WO2011093305A1 - Procédé de traitement, installation de traitement et matériau de retrait d'impuretés pour déchets gazeux radioactifs - Google Patents

Procédé de traitement, installation de traitement et matériau de retrait d'impuretés pour déchets gazeux radioactifs Download PDF

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WO2011093305A1
WO2011093305A1 PCT/JP2011/051416 JP2011051416W WO2011093305A1 WO 2011093305 A1 WO2011093305 A1 WO 2011093305A1 JP 2011051416 W JP2011051416 W JP 2011051416W WO 2011093305 A1 WO2011093305 A1 WO 2011093305A1
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gas waste
radioactive gas
impurity
radioactive
removing material
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PCT/JP2011/051416
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English (en)
Japanese (ja)
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周一 菅野
泰雄 吉井
秀宏 飯塚
高志 西
元浩 会沢
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日立Ｇｅニュークリア・エナジー株式会社
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Priority to JP2011551864A priority Critical patent/JP5564519B2/ja
Publication of WO2011093305A1 publication Critical patent/WO2011093305A1/fr

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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/02—Treating gases

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  • the present invention relates to a treatment method and treatment equipment for radioactive gas waste discharged from a nuclear reactor at a nuclear power plant. Moreover, it is related with the impurity removal material which removes the impurity in a radioactive gas waste.
  • reactor water in a nuclear reactor is partially decomposed into hydrogen and oxygen by radiation decomposition.
  • the hydrogen and oxygen are discharged from the reactor as radioactive gas waste together with the water vapor evaporated from the reactor water.
  • the water vapor containing hydrogen and oxygen passes through a recombination catalyst provided in a recombination apparatus at the rear stage of the nuclear reactor, and the hydrogen and oxygen recombine with H 2 O on the catalyst.
  • air is added between the nuclear reactor and the recombination apparatus.
  • the recombination catalyst an alumina catalyst supporting Pt and Pd is used as the recombination catalyst.
  • Patent Document 1 discloses a technique for supplementing an organosilicon complex in a gasoline fraction.
  • a material in which an alkali metal is supported on alumina is used as a material for removing the impurity.
  • radioactive gas waste discharged from nuclear reactors contains impurities depending on the operating conditions of the equipment inside the reactor and upstream of the reactor, and these impurities poison the recombination catalyst of the recombination equipment.
  • impurities depending on the operating conditions of the equipment inside the reactor and upstream of the reactor, and these impurities poison the recombination catalyst of the recombination equipment.
  • a recombination catalyst is poisoned by a silicon compound such as siloxane and the performance is lowered, and H 2 remains in a high concentration in exhaust gas discharged from the recombiner.
  • the present invention has been made in order to solve the above-described problems, and is intended to provide a radioactive gas waste capable of operating a nuclear power plant without causing an abnormal increase in H 2 concentration in exhaust gas from a recombiner.
  • a processing method, processing equipment, and an impurity removing material are provided.
  • the radioactive gas waste processing method according to the present invention basically has the following characteristics.
  • the impurities contained in the radioactive gas waste are: A step of removing by contacting with an impurity removing material containing at least one of ZrO 2 , mesoporous silica, and activated carbon; and after removing the impurities, contacting the radioactive gas waste with the catalyst to form the hydrogen and the hydrogen And recombining with oxygen.
  • An impurity removing material according to the present invention is an impurity removing material that removes impurities contained in radioactive gas waste discharged from a nuclear reactor at a nuclear power plant, and includes at least one of ZrO 2 , mesoporous silica, and activated carbon. Including is a basic feature.
  • the radioactive gas waste treatment facility according to the present invention basically has the following characteristics.
  • the recombination An exhaust gas preheater that heats the radioactive gas waste at the front stage of the vessel, and an impurity removing material that includes at least one of ZrO 2 , mesoporous silica, and activated carbon between the exhaust gas preheater and the recombiner. And a filled impurity removal layer.
  • the radioactive gas waste treatment facility according to the present invention can basically have the following characteristics.
