WO2010107262A3 - 열변환반응 밀폐용기 - Google Patents

열변환반응 밀폐용기 Download PDF

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Publication number
WO2010107262A3
WO2010107262A3 PCT/KR2010/001686 KR2010001686W WO2010107262A3 WO 2010107262 A3 WO2010107262 A3 WO 2010107262A3 KR 2010001686 W KR2010001686 W KR 2010001686W WO 2010107262 A3 WO2010107262 A3 WO 2010107262A3
Authority
WO
WIPO (PCT)
Prior art keywords
hot zone
bezel
reaction gas
fed
hermetic container
Prior art date
Application number
PCT/KR2010/001686
Other languages
English (en)
French (fr)
Other versions
WO2010107262A2 (ko
Inventor
윤순광
정재철
김태수
김태형
유선일
김경호
Original Assignee
주식회사수성기술
한국실리콘주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090023875A external-priority patent/KR101079340B1/ko
Priority claimed from KR1020090027973A external-priority patent/KR101181458B1/ko
Application filed by 주식회사수성기술, 한국실리콘주식회사 filed Critical 주식회사수성기술
Priority to CN2010800129826A priority Critical patent/CN102361688A/zh
Priority to US13/257,034 priority patent/US20120039760A1/en
Priority to JP2012500722A priority patent/JP2012520759A/ja
Publication of WO2010107262A2 publication Critical patent/WO2010107262A2/ko
Publication of WO2010107262A3 publication Critical patent/WO2010107262A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002—Nozzle-type elements
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00094—Jackets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00132—Controlling the temperature using electric heating or cooling elements
    • B01J2219/00135—Electric resistance heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00159—Controlling the temperature controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
    • B01J2219/0277—Metal based
    • B01J2219/0286—Steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Silicon Compounds (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Abstract

본 발명은 열변환반응 밀폐용기에 관한 것으로서, 본 발명에 따른 열변환반응 밀폐용기는 유틸리티들이 설치되는 베이스 플레이트;와, 상기 베이스 플레이트와의 사이에 밀폐된 핫존을 형성하는 베젤;과, 상기 핫존에 배치되는 히터;와, 상기 핫존으로 반응 가스를 공급 및 배출하는 유입공과 유출공; 및, 상기 유입공을 통해 핫존으로 공급되는 반응 가스가 상기 베젤로 전달되는 열에너지를 흡수하여 베젤의 온도를 냉각시키는 것과 동시에 가열된 상태로 상기 핫존으로 공급되도록 상기 베젤의 내측에 형성되는 열교환부;를 포함하는 것을 특징으로 한다. 이에 의하여, 베젤의 내측에 마련된 열교환부를 통해 반응 가스가 핫존으로 공급되는 과정에서, 핫존의 히터로부터 베젤로 전달되어 외부로 손실되는 열에너지를 핫존으로 공급되는 반응 가스가 흡수하므로 베젤이 한계온도 이상으로 가열되는 것이 방지되며, 상기 베젤의 외측으로 손실되는 열에너지를 흡수한 반응 가스가 가열되어 핫존으로 공급되므로 히터의 전력소비량을 절감할 수 있는 열변환반응 밀폐용기가 제공된다.
PCT/KR2010/001686 2009-03-20 2010-03-18 열변환반응 밀폐용기 WO2010107262A2 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
CN2010800129826A CN102361688A (zh) 2009-03-20 2010-03-18 热转换反应密封容器
US13/257,034 US20120039760A1 (en) 2009-03-20 2010-03-18 Hermetic Container for Thermal Conversion Reaction
JP2012500722A JP2012520759A (ja) 2009-03-20 2010-03-18 熱変換反応密閉容器

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020090023875A KR101079340B1 (ko) 2009-03-20 2009-03-20 열변환반응에 의한 트리클로로실란 제조장치
KR10-2009-0023875 2009-03-20
KR1020090027973A KR101181458B1 (ko) 2009-04-01 2009-04-01 열변환반응 밀폐용기
KR10-2009-0027973 2009-04-01

Publications (2)

