WO2011099596A1 - Procédé de régénération d'une boue abrasive à base de cérium - Google Patents

Procédé de régénération d'une boue abrasive à base de cérium Download PDF

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Publication number
WO2011099596A1
WO2011099596A1 PCT/JP2011/052982 JP2011052982W WO2011099596A1 WO 2011099596 A1 WO2011099596 A1 WO 2011099596A1 JP 2011052982 W JP2011052982 W JP 2011052982W WO 2011099596 A1 WO2011099596 A1 WO 2011099596A1
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WIPO (PCT)
Prior art keywords
abrasive
cerium
acid
based abrasive
slurry
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PCT/JP2011/052982
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English (en)
Japanese (ja)
Inventor
純和 尾形
佳 大貫
克彦 林
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三井金属鉱業株式会社
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Application filed by 三井金属鉱業株式会社 filed Critical 三井金属鉱業株式会社
Priority to JP2011512740A priority Critical patent/JP5331200B2/ja
Priority to KR1020127021043A priority patent/KR101398904B1/ko
Publication of WO2011099596A1 publication Critical patent/WO2011099596A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Definitions

  • the present invention relates to a technology for regenerating a cerium-based abrasive from an abrasive scrap made from a waste abrasive slurry containing an used cerium-based abrasive or an abrasive waste.
  • Cerium-based abrasives are used for surface polishing of various types of glass such as optical lenses such as optical lenses, glass substrates for liquid crystal displays and plasma displays, glass substrates for recording media such as magnetic disks and optical disks, and glass substrates for photomasks. It is used.
  • Patent Document 1 a dispersant is added to a deteriorated cerium oxide abrasive suspension, the pH of the suspension is adjusted to 10.5 or higher, and the suspension is heated to a temperature of 50 ° C. or higher.
  • a method of reclaiming the system abrasive has been proposed.
  • the pH of the suspension is set to pH 10.5 or higher, the glass component silicon (Si) is not sufficiently dissolved.
  • the regeneration method of this Patent Document 1 cannot remove Ca and Mg, and these are not scratched. There is a tendency to become the cause.
  • Patent Document 2 the polishing waste liquid is subjected to an ultrafiltration membrane treatment using an ultrafiltration membrane, and then the concentrated liquid obtained from the ultrafiltration membrane treatment step is converted into a membrane having a larger pore size than the ultrafiltration membrane.
  • a method of performing a microfiltration process using a microfiltration membrane and recovering the abrasive from the permeate has been proposed.
  • This patent document 2 is intended to regenerate semiconductor CMP abrasives, and since the CMP abrasives are fine particles, the glass and the CMP abrasives can be separated by filtration, but are cerium-based. For abrasives that are not fine particles such as abrasives, it is difficult to perform an effective regeneration process with the regeneration method of Patent Document 2.
  • cerium-based abrasive used for various glass materials is discharged as so-called waste.
  • Used cerium-based abrasives are often used as slurries, and when discharged as waste, flocculants such as iron (Fe) and aluminum (Al) are added to used cerium-based abrasive slurries.
  • the abrasive particles are aggregated and discharged as a cake.
  • abrasive waste such waste obtained by adding a flocculant to a used cerium-based abrasive slurry to form a cake.
  • This abrasive waste is subject to recycling in that it contains cerium, a rare resource. However, since it contains a lot of polished glass and also contains an aggregating agent such as iron (Fe) or aluminum (Al), efficient reuse is not easy.
  • Patent Document 3 the flocculant contained in the used cerium-based abrasive is removed with an inorganic acid, and the glass scraps contained in the used cerium-based abrasive and the glass adhering to the surface of the abrasive are removed with hydrofluoric acid.
  • Regeneration techniques that dissolve in (HF) have been proposed.
  • hydrofluoric acid has high reactivity with the rare earth elements constituting the abrasive, it is difficult to selectively remove only glass by the hydrofluoric acid treatment.
  • the present invention has been made in the background as described above, and when regenerating a cerium-based abrasive from an abrasive waste material comprising a waste abrasive slurry containing a used cerium-based abrasive or an abrasive waste, Cerium-based polishing that efficiently removes flocculants such as glass and iron and aluminum, restores the polishing speed, and efficiently removes foreign matter with a diameter of 3 ⁇ m or more to suppress the occurrence of scratches. It aims at providing the technology which reproduces material.
  • the present invention provides a method for regenerating a cerium-based abrasive from a waste abrasive slurry containing a used cerium-based abrasive or an abrasive waste comprising an abrasive waste, and the polishing waste is treated with hydrofluoric acid. At least one selected from an acid containing no acid and a salt thereof is added to form a slurry, and the mixture is stirred at a peripheral speed of 4 m / sec or more. According to the present invention, it is possible to regenerate a cerium-based abrasive in which glass is efficiently removed, the polishing speed is recovered, and the generation of abrasive scratches is suppressed.
  • At least one additive selected from an acid not containing hydrofluoric acid and a salt thereof (hereinafter sometimes simply referred to as additive) is added to the abrasive waste, and the slurry is stirred at 4 m / sec or more. Do.
  • the stirring speed is more preferably 10 m / sec or more. If it is less than 4 m / sec, the agglomeration of the abrasive particles will not be sufficiently loosened, and the adhered glass and the abrasive will not be efficiently separated.
  • the stirring of the slurry is preferable because the dispersion becomes better as the stirring speed is higher.
  • the stirring speed is too high, the apparatus cost and the energy cost are increased, and therefore, 100 m / sec or less is preferable, and 80 m / sec or less is more preferable.
  • a stirring device T.W. K. It is particularly preferable to use a film mix (registered trademark / manufactured by Primix Co., Ltd.) and set the viscosity to 50 m / sec or less for stable treatment.
  • the stirring device is not particularly limited, and various stirring devices can be used. A stirrer using a medium is also possible, and for example, a bead mill can be used.
  • At least one additive selected from an acid not containing hydrofluoric acid and a salt thereof in the present invention has a dispersing effect, and coupled with stirring at a peripheral speed of 4 m / sec or more, the glass is separated from the abrasive particles.
  • the glass can be efficiently removed.
  • the slurry is stirred after the slurry is stirred at a peripheral speed of 4 m / sec or more, the ratio of the abrasive particles passing through the filter is improved.