  • the recombination The vessel includes an impurity removal layer filled with an impurity removal material including at least one of ZrO 2 , mesoporous silica, and activated carbon, and the impurity removal layer and the recombination catalyst layer are configured such that the radioactive gas waste is regenerated by the recycle catalyst layer. It is arranged to pass through the coupler in this order.
  • the nuclear power plant can be safely operated without increasing the H 2 concentration in the exhaust gas at the outlet of the recombiner. Can do.
  • the impurities can be removed from the radioactive gas waste by bringing the impurities into contact with the impurity removing material under appropriate conditions before the radioactive gas waste flows into the recombination catalyst layer. It was found that the catalyst performance degradation can be suppressed.
  • the radioactive gas waste processing method, the processing equipment, and the impurity removing material according to the present invention can be used for various catalysts without changing the recombination catalyst.
  • the impurity removing material As the impurity removing material, a material that can remove impurities even in a high-concentration water vapor atmosphere is optimal.
  • the composition of the radioactive gas waste processed by the recombiner is largely different from that of a normal processing gas because water vapor accounts for about 98 vol%. The remaining few percent is radioactively decomposed H 2 and O 2 , and N 2 in the air added before the recombiner. For this reason, there is an optimum material for removing impurities, and otherwise, the catalyst performance is lowered.
  • Specific examples of the impurity removing material include those containing at least one of ZrO 2 , mesoporous silica, and activated carbon. In particular, ZrO 2 and mesoporous silica are desirable because they do not contain carbon.
  • the operating temperature is preferably 100 to 500 ° C. When the temperature is 100 ° C. or lower, water vapor in the radioactive gas waste is condensed, so that the predetermined performance is not exhibited.
  • the upper limit of the use temperature depends on the system to be used, but it is desirable to use it at 500 ° C. or lower in order to heat the entire radioactive gas waste.
  • the temperature is 200 ° C. or lower. It is desirable to use it.
  • the temperature of the radioactive gas waste flowing into the recombination catalyst becomes high, and the recombination catalyst may deteriorate due to heat generated by the recombination reaction.
  • the impurity removing material needs to pay attention to radiation of recombination reaction heat on the recombination catalyst.
  • the temperature of the impurity removing material increases due to radiation, the trapped impurities may be desorbed.
  • the impurity removing material when installed outside the recombiner, it can be used below the heat resistance temperature of the impurity removing material. However, in order to heat the whole radioactive gaseous waste, it is desirable to use it at 500 degrees C or less. When using at 200 degreeC or more, it is desirable to install coolers, such as a heat exchanger, between an impurity removal layer and a recombination catalyst layer, before making a radioactive waste flow into a recombiner.
  • coolers such as a heat exchanger
  • siloxane when used as the impurity removing material, siloxane can be decomposed when used at 180 ° C. or higher. If water vapor is present, it can be hydrolyzed.
  • the decomposition reaction of C 10 H 30 O 5 Si 5 (D5), which is a kind of siloxane, is represented by the following formula.
  • the recombination catalyst is desirably used at 600 ° C or lower, and more preferably at 500 ° C or lower.
  • the sintering of the catalytically active component is easily promoted, and the performance is deteriorated.
  • the exotherm due to the recombination reaction varies depending on the amount of H 2 flowing into the recombination catalyst.
  • the temperature of the impurity removing material can be set so that the use temperature of the recombination catalyst is 600 ° C. or less.
  • the impurity removing material is installed outside the recombiner, it can be used at 200 ° C. or higher. In that case, it is desirable to install a cooler such as a heat exchanger between the impurity removal layer and the recombination catalyst layer before the radioactive waste flows into the recombiner.
  • a material that exhibits decomposition characteristics after trapping when the operating temperature is raised needs to have an acid point as a chemical property. Moreover, it is desirable that many acid sites exist per unit surface area.
  • the aforementioned ZrO 2 is 0.0064 ⁇ mol / m 2 , Materials with higher values are desirable. Further, TiO 2 is less than 0.0051 ⁇ mol / m 2 and ZrO 2, is believed to show similar effects.
