WO2011085896A3 - Strömungsrohrreaktor zur umsetzung von siliziumtetrachlorid zu trichlorsilan - Google Patents

Strömungsrohrreaktor zur umsetzung von siliziumtetrachlorid zu trichlorsilan Download PDF

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Publication number
WO2011085896A3
WO2011085896A3 PCT/EP2010/069799 EP2010069799W WO2011085896A3 WO 2011085896 A3 WO2011085896 A3 WO 2011085896A3 EP 2010069799 W EP2010069799 W EP 2010069799W WO 2011085896 A3 WO2011085896 A3 WO 2011085896A3
Authority
WO
WIPO (PCT)
Prior art keywords
trichlorosilane
silicon tetrachloride
flow tube
tube reactor
converting silicon
Prior art date
Application number
PCT/EP2010/069799
Other languages
English (en)
French (fr)
Other versions
WO2011085896A2 (de
Inventor
Guido Stochniol
Günter Latoschinski
Yücel ÖNAL
Ingo Pauli
Alfons Bieker
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Priority to EP10793230A priority Critical patent/EP2526056A2/de
Priority to JP2012549270A priority patent/JP5635128B2/ja
Priority to KR1020127018698A priority patent/KR20120125470A/ko
Priority to US13/521,638 priority patent/US20130078176A1/en
Priority to CA2786420A priority patent/CA2786420A1/en
Priority to RU2012135373/05A priority patent/RU2012135373A/ru
Priority to CN2010800617622A priority patent/CN102725229A/zh
Publication of WO2011085896A2 publication Critical patent/WO2011085896A2/de
Publication of WO2011085896A3 publication Critical patent/WO2011085896A3/de

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/007—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor in the presence of catalytically active bodies, e.g. porous plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B01J19/2415—Tubular reactors
    • B01J19/2425—Tubular reactors in parallel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • B01J8/062—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes being installed in a furnace
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B01J2208/00415—Controlling the temperature using electric heating or cooling elements electric resistance heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00504—Controlling the temperature by means of a burner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00513—Controlling the temperature using inert heat absorbing solids in the bed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00157—Controlling the temperature by means of a burner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0263—Ceramic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/10—Process efficiency
    • Y02P20/129—Energy recovery, e.g. by cogeneration, H2recovery or pressure recovery turbines

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zur Umsetzung von Siliciumtetrachlorid mit Wasserstoff zu Trichlorsilan in einem Hydrodechlorierungsreaktor, wobei der Hydrodechlorierungsreaktor unter Druck betrieben wird und ein oder mehrere Reaktorrohre umfasst, die aus keramischem Material bestehen. Die Erfindung betrifft des Weiteren die Verwendung eines solchen Hydrodechlorierungsreaktors als integraler Bestandteil einer Anlage zur Herstellung von Trichlorsilan aus metallurgischem Silicium.
PCT/EP2010/069799 2010-01-18 2010-12-15 Strömungsrohrreaktor zur umsetzung von siliziumtetrachlorid zu trichlorsilan WO2011085896A2 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP10793230A EP2526056A2 (de) 2010-01-18 2010-12-15 Strömungsrohrreaktor zur umsetzung von siliziumtetrachlorid zu trichlorsilan
JP2012549270A JP5635128B2 (ja) 2010-01-18 2010-12-15 四塩化ケイ素を反応させてトリクロロシランを得るための流通管反応器
KR1020127018698A KR20120125470A (ko) 2010-01-18 2010-12-15 사염화규소를 트리클로로실란으로 전환시키기 위한 관형 흐름 반응기
US13/521,638 US20130078176A1 (en) 2010-01-18 2010-12-15 Flow tube reactor for conversion of silicon tetrachloride to trichlorosilane
CA2786420A CA2786420A1 (en) 2010-01-18 2010-12-15 Flow tube reactor for converting silicon tetrachloride to trichlorosilane
RU2012135373/05A RU2012135373A (ru) 2010-01-18 2010-12-15 Проточный трубчатый реактор для превращения тетрахлорида кремния до трихлорсилана
CN2010800617622A CN102725229A (zh) 2010-01-18 2010-12-15 用于将四氯化硅转化成三氯硅烷的流动管反应器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010000978.4 2010-01-18
DE102010000978A DE102010000978A1 (de) 2010-01-18 2010-01-18 Strömungsrohrreaktor zur Umsetzung von Siliciumtetrachlorid zu Trichlorsilan

Publications (2)

Publication Number Publication Date
WO2011085896A2 WO2011085896A2 (de) 2011-07-21
WO2011085896A3 true WO2011085896A3 (de) 2011-10-13

Family

ID=43920904

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2010/069799 WO2011085896A2 (de) 2010-01-18 2010-12-15 Strömungsrohrreaktor zur umsetzung von siliziumtetrachlorid zu trichlorsilan

Country Status (10)

