WO2011016488A1 - Elément recouvert - Google Patents

Elément recouvert Download PDF

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Publication number
WO2011016488A1
WO2011016488A1 PCT/JP2010/063192 JP2010063192W WO2011016488A1 WO 2011016488 A1 WO2011016488 A1 WO 2011016488A1 JP 2010063192 W JP2010063192 W JP 2010063192W WO 2011016488 A1 WO2011016488 A1 WO 2011016488A1
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WO
WIPO (PCT)
Prior art keywords
covering member
hard film
base material
member according
sum
Prior art date
Application number
PCT/JP2010/063192
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English (en)
Japanese (ja)
Inventor
美保 柴田
克久 大友
Original Assignee
株式会社タンガロイ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社タンガロイ filed Critical 株式会社タンガロイ
Priority to US13/388,622 priority Critical patent/US8557405B2/en
Priority to JP2011525914A priority patent/JP5403058B2/ja
Priority to EP10806487.4A priority patent/EP2463398B1/fr
Publication of WO2011016488A1 publication Critical patent/WO2011016488A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Definitions

  • the present invention relates to a covering member in which a surface of a base material such as a sintered alloy, a ceramic, a cBN sintered body, or a diamond sintered body is coated.
  • Patent Document 1 As a conventional technique for coating, there is a hard coating for cutting tools made of (Ti, Al, Cr) (C, N) (for example, see Patent Document 1). In addition, as a film having excellent oxidation resistance, there is an Al—Cr—N-based film (see, for example, Non-Patent Document 1). However, due to changes in the work material, cutting conditions, etc., there has been a problem that a long tool life cannot be obtained with a cutting tool coated with these films.
  • the present invention has been made in view of such circumstances, and it is an object of the present invention to provide a covering member that realizes a long life in cutting processing with severe processing conditions such as high-speed processing, high-feed processing, and processing of difficult-to-cut materials. To do.
  • a cutting tool composed of a covering member in which a hard film made of a cubic metal compound such as (TiAl) N, (TiCr) N, (CrAl) N, and (TiAlCr) N is coated on the surface of a substrate.
  • a hard film made of a cubic metal compound such as (TiAl) N, (TiCr) N, (CrAl) N, and (TiAlCr) N is coated on the surface of a substrate.
  • the inventors of the present invention have worked on improving the performance of a covering member in which the surface of a base material is coated with (TiAl) N, (TiCr) N, (CrAl) N, (TiAlCr) N, etc.
  • the ⁇ -axis X-ray intensity distribution of the positive pole chart with respect to the (111) plane of the hard film has an ⁇ angle in the range of 50 to 65 degrees. It shows the maximum strength, and the X-ray intensity distribution on the ⁇ -axis of the positive chart on the (200) plane shows the highest strength in the ⁇ angle range of 60 to 80 degrees, which improves wear resistance and is long when used as a cutting tool. The knowledge that it will become a lifetime was obtained.
  • the covering member of the present invention is a covering member in which the surface of the substrate is covered with a coating, and at least one layer of the coating is selected from the periodic tables 4, 5, and 6 elements, Al, Si, B, Y, and Mn.
  • a hard film made of a cubic metal compound comprising at least one selected element and at least one element selected from C, N, and O, and a positive electrode relating to the (111) plane of the hard film
  • the X-ray intensity distribution of the ⁇ axis in the dot diagram shows the maximum intensity in the range of ⁇ angle of 50 to 65 degrees
  • the X-ray intensity distribution of the ⁇ axis in the positive electrode diagram for the (200) plane of the hard film has an ⁇ angle of 60 to 80.
  • the hard film of the present invention has excellent adhesion to the substrate and excellent wear resistance.
  • the covering member of the present invention is excellent in wear resistance, chipping resistance and oxidation resistance. When the covering member of the present invention is used as a cutting tool, an effect that the tool life is extended is obtained. In particular, it is highly effective in cutting with severe processing conditions such as high-speed machining, high-feed machining, machining of hard work materials, and difficult-to-cut materials.
  • the inventors investigated the angular distribution of the inclination of the (111) plane of the cubic crystal constituting the hard film and the angular distribution of the inclination of the (200) plane by controlling the positive pole figure measurement. As a result, the wear resistance was improved as compared with the conventional hard film.
  • the X-ray intensity distribution of the ⁇ axis of the positive map related to the (111) plane of the hard film was within the ⁇ angle range of 50 to 65 degrees.
  • the X-ray intensity distribution of the ⁇ axis in the positive dot diagram with respect to the (200) plane shows the maximum intensity in the range of ⁇ angles of 60 to 80 degrees.