  • ZSM-5 is 0.0017 mol / m 2, but up to this level, it is considered that the same effect can be obtained depending on the operating temperature. Other than that of 0.0017 mol / m 2 or more is activated alumina. A second component may be added to these to improve the acid point amount. In addition, said acid point amount was measured as follows.
  • the acid point amount of the impurity removing material was measured using a metal exposure analyzer (BELCAT-A manufactured by Nippon Bell Co., Ltd.).
  • a metal exposure analyzer BELCAT-A manufactured by Nippon Bell Co., Ltd.
  • particles having a diameter of 0.5 to 1.0 mm were used in the form of powder in a mortar.
  • the sample amount is 0.05 g.
  • the measurement includes a pretreatment process, an NH 3 adsorption process, and a temperature programmed desorption process.
  • the pretreatment step He was circulated as a treatment gas at 50 ml / min, the temperature was raised from room temperature to 500 ° C. at 10 ° C./min, and held at 500 ° C. for 60 min. Thereafter, the temperature was lowered to 100 degrees by natural cooling.
  • Impurity-removing materials are used to reduce poisoning caused by siloxane as a recombination catalyst in nuclear power plants, suppress insulation failure due to adhesion of siloxane to electrical relays, suppress haze caused by adhesion of siloxane to optical products, and repel paint due to adhesion of siloxane to the coating surface Can be used for suppression.
  • Siloxane is also contained in dry cleaning chemicals, shampoos, cosmetics, silicone tubes and silicone grease, and siloxane-containing substances may be generated even in the environment where these are used.
  • An impurity removing material can be used.
  • Fig. 7 shows the processing flow diagram of the system.
  • the fluid containing siloxane or the fluid passing through the siloxane generation source 100 is allowed to flow into the device 102 that is not desired to be poisoned by siloxane, the fluid is passed through the impurity removal layer 101 containing the impurity removing material and then poisoned by siloxane. It flows into the apparatus 102 which does not want to be discharged.
  • Siloxane is a compound in which a reference structure of —OSi (CH 3 ) 2 — is continuously bonded and finally becomes a ring.
  • the size of the compound is determined by the number of reference structures. For example, in the case of describing D5, the above-described reference structure is five cyclic compounds.
  • compounds of about D3 to D8 are targeted, but in the present invention, compounds having two or less reference structures can also be handled as impurities. It is presumed that a compound having two or less reference structures cannot form a cyclic structure, and thus has a linear structure and has a terminal —OH.
  • Impurities other than silicon compounds include hydrocarbons, sulfuric acid compounds, chlorine compounds, and fluorine compounds.
  • the test was conducted with a silicon compound as a representative example, but the present invention has the same effect with respect to other impurities.
  • the impurity removing material preferably has a large specific surface area.
  • the impurity removing material has a structure having micropores and mesopores, the specific surface area becomes large, and the amount of impurities to be captured increases.
  • an impurity removing material such as ZrO 2 may be supported on a material having a high specific surface area such as alumina, TiO 2 , zeolite, or mesoporous silica. It may be combined with these components and converted into a composite oxide to increase the specific surface area.
  • the siloxane trapping performance is improved.
  • hydrophilic components such as Ni, Zn, W, Fe, Co, Ce, and Ti may be supported.
  • hydrophobic components such as organic groups, such as F and a methyl group. Since siloxane has a hydrophilic Si group and a hydrophobic organic group, increasing the hydrophilicity improves the Si group capturing performance, and improving the hydrophobicity improves the organic group capturing performance. You may carry
  • FIG. 5 shows an exhaust gas treatment flow from the nuclear reactor.
  • Water vapor including H 2 and O 2 ) contained in the radioactive gas waste generated in the nuclear reactor is used to turn the turbine.
  • the radioactive gas waste after turning the turbine is heated to a predetermined temperature by the exhaust gas preheater and introduced into the recombiner.
  • H 2 and O 2 are combined and changed to H 2 O (water vapor).
  • the steam is returned to the water by the condenser, and the moisture is removed by the dehumidifying cooler.
