WO2011111479A1 - Photomask, exposure device, and method for producing liquid crystal display panel - Google Patents

Photomask, exposure device, and method for producing liquid crystal display panel Download PDF

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Publication number
WO2011111479A1
WO2011111479A1 PCT/JP2011/053117 JP2011053117W WO2011111479A1 WO 2011111479 A1 WO2011111479 A1 WO 2011111479A1 JP 2011053117 W JP2011053117 W JP 2011053117W WO 2011111479 A1 WO2011111479 A1 WO 2011111479A1
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WO
WIPO (PCT)
Prior art keywords
photomask
exposure
light
liquid crystal
substrate
Prior art date
Application number
PCT/JP2011/053117
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French (fr)
Japanese (ja)
Inventor
貴浩 平子
Original Assignee
シャープ株式会社
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Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP2012504376A priority Critical patent/JP5308573B2/en
Priority to CN201180007634.4A priority patent/CN102741746B/en
Publication of WO2011111479A1 publication Critical patent/WO2011111479A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

Definitions

  • the present invention relates to a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel. More particularly, the present invention relates to a photomask used for alignment division by an alignment film, an exposure apparatus, and a method for manufacturing a liquid crystal display panel.
  • a photomask is used for exposing a photosensitive resin layer on a substrate, and is used for manufacturing various electronic members. In particular, it is widely used in alignment film exposure by a photo-alignment method for manufacturing a liquid crystal display panel.
  • the alignment film exposure process is an important process for forming an alignment film that controls and regulates the alignment direction of the liquid crystal molecules, and this makes it possible to manufacture a liquid crystal display panel having an excellent viewing angle. For example, by applying light from a predetermined direction through a photomask, the alignment film is given an alignment regulating force for liquid crystal molecules, and in the next step, the alignment film is selectively irradiated from different directions. A method of performing alignment division of the alignment film is used.
  • a liquid crystal display device in which at least one holding a liquid crystal has a pair of transparent substrates, and an alignment film for regulating the alignment direction of liquid crystal molecules is provided on each substrate.
  • This is a method of manufacturing, and by applying ultraviolet rays through an optical mask, the alignment film is given an alignment regulating force of liquid crystal molecules, and the alignment film is selectively irradiated with ultraviolet rays from different directions, whereby the alignment film
  • a method for manufacturing a liquid crystal display device including performing alignment division, wherein an optical mask having a light-shielding pattern surface provided with a metal-dielectric multilayer film is used, and the multilayer film transmits ultraviolet rays having a specific incident angle.
  • a method of manufacturing a liquid crystal display device characterized by being optimized is disclosed (for example, see Patent Document 1).
  • An object of this manufacturing method is to optimize the alignment division by narrowing the range of the overlapped exposure region when performing the alignment division, thereby enabling stable alignment of the alignment film.
  • a scanning exposure method in which a plurality of small photomasks are connected to reduce the running cost of the photomask. Since the photomask is small, it is usually irradiated with light such as ultraviolet rays in several times. As the number of exposure steps increases, the number of exposure stages increases accordingly.
  • FIG. 6 is a schematic plan view of a conventional photomask 111.
  • a light shielding unit 113 and a transmission unit 115 are provided, and exposure can be performed, for example, for each half-pixel width by light transmitted through the transmission unit 115.
  • an exposure process is further provided to irradiate the substrate main surface with ultraviolet rays from different directions.
  • the exposure process is classified in each light irradiation direction, and exposure is performed using a plurality of small masks.
  • the entire substrate on which the alignment film before exposure is formed in a plurality of times using a plurality of small masks when the alignment division processing is performed by performing light irradiation from two or more different directions, the entire substrate Since the exposure is performed at least two times and at least two different directions in order to divide the plurality of times into a plurality of times, at least four exposure stages are required.
  • a transfer stage for preparing for pre-exposure is provided between the exposure stages, and the entire facility becomes huge.
  • FIG. 7 conceptually shows the exposure process of such a conventional exposure apparatus.
  • FIG. 7 shows that the alignment film exposure process for alignment division is composed of four stages and a transport stage connecting them. Specifically, it is composed of four stage portions 171a, 171b, 171c, and 171d, and the substrate 130 advances along the substrate flow 181.
  • the direction of inclination with the ultraviolet ray 121 is different.
  • the photo-alignment method different tilts can be imparted to the liquid crystal by irradiating light with different irradiation directions.
  • the main surface of the photomask 111 is parallel to the main surface of the substrate 130 to be exposed, and the photomask 111 transmits the irradiation light from the exposure light source for each half-pixel width. Exposure.
  • the conventional exposure apparatus has a large installation space, and each stage is provided with expensive consumables such as a plurality of photomasks and high-pressure mercury lamps, and in particular, a photomask that is different for each normal model is used. Therefore, it leads to an increase in equipment cost and running cost. That is, since a plurality of light sources (exposure light source and tracking light source) and a photomask are required for each exposure stage, the running cost of the entire apparatus is enormous. In the conventional exposure apparatus and liquid crystal display manufacturing method, there are significant problems in terms of efficiency of the production process and production space.
  • the present invention has been made in view of the above-described present situation, and an object thereof is to provide a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel that can reduce running costs and equipment. To do.
  • the present inventor conducted various studies on a photomask (exposure mask) used in the alignment film exposure process, an exposure apparatus using the photomask, and a method for manufacturing a liquid crystal display panel.
  • the conventional photomask is divided into a transmission part and a light shielding part.
  • the photomask is configured such that light incident on the photomask from the light source is irradiated to the alignment film on the substrate through the transmission part, while part of the incident light is shielded by the light shielding part. Pay attention.
  • a light reflection film layer as a reflection part on the light shielding part of the photomask, it is possible to irradiate light in two directions by irradiating light from one light source.
  • the process that had to be performed can be completed by one irradiation, and it was found that it can be omitted, and the inventors have conceived that the above problems can be solved brilliantly.
  • the direction of installation of the photomask with respect to the substrate is different from that of the conventional substrate main surface, and is substantially perpendicular to the substrate main surface (normal direction of the substrate). While the light is transmitted and directly irradiated onto the substrate, the light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position shifted by approximately half a pixel from the transmitting portion.
  • the purpose of alignment film exposure in alignment division is satisfied, and the present invention has been achieved.
  • the present invention is a photomask used to expose an alignment film for each exposure region in the substrate surface, and the photomask transmits and reflects light incident on the main surface of the photomask.
  • the photomask is characterized in that the transmitted light is irradiated toward one of the exposure regions and the reflected light is irradiated toward the other of the exposure regions.
  • a part of the photomask is a transmission part and the other part is constituted by a reflection part.
  • the photomask has a light-shielding part.
  • a light-shielding portion is provided around the periphery and the edge of the photomask.
  • the transmissive portion is preferably formed by being divided into a plurality of parts in one photomask, and usually has a form in which a plurality of slit-shaped transmissive portions are arranged at a constant direction and at a constant interval.
  • the reflection part may be formed of a member that reflects light so that the alignment film can be oriented, and the light reflection layer is preferably formed of a metal film having a high light reflectance such as an aluminum film.
  • a plurality of slit-shaped transmission parts are arranged in a predetermined direction (fixed direction) and at a predetermined interval (fixed interval), and between the plurality of transmission parts.
  • a plurality of reflective portions having substantially the same shape as the transmissive portion are arranged in a predetermined direction (constant direction) and at a predetermined interval (constant interval), and the short axis side of the slit-shaped transmissive portion and the short axis side of the reflective portion are arranged side by side
  • the both-ends of the photomask along the line form a light shielding part.
  • the photomask of the present invention As long as the light incident on the main surface of the photomask is transmitted and reflected, it has the transmissive part and the reflective part as described above.
  • a form in which a photomask is constituted by a member that transmits and reflects light at the same time, and transmission and reflection are performed in the same area in the photomask can be cited.
  • light incident from one direction is normally decomposed in two directions by transmission and reflection and irradiated in two directions, and such a form is preferable. You may make it irradiate in more directions by changing the shape of a reflection part partially.
  • the light is preferably incident from one direction, but may be incident from multiple directions.
  • One preferred form of the photomask of the present invention is a form in which the main surface is arranged and used so as to be substantially perpendicular to the substrate surface subjected to exposure.
  • the light irradiation direction can be decomposed in two directions so as to be substantially symmetric with respect to the normal line of the substrate main surface.
  • the process of changing the direction of irradiation which is the cause of the enlargement of the exposure equipment in the alignment division, can be performed at one time, and a remarkable effect that cannot be realized with a conventional photomask can be obtained.
  • the photomask main surface is arranged so as to be substantially perpendicular to the substrate surface to be exposed, the angle of light decomposed in two directions and irradiated to the substrate surface is the same.
