WO2011050889A2 - Verfahren zur herstellung von solarzellen mit selektivem emitter - Google Patents
Verfahren zur herstellung von solarzellen mit selektivem emitter Download PDFInfo
- Publication number
- WO2011050889A2 WO2011050889A2 PCT/EP2010/006016 EP2010006016W WO2011050889A2 WO 2011050889 A2 WO2011050889 A2 WO 2011050889A2 EP 2010006016 W EP2010006016 W EP 2010006016W WO 2011050889 A2 WO2011050889 A2 WO 2011050889A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- etching
- psg
- phosphoric acid
- paste
- solar cells
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 238000005530 etching Methods 0.000 claims abstract description 122
- 238000000034 method Methods 0.000 claims abstract description 101
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 40
- 239000010703 silicon Substances 0.000 claims abstract description 40
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims abstract description 39
- 238000009792 diffusion process Methods 0.000 claims abstract description 33
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 31
- 238000000151 deposition Methods 0.000 claims abstract description 31
- 230000008021 deposition Effects 0.000 claims abstract description 30
- 239000011574 phosphorus Substances 0.000 claims abstract description 29
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 29
- 238000007650 screen-printing Methods 0.000 claims abstract description 24
- 239000000203 mixture Substances 0.000 claims abstract description 21
- 238000009413 insulation Methods 0.000 claims abstract description 20
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 19
- 238000004140 cleaning Methods 0.000 claims abstract description 19
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 19
- 238000005245 sintering Methods 0.000 claims abstract description 19
- 239000005368 silicate glass Substances 0.000 claims abstract description 14
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 50
- 230000008569 process Effects 0.000 claims description 49
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 25
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 22
- 238000001465 metallisation Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 13
- 239000005360 phosphosilicate glass Substances 0.000 claims description 13
- 239000002562 thickening agent Substances 0.000 claims description 9
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims description 8
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 claims description 8
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 6
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- 239000011877 solvent mixture Substances 0.000 claims description 6
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 5
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 5
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- OYLRFHLPEAGKJU-UHFFFAOYSA-N phosphane silicic acid Chemical compound P.[Si](O)(O)(O)O OYLRFHLPEAGKJU-UHFFFAOYSA-N 0.000 claims description 4
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 239000001863 hydroxypropyl cellulose Substances 0.000 claims description 3
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 claims description 3
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- 239000006117 anti-reflective coating Substances 0.000 claims 3
- 239000004071 soot Substances 0.000 claims 1
- 230000000873 masking effect Effects 0.000 abstract description 15
- 238000005334 plasma enhanced chemical vapour deposition Methods 0.000 abstract 2
- 229910004205 SiNX Inorganic materials 0.000 abstract 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 53
- 235000012431 wafers Nutrition 0.000 description 45
- 239000000243 solution Substances 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 239000011521 glass Substances 0.000 description 8
- 238000007639 printing Methods 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 238000002955 isolation Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000003667 anti-reflective effect Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000839 emulsion Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000008240 homogeneous mixture Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000002800 charge carrier Substances 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000005231 Edge Defined Film Fed Growth Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 238000010344 co-firing Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 241000282461 Canis lupus Species 0.000 description 1
