WO2010112350A1 - Verfahren zur herstellung von kohlenwasserstoffoxysiliciumverbindungen - Google Patents
Verfahren zur herstellung von kohlenwasserstoffoxysiliciumverbindungen Download PDFInfo
- Publication number
- WO2010112350A1 WO2010112350A1 PCT/EP2010/053582 EP2010053582W WO2010112350A1 WO 2010112350 A1 WO2010112350 A1 WO 2010112350A1 EP 2010053582 W EP2010053582 W EP 2010053582W WO 2010112350 A1 WO2010112350 A1 WO 2010112350A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radicals
- values
- sime
- general formula
- silicon compounds
- Prior art date
Links
- 239000004215 Carbon black (E152) Substances 0.000 title claims abstract description 23
- 229930195733 hydrocarbon Natural products 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title abstract description 5
- 150000002430 hydrocarbons Chemical class 0.000 title 1
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 55
- 239000003054 catalyst Substances 0.000 claims abstract description 46
- 238000006243 chemical reaction Methods 0.000 claims abstract description 40
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 12
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000002904 solvent Substances 0.000 claims abstract description 7
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 6
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 42
- 230000008569 process Effects 0.000 claims description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 239000000126 substance Substances 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 14
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 229910018540 Si C Inorganic materials 0.000 claims description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 4
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 claims description 4
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 4
- 229910008045 Si-Si Inorganic materials 0.000 claims description 3
- 229910002808 Si–O–Si Inorganic materials 0.000 claims description 3
- 229910006411 Si—Si Inorganic materials 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 229920002554 vinyl polymer Chemical group 0.000 claims description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229910000077 silane Inorganic materials 0.000 claims 1
- 239000012876 carrier material Substances 0.000 abstract description 3
- -1 cyclic siloxanes Chemical class 0.000 description 43
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 22
- 150000003254 radicals Chemical class 0.000 description 16
- 239000000203 mixture Substances 0.000 description 15
- 239000000047 product Substances 0.000 description 13
- 150000001298 alcohols Chemical class 0.000 description 12
- 229910052739 hydrogen Inorganic materials 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 239000000376 reactant Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000011541 reaction mixture Substances 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 229910003849 O-Si Inorganic materials 0.000 description 4
- 229910003872 O—Si Inorganic materials 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- XKINWJBZPLWKCW-UHFFFAOYSA-N methoxy-[methoxy(dimethyl)silyl]oxy-dimethylsilane Chemical compound CO[Si](C)(C)O[Si](C)(C)OC XKINWJBZPLWKCW-UHFFFAOYSA-N 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000002269 spontaneous effect Effects 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical class [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000003869 coulometry Methods 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- 238000011067 equilibration Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- SROOZJHAEHZBIF-UHFFFAOYSA-N methoxysilyloxy(dimethyl)silane Chemical compound C[SiH](O[SiH2]OC)C SROOZJHAEHZBIF-UHFFFAOYSA-N 0.000 description 2
- RZKSECIXORKHQS-UHFFFAOYSA-N n-heptane-3-ol Natural products CCCCC(O)CC RZKSECIXORKHQS-UHFFFAOYSA-N 0.000 description 2
- 239000012454 non-polar solvent Substances 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 description 2
- 239000011949 solid catalyst Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- SZCWBURCISJFEZ-UHFFFAOYSA-N (3-hydroxy-2,2-dimethylpropyl) 3-hydroxy-2,2-dimethylpropanoate Chemical compound OCC(C)(C)COC(=O)C(C)(C)CO SZCWBURCISJFEZ-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- QYLFHLNFIHBCPR-UHFFFAOYSA-N 1-ethynylcyclohexan-1-ol Chemical compound C#CC1(O)CCCCC1 QYLFHLNFIHBCPR-UHFFFAOYSA-N 0.000 description 1
- GIEMHYCMBGELGY-UHFFFAOYSA-N 10-undecen-1-ol Chemical compound OCCCCCCCCCC=C GIEMHYCMBGELGY-UHFFFAOYSA-N 0.000 description 1
- ZWNMRZQYWRLGMM-UHFFFAOYSA-N 2,5-dimethylhexane-2,5-diol Chemical compound CC(C)(O)CCC(C)(C)O ZWNMRZQYWRLGMM-UHFFFAOYSA-N 0.000 description 1
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 1
- CUUQUEAUUPYEKK-UHFFFAOYSA-N 4-ethyloct-1-yn-3-ol Chemical compound CCCCC(CC)C(O)C#C CUUQUEAUUPYEKK-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 229910020489 SiO3 Inorganic materials 0.000 description 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000005915 ammonolysis reaction Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GMZZPDFMJLYMEK-UHFFFAOYSA-N bis(methylsilyloxy)silane Chemical compound C[SiH2]O[SiH2]O[SiH2]C GMZZPDFMJLYMEK-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003729 cation exchange resin Substances 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 229960001701 chloroform Drugs 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010542 dehydrogenative silylation reaction Methods 0.000 description 1