  • the X-ray intensity distribution of the ⁇ axis in the positive diagram for the (111) plane of the hard film shows the highest intensity in the range of ⁇ angle 50 to 65 degrees
  • the X-ray of the ⁇ axis in the positive diagram for the (200) plane More preferably, the intensity distribution exhibits a maximum intensity in the range of an ⁇ angle of 65 to 75 degrees. This is because, among the cubic crystals constituting the hard film, the (111) plane is inclined by about 60 degrees with respect to the covering member surface, and the (200) plane is 70 with respect to the covering member surface. This shows that there are many crystals that are tilted by a certain degree.
  • the wear resistance could be improved as compared with the covering member having the ⁇ -axis X-ray intensity distribution of the dot diagram showing the maximum strength at an ⁇ angle of less than 60 ° or more than 80 °.
  • the X-ray intensity distribution on the ⁇ axis of the positive pole figure regarding the (111) plane and (200) plane of the hard film of the present invention can be measured by the Schulz reflection method.
  • Schulz's reflection method uses an equiangular reflection optical system in which 2 ⁇ is a diffraction angle and the incident angle and the reflection angle are each ⁇ , and ⁇ around the A axis in the sample surface is used. This is a method of measuring the intensity distribution of diffraction lines by changing the direction of the sample with respect to incident X-rays by rotation and ⁇ rotation around the sample surface normal (B axis), that is, in-sample rotation.
  • the ⁇ angle is defined as 90 degrees.
  • the ⁇ angle is 90 degrees, it becomes the center point on the positive dot diagram as shown in FIG.
  • the positive electrode point measurement program of the Rigaku Corporation X-ray diffractometer RINT-TTRIII the (111) plane and (200) plane of the hard film are measured according to the following measurement conditions and measurement methods. It is possible to measure the X-ray intensity distribution on the ⁇ axis of the positive dot diagram.
  • the ⁇ angle indicating the maximum intensity can also be read from the contour lines of the positive map for the (111) plane and the (200) plane, but the X-ray intensity of the ⁇ axis of the positive map for the (111) plane and the (200) plane. From the distribution, the ⁇ angle indicating the maximum intensity can be easily obtained.
  • the base material of the covering member of the present invention include sintered alloys, ceramics, cBN sintered bodies, diamond sintered bodies, and the like.
  • sintered alloys are preferable because they are excellent in fracture resistance and wear resistance.
  • cermets and cemented carbides are more preferable, and cemented carbides are more preferable.
  • the coating of the present invention comprises periodic table 4 (Ti, Zr, Hf, etc.), 5 (V, Nb, Ta, etc.), 6 (Cr, Mo, W, etc.) group elements, Al, Si, B, Y and Mn. It is composed of a metal compound film composed of at least one element selected from the inside and at least one element selected from C, N and O, specifically, TiC, TiCN, TiCNO, TiN , (TiAl) N, (CrAl) N, Al 2 O 3 , (CrAl) 2 O 3 , (AlTiSi) N, (AlCrW) N, (TiAl) BN, (HfAlMn) N, (TiSi) N, (ZrAl ) CN, (TiNb) BN, and the like.
  • At least one layer of the coating of the present invention is a hard film.
  • the coating film of the present invention includes any film configuration of a single layer film composed of only a hard film and a multilayer film of two or more layers of a hard film and a film other than the hard film.
  • the average film thickness of the entire coating film of the present invention is 0.1 ⁇ m or more, wear resistance and oxidation resistance are improved, and when it exceeds 15 ⁇ m, chipping resistance is lowered. Therefore, the average film thickness of the coating of the present invention is preferably in the range of 0.1 to 15 ⁇ m, more preferably in the range of 0.5 to 10 ⁇ m, further preferably in the range of 0.7 to 8 ⁇ m, and in the range of 1 to 5 ⁇ m. Is particularly preferred.
  • the hard film of the present invention has periodic table 4 (Ti, Zr, Hf etc.), 5 (V, Nb, Ta etc.), 6 (Cr, Mo, W etc.) group elements, Al, Si, B, Y and Mn And a cubic metal compound composed of at least one element selected from the group consisting of C, N, and O.
  • a cubic metal compound comprising at least one metal element selected from Al, Ti, Cr, and Si and at least one nonmetal element selected from C, N, and O It is preferable because it has high hardness and excellent wear resistance.
  • the average film thickness of the hard film of the present invention is 0.1 ⁇ m or more, wear resistance and oxidation resistance are improved, and when it exceeds 15 ⁇ m, chipping resistance is lowered. Therefore, the average film thickness of the hard film of the present invention is preferably in the range of 0.1 to 15 ⁇ m, more preferably in the range of 0.5 to 10 ⁇ m, further preferably in the range of 0.7 to 8 ⁇ m, and in the range of 1 to 5 ⁇ m. A range is particularly preferred.
  • the hard film of the present invention has (Al a J b ) (C x N y ) (where J represents one or two of Ti and Cr, and a represents Al relative to the total of Al and J.
