JP5308573B2 - フォトマスク、露光装置及び液晶表示パネルの製造方法 - Google Patents

フォトマスク、露光装置及び液晶表示パネルの製造方法 Download PDF

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Publication number
JP5308573B2
JP5308573B2 JP2012504376A JP2012504376A JP5308573B2 JP 5308573 B2 JP5308573 B2 JP 5308573B2 JP 2012504376 A JP2012504376 A JP 2012504376A JP 2012504376 A JP2012504376 A JP 2012504376A JP 5308573 B2 JP5308573 B2 JP 5308573B2
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Japan
Prior art keywords
photomask
exposure
light
liquid crystal
substrate
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Expired - Fee Related
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JP2012504376A
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English (en)
Japanese (ja)
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JPWO2011111479A1 (ja
Inventor
貴浩 平子
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Sharp Corp
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Sharp Corp
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Priority to JP2012504376A priority Critical patent/JP5308573B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2012504376A 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法 Expired - Fee Related JP5308573B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012504376A JP5308573B2 (ja) 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010056578 2010-03-12
JP2010056578 2010-03-12
PCT/JP2011/053117 WO2011111479A1 (ja) 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法
JP2012504376A JP5308573B2 (ja) 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法

Publications (2)

Publication Number Publication Date
JPWO2011111479A1 JPWO2011111479A1 (ja) 2013-06-27
JP5308573B2 true JP5308573B2 (ja) 2013-10-09

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012504376A Expired - Fee Related JP5308573B2 (ja) 2010-03-12 2011-02-15 フォトマスク、露光装置及び液晶表示パネルの製造方法

Country Status (3)

Country Link
JP (1) JP5308573B2 (zh)
CN (1) CN102741746B (zh)
WO (1) WO2011111479A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5629941B2 (ja) * 2011-02-23 2014-11-26 株式会社ブイ・テクノロジー スキャン露光装置
CN104360428B (zh) * 2014-11-28 2016-08-24 京东方科技集团股份有限公司 制作彩色滤光片的方法及彩色滤光片、显示装置
CN106527055B (zh) * 2016-12-19 2018-03-30 武汉华星光电技术有限公司 曝光设备及曝光方法
CN108873486B (zh) * 2018-05-24 2020-11-27 南京中电熊猫液晶显示科技有限公司 一种用于基板光配向的掩膜版及光配向的方法
CN116520612B (zh) * 2023-04-20 2024-05-28 成都瑞波科材料科技有限公司 光学组件及光学膜处理装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10282499A (ja) * 1997-04-09 1998-10-23 Agency Of Ind Science & Technol 配向膜の形成方法および露光装置
JP2000081621A (ja) * 1998-07-07 2000-03-21 Fujitsu Ltd 液晶表示装置の製造方法
JP2000187043A (ja) * 1998-10-14 2000-07-04 Japan Electronic Materials Corp 異種金属接合プロ―ブ、その製造方法及び異種金属接合プロ―ブを用いたプロ―ブカ―ド
JP2003043492A (ja) * 2001-08-01 2003-02-13 Fujitsu Ltd 液晶表示装置及び配向膜の露光装置及び配向膜の処理方法
JP2003161946A (ja) * 2001-11-27 2003-06-06 Fujitsu Display Technologies Corp 液晶表示装置製造方法及び液晶表示装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009223304A (ja) * 2008-02-19 2009-10-01 Fujifilm Corp 液晶表示装置用基板および液晶表示装置
JP2009187043A (ja) * 2009-05-29 2009-08-20 Sharp Corp 液晶表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10282499A (ja) * 1997-04-09 1998-10-23 Agency Of Ind Science & Technol 配向膜の形成方法および露光装置
JP2000081621A (ja) * 1998-07-07 2000-03-21 Fujitsu Ltd 液晶表示装置の製造方法
JP2000187043A (ja) * 1998-10-14 2000-07-04 Japan Electronic Materials Corp 異種金属接合プロ―ブ、その製造方法及び異種金属接合プロ―ブを用いたプロ―ブカ―ド
JP2003043492A (ja) * 2001-08-01 2003-02-13 Fujitsu Ltd 液晶表示装置及び配向膜の露光装置及び配向膜の処理方法
JP2003161946A (ja) * 2001-11-27 2003-06-06 Fujitsu Display Technologies Corp 液晶表示装置製造方法及び液晶表示装置

Also Published As

Publication number Publication date
WO2011111479A1 (ja) 2011-09-15
CN102741746B (zh) 2014-10-22
CN102741746A (zh) 2012-10-17
JPWO2011111479A1 (ja) 2013-06-27

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