- FLEZTVNVBFPJHL-UHFFFAOYSA-N dichloro(silyloxy)silane Chemical compound [SiH3]O[SiH](Cl)Cl FLEZTVNVBFPJHL-UHFFFAOYSA-N 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- KDOWHHULNTXTNS-UHFFFAOYSA-N hex-3-yne-2,5-diol Chemical compound CC(O)C#CC(C)O KDOWHHULNTXTNS-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 150000002443 hydroxylamines Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- QUXHCILOWRXCEO-UHFFFAOYSA-M magnesium;butane;chloride Chemical compound [Mg+2].[Cl-].CCC[CH2-] QUXHCILOWRXCEO-UHFFFAOYSA-M 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001843 polymethylhydrosiloxane Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- NZINNJYWGLAHPB-UHFFFAOYSA-N tributyl(methoxy)silane Chemical compound CCCC[Si](CCCC)(CCCC)OC NZINNJYWGLAHPB-UHFFFAOYSA-N 0.000 description 1
- ISEIIPDWJVGTQS-UHFFFAOYSA-N tributylsilicon Chemical compound CCCC[Si](CCCC)CCCC ISEIIPDWJVGTQS-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OBAJXDYVZBHCGT-UHFFFAOYSA-N tris(pentafluorophenyl)borane Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1B(C=1C(=C(F)C(F)=C(F)C=1F)F)C1=C(F)C(F)=C(F)C(F)=C1F OBAJXDYVZBHCGT-UHFFFAOYSA-N 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/083—Syntheses without formation of a Si-C bond
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/755—Nickel
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
Definitions
- the invention relates to a process for the preparation of Kohlenwasserstoffoxysiliciumeducationen by reaction of SiH-silicon compounds with alcohols in the presence of metal catalysts on support materials.
- Silanes and siloxanes in which all or part of their valences are occupied by alkoxy groups can be prepared by reacting the corresponding SiH compounds with alcohols in the presence of basic, acidic or metal-containing catalysts to release hydrogen.
- the Si-bonded hydrogen atoms are against the Alkoxy radicals of the respective alcohol with the release of gaseous hydrogen exchanged.
- the catalysts there are representatives that not only accelerate the desired SiH exchange reaction, but also cause unwanted side reactions, such as equilibrations or rearrangements of the siloxane backbone.
- These strongly basic (eg, metal alcoholates) or acidic catalysts are not suitable for targeted reactions, in particular in the presence of base or acid-incompatible functional groups, so that alternatives were sought which make a selective reaction possible.
- No. 2,967,171 describes the replacement of Si-bonded H by alkoxy groups by dehydrocondensation of SiH silanes and SiH siloxanes with alcohols.
- the catalyst used is hexachloroplatinic acid, which is why only saturated systems can be used and the carryover of chloride ions or chlorine-containing compounds into the target product can not be ruled out.
- a combination of a platinum compound and an organic acid is used in EP 475440 A as a catalyst for the dehydrocondensation of SiH siloxanes with an aliphatic alcohol having at least 4 C atoms. Carryover of the organic acid into the target product can not be excluded.
- a catalytic system for the dehydrocondensation of SiH units with alcohols is described in EP 1627892. It is a mixture of a boron compound (e.g., tris (pentafluorophenyl) borane) and at least one synergistically acting metal salt. Carryover of traces of metallic or boron-containing compounds in the target products can not therefore be ruled out, which is why this route is unsuitable for the production of in particular semiconducting alkoxysiloxanes.
- a boron compound e.g., tris (pentafluorophenyl) borane
- the dehydrocoupling of polyglycol alcohols with poly (methylhydrogen) siloxane can be carried out according to Zhang, Ruzhi; Zhang,
- Zinc hydrides have been reported by H. Mimoun in Journal of Organic Chemistry (1999), 64 (7), 2582-2589, et al. for the hydrosilylation of aldehydes, ketones and esters described, but can also be used for the dehydrogenative silylation of
- Zinc carboxylates and their handling are complex and demanding in terms of safety.
- the invention relates to a process for the preparation of hydrocarbyl-containing silicon compounds (A) which contain at least one unit of the general formula (1)
- a catalyst which is metal bound to a support material, which is selected from Ni, Pd, Pt, wherein per mol of group OR formed, at most 1 liter of solvent is used and wherein
- R is a monovalent hydrocarbon radical having 1 to 18 carbon atoms, which may be substituted by OH groups, halogen atoms, silyl groups, siloxy groups, -CN,
- Halogen atoms silyl groups, siloxy groups, -CN, -COOR 1 , -OCOOR 2 , -CONR 3 R 4 , -OCONR 5 R 6 , -NR 7 CONR 8 R 9 , -SO 2 -R 10 , -OSO 2 -R 11 , -OP (OR 12 ) (OR 13 ), wherein the carbon chain may be interrupted by non-adjacent - (CO), -O-, -S- or -NR 14 groups;
- R 1 to R 14 each having a monovalent hydrocarbon radical
- X is a chemical bond via which residues are attached which contain silicon atoms
- m is 0, 1, 2 or 3
- n is 1, 2 or 3
- m + n is 1, 2 or 3
- o is 0
- p the values 0, 1, 2 or 3
- m + n + o + p are the values 1, 2, 3 or 4.
