WO2010089892A1 - 太陽電池 - Google Patents
太陽電池 Download PDFInfo
- Publication number
- WO2010089892A1 WO2010089892A1 PCT/JP2009/052160 JP2009052160W WO2010089892A1 WO 2010089892 A1 WO2010089892 A1 WO 2010089892A1 JP 2009052160 W JP2009052160 W JP 2009052160W WO 2010089892 A1 WO2010089892 A1 WO 2010089892A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- wetting
- solar cell
- layers
- positive electrode
- Prior art date
Links
- 238000009736 wetting Methods 0.000 claims abstract description 190
- 239000000463 material Substances 0.000 claims abstract description 171
- 239000002096 quantum dot Substances 0.000 claims abstract description 91
- 230000027756 respiratory electron transport chain Effects 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 20
- 230000003993 interaction Effects 0.000 claims description 14
- 230000000903 blocking effect Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 230000000694 effects Effects 0.000 abstract description 34
- 239000000969 carrier Substances 0.000 abstract description 22
- 239000004065 semiconductor Substances 0.000 description 26
- 230000005525 hole transport Effects 0.000 description 15
- 230000004888 barrier function Effects 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 229910002704 AlGaN Inorganic materials 0.000 description 5
- 230000001678 irradiating effect Effects 0.000 description 5
- 229910000673 Indium arsenide Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 4
- 238000010248 power generation Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 230000005639 quantum mechanical wave Effects 0.000 description 1
- 239000004054 semiconductor nanocrystal Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035209—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
- H01L31/035218—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum dots
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0735—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising only AIIIBV compound semiconductors, e.g. GaAs/AlGaAs or InP/GaInAs solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
- H01L31/1856—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising nitride compounds, e.g. GaN
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Definitions
- the present invention relates to a solar cell, and more particularly to a solar cell using a wetting layer and quantum dots.
- quantum dot solar cell One of the new methods studied so far is a solar cell using semiconductor quantum dots (hereinafter referred to as “quantum dot solar cell”).
- a quantum dot used in a quantum dot solar cell is a semiconductor nanocrystal having a size of about 10 nm and is sometimes referred to as an electron or a hole generated by irradiating light (hereinafter, these are collectively referred to as “carrier”). )
- Carrier irradiating light
- Patent Document 1 includes a quantum dot having a pin structure and having a three-dimensional quantum confinement function in an i layer which is a light detection layer, and includes a quantum dot and a barrier layer surrounding the quantum dot.
- a solar cell is disclosed in which the energy band structure is type II.
- Patent Document 2 discloses an optical semiconductor device using a stacked body in which layers in which self-assembled quantum dots are generated are multilayered.
- Patent Document 3 discloses a quantum dot semiconductor laser characterized by an energy potential structure for shortening the carrier relaxation time in the quantum dots.
- an object of the present invention is to provide a solar cell that can extract a current by moving carriers while obtaining a phonon bottleneck effect of a quantum dot.
- a first aspect of the present invention includes a first material layer having a wetting layer and quantum dots generated in the wetting layer, a second material layer on which the first material layer is formed, and a negative electrode
- the negative electrode or the positive electrode and the wetting layer are connected and the negative electrode and the wetting layer are connected, electrons existing in the wetting layer move to the negative electrode.
- the positive and negative electrodes are connected in such a way that the positive electrode and the wetting layer are connected, and the holes existing in the wetting layer are connected so as to be movable to the positive electrode. It is.
- the negative electrode or the positive electrode and the wetting layer may be directly connected.
- directly connected means that the negative electrode and the wetting layer are in contact with each other without any other layer, or the negative electrode and the wetting layer are connected, or other layers. It means that the positive electrode and the wetting layer are connected in such a form that the positive electrode and the wetting layer are in contact with each other without the interposition.
- the negative electrode and the wetting layer are connected via the electron transfer layer capable of preventing the passage of holes, and the positive electrode and the wetting layer are connected.
- the connection is made via a hole moving layer capable of blocking the passage of electrons.
- the electron transfer layer and the wetting layer are connected, the electron transfer layer and the wetting layer are connected via an electron mixed layer that activates the interaction of a plurality of electrons.