  • the main surface of the photomask is inclined with respect to the substrate surface. It does not prevent it.
  • This invention is also an exposure apparatus provided with the light source which irradiates the light which exposes the photomask and alignment film of this invention.
  • a preferred form of the above exposure apparatus is a form in which a scan exposure method is performed in which a plurality of small photomasks are joined together.
  • an alignment film before exposure is formed in several steps to expose the entire substrate. Then, light such as ultraviolet rays is irradiated from a predetermined direction toward the substrate.
  • the exposure apparatus of the present invention makes it possible to perform substantially two exposures in one exposure operation, and particularly in an alignment division exposure process in which an alignment film in one pixel is divided into a plurality of alignment directions. Therefore, the production process can be made more efficient and the production space can be reduced.
  • the present invention further provides a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
  • the manufacturing method is a method for manufacturing a liquid crystal display panel including a step of exposing the alignment film using the exposure apparatus of the present invention.
  • the present invention is also a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
  • the substrate surface is divided into two or more exposure regions, the alignment film in one of the exposure regions is exposed with light transmitted through the photomask, and the alignment film in the other of the exposure regions is exposed with light reflected from the photomask.
  • the exposure area is, for example, one picture element divided into half picture elements, one half picture element having a constant orientation direction, and the other half picture element having a constant orientation direction different from the orientation direction.
  • one half picture element is used as one exposure area
  • the other half picture element is used as another exposure area.
  • the orientation of the alignment film is different for each exposure region, which improves the viewing angle of the liquid crystal display panel.
  • the exposure step irradiates light to the main surface of the photomask from an oblique direction with respect to the normal line of the main surface of the substrate to perform transmission and reflection.
  • Other configurations of the above-described photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention may be set as appropriate, and are not particularly limited as long as the effects of the present invention are not impaired.
  • the photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention not only reduce running costs and equipment, but also mask operation control because the number of scan exposures is halved in some cases. It will also help to reduce the risk of defects due to mistakes. Further, in the conventional exposure apparatus, since about half of the photomask area is shielded, a great deal of energy from the light source is wasted, but in the present invention, substantially all of the light from the light source is used. Efficient use of energy becomes possible. Note that the present invention only needs to exhibit an effect of either sufficiently reducing the running cost or reducing the equipment.
  • the running cost can be sufficiently reduced and the equipment can be reduced.
  • the production process of the liquid crystal display panel is made more efficient, and as a result, the reduction in the number of processes also contributes to higher quality.
  • FIG. 2 is a schematic plan view of a photomask according to Embodiment 1.
  • FIG. It is a cross-sectional schematic diagram which shows the usage pattern of the photomask which concerns on Embodiment 1.
  • FIG. 1 is a schematic diagram showing an exposure apparatus according to Embodiment 1.
  • FIG. 2 is a schematic plan view of a TFT substrate observed by a CCD camera of the exposure apparatus according to Embodiment 1.
  • FIG. It is a schematic diagram which shows the exposure process of the exposure apparatus which concerns on Embodiment 1.
  • FIG. It is a plane schematic diagram of a conventional photomask. It is a schematic diagram which shows the exposure process of the conventional exposure apparatus.
  • the substrate on which the thin film transistor element (TFT) is arranged is also referred to as a TFT substrate.
  • the substrate on which the color filter (CF) is disposed is also referred to as a CF substrate.
  • FIG. 1 is a schematic plan view of a photomask according to the first embodiment.
  • a light reflecting portion (reflecting portion 17) is provided in a portion between the transmitting portion 15 and the transmitting portion 15 (a light shielding portion in the conventional photomask), and the transmitting portion 15 and the reflecting portion are reflected.
  • the portions 17 are provided alternately.
  • the length of the transmission part 15 and the length of the reflection part 17 (the horizontal length shown in FIG. 1) are substantially the same, and the width of the transmission part 15 and the width of the reflection part 17 (FIG. 1).
  • the vertical length shown in FIG. For example, a film having a high light reflectivity can be applied to the reflecting portion 17.
  • an aluminum film or the like is preferably applied.
  • One important item in the alignment division of the alignment film is to reverse the light irradiation angle for each half-pixel.
  • the photomask 11 of Embodiment 1 decomposes the irradiation direction of light from a light source into two directions in an exposure process for orientation division by adding a light reflection function to a conventional light shielding portion. Thereby, the process of changing the direction of irradiation, which is the cause of enlarging the exposure equipment for the alignment film, can be performed at a time.
  • a light shielding portion 13 is provided at the edge of the photomask 11.
  • FIG. 2 is a schematic cross-sectional view showing a usage pattern of the photomask according to the first embodiment.
  • FIG. 3 is a schematic diagram showing the exposure apparatus according to the first embodiment.
  • the exposure apparatus according to Embodiment 1 is composed of two exposure stage units and a transfer stage unit therebetween, and FIG. 3 shows a part thereof.
  • Each exposure stage unit is provided with a plurality of heads. Although the number of heads varies depending on the substrate size, an exposure light source 31 (exposure head unit), a photomask 11, a follow-up CCD (charge-coupled device) camera 41, and the like are installed in each head.
  • the photomask 11 is arranged so that its main surface is substantially perpendicular to the substrate surface subjected to exposure.
  • an image detection light source 61 (also referred to as a follow-up light source) is provided on the back surface of the substrate 30 (opposite to the exposure light source 31 when viewed from the substrate), and light from the image detection light source 61 is transmitted. It passes through the substrate 30, passes through the photomask 11 through a mirror, and reaches the CCD camera 41.
  • the CCD camera 41 for fine adjustment of the photomask is usually arranged in this way, for example, since it can look into the slit of the photomask when it is perpendicular to the photomask. In addition, as long as the CCD camera 41 can capture the pattern edge of the substrate 30 and recognize the edge of the photomask 11, other forms than this form can be adopted as appropriate.
  • the substrate 30 is transferred by the stage unit 71.
  • the exposure light source 31 (irradiation direction of the ultraviolet rays 21) and the photomask 11 are fixed, and the ultraviolet rays are accurately emitted by causing the photomask 11 to follow the substrate 30 that travels. Irradiate.
  • the tracking operation an arbitrary pattern image on the substrate 30 is set in advance, the tracking pattern provided on the photomask 11 is monitored by the CCD camera 41, and the distance between the two pattern edges is always constant. Thus, the photomask 11 is always finely adjusted.
  • the CCD camera 41 installed in the exposure apparatus according to the first embodiment captures the pattern edge of the substrate 30, and simultaneously recognizes the edge of the photomask 11, and finely holds the photomask 11 so as to keep the distance between them constant. Adjust the exposure position accuracy by adjusting.
  • fine adjustment is performed by the control unit 51 including an image processing circuit. Then, exposure is performed by the exposure light source 31 while finely adjusting the photomask 11.
  • FIG. 4 is a schematic plan view of the TFT substrate observed with the CCD camera of the exposure apparatus according to the first embodiment.
  • the dotted line indicates the traced pattern edge of the captured photomask.
  • a linear or substantially linear (close to a straight line) pattern on the substrate is set as a follow-up pattern, and a slit on the photomask side (actually, a mask pattern) Appear in the image as follows). That is, follow-up exposure is possible if there is a certain linear or substantially linear pattern on the substrate surface.
  • FIG. 5 is a schematic diagram showing an exposure process of the exposure apparatus according to the first embodiment.
  • the transmitted ultraviolet light (transmitted light 23) is irradiated toward one of the exposure areas
  • the reflected light (reflected light 25) is irradiated toward the other of the exposure areas.
  • the exposure region can be adjusted as appropriate by adjusting the length and width of the transmissive and reflective portions of the photomask 11 and the irradiation direction of the ultraviolet rays from the light source.
  • the ultraviolet light from the light source can be decomposed into transmitted light for normal half-picture elements and reflected light for the remaining half-picture elements, and these can be irradiated to the alignment film at the same time.
  • the photomask 11 provided adjacent to the photomask 11 that transmits the transmitted light corresponding to the half-pixel is used.
  • the reflected light is radiated, whereby the areas exposed by the transmitted light and the areas exposed by the reflected light are alternately arranged for each half picture element.
  • the half-pixel refers to a substantially half region divided in the length direction or the width direction of a pixel indicating any one color, such as R (red), G (green), or B (blue).
  • the region where the transmitted light is irradiated by one photomask and the region where the reflected light is irradiated for each half picture element are substantially the same.