  • ZrO 2 material 1
  • mesoporous silica material 2
  • activated carbon material 3
  • TiO 2 Comparative 1
  • ZSM-5 Comparative 2
  • ZrO 2 Zirconyl nitrate dihydrate (commercial product, Wako Pure Chemical Industries, Ltd. reagent) was calcined in the atmosphere at 500 ° C. for 2 hours to prepare ZrO 2 .
  • the fired powder was press-molded at 500 kgf / cm 2 , crushed in a mortar, and sized to 0.5 to 1.0 mm.
  • Mesoporous silica (commercial product, manufactured by Zude Chemie Catalyst Co., Ltd.) was dried at 120 ° C. for 2 hours. The dried powder was press-molded at 200 kgf / cm 2 , crushed in a mortar, and sized to 0.5 to 1.0 mm.
  • Activated carbon activated carbon (commercially available product, spherical white DX7-3 (0.5-3.0 mm diameter) manufactured by Takeda Pharmaceutical Co., Ltd.) was dried at 120 ° C. for 2 hours. After drying, the mixture was crushed with a mortar and sized to 0.5 to 1.0 mm.
  • TiO 2 TiO 2 having a particle diameter of 2 to 4 mm (commercial product, CS-200S-24 manufactured by Sakai Chemical Industry Co., Ltd.) was crushed with a mortar and sized to 0.5 to 1.0 mm.
  • ZSM-5 ZSM-5 (commercial product, H-MFI-240 manufactured by Zude Chemie Catalysts Co., Ltd.) was press-molded at 500 kgf / cm 2 , crushed in a mortar, and sized to 0.5 to 1.0 mm.
  • siloxane was added as an impurity to the reaction gas, and the effect of the impurity removing material prepared in Example 1 was examined. Specifically, the reaction gas to which siloxane was added was introduced into a reaction tube having an impurity removal layer and a recombination catalyst layer, and the H 2 concentration at the outlet of the reaction tube was measured. The impurity removal layer of the reaction tube is filled with an impurity removal material, and the recombination catalyst layer is filled with a recombination catalyst.
  • reaction gas water 2.4 ml / min is vaporized into water vapor by a steam generator, H 2 97 ml / min and O 2 48.3 ml / min are mixed, and air is added 17.7 ml / min. Was used.
  • This reaction gas was allowed to flow at 150 ° C. into the recombination catalyst layer.
  • the space velocity represented by (Equation 1) was 109,400 h ⁇ 1
  • linear velocity represented by (Equation 2) was 0.297 m / s.
  • the reason why the metal mesh is laid is to prevent the impurity removing material from falling to the lower part (downstream of the flow of the reaction gas).
  • the reaction gas introduced into the reaction tube first passes through the impurity removal layer, then the recombination catalyst layer, and reaches the outlet.
  • the H 2 concentration in the reaction gas that has passed through the recombination catalyst layer is determined by using a PDD (Pulsed Discharge Detector) gas chromatograph analyzer (GC Science Co., Ltd. GC) after condensing water vapor into water in an ice-cooled cooling bath. -4000) and measured.
  • PDD Pulsed Discharge Detector
  • HID Helium Ionization Detector
  • 100 ⁇ l of sample gas (reactive gas that passed through the recombination catalyst layer) was sucked with a pump.
  • the gas inlet temperature of the gas chromatograph was room temperature, the detector temperature was 150 ° C., and the oven temperature was 50 ° C.
  • the column had an outer diameter of 1/8 inch ⁇ ⁇ length of 2 m, and Molecular Sieve 13X-S (60-80 mesh) was used as a packing material.
  • He was allowed to flow at 20 ml / min. Further, He was allowed to flow at 30 ml / min as a discharge gas.
  • the impurities are heated to 150 ° C. and introduced into a reaction tube filled with an impurity removing material and a recombination catalyst, and when the H 2 concentration at the outlet of the reaction tube (outlet H 2 concentration) becomes stable,
  • One type of D5 was added dropwise from the top of the reaction tube at 2.5 ⁇ 10 ⁇ 8 liter / min.
  • the outlet concentration of H 2 to be stable for each test differs slightly with respect to the outlet concentration of H 2 immediately before the addition of D5, was compared outlet concentration of H 2 was increased after addition of D5.