- the layers are connected, they are preferably connected via a hole mixed layer that activates the interaction of a plurality of holes.
- interaction of a plurality of electrons refers to an action in which two or more electrons collide with each other.
- the “interaction of a plurality of holes” refers to an operation in which two or more holes collide with each other.
- the first material layer and the second material layer are provided in plural, the first material layer and the second material layer are alternately stacked, and the negative electrode and the wetting layer are connected to each other.
- the negative electrode and the plurality of wetting layers are connected so that the electrons existing in each of the plurality of wetting layers can move to the negative electrode, and the positive electrode and the wetting layer are connected.
- the positive electrode and the plurality of wetting layers are connected so that holes existing in each of the plurality of wetting layers can move to the positive electrode.
- the laminate including the plurality of first material layers and the plurality of second material layers includes a recess, and the negative electrode and the web are provided.
- the connecting layer is connected, the negative electrode arranged in the recess and the plurality of wetting layers are connected so that electrons existing in each of the plurality of wetting layers can move to the negative electrode.
- the positive electrode and the wetting layer are connected, the positive electrode disposed in the recess and the plurality of wettings so that the holes existing in each of the plurality of wetting layers can move to the positive electrode.
- the layer may be connected to the layer.
- a first material layer having a wetting layer and quantum dots generated in the wetting layer, a second material layer on which the first material layer is formed, and a positive electrode And a negative electrode, and the negative electrode and the wetting layer are connected so that electrons existing in the wetting layer can move to the negative electrode through an electron transfer layer capable of blocking the passage of holes.
- the positive electrode and the wetting layer are connected so that the holes existing in the wetting layer can move to the positive electrode through the hole moving layer that can block the passage of electrons. It is a solar cell. *
- the electron transfer layer and the wetting layer are connected via an electron mixed layer that activates the interaction of a plurality of electrons.
- the hole moving layer and the wetting layer are connected via a hole mixed layer that activates the interaction of a plurality of holes.
- the first material layer and the second material layer are formed so as to be inclined with respect to the horizontal plane, and are disposed substantially horizontally with the wetting layer formed so as to be inclined with respect to the horizontal plane.
- the negative electrode is connected to at least the electron transfer layer, and the wetting layer formed so as to be inclined with respect to the horizontal plane and the positive electrode arranged substantially horizontally are at least via the hole transfer layer It is preferable that they are connected.
- a plurality of first material layers and a plurality of second material layers are provided, the first material layers and the second material layers are alternately stacked, and the negative electrode and the plurality of wetting layers are provided.
- the electron transfer layer is connected, and the positive electrode and the plurality of wetting layers are connected at least through the hole transfer layer.
- the laminate having the plurality of first material layers and the plurality of second material layers has at least two or more recesses, and is disposed in at least one of the two or more recesses. And a plurality of wetting layers are connected via at least an electron transfer layer, and a positive electrode disposed in at least one of two or more recesses and a plurality of wetting layers are connected via at least a hole transfer layer It can be made into the form currently made.
- the difference between the band gap of the first material layer and the band gap of the second material layer is 1 eV or more.
- the negative electrode or the positive electrode and the quantum dot are connected via at least the wetting layer. Therefore, the carriers confined in the quantum dots can be moved to the wetting layer, and the carriers present in the wetting layer can be moved to the negative electrode or the positive electrode.
- the wetting layer has a thickness of about one or two molecules, only carriers having specific energy can exist. Therefore, according to the first aspect of the present invention, it is possible to provide a solar cell that can extract a current by moving carriers while obtaining a phonon bottleneck effect of a quantum dot.
- the wetting layer can function as an electron transfer layer or a hole transfer layer. Therefore, it is possible to provide a solar cell that can extract a current by moving carriers while obtaining a phonon bottleneck effect of a quantum dot by directly connecting a negative electrode or a positive electrode and a wetting layer. Can do.
- the electron moving layer or the hole moving layer by using the electron moving layer or the hole moving layer, it is possible to reliably select carriers that reach the negative electrode and the positive electrode in addition to the above effects.