  • the transmitted light 23 and the reflected light 25 are alternately irradiated from the exposure light source 31a through the photomask 11, and a striped portion is generated. In between, the transmitted light 23 and the reflected light 25 are irradiated from the exposure light source 31b through the photomask 11 in the next exposure stage unit 71b. Further, the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the first exposure stage and the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the next exposure stage are shaped and large. Are substantially the same. In the first embodiment, ultraviolet light that is light normally used for photo-alignment is used. However, as long as the effect of the present invention is exhibited, light in other wavelength regions can be used. In the first embodiment, the substrate 30 is transported along the substrate flow 81.
  • the installation direction of the photomask is made substantially perpendicular to the main surface of the substrate, and the photomask itself is formed with an ultraviolet reflecting film layer such as aluminum on the conventional light shielding portion, so that 2 in one scanning operation.
  • an ultraviolet reflecting film layer such as aluminum on the conventional light shielding portion, so that 2 in one scanning operation.
  • ultraviolet irradiation in the direction.
  • the photomask perpendicular to the substrate, ultraviolet rays are transmitted from the transmission part and directly irradiated onto the substrate.
  • the ultraviolet light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position that is exactly half a pixel apart from the transmitting portion, and a method for manufacturing a liquid crystal display device that performs alignment division of the alignment film The purpose of alignment film exposure is satisfied.
  • substantially vertical may be substantially vertical to such an extent that it can be said that the preferred effect of the present embodiment is exhibited.
  • Comparative Example 1 Using a conventional photomask (shown in FIG. 6) instead of the photomask according to Example 1, the exposure process was performed using four exposure stages 171a, 171b, 171c, and 171d as shown in FIG.
  • an exposure lamp means an alignment film exposure lamp
  • a follow-up lamp means an image detection lamp for follow-up.
  • H in “1000H” and “2000H” means a unit (hour) of the average life of the lamp.
  • Numberer of sheets / model means the number of photomasks required for each exposure apparatus.
  • the “Effect” column shows the running cost reduction rate.
  • Embodiment 1 The facility installation area and facility cost in Embodiment 1 and Comparative Example 1 are shown in Table 2 below.
  • “Effect” means the reduction ratio of “Equipment Installation Area” and “Equipment Cost”.
  • the running cost including the photomask and the installation area of the equipment can be reduced by about 50%, and the equipment cost can be expected to be reduced by about 33% compared to the conventional case. .

Abstract

Provided are a photomask, an exposure device, and a method for producing a liquid crystal display panel, such that it is possible to reduce running cost and the size of a facility. Specifically, disclosed is a photomask used for exposing an alignment film at each exposure region on a substrate surface, wherein the photomask transmits and reflects the light that entered from the main surface of the photomask, irradiates one side of the exposure region with the transmitted light, and irradiates the other side of the exposure region with the reflected light.

Description

フォトマスク、露光装置及び液晶表示パネルの製造方法Photomask, exposure apparatus, and liquid crystal display panel manufacturing method
本発明は、フォトマスク、露光装置及び液晶表示パネルの製造方法に関する。より詳しくは、配向膜による配向分割のために用いられるフォトマスク、露光装置及び液晶表示パネルの製造方法に関するものである。 The present invention relates to a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel. More particularly, the present invention relates to a photomask used for alignment division by an alignment film, an exposure apparatus, and a method for manufacturing a liquid crystal display panel.
フォトマスクは、基板上の感光性樹脂層を露光するために用いられ、種々の電子部材の製造に活用されている。特に、液晶表示パネルを製造するための光配向法による配向膜露光において広く用いられている。配向膜露光プロセスは、液晶分子の配向方向を制御し、規制する配向膜を形成するための重要なプロセスであり、これによって視野角に優れた液晶表示パネルの製造が可能となる。例えば、フォトマスクを透過させて所定の方向から光を照射することにより配向膜に液晶分子の配向規制力を与え、更に、次工程において配向膜の光照射を異なる方向から選択的に行うことにより、配向膜の配向分割を行う手法が用いられている。 A photomask is used for exposing a photosensitive resin layer on a substrate, and is used for manufacturing various electronic members. In particular, it is widely used in alignment film exposure by a photo-alignment method for manufacturing a liquid crystal display panel. The alignment film exposure process is an important process for forming an alignment film that controls and regulates the alignment direction of the liquid crystal molecules, and this makes it possible to manufacture a liquid crystal display panel having an excellent viewing angle. For example, by applying light from a predetermined direction through a photomask, the alignment film is given an alignment regulating force for liquid crystal molecules, and in the next step, the alignment film is selectively irradiated from different directions. A method of performing alignment division of the alignment film is used.
従来の液晶表示装置の製造方法としては、液晶を挟持する少なくとも一方が透明の１対の基板を有し、各基板上に液晶分子の配向方向を規制する配向膜が設けられた液晶表示装置を製造する方法であり、光学マスクを通して紫外線を照射することにより該配向膜に液晶分子の配向規制力を与え、且つ該配向膜の紫外線照射を異なる方向から、選択的に行い、それにより配向膜の配向分割を行うことを含む液晶表示装置の製造方法であって、遮光パターン面に金属－誘電体多層膜が設けられた光学マスクを使用し、該多層膜は、特定の入射角の紫外線を透過するように最適化されていることを特徴とする液晶表示装置の製造方法が開示されている（例えば、特許文献１参照）。
この製造方法は、配向分割を行う際に、重複露光領域の範囲を狭くすることによって配向分割を最適化し、配向膜の安定な配向を可能とすることを課題としたものである。 As a conventional method for manufacturing a liquid crystal display device, there is provided a liquid crystal display device in which at least one holding a liquid crystal has a pair of transparent substrates, and an alignment film for regulating the alignment direction of liquid crystal molecules is provided on each substrate. This is a method of manufacturing, and by applying ultraviolet rays through an optical mask, the alignment film is given an alignment regulating force of liquid crystal molecules, and the alignment film is selectively irradiated with ultraviolet rays from different directions, whereby the alignment film A method for manufacturing a liquid crystal display device including performing alignment division, wherein an optical mask having a light-shielding pattern surface provided with a metal-dielectric multilayer film is used, and the multilayer film transmits ultraviolet rays having a specific incident angle. A method of manufacturing a liquid crystal display device characterized by being optimized is disclosed (for example, see Patent Document 1).
An object of this manufacturing method is to optimize the alignment division by narrowing the range of the overlapped exposure region when performing the alignment division, thereby enabling stable alignment of the alignment film.
特開２００３－１６１９４６号公報JP 2003-161946 A
上述したような配向膜露光装置においては、フォトマスクのランニングコストを抑えるため小型フォトマスクを複数枚繋ぎ合わすスキャン露光方法が主流となっている。フォトマスクが小型であるため、通常は数回に分けて紫外線等の光を照射することになる。露光工程数が多くなると、それに伴い露光ステージも多くなる。 In the alignment film exposure apparatus as described above, a scanning exposure method in which a plurality of small photomasks are connected to reduce the running cost of the photomask. Since the photomask is small, it is usually irradiated with light such as ultraviolet rays in several times. As the number of exposure steps increases, the number of exposure stages increases accordingly.
従来の液晶表示装置の製造方法においては、基板主面に対してその主面が平行となるように設置されるフォトマスクを透過させて基板主面に紫外線を照射することが行われている。図６は、従来のフォトマスク１１１の平面模式図である。遮光部１１３と透過部１１５が設けられ、透過部１１５を透過した光によって例えば半絵素幅毎に露光を行うことができるようになっている。しかしながら、配向膜の配向分割を行うためには、更に露光プロセスを設けて基板主面に対して異なる方向から紫外線を照射することになる。 In a conventional method for manufacturing a liquid crystal display device, the main surface of a substrate is irradiated with ultraviolet rays through a photomask that is installed so that the main surface is parallel to the main surface of the substrate. FIG. 6 is a schematic plan view of a conventional photomask 111. A light shielding unit 113 and a transmission unit 115 are provided, and exposure can be performed, for example, for each half-pixel width by light transmitted through the transmission unit 115. However, in order to perform alignment division of the alignment film, an exposure process is further provided to irradiate the substrate main surface with ultraviolet rays from different directions.
すなわち、露光プロセスは各々の光照射方向に分別し、また小型マスクを複数枚使用し露光することになる。例えば、露光前の配向膜が形成された基板全体を複数の小型マスクによって複数回に分けて露光する工程において、更に２以上の異なる方向から光照射を行って配向分割処理をする場合、基板全体を複数回に分けるのに最低で２回、更に少なくとも２つの異なる方向から露光することから、最低でも４つの露光ステージが必要となる。通常、スループットを確保するため、露光ステージの間には露光前準備をするための搬送ステージが設けられ、設備全体としては巨大なものとなってしまう。 That is, the exposure process is classified in each light irradiation direction, and exposure is performed using a plurality of small masks. For example, in the step of exposing the entire substrate on which the alignment film before exposure is formed in a plurality of times using a plurality of small masks, when the alignment division processing is performed by performing light irradiation from two or more different directions, the entire substrate Since the exposure is performed at least two times and at least two different directions in order to divide the plurality of times into a plurality of times, at least four exposure stages are required. Usually, in order to ensure throughput, a transfer stage for preparing for pre-exposure is provided between the exposure stages, and the entire facility becomes huge.