  • acids that do not contain hydrofluoric acid include acids having two or more carboxyl groups, carbonic acid, phosphoric acid, etc., and salts thereof include alkali metal salts (lithium salts, sodium salts, potassium salts) of each acid. , Rubidium salt) and ammonium salt.
  • alkali metal salts lithium salts, sodium salts, potassium salts
  • ammonium salt a salt where the acid is divalent or higher
  • the salt at least one of the plurality of hydrogens (H) may be substituted with an alkali metal or ammonium.
  • some hydrogen (H) such as sodium hydrogen carbonate, potassium dihydrogen citrate, and diammonium hydrogen phosphate are substituted.
  • the salt includes a case where a plurality of hydrogen (H) is substituted with different alkali metals and ammonium, such as sodium potassium tartrate.
  • the acid not containing hydrofluoric acid in the present invention it is preferable to use at least one selected from an acid having two or more carboxyl groups, a salt thereof, and a phosphate.
  • a sodium salt, potassium salt, and ammonium salt are cheap and preferable.
  • Examples of the acid having two or more carboxyl groups and salts thereof in the present invention include citric acid, tartaric acid, gluconic acid, succinic acid, fumaric acid, polyacrylic acid, carboxymethyltartronic acid (CMT), carboxymethyloxysuccinic acid (CMOS), hydroxyethylethylenediaminetetraacetic acid (HEDTA), N- (2-hydroxyethyl) iminodiacetic acid (HIDA), diethylenetriaminopentaacetic acid (DTPA), ethylenediaminetetraacetic acid (EDTA), nitrilotriacetic acid (NTA), Shu There are acids, or alkali metal salts thereof, and ammonium (NH 4 ) salts. Among them, sodium (Na) salts, potassium (K) salts, and ammonium (NH 4 ) salts are preferable.
  • the alkali metal salts there are ammonium (NH 4) salts, among others sodium (Na) salt, potassium (K) salts, ammonium (NH 4) salts are preferred.
  • NH 4 salts include sodium pyrophosphate, sodium tripolyphosphate, sodium hexametaphosphate, sodium ultrapolyphosphate, sodium orthophosphate, potassium pyrophosphate, potassium polyphosphate, and potassium metaphosphate.
  • the addition amount is preferably 0.01% by mass to 10% by mass and more preferably 0.05% by mass to 6% by mass with respect to the solid content of the slurry.
  • the addition amount is less than 0.01% by mass, the dispersion effect is insufficient, and the separation between the glass and the abrasive particles tends to be insufficient. Moreover, even if it adds exceeding 10 mass%, the dispersion effect hardly increases.
  • the pH of the slurry to be stirred is preferably pH 3 to pH 12. More preferably, the pH is 6 to 10.
  • the pH is less than 3, the cerium-based abrasive itself tends to be dissolved, and the regeneration rate is deteriorated. Even if the pH exceeds pH 12, there is no change in the dispersion effect and the ease of separation of the glass and abrasive particles, but the amount of alkali such as sodium hydroxide or aqueous ammonia increases.
  • the abrasive waste when the abrasive waste is an abrasive waste, it is preferable that the abrasive waste is preliminarily subjected to an aggregating agent removal treatment for removing an aggregating agent component with an acid other than hydrofluoric acid.
  • the flocculant removal treatment in the present invention is performed with an acid other than hydrofluoric acid. Even if hydrofluoric acid is used, iron and aluminum can be removed. However, hydrofluoric acid reacts with rare earth elements to produce fluoride, so that when it is made into a recycled cerium-based abrasive, it will cause abrasive scratches. It tends to occur.
  • the flocculant removal treatment in the present invention may be performed with an acid other than hydrofluoric acid, at least one of an inorganic acid selected from sulfuric acid, hydrochloric acid, and nitric acid, an organic acid selected from citric acid, tartaric acid, and acetic acid. preferable.
  • an inorganic acid selected from sulfuric acid, hydrochloric acid, and nitric acid
  • an organic acid selected from citric acid, tartaric acid, and acetic acid.
  • sulfuric acid is particularly preferable. This is because sulfuric acid has a relatively high efficiency for removing the flocculant and can be easily treated with waste water at the time of regeneration, so that the cost can be reduced.
  • the acid other than hydrofluoric acid in the flocculant removing treatment is an inorganic acid selected from sulfuric acid, hydrochloric acid and nitric acid, an organic acid selected from citric acid, tartaric acid and acetic acid. It is preferably at least one of acids.
  • the amount of acid used per 1 mol of iron or aluminum is 2 for an n-valent inorganic acid. 5 / n to 9 / n mol is preferable, and 3 / n to 6 / n mol is more preferable. If the amount is too small, the dissolution and removal of the flocculant component tends to be insufficient. If the amount is too large, the rare earth component is dissolved and the regeneration rate tends to decrease.
  • the monovalent inorganic acid is hydrochloric acid or nitric acid, and the divalent inorganic acid is sulfuric acid.
  • the acid usage-amount is the same as the case of the above-mentioned inorganic acid.
  • the monovalent organic acid is acetic acid
  • the divalent organic acid is tartaric acid
  • the trivalent organic acid includes citric acid.
  • the filtering can be performed with a so-called cartridge filter (for disposable use), but a nylon mesh with a predetermined opening diameter (for example, an opening diameter of 1 ⁇ m, V-SEP (manufactured by Techno Alpha)) is used to reduce the environmental burden. It is preferable to do.
  • the slurry after agitation is settled and the supernatant liquid is extracted, and if necessary, the repulp and the sediment are further extracted. It can repeat by removing the glass component lighter than the abrasive particle contained repeatedly in a supernatant liquid. It is also possible to filter the above-described cartridge filter and pass the abrasive, and capture and remove the glass. And it can also carry out combining sedimentation, extraction of supernatant liquid, and filtering.
