WO2011030905A1 - Taが添加されたNi3(Si,Ti)系金属間化合物 - Google Patents
Taが添加されたNi3(Si,Ti)系金属間化合物 Download PDFInfo
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- WO2011030905A1 WO2011030905A1 PCT/JP2010/065839 JP2010065839W WO2011030905A1 WO 2011030905 A1 WO2011030905 A1 WO 2011030905A1 JP 2010065839 W JP2010065839 W JP 2010065839W WO 2011030905 A1 WO2011030905 A1 WO 2011030905A1
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- 229910000765 intermetallic Inorganic materials 0.000 title claims abstract description 104
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 101
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 96
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 39
- 239000000203 mixture Substances 0.000 claims abstract description 34
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 32
- 239000012535 impurity Substances 0.000 claims abstract description 19
- 239000006185 dispersion Substances 0.000 claims description 8
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 239000000463 material Substances 0.000 abstract description 21
- 239000002270 dispersing agent Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 136
- 239000000523 sample Substances 0.000 description 129
- 230000000052 comparative effect Effects 0.000 description 38
- 238000012360 testing method Methods 0.000 description 25
- 239000000956 alloy Substances 0.000 description 20
- 229910045601 alloy Inorganic materials 0.000 description 19
- 238000002474 experimental method Methods 0.000 description 17
- 238000007545 Vickers hardness test Methods 0.000 description 15
- 238000002441 X-ray diffraction Methods 0.000 description 15
- 238000013507 mapping Methods 0.000 description 15
- 230000003647 oxidation Effects 0.000 description 15
- 238000007254 oxidation reaction Methods 0.000 description 15
- 238000005259 measurement Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 11
- 238000004453 electron probe microanalysis Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 7
- 238000009864 tensile test Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 5
- 238000011038 discontinuous diafiltration by volume reduction Methods 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000000470 constituent Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052735 hafnium Inorganic materials 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000005728 strengthening Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005495 investment casting Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/03—Alloys based on nickel or cobalt based on nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
- C22C1/023—Alloys based on nickel
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/007—Alloys based on nickel or cobalt with a light metal (alkali metal Li, Na, K, Rb, Cs; earth alkali metal Be, Mg, Ca, Sr, Ba, Al Ga, Ge, Ti) or B, Si, Zr, Hf, Sc, Y, lanthanides, actinides, as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C21/00—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/04—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of aluminium or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/66—Current collectors
- H01G11/68—Current collectors characterised by their material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G11/00—Hybrid capacitors, i.e. capacitors having different positive and negative electrodes; Electric double-layer [EDL] capacitors; Processes for the manufacture thereof or of parts thereof
- H01G11/66—Current collectors
- H01G11/70—Current collectors characterised by their structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
- H01M4/661—Metal or alloys, e.g. alloy coatings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/13—Energy storage using capacitors
Definitions
- the present invention relates to a nickel-based intermetallic compound to which Ta is added, and in particular, an intermetallic compound having a basic composition of Ni 3 (Si, Ti) (hereinafter referred to as “Ni 3 (Si, Ti) -based intermetallic compound”) Call).
- Ni 3 Si intermetallic compounds which are nickel-based intermetallic compounds, have excellent properties such as high-temperature strength, corrosion resistance, and oxidation resistance.
- Ni 3 Si intermetallic compounds are liable to cause intergranular cracking, there is a need for intermetallic compounds that are easier to plastically process at room temperature. Therefore, research and development for improving this Ni 3 Si intermetallic compound is underway.
- a Ni 3 (Si, Ti) -based intermetallic compound that is a nickel-based intermetallic compound is known as an intermetallic compound having workability, particularly room temperature ductility (see, for example, Non-Patent Documents 1 and 2). .
- Such Ni 3 (Si, Ti) -based intermetallic compound contains, for example, Ni, Si, Ti, C as a nickel-based intermetallic compound for casting, and further contains either or both of Hf and Zr. It is known that an intermetallic compound is included, and this intermetallic compound exhibits good castability as a timepiece-side member or the like (suitable for a die-cast method or a lost wax method) (for example, Patent Document 1). reference).
- an intermetallic compound containing Ni, Si, Ti, Cu, Ta, and B as a Ni 3 (Si, Ti) -based alloy material that has excellent corrosion resistance and has sufficient ductility and workability sufficient as a structural material Is known (see, for example, Patent Document 2). This intermetallic compound is combined with Ta and Cu to ensure good ductility and is useful as a structural material for a sulfuric acid purification apparatus.
- nickel-based intermetallic compounds when used as structural materials, it is desired to further improve mechanical and chemical characteristics.
- a structure formed of a nickel-based intermetallic compound is manufactured by, for example, plastic working in addition to the precision casting method, improvement in workability such as ductility is desired.
- the nickel-based intermetallic compound when used in an apparatus that handles acid, it is desirable to maintain chemical characteristics. Therefore, a nickel-based intermetallic compound having sufficient chemical properties and mechanical properties (for example, ductility) is desired.
- the present invention has been made in view of such circumstances, and provides a nickel-based intermetallic compound having sufficient chemical characteristics and mechanical characteristics. Moreover, this invention provides the structural material provided with the outstanding hardness (strength) characteristic, and also provides the structural material provided with the outstanding abrasion resistance.
- Ni 3 (Si, Ti) -based intermetallic compound characterized by having a structure composed of a second phase dispersion.
- the inventors of the present invention have invented adding a refractory metal element instead of Ti in consideration of the fact that Ti in Ni 3 (Si, Ti) is a factor that degrades oxidation resistance. And we conducted intensive research on this idea.
- the Ni 3 (Si, Ti) -based intermetallic compound further containing Ta has a hardness (strength) superior to the intermetallic compound composed of Ni, Si, and Ti.
- the present invention has been completed. Since the Ni 3 (Si, Ti) -based intermetallic compound of the present invention has excellent hardness (strength), it can be suitably used for structural materials such as machine elements.