このような従来の露光装置の露光プロセスを概念的に図示したのが図７である。この図７においては、配向分割のための配向膜露光工程が、４つのステージとそれらを繋ぐ搬送ステージで構成されていることが示されている。具体的には、４つのステージ部１７１ａ、１７１ｂ、１７１ｃ、１７１ｄで構成されており、基板１３０は基板の流れ１８１に沿って進行する。前半（ステージ部１７１ａ、１７１ｂ）で露光用光源（露光する光を照射する光源）１３１ａ、１３１ｂから照射する光（紫外線１２１）と後半（ステージ部１７１ｃ、１７１ｄ）で露光用光源１３１ｃ、１３１ｄから照射する紫外線１２１との傾き方向は異なるものである。光配向法においては、照射方向の異なる光を照射することにより、液晶に異なるチルトの付与が可能となる。なお、フォトマスク１１１の主面は露光に供される基板１３０の主面に対して平行となっており、該フォトマスク１１１が露光用光源からの照射光を透過することで半絵素幅毎の露光を行っている。 FIG. 7 conceptually shows the exposure process of such a conventional exposure apparatus. FIG. 7 shows that the alignment film exposure process for alignment division is composed of four stages and a transport stage connecting them. Specifically, it is composed of four stage portions 171a, 171b, 171c, and 171d, and the substrate 130 advances along the substrate flow 181. Light (ultraviolet light 121) emitted from exposure light sources (light sources for irradiating light to be exposed) 131a and 131b in the first half ( stage portions 171a and 171b) and light from exposure light sources 131c and 131d in the second half ( stage portions 171c and 171d) The direction of inclination with the ultraviolet ray 121 is different. In the photo-alignment method, different tilts can be imparted to the liquid crystal by irradiating light with different irradiation directions. Note that the main surface of the photomask 111 is parallel to the main surface of the substrate 130 to be exposed, and the photomask 111 transmits the irradiation light from the exposure light source for each half-pixel width. Exposure.
このように、従来の露光装置は設置スペースが大きくなり、各ステージに複数のフォトマスク、高圧水銀ランプ等、高額な消耗品が設けられ、特に、フォトマスクについては通常機種毎に異なるものを用いるため、設備費用、ランニングコストの増大に繋がっている。すなわち、各露光ステージに複数の光源（露光用光源及び追従用光源）、フォトマスクが必要となる為、装置全体のランニングコストとしては膨大な額となってしまう。従来の露光装置及び液晶表示装置の製造方法においては、このように生産工程の効率化、生産スペースなどの点で大きな課題を有するものであった。 As described above, the conventional exposure apparatus has a large installation space, and each stage is provided with expensive consumables such as a plurality of photomasks and high-pressure mercury lamps, and in particular, a photomask that is different for each normal model is used. Therefore, it leads to an increase in equipment cost and running cost. That is, since a plurality of light sources (exposure light source and tracking light source) and a photomask are required for each exposure stage, the running cost of the entire apparatus is enormous. In the conventional exposure apparatus and liquid crystal display manufacturing method, there are significant problems in terms of efficiency of the production process and production space.
本発明は、上記現状に鑑みてなされたものであり、ランニングコストを削減したり、設備を縮小化したりすることができるフォトマスク、露光装置及び液晶表示パネルの製造方法を提供することを目的とするものである。 The present invention has been made in view of the above-described present situation, and an object thereof is to provide a photomask, an exposure apparatus, and a method for manufacturing a liquid crystal display panel that can reduce running costs and equipment. To do.
本発明者は、配向膜露光プロセスに用いられるフォトマスク（露光マスク）、それを用いた露光装置及び液晶表示パネルの製造方法について種々検討したところ、従来のフォトマスクが透過部と遮光部とによって構成され、光源からフォトマスクに入射した光が透過部を通って基板上の配向膜に照射されることになる一方で、遮光部によって一部の入射光が遮光されるというフォトマスクの形態に着目した。そして、フォトマスクの遮光部に反射部として光反射膜層を形成することで、１回の光源からの光照射により２方向の光の照射を可能とし、これまで別々の方向から複数回光照射せざるを得なかった工程を１回の照射で済ますことができ、省略できることを見いだし、上記課題をみごとに解決することができることに想到した。また、フォトマスクの基板に対する設置方向についても従来の基板主面に対して平行とは異なり、基板主面に対して略垂直（基板の法線方向）となるようにすれば、透過部からは光が透過され直接基板に照射される一方、残りの反射部で反射された光は、透過部と略半絵素分ずれた位置に前者と反対方向から照射されることになり、露光プロセス、特に配向分割における配向膜露光の目的を満足することを見いだし、本発明に到達したものである。 The present inventor conducted various studies on a photomask (exposure mask) used in the alignment film exposure process, an exposure apparatus using the photomask, and a method for manufacturing a liquid crystal display panel. The conventional photomask is divided into a transmission part and a light shielding part. The photomask is configured such that light incident on the photomask from the light source is irradiated to the alignment film on the substrate through the transmission part, while part of the incident light is shielded by the light shielding part. Pay attention. Then, by forming a light reflection film layer as a reflection part on the light shielding part of the photomask, it is possible to irradiate light in two directions by irradiating light from one light source. The process that had to be performed can be completed by one irradiation, and it was found that it can be omitted, and the inventors have conceived that the above problems can be solved brilliantly. Also, the direction of installation of the photomask with respect to the substrate is different from that of the conventional substrate main surface, and is substantially perpendicular to the substrate main surface (normal direction of the substrate). While the light is transmitted and directly irradiated onto the substrate, the light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position shifted by approximately half a pixel from the transmitting portion. In particular, it has been found that the purpose of alignment film exposure in alignment division is satisfied, and the present invention has been achieved.
すなわち、本発明は、基板面内の露光領域毎に配向膜を露光するのに用いられるフォトマスクであって、上記フォトマスクは、フォトマスクの主面に入射する光に対して透過と反射とを行うものであり、透過した光を露光領域の一方に向けて照射し、反射した光を露光領域の他方に向けて照射することを特徴とするフォトマスクである。 That is, the present invention is a photomask used to expose an alignment film for each exposure region in the substrate surface, and the photomask transmits and reflects light incident on the main surface of the photomask. The photomask is characterized in that the transmitted light is irradiated toward one of the exposure regions and the reflected light is irradiated toward the other of the exposure regions.
従来のフォトマスクでは配向分割するために別々の方向から光照射しなければならず、その分だけ露光工程数が多くなっていたが、本発明のフォトマスクを用いると、露光プロセスにおいて露光用光源からの光の照射方向を２方向に分解することができ、上述したように、これまで基板面に対して異なる方向から光照射せざるを得なかった工程を省略することができる。その結果、露光ステージ数を削減し、これによって露光ステージにおけるランニングコストを大幅に削減したり、露光ステージ間の搬送ステージの削減による設備費用の縮小を実現したりすることが可能となる。 In conventional photomasks, light must be irradiated from different directions in order to divide the alignment, and the number of exposure steps is increased accordingly. However, when the photomask of the present invention is used, an exposure light source is used in the exposure process. The irradiation direction of light from can be decomposed into two directions, and as described above, it is possible to omit a process that has so far had to be irradiated with light from different directions with respect to the substrate surface. As a result, it is possible to reduce the number of exposure stages, thereby significantly reducing the running cost in the exposure stages and reducing the equipment cost by reducing the transfer stage between the exposure stages.