  • a filter having a filtration accuracy of 1 ⁇ m to 5 ⁇ m when removing glass or removing glass and foreign matters, it is preferable to use a filter having a filtration accuracy of 1 ⁇ m to 5 ⁇ m. If only a filter exceeding 5 ⁇ m is passed, the removal of glass and foreign matters tends to be insufficient, and if polishing treatment is performed with the regenerated cerium-based abrasive, a lot of abrasive scratches are likely to occur. In particular, when the supernatant liquid is not extracted, the tendency becomes strong. If it is less than 1 ⁇ m, the abrasive particles hardly pass through the filter, and the regeneration rate tends to be greatly reduced. When the filter of 1 ⁇ m to 5 ⁇ m is passed from the beginning, the filter is likely to be clogged.
  • a filter of 1 ⁇ m to 5 ⁇ m may be passed.
  • a plurality of filters may be sequentially passed through such as 10 ⁇ m, then 5 ⁇ m, and finally 3 ⁇ m.
  • the solid content of the slurry after stirring is preferably 50% by mass or more, more preferably 70% by mass, and the ratio of passing through the filter (filter solid content passing rate) is preferably 90% by mass. More preferably, it is more preferably 95% by mass or more.
  • Most of the solid content is abrasive particles of a cerium-based abrasive, but a minute amount of glass or foreign matter is also mixed before filtering.
  • the solid content of the slurry before filtering and the slurry after filtering is measured for the total mass, and after stirring, a part is sampled and the solid content concentration (% by mass) is measured using an infrared dry moisture meter. Can be measured.
  • the filter solid content passage rate is calculated by calculating the total solid content before and after filtering.
  • the total mass may be measured directly, or may be determined by measuring and calculating the total slurry amount (volume) and the specific gravity of the slurry.
  • the abrasive waste when the abrasive waste is an abrasive waste, the abrasive waste is not particularly limited, but the used cerium-based abrasive slurry may be added to an iron-based or aluminum-based flocculant or an organic polymer-based material. It is preferable to use a cake obtained by adding a flocculant and separating into solid and liquid by filtration or the like.
  • the average particle diameter of the cerium-based abrasive in the previous slurry is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more in terms of volume-based median diameter (D 50 ) by laser diffraction / scattering method. preferable. If D 50 is less than 0.1 [mu] m, separation of the glass contained in the abrasive waste slag it tends to become difficult. D 50 is preferably 5 ⁇ m or less, and more preferably 3 ⁇ m or less.
  • the used cerium-based abrasive is preferably a glass material such as a hard disk glass substrate, a liquid crystal glass substrate, a photomask glass substrate, or an optical glass, or a material used for polishing of quartz.
  • the waste abrasive slurry is not particularly limited.
  • the average particle diameter of the used abrasive slurry of the used abrasive slurry is preferably 0.1 ⁇ m or more, and more preferably 0.2 ⁇ m or more in terms of volume-based median diameter (D 50 ) by a laser diffraction / scattering method.
  • D 50 is less than 0.1 [mu] m, tend to removal of the glass component becomes difficult.
  • D 50 is preferably 5 ⁇ m or less, and more preferably 3 ⁇ m or less. If D 50 exceeds 5 [mu] m, playback cerium-based abrasive slurry obtained becomes liable characteristic generating the polishing scratches.
  • the waste abrasive slurry is preferably a glass material such as a glass substrate for hard disk, a glass substrate for liquid crystal, a glass substrate for photomask, or optical glass, or a material used for polishing treatment of quartz.
  • cerium-based abrasive slurry to be reclaimed is not only in a solid-liquid mixed state, that is, in a so-called slurry state, but also in which the abrasive component settles and is separated from the solid-liquid by storage.
  • the thing which made this a slurry state by stirring is also included.
  • the cake after sedimentation and removal of the supernatant liquid can be slurried as it is and used as a regenerated cerium-based abrasive slurry, but it can also be used after drying or baking.
  • the slurry after filtering can be used as a regenerated cerium-based abrasive slurry by adjusting the concentration as necessary, but it can also be used after drying or drying.
  • dry pulverization or dry pulverization and dry classification are preferably performed. In this way, a powdered recycled cerium-based abrasive can be obtained. Further, a powdered recycled cerium-based abrasive can be used in the form of a slurry.
  • slurry-like recycled cerium-based abrasives can be used by mixing with slurry-like cerium-based abrasives that are not recycled, and powder-like recycled cerium-based abrasives can be used as powdered cerium-based abrasives that are not recycled. It can be used as a mixture.
  • the cake-like recycled cerium-based abrasive before slurrying or drying, the recycled cerium-based abrasive after slurrying, and the powdered recycled cerium-based abrasive are used alone or together with other cerium-based abrasive raw materials, It can also be used as a raw material for abrasives.
  • the regenerated cerium-based abrasive obtained by the present invention is preferably used for polishing of glass materials such as hard disk glass substrates, liquid crystal glass substrates, photomask glass substrates, optical glass, or quartz.
  • a cerium-based abrasive whose polishing speed has been recovered and the generation of abrasive scratches has been suppressed can be easily made from an abrasive scrap made from a waste abrasive slurry or abrasive waste containing a used cerium-based abrasive. Can be played.
  • the used cerium-based abrasive can be effectively reused, which is extremely effective from the viewpoint of effective use of resources.
  • Abrasive testing machine HSP-21 type (Taito Seiki Co., Ltd.) is used to polish flat panel glass, and the abrasive slurry is changed until the polishing speed drops below 50% of the initial polishing.
  • a ferric chloride flocculant (manufactured by Kanto Chemical Co.) is added to this used cerium-based abrasive slurry, and caustic soda (manufactured by Kanto Chemical Co., Ltd.) is added to the slurry.
  • a precipitate was generated by adjusting the pH to 7 or more, and this precipitate was also contaminated with flat panel fragments in the polishing process.
  • this precipitate was subjected to solid-liquid separation with a filter press (manufactured by Ataca Daiki Co., Ltd., TFP-3) to obtain cake-like abrasive wastes to be recycled.
  • the cake-like abrasive waste thus obtained had a water content of 50.2%, and Fe was mixed by 12% by mass with respect to the solid content. And 2 mass% of Si (silicon) was contained with respect to solid content.
  • the stirring device T.A. Stirring was performed for 30 seconds at a peripheral speed of 50 m / sec using K Fillmix (manufactured by PRIMIX Corporation).
  • K Fillmix manufactured by PRIMIX Corporation
  • foreign matter removal treatment was performed by filtering with a slope pure filter 250L-SLS-030 (manufactured by Loki Techno Co., Ltd.) having a filtration accuracy of 3 ⁇ m.