- 241000238631 Hexapoda Species 0.000 description 1
- -1 Phosphorus silicates Chemical class 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 238000007704 wet chemistry method Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/504,504 US8723340B2 (en) | 2009-10-30 | 2010-10-01 | Process for the production of solar cells comprising a selective emitter |
CN201080048001.3A CN102859707B (zh) | 2009-10-30 | 2010-10-01 | 用于制造具有选择性发射极的太阳能电池的方法 |
EP10770991A EP2494615A2 (de) | 2009-10-30 | 2010-10-01 | Verfahren zur herstellung von solarzellen mit selektivem emitter |
JP2012535648A JP5628931B2 (ja) | 2009-10-30 | 2010-10-01 | 選択エミッタを含む、ソーラーセルの製造方法 |
HK13107272.9A HK1180106A1 (zh) | 2009-10-30 | 2013-06-21 | 用於製造具有選擇性發射極的太陽能電池的方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09013676 | 2009-10-30 | ||
EP09013676.3 | 2009-10-30 | ||
EP10002692 | 2010-03-15 | ||
EP10002692.1 | 2010-03-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011050889A2 true WO2011050889A2 (de) | 2011-05-05 |
WO2011050889A3 WO2011050889A3 (de) | 2012-05-03 |
Family
ID=43922663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2010/006016 WO2011050889A2 (de) | 2009-10-30 | 2010-10-01 | Verfahren zur herstellung von solarzellen mit selektivem emitter |
Country Status (9)
Country | Link |
---|---|
US (1) | US8723340B2 (de) |
EP (1) | EP2494615A2 (de) |
JP (1) | JP5628931B2 (de) |
KR (1) | KR20120093313A (de) |
CN (1) | CN102859707B (de) |
HK (1) | HK1180106A1 (de) |
MY (1) | MY163052A (de) |
TW (1) | TWI440203B (de) |
WO (1) | WO2011050889A2 (de) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2577748A2 (de) * | 2010-06-03 | 2013-04-10 | Suniva, Inc. | Solarzellen mit selektivem emitter, die durch einen hybriddifusions- und ionenimplantationsvorgang gebildet werden |
CN103165758A (zh) * | 2013-04-01 | 2013-06-19 | 南通大学 | 一种基于逆扩散的太阳能电池选择性掺杂方法 |
JP2013140943A (ja) * | 2011-12-06 | 2013-07-18 | Tokyo Ohka Kogyo Co Ltd | エッチングマスク用組成物およびパターン形成方法 |
JP2013225583A (ja) * | 2012-04-20 | 2013-10-31 | Mitsubishi Electric Corp | 太陽電池の製造方法 |
EP2709161A3 (de) * | 2012-09-14 | 2014-04-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum zumindest bereichsweisen Einebnen einer Textur einer Halbleiterstruktur |
CN103890139A (zh) * | 2011-10-19 | 2014-06-25 | 东友精细化工有限公司 | 结晶性硅晶片的织构蚀刻液组合物及织构蚀刻方法 |
WO2014101989A1 (de) * | 2012-12-28 | 2014-07-03 | Merck Patent Gmbh | Dotiermedien zur lokalen dotierung von siliziumwafern |
JP2015522951A (ja) * | 2012-06-25 | 2015-08-06 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | 局所背面電界(lbsf)を有する太陽電池の製造方法 |
CN105529381A (zh) * | 2015-12-09 | 2016-04-27 | 常州天合光能有限公司 | 一种高效太阳电池的制备方法 |
CN105576083A (zh) * | 2016-03-11 | 2016-05-11 | 泰州中来光电科技有限公司 | 一种基于apcvd技术的n型双面太阳能电池及其制备方法 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102969390B (zh) * | 2012-08-27 | 2015-03-11 | 横店集团东磁股份有限公司 | 一种太阳能晶硅电池的开窗工艺 |
CN102800755A (zh) * | 2012-08-27 | 2012-11-28 | 英利能源(中国)有限公司 | 太阳能电池正面电极的制备方法 |
TWI643351B (zh) * | 2013-01-31 | 2018-12-01 | 澳洲商新南創新有限公司 | 太陽能電池金屬化及互連方法 |
JP2015005621A (ja) * | 2013-06-20 | 2015-01-08 | 株式会社ノリタケカンパニーリミテド | 太陽電池用基板およびその製造方法 |
FR3018391B1 (fr) * | 2014-03-07 | 2016-04-01 | Commissariat Energie Atomique | Procede de realisation d’une cellule photovoltaique a dopage selectif |
CR20170028A (es) | 2014-06-27 | 2017-09-28 | Vidrio Plano Mexico Sa De Cv | Proceso de fabricación de láminas de vidrio con acabado difuso y lámina de vidrio resultante |
JP6359394B2 (ja) * | 2014-09-18 | 2018-07-18 | 国立研究開発法人産業技術総合研究所 | 半導体装置とその製造方法 |
US9246046B1 (en) * | 2014-09-26 | 2016-01-26 | Sunpower Corporation | Etching processes for solar cell fabrication |
CN109192811B (zh) * | 2018-08-09 | 2020-06-09 | 江苏辉伦太阳能科技有限公司 | 一种se电池的制备方法 |
CN114830357B (zh) * | 2019-12-19 | 2024-03-15 | 株式会社钟化 | 太阳能电池的制造方法 |