本発明のフォトマスクは、フォトマスクの一部が透過部であり、他の一部が反射部によって構成されることになるが、通常では遮光部を有し、例えば、透過部と反射部の周囲やフォトマスクの端の部分に遮光部を有することになる。透過部は、１つのフォトマスク内に複数に分割して形成されることが好ましく、通常では、スリット状の複数の透過部が一定方向、一定間隔で配列された形態となっている。反射部は、配向膜に配向性を与え得るように光反射する部材で構成されていればよく、アルミ膜等の光反射率が高い金属膜等によって光反射層を構成することが好ましい。このようなフォトマスクの好ましい形態としては、図１に示されるように、スリット形状の複数の透過部が所定方向（一定方向）、所定間隔（一定間隔）で配列され、該複数の透過部間に透過部と略同一形状の複数の反射部が所定方向（一定方向）、所定間隔（一定間隔）で配列され、スリット状の透過部の短軸辺及び反射部の短軸辺が並んだ辺に沿ったフォトマスクの両端部が遮光部となっている形態が挙げられる。 In the photomask of the present invention, a part of the photomask is a transmission part and the other part is constituted by a reflection part. Usually, the photomask has a light-shielding part. A light-shielding portion is provided around the periphery and the edge of the photomask. The transmissive portion is preferably formed by being divided into a plurality of parts in one photomask, and usually has a form in which a plurality of slit-shaped transmissive portions are arranged at a constant direction and at a constant interval. The reflection part may be formed of a member that reflects light so that the alignment film can be oriented, and the light reflection layer is preferably formed of a metal film having a high light reflectance such as an aluminum film. As a preferred form of such a photomask, as shown in FIG. 1, a plurality of slit-shaped transmission parts are arranged in a predetermined direction (fixed direction) and at a predetermined interval (fixed interval), and between the plurality of transmission parts. A plurality of reflective portions having substantially the same shape as the transmissive portion are arranged in a predetermined direction (constant direction) and at a predetermined interval (constant interval), and the short axis side of the slit-shaped transmissive portion and the short axis side of the reflective portion are arranged side by side The both-ends of the photomask along the line form a light shielding part.
なお、本発明においては、フォトマスクの主面に入射する光に対して透過と反射とを行うことになる限り、上記のように透過部と反射部とを有し、透過と反射とをフォトマスク内の別々の領域で行う形態の他、光を透過すると同時に反射する部材でフォトマスクを構成し、透過と反射とをフォトマスク内の同じ領域で行う形態も挙げることができる。また、本発明のフォトマスクにおいて、一方向から入射した光は、通常では透過と反射とによって２方向に分解され、２方向に照射されることになり、このような形態が好ましいが、例えば、反射部の形状を一部変えることによって、更に多方向に照射されるようにしてもよい。光の入射についても、一方向から入射されるようにすることが好ましいが、多方向から入射されるようにしてもよい。 In the present invention, as long as the light incident on the main surface of the photomask is transmitted and reflected, it has the transmissive part and the reflective part as described above. In addition to the form performed in separate areas in the mask, a form in which a photomask is constituted by a member that transmits and reflects light at the same time, and transmission and reflection are performed in the same area in the photomask can be cited. In the photomask of the present invention, light incident from one direction is normally decomposed in two directions by transmission and reflection and irradiated in two directions, and such a form is preferable. You may make it irradiate in more directions by changing the shape of a reflection part partially. The light is preferably incident from one direction, but may be incident from multiple directions.
本発明のフォトマスクの好ましい形態の一つとして、その主面が露光に供される基板面に対して略垂直となるように配置して用いるものである形態が挙げられる。このような使用形態により、光の照射方向が基板主面の法線に対して略対称になるように２方向に分解することができる。これによって、基板上を露光装置によってスキャンする場合、１回のスキャン動作で２方向の光の照射を可能とし、配向分割工程においては、半絵素毎に光の照射角度を反転させることが可能となる。配向分割における露光設備巨大化の原因となっている照射の向きを変えるという工程を一度に実施できるところがポイントであり、従来のフォトマスクでは実現できなかった顕著な効果を得ることができる。
なお、上記のように、フォトマスクの主面が露光に供される基板面に対して略垂直となるように配置すれば、２方向に分解されて照射される光の基板面に対する角度が同等となり、配向分割を配向方向だけを変えて均一に行うという点で好ましいが、本発明のフォトマスクにおいては、フォトマスクの主面を基板面に対して斜め方向にする等の形態とすることを妨げるものではない。 One preferred form of the photomask of the present invention is a form in which the main surface is arranged and used so as to be substantially perpendicular to the substrate surface subjected to exposure. With such a usage pattern, the light irradiation direction can be decomposed in two directions so as to be substantially symmetric with respect to the normal line of the substrate main surface. As a result, when the substrate is scanned by the exposure apparatus, it is possible to irradiate light in two directions with one scanning operation, and in the alignment division process, the light irradiation angle can be reversed for each half-pixel. It becomes. The point is that the process of changing the direction of irradiation, which is the cause of the enlargement of the exposure equipment in the alignment division, can be performed at one time, and a remarkable effect that cannot be realized with a conventional photomask can be obtained.
As described above, if the photomask main surface is arranged so as to be substantially perpendicular to the substrate surface to be exposed, the angle of light decomposed in two directions and irradiated to the substrate surface is the same. However, in the photomask of the present invention, it is preferable that the main surface of the photomask is inclined with respect to the substrate surface. It does not prevent it.
本発明はまた、本発明のフォトマスク及び配向膜を露光する光を照射する光源を備える露光装置でもある。
上記露光装置の好ましい形態としては、小型フォトマスクを複数枚繋ぎ合わすスキャン露光方法を行う形態であり、通常では、基板全体を露光するために数回に分けて、露光前の配向膜が形成された基板上に向けて所定方向から紫外線等の光を照射することになる。本発明の露光装置は、１回の露光操作で実質的に２回の露光を行うことを可能とし、特に、１つの絵素内の配向膜を複数の配向方向に分割する配向分割露光プロセスにおいて、生産工程の効率化と生産スペースの縮小とを実現できるものである。 This invention is also an exposure apparatus provided with the light source which irradiates the light which exposes the photomask and alignment film of this invention.
A preferred form of the above exposure apparatus is a form in which a scan exposure method is performed in which a plurality of small photomasks are joined together. Usually, an alignment film before exposure is formed in several steps to expose the entire substrate. Then, light such as ultraviolet rays is irradiated from a predetermined direction toward the substrate. The exposure apparatus of the present invention makes it possible to perform substantially two exposures in one exposure operation, and particularly in an alignment division exposure process in which an alignment film in one pixel is divided into a plurality of alignment directions. Therefore, the production process can be made more efficient and the production space can be reduced.
本発明は更に、一対の基板、基板間に設けられた液晶層及び基板の少なくとも一方の液晶層側の表面に設けられた配向膜を備える液晶表示パネルを製造するための方法であって、上記製造方法は、本発明の露光装置を用いて配向膜を露光する工程を含む液晶表示パネルの製造方法である。 The present invention further provides a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate, The manufacturing method is a method for manufacturing a liquid crystal display panel including a step of exposing the alignment film using the exposure apparatus of the present invention.
本発明はそして、一対の基板、基板間に設けられた液晶層及び基板の少なくとも一方の液晶層側の表面に設けられた配向膜を備える液晶表示パネルを製造するための方法であって、上記製造方法は、基板面内を２以上の露光領域に分割し、フォトマスクを透過した光によって露光領域の一方における配向膜を露光し、フォトマスクを反射した光によって露光領域の他方における配向膜を露光する露光工程を含む液晶表示パネルの製造方法でもある。これら本発明の液晶表示パネルの製造方法によって、上述したようにランニングコストが削減され、設備の縮小化を可能とする製造方法とすることができる。上記露光領域とは、例えば、１つの絵素が半絵素毎に区切られ、一方の半絵素が一定の配向方向となり、他方の半絵素が前記配向方向とは異なる一定の配向方向となる場合、一方の半絵素を１つの露光領域とし、他方の半絵素をもう１つの露光領域とすることになる。露光領域毎に配向膜の配向が異なり、これにより液晶表示パネルの視野角が改善されることとなる。上記液晶表示パネルの製造方法の好ましい形態としては、上記露光工程が基板主面の法線に対して斜め方向から光をフォトマスク主面に照射して透過と反射とを行う形態が挙げられる。
上述した本発明のフォトマスク、露光装置及び液晶表示パネルの製造方法のその他の構成は適宜設定すればよく、本発明の効果を阻害しない限り特に限定されるものではない。 The present invention is also a method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate, In the manufacturing method, the substrate surface is divided into two or more exposure regions, the alignment film in one of the exposure regions is exposed with light transmitted through the photomask, and the alignment film in the other of the exposure regions is exposed with light reflected from the photomask. It is also a manufacturing method of a liquid crystal display panel including an exposure step of exposing. By these liquid crystal display panel manufacturing methods of the present invention, the running cost can be reduced as described above, and the manufacturing method can be reduced. The exposure area is, for example, one picture element divided into half picture elements, one half picture element having a constant orientation direction, and the other half picture element having a constant orientation direction different from the orientation direction. In this case, one half picture element is used as one exposure area, and the other half picture element is used as another exposure area. The orientation of the alignment film is different for each exposure region, which improves the viewing angle of the liquid crystal display panel. As a preferable form of the method for manufacturing the liquid crystal display panel, there is a form in which the exposure step irradiates light to the main surface of the photomask from an oblique direction with respect to the normal line of the main surface of the substrate to perform transmission and reflection.