  • a slope pure filter 250L-SLS-030 manufactured by Loki Techno Co., Ltd.
  • the physical properties and polishing evaluation of the recovered recycled cerium-based abrasive and the cerium-based abrasive (product) before use were performed. Physical properties were measured for BET specific surface area, particle size, and composition (fluorine (F), iron (Fe), silicon (Si), calcium (Ca), aluminum (Al), total oxidized rare earth (TREO)) and polished. In the evaluation, the polishing speed and the scratches were investigated. The test conditions are as follows.
  • BET specific surface area Conforms to “6.2 Flow method (3.5) single point method” in JIS R 1626-1996 (Method for measuring specific surface area of fine ceramic powder by gas adsorption BET method). And measured. At that time, a mixed gas of helium as a carrier gas and nitrogen as an adsorbate gas was used. In the measurement of the slurry abrasive, the BET method specific surface area was measured for a dried product obtained by sufficiently drying (heating to 105 ° C.) the slurry.
  • Particle size 10% of the volume-based fraction from the small particle size side by measuring the particle size distribution using a laser diffraction / scattering particle size distribution measuring device (LA-920 manufactured by Horiba, Ltd.) The diameter (D 10 ), 50% diameter (D 50 ) and 90% diameter (D 90 ) were determined.
  • TREO total oxidized rare earth
  • Abrasive raw material or total oxidized rare earth of abrasive raw material was measured by oxalate precipitation / firing / gravimetry (unit: solid mass: liquid: g / L) .
  • the solid (abrasive) was dissolved in perchloric acid and hydrogen peroxide and boiled.
  • the measurement object was a liquid, it was boiled as it was.
  • CeO 2 / TREO a TREO sample obtained by performing the above-mentioned total oxidation rare earth (TREO) measurement was dissolved in perchloric acid and hydrogen peroxide, and measured by the ICP-AES method.
  • the fluorine (F) content was measured by the fluoride ion electrode method (unit: solids: mass%, liquid: g / L).
  • the solid matter to be measured was measured by being made into a solution by alkaline melting / hot water extraction.
  • Si silicon
  • Fe iron
  • Ca calcium
  • Al aluminum
  • Polishing speed A polishing tester (HSP-21 type, manufactured by Taito Seiki Co., Ltd.) was prepared as a polishing machine. This polishing tester polishes the surface to be polished with a polishing pad while supplying a polishing material slurry to the surface to be polished.
  • the abrasive grain concentration of the abrasive slurry was 100 g / L (dispersion medium was water only).
  • the object to be polished was a flat panel glass with a diameter of 65 mm.
  • a polishing pad made of polyurethane was used. Polishing was performed by setting the pressure of the polishing pad to the polishing surface to 9.8 kPa (100 g / cm 2 ) and the rotation speed of the polishing tester to 100 min ⁇ 1 (rpm).
  • the polishing speed is determined by measuring the glass weight before and after polishing to determine the reduction in glass weight due to polishing, and taking the reduction in cerium-based abrasive (product) before use as 100. The polishing speed of the cerium-based abrasive was examined.
  • Abrasion scratches are evaluated by visually observing the polished glass surface with a reflection method using a 300,000 lux halogen lamp as the light source, and counting the number of abrasive scratches with a width of 1 mm or more within the observation range of the entire glass surface. Abrasive scratches were observed on a total of 8 glasses, and the total number was used as an abrasive scratch evaluation value. The evaluation of the abrasive scratch was examined by comparing the abrasive scratch by the cerium-based abrasive (product) before use with the abrasive scratch by the recycled cerium-based abrasive.
  • Table 2 shows the measurement results of the physical properties and polishing characteristics of the recycled cerium-based abrasive of Example 1-1.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-1 is a relative value of 98, and the scratches of the recycled cerium-based abrasive are the same as those of the cerium-based abrasive (product) before use. It was almost the same as an abrasive scratch and was particularly suitable. As a result, it was found that the recycled cerium-based abrasive of Example 1-1 was practical for reuse of the polishing treatment.
  • Example 1-2 This Example 1-2 was obtained by performing a regeneration process under basically the same conditions as in Example 1-1 above. After the stirring process, the abrasive was filtered and solid-liquid separated. After being dried, it was calcined at 800 ° C., and then dry-pulverized with a hammer mill, and recovered as a recycled cerium-based abrasive. Table 1 shows the reproduction processing conditions of Example 1-2. In addition, Table 2 shows the physical properties, composition, and evaluation results of the recycled cerium-based abrasive of Example 1-2.
  • the polishing rate of the recycled cerium-based abrasive of Example 1-2 was 102 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasives before use ( It was almost the same as the abrasive scratches of the product) and was particularly suitable. As a result, it was found that the recycled cerium-based abrasive of Example 1-2 was practical for reuse of the polishing treatment.
  • Example 1-3 In Example 1-3, regeneration treatment was performed under basically the same conditions as in Example 1-1. Sodium pyrophosphate was used instead of citric acid. Moreover, pH adjustment by an alkali adjuster was not performed, and the slurry pH was pH 7.5. Other conditions were the same as in Example 1-1. Table 1 shows the reproduction processing conditions of Example 1-3. Table 2 shows the physical properties and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-3.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-3 is a relative value of 98, and the scratches of the recycled cerium-based abrasive are those of the cerium-based abrasive (product) before use. It was almost the same as an abrasive scratch and was particularly suitable. As a result, the recycled cerium-based abrasive of Example 1-3 was found to be practical for reuse of the polishing treatment.
  • Example 1-4 In this example 1-4, the regeneration treatment was performed under basically the same conditions as in the above-described example 1-3. After the stirring process, the abrasive was filtered and solid-liquid separated. After being dried, it was calcined at 800 ° C., and then dry-pulverized with a hammer mill, and recovered as a recycled cerium-based abrasive. Table 1 shows the reproduction processing conditions of Example 1-4. Table 2 shows the physical properties, composition, and evaluation results of the recycled cerium-based abrasive of Example 1-4.