- the process according to the invention is predestined for the cost-effective production of particularly pure alkoxysiloxanes which are e.g. in the semiconductor industry as CVD precursors find use.
- Another advantage is the avoidance of side reactions that reduce the yield and generate waste whose disposal pollutes the environment as far as possible.
- the hydrocarbon radical R may be linear, cyclic, branched, aromatic, saturated or unsaturated.
- the hydrocarbon radical R has 1 to 6 carbon atoms, Particular preference is given to alkyl radicals, alkylaryl radicals, arylalkyl radicals and phenyl radicals. Particularly preferred alkyl radicals are methyl and ethyl.
- the hydrocarbon radical R preferably has no or 1 to 6 additional OH groups, in particular 1, 2 or 3 OH groups. There are only one OH group on a carbon atom.
- the monovalent hydrocarbon radicals R ', R "and R - * - to R ⁇ ⁇ may be linear, cyclic, branched, aromatic, saturated or unsaturated.
- the monovalent hydrocarbon radicals R ', R "and R - * - to R ⁇ ⁇ may be linear, cyclic, branched, aromatic, saturated or unsaturated.
- the monovalent hydrocarbon radicals R ', R "and R - * - to R ⁇ ⁇ may be linear, cyclic, branched, aromatic, saturated or unsaturated.
- the monovalent hydrocarbon radicals R ', R "and R - * - to R ⁇ ⁇ may be linear, cyclic, branched, aromatic, saturated or unsaturated.
- Carbon atoms particularly preferred are alkyl, vinyl, allyl and phenyl radicals.
- Particularly preferred alkyl radicals are methyl and ethyl.
- radicals attached via the chemical bonds X are preferably polyvalent hydrocarbon radicals R 1, which in the case of silicon compounds (A) comprise one or more units of the general formulas (1) or, in the case of silicon compounds (B), one or more units of the general formulas (2) preferably have no or one unit of the general formula (1) or (2).
- R 1 polyvalent hydrocarbon radicals R 1
- the radicals attached via the chemical bonds X are preferably polyvalent hydrocarbon radicals R 1, which in the case of silicon compounds (A) comprise one or more units of the general formulas (1) or, in the case of silicon compounds (B), one or more units of the general formulas (2) preferably have no or one unit of the general formula (1) or (2).
- R 1 polyvalent hydrocarbon radicals
- Hydrocarbon radicals R 2, 3 or 4 valent Hydrocarbon radicals R 2, 3 or 4 valent.
- Hydrocarbon radicals R 1 preferably have 1 to 50, in particular 1 to 18, particularly preferably 1 to 6, for example 1, 2, 3 or 4 carbon atoms.
- the chemical bonds X in this case are Si-C bonds.
- the bonded via chemical bonds X radicals are preferably monovalent or polyvalent hydrocarbon radicals R ⁇ 1, which contain Si-C bonds embedded silicon atoms.
- the silicon compounds (A) and (B) can be made Residues R ⁇ S i and one or more units of the general formulas (1) and (2) exist.
- the hydrocarbon radicals R ⁇ S i are 2, 3 or 4 valent.
- the radicals R ⁇ S i preferably 1 to 50, especially 1 to 18 have, particularly preferably 1 to 6, for example 1, 2, 3 or 4
- the radicals RpS i preferably have 1 to 10, particularly preferably 1 to 6, for example 1, 2, 3 or 4 silicon atoms.
- the chemical bonds X in this case are Si-C bonds.
- the bonded via chemical bonds X radicals are preferably mono- or polyhydric (poly) silane group R ⁇ 1 containing Si-Si bonds embedded silicon atoms.
- Silicon compounds (A) and (B) can be selected from radicals R ⁇ 1 and one or more units of the general formulas (1) or
- the hydrocarbon radicals R ⁇ are 1
- the radicals R 1 have preferably 1 to 50, in particular 1 to 18, more preferably 1 to 6, for example 1, 2, 3 or 4 silicon atoms.
- the radicals R 1 have preferably 1 to 10, more preferably 1 to 6, for example 1, 2, 3 or 4 silicon atoms.
- the chemical bonds X in this case are Si-Si bonds.
- the bonded via chemical bonds X radicals are preferably mono- or polyhydric (poly) siloxane groups R ⁇ S i containing Si-O-Si bonds embedded silicon atoms.