- An embodiment of the present invention will be described below. The configuration shown in the following description is an exemplification, and the scope of the present invention is not limited to that shown in the following description. In this specification, “ ⁇ ” includes an end point.
- Example Sample 2 3 is a SEM photograph of Example Sample 2.
- 3 is an X-ray diffraction profile of Example Sample 2.
- the upper row is an X-ray diffraction profile of an Hf-added sample (reference sample) which is an example of a comparative sample, and the lower row is an X-ray diffraction profile of Example Sample 2.
- 4 is an EPMA element mapping diagram of Example Sample 2.
- FIG. It is the result of the Vickers test in the demonstration experiment 1, and is a graph showing the relationship between the Vickers hardness and the content of Ta.
- It is a SEM photograph of a comparative example sample and an example sample.
- 7 is an X-ray diffraction profile of a comparative sample and example samples 1 to 7.
- FIG. 6 is an EPMA element mapping diagram of Example Sample 7.
- FIG. It is a graph which shows the result of the Vickers hardness test of the demonstration experiment 2, and is a graph which showed the relationship between Vickers hardness and content of Ta. It is the graph which showed the relationship between content of Ta, Vickers hardness, and a lattice constant. It is a graph which shows the change of the Vickers hardness in the high temperature of a comparative example sample and Example samples 2, 4 and 7. It is a graph which shows the relationship between Ta content of a sample, tensile strength (Tensile Strength), 0.2% yield strength (0.2% Proof Stress), and elongation (Elongation).
- FIG. It is a photograph which shows the fracture surface of the comparative example sample after an tensile test, and the Example samples 5 and 7.
- FIG. It is a graph which shows the relationship between the amount of mass increase and time by the oxidation resistance test of a comparative example sample and Example samples 2, 4 and 7.
- the Ni 3 (Si, Ti) -based intermetallic compound of the present invention includes Ni as a main component, 7.5 to 12.5 atomic% Si, and 1.5 to 10.5 atomic%. It is characterized by containing 25 to 500 ppm by weight of B with respect to the weight of the intermetallic compound having a composition of 100 atomic% in total including Ti and 1.0 to 10.0 atomic% Ta.
- Ni 3 (Si, Ti) -based intermetallic compound having excellent hardness (strength) is provided.
- the Vickers hardness in the temperature range from room temperature to 800 ° C. may be 410 to 520.
- the Vickers hardness is measured at a load of 300 g, 500 g, or 1 kg.
- the main components are Ni, 10.0-12.0 atomic% Si, 1.5-9.5 atomic% Ti, and 1.0-9.0 atomic% Ta.
- a total of 100 atomic% containing Ni as the main component, 10.0-12.0 atomic% Si, 2.5-8.5 atomic% Ti and 1.0-7.0 atomic% Ta may be a Ni 3 (Si, Ti) intermetallic compound containing 25 to 100 ppm by weight of B with respect to the weight of the intermetallic compound having the composition.
- the main components are Ni, 10.0-12.0 atomic% Si, 2.5-6.5 atomic% Ti, and 3.0-7.0 atomic% Ta.
- the composition of Ni as the main component, 10.0 to 12.0 at% Si, and Ti and Ta including 9.0 to 11.5 at% in total includes 100 at% in total.
- the Ni 3 (Si, Ti) -based intermetallic compound of the present invention is 10.0 to 12.0 atomic% Si, 1.5 to 7.5 atomic% Ti, Containing 25 to 500 ppm by weight of B with respect to the weight of the intermetallic compound having a total composition of 100 atomic%, more than 2.0 and not more than 8.0 atomic% Ta, with the balance being made of Ni excluding impurities, L1 2 phase composed of tissue, or L1 2 and phase, characterized by having a structure composed of a second phase dispersion containing Ni and Ta.
- an Ni 3 (Si, Ti) intermetallic compound having excellent hardness (strength) and wear resistance is provided.
- Ni and Ta sliding parts for Ni 3 having a tissue and a second phase dispersion may be based intermetallic compound, the Ni 3 (Si, Ti) based intermetallic compound having the composition and tissue It may be used as a sliding part material (or wear-resistant metal material).
- Ni 3 (Si, Ti) based cast intermetallic compounds cast Ni 3 (Si, A method of forming a sliding component with a Ti) -based intermetallic compound may be used.
- the sliding part is formed by cutting a cast Ni 3 (Si, Ti) intermetallic compound.
- a Ni 3 (Si, Ti) -based intermetallic compound containing 25 to 100 ppm by weight of B with respect to the weight of the intermetallic compound having a total composition of 100 atomic% made of Ni excluding impurities may be used.
- a Ni 3 (Si, Ti) -based intermetallic compound containing 25 to 100 ppm by weight of B with respect to the weight of the intermetallic compound having a composition of 100 atomic% may be used.
- Ni 3 (Si, Ti) -based intermetallic compound that is superior in hardness and resistant to wear is provided.
- an intermetallic compound having a composition of a total of 100 atomic% which is composed of 10.0 to 12.0 atomic% of Si, a total of 9.0 to 11.5 atomic% of Ti and Ta, and the balance is Ni except impurities Ni 3 (Si, Ti) -based intermetallic compound containing 25 to 100 ppm by weight of B with respect to the weight of the material, and has a Vickers hardness of 410 measured at a load of 300 g, 500 g, or 1 kg. ⁇ 520.
- the Vickers hardness may be measured at room temperature (about 25 ° C.).
- Ni 3 (Si, Ti) -based intermetallic compound that is superior in hardness is provided.
- the Ni 3 (Si, Ti) -based intermetallic compound of the present invention is 10.0 or more and 12.0 or less atomic percent Si, and 1.5 or more and less than 7.5 atomic percent Ti. , More than 2.0 and not more than 8.0 atomic% Ta, the balance being 25 to 500 ppm by weight of B with respect to the weight of the intermetallic compound having a total composition of 100 atomic% made of Ni excluding impurities. , L1 2 phase composed of tissue, or the L1 2 phase, a Ni 3 (Si, Ti) based intermetallic compound having a structure composed of a second phase dispersion containing Ni and Ta, Ta the maximum content It is characterized by 6.0 atomic%.
