to as a CF substrate.
  • FIG. 1 is a schematic plan view of a photomask according to the first embodiment.
  • a light reflecting portion (reflecting portion 17) is provided in a portion between the transmitting portion 15 and the transmitting portion 15 (a light shielding portion in the conventional photomask), and the transmitting portion 15 and the reflecting portion are reflected.
  • the portions 17 are provided alternately.
  • the length of the transmission part 15 and the length of the reflection part 17 (the horizontal length shown in FIG. 1) are substantially the same, and the width of the transmission part 15 and the width of the reflection part 17 (FIG. 1).
  • the vertical length shown in FIG. For example, a film having a high light reflectivity can be applied to the reflecting portion 17.
  • an aluminum film or the like is preferably applied.
  • One important item in the alignment division of the alignment film is to reverse the light irradiation angle for each half-pixel.
  • the photomask 11 of Embodiment 1 decomposes the irradiation direction of light from a light source into two directions in an exposure process for orientation division by adding a light reflection function to a conventional light shielding portion. Thereby, the process of changing the direction of irradiation, which is the cause of enlarging the exposure equipment for the alignment film, can be performed at a time.
  • a light shielding portion 13 is provided at the edge of the photomask 11.
  • FIG. 2 is a schematic cross-sectional view showing a usage pattern of the photomask according to the first embodiment.
  • FIG. 3 is a schematic diagram showing the exposure apparatus according to the first embodiment.
  • the exposure apparatus according to Embodiment 1 is composed of two exposure stage units and a transfer stage unit therebetween, and FIG. 3 shows a part thereof.
  • Each exposure stage unit is provided with a plurality of heads. Although the number of heads varies depending on the substrate size, an exposure light source 31 (exposure head unit), a photomask 11, a follow-up CCD (charge-coupled device) camera 41, and the like are installed in each head.
  • the photomask 11 is arranged so that its main surface is substantially perpendicular to the substrate surface subjected to exposure.
  • an image detection light source 61 (also referred to as a follow-up light source) is provided on the back surface of the substrate 30 (opposite to the exposure light source 31 when viewed from the substrate), and light from the image detection light source 61 is transmitted. It passes through the substrate 30, passes through the photomask 11 through a mirror, and reaches the CCD camera 41.
  • the CCD camera 41 for fine adjustment of the photomask is usually arranged in this way, for example, since it can look into the slit of the photomask when it is perpendicular to the photomask. In addition, as long as the CCD camera 41 can capture the pattern edge of the substrate 30 and recognize the edge of the photomask 11, other forms than this form can be adopted as appropriate.
  • the substrate 30 is transferred by the stage unit 71.
  • the exposure light source 31 (irradiation direction of the ultraviolet rays 21) and the photomask 11 are fixed, and the ultraviolet rays are accurately emitted by causing the photomask 11 to follow the substrate 30 that travels. Irradiate.
  • the tracking operation an arbitrary pattern image on the substrate 30 is set in advance, the tracking pattern provided on the photomask 11 is monitored by the CCD camera 41, and the distance between the two pattern edges is always constant. Thus, the photomask 11 is always finely adjusted.
  • the CCD camera 41 installed in the exposure apparatus according to the first embodiment captures the pattern edge of the substrate 30, and simultaneously recognizes the edge of the photomask 11, and finely holds the photomask 11 so as to keep the distance between them constant. Adjust the exposure position accuracy by adjusting.
  • fine adjustment is performed by the control unit 51 including an image processing circuit. Then, exposure is performed by the exposure light source 31 while finely adjusting the photomask 11.
  • FIG. 4 is a schematic plan view of the TFT substrate observed with the CCD camera of the exposure apparatus according to the first embodiment.
  • the dotted line indicates the traced pattern edge of the captured photomask.
  • a linear or substantially linear (close to a straight line) pattern on the substrate is set as a follow-up pattern, and a slit on the photomask side (actually, a mask pattern) Appear in the image as follows). That is, follow-up exposure is possible if there is a certain linear or substantially linear pattern on the substrate surface.
  • FIG. 5 is a schematic diagram showing an exposure process of the exposure apparatus according to the first embodiment.
  • the transmitted ultraviolet light (transmitted light 23) is irradiated toward one of the exposure areas
  • the reflected light (reflected light 25) is irradiated toward the other of the exposure areas.