CN112349809B (zh) * | 2020-10-22 | 2023-06-06 | 泰州中来光电科技有限公司 | 一种局域发射极的太阳能电池及其制备方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4252865A (en) | 1978-05-24 | 1981-02-24 | National Patent Development Corporation | Highly solar-energy absorbing device and method of making the same |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19910816A1 (de) * | 1999-03-11 | 2000-10-05 | Merck Patent Gmbh | Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern |
IL152497A0 (en) * | 2000-04-28 | 2003-05-29 | Merck Patent Gmbh | Etching pastes for inorganic surfaces |
DE102005032807A1 (de) * | 2005-07-12 | 2007-01-18 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien für Siliziumdioxidschichten und darunter liegendes Silizium |
CA2623382A1 (en) | 2005-09-23 | 2007-04-05 | Tom Rust | Systems and methods for manufacturing photovoltaic devices |
DE102006051952A1 (de) * | 2006-11-01 | 2008-05-08 | Merck Patent Gmbh | Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten |
CN101743640B (zh) * | 2007-07-26 | 2012-12-19 | 康斯坦茨大学 | 具有回蚀刻发射极的硅太阳能电池的制造方法和相应的太阳能电池 |
US20090223549A1 (en) * | 2008-03-10 | 2009-09-10 | Calisolar, Inc. | solar cell and fabrication method using crystalline silicon based on lower grade feedstock materials |
US8110431B2 (en) * | 2010-06-03 | 2012-02-07 | Suniva, Inc. | Ion implanted selective emitter solar cells with in situ surface passivation |
US8071418B2 (en) * | 2010-06-03 | 2011-12-06 | Suniva, Inc. | Selective emitter solar cells formed by a hybrid diffusion and ion implantation process |
-
2010
- 2010-10-01 KR KR1020127013909A patent/KR20120093313A/ko not_active Application Discontinuation
- 2010-10-01 EP EP10770991A patent/EP2494615A2/de not_active Withdrawn
- 2010-10-01 US US13/504,504 patent/US8723340B2/en not_active Expired - Fee Related
- 2010-10-01 JP JP2012535648A patent/JP5628931B2/ja not_active Expired - Fee Related
- 2010-10-01 WO PCT/EP2010/006016 patent/WO2011050889A2/de active Application Filing
- 2010-10-01 CN CN201080048001.3A patent/CN102859707B/zh not_active Expired - Fee Related
- 2010-10-01 MY MYPI2012700218A patent/MY163052A/en unknown
- 2010-10-29 TW TW099137349A patent/TWI440203B/zh not_active IP Right Cessation
-
2013
- 2013-06-21 HK HK13107272.9A patent/HK1180106A1/zh not_active IP Right Cessation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4252865A (en) | 1978-05-24 | 1981-02-24 | National Patent Development Corporation | Highly solar-energy absorbing device and method of making the same |
Non-Patent Citations (5)
Title |
---|
A. DASTGHEIB-SHIRAZI ET AL.: "Selective Emitter for Industrial Solar Cell Production: A Wet Chemical Approach Using a Single Side Diffusion Process", PROC. 23D. EU PVSEC, 2008, pages 1197 |
DIETL J.; HELMREICH D.; SIRTL E.: "Crystals : Growth, Properties and Applications", vol. 5, 1981, SPRINGER VERLAG, pages: 57,73 |
P. FERRADA ET AL.: "Diffusion through semitransparent barriers on p-type silicon wafers", INTERNATIONAL SOLAR ENERGY RESEARCH CENTER - ISC KONSTANZ, 21 September 2009 (2009-09-21) |
VON DASTGHEIB-SHIRAZI, A. ET AL.: "INSECT: An inline selective emitter concept with efficiencies at at competitive process costs improved with inkjet masking process", PREPRINT 24TH EU PVSEC, 21 September 2009 (2009-09-21) |
WALD, F. V.: "Crystals : Growth, Properties and Applications", vol. 5, 1981, SPRINGER VERLAG, pages: 157 |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2577748A2 (de) * | 2010-06-03 | 2013-04-10 | Suniva, Inc. | Solarzellen mit selektivem emitter, die durch einen hybriddifusions- und ionenimplantationsvorgang gebildet werden |
CN103890139A (zh) * | 2011-10-19 | 2014-06-25 | 东友精细化工有限公司 | 结晶性硅晶片的织构蚀刻液组合物及织构蚀刻方法 |
JP2013140943A (ja) * | 2011-12-06 | 2013-07-18 | Tokyo Ohka Kogyo Co Ltd | エッチングマスク用組成物およびパターン形成方法 |
JP2013225583A (ja) * | 2012-04-20 | 2013-10-31 | Mitsubishi Electric Corp | 太陽電池の製造方法 |
JP2015522951A (ja) * | 2012-06-25 | 2015-08-06 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung | 局所背面電界(lbsf)を有する太陽電池の製造方法 |
EP2709161A3 (de) * | 2012-09-14 | 2014-04-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum zumindest bereichsweisen Einebnen einer Textur einer Halbleiterstruktur |
WO2014101989A1 (de) * | 2012-12-28 | 2014-07-03 | Merck Patent Gmbh | Dotiermedien zur lokalen dotierung von siliziumwafern |