- the (poly) siloxane radicals R ⁇ i S may be prepared by
- X ' is a group -O-, R' '' has the meanings of R '', b is 1, 2, 3 or 4 c is 0, 1, 2 or 3, b + c is 4, d the values 1, 2 or 3 e have the values 0, 1 or 2, d + e the value 3, f the values 1 or 2 g the values 0 or 1 and d + e the value 2.
- the (poly) siloxane groups R ⁇ S i can still preferably up to 1,000 more units of the general formulas (8), (9), (10) and (11)
- R '' SiO3 / 2 (10) SiO 4/2 (H) contain, where
- R '' ' has the above meanings.
- the silicon compounds (A) and (B) may consist of radicals R ⁇ Si and one or more units of the general formulas (1) or (2).
- the radicals R 1, Si preferably have 1 to 1000, in particular 1 to 200, particularly preferably 1 to 10, for example, 1, 2, 3 or 4 units of the general formulas (4) to (11).
- the silicon compounds (A) and (B) may be linear, cyclic or branched.
- hydrocarbon radical R has further OH groups
- two or more silicon compounds (A) may be linked via R radicals or crosslinked.
- R * V are hydrogen atoms or methyl radicals
- R v are methyl, ethyl, vinyl, allyl or phenyl radicals
- h are the values 1 or 2
- z are values from 1 to 20
- y are the values 1, 2, 3 or 4
- r values from 0 to 20
- k values from 1 to 20
- z, a, r, k, 1, m may represent mean values and thus also be numbers with decimal places.
- units [(R (O-CH 2 CH (R IV ) ⁇ r O) R "SiO 2 / 2I ⁇ may occur in which the radicals R IV exclusively hydrogen atoms or methyl radicals, or in which Radicals R * ⁇ , mixed hydrogen atoms or methyl radicals mean that all hydrogen atom / methyl radical ratios of 0-100% hydrogen atoms are possible.
- silicon compounds (A) obtainable by the process according to the invention are intended to reflect the following examples: (tBuO) HSi (OEt) 2 , MeO-Si (n-Bu) 3, (MeOSiMe 2 ) 2 -CH-CH- (SiMe 2 OMe ) 2 , (MeO) 3 Si-O-CH 2 CH 2 -O-Si (OMe) 3, (EtO) 3 Si-O-CH 2 CH (CH 3 ) -O-Si (OEt) 3, PhO-SiPh ( OMe) 2 , n-cyclohexyl-O-SiMe (OEt) 2 , HO-CH 2 CH 2 -O-SiMe 2 (O-CH 2 CH 2 -O-CH 2 CH 2 -OMe ), HO-CH 2 -SiMe 2 -O-SiMe 2 -CH 2 -O-SiMe 2 -CH 2 -O-SiMe
- a special feature of the process according to the invention is that the part of the silicon compounds (B) not affected by the dehydrocondensation reaction with the alcohol of the general formula (3) is as a rule not or only insignificantly changed by the conversion to silicon compounds (A).
- Possible changes to the molecular skeleton are essentially limited to secondary side reactions, such as condensation reactions of silanol groups, which are formed by hydrolysis reactions.
- the water required for this purpose can be introduced, for example, into the reaction by the reaction components. Accordingly, only the units of the general formula (2) contained in silicon compounds (B), depending on the stoichiometry and Reaction conditions completely or partially converted into units of the general formula (1).
- silicon compounds (A) differ essentially from the silicon compounds (B) from the units of the general formula (1) formed from the units of the general formula (2) in the process according to the invention.
- silicon compounds (B) are:
- H-SiMe 2 O-SiMe 2 O-SiMe 2 O-SiMe 2 O-SiMe 2 -CH CH 2 ,
- H 2 C CH-SiMe 2 O- (SiMe (OCH 2 CH 2 CH 2 OCH 2 CH 2 OCH 2 CH 2 OCH 2 CH 2 OMeIO) 6
- Numbers with decimal places in the examples of silicon compounds (A) and (B) represent average values of mixtures of silicon compounds (A) or (B).
- SiMe 2 -CH 2 -OH HO-CH 2 CH 2 CH 2 -SiMe 2 -O-SiMe 2 -CH 2 CH 2 CH 2 -OH.
- the fixed metals Ni, Pd, Pt are used in the process according to the invention on support materials.
- Suitable carrier materials are, in principle, all inorganic or organic polymers previously used for this purpose according to the prior art, such as, for example, SiO 2 , Al 2 O 3, clays, activated carbons, zeolites or organic resins.
- the catalyst support material is preferably activated carbon or Al 2 O 3, it being possible to use as catalysts (K)
- Palladium / activated carbon, palladium / Al 2 ⁇ 3 and nickel / activated carbon, especially palladium / activated carbon is preferred.
- the catalysts used are commercially available products or can be prepared by conventional methods in organometallic chemistry.