  • the polishing speed of the regenerated cerium-based abrasive of Example 1-4 was 110 (relative value), and the scratches of the regenerated cerium-based abrasive were cerium-based abrasive before use ( It was almost the same as the abrasive scratches of the product) and was particularly suitable. As a result, the recycled cerium-based abrasive of Example 1-4 was found to be practical for reuse of the polishing treatment.
  • Example 1-5 In this Example 1-5, regeneration treatment was performed under basically the same conditions as in Example 1-3 above, and the stirring speed during the stirring treatment was 10 m / sec. is there. Table 1 shows the reproduction processing conditions of Example 1-5. Table 2 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-5.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-5 was 103 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasives before use ( It was found to be particularly suitable because it was slightly more than the scratches of the product), but to the extent that there was no practical problem at all.
  • Example 1-6 This Example 1-6 was obtained by performing a regeneration process under basically the same conditions as in Example 1-4 above, and the stirring speed during the stirring process was 10 m / sec. is there.
  • Table 1 shows the reproduction processing conditions of Example 1-6.
  • Table 2 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-6.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-6 was 109 (relative value), and the scratches on the recycled cerium-based abrasive were cerium-based abrasives before use ( It was found to be suitable as an abrasive.
  • Example 1-7 This Example 1-7 was obtained by performing a regeneration process under basically the same conditions as in Example 1-3 above, and the stirring speed during the stirring process was 5 m / sec. is there. Table 1 shows the reproduction processing conditions of Example 1-7. In addition, Table 2 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-7.
  • the polishing rate of the recycled cerium-based abrasive of Example 1-7 was 108 (relative value). Further, the number of scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 22 were confirmed. However, it was found that the abrasive was usable as an abrasive.
  • Example 1-8 Example 1-8 was obtained by performing a regeneration process under basically the same conditions as in Example 1-4 above, and the stirring speed during the stirring process was 5 m / sec. is there. Table 1 shows the reproduction processing conditions of Example 1-8. Table 2 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-8.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-8 was 113 (relative value).
  • the number of abrasive scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 29 were confirmed.
  • the abrasive was usable as an abrasive.
  • Example 1-9 This Example 1-9 was obtained by performing a regeneration process under basically the same conditions as in Example 1-1 above, and the stirring speed during the stirring process was 10 m / sec. is there.
  • Table 1 shows the reproduction processing conditions of Example 1-9.
  • Table 2 shows the physical properties, composition, and evaluation results of the recycled cerium-based abrasive of Example 1-9.
  • the polishing rate of the recycled cerium-based abrasive of Example 1-9 was 100 (relative value). Moreover, although the number of abrasive scratches on the recycled cerium abrasive was greater than that on the cerium-based abrasive (product) before use, it was found to be suitable as an abrasive.
  • Example 1-10 This Example 1-10 was obtained by performing a regeneration process under basically the same conditions as in Example 1-1 above, and the stirring speed during the stirring process was 5 m / sec. is there.
  • Table 1 shows the reproduction processing conditions of Example 1-10.
  • Table 2 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 1-10.
  • the polishing speed of the recycled cerium-based abrasive of Example 1-10 was 105 (relative value).
  • the number of abrasive scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 23 were confirmed.
  • the abrasive was usable as an abrasive.
  • Examples 1-11 to 29 In Examples 1-11 to 29, the case where various additives were added to the waste slurry was evaluated under basically the same regeneration conditions as in Example 1-1. Is. Table 1 shows the reproduction processing conditions of Examples 1-11 to 29. In addition, as a pH adjuster in the regeneration treatment, an alkali adjuster (ammonia water) or hydrochloric acid is used. In the case of Examples 1-18 and 1-19, HEDTA, DTPA, and EDTA are not dissolved unless an alkali adjuster is added. It was. Furthermore, succinic acid and HIDA were difficult to dissolve unless an alkali modifier was added. Tables 2 and 3 show the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasives of Examples 1-11 to 29.
  • the polishing rate of the regenerated cerium-based abrasive using the various additives of Examples 1-11 to 29 was at least 96 (relative value) or more. Further, 13 scratches of the recycled cerium abrasives of Examples 1-11 to 29 were confirmed in Example 1-29, but the other scratches were less than 10. It has been found that good cerium-based abrasives can also be regenerated using the various additives of Examples 1-11 to 29.
  • Comparative Example 1-1 In Comparative Example 1-1, the same abrasive waste as in Example 1-1 (water content 50.2%, Fe mixed in 12% by mass with respect to solid content, Si as solid content) 2% by mass).
  • Table 1 shows the reproduction processing conditions of Comparative Example 1-1.
  • Table 3 shows the physical properties and polishing characteristics of the recycled cerium-based abrasive of Comparative Example 1-1.
  • the polishing speed of the recycled cerium-based abrasive of Comparative Example 1-1 was 53 (relative value). Further, it is clear that the abrasive scratches of the recycled cerium abrasive of Comparative Example 1-1 is about 10 times or more than the abrasive scratches of the cerium-based abrasive (product) before use. It was impossible. Furthermore, compositionally, it was confirmed that Si, Ca, and Al were contained more than the regenerated cerium-based abrasive of each Example.
  • Comparative Example 1-2 In Comparative Example 1-2, the pH is not adjusted with an alkali adjuster (ammonia water) in the regeneration treatment conditions of Example 1-3, and the filtering after the stirring treatment is not performed. Reproduction processing was performed under conditions. Table 1 shows the reproduction processing conditions of Comparative Example 1-2. Table 3 shows the physical properties and polishing characteristics of the recycled cerium-based abrasive of Comparative Example 1-2.
  • an alkali adjuster ammonia water
  • the polishing speed of the recycled cerium-based abrasive of Comparative Example 1-2 was 89 (relative value).
  • the abrasive scratches of the recycled cerium abrasive of Comparative Example 1-2 are about 10 times or more than the abrasive scratches of the cerium-based abrasive (product) before use. It was impossible.
  • Comparative Example 1-3 In Comparative Example 1-3, the regeneration process was performed by filtering the peripheral speed during the stirring process at 3 m / sec under the regeneration process conditions of Comparative Example 1-2. .
  • Table 1 shows the reproduction processing conditions of Comparative Example 1-3.
  • Table 3 shows the physical properties and polishing characteristics of the recycled cerium-based abrasive of Comparative Example 1-3.