- Ni 3 (Si, Ti) -based intermetallic compound having excellent ductility or oxidation resistance is provided.
- Ni 3 (Si, Ti) -based intermetallic compounds of these inventions a total of 19.0 to 21.5 atomic% of Si, Ti and Ta, with the balance being Ni excluding impurities, a total of 100 atomic% It may be in a form containing 25 to 500 ppm by weight of B with respect to the weight of the intermetallic compound having the composition.
- the Ni content is approximately 78.5 to 81.0 atomic%, so that the structure consisting essentially of only the L1 2 phase, or substantially the L1 2 phase, Ni and A structure consisting only of the second phase dispersion containing Ta is formed. For this reason, while being excellent in hardness, it is excellent in abrasion resistance, ductility, or oxidation resistance.
- each element of these embodiments will be described in detail. In this specification, the description of “to” includes both ends of the numerical range unless otherwise specified.
- the content of Ni is, for example, 78.5 to 81.0 atomic%, and preferably 78.5 to 80.5 atomic%.
- the specific content of Ni is, for example, 78.5, 79.0, 79.5, 80.0, 80.5, or 81.0 atomic%.
- the range of the Ni content may be between any two of the numerical values exemplified here.
- the content of Si is 7.5 to 12.5 atomic%, preferably 10.0 to 12.0 atomic%. Specific contents of Si are, for example, 7.5, 8.0, 8.5, 9.0, 9.5, 10.0, 10.5, 11.0, 11.5, 12.0. Or 12.5 atomic%.
- the range of the Si content may be between any two of the numerical values exemplified here.
- the content of Ti is 1.5 to 10.5 atomic%, preferably 1.5 to 9.5 atomic%. More preferably, it is 2.5 to 6.5 atomic%.
- the specific content of Ti is, for example, 1.5, 2.0, 2.5, 3.0, 3.5, 4.0, 4.5, 5.0, 5.5, 6.0. 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5, 10.0 or 10.5 atomic%.
- the range of the Ti content may be between any two of the numerical values exemplified here. From the viewpoint of hardness and wear resistance, it is preferably 1.5 or more and less than 7.5 atom%, more preferably 1.5 to 5.5 atom%, still more preferably 2.5 to 5.5 atomic percent. If it is these ranges, it is excellent in hardness and abrasion resistance.
- the content of Ta is 1.0 to 10.0 atomic%, preferably 1.0 to 9.0 atomic%. More preferably, it is 3.0 to 7.0 atomic%.
- the specific content of Ta is, for example, 1.0, 1.5, 2.0, 2.5, 3.0, 1.5, 2.0, 2.5, 3.0, 3.5. , 4.0, 4.5, 5.0, 5.5, 6.0, 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5 or 10 0.0 atomic percent.
- the range of the content of Ta may be between any two of the numerical values exemplified here. From the viewpoint of hardness and wear resistance, it is preferably more than 2.0 and not more than 8.0 atomic%, more preferably 4.0 to 8.0 atomic%, and still more preferably 4.0. -7.0 atomic percent. If it is these ranges, it is excellent in hardness and abrasion resistance.
- the content of Ti and Ta may be 9.0 to 11.5 atomic% in total for Ti and Ta.
- the total content of Ti and Ta is 9.0, 9.5, 10.0, 10.5, 11.0, or 11.5 atomic%.
- the range of the content of Ti and Ta may be between any two of the numerical values exemplified here.
- Si, Ti, and Ta are 19.0 to 21.5 atomic% in total, and preferably 19.5 to 21.5 atomic%.
- the content of each element is appropriately adjusted so that the total content of Ni, Si, Ti, and Ta is 100 atomic%.
- the content of B is 25 to 500 ppm by weight, preferably 25 to 100 ppm by weight.
- the specific content of B is, for example, 25, 40, 50, 60, 75, 100, 150, 200, 300, 400, or 500 ppm by weight.
- the range of the B content may be between any two of the numerical values exemplified here.
- the specific composition of the intermetallic compound according to the embodiment of the present invention is, for example, one obtained by adding the above-mentioned content of B to the compositions shown in Tables 1 to 3.
- the Ni 3 (Si, Ti) -based intermetallic compound according to this embodiment may be substantially composed of Ni, Si, Ti, B, and Ta elements, or may contain other impurity elements.
- the impurity element is an unavoidable impurity, and may be a Ni 3 (Si, Ti) -based intermetallic compound substantially composed of only elements of Ni, Si, Ti, B, and Ta.
- the Ni 3 (Si, Ti) -based intermetallic compound according to one embodiment of the present invention is melted by heating the Ni, Si, Ti, and Ta metals in the proportions shown in the above embodiment, and this molten metal It is obtained by solidifying by cooling.
- the Ni 3 (Si, Ti) intermetallic compound obtained by solidification may be subjected to a homogenization heat treatment. By this treatment, element segregation can be eliminated and the structure can be made uniform.
- the Ni 3 (Si, Ti) -based intermetallic compound according to this embodiment may have a Vickers hardness of 410 to 520 measured with a load of 300 g. According to the embodiment of the present invention, a Ni 3 (Si, Ti) intermetallic compound having such Vickers hardness can be obtained.
- each metal (each purity is 99.9% by weight or more) and B were weighed so as to have eight kinds of compositions shown in Table 4.
- these weighed metals and B were melted and cast in an arc melting furnace to produce an ingot having a weight of about 130 g.
- the atmosphere of the arc melting furnace was evacuated in the melting chamber and then replaced with an inert gas (argon gas).
- the electrode used was a non-consumable tungsten electrode, and a water-cooled copper hearth was used as the mold.
- a sample containing Ta is an example of the present invention.
- the Ta content is 2 at.
- “Example Sample 2” is hereinafter referred to with a number indicating the content of “Example Sample” Ta.