- the concentration of the metal bound on the carrier material is preferably in the range of at least 0.01, more preferably at least 0.1 wt .-%, in particular at least 1 and at most 30 wt .-%, particularly preferably at most 10 wt .-% and in particular at most 6 wt .-%.
- Catalysts (K) with higher metal concentrations can bleed out and contaminate the silicon compound (A) with metallic constituents (this is especially true if the silicon compound (A) can not be distilled), for catalysts (K) with lower metal concentrations due to the reduced specific activity higher proportions by weight of catalyst necessary, which can make the work-up consuming and / or losses by adsorption of silicon compounds (A) on the catalyst (K) may occur.
- the catalysts (K) may contain certain amounts of water.
- the solid catalysts are sometimes prepared with a certain water content.
- the proportion of water may come from the preparation of the catalyst (K) or deliberately added.
- the water content is preferably at least 0.1% by weight, particularly preferably at least 1, in the case of catalysts (K) with activated carbon as support material
- the catalysts (K) can be introduced directly as a solid or suspended in one of the two reactants silicon compound (B) or alcohol of the general formula (3), or the target product component (A) or a suitable solvent in the reaction.
- the catalyst (K) bound to a support material is removed after completion of the reaction or at the end of the process according to the invention by filtering, decanting or centrifuging and optionally reused or recycled.
- the amount of the catalyst used depends on the number of present in the silicon compounds (B)
- the catalyst (K) in amounts of at least 10 ppm, more preferably at least 20 ppm, in particular at least 50 ppm and at most 10,000 ppm, more preferably at most 1000 ppm and in particular at most 700 ppm, calculated as a metallic element and based on the total weight of
- the optimal concentration in terms of reaction rate or economy can be determined in simple preliminary experiments, e.g. a partial amount of silicon compound (B) with the alcohol of the general formula (3) is introduced and as much catalyst (K) is added until a clearly recognizable hydrogen evolution begins.
- the amount of the alcohol of the general formula (3) used depends on the number of units of the general formula (2) present in silicon compounds (B) and the desired degree of conversion. Unless complete sales is desired, the alcohol of the general formula (3) is used in equimolar amounts or in excess of the units of the general formula (2) contained in the silicon compounds (B).
- the amount of alcohol of the general formula (3) used is preferably at least 1 mol, and at most 4 mol, particularly preferably at most 3 mol and in particular at most 2 mol OH, based on 1 mol of the Si n-reacted in the silicon compounds (B) bonded H atoms in the units of the general formula (2). If incomplete turnover is desired, i. m> 0, can e.g. even lower levels of alcohol can be used.
- the inventive method is preferably in a
- the process according to the invention is preferably carried out under an absolute pressure of at least 10 hPa, particularly preferably at least 100 hPa and at most 4000 hPa, particularly preferably at most 2000 hPa.
- the method according to the invention is carried out at the pressure of the surrounding atmosphere.
- the hydrogen formed during the reaction can be completely or partially for Pressure build-up can be used. For technical reasons, it may be advantageous to allow the hydrogen formed during the reaction to escape during the reaction.
- the desired reaction usually begins spontaneously with evolution of hydrogen.
- the catalyst (K) may be initially charged and a mixture of both
- silicon compound (B) is preferably initially charged with the catalyst (K) and the alcohol with the general formula (3) added.
- reaction mixtures which react only slowly due to kinetic effects, e.g. because of steric hindrance, incomplete miscibility, it is also possible to include the total amount of all reactants
- Catalyst (K) to mix and allow to react until the desired degree of conversion is achieved.
- the degree of conversion of the mixture can be determined by gas evolution, e.g. by volumetric determination of the released amount of hydrogen, or by means of the usual analytical
- mixtures of different silicon compounds (B) and / or mixtures of alcohols of the general formula (3) can be used in the process according to the invention.
- component (B) by successive reaction of component (B) with various alcohols of the general formula (3) also mixed silicon compounds (A) accessible, wherein the proportion of the respective radical R in the silicon compounds (A) on the stoichiometric ratio of alcohol of general formula (3) to units of the general formula (2) can be adjusted. For example, 30% of all units of the general formula (2) can first be reacted with an alcohol 1 and subsequently the remaining 70% of the units of the general formula (2) can be reacted with an alcohol 2.
- the reaction mixture is preferably worked up after the desired conversion has been achieved with removal of the catalyst (K) and / or the other silicon compounds (A), (B) still present, and more preferably silicon compound (A) by removal of undesirable minor components, e.g. purified by heating volatile components or distillation.
- the reaction mixture can also be fed directly without processing their further processing or application.
- At most 0.5 liter, particularly preferably at most 0.1 liter, in particular at most 0.01 liter, in particular preferably at most 0.001 liter of solvent is used per mole of group OR formed.