- a wetting layer formed so as to be inclined with respect to a horizontal plane is connected to a negative electrode or a positive electrode arranged substantially horizontally.
- the solar cell can be easily manufactured.
- the plurality of wetting layers and the negative electrode or the positive electrode are connected, and in addition to the above effects, the first material layer and the second material layer are further absorbed. It becomes possible to easily increase the photoelectric conversion efficiency by increasing the light.
- the first electrode in which a plurality of first material layers and second material layers are provided, can also be formed by connecting a negative electrode or a positive electrode disposed in the recess and a plurality of wetting layers. It is possible to easily improve the photoelectric conversion efficiency by increasing the light absorbed by the material layer and the second material layer.
- the wetting layer and the negative electrode are connected via the electron transfer layer, and the wetting layer and the positive electrode are connected via the hole transfer layer. Since quantum dots are used, the phonon bottleneck effect of quantum dots can be obtained also by the second aspect of the present invention. Furthermore, according to the second aspect of the present invention, the electrons moved from the quantum dots to the wetting layer can be moved to the negative electrode, and the holes moved from the quantum dots to the wetting layer can be positive. It can be moved to the electrode. Therefore, according to the second aspect of the present invention, it is possible to provide a solar cell that can extract a current by moving carriers while obtaining a phonon bottleneck effect of quantum dots.
- the electron transfer layer and the wetting layer are connected via the electron mixed layer, so that in addition to the above effects, electrons can be easily transferred from the wetting layer to the negative electrode. It can be moved.
- the hole moving layer and the wetting layer are connected via the hole mixed layer, so that in addition to the above effects, the holes can be easily transferred from the wetting layer to the positive electrode. Can be moved.
- the wetting layer formed so as to be inclined with respect to the horizontal plane, and the negative electrode and the positive electrode disposed substantially horizontally are at least an electron moving layer and a hole moving layer, respectively.
- the solar cell can be easily manufactured.
- the plurality of wetting layers, the negative electrode, and the positive electrode are connected through at least the electron transfer layer and the hole transfer layer, respectively, in addition to the above effect, It is possible to easily improve the photoelectric conversion efficiency by increasing the light absorbed by the first material layer and the second material layer.
- the negative electrode disposed in the recess, the positive electrode disposed in the recess, and the plurality of wetting layers, respectively Also by connecting via the electron transfer layer and the hole transfer layer, the light absorbed by the first material layer and the second material layer can be increased to easily improve the photoelectric conversion efficiency.
- the difference between the band gap of the first material layer and the band gap of the second material layer is 1 eV or more.
- the carriers generated by irradiating light can be easily confined in the quantum dots.
- FIG. 2 is a cross-sectional view showing a configuration example of a solar cell 10.
- FIG. 2 is a cross-sectional view showing a configuration example of a solar cell 10.
- FIG. 2 is a cross-sectional view showing a configuration example of a solar cell 20.
- FIG. 2 is a band diagram showing a band structure of solar cell 20.
- FIG. 3 is a cross-sectional view showing an example of a form of solar cell 30.
- FIG. 4 is a cross-sectional view showing an example of a form of solar cell 40.
- FIG. FIG. 4 is a diagram showing an example of one process included in the manufacturing process of the solar cell 40.
- Quantum dot solar cells use, for example, the phonon bottleneck effect of quantum dots by confining electrons generated by light irradiation in quantum dots. This makes it possible to increase the band of the solar spectrum that can be absorbed, and in the quantum dot solar cell, it is necessary to confine carriers in the quantum dots. On the other hand, if carriers are held in the quantum dots and cannot move from the quantum dots to the electrodes, current cannot be extracted, and as a result, it is difficult to improve the photoelectric conversion efficiency. Therefore, in order to improve the photoelectric conversion efficiency of the quantum dot solar cell, it is necessary to make it possible to move the carrier from the quantum dot while maintaining the maximum effect of confining the carrier in the quantum dot. In order to solve this problem, it is considered effective to limit the energy range of carriers extracted from the quantum dots.