- a sample containing no Ta is referred to as a “comparative sample”.
- FIG. 1 is an SEM photograph of Example Sample 2.
- Example Sample 2 exhibits a single-phase structure composed of crystal grains having a grain size of several hundred microns.
- the sample sample 2 had a Vickers hardness of 434 Hv.
- FIG. 2 is an X-ray diffraction profile of Example Sample 2.
- Ni 77.5 Si 11.0 Ti 9.5 Hf 2.0 +50 wt As a reference, Ni 77.5 Si 11.0 Ti 9.5 Hf 2.0 +50 wt.
- the X-ray diffraction profile of ppm (at% other than B. Hereinafter referred to as “Hf-added sample”) is also shown.
- the upper row is the X-ray diffraction profile of the Hf-added sample, and the lower row is the X-ray diffraction profile of Example Sample 2.
- Ni 3 (Si, Ti) Comparative Sample
- Ni 3 Hf the peak position of the profile of Ni 5 Hf.
- the (circle shape) point is the peak position of the profile with Ni 3 (Si, Ti)
- the triangle (triangle) point is Ni 3 Hf
- the square (square) point is Ni 5 Hf.
- the Hf-added sample shown here is produced by the same method as the example sample.
- Example Sample 2 matches the peak position of the Ni 3 (Si, Ti) profile.
- Example Sample 2 when because it is single-phase structure, from the results, the constituent phases of the example sample 2 can be identified as a L1 2 phase.
- the peak positions of the profiles of Ni 3 Hf and Ni 5 Hf matched the profile.
- the Hf-added sample had Ni 3 Hf and Ni 5 Hf phases dispersed therein.
- FIG. 3 is an EPMA element mapping diagram of Example Sample 2.
- the upper left figure of FIG. 3 is an SEM photograph, the upper right figure is a Ni mapping figure, the middle left figure is a Si mapping figure, the middle right figure is a Ti mapping figure, the lower left figure is a Ta mapping figure, and the lower right figure Is a B mapping diagram.
- any element mapping including Ni mapping has a uniform composition throughout the entire structure.
- point analysis was performed by this EPMA measurement, as shown in Table 5, the composition was almost as weighed.
- FIG. 4 shows the result.
- FIG. 4 is a graph showing the relationship between Vickers hardness and Ta content. The horizontal axis represents the Ta content, with the leftmost measurement point corresponding to the comparative sample and the other measurement points corresponding to the example sample.
- FIG. 5 is an SEM photograph of the comparative example sample and the example sample.
- FIG. 5 (1) is the comparative example sample
- (2) is the example sample 5
- (3) is the example sample 6,
- (4) is the example.
- 5 is a SEM photograph of Example Sample 7.
- (5) of FIG. 5 is the SEM photograph which expanded the 2nd phase of the Example sample 7.
- the comparative sample and the example sample 5 have a single-phase structure. From the observation of these samples and other examples, the Ta content was 5.0 at. Up to%, Ta was found to form a single phase structure by solid solution.
- Example Samples 6 and 7 are composed of a first phase and a second phase, and the second phase is dispersed in the first phase.
- the Ta content is 6.0 at. % (Example Sample 6)
- a small amount of plate-like second phase was observed (see FIG. 5 (5) for the shape)
- the Ta content was 7.0 at. % (Example Sample 7)
- a phenomenon was observed in which the volume fraction of the second phase (the proportion of the second phase in the structure) increased. It was also observed that when the second phase appeared, the crystal grain size of the L12 phase was slightly reduced due to the influence of the second phase.
- FIG. 6 shows X-ray diffraction profiles of the comparative sample and the example samples 1 to 7.
- the point of ⁇ is a point indicating the peak position of the profile of Ni 3 (Si, Ti) (this material is composed of L1 2 phase) which is a known material, The numerical value is the plane index of the diffraction crystal plane.
- FIG. 7 is an enlarged view of the X-ray diffraction profile of Example Sample 7, and is measured separately from FIG. 6 in order to identify the phase of Example Sample 7.
- the points marked with ⁇ (inverted triangle shape) are points indicating the peak positions of the Ni 3 (Si, Ti) profile.
- the ⁇ (circular shape) points indicate the peak positions of the Ni 3 Ta profile.
- the X-ray diffraction profile of each sample matches the peak position of the Ni 3 (Si, Ti) profile, and it can be seen that these samples are composed of the L1 2 phase.
- the single-phase structure of the comparative sample and the example samples 2 to 5 is the L1 2 phase, and the parent phase (second phase) of the example samples 6 and 7 is used.
- first phase occupying between phases it can be seen that a L1 2 phase.
- Example Sample 7 coincides with the peak position of the Ni 3 Ta profile in addition to Ni 3 (Si, Ti).
- Example Sample 7 L1 2 phase (first phase) and Ni 3 second phase of Ta (phase containing Ni and Ta) and de seen to be composed. From this result, it was identified that the second phase observed in FIG. 5 was Ni 3 Ta.
- Ni 3 (Si, Ti) and Ni 3 at a position other than the peak position in Ta profile a clear peak was not observed, the sample of Example 7 substantially L1 2 phase and Ni 3 Ta It was found to consist only of the second phase.
- FIG. 8 shows the result.
- FIG. 8 is an EPMA element mapping diagram of Example Sample 7.
- (1) in FIG. 8 is an SEM photograph (upper left figure), (2) is a mapping chart of Ni (upper center figure), (3) is a mapping chart of Si (upper right figure), and (4) is Ti.
- Mapping diagrams (lower center diagram) and (5) are Ta mapping diagrams (lower right diagram).
- the measurement region of this EPMA includes the first phase and the second phase. However, referring to the respective drawings in FIG. 8, they are contained in the respective phases. It can be seen that the amount of elements is different. For example, it can be seen that the contents of Ni, Si, and Ta differ between the two phases, and there is not much difference in the Ti content.