  • x represents the atomic ratio of C to the sum of C and N
  • y represents the atomic ratio of N to the sum of C and N
  • x + y 1, 0 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 1 It is preferable that it is a metal compound represented by.
  • the hard film of the present invention has (Al c J d Si e ) (C z N w ) (where J represents one or two of Ti and Cr, and c represents Al relative to the sum of Al, J and Si. D represents the atomic ratio of J to the sum of Al, J, and Si, e represents the atomic ratio of Si to the sum of Al, J, and Si, and c, d, and e are c + d + e.
  • z is the atomic ratio of C to the sum of C and N
  • c 0.3 or more, d is 0.6 or less, and e is 0.01 or more, the hardness of the hard film is further increased and the wear resistance is improved.
  • the hard film of the present invention is made of a cubic metal compound, and among them, the half-value width of the diffraction line on the (200) plane is preferably 0.90 to 1.60 degrees because of excellent wear resistance. .
  • composition of the coating of the present invention can be measured using an elemental analyzer such as a secondary ion mass spectrometer (SIMS), an energy dispersive element analyzer (EDS), or a glow discharge analyzer (GDS).
  • an elemental analyzer such as a secondary ion mass spectrometer (SIMS), an energy dispersive element analyzer (EDS), or a glow discharge analyzer (GDS).
  • an arc ion plating apparatus (hereinafter referred to as AIP apparatus) can be used, but other apparatuses such as a sputtering apparatus can also be used.
  • AIP apparatus the base material is put in the AIP apparatus, and the base material temperature is heated to 500 to 750 ° C., preferably 500 to 700 ° C. with a heater, and Ar gas bombardment is performed on the base material.
  • Ar, N 2 , O 2 , CH 4 , C 2 H 2 or a mixed gas thereof is introduced so that the pressure in the AIP apparatus is 2 to 5 Pa, preferably 2 to 4 Pa, and a DC bias voltage is applied to the substrate.
  • ⁇ 20 to ⁇ 70 V preferably ⁇ 30 to ⁇ 60 V, more preferably ⁇ 30 to ⁇ 45 V
  • arc discharge current 80 to 180 A, preferably 100 to 150 A
  • the substrate temperature is lowered to 450 to 700 ° C., preferably 450 to 550 ° C.
  • the substrate bias voltage is gradually adjusted from ⁇ 20 to ⁇ 70 V, and the substrate bias voltage is set to ⁇ 80 to -180 V, preferably -80 to -120 V, more preferably -80 to -95 V, arc discharge current: 130 to 180 A, preferably 150 to 180 A, the average thickness of the hard film is 85 to The hard film is coated by adjusting the film thickness corresponding to 97% over time.
  • the X-ray intensity distribution of the ⁇ axis of the positive electrode diagram relating to the (111) plane shows the highest intensity in the range of ⁇ angle 50 to 65 degrees, and the positive electrode point related to the (200) plane is made of a cubic metal compound.
  • a hard film having the highest intensity is formed in the range of ⁇ angle of 60 to 80 degrees.
  • Example 1 An S10 equivalent cemented carbide insert having a shape of CNMG120408 was prepared as a base material.
  • a metal target corresponding to the composition of the metal element and Si element of the coating shown in Table 1 was installed in the AIP apparatus.
  • the base material was put in the AIP apparatus, the base material temperature was heated to 700 ° C. with a heater, and Ar gas bombardment was performed on the base material.
  • a source gas selected from Ar, N 2 , O 2 and CH 4 depending on the coating composition is introduced into the AIP apparatus, the pressure is adjusted to 3 Pa, and the substrate bias voltage: ⁇ 20 to ⁇ 70 V, arc Discharge current: It was coated for the time shown in Table 2 by the first coating step of 160A.
  • the substrate temperature is lowered to 550 ° C. while maintaining the pressure, and the substrate bias voltage is gradually adjusted from ⁇ 20 to ⁇ 70 V to ⁇ 100 to ⁇ 150 V, Coating was performed for the time shown in Table 2 by the second coating step of material bias voltage: ⁇ 100 to ⁇ 150 V and arc discharge current: 160 A.
  • a metal target corresponding to the composition of the metal elements of the coating shown in Table 1 was placed in the AIP apparatus, and the substrate was placed in the AIP apparatus in the same way as the invention, and the substrate was heated by a heater. After heating the temperature up to 600 ° C. and Ar gas bombarding the base material in the same manner as the invention, the mixed gas of Ar and N 2 was introduced into the AIP apparatus to adjust the pressure to 2 Pa, and the base material bias voltage The coating was applied under the following coating conditions: -50 V, arc discharge current: 150 A.
  • the composition of the coating coated on the surface of the substrate was measured from the coating surface using an energy dispersive element analyzer (EDS). About the average film thickness of the film coat
  • the comparative product 1 had a life because the maximum flank wear amount was 0.30 mm after a cutting time of 7 minutes, and the comparative product 2 was defective and had a life after a cutting time of 9 minutes.
  • Inventive products 1 to 7 could be processed up to a cutting time of 10 minutes, and could be further processed.