- the present inventor has used a wetting layer connected to quantum dots to maintain the effect obtained by confining carriers in the quantum dots (phonon bottleneck effect) to the maximum while It was found that the carrier can be moved from the dot. Furthermore, the present inventor connects the wetting layer connected to the quantum dot and the electrode (negative electrode and / or positive electrode) to thereby move the carrier moved to the wetting layer to the negative electrode or the positive electrode. It has been found that the current can be taken out.
- the present invention has been made based on such knowledge.
- the present invention moves the carrier while obtaining the phonon bottleneck effect of the quantum dot by directly or indirectly connecting the wetting layer connected to the quantum dot and the negative electrode and / or the positive electrode.
- the main point of the invention is to provide a solar cell capable of taking out an electric current.
- FIG. 1 is a cross-sectional view showing an example of a solar cell 10 according to the first embodiment of the present invention.
- FIG. 1 only a part of the solar cell 10 is extracted and enlarged. Further, in FIG. 1, some reference numerals are omitted.
- FIG. 2 is an enlarged view showing a part surrounded by a dotted line in FIG.
- the solar cell 10 includes a stacked body 3 having a plurality of first material layers 1, 1,... And a plurality of second material layers 2, 2,.
- the first material layers 1, 1,... are semiconductors having a slightly larger lattice constant and a smaller band gap than the semiconductor (semiconductor corresponding to the semiconductor X) constituting the second material layers 2, 2,. (A semiconductor corresponding to the semiconductor Y).
- the first material layer 1 includes a wetting layer 1a and quantum dots 1b, 1b,... Connected to the wetting layer 1a, and a plurality of wetting layers 1a, 1a,. And are connected directly.
- the first material layers 1, 1,... Are made of InN
- the second material layers 2, 2,... are made of p-doped GaN
- the hole transport layer 6 is strongly p-doped AlGaN.
- the first material layers 1, 1,... Correspond to the n layer, the second material layers 2, 2,... Correspond to the p layer, and the hole transport layer 6 corresponds to the p + layer.
- the quantum dots 1b, 1b,... Have a height of about 1 to 10 nm and a diameter of about 10 to 100 nm.
- the electrons generated in the stacked body 3 by irradiating light can be confined in the quantum dots 1b, 1b,..., And the phonon bottleneck effect of the quantum dots 1b, 1b,. Can do.
- the wetting layers 1a, 1a,... Connected to the quantum dots 1b, 1b,. Therefore, only electrons having energy higher than the energy at the bottom of the conduction band of the semiconductor Y can exist in the wetting layers 1a, 1a,. Therefore, in the solar cell 10, among the electrons confined in the quantum dots 1b, 1b,..., Only electrons having energy that can move to the wetting layers 1a, 1a,. And can be moved.
- the wetting layers 1a, 1a, ... and the negative electrodes 5, 5 are directly connected. Therefore, according to the solar cell 10, electrons moved to the wetting layers 1 a, 1 a,... Can be moved to the negative electrodes 5, 5. That is, according to the solar cell 10, the electrons confined in the quantum dots 1b, 1b,... Can be taken out via the wetting layers 1a, 1a,.
- the holes generated by irradiating the solar cell 10 with light can move from the first material layer 1, 1,... To the second material layer 2, 2,.
- a force that accelerates toward the hole moving layer 6 is caused by the electric field induced by p-doping of the hole moving layer 6. Therefore, the holes existing in the laminate 3 can move from the upper side to the lower side in FIG. 1 and can reach the positive electrode 7 via the hole moving layer 6 that can block the passage of electrons.
- the solar cell 10 As described above, according to the solar cell 10, the electrons generated in the stacked body 3 by irradiating light with the phonon bottleneck effect of the quantum dots 1 b, 1 b,. Can be moved to the negative electrodes 5, 5, and the holes generated in the stacked body 3 can be moved to the positive electrode 7. Therefore, according to the present invention, it is possible to provide the solar cell 10 capable of extracting electrons by moving electrons while obtaining the phonon bottleneck effect of the quantum dots 1b, 1b,.