Country Link
US (1) US20130078176A1 (de)
EP (1) EP2526056A2 (de)
JP (1) JP5635128B2 (de)
KR (1) KR20120125470A (de)
CN (1) CN102725229A (de)
CA (1) CA2786420A1 (de)
DE (1) DE102010000978A1 (de)
RU (1) RU2012135373A (de)
TW (1) TW201139272A (de)
WO (1) WO2011085896A2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
DE102009048087A1 (de) 2009-10-02 2011-04-07 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Hydridosilane
DE102010039267A1 (de) * 2010-08-12 2012-02-16 Evonik Degussa Gmbh Verwendung eines Reaktors mit integriertem Wärmetauscher in einem Verfahren zur Hydrodechlorierung von Siliziumtetrachlorid
DE102011002749A1 (de) * 2011-01-17 2012-07-19 Wacker Chemie Ag Verfahren und Vorrichtung zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan
WO2012130547A1 (de) * 2011-03-25 2012-10-04 Evonik Degussa Gmbh Verwendung von siliziumcarbidrohren mit flansch- oder bördelende
DE102012223784A1 (de) * 2012-12-19 2014-06-26 Wacker Chemie Ag Verfahren zur Konvertierung von Siliciumtetrachlorid in Trichlorsilan
US9643851B2 (en) 2013-09-30 2017-05-09 Lg Chem, Ltd. Method for producing trichlorosilane
WO2015047043A1 (ko) * 2013-09-30 2015-04-02 주식회사 엘지화학 트리클로로실란 제조방법
WO2015138512A1 (en) * 2014-03-10 2015-09-17 Sitec Gmbh Hydrochlorination reactor
EP3075707A1 (de) * 2015-04-02 2016-10-05 Evonik Degussa GmbH Verfahren zur hydrierung von siliciumtetrachlorid zu trichlorsilan durch ein gasgemisch von wasserstoff und chlorwasserstoff
CN109963645B (zh) * 2016-11-23 2022-03-11 瓦克化学股份公司 用于氢化四氯化硅的方法
CN106813264A (zh) * 2017-04-01 2017-06-09 东方宏海新能源科技发展有限公司 一种高效燃烧器
CN109647290B (zh) * 2018-12-10 2021-08-24 浙江工业大学 纳米二氧化猛/氧化铝复合涂层管式反应器及其制备方法和应用

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3024319A1 (de) * 1980-06-27 1982-01-28 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Kontinuierliches verfahren zur herstellung von trichlorsilan
DE19654154A1 (de) * 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
EP1454670A1 (de) * 2003-03-03 2004-09-08 Hemlock Semiconductor Corporation Vorrichtung zum Berühren von Hochtemperaturgasen
WO2005102928A1 (de) * 2004-04-23 2005-11-03 Degussa Ag VERFAHREN ZUR HERSTELLUNG VON HSiCl3 DURCH KATALYTISCHE HYDRODEHALOGENIERUNG VON SiCl4
EP1775263A1 (de) * 2005-09-29 2007-04-18 Wacker Chemie AG Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
EP2014618A1 (de) * 2006-10-31 2009-01-14 Mitsubishi Materials Corporation Vorrichtung zur herstellung von trichlorsilan
EP2088124A1 (de) * 2006-11-30 2009-08-12 Mitsubishi Materials Corporation Verfahren zur herstellung von trichlorsilan und vorrichtung zur herstellung von trichlorsilan

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3024320A1 (de) * 1980-06-27 1982-04-01 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Vorrichtung zur hochtemperaturbehandlung von gasen
JPS57129817A (en) * 1981-01-30 1982-08-12 Osaka Titanium Seizo Kk Manufacture of trichlorosilane
DE102005005044A1 (de) * 2005-02-03 2006-08-10 Consortium für elektrochemische Industrie GmbH Verfahren zur Herstellung von Trichlorsilan mittels thermischer Hydrierung von Siliciumtetrachlorid

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3024319A1 (de) * 1980-06-27 1982-01-28 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Kontinuierliches verfahren zur herstellung von trichlorsilan
DE19654154A1 (de) * 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
EP1454670A1 (de) * 2003-03-03 2004-09-08 Hemlock Semiconductor Corporation Vorrichtung zum Berühren von Hochtemperaturgasen
WO2005102928A1 (de) * 2004-04-23 2005-11-03 Degussa Ag VERFAHREN ZUR HERSTELLUNG VON HSiCl3 DURCH KATALYTISCHE HYDRODEHALOGENIERUNG VON SiCl4
EP1775263A1 (de) * 2005-09-29 2007-04-18 Wacker Chemie AG Verfahren und Vorrichtung zur Hydrierung von Chlorsilanen
EP2014618A1 (de) * 2006-10-31 2009-01-14 Mitsubishi Materials Corporation Vorrichtung zur herstellung von trichlorsilan
EP2088124A1 (de) * 2006-11-30 2009-08-12 Mitsubishi Materials Corporation Verfahren zur herstellung von trichlorsilan und vorrichtung zur herstellung von trichlorsilan

Also Published As

Publication number Publication date
TW201139272A (en) 2011-11-16
KR20120125470A (ko) 2012-11-15
WO2011085896A2 (de) 2011-07-21
EP2526056A2 (de) 2012-11-28
JP2013517207A (ja) 2013-05-16
RU2012135373A (ru) 2014-03-10
CN102725229A (zh) 2012-10-10
US20130078176A1 (en) 2013-03-28
JP5635128B2 (ja) 2014-12-03
CA2786420A1 (en) 2011-07-21
DE102010000978A1 (de) 2011-07-21

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