Other configurations of the above-described photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention may be set as appropriate, and are not particularly limited as long as the effects of the present invention are not impaired.
本発明のフォトマスク、露光装置及び液晶表示パネルの製造方法は、ランニングコストを削減したり設備を縮小化したりするだけでなく、場合に応じて、スキャン露光の回数が半減されるためマスク動作制御ミスによる不良発生のリスクを抑えることにも繋がる。また従来の露光装置では、フォトマスク面積の約半分を遮光しているため、光源からの多大なエネルギーが無駄になっていたが、本発明では光源からの光を実質的に全て利用することでエネルギーの効率的な利用が可能となる。なお、本発明は、ランニングコストを充分に削減するか、設備を縮小化するかのいずれかの効果を発揮するものであればよい。 The photomask, exposure apparatus, and liquid crystal display panel manufacturing method of the present invention not only reduce running costs and equipment, but also mask operation control because the number of scan exposures is halved in some cases. It will also help to reduce the risk of defects due to mistakes. Further, in the conventional exposure apparatus, since about half of the photomask area is shielded, a great deal of energy from the light source is wasted, but in the present invention, substantially all of the light from the light source is used. Efficient use of energy becomes possible. Note that the present invention only needs to exhibit an effect of either sufficiently reducing the running cost or reducing the equipment.
上述した各形態は、本発明の要旨を逸脱しない範囲において適宜組み合わされてもよい。 Each form mentioned above may be combined suitably in the range which does not deviate from the gist of the present invention.
本発明のフォトマスク、露光装置及び液晶表示パネルの製造方法によれば、ランニングコストを充分に削減したり、設備を縮小化したりすることができる。これによって、液晶表示パネルの生産工程を効率化し、その結果、工程数の削減が高品質化にも資することになる。 According to the photomask, the exposure apparatus, and the liquid crystal display panel manufacturing method of the present invention, the running cost can be sufficiently reduced and the equipment can be reduced. As a result, the production process of the liquid crystal display panel is made more efficient, and as a result, the reduction in the number of processes also contributes to higher quality.
実施形態１に係るフォトマスクの平面模式図である。2 is a schematic plan view of a photomask according to Embodiment 1. FIG. 実施形態１に係るフォトマスクの使用形態を示す断面模式図である。It is a cross-sectional schematic diagram which shows the usage pattern of the photomask which concerns on Embodiment 1. FIG. 実施形態１に係る露光装置を示す模式図である。1 is a schematic diagram showing an exposure apparatus according to Embodiment 1. FIG. 実施形態１に係る露光装置のＣＣＤカメラで観測したＴＦＴ基板の平面模式図である。2 is a schematic plan view of a TFT substrate observed by a CCD camera of the exposure apparatus according to Embodiment 1. FIG. 実施形態１に係る露光装置の露光プロセスを示す模式図である。It is a schematic diagram which shows the exposure process of the exposure apparatus which concerns on Embodiment 1. FIG. 従来のフォトマスクの平面模式図である。It is a plane schematic diagram of a conventional photomask. 従来の露光装置の露光プロセスを示す模式図である。It is a schematic diagram which shows the exposure process of the conventional exposure apparatus.
実施形態において薄膜トランジスタ素子（ＴＦＴ）が配置される基板は、ＴＦＴ基板ともいう。
実施形態においてカラーフィルタ（ＣＦ）が配置される基板は、ＣＦ基板ともいう。
以下に実施形態を掲げ、本発明を図面を参照して更に詳細に説明するが、本発明はこれらの実施形態のみに限定されるものではない。 In the embodiment, the substrate on which the thin film transistor element (TFT) is arranged is also referred to as a TFT substrate.
In the embodiment, the substrate on which the color filter (CF) is disposed is also referred to as a CF substrate.
Embodiments will be described below, and the present invention will be described in more detail with reference to the drawings. However, the present invention is not limited only to these embodiments.
実施形態１
図１は、実施形態１に係るフォトマスクの平面模式図である。
実施形態１に係るフォトマスク１１においては、透過部１５と透過部１５との間の部分（従来のフォトマスクにおける遮光部）に光反射部（反射部１７）が設けられ、透過部１５と反射部１７とが交互に設けられている。実施形態１においては、透過部１５の長さと反射部１７の長さ（図１に示した横の長さ）とは略同一であり、透過部１５の幅と反射部１７の幅（図１に示した縦の長さ）もまた略同一である。反射部１７には、例えば光反射率の高い膜を貼ることにより形成することができ、例えばアルミニウム膜等を貼ることが好適である。配向膜の配向分割において重要な項目の１つは、半絵素毎に光の照射角度を反転させることである。実施形態１のフォトマスク１１は、従来の遮光部に光反射の機能を付与することにより、配向分割のための露光プロセスにおける光源からの光の照射方向を２方向に分解する。これにより、配向膜の露光設備が巨大化する原因となっている照射の向きを変えるという工程を一度に実施することができる。なお、フォトマスク１１の縁には遮光部１３が設けられている。 Embodiment 1
FIG. 1 is a schematic plan view of a photomask according to the first embodiment.
In the photomask 11 according to the first embodiment, a light reflecting portion (reflecting portion 17) is provided in a portion between the transmitting portion 15 and the transmitting portion 15 (a light shielding portion in the conventional photomask), and the transmitting portion 15 and the reflecting portion are reflected. The portions 17 are provided alternately. In the first embodiment, the length of the transmission part 15 and the length of the reflection part 17 (the horizontal length shown in FIG. 1) are substantially the same, and the width of the transmission part 15 and the width of the reflection part 17 (FIG. 1). The vertical length shown in FIG. For example, a film having a high light reflectivity can be applied to the reflecting portion 17. For example, an aluminum film or the like is preferably applied. One important item in the alignment division of the alignment film is to reverse the light irradiation angle for each half-pixel. The photomask 11 of Embodiment 1 decomposes the irradiation direction of light from a light source into two directions in an exposure process for orientation division by adding a light reflection function to a conventional light shielding portion. Thereby, the process of changing the direction of irradiation, which is the cause of enlarging the exposure equipment for the alignment film, can be performed at a time. A light shielding portion 13 is provided at the edge of the photomask 11.
図２は、実施形態１に係るフォトマスクの使用形態を示す断面模式図である。
上述したように加工したフォトマスク１１を基板３０の主面に対して略垂直となるように配置して用いることで、フォトマスク１１の主面に入射する紫外線２１に対して透過と反射とを行う。 FIG. 2 is a schematic cross-sectional view showing a usage pattern of the photomask according to the first embodiment.
By using the photomask 11 processed as described above so as to be substantially perpendicular to the main surface of the substrate 30, transmission and reflection with respect to the ultraviolet rays 21 incident on the main surface of the photomask 11 are achieved. Do.
図３は、実施形態１に係る露光装置を示す模式図である。
実施形態１に係る露光装置は、２つの露光ステージ部とその間の搬送ステージ部とから構成されており、図３はその一部を示す。各露光ステージ部に、複数のヘッドが設けられている。ヘッドの数は基板サイズによって異なるが、各ヘッドにそれぞれ露光用光源３１（露光ヘッド部）、フォトマスク１１及び追従用ＣＣＤ（ｃｈａｒｇｅ－ｃｏｕｐｌｅｄ　ｄｅｖｉｃｅ）カメラ４１等が設置される。フォトマスク１１は、その主面が露光に供される基板面に対して略垂直となるように配置されている。また実施形態１においては基板３０の背面（基板から見て露光用光源３１の反対側）に画像検出用光源６１（追従用光源ともいう。）が設けられ、画像検出用光源６１からの光が基板３０を通り、鏡を介してフォトマスク１１を通り、ＣＣＤカメラ４１に届く。フォトマスク微調整用のＣＣＤカメラ４１は、フォトマスクに垂直方向からであるとフォトマスクのスリットを覗くことができる点から、通常は、例えばこのように配置される。なお、ＣＣＤカメラ４１が基板３０のパターンエッジを捕捉でき、フォトマスク１１のエッジを認識できるものである限りこの形態以外の形態を適宜採用することができる。なお、ステージ部７１により基板３０が搬送される。 FIG. 3 is a schematic diagram showing the exposure apparatus according to the first embodiment.