  • the polishing speed of the recycled cerium-based abrasive of Comparative Example 1-3 was a very high value of 122 (relative value).
  • the abrasive scratches of the recycled cerium abrasive of Comparative Example 1-3 is about 10 times or more of the abrasive scratches of the cerium-based abrasive (product) before use, and the measurement is very much because there are many scratches. It was impossible.
  • Comparative example 1-4 In this comparative example 1-4, acid treatment, pH adjustment with an alkali adjuster, and stirring of the slurry with the addition of additives were performed under the regeneration treatment conditions shown in Example 1-1 above. First, the playback process was performed with filtering. Table 1 shows the reproduction processing conditions of Comparative Example 1-4. Table 3 shows the physical properties and polishing characteristics of the recycled cerium-based abrasive of Comparative Example 1-4.
  • the polishing rate of the recycled cerium-based abrasive of Comparative Example 1-4 was a very low value of 12 (relative value).
  • the abrasive scratches of the recycled cerium abrasive of Comparative Example 1-4 are more than about 10 times the abrasive scratches of the cerium-based abrasive (product) before use. It was impossible.
  • Comparative Example 1-5 Comparative Example 1-5 was obtained by performing a regeneration process under basically the same conditions as in Example 1-1 above, and the stirring speed during the stirring process was 3 m / sec. is there. Table 1 shows the reproduction processing conditions of Comparative Example 1-5. Table 3 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Comparative Example 1-5.
  • the polishing speed of the recycled cerium-based abrasive of Comparative Example 1-5 was 110 (relative value).
  • the scratches of the recycled cerium abrasive were about 10 times or more than those of the cerium-based abrasive (product) before use, and measurement was impossible because there were so many scratches.
  • Second Embodiment In this second embodiment, a case where a used cerium-based abrasive slurry is used as an abrasive waste to be recycled will be described.
  • Example 2-1 The used cerium-based abrasive slurry to be regenerated was one containing 1.1% by mass of Si in the slurry with respect to the abrasive (solid content). Moreover, the spent cerium-based abrasive abrasive average particle diameter D 50 of the slurry is 1.3 .mu.m (the average particle diameter D 50 is citric acid was added to the spent cerium abrasive slurry as described below, It was the value of the cerium-based abrasive in the slurry before the stirring treatment adjusted to pH with an alkali adjuster (ammonia water).
  • an alkali adjuster ammonia water
  • this used cerium-based abrasive slurry was made into a slurry having a concentration of 100 g / L using pure water.
  • the Si concentration in the supernatant of this slurry was measured and found to be 20 mg / L.
  • the addition amount of the citric acid used as 3 mass% with respect to the abrasive in a slurry was added to the slurry.
  • an alkali adjuster ammonia water
  • the stirring device T.A. Stirring was performed for 30 seconds at a peripheral speed of 50 m / sec using K Fillmix (manufactured by PRIMIX Corporation).
  • K Fillmix manufactured by PRIMIX Corporation
  • filtering was performed with a Dia II filter 250L-DCP-030 (manufactured by Loki Tecino Co., Ltd.) having a filtration accuracy of 3 ⁇ m, and then the slurry was subjected to solid-liquid separation treatment.
  • the slurry after stirring treatment was settled down, and then the supernatant liquid was extracted, followed by the addition of pure water ⁇ stirring ⁇ static sedimentation twice, and the supernatant liquid was extracted.
  • the Si concentration of the first supernatant liquid-separated was measured, it was 1100 mg / L. From the result of this Si concentration, it was confirmed that most of Si (glass component) was removed.
  • the physical properties and polishing evaluation of the recovered recycled cerium-based abrasive and the cerium-based abrasive (product) before use were performed. Physical properties were measured for BET specific surface area, particle size, and composition (fluorine (F), silicon (Si), calcium (Ca), aluminum (Al), total oxidized rare earth (TREO)). And investigated the abrasive scratches. These measurement conditions are the same as in the first embodiment. In the measurement regarding the composition, the cerium-based abrasive was collected from the used cerium-based abrasive slurry, and the cerium-based abrasive was used.
  • Table 6 shows the physical properties, composition, and polishing evaluation results of the abrasive in the recycled cerium-based abrasive slurry of Example 2-1.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-1 is a relative value of 95
  • the scratches of the recycled cerium-based abrasive are cerium-based abrasives (product It was almost the same as the abrasive scratches of As a result, it was found that the recycled cerium-based abrasive of Example 2-1 was practical for reuse of the polishing treatment.
  • Example 2-2 This Example 2-2 was obtained by performing a regeneration process under basically the same conditions as in the above Example 2-1; after the stirring process, the abrasive was filtered and solid-liquid separated. After being dried, it was calcined at 800 ° C., and then dry-pulverized with a hammer mill, and recovered as a recycled cerium-based abrasive. Tables 4 and 5 show the reproduction processing conditions of Example 2-2. Table 6 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 2-2.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-2 was 102 (relative value).
  • the scratches of the recycled cerium-based abrasive were cerium-based abrasives ( This was particularly suitable because it was almost the same as the product scratches. As a result, it was found that the recycled cerium-based abrasive of Example 2-2 was practical for reuse of the polishing treatment.
  • Example 2-3 In this Example 2-3, the same used cerium-based abrasive slurry as in Example 2-1 was used (1.1% by mass of Si with respect to the abrasive).
  • the used cerium-based abrasive slurry was made into a slurry having a concentration of 100 g / L using pure water.
  • the Si concentration in the supernatant of this slurry was measured and found to be 20 mg / L.
  • the stirring device T.A. Stirring was performed for 30 seconds at a peripheral speed of 50 m / sec using K Fillmix (manufactured by PRIMIX Corporation). After the stirring treatment, the same solid-liquid separation treatment as in Example 1 was performed without filtering. When the Si concentration of the first supernatant liquid in this solid-liquid separation treatment was measured, it was 1100 mg / L. From the result of this Si concentration, it was confirmed that most of Si (glass component) was removed.
  • Table 6 shows the physical properties and composition of the recycled cerium-based abrasive of Example 2-3 and the results of polishing evaluation. As shown in Table 6, the polishing rate of the recycled cerium-based abrasive of Example 2-3 was 98 (relative value). In addition, although the scratches of the recycled cerium abrasive were slightly more than those of the cerium-based abrasive (product) before use, they were of a level that was not a problem at all practically and should be particularly suitable. found.