  • FIG. 1 is a diagram comparing outlet H 2 concentrations 35 minutes and 60 minutes after adding D5 to the reaction gas.
  • ZrO 2 material 1
  • MPS mesoporous silica
  • activated carbon material 3
  • TiO 2 material 3
  • ZrO 2 was charged with 1.8 ml (2.51 g) in the impurity removal layer on the upper part of the recombination catalyst layer (upstream side of the reaction gas flow).
  • the outlet H 2 concentration when ZrO 2 was filled as an impurity removing material was almost the same as when only the recombination catalyst was filled after 35 minutes, but the increase was clearly suppressed after 60 minutes.
  • MPS mesoporous silica
  • the outlet gas temperature measured at the outlet of the recombination catalyst layer under test was 285 ° C. at the maximum. This is because the recombination reaction proceeds on the recombination catalyst and heat is generated.
  • the difference in the removal performance of ZrO 2 and TiO 2 is due to the difference in specific surface area and the amount of solid acid.
  • D5 is adsorbed on the surface of the removal material, and the amount of adsorption is estimated to be governed by the amount of solid acid.
  • the solid acid point is a point where an acid-base reaction proceeds on the surface, and the solid acid amount per unit specific surface area is considered to determine the adsorption rate.
  • the solid acid amounts of ZrO 2 and TiO 2 were examined by NH 3 adsorption method.
  • the NH 3 adsorption method is a method in which NH 3 is adsorbed on a catalyst, and then the desorption temperature and desorption amount of adsorbed NH 3 are measured while raising the temperature. The adsorption power of NH 3 can be seen from the desorption temperature.
  • a predetermined amount of sample (ZrO 2 or TiO 2 ) was filled in the reaction tube, and pretreatment was performed.
  • the water adsorbed on the catalyst surface was removed by raising the temperature to 450 ° C. under a flow of He gas and maintaining the temperature at 450 ° C. for 30 minutes.
  • Adsorption treatment of NH 3 was introduced and NH 3 was diluted to 9.5Vol% with He gas into the reaction tube is adsorbed on the sample.
  • the adsorption temperature was 100 ° C.
  • the concentration of unadsorbed gas flowing out in a pulse manner from the reaction tube outlet was quantified, and it was judged that the adsorption was completed when this concentration became constant.
  • NH 3 was heated and desorbed by heating to 700 ° C. in a He stream after completion of adsorption, and the amount of NH 3 desorbed was measured.
  • the NH 3 concentration at the outlet of the reaction tube was measured with a TCD gas chromatograph.
  • the solid acid amount of ZrO 2 was 0.015 mol / m 2
  • the solid acid amount of TiO 2 was 0.012 mol / m 2 . From this, it was found that the impurity removing material requires a solid acid amount of at least 0.012 mol / m 2 or more. It is estimated that even if the amount of solid acid becomes too large, the removal performance is limited due to steric hindrance between adsorbed impurities.
  • ZSM-5 had a large specific surface area and a large amount of solid acid, but its performance was low. This is thought to be due to the low hydrothermal resistance of ZSM-5. When used in an atmosphere with a lot of water vapor as in this embodiment, it is necessary to make the surface hydrophobic and to sufficiently reduce impurities inside ZSM-5 containing structurally unstable Si.
  • FIG. 2 is a diagram showing a change with time of the outlet H 2 concentration when the amount of ZrO 2 in the impurity removal layer is increased to 2.7 ml (3.77 g).
  • the results when D5 is not added to the reaction gas and only the recombination catalyst is filled into the reaction tube and when only D5 is added to the reaction gas and the reaction tube is filled with only the recombination catalyst are also shown. It was.
  • the amount of ZrO 2 filled in the impurity removal layer is larger in the case of FIG. 2, and the increase in the outlet H 2 concentration is smaller. From this, it can be seen that increasing the filling amount of ZrO 2 further suppresses the increase in the outlet H 2 concentration.
  • FIG. 3 is an example of a cross-sectional view of a recombiner that recombines hydrogen and oxygen in water vapor contained in radioactive gas waste with a catalyst.