The exposure apparatus according to Embodiment 1 is composed of two exposure stage units and a transfer stage unit therebetween, and FIG. 3 shows a part thereof. Each exposure stage unit is provided with a plurality of heads. Although the number of heads varies depending on the substrate size, an exposure light source 31 (exposure head unit), a photomask 11, a follow-up CCD (charge-coupled device) camera 41, and the like are installed in each head. The photomask 11 is arranged so that its main surface is substantially perpendicular to the substrate surface subjected to exposure. In the first embodiment, an image detection light source 61 (also referred to as a follow-up light source) is provided on the back surface of the substrate 30 (opposite to the exposure light source 31 when viewed from the substrate), and light from the image detection light source 61 is transmitted. It passes through the substrate 30, passes through the photomask 11 through a mirror, and reaches the CCD camera 41. The CCD camera 41 for fine adjustment of the photomask is usually arranged in this way, for example, since it can look into the slit of the photomask when it is perpendicular to the photomask. In addition, as long as the CCD camera 41 can capture the pattern edge of the substrate 30 and recognize the edge of the photomask 11, other forms than this form can be adopted as appropriate. The substrate 30 is transferred by the stage unit 71.
（配向膜露光装置の動作）
実施形態１に係る露光装置においては、露光用光源３１（紫外線２１の照射方向）及びフォトマスク１１が固定され、進行してくる基板３０に対してフォトマスク１１を追従させることで正確に紫外線を照射する。追従の動作は、基板３０の任意のパターン画像を予め設定しておき、フォトマスク１１に設けられている追従用パターンをＣＣＤカメラ４１で監視し、それら２つのパターンエッジの距離が常に一定となるようにフォトマスク１１を常時微調整するものである。 (Operation of alignment film exposure device)
In the exposure apparatus according to the first embodiment, the exposure light source 31 (irradiation direction of the ultraviolet rays 21) and the photomask 11 are fixed, and the ultraviolet rays are accurately emitted by causing the photomask 11 to follow the substrate 30 that travels. Irradiate. In the tracking operation, an arbitrary pattern image on the substrate 30 is set in advance, the tracking pattern provided on the photomask 11 is monitored by the CCD camera 41, and the distance between the two pattern edges is always constant. Thus, the photomask 11 is always finely adjusted.
（基板－フォトマスク追従）
実施形態１に係る露光装置に設置されているＣＣＤカメラ４１によって基板３０のパターンエッジを捕捉し、同時にフォトマスク１１のエッジを認識し、両者の距離を一定に保持するようにフォトマスク１１を微調整することで露光位置精度を保つ。実施形態１においては、微調整は画像処理回路を含む制御部５１にて行う。そして、フォトマスク１１の微調整をしながら露光用光源３１により露光を行う。 (Substrate-Photomask tracking)
The CCD camera 41 installed in the exposure apparatus according to the first embodiment captures the pattern edge of the substrate 30, and simultaneously recognizes the edge of the photomask 11, and finely holds the photomask 11 so as to keep the distance between them constant. Adjust the exposure position accuracy by adjusting. In the first embodiment, fine adjustment is performed by the control unit 51 including an image processing circuit. Then, exposure is performed by the exposure light source 31 while finely adjusting the photomask 11.
図４は、実施形態１に係る露光装置のＣＣＤカメラで観測したＴＦＴ基板の平面模式図である。点線は、捕捉されたフォトマスクの追従用パターンエッジを示す。なお、ＣＦ基板であっても同様にしてフォトマスク１１を常時微調整しながら露光用光源により露光を行うことができる。ＴＦＴ基板又はＣＦ基板のいずれにおいても、該基板における直線又は略直線状の（直線に近い）パターンを追従パターンとして設定し、そのエッジを画像認識しながらそこにフォトマスク側のスリット（実際はマスクパターンとして画像に現れる）を追従させることになる。すなわち、基板面に何らかの直線又は略直線状のパターンがあれば追従露光が可能である。 FIG. 4 is a schematic plan view of the TFT substrate observed with the CCD camera of the exposure apparatus according to the first embodiment. The dotted line indicates the traced pattern edge of the captured photomask. Even in the case of a CF substrate, exposure can be performed with an exposure light source while finely adjusting the photomask 11 in the same manner. In either the TFT substrate or the CF substrate, a linear or substantially linear (close to a straight line) pattern on the substrate is set as a follow-up pattern, and a slit on the photomask side (actually, a mask pattern) Appear in the image as follows). That is, follow-up exposure is possible if there is a certain linear or substantially linear pattern on the substrate surface.
図５は、実施形態１に係る露光装置の露光プロセスを示す模式図である。
図５に示されるように、透過した紫外線（透過光２３）を露光領域の一方に向けて照射し、反射した光（反射光２５）を露光領域の他方に向けて照射する。例えば、フォトマスク１１の透過部・反射部の長さ及び幅と光源からの紫外線の照射方向とを調整することにより、露光領域を適宜調整することができる。実施形態１においては、光源からの紫外線を通常の半絵素分の透過光と残りの半絵素分の反射光とに分解し、これらを同時に配向膜に照射することができる。なお、半絵素分の透過光が照射された露光領域に隣接する露光領域には、該半絵素分の透過光を透過したフォトマスク１１に隣接して設けられているフォトマスク１１からの反射光が照射され、これにより半絵素毎に透過光により露光された領域と反射光により露光された領域とが交互に配置されることになる。半絵素とは、例えばＲ（赤）、Ｇ（緑）又はＢ（青）等の、いずれかの単色を示す絵素の長さ方向又は幅方向で区切られた略半分の領域をいう。また、実施形態１においては、フォトマスク一つにより透過光が照射される領域と、反射光が半絵素ごとに照射される領域とは、略同一である。実施形態１においては、１回目の露光ステージ部７１ａにおいて、露光用光源３１ａからフォトマスク１１を介して透過光２３と反射光２５とが交互に照射されてストライプ状の部分が生じるが、該部分どうしの間に、次の露光ステージ部７１ｂで露光用光源３１ｂからフォトマスク１１を介して透過光２３と反射光２５とが照射される。また１回目の露光ステージで透過光２３と反射光２５とが照射されるストライプ状部分と次の露光ステージで透過光２３と反射光２５とが照射されるストライプ状部分とは、その形状・大きさが略同一である。なお、実施形態１では光配向に通常用いられる光である紫外線を用いているが、本発明の効果を発揮する限り、この他の波長領域の光を用いることが可能である。なお、実施形態１では、基板の流れ８１に沿って基板３０が搬送される。 FIG. 5 is a schematic diagram showing an exposure process of the exposure apparatus according to the first embodiment.
As shown in FIG. 5, the transmitted ultraviolet light (transmitted light 23) is irradiated toward one of the exposure areas, and the reflected light (reflected light 25) is irradiated toward the other of the exposure areas. For example, the exposure region can be adjusted as appropriate by adjusting the length and width of the transmissive and reflective portions of the photomask 11 and the irradiation direction of the ultraviolet rays from the light source. In the first embodiment, the ultraviolet light from the light source can be decomposed into transmitted light for normal half-picture elements and reflected light for the remaining half-picture elements, and these can be irradiated to the alignment film at the same time. In the exposure region adjacent to the exposure region irradiated with the transmitted light corresponding to the half-pixel, the photomask 11 provided adjacent to the photomask 11 that transmits the transmitted light corresponding to the half-pixel is used. The reflected light is radiated, whereby the areas exposed by the transmitted light and the areas exposed by the reflected light are alternately arranged for each half picture element. The half-pixel refers to a substantially half region divided in the length direction or the width direction of a pixel indicating any one color, such as R (red), G (green), or B (blue). In the first embodiment, the region where the transmitted light is irradiated by one photomask and the region where the reflected light is irradiated for each half picture element are substantially the same. In the first embodiment, in the first exposure stage portion 71a, the transmitted light 23 and the reflected light 25 are alternately irradiated from the exposure light source 31a through the photomask 11, and a striped portion is generated. In between, the transmitted light 23 and the reflected light 25 are irradiated from the exposure light source 31b through the photomask 11 in the next exposure stage unit 71b. Further, the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the first exposure stage and the stripe-shaped portion irradiated with the transmitted light 23 and the reflected light 25 in the next exposure stage are shaped and large. Are substantially the same. In the first embodiment, ultraviolet light that is light normally used for photo-alignment is used. However, as long as the effect of the present invention is exhibited, light in other wavelength regions can be used. In the first embodiment, the substrate 30 is transported along the substrate flow 81.