  • the exposure region can be adjusted as appropriate by adjusting the length and width of the transmissive and reflective portions of the photomask 11 and the irradiation direction of the ultraviolet rays from the light source.
  • the ultraviolet light from the light source can be decomposed into transmitted light for normal half-picture elements and reflected light for the remaining half-picture elements, and these can be irradiated to the alignment film at the same time.
  • the photomask 11 provided adjacent to the photomask 11 that transmits the transmitted light corresponding to the half-pixel is used.
  • the reflected light is radiated, whereby the areas exposed by the transmitted light and the areas exposed by the reflected light are alternately arranged for each half picture element.
  • the half-pixel refers to a substantially half region divided in the length direction or the width direction of a pixel indicating any one color, such as R (red), G (green), or B (blue).
  • the region where the transmitted light is irradiated by one photomask and the region where the reflected light is irradiated for each half picture element are substantially the same.
  • the transmitted light 23 and the reflected light 25 are alternately irradiated from the exposure light source 31a through the photomask 11, and a striped portion is generated. In between, the transmitted light 23 and the reflected light 25 are irradiated from the exposure light source 31b through the photomask 11 in the next exposure stage unit 71b. Further, the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the first exposure stage and the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the next exposure stage are shaped and large. Are substantially the same. In the first embodiment, ultraviolet light that is light normally used for photo-alignment is used. However, as long as the effect of the present invention is exhibited, light in other wavelength regions can be used. In the first embodiment, the substrate 30 is transported along the substrate flow 81.
  • the installation direction of the photomask is made substantially perpendicular to the main surface of the substrate, and the photomask itself is formed with an ultraviolet reflecting film layer such as aluminum on the conventional light shielding portion, so that 2 in one scanning operation.
  • an ultraviolet reflecting film layer such as aluminum on the conventional light shielding portion, so that 2 in one scanning operation.
  • ultraviolet irradiation in the direction.
  • the photomask perpendicular to the substrate, ultraviolet rays are transmitted from the transmission part and directly irradiated onto the substrate.
  • the ultraviolet light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position that is exactly half a pixel apart from the transmitting portion, and a method for manufacturing a liquid crystal display device that performs alignment division of the alignment film The purpose of alignment film exposure is satisfied.
  • substantially vertical may be substantially vertical to such an extent that it can be said that the preferred effect of the present embodiment is exhibited.
  • Comparative Example 1 Using a conventional photomask (shown in FIG. 6) instead of the photomask according to Example 1, the exposure process was performed using four exposure stages 171a, 171b, 171c, and 171d as shown in FIG.
  • an exposure lamp means an alignment film exposure lamp
  • a follow-up lamp means an image detection lamp for follow-up.
  • H in “1000H” and “2000H” means a unit (hour) of the average life of the lamp.
  • Numberer of sheets / model means the number of photomasks required for each exposure apparatus.
  • the “Effect” column shows the running cost reduction rate.
  • Embodiment 1 The facility installation area and facility cost in Embodiment 1 and Comparative Example 1 are shown in Table 2 below.
  • “Effect” means the reduction ratio of “Equipment Installation Area” and “Equipment Cost”.
  • the running cost including the photomask and the installation area of the equipment can be reduced by about 50%, and the equipment cost can be expected to be reduced by about 33% compared to the conventional case. .

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
PCT/JP2011/053117 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法 WO2011111479A1 (ja)

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CN201180007634.4A CN102741746B (zh) 2010-03-12 2011-02-15 光掩模、曝光装置以及液晶显示面板的制造方法
JP2012504376A JP5308573B2 (ja) 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法

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JP2012173641A (ja) * 2011-02-23 2012-09-10 V Technology Co Ltd スキャン露光装置

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CN104360428B (zh) * 2014-11-28 2016-08-24 京东方科技集团股份有限公司 制作彩色滤光片的方法及彩色滤光片、显示装置
CN106527055B (zh) * 2016-12-19 2018-03-30 武汉华星光电技术有限公司 曝光设备及曝光方法
CN108873486B (zh) * 2018-05-24 2020-11-27 南京中电熊猫液晶显示科技有限公司 一种用于基板光配向的掩膜版及光配向的方法
CN116520612B (zh) * 2023-04-20 2024-05-28 成都瑞波科材料科技有限公司 光学组件及光学膜处理装置

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