  • Example 2-4 This Example 2-4 was subjected to a regeneration treatment under basically the same conditions as in Example 2-3 above. After stirring, the abrasive separated after solid-liquid separation was dried, After baking at 800 ° C., the powder was dry-ground with a hammer mill and recovered as a recycled cerium-based abrasive. Tables 4 and 5 show the reproduction processing conditions of Example 2-4. Table 6 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Example 2-4.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-4 was 110 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasives before use ( Product).
  • the recycled cerium-based abrasive of Example 2-4 was slightly more than the scratches of the cerium-based abrasive (product) before use, but it has a practically no problem and is particularly suitable. It turned out to be something.
  • Example 2-5 In Example 2-5, regeneration treatment was performed under basically the same conditions as in Example 1 described above, and the stirring speed during the stirring treatment was 10 m / sec. Tables 4 and 5 show the reproduction processing conditions of Example 2-5. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-5.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-5 was 93 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasive ( It was found to be particularly suitable because it was slightly more than the scratches of the product), but to the extent that there was no practical problem at all.
  • Example 2-6 This Example 2-6 was obtained by performing a regeneration process under basically the same conditions as in Example 2-2, and the stirring speed during the stirring process was 10 m / sec. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-6. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-6.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-6 was 98 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasive ( It was found to be suitable as an abrasive.
  • Example 2-7 This Example 2-7 was subjected to regeneration treatment under basically the same conditions as in the above Example 2-5. After stirring, the filtration treatment was performed with a Dia II filter having a filtration accuracy of 5 ⁇ m. 250L-DCP-050 (manufactured by Loki Techno Co., Ltd.) was used. Tables 4 and 5 show the reproduction processing conditions of Example 2-7. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-7.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-7 was 94 (relative value), and the scratches of the recycled cerium-based abrasive were cerium-based abrasive ( It was found to be suitable as an abrasive.
  • Example 2-8 This Example 2-8 was obtained by performing a regeneration process under basically the same conditions as in the above Example 2-6. After the stirring process, the filtration process was performed with a filtration accuracy of 5 ⁇ m. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-8. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-8.
  • the polishing speed of the recycled cerium-based abrasive of Example 2-8 is 100 (relative value), and the scratches of the recycled cerium-based abrasive are the cerium-based abrasive ( It was found to be suitable as an abrasive.
  • Example 2-9 This Example 2-9 was obtained by performing regeneration processing under basically the same conditions as in Example 2-1 above, and the stirring speed during the stirring process was 5 m / sec. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-9. Table 6 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive 3 of Example 2-9.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-9 was 90 (relative value). Further, the number of scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 22 were confirmed. However, it was found that the abrasive was usable as an abrasive.
  • Example 2-10 This Example 2-10 was obtained by performing a regeneration process under basically the same conditions as in Example 2-2, and the stirring speed during the stirring process was 5 m / sec. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-10. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-10.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-10 was 97 (relative value).
  • the number of scratches on the recycled cerium abrasive was 25 more than the scratches on the cerium-based abrasive (product) before use, and 25 were confirmed, but it was found that the abrasive can be used as an abrasive.
  • Example 2-11 This Example 2-11 was obtained by performing a regeneration process under basically the same conditions as in the above Example 2-9. After the stirring process, the filtration process was performed with a filtration accuracy of 5 ⁇ m. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-11. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-11.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-11 was 92 (relative value). Further, the number of abrasive scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 24 were confirmed. However, it was found that the abrasive was usable as an abrasive.
  • Example 2-12 This Example 2-12 was obtained by performing a regeneration process under basically the same conditions as in the above Example 2-10. After the stirring process, the filtration process was performed with a filtration accuracy of 5 ⁇ m. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-12. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-12.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-12 was 98 (relative value). Further, the number of abrasive scratches on the recycled cerium abrasive was 28 more than that on the cerium-based abrasive (product) before use, but it was found that the abrasive was usable as an abrasive.
  • Example 2-13 This Example 2-13 was obtained by performing a regeneration process under basically the same conditions as in Example 2-3 above, and the stirring speed during the stirring process was 10 m / sec. is there.
  • Tables 4 and 5 show the reproduction processing conditions of Example 2-13.
  • Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-13.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-13 was 96 (relative value). Moreover, although the number of abrasive scratches on the recycled cerium abrasive was greater than that on the cerium-based abrasive (product) before use, it was found to be suitable as an abrasive.
  • Example 2-14 This Example 2-14 was obtained by performing a regeneration process under basically the same conditions as in Example 2-3 above, and the stirring speed during the stirring process was 5 m / sec. is there. Tables 4 and 5 show the reproduction processing conditions of Example 2-14. Table 6 shows the physical properties, composition, and results of the polishing evaluation of the recycled cerium-based abrasive material of Example 2-14.
  • the polishing rate of the recycled cerium-based abrasive of Example 2-14 was 92 (relative value).
  • the number of abrasive scratches on the recycled cerium abrasive was larger than that on the cerium-based abrasive (product) before use, and 29 were confirmed.
  • the abrasive was usable as an abrasive.
  • Examples 2-15 to 33 In Examples 1-15 to 33, various additives were added to the used cerium-based abrasive slurry under basically the same regeneration conditions as in Example 2-1. The case is evaluated. Tables 4 and 5 show the reproduction processing conditions of Examples 2-15 to 33. In the case of Examples 2-22 and 2-23, HEDTA, DTPA, and EDTA were not dissolved unless an alkali adjuster was added in Examples 2-22 and 2-23 as a pH adjuster in the regeneration treatment. . Furthermore, succinic acid and HIDA were difficult to dissolve unless an alkali modifier was added. Tables 6 and 7 show the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasives of Examples 2-15 to 33.
  • the polishing rate of the recycled cerium-based abrasive using the various additives of Examples 2-15 to 33 was at least 96 (relative value) or more. Further, 12 scratches of the recycled cerium abrasives of Examples 2-15 to 33 were confirmed in Example 2-33, but the other scratches were less than 10. It has been found that a good cerium-based abrasive can be regenerated even with the various additives of Examples 2-15 to 33.