  • the recombiner 3 includes a recombination catalyst layer 2 filled with a recombination catalyst, and an impurity removal layer 5 filled with an impurity removal material, and the radioactive gas waste 1 flows in.
  • the impurity removal layer 5 is installed in the recombiner 3 on the upstream side of the flow of the radioactive gas waste 1 when viewed from the recombination catalyst layer 2.
  • the recombiner 3 includes a heating facility 4. For the heating equipment 4, for example, a heater is used.
  • the impurity removal layer 5 is filled in the cartridge 6, and the cartridge 6 is held by the cartridge support 7.
  • the cartridge support 7 is welded inside the recombiner 3.
  • the impurity removal layer 5 is installed in the recombiner 3 where the temperature is 100 to 200 ° C.
  • the temperature of the radioactive gas waste 1 is controlled to be 100 to 200 ° C. by the heating equipment 4. Due to the heated radioactive gas waste 1, the temperature of the impurity removal layer 5 can be kept within the range of 100 to 200 ° C. even if the temperature of the recombination catalyst layer 2 rises.
  • the impurity removing material is installed in a part where the temperature is lower than 100 ° C., the water vapor is condensed and the predetermined performance cannot be obtained. Moreover, when it exceeds 200 degreeC, the temperature control of the recombination catalyst layer 2 will become difficult. When the inlet temperature of the recombination catalyst layer 2 exceeds 200 ° C., the temperature inside the catalyst rises due to the recombination reaction, causing deterioration of the catalyst.
  • the radioactive gas waste 1 that has passed through the impurity removal layer 5 flows into the recombination catalyst layer 2 at 140 to 160 ° C. desirable.
  • the shape of the impurity removing material can be molded into a granular shape, a columnar shape, a pellet shape, or the like.
  • the ceramic honeycomb surface may be coated, or the metal wire surface may be coated.
  • the impurity removal layer 5 is preferably filled in a cartridge 6 which is a porous container.
  • a cartridge 6 which is a porous container.
  • a cartridge support may be placed on the recombination catalyst layer 2 and held.
  • FIG. 4 is a diagram showing another installation example of the impurity removing material, and shows an example of a cross-sectional view of the recombiner and the impurity removing layer.
  • FIG. 4 shows a case where the impurity removing material is installed outside the recombiner and before the recombiner.
  • An exhaust gas preheater (see FIG. 5) is usually arranged in the front stage of the recombiner 3, but an impurity removal layer 5 filled with an impurity removal material is installed between the exhaust gas preheater and the recombiner 3. May be.
  • the recombiner 3 includes only the recombination catalyst layer 2 filled with the recombination catalyst.
  • the impurity removal layer 5 is filled in the cartridge 6. The radioactive gas waste 1 passes through the impurity removal layer 5 and flows into the recombiner 3.
  • a heating facility 4 such as a heater is provided around the impurity removal layer 5.
  • the radioactive gaseous waste 1 can be heated to 100 to 200 ° C. by the heating equipment 4 and the temperature of the impurity removal layer 5 can be kept within the range of 100 to 200 ° C. For example, when the temperature of the impurity removal layer 5 is low, it can be heated by the heating equipment 4 and raised to a predetermined temperature.
  • high temperature exhaust gas burned with fuel may be mixed with radioactive gas waste.
  • the impurity removal layer 5 when the structure in which the impurity removal layer 5 is installed in the previous stage of the recombiner 3, two or more impurity removal layers 5 can be arranged.
  • the impurity removal layer 5 is installed inside the recombiner 3, and the number of installation is limited.
  • two or more impurity removal layers 5 are arranged, there is an advantage that the operation can be performed while operating the radioactive gas waste treatment facility even in an emergency or material exchange.
  • the recombination catalyst of Example 1 was removed, siloxanes before and after the material 1 (ZrO 2 ) were analyzed, and the effect of the impurity removing material was examined.
  • the reaction gas to which siloxane was added was introduced into a reaction tube having an impurity removal layer, and the concentration of siloxanes at the outlet of the reaction tube was measured.