- Solvent e.g. aliphatic and aromatic hydrocarbons, such as n-pentane, n-heptane, isooctane,
- Alkane mixtures benzene, toluene, o-xylene, p-xylene and m-xylene; chlorinated hydrocarbons, such as dichloromethane, trichloromethane, chlorobenzene; Ethers, such as diethyl ether, diisopropyl ether, di-n-butyl ether, tetrahydrofuran, dioxane, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether,
- Triethylene glycol dimethyl ether polyethylene glycol dimethyl ether, methyl t-butyl ether; Silicone oils such as hexamethyldisiloxane, trimethylsilyl endblocked polydimethylsiloxanes with viscosities of 2-100 mPas at 20 ° C); Siloxane cycles, such as octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane;
- solvent mixtures can in the inventive method, for example, the mediation poorly miscible or immiscible reactants or to reduce the Viscosity are used, but are preferably present only for polymers having a viscosity> 100 mPas at 20 ° C and / or alcohols having a molecular weight> 75 g / mol. With particular preference, no solvents are used in the process according to the invention.
- the process can be carried out in batch, semibatch or continuous mode.
- the catalyst (K) it is advisable to use the catalyst (K) as a fixed bed and pass over the mixture of the reactants in gaseous, liquid or dissolved form.
- Catalyst 2.12 g of 5% palladium on charcoal containing 54.9% by weight of water (commercially available from Johnson & Matthey, UK, as Pd on Charcoal Type 87L).
- the target product was obtained with a yield of 85% of theory isolated by distillation. Its purity was 99.4% according to gas chromatographic analysis. The total chlorine content was determined by means of ashing and coulometry, it was below the detection limit of 3 ppm. The product is therefore also suitable for use in semiconductor applications.
- Tetrakis (1,1-dimethyl-1-methoxysiloxy) silane In a 500 ml four-necked flask with reflux condenser, KPG stirrer and thermometer, 0.75 g of 5% palladium on charcoal, anhydrous (commercially available from Sigma). Aldrich Corp., USA) in 87.8 g of methanol. This mixture was heated in an oil bath to 50 ° C. Subsequently, at this temperature, 150 g of tetrakis (1, 1-dimethylsiloxy) silane within 3 Hours added with stirring. After adding the first drops of the SiH-functional siloxane spontaneous
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012502564A JP2012522738A (ja) | 2009-04-01 | 2010-03-19 | 炭化水素オキシケイ素化合物の製造方法 |
CN2010800153647A CN102365289A (zh) | 2009-04-01 | 2010-03-19 | 生产烃氧基硅化合物的方法 |
US13/255,432 US8507709B2 (en) | 2009-04-01 | 2010-03-19 | Method for producing hydrocarbon oxysilicon compounds |
KR1020117024791A KR101335781B1 (ko) | 2009-04-01 | 2010-03-19 | 탄화수소 옥시규소 화합물의 제조 방법 |
EP10710569A EP2414370A1 (de) | 2009-04-01 | 2010-03-19 | Verfahren zur herstellung von kohlenwasserstoffoxysiliciumverbindungen |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009002075A DE102009002075A1 (de) | 2009-04-01 | 2009-04-01 | Verfahren zur Herstellung von Kohlenwasserstoffoxysiliciumverbindungen |
DE102009002075.6 | 2009-04-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010112350A1 true WO2010112350A1 (de) | 2010-10-07 |
Family
ID=42140084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2010/053582 WO2010112350A1 (de) | 2009-04-01 | 2010-03-19 | Verfahren zur herstellung von kohlenwasserstoffoxysiliciumverbindungen |
Country Status (7)
Country | Link |
---|---|
US (1) | US8507709B2 (de) |
EP (1) | EP2414370A1 (de) |
JP (1) | JP2012522738A (de) |
KR (1) | KR101335781B1 (de) |
CN (1) | CN102365289A (de) |
DE (1) | DE102009002075A1 (de) |
WO (1) | WO2010112350A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9150475B2 (en) | 2013-11-08 | 2015-10-06 | Celanese International Corporation | Process for producing ethanol by hydrogenation with carbon monoxide controls |