- Example Sample 7 In addition to Example Sample 7, each sample was also subjected to EPMA measurement, and a point analysis was performed on its parent phase (first phase). The results are shown in Table 6.
- the Ta content of the parent phase (first phase) in Example Samples 6 and 7 is 5.6 to 5.7 at. %
- the upper limit of the Ta content of the parent phase (first phase) is 5 to 6 at. %It can be seen that it is.
- the solid solubility limit of Ta in the Ni 3 (Si, Ti) alloy is 5 to 6 at. %It can be seen that it is.
- FIG. 9 shows the result.
- FIG. 9 is a graph showing the results of the Vickers hardness test of Demonstration Experiment 2, and is a graph showing the relationship between the Vickers hardness and the Ta content. Each axis is the same as in Experiment 1.
- the Ta content is 6.0 at. %
- the value of Vickers hardness increases with increasing Ta content, and the Ta content is 6.0 at. If it exceeds%, the value of Vickers hardness does not increase so much, and it is understood that it is almost constant. From the point analysis results of EPMA measurement in Table 6, it was found that the content of Ta in the matrix phase became almost constant when the solid solubility limit was exceeded. The results of this Vickers hardness test showed that the Ta content in the matrix phase It is considered that the content is almost constant and solid solution strengthening does not progress any further.
- FIG. 7 is a table showing the lattice constant of each sample
- FIG. 10 is a graph showing the relationship between the Ta content, Vickers hardness, and lattice constant.
- Lattice constants shown in Table 7 and FIG. 10 is a lattice constant of the crystal lattice of the L1 2 phase was calculated from the X-ray measurement results of FIG. 6 (Comparative Sample and X-ray diffraction profile of the example sample).
- the lattice constant tends to increase as the Vickers hardness increases. That is, the lattice distortion when Ta is dissolved in the L1 2 phase occurs, hardness by solid solution strengthening of the Ta is considered to have increased.
- FIG. 11 shows the results together with the results of the room temperature Vickers hardness test.
- FIG. 11 is a graph showing the change in Vickers hardness of each sample at a high temperature, and shows the change in Vickers hardness for the comparative sample and the example samples 2, 4 and 7.
- (1) is the comparative sample
- (2) is the example sample 2
- (3) is the example sample 4
- (4) is the Vickers hardness of the example sample 7.
- the example samples 2, 4 and 7 are harder than the comparative sample in all temperature ranges. From this result, it is understood that the hardness of the alloy can be improved in all temperature ranges by including Ta in the Ni 3 (Si, Ti) alloy.
- the Vickers hardness of these samples is approximately 410 Hv at 800 ° C. for Example Sample 2 and approximately 520 Hv at 300 ° C. for Example Sample 7. These samples are approximately at room temperature and the above high temperature range.
- the Vickers hardness was 410 Hv to about 520 Hv.
- Example Sample 7 is larger than that of Example Samples 2 and 4. From this result, it can be seen that the L1 2 single-phase structure is superior in high-temperature hardness characteristics than the structure having the second phase (two-phase structure).
- FIG. 12 is a graph showing the relationship between Ta content, tensile strength (Tensile Strength), 0.2% proof stress (0.2% Proof Stress), and elongation (Elongation) of a sample.
- the horizontal axis indicates the Ta content (at.%) Of each sample, the left vertical axis indicates the tensile strength or 0.2% yield strength (MPa), and the right vertical axis indicates the elongation (%).
- Example Samples 1 to 7 are superior in tensile strength and 0.2% proof stress to Comparative Example samples. From this result, it is understood that the tensile strength and 0.2% proof stress of the alloy can be improved by adding Ta to the Ni 3 (Si, Ti) alloy. By including Ta in this alloy, the maximum tensile strength and 0.2% proof stress were improved by about 200 MPa.
- both the comparative sample and the example samples 1 to 6 maintain the elongation of about 30%.
- the Ni 3 (Si, Ti) alloy described in Patent Document 2 Japanese Patent Laid-Open No. 5-320794
- Patent Document 2 Japanese Patent Laid-Open No. 5-320794
- Example Sample 7 has a 0.2% yield strength improvement as compared with Example Samples 1 to 6, but has a reduced tensile strength and elongation.
- FIG. 13 shows the result.
- FIG. 13 is a photograph showing a fracture surface of the comparative example sample and the example samples 5 and 7 after the tensile test, in which (1) in FIG. 13 is the comparative example sample, (2) is the example sample 5, (3). Shows the fracture surface of Example Sample 7.
- the comparative sample exhibits a dimple-like ductile fracture surface
- the example sample 5 also has a dimple-like fracture mode, but the unevenness thereof exhibits a shallow fracture surface.
- Example Sample 7 there are many regions exhibiting a brittle fracture surface that breaks at a specific crystal plane. From this observation, it was found that when Ta is contained in the Ni 3 (Si, Ti) alloy, the tensile strength is improved while the elongation is maintained, although the fracture mode is changed. The Ta content is 7 at. %, It was found that the fracture morphology further changed and the tensile strength decreased. This is considered to be the influence of the second phase.
- FIG. 14 shows the result.
- FIG. 14 is a graph showing the relationship between the amount of increase in mass by the oxidation resistance test of the comparative example sample and the example samples 2, 4 and 7 and time, and the comparative example sample, the example sample 2, the example sample 4 and The oxidation resistance test result of the example sample 7 is shown.
- Example Samples 2 and 4 have a single-phase structure, it can be seen that oxidation resistance is improved when a single-phase structure is formed by adding Ta to the Ni 3 (Si, Ti) alloy.
- FIG. 15 is a conceptual diagram for explaining the pin-on-disk wear test.
- the pin 2 to be evaluated is placed on the disk 2, and a load is applied from one end of the pin 2, and the other end of the pin 2 is made to slide on the disk 2.
- the wear resistance of the pin is evaluated by contacting the surface (the upper surface in FIG. 15) and rotating the disk 2.