Publication Number Publication Date
WO2010107262A2 WO2010107262A2 (ko) 2010-09-23
WO2010107262A3 true WO2010107262A3 (ko) 2010-12-23

Family

ID=42740138

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/001686 WO2010107262A2 (ko) 2009-03-20 2010-03-18 열변환반응 밀폐용기

Country Status (4)

Country Link
US (1) US20120039760A1 (ko)
JP (1) JP2012520759A (ko)
CN (1) CN102361688A (ko)
WO (1) WO2010107262A2 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9315895B2 (en) * 2010-05-10 2016-04-19 Mitsubishi Materials Corporation Apparatus for producing polycrystalline silicon
US9168502B2 (en) * 2011-11-28 2015-10-27 Mitsubishi Materials Corporation Apparatus for producing trichlorosilane
KR101895526B1 (ko) * 2015-08-28 2018-09-05 한화케미칼 주식회사 폴리실리콘 제조 장치
SG11202009836VA (en) * 2018-04-05 2020-11-27 Tokuyama Corp Polycrystalline silicon rod manufacturing method, and reactor
WO2020255672A1 (ja) * 2019-06-17 2020-12-24 株式会社トクヤマ 棒状体、治具、取り外し方法およびシリコンロッドの製造方法
KR20210065054A (ko) * 2019-11-25 2021-06-03 주식회사 원익아이피에스 가스 공급 블록 및 이를 포함하는 기판 처리 장치
CN113753899B (zh) * 2021-10-25 2022-05-03 江苏大学 一种还原炉保温结构、多晶硅还原炉及工作方法

Citations (4)

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Publication number Priority date Publication date Assignee Title
US20080159942A1 (en) * 2005-03-05 2008-07-03 Rico Berthold Reactor And Process For The Preparation Of Silicon
US20080233037A1 (en) * 2007-03-19 2008-09-25 Chisso Corporation Apparatus and method for manufacturing high purity polycrystalline silicon
EP2000434A2 (en) * 2006-10-31 2008-12-10 Mitsubishi Materials Corporation Trichlorosilane production apparatus
EP2003092A1 (en) * 2006-10-31 2008-12-17 Mitsubishi Materials Corporation Trichlorosilane production apparatus

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US3057701A (en) * 1956-09-27 1962-10-09 British Titan Products Apparatus for the distribution of gases
JPS5753231A (en) * 1980-09-17 1982-03-30 Hitachi Maxell Ltd Powder withdrawing apparatus
JPH0761445B2 (ja) * 1986-11-13 1995-07-05 トヨタ自動車株式会社 金属化合物の微粉末の製造方法及び装置
JPH0732311U (ja) * 1993-11-29 1995-06-16 石川島播磨重工業株式会社 流動層ボイラの空気分散ノズル
JP3166025B2 (ja) * 1994-10-17 2001-05-14 信越化学工業株式会社 流動床式混合・分散装置用ノズル
GB9500226D0 (en) * 1995-01-06 1995-03-01 Bp Chem Int Ltd Nozzle
JP2005230586A (ja) * 2002-03-08 2005-09-02 Shuzo Nomura ガス混合装置及びガス反応装置
JP2007229556A (ja) * 2006-02-28 2007-09-13 Hitachi Ltd 化学反応装置
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080159942A1 (en) * 2005-03-05 2008-07-03 Rico Berthold Reactor And Process For The Preparation Of Silicon
EP2000434A2 (en) * 2006-10-31 2008-12-10 Mitsubishi Materials Corporation Trichlorosilane production apparatus
EP2003092A1 (en) * 2006-10-31 2008-12-17 Mitsubishi Materials Corporation Trichlorosilane production apparatus
US20080233037A1 (en) * 2007-03-19 2008-09-25 Chisso Corporation Apparatus and method for manufacturing high purity polycrystalline silicon

Also Published As

Publication number Publication date
WO2010107262A2 (ko) 2010-09-23
US20120039760A1 (en) 2012-02-16
CN102361688A (zh) 2012-02-22
JP2012520759A (ja) 2012-09-10

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