  • the coating film of the inventive product 6 contains Al, Cr, Si
  • the coating film of the inventive product 7 contains Al, Ti, Si, and thus exhibits particularly excellent wear resistance.
  • Example 2 An S10 equivalent cemented carbide insert having a shape of CNMG120408 was prepared as a base material.
  • a metal target corresponding to the composition of the metal element and Si element of the coating shown in Table 5 was installed in the AIP apparatus.
  • the base material was put in the AIP apparatus, the base material temperature was heated to 650 ° C. with a heater, and Ar gas bombardment was performed on the base material.
  • a source gas selected from Ar, N 2 and CH 4 depending on the composition of the coating is introduced into the AIP apparatus, the pressure is adjusted to 3.5 Pa, and the substrate bias voltage is ⁇ 30 to ⁇ 60 V, arc discharge Current: Coating was performed for the time shown in Table 6 by the first coating process at 150 A.
  • the substrate temperature is lowered to 500 ° C. while maintaining the pressure, and the substrate bias voltage is gradually adjusted from ⁇ 30 to ⁇ 60 V to ⁇ 80 to ⁇ 100 V, Coating was performed for the time shown in Table 6 in the second coating step of material bias voltage: ⁇ 80 to ⁇ 100 V and arc discharge current: 130 A.
  • a metal target corresponding to the composition of the metal elements of the coating shown in Table 5 was placed in the AIP apparatus, the substrate was placed in the AIP apparatus as in the invention, and the substrate temperature was adjusted by a heater. After heating to 600 ° C. and Ar gas bombarding the substrate as in the invention, the mixed gas of Ar and N 2 was introduced into the AIP apparatus to adjust the pressure to 2 Pa, and the substrate bias voltage: ⁇ The coating was coated under the coating conditions of 50 V and arc discharge current: 150 A.
  • the composition of the coating coated on the surface of the substrate was measured from the coating surface using an energy dispersive element analyzer (EDS). About the average film thickness of the film coat
  • EDS energy dispersive element analyzer
  • the work material Ni-base heat-resistant alloy Inconel 718, cutting speed: 75 m / min, cutting depth: 1.0 mm, feeding: 0.2 mm / rev
  • the wet turning test was conducted under the conditions.
  • the comparative product 3 reached the end of its life after a cutting time of 7 minutes, but the inventive products 8 to 15 can be processed for a cutting time of 10 minutes or more, and 1.4 times or more that of the comparative product 3. Of tool life. Among Invention Products 8 to 15, Invention Products 9 to 11 and 13 to 15 showed tool life more than twice that of Comparative Product 3.
  • Example 3 An S10 equivalent cemented carbide insert having a shape of CNMG120408 was prepared as a base material.
  • a metal target corresponding to the composition of the metal elements of the coating shown in Table 9 was installed in the AIP apparatus.
  • the base material was put in the AIP apparatus, the base material temperature was heated to 650 ° C. with a heater, and Ar gas bombardment was performed on the base material.
  • a source gas selected from Ar, N 2 and CH 4 depending on the composition of the coating is introduced into the AIP apparatus, the pressure is adjusted to 3.5 Pa, and the substrate bias voltage is ⁇ 30 to ⁇ 50 V, arc discharge
  • the coating was carried out for the time shown in Table 10 by the first coating step of current: 120 to 160A.
  • the substrate temperature is lowered to 500 ° C. while maintaining the pressure, and the substrate bias voltage is gradually adjusted from ⁇ 30 to ⁇ 50 V to ⁇ 80 to ⁇ 110 V, Coating was performed for the time shown in Table 10 by the second coating step of material bias voltage: ⁇ 80 to ⁇ 110 V and arc discharge current: 130 to 170 A.
  • a metal target corresponding to the composition of the metal elements of the coating shown in Table 9 was installed in the AIP apparatus, the substrate was placed in the AIP apparatus in the same manner as the invention, and the substrate temperature was adjusted by a heater. After heating to 600 ° C. and Ar gas bombarding the substrate as in the invention, the mixed gas of Ar and N 2 was introduced into the AIP apparatus to adjust the pressure to 2 Pa, and the substrate bias voltage: ⁇ The coating was coated under the coating conditions of 50 V and arc discharge current: 150 A.
  • the composition of the coating coated on the surface of the substrate was measured from the coating surface using an energy dispersive element analyzer (EDS). About the average film thickness of the film coat
  • the work material Ni-base heat-resistant alloy Inconel 718, cutting speed: 90 m / min, depth of cut: 0.5 mm, feed: 0.15 mm / rev
  • the comparative product 4 reached the end of its life at a cutting time of 7 minutes, but the inventive products 16 to 23 can be processed for a cutting time of 11 minutes or more, and 1.5 times or more of the comparative product 4 Of tool life.
  • inventive products 17, 18, 19, 21, 22, and 23 showed tool life more than twice that of the comparative product 4.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Drilling Tools (AREA)