- Carbide (G5) was used for the disk, and the pin 2 was formed in a columnar shape in each sample. Specifically, a cylindrical pin 2 having a height of 15 mm (H shown in FIG. 15) and a diameter of 5 mm (D shown in FIG. 15) is arranged at a distance of 15 mm (X shown in FIG. 15) from the center of the disk. And tested.
- the pin-on-disk wear test was performed in a room temperature (about 25 ° C.) and in an air atmosphere under conditions of a load of 100 N, a rotation speed of 300 rpm, a test time of 30 minutes, and a total sliding distance of 1413.7 m.
- the test was a dry wear test in which no lubricating oil was used. Abrasion resistance was evaluated by the amount of reduction in the mass and volume of the pin after the total sliding distance. Table 8 shows the results.
- Table 8 is a table showing the wear amount, wear volume reduction rate, and wear resistance ratio due to wear of each sample.
- the amount of wear (Wear mass loss) indicates the amount of mass reduction of the pin by the friction test
- the wear volume reduction rate (Wear volume loss rate) is the amount of pin volume reduction (unit distance) relative to the sliding distance. The volume reduction of the pin per contact).
- the wear resistance ratio is a ratio (index) indicating the quality of wear resistance of each sample when the comparative sample is 1.
- FIG. 16 is a graph showing the wear resistance ratio of each sample.
- the wear resistance ratio is the reciprocal of the value obtained by dividing the wear volume reduction amount of each sample in Table 8 by that of the comparative sample, and the larger this value, the better the wear resistance.
- the wear resistance of the alloy at room temperature is improved.
- the Ta content is 4 at. % Or more, the wear resistance of the alloy is remarkably improved.
- the wear resistance of the alloy at room temperature largely depends on the hardness, the Ta content is 2 at. % More than 4 at. It can be seen that the wear resistance varies greatly within the range of% or less.
- the example sample has hardness (strength) characteristics superior to those of the comparative example sample.
- this demonstration experiment 2 proved that the example samples had hardness (strength) characteristics superior to those of the comparative example samples even at high temperatures, and particularly excellent tensile strength and oxidation resistance characteristics in the case of a single phase structure.
- the Ta content is 2 at. It has also been demonstrated that the wear resistance is excellent when the content is more than%.
- Ni 3 (Si, Ti) -based intermetallic compound exhibits excellent hardness at room temperature and excellent wear resistance
- Ni 3 (Si, Ti) suitable for friction parts is used.
- ) -Based intermetallic compounds can be provided.
- the Ni 3 (Si, Ti) intermetallic compound of the present invention maintains a ductility equal to or higher than that of the conventional Ni 3 (Si, Ti) intermetallic compound.
- a Ni 3 (Si, Ti) -based intermetallic compound having excellent characteristics as a structure can be provided.
- this Ni 3 (Si, Ti) intermetallic compound maintains excellent hardness not only at normal temperature but also at high temperature, so it is very useful as a material for machine elements for high temperature, and is also resistant to oxidation. Since it is excellent in properties, it is more useful in a high-temperature environment that is easily oxidized.
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Abstract
Description
このようなNi3(Si,Ti)系金属間化合物には、例えば、鋳造用ニッケル系金属間化合物として、Ni、Si、Ti、Cを含有し、さらに、Hf及びZrの何れか又は双方を含む金属間化合物が知られており、この金属間化合物が、時計側部材等として良好な鋳造性を示す(ダイキャスト法やロストワックス法に適する)ことが知られている(例えば、特許文献1参照)。
また、耐食性に優れるとともに構造材として十分に満足できる延性、加工性をも兼備したNi3(Si,Ti)基合金材料として、Ni、Si、Ti、Cu、Ta及びBを含有する金属間化合物が知られている(例えば、特許文献2参照)。この金属間化合物は、TaとCuを複合添加されることにより、良好な延性が確保され、硫酸精製装置等の構造材料として有用とされている。