実施形態１はフォトマスクの設置方向を基板主面に対して略垂直にし、フォトマスク自体には従来の遮光部にアルミニウム等の紫外線反射膜層を形成することで、１回のスキャン動作で２方向の紫外線照射を可能とするものである。フォトマスクを基板に対し垂直に設置することにより、透過部からは紫外線が透過され直接基板に照射される。一方、残りの反射部で反射された紫外線は、透過部とちょうど半絵素分ずれた位置に前者と反対方向から照射されることになり、配向膜の配向分割を行う液晶表示装置の製造方法における配向膜露光の目的を満足する。なお、略垂直とは、本実施形態の好適な効果が発揮されると言える程度に実質的に垂直であればよい。 In the first embodiment, the installation direction of the photomask is made substantially perpendicular to the main surface of the substrate, and the photomask itself is formed with an ultraviolet reflecting film layer such as aluminum on the conventional light shielding portion, so that 2 in one scanning operation. This enables ultraviolet irradiation in the direction. By setting the photomask perpendicular to the substrate, ultraviolet rays are transmitted from the transmission part and directly irradiated onto the substrate. On the other hand, the ultraviolet light reflected by the remaining reflecting portion is irradiated from the opposite direction to the former at a position that is exactly half a pixel apart from the transmitting portion, and a method for manufacturing a liquid crystal display device that performs alignment division of the alignment film The purpose of alignment film exposure is satisfied. Note that “substantially vertical” may be substantially vertical to such an extent that it can be said that the preferred effect of the present embodiment is exhibited.
以上の結果、設備の縮小化及びランニングコスト削減が図れるだけでなく、スキャン露光の回数が半減されるためマスク動作制御ミスによる不良発生のリスクを抑えることにも繋がる。また現行処理では、フォトマスク面積の約半分を遮光している為、光源からの多大なエネルギーが無駄になっていたが、実施形態１では実質的に全ての紫外線を利用することでエネルギーの効率的な利用が可能となる。 As a result, not only can the equipment be reduced and the running cost can be reduced, but also the number of scan exposures can be halved, leading to a reduction in the risk of defects due to mask operation control errors. Further, in the current processing, since about half of the photomask area is shielded, a great deal of energy from the light source is wasted, but in the first embodiment, energy efficiency is obtained by using substantially all ultraviolet rays. Use is possible.
比較例１
実施例１に係るフォトマスクの代わりに従来のフォトマスク（図６に示したもの）を用いて図７に示したように４つの露光ステージ１７１ａ、１７１ｂ、１７１ｃ、１７１ｄにより露光工程を行った。 Comparative Example 1
Using a conventional photomask (shown in FIG. 6) instead of the photomask according to Example 1, the exposure process was performed using four exposure stages 171a, 171b, 171c, and 171d as shown in FIG.
実施形態１及び比較例１におけるランニングコスト削減効果を下記表１に示す。表１中、露光用ランプは、配向膜露光用のランプを意味し、追従用ランプは、追従のための画像検出用ランプを意味する。「１０００Ｈ」及び「２０００Ｈ」の「Ｈ」は、ランプの平均寿命の単位（時間）を意味する。「枚／機種」は、露光装置一つ当たりに必要となるフォトマスクの枚数を意味する。「効果」の欄には、ランニングコストの削減割合を示す。 The running cost reduction effect in Embodiment 1 and Comparative Example 1 is shown in Table 1 below. In Table 1, an exposure lamp means an alignment film exposure lamp, and a follow-up lamp means an image detection lamp for follow-up. “H” in “1000H” and “2000H” means a unit (hour) of the average life of the lamp. “Number of sheets / model” means the number of photomasks required for each exposure apparatus. The “Effect” column shows the running cost reduction rate.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
実施形態１及び比較例１における設備設置面積及び設備費用を下記表２に示す。下記表２中、「効果」は、「設備設置面積」及び「設備費用」の削減割合を意味する。 The facility installation area and facility cost in Embodiment 1 and Comparative Example 1 are shown in Table 2 below. In Table 2 below, “Effect” means the reduction ratio of “Equipment Installation Area” and “Equipment Cost”.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
実施形態１の形態の導入効果として、従来と比較しフォトマスクを含むランニングコスト及び設備設置面積については約５０％の削減をすることができ、設備費用は約３３％の削減を見込むことができる。 As an introduction effect of the form of the first embodiment, the running cost including the photomask and the installation area of the equipment can be reduced by about 50%, and the equipment cost can be expected to be reduced by about 33% compared to the conventional case. .
上述した実施形態における各形態は、本発明の要旨を逸脱しない範囲において適宜組み合わされてもよい。 Each form in embodiment mentioned above may be combined suitably in the range which does not deviate from the summary of this invention.
なお、本願は、２０１０年３月１２日に出願された日本国特許出願２０１０－０５６５７８号を基礎として、パリ条約ないし移行する国における法規に基づく優先権を主張するものである。該出願の内容は、その全体が本願中に参照として組み込まれている。 This application claims priority based on the Paris Convention or the laws and regulations in the country to which the transition is based on Japanese Patent Application No. 2010-056578 filed on March 12, 2010. The contents of the application are hereby incorporated by reference in their entirety.
１１、１１１：フォトマスク
１３、１１３：遮光部
１５、１１５：透過部
１７：反射部
２１、１２１：紫外線
２３：透過光
２５：反射光
３０、１３０：基板
３１、３１ａ、３１ｂ、１３１ａ、１３１ｂ、１３１ｃ、１３１ｄ、：露光用光源
４１：ＣＣＤカメラ
５１：制御部
６１：画像検出用光源
７１、７１ａ、７１ｂ、１７１ａ、１７１ｂ、１７１ｃ、１７１ｄ：ステージ部 
８１、１８１：基板の流れ 11, 111: Photomask 13, 113: Light shielding part 15, 115: Transmission part 17: Reflection part 21, 121: Ultraviolet light 23: Transmitted light 25: Reflected light 30, 130: Substrate 31, 31a, 31b, 131a, 131b, 131c, 131d: Light source for exposure 41: CCD camera 51: Control unit 61: Light source for image detection 71, 71a, 71b, 171a, 171b, 171c, 171d: Stage unit
81, 181: Flow of substrate

Claims (6)

  1. 基板面内の露光領域毎に配向膜を露光するのに用いられるフォトマスクであって、
    該フォトマスクは、フォトマスクの主面に入射する光に対して透過と反射とを行うものであり、透過した光を露光領域の一方に向けて照射し、反射した光を露光領域の他方に向けて照射することを特徴とするフォトマスク。     A photomask used to expose an alignment film for each exposure region in a substrate surface,
    The photomask transmits and reflects light incident on the main surface of the photomask, irradiates the transmitted light toward one of the exposure areas, and applies the reflected light to the other exposure area. A photomask characterized by irradiating toward.
  2. 前記フォトマスクは、その主面が露光に供される基板面に対して略垂直となるように配置して用いるものであることを特徴とする請求項１に記載のフォトマスク。 2. The photomask according to claim 1, wherein the photomask is used by being arranged so that a main surface thereof is substantially perpendicular to a substrate surface to be exposed.
  3. 請求項１又は２に記載のフォトマスク及び配向膜を露光する光を照射する光源を備えることを特徴とする露光装置。 An exposure apparatus comprising a light source for irradiating light for exposing the photomask and the alignment film according to claim 1.
  4. 一対の基板、基板間に設けられた液晶層及び基板の少なくとも一方の液晶層側の表面に設けられた配向膜を備える液晶表示パネルを製造するための方法であって、
    該製造方法は、請求項３に記載の露光装置を用いて配向膜を露光する工程を含むことを特徴とする液晶表示パネルの製造方法。     A method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
    The manufacturing method includes a step of exposing the alignment film using the exposure apparatus according to claim 3.
  5. 一対の基板、基板間に設けられた液晶層及び基板の少なくとも一方の液晶層側の表面に設けられた配向膜を備える液晶表示パネルを製造するための方法であって、
    該製造方法は、基板面内を２以上の露光領域に分割し、フォトマスクを透過した光によって露光領域の一方における配向膜を露光し、フォトマスクを反射した光によって露光領域の他方における配向膜を露光する露光工程を含むことを特徴とする液晶表示パネルの製造方法。     A method for producing a liquid crystal display panel comprising a pair of substrates, a liquid crystal layer provided between the substrates, and an alignment film provided on the surface of at least one liquid crystal layer of the substrate,
    The manufacturing method divides the substrate surface into two or more exposure regions, exposes the alignment film in one of the exposure regions with light transmitted through the photomask, and aligns the alignment film in the other of the exposure regions with light reflected from the photomask. The manufacturing method of the liquid crystal display panel characterized by including the exposure process which exposes.
  6. 前記露光工程は、基板主面の法線に対して斜め方向から光をフォトマスク主面に照射して透過と反射とを行うことを特徴とする請求項４又は５に記載の液晶表示パネルの製造方法。 6. The liquid crystal display panel according to claim 4, wherein the exposure step performs transmission and reflection by irradiating light on the photomask main surface from an oblique direction with respect to a normal line of the substrate main surface. Production method.
PCT/JP2011/053117 2010-03-12 2011-02-15 Photomask, exposure device, and method for producing liquid crystal display panel WO2011111479A1 (en)

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