US10134942B2 (en) | 2012-12-28 | 2018-11-20 | Merck Patent Gmbh | Doping media for the local doping of silicon wafers |
CN103165758A (zh) * | 2013-04-01 | 2013-06-19 | 南通大学 | 一种基于逆扩散的太阳能电池选择性掺杂方法 |
CN103165758B (zh) * | 2013-04-01 | 2015-08-26 | 南通大学 | 一种基于逆扩散的太阳能电池选择性掺杂方法 |
CN105529381A (zh) * | 2015-12-09 | 2016-04-27 | 常州天合光能有限公司 | 一种高效太阳电池的制备方法 |
CN105529381B (zh) * | 2015-12-09 | 2018-09-18 | 天合光能股份有限公司 | 一种高效太阳电池的制备方法 |
CN105576083A (zh) * | 2016-03-11 | 2016-05-11 | 泰州中来光电科技有限公司 | 一种基于apcvd技术的n型双面太阳能电池及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
HK1180106A1 (zh) | 2013-10-11 |
JP2013509695A (ja) | 2013-03-14 |
TWI440203B (zh) | 2014-06-01 |
WO2011050889A3 (de) | 2012-05-03 |
TW201133913A (en) | 2011-10-01 |
CN102859707A (zh) | 2013-01-02 |
JP5628931B2 (ja) | 2014-11-19 |
MY163052A (en) | 2017-08-15 |
KR20120093313A (ko) | 2012-08-22 |
EP2494615A2 (de) | 2012-09-05 |
CN102859707B (zh) | 2016-02-24 |
US8723340B2 (en) | 2014-05-13 |
US20120214270A1 (en) | 2012-08-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2011050889A2 (de) | Verfahren zur herstellung von solarzellen mit selektivem emitter | |
EP2865018A1 (de) | Verfahren zur herstellung von solarzellen mit local back surface field (lbsf) | |
EP2377169A2 (de) | Solarzelle und verfahren zur herstellung einer solarzelle aus einem siliziumsubstrat | |
DE69731485T2 (de) | Halbleitervorrichtung mit selektiv diffundierten bereichen | |
WO2010099863A2 (de) | Beidseitig kontaktierte solarzellen sowie verfahren zu deren herstellung | |
DE112005002592T5 (de) | Rückseitenkontakt-Photovoltaikzellen | |
EP2683777A2 (de) | Aluminiumoxid basierte metallisierungsbarriere | |
JP2013509695A5 (de) | ||
EP2583314B1 (de) | Verfahren zur herstellung einer metallischen kontaktstruktur einer photovoltaischen solarzelle | |
EP2404323A2 (de) | Solarzellen mit rückseitenkontaktierung sowie verfahren zu deren herstellung | |
EP2561557B1 (de) | Verfahren zur herstellung einer solarzelle | |
EP2368272A1 (de) | Verfahren zur herstellung eines metallkontakts auf einem mit einer schicht versehenen halbleitersubstrat | |
EP2652802A2 (de) | Verfahren zur herstellung von siliziumsolarzellen mit vorderseitiger textur und glatter rückseitenoberfläche | |
DE102010024307A1 (de) | Verfahren zur Herstellung einer metallischen Kontaktstruktur einer photovoltaischen Solarzelle | |
WO2010049229A2 (de) | Verfahren zur herstellung einer solarzelle und solarzelle | |
DE112011104815T5 (de) | Solarbatteriezelle, Herstellungsverfahren für diese und Solarbatteriemodul | |
DE102011115581B4 (de) | Verfahren zur Herstellung einer Solarzelle | |
KR20160005348A (ko) | 후면 패시베이션 층을 갖는 광전지 | |
EP3284109A1 (de) | Verfahren zur herstellung von solarzellen unter verwendung von phosphor-diffusionshemmenden, druckbaren dotiermedien | |
WO2011116762A2 (de) | Herstellungsverfahren einer halbleitersolarzelle | |
DE112017004982B4 (de) | Solarzellen mit differenziertem p-Typ- und n-Typ-Bereichsarchitekturen | |
DE102010020557A1 (de) | Verfahren zur Herstellung einer einseitig kontaktierbaren Solarzelle aus einem Silizium-Halbleitersubstrat | |
DE102011115532A1 (de) | Verfahren zur Herstellung eines texturierten Siliziumsubstrats | |
DE102011052261B4 (de) | Verfahren zum Herstellen einer Solarzelle, Solarzelle und Solarmodul | |
WO2016150549A2 (de) | Druckbare tinte zur verwendung als diffusions- und legierungsbarriere zur herstellung von hocheffizienten kristallinen siliziumsolarzellen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201080048001.3 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10770991 Country of ref document: EP Kind code of ref document: A1 |
|
REEP | Request for entry into the european phase |
Ref document number: 2010770991 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010770991 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012535648 Country of ref document: JP Ref document number: 13504504 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1291/KOLNP/2012 Country of ref document: IN |
|
ENP | Entry into the national phase |
Ref document number: 20127013909 Country of ref document: KR Kind code of ref document: A |