US20170193644A1 (en) * | 2015-12-30 | 2017-07-06 | Ebay Inc | Background removal |
WO2017154848A1 (ja) * | 2016-03-09 | 2017-09-14 | 国立研究開発法人産業技術総合研究所 | シリルアセタール、オリゴシロキサン、及びそれらの製造方法 |
JP7416927B2 (ja) * | 2019-10-11 | 2024-01-17 | ワッカー ケミー アクチエンゲゼルシャフト | ヒドリドシリコン化合物からのシロキサンの調製方法 |
CN112832034B (zh) * | 2020-12-31 | 2023-04-21 | 浙江路联装饰材料有限公司 | 改性有机硅树脂及其在聚氨酯无溶剂装饰革、家具革、汽车革方面的应用 |
CN117466932B (zh) * | 2023-12-28 | 2024-04-16 | 山东东岳有机硅材料股份有限公司 | 1,1,1,3,5,5,5-七甲基三硅氧烷的合成工艺 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2967171A (en) | 1957-06-14 | 1961-01-03 | Dow Corning | Reaction of organohydrogenosilicon compounds with hydroxy compounds |
DE1248048B (de) | 1964-07-16 | 1967-08-24 | Rhone Poulenc Sa | Verfahren zur Herstellung von Organosiliciumverbindungen |
EP0475440A2 (de) | 1990-09-14 | 1992-03-18 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung von höhere Alkoxygruppe enthaltenden Polysiloxanen |
JPH08325277A (ja) | 1995-06-01 | 1996-12-10 | Shin Etsu Chem Co Ltd | 1,3−ジメトキシ−1,1,3,3−テトラメチルジシロキサンの製造方法 |
JPH0912720A (ja) | 1995-06-30 | 1997-01-14 | Shin Etsu Chem Co Ltd | α,ω−ジアルコキシオリゴシロキサンの製造方法 |
JPH0940681A (ja) | 1995-08-01 | 1997-02-10 | Shin Etsu Chem Co Ltd | アルコキシシロキサンの製造方法 |
EP1627892A1 (de) | 2004-08-18 | 2006-02-22 | Goldschmidt GmbH | Katalytisches System für die dehydrogenative Kondensation von Polyorganosiloxanen mit Alkoholen und ein Verfahren zur Herstellung von organisch modifizierten Polyorganosiloxanen |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3373137A (en) * | 1962-05-18 | 1968-03-12 | Dow Corning | Nitrogen-containing organosilicon compounds and their preparation |
JPH0737467B2 (ja) * | 1989-05-26 | 1995-04-26 | 信越化学工業株式会社 | tert―ブチルトリアルコキシシランの製造方法 |
US5310842A (en) * | 1990-09-14 | 1994-05-10 | Shin-Etsu Chemical Co., Ltd. | Higher alkoxy-substituted organopolysiloxane |
JP2704344B2 (ja) * | 1992-03-30 | 1998-01-26 | 信越化学工業株式会社 | アルコキシシランの製造方法 |
JPH0673073A (ja) * | 1992-08-26 | 1994-03-15 | Denki Kagaku Kogyo Kk | オルガノトリアルコキシシランの製造方法 |
US6005131A (en) * | 1996-01-30 | 1999-12-21 | Bayer Aktiengesellschaft | Multi-functional, cyclic organosiloxanes, process for the production thereof and use thereof |
US6503594B2 (en) | 1997-02-13 | 2003-01-07 | Samsung Electronics Co., Ltd. | Silicon wafers having controlled distribution of defects and slip |
JP3815535B2 (ja) * | 1999-10-13 | 2006-08-30 | 信越化学工業株式会社 | アルコール類のシリル化方法 |
JP3812647B2 (ja) * | 2001-09-07 | 2006-08-23 | 信越化学工業株式会社 | オルガノオキシ基またはヒドロキシル基を有するシロキサンの製造方法 |
JP2004067802A (ja) * | 2002-08-05 | 2004-03-04 | Shin Etsu Chem Co Ltd | オルガノキシ基又はヒドロキシル基を有するシロキサンの製造方法 |
DE102006039191A1 (de) * | 2006-08-21 | 2008-03-20 | Wacker Chemie Ag | Kontinuierliche Herstellung von Organosilanen |
-
2009
- 2009-04-01 DE DE102009002075A patent/DE102009002075A1/de not_active Withdrawn
-
2010
- 2010-03-19 EP EP10710569A patent/EP2414370A1/de not_active Withdrawn
- 2010-03-19 JP JP2012502564A patent/JP2012522738A/ja active Pending
- 2010-03-19 US US13/255,432 patent/US8507709B2/en not_active Expired - Fee Related
- 2010-03-19 CN CN2010800153647A patent/CN102365289A/zh active Pending
- 2010-03-19 WO PCT/EP2010/053582 patent/WO2010112350A1/de active Application Filing
- 2010-03-19 KR KR1020117024791A patent/KR101335781B1/ko not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2967171A (en) | 1957-06-14 | 1961-01-03 | Dow Corning | Reaction of organohydrogenosilicon compounds with hydroxy compounds |
DE1248048B (de) | 1964-07-16 | 1967-08-24 | Rhone Poulenc Sa | Verfahren zur Herstellung von Organosiliciumverbindungen |
EP0475440A2 (de) | 1990-09-14 | 1992-03-18 | Shin-Etsu Chemical Co., Ltd. | Verfahren zur Herstellung von höhere Alkoxygruppe enthaltenden Polysiloxanen |
JPH08325277A (ja) | 1995-06-01 | 1996-12-10 | Shin Etsu Chem Co Ltd | 1,3−ジメトキシ−1,1,3,3−テトラメチルジシロキサンの製造方法 |
JPH0912720A (ja) | 1995-06-30 | 1997-01-14 | Shin Etsu Chem Co Ltd | α,ω−ジアルコキシオリゴシロキサンの製造方法 |