Abstract

La présente invention se rapporte à un élément recouvert comprenant un matériau de base et un film de revêtement formé sur la surface de ce dernier, au moins une couche du film de revêtement étant un film dur d'un composé de métal cubique comprenant au moins un élément sélectionné dans le groupe constitué par les éléments du groupe 4 (le titane (Ti), le zirconium (Zr), le hafnium (Hf), etc.), les éléments du groupe 5 (le vanadium (V), le niobium (Nb), le tantale (Ta), etc.) et les éléments du groupe 6 (le chrome (Cr), le molybdène (Mo), le tungstène (W), etc.) du tableau périodique, l'aluminium (Al), le silicium (Si), le bore (B), l'yttrium (Y) et le manganèse (Mn) conjointement à au moins un élément sélectionné dans le groupe constitué par le carbone (C), l'azote (N) et l'oxygène (O) ; dans la figure polaire pour la face (111) du film dur, la distribution d'intensité de rayons X dans l'axe α représente l'intensité maximale dans la plage d'angles α allant de 50 à 65° ; et, dans la figure polaire pour la face (200) du film dur, la distribution d'intensité de rayons X dans l'axe α représente l'intensité maximale dans la plage d'angles α allant de 60 à 80°.
PCT/JP2010/063192 2009-08-04 2010-08-04 Elément recouvert WO2011016488A1 (fr)

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US13/388,622 US8557405B2 (en) 2009-08-04 2010-08-04 Coated member
JP2011525914A JP5403058B2 (ja) 2009-08-04 2010-08-04 被覆部材
EP10806487.4A EP2463398B1 (fr) 2009-08-04 2010-08-04 Elément recouvert

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JP2009181826 2009-08-04

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WO2013140988A1 (fr) * 2012-03-19 2013-09-26 シチズンホールディングス株式会社 Élément décoratif rigide doré
JP2015182208A (ja) * 2014-03-26 2015-10-22 三菱マテリアル株式会社 表面被覆切削工具
WO2017077801A1 (fr) * 2015-11-06 2017-05-11 株式会社Ihi Aube de compresseur de moteur portant un revêtement résistant à la corrosion et procédé de revêtement s'y rapportant
WO2019146710A1 (fr) 2018-01-26 2019-08-01 京セラ株式会社 Outil revêtu et outil de coupe le comprenant
WO2019146711A1 (fr) 2018-01-26 2019-08-01 京セラ株式会社 Outil revêtu et outil de coupe le comprenant
JP2020138252A (ja) * 2019-02-27 2020-09-03 三菱マテリアル株式会社 表面被覆切削工具
JPWO2020196631A1 (fr) * 2019-03-27 2020-10-01
WO2021149642A1 (fr) * 2020-01-20 2021-07-29 京セラ株式会社 Outil revêtu
WO2023008131A1 (fr) * 2021-07-30 2023-02-02 京セラ株式会社 Outil revêtu et outil de coupe
WO2023008133A1 (fr) * 2021-07-30 2023-02-02 京セラ株式会社 Outil revêtu et outil de coupe
WO2023162682A1 (fr) * 2022-02-28 2023-08-31 京セラ株式会社 Outil revêtu et outil de coupe

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EP2463398A4 (fr) 2017-04-05
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US20120128971A1 (en) 2012-05-24
JPWO2011016488A1 (ja) 2013-01-10
EP2463398B1 (fr) 2018-04-04
JP5403058B2 (ja) 2014-01-29

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