以下、この発明の一実施形態を説明する。以下の記述中で示す構成は、例示であって、この発明の範囲は、以下の記述中で示すものに限定されない。なお、この明細書において、「~」は、端の点を含む。
また、この発明の実施形態において、主成分であるNi、10.0~12.0原子%のSi、1.5~9.5原子%のTi及び1.0~9.0原子%のTaを含む合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有するNi3(Si,Ti)系金属間化合物であってもよい。または、主成分であるNi、10.0~12.0原子%のSi、2.5~8.5原子%のTi及び1.0~7.0原子%のTaを含む合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有するNi3(Si,Ti)系金属間化合物であってもよい。
また、この発明の実施形態において、主成分であるNi、10.0~12.0原子%のSi、2.5~6.5原子%のTi及び3.0~7.0原子%のTaを含む合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有するNi3(Si,Ti)系金属間化合物であってもよい。
さらに、この発明の実施形態において、主成分であるNi、10.0~12.0原子%のSi並びにTi及びTaが合計で9.0~11.5原子%を含む合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有するNi3(Si,Ti)系金属間化合物であってもよい。
なお、この発明は、10.0以上12.0以下原子%のSi、1.5以上7.5未満原子%のTi、2.0より多く8.0以下原子%のTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上500以下重量ppmのBを含有し、L12相からなる組織、又はL12相と、Ni及びTaを含む第2相分散物とからなる組織を有する摺動部品用Ni3(Si,Ti)系金属間化合物であってもよく、前記組成及び組織を有するNi3(Si,Ti)系金属間化合物の摺動部品材料(又は、耐摩耗性金属材料)としての使用であってもよい。また、前記組成の材料を溶解し、鋳造して摺動部品を形成する方法であってもよいし、Ni3(Si,Ti)系金属間化合物を鋳造し、鋳造されたNi3(Si,Ti)系金属間化合物で摺動部品を形成する方法であってもよい。例えば、摺動部品は、鋳造されたNi3(Si,Ti)系金属間化合物を切削して形成する。
以下、これらの実施形態の各元素について詳述する。なお、この明細書において「~」の記載は、特に記載がない限り、数値範囲の両端を含む。
また、硬さ及び耐摩耗性の観点から、好ましくは、1.5以上7.5未満原子%、より好ましくは、1.5~5.5原子%であり、さらに好ましくは、2.5~5.5原子%である。これらの範囲であれば、硬さ及び耐摩耗性に優れる。
また、硬さ及び耐摩耗性の観点から、好ましくは、2.0より多く8.0以下原子%、より好ましくは、4.0~8.0原子%であり、さらに好ましくは、4.0~7.0原子%である。これらの範囲であれば、硬さ及び耐摩耗性に優れる。
また、この実施形態に係るNi3(Si,Ti)系金属間化合物は、荷重300gで測定したビッカース硬さが410~520であってもよい。この発明の実施形態によれば、このようなビッカース硬さのNi3(Si,Ti)系金属間化合物を得ることができる。
〔実証実験1〕
(金属間化合物の作製)
(1)鋳塊試料作製工程
表4は、実証実験1で作製した7種類の金属間化合物の組成、および比較のために作製した金属間化合物の組成を示した表である。表4に記載しているように、この実証実験1では、Ti及びTaの合計含有量が一定となるように、これらの金属間化合物の組成を定めた。ここで、比較のために作製した金属間化合物は、特許文献1に開示されている金属間化合物である。
次いで、上記鋳塊を均質化するために、真空中で48時間、1050℃で保持する均質化熱処理工程を行った。以上により、試料を作製した。
(1)組織観察
まず、上記のようにして作製した実施例試料について、組織のSEM写真の撮影を行った。図1にその写真を示す。図1は実施例試料2のSEM写真である。
なお、Hf添加試料は、Ni3(Si,Ti)のほか、Ni3Hf、Ni5Hfのプロファイルのピーク位置とそのプロファイルが一致していた。Hf添加試料は、実施例試料2と異なり、Ni3Hf、Ni5Hfの相が分散していた。
次に、各試料についてビッカース硬さ試験を行った。ビッカース硬さ試験は、室温で、各試料に正4角錐のダイヤモンド製圧子を押し込むことによって行った。この試験では、荷重は300gを主として用い、保持時間は20秒とした。図4にその結果を示す。図4は、ビッカース硬さとTaの含有量との関係を示したグラフである。横軸はTaの含有量であり、最も左の測定点が比較例試料、その他の測定点が実施例試料に対応している。
さらに、実証実験1と同じ組成(上記表4と同じ組成)の試料を実証実験と同じ方法で作製し、(1)組織観察、(2)室温ビッカース硬さ試験、(3)高温ビッカース硬さ試験、(4)室温引張試験、(5)耐酸化性試験、(6)摩耗試験を行った。
まず、作製された実施例試料について、組織のSEM写真の撮影を行った。図5にその写真を示す。図5は比較例試料及び実施例試料のSEM写真であり、図5の(1)が比較例試料、(2)が実施例試料5、(3)が実施例試料6、(4)が実施例試料7のSEM写真である。また、図5の(5)は実施例試料7の第2相を拡大したSEM写真である。
なお、この測定において、Ni3(Si,Ti)及びNi3Taのプロファイルにおけるピーク位置以外の位置で、明確なピークは観察されず、実施例試料7は実質的にL12相とNi3Taの第2相とのみからなることがわかった。
次に、実証試験1と同様に各試料についてビッカース硬さ試験を行った。ビッカース硬さ試験の条件は、荷重1kgで、保持時間20秒とした(室温約25℃)。図9にその結果を示す。図9は、実証実験2のビッカース硬さ試験の結果を示すグラフであり、ビッカース硬さとTaの含有量との関係を示したグラフである。各軸は、実証実験1と同じである。
次に、各試料について、高温(300℃、500℃、600℃及び800℃)でビッカース硬さ試験を行った。ビッカース硬さ試験は、荷重1kg、保持時間20秒で行い、還元雰囲気中(Ar+約10%H2)にて毎分10℃で昇温させて測定した。図11に、上記室温ビッカース硬さ試験の結果とともにその結果を示す。図11は、各試料の高温におけるビッカース硬さの変化を示すグラフであり、比較例試料並びに実施例試料2,4及び7について、そのビッカース硬さの変化を示している。図11において(1)が比較例試料、(2)が実施例試料2、(3)が実施例試料4、(4)が実施例試料7のビッカース硬さを示している。
なお、これらの試料のビッカース硬さは、実施例試料2が800℃で約410Hv、実施例試料7が300℃で約520Hvであり、これらの試料は、室温及び上記高温の温度範囲で、約410Hv~約520Hvのビッカース硬さであった。
次に、各試料について、引張試験を行った。引張試験は、ゲージ部が10×2×1mm3の試験片を用いて、室温、真空中、歪み速度1.66×10-4s-1の条件で行った。その結果を図12に示す。図12は、試料のTa含有量と引張強度(Tensile Strength)、0.2%耐力(0.2% Proof Stress)及び伸び(Elongation)の関係を示すグラフである。図12において、横軸が各試料のTa含有量(at.%)を示し、縦軸左が引張強度又は0.2%耐力(MPa)、縦軸右が伸び(%)を示している。
この結果から、(1)Ni3(Si,Ti)合金にTaを含有させることにより、合金の伸びはやや減少するものの、約30%の伸びを維持すること、及び(2)Ta含有量が7at.%に達すると、引張強度及び伸びが低下すること、が明らかとなった。
次に、各試料について耐酸化性試験を行った。耐酸化性試験は、TG-DTA(Thermogravimetry‐Differential Thermal Analysis)によって行った。具体的には、900℃で大気暴露したときの、試料の単位表面積当たりの質量増加量を測定することによって行った。図14にその結果を示す。
図14は、比較例試料並びに実施例試料2,4及び7の耐酸化性試験による質量増加量と時間との関係を示すグラフであり、比較例試料、実施例試料2、実施例試料4及び実施例試料7の耐酸化性試験結果を示している。
次に、各試料について摩耗試験を行った。この実証実験2で行った摩耗試験は、ピンオンディスク式摩耗試験であり、その試験方法を図15に示す。
図15は、ピンオンディスク式摩耗試験を説明するための概念図である。