  • the impurity removal layer of the reaction tube was filled with material 1 as an impurity removal material. Further, the same reaction gas was passed through a reaction tube having no impurity removal layer, and the concentration of siloxanes at the inlet of the reaction tube was measured.
  • the reaction gas was vaporized with 0.8 ml / min of water using a steam generator, and added with 7.5 ml / min of air to supply water vapor.
  • 40 ml / min of H 2 and 20.3 ml / min of O 2 were mixed and helium was further added at 2027.5 ml / min. Part of helium was used to supply D5, a kind of siloxane.
  • the reaction gas was allowed to flow into the impurity removal layer at 92 to 289 ° C.
  • the amount of the impurity removing material was 2.7 ml (3.76 g).
  • the reaction tube was filled with material 1 at the same position as in Example 1.
  • the recombination catalyst layer portion was filled with alumina wool.
  • the reaction gas introduced into the reaction tube passes through the impurity removal layer and reaches the outlet.
  • the H 2 concentration in the reaction gas that passed through the recombination catalyst layer was measured in the same manner as in Example 1.
  • the siloxanes were measured by collecting gas after condensing water vapor into water in an ice-cooled cooling bath and measuring with a mass spectrometer.
  • FIG. 6 is a graph showing the temperature of the material 1 (impurity removing material) and the D5 reduction rate 30 minutes after adding D5 to the reaction gas.
  • the D5 reduction rate is as low as 25.0% when the temperature of the material 1 is 92 ° C. (corresponding to the reaction gas temperature of 150 ° C. in Example 1), but is 86.8% at 180 ° C., 91.8% at 220 ° C. It was found to be 96.4% at 257 ° C. and 99.6% at 289 ° C.
  • methane CH 4
  • Degradation of D5 was suggested. Therefore, the effect of the material 1 is considered to decompose the adsorbed siloxane.
  • the present invention can be used for the treatment of radioactive gas waste at nuclear power plants.

Abstract

L'invention porte sur des impuretés contenues dans un déchet gazeux radioactif qui est déchargé à partir d'un réacteur nucléaire et qui peuvent être retirées pour empêcher la détérioration des performances d'un catalyseur de recombinaison dans un dispositif de recombinaison. L'invention porte également sur un procédé de traitement de déchets gazeux radioactifs dans lequel de l'hydrogène et de l'oxygène dans de la vapeur d'eau qui est contenue dans un déchet gazeux radioactif déchargé à partir d'un réacteur nucléaire dans une centrale nucléaire sont recombinés entre eux par utilisation d'un catalyseur. Le procédé les consiste à : amener les impuretés contenues dans un déchet gazeux radioactif (1) en contact avec un matériau de retrait d'impuretés (5) contenant au moins un matériau choisi parmi du ZrO2, de la silice mésoporeuse et du charbon actif pour retirer les impuretés ; et, à la suite du retrait des impuretés, amener les déchets gazeux radioactifs en contact avec un catalyseur (2) pour provoquer la recombinaison de l'hydrogène et de l'oxygène.
PCT/JP2011/051416 2010-01-27 2011-01-26 Procédé de traitement, installation de traitement et matériau de retrait d'impuretés pour déchets gazeux radioactifs WO2011093305A1 (fr)

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Cited By (5)

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JP2011203035A (ja) * 2010-03-25 2011-10-13 Hitachi-Ge Nuclear Energy Ltd 沸騰水型原子力プラント
JP2013186052A (ja) * 2012-03-09 2013-09-19 Ibiden Co Ltd 放射性物質を含む汚染水からセシウムを除去する方法、およびセシウム除去用のハニカム構造体
JP2013221890A (ja) * 2012-04-18 2013-10-28 Toshiba Corp 原子炉格納容器のベント装置及びベント方法
JP2014006221A (ja) * 2012-06-27 2014-01-16 Hitachi-Ge Nuclear Energy Ltd シロキサン分解材並びにこれを用いた気体廃棄物処理装置及び気体廃棄物の処理方法
JP2014083511A (ja) * 2012-10-25 2014-05-12 Hitachi-Ge Nuclear Energy Ltd シロキサン分解装置

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