  • Comparative Example 2-1 In Comparative Example 2-1, the same used cerium-based abrasive slurry as in Example 2-1 was used (1.1% by mass of Si with respect to the abrasive).
  • the used cerium-based abrasive slurry was made into a slurry having a concentration of 100 g / L using pure water.
  • the Si concentration in the supernatant of this slurry was measured and found to be 20 mg / L.
  • the alkali adjuster (ammonia water) was added to the slurry, and the pH of the slurry was adjusted to pH 8.0.
  • the stirring device T.A Stirring was performed for 30 seconds at a peripheral speed of 50 m / sec using K Fillmix (manufactured by PRIMIX Corporation). After the stirring treatment, the same solid-liquid separation treatment as in Example 2-1 was performed. When the Si concentration of the first supernatant liquid in this solid-liquid separation treatment was measured, it was 20 mg / L. From the result of this Si concentration, it was confirmed that most Si (glass component) remained.
  • Comparative Example 2-1 After the stirring treatment, the abrasive that had been filtered and solid-liquid separated was dried, and then dry-ground with a hammer-type mill, and recovered as a recycled cerium-based abrasive.
  • the filtering in Comparative Example 2-1 was performed using Dia II filter 250L-DCP-050 (manufactured by Loki Techno Co., Ltd.) having a filtration accuracy of 5 ⁇ m (the following Comparative Examples 2-2 and 2-3 were also used). the same). Tables 4 and 5 show the reproduction processing conditions of Comparative Example 2-1.
  • Table 7 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Comparative Example 2-1.
  • the polishing rate of the recycled cerium-based abrasive of Comparative Example 2-1 was 51 (relative value).
  • the scratches of the recycled cerium abrasive were about 10 times or more than those of the cerium-based abrasive (product) before use, and measurement was impossible because there were so many scratches.
  • Comparative Example 2-2 In Comparative Example 2-2, the same used cerium-based abrasive slurry as in Example 2-1 was used (1.1% by mass of Si with respect to the abrasive).
  • the used cerium-based abrasive slurry was made into a slurry having a concentration of 100 g / L using pure water.
  • the Si concentration in the supernatant of this slurry was measured and found to be 20 mg / L.
  • citric acid to be 3% by mass with respect to the abrasive in the slurry was added to the slurry.
  • an alkali adjuster ammonia water
  • the stirring device T.A Stirring was performed for 30 seconds at a peripheral speed of 3 m / sec using K Fillmix (manufactured by PRIMIX Corporation). After the stirring treatment, the slurry was filtered, and then the slurry was subjected to solid-liquid separation treatment. When the Si concentration of the first supernatant liquid in this solid-liquid separation treatment was measured, it was 20 mg / L. From the result of this Si concentration, it was confirmed that most Si (glass component) remained.
  • Table 7 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Comparative Example 2-2.
  • the polishing rate of the recycled cerium-based abrasive of Comparative Example 2-2 was 60 (relative value).
  • the scratches of the recycled cerium abrasive were about 10 times or more than those of the cerium-based abrasive (product) before use, and measurement was impossible because there were so many scratches.
  • Comparative Example 2-3 In Comparative Example 2-3, the same used cerium-based abrasive slurry as in Example 2-1 was used (1.1% by mass of Si with respect to the abrasive).
  • the used cerium-based abrasive slurry was made into a slurry having a concentration of 100 g / L using pure water.
  • the Si concentration in the supernatant of this slurry was measured and found to be 20 mg / L.
  • the slurry was filtered and then the slurry was subjected to solid-liquid separation treatment, and the solid content was washed to sufficiently remove hydrogen fluoride. Further, when the Si concentration of the first supernatant liquid in this solid-liquid separation treatment was measured, it was 1100 mg / L. From the result of this Si concentration, it was confirmed that most of Si (glass component) was removed.
  • Table 7 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Comparative Example 2-3.
  • the polishing rate of the recycled cerium-based abrasive of Comparative Example 2-3 was 99 (relative value).
  • the abrasive scratches of the recycled cerium abrasive are about 10 times or more than the abrasive scratches of the cerium-based abrasive (product) before use, and measurement was impossible because there were so many scratches.
  • Comparative Example 2-4 This Comparative Example 2-4 was obtained by performing a regeneration process under basically the same conditions as in Example 2-3 above, and the stirring speed during the stirring process was 3 m / sec. is there. Tables 4 and 5 show the reproduction processing conditions of Comparative Example 2-4. Table 7 shows the physical properties, composition, and results of polishing evaluation of the recycled cerium-based abrasive of Comparative Example 2-4.
  • the polishing rate of the recycled cerium-based abrasive of Comparative Example 2-4 was a low value of 63 (relative value).
  • the scratches of the recycled cerium abrasive were about 10 times or more than those of the cerium-based abrasive (product) before use, and measurement was impossible because there were so many scratches.

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  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

L'invention porte sur une technique qui élimine efficacement le composant vitreux contenu dans une boue abrasive à base de cérium usée, restaure le pouvoir abrasif, régénère un abrasif à base de cérium et supprime l'apparition de la détérioration de l'abrasion. Le procédé de régénération de boue abrasive à base de cérium, qui régénère une boue abrasive à base de cérium usée, est caractérisé par l'addition à la boue abrasive à base de cérium d'au moins un élément choisi parmi les acides qui ne contiennent pas d'acide fluorhydrique, et les sels desdits acides, et par la mise du mélange dans un état de boue et l'agitation à une vitesse circonférentielle de 4 m/s ou plus.
PCT/JP2011/052982 2010-02-15 2011-02-14 Procédé de régénération d'une boue abrasive à base de cérium WO2011099596A1 (fr)

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TWI645045B (zh) * 2017-09-25 2018-12-21 國立臺北科技大學 氧化鈰拋光粉與玻璃粉的分離方法
KR102282872B1 (ko) * 2019-11-11 2021-07-28 주식회사 켐톤 세륨 산화물 입자의 제조방법, 연마입자 및 이를 포함하는 연마용 슬러리 조성물
TWI759787B (zh) * 2020-07-07 2022-04-01 環創源科技股份有限公司 研磨廢液與含氫氟酸廢液的處理方法

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KR20120123084A (ko) 2012-11-07
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