JPH0940681A (ja) | 1995-08-01 | 1997-02-10 | Shin Etsu Chem Co Ltd | アルコキシシロキサンの製造方法 |
EP1627892A1 (de) | 2004-08-18 | 2006-02-22 | Goldschmidt GmbH | Katalytisches System für die dehydrogenative Kondensation von Polyorganosiloxanen mit Alkoholen und ein Verfahren zur Herstellung von organisch modifizierten Polyorganosiloxanen |
Non-Patent Citations (3)
Title |
---|
H. MIMOUN, JOURNAL OF ORGANIC CHEMISTRY, vol. 64, no. 7, 1999, pages 2582 - 2589 |
L.H.SOMMER; J.E.LYONS, JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 91, 1969, pages 7061 |
SILICON CHEMISTRY, vol. 2, no. 5/6, 2005, pages 271 - 277 |
Also Published As
Publication number | Publication date |
---|---|
EP2414370A1 (de) | 2012-02-08 |
CN102365289A (zh) | 2012-02-29 |
KR101335781B1 (ko) | 2013-12-12 |
US20120010422A1 (en) | 2012-01-12 |
US8507709B2 (en) | 2013-08-13 |
JP2012522738A (ja) | 2012-09-27 |
KR20110132455A (ko) | 2011-12-07 |
DE102009002075A1 (de) | 2010-10-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2010112350A1 (de) | Verfahren zur herstellung von kohlenwasserstoffoxysiliciumverbindungen | |
EP1460099A1 (de) | Verfahren zur Umsetzung von Polyorganosiloxanen | |
EP1627892A1 (de) | Katalytisches System für die dehydrogenative Kondensation von Polyorganosiloxanen mit Alkoholen und ein Verfahren zur Herstellung von organisch modifizierten Polyorganosiloxanen | |
WO2009049943A1 (de) | Entfernung von polaren organischen verbindungen und fremdmetallen aus organosilanen | |
DE4316101A1 (de) | Organosiliciumverbindungen mit käfigartiger Struktur | |
WO2010066487A1 (de) | Reinigung von siliciumverbindungen | |
EP3164407B1 (de) | Verfahren zur herstellung von siloxanen aus alkalisalzen von silanolen | |
EP0776935B1 (de) | Niedermolekulare Organosiliciumverbindungen, Verfahren zu deren Herstellung sowie deren Verwendung in vernetzbaren Organopolysiloxanmassen | |
EP2493962B1 (de) | Verfahren zur herstellung von (hydroxymethyl)polysiloxanen | |
EP0787734A1 (de) | Multifunktionelle, cyclische Organosiloxane, Verfahren zu deren Herstellung und deren Verwendung | |
EP3858893A1 (de) | Verfahren zur herstellung hochreiner hydrosilylierungsprodukte | |
EP2445837B1 (de) | Verfahren zur herstellung von dodecahalogenneopentasilanen | |
WO2013174689A1 (de) | Verfahren zur herstellung von feststoffen aus alkalisalzen von silanolen | |
EP4349883A1 (de) | Herstellung von alkoxysiloxanen | |
EP0115772B1 (de) | Verfahren zur Spaltung von Organosiloxanen und deren Produkte und Anwendungen | |
WO2005123812A1 (de) | Verfahren zur herstellung von hydroxyalkylpolysiloxanen | |
DE60205521T2 (de) | Verfahren zur Herstellung linearer Organohydrosiloxane | |
DE102015224732A1 (de) | Verfahren zur Herstellung von Siloxanolen aus Metallsalzen von Silanolen | |
DE602004011200T2 (de) | Verfahren zur destillierung von (meth)acryloxygruppen-enthaltenden organosiliziumverbindungen | |
EP4112674A1 (de) | Verfahren zur herstellung hochreiner hydrosilylierungsprodukte | |
EP2872522A1 (de) | Oxasilacyclen und verfahren zu deren herstellung | |
EP0266633A2 (de) | Verfahren zur Herstellung von SiH-Gruppen enthaltenden Organopolysiloxanen | |
WO2021069081A1 (de) | Verfahren zur herstellung von siloxanen aus hydridosiliciumverbindungen | |
EP4301822B1 (de) | Siloxan-funktionalisierte kieselsäure | |
DE2163912C3 (de) | Verfahren zur Herstellung von Hydrogendialkylchlorsilanen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201080015364.7 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 10710569 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13255432 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010710569 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012502564 Country of ref document: JP |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
ENP | Entry into the national phase |
Ref document number: 20117024791 Country of ref document: KR Kind code of ref document: A |