また、このNi3(Si,Ti)系金属間化合物は、常温のみならず、高温においても優れた硬さを維持するので、高温用の機械要素の材料にとても有用であり、また、耐酸化特性にも優れるので、酸化しやすい高温環境でより有用である。
Claims (9)
- 10.0以上12.0以下原子%のSi、1.5以上7.5未満原子%のTi、2.0より多く8.0以下原子%のTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上500以下重量ppmのBを含有し、
L12相からなる組織、又はL12相と、Ni及びTaを含む第2相分散物とからなる組織を有することを特徴とするNi3(Si,Ti)系金属間化合物。 - 室温から800℃の温度範囲におけるビッカース硬さが410~520である請求項1に記載のNi3(Si,Ti)系金属間化合物。
- 10.0以上12.0以下原子%のSi、1.5以上5.5以下原子%のTi、4.0以上8.0以下原子%のTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有する請求項1又は2に記載のNi3(Si,Ti)系金属間化合物。
- 10.0以上12.0以下原子%のSi、2.5以上5.5以下原子%のTi、4.0以上7.0以下原子%のTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有する請求項1~3のいずれか1つに記載のNi3(Si,Ti)系金属間化合物。
- 10.0以上12.0以下原子%のSi、2.5以上6.5以下原子%のTi、3.0以上7.0以下原子%のTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有し、
L12相からなる組織、又はL12相とNi及びTaを含む第2相分散物とからなる組織を有することを特徴とするNi3(Si,Ti)系金属間化合物。 - 10.0~12.0原子%のSi、並びに合計で9.0~11.5原子%のTi及びTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上100以下重量ppmのBを含有する請求項5に記載のNi3(Si,Ti)系金属間化合物。
- 荷重300gで測定したビッカース硬さが410~520である請求項5又は6に記載のNi3(Si,Ti)系金属間化合物。
- 前記Ni3(Si,Ti)系金属間化合物のTa最大含有量が6.0原子%である請求項1~7のいずれか1つに記載のNi3(Si,Ti)系金属間化合物。
- 合計で19.0~21.5原子%のSi、Ti及びTa、残部が不純物を除きNiからなる合計100原子%の組成を有する金属間化合物の重量に対して25以上500以下重量ppmのBを含有する請求項1~8のいずれか1つに記載のNi3(Si,Ti)系金属間化合物。
Priority Applications (5)
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KR1020127009281A KR101715149B1 (ko) | 2009-09-14 | 2010-09-14 | Ta가 첨가된 Ni3(Si,Ti)계 금속간 화합물 |
US13/395,778 US9447485B2 (en) | 2009-09-14 | 2010-09-14 | Ni3(Si, Ti)-based intermetallic compound to which Ta is added |
CN201080040548.9A CN102575321B (zh) | 2009-09-14 | 2010-09-14 | 添加Ta的Ni3(Si,Ti)基金属间化合物 |
EP10815495.6A EP2487272A4 (en) | 2009-09-14 | 2010-09-14 | Ni3(si, ti) intermetallic compound to which ta is added |
JP2011530912A JP5565777B2 (ja) | 2009-09-14 | 2010-09-14 | Taが添加されたNi3(Si,Ti)系金属間化合物 |
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JP2009-212090 | 2009-09-14 | ||
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EP (1) | EP2487272A4 (ja) |
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KR (1) | KR101715149B1 (ja) |
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Cited By (2)
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WO2012102386A1 (ja) * | 2011-01-27 | 2012-08-02 | 公立大学法人大阪府立大学 | Ta及びAlが添加されたNi3(Si,Ti)系金属間化合物合金で形成された耐熱軸受及びその製造方法 |
JP2015063752A (ja) * | 2013-08-27 | 2015-04-09 | 公立大学法人大阪府立大学 | Ni基金属間化合物合金の溶射皮膜、溶射皮膜被覆部材および溶射皮膜の製造方法 |
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- 2010-09-14 EP EP10815495.6A patent/EP2487272A4/en not_active Withdrawn
- 2010-09-14 JP JP2011530912A patent/JP5565777B2/ja not_active Expired - Fee Related
- 2010-09-14 WO PCT/JP2010/065839 patent/WO2011030905A1/ja active Application Filing
- 2010-09-14 CN CN201080040548.9A patent/CN102575321B/zh not_active Expired - Fee Related
- 2010-09-14 US US13/395,778 patent/US9447485B2/en active Active
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WO2012102386A1 (ja) * | 2011-01-27 | 2012-08-02 | 公立大学法人大阪府立大学 | Ta及びAlが添加されたNi3(Si,Ti)系金属間化合物合金で形成された耐熱軸受及びその製造方法 |
US20130308884A1 (en) * | 2011-01-27 | 2013-11-21 | Osaka Prefecture University Public Corporation | HEAT-RESISTANT BEARING FORMED OF Ta OR A1-ADDED Ni3(Si, Ti)-BASED INTERMETALLIC COMPOUND ALLOY AND METHOD FOR PRODUCING THE SAME |
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JP2015063752A (ja) * | 2013-08-27 | 2015-04-09 | 公立大学法人大阪府立大学 | Ni基金属間化合物合金の溶射皮膜、溶射皮膜被覆部材および溶射皮膜の製造方法 |
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EP2487272A1 (en) | 2012-08-15 |
KR101715149B1 (ko) | 2017-03-10 |
JP5565777B2 (ja) | 2014-08-06 |
CN102575321A (zh) | 2012-07-11 |
EP2487272A4 (en) | 2017-01-04 |
US9447485B2 (en) | 2016-09-20 |
US20120171071A1 (en) | 2012-07-05 |
CN102575321B (zh) | 2014-10-15 |
KR20120051772A (ko) | 2012-05-22 |
JPWO2011030905A1 (ja) | 2013-02-07 |
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