- the laminated body 3 can be produced, for example, by the following procedure. That is, first, a semiconductor having a smaller lattice constant and a larger band gap (semiconductor corresponding to the semiconductor X) than the semiconductor (semiconductor corresponding to the semiconductor Y) constituting the first material layer 1 on the surface of the hole moving layer 6. The 2nd material layer 2 comprised by these is formed. Thereafter, a semiconductor (semiconductor corresponding to the semiconductor Y) is vapor-deposited on the surface of the formed second material layer 2 by the SK mode in the order of nm, thereby generating the wetting layer 1a and the quantum generated in the wetting layer 1a.
- a first material layer 1 having dots 1b, 1b,...
- the laminate 3 can be manufactured. And if the laminated body 3 is produced, for example, the concave portions 4 and 4 are formed by etching the surface of the laminated body 3 with an appropriate mask, or by grinding with an electron beam or ion beam processing or other technique, The material forming the negative electrodes 5 and 5 (for example, a material that can form a transparent electrode, etc .; the same applies below) is deposited on the formed recesses 4 and 4. By manufacturing the solar cell 10 through such steps, the plurality of wetting layers 1a, 1a,... And the negative electrodes 5, 5 can be directly connected.
- the plurality of wetting layers 1a, 1a,... And the negative electrodes 5, 5 can be directly connected.
- FIG. 3 is sectional drawing which shows the example of the form of the solar cell 20 of this invention concerning 2nd Embodiment.
- FIG. 3 only a part of the solar cell 20 is extracted and enlarged.
- FIG. 3 some reference numerals are omitted. 3, those having the same configuration as that of the solar cell 10 shown in FIG. 1 are denoted by the same reference numerals as those used in FIG. 1, and description thereof will be omitted as appropriate.
- the solar cell 20 includes a stacked body 3 having a plurality of first material layers 1, 1,... And a plurality of second material layers 2, 2,. 4, the electron transfer layers 8, 8 and the negative electrodes 5, 5 arranged in 4, the hole transfer layer 6 arranged in contact with the second material layer 2 below the stacked body 3, and the hole transfer layer 6 And a positive electrode 7 disposed so as to be in contact with the hole moving layer 6 below.
- the first material layer 1 includes a wetting layer 1a and quantum dots 1b, 1b,... Connected to the wetting layer 1a. .. Are disposed between the plurality of wetting layers 1a, 1a,... And the negative electrodes 5, 5, and the plurality of wetting layers 1a, 1a,.
- the first material layers 1, 1,... Are made of InN, and the second material layers 2, 2,... Are made of p-doped GaN.
- the electron transfer layers 8 and 8 are made of n-doped GaN, and the hole transfer layer 6 is made of strongly p-doped AlGaN. That is, in the solar cell 20, the first material layers 1, 1,... Correspond to the n layer, the second material layers 2, 2,... Correspond to the p layer, and the electron transfer layers 8, 8 correspond to the n + layer.
- the hole transport layer 6 corresponds to the p + layer.
- the quantum dots 1b, 1b,... Have a height of about 1 to 10 nm and a diameter of about 10 to 100 nm.
- FIG. 4 is a conceptual diagram showing the band structure of the solar cell 20 in a simplified manner.
- the top and bottom in FIG. 4 correspond to the energy level, and the left and right in FIG. 4 correspond to the thickness of each component of the solar cell 20 except for the wetting layers 1a, 1a,.
- “ ⁇ ” is an electron
- “ ⁇ ” is a hole.
- the energy level at the bottom of the conduction band of the second material layers 2, 2,... Is higher than the energy level at the bottom of the conduction band of quantum dots 1b, 1b,. Further, the energy level at the top of the valence band of the second material layers 2, 2,... Is lower than the energy level at the top of the valence band of the quantum dots 1b, 1b,. Due to the influence of the internal electric field generated in the solar cell 20, the energy level at the bottom of the conduction band and the energy level at the top of the valence band of the second material layers 2, 2,... The holes generated by the p-doping of the two material layers 2, 2,...
- the energy level at the top of the electron band is curved in a convex downward form. 4, the energy level of the bottom of the conduction band of the wetting layers 1a, 1a,... Is lower than the energy level of the bottom of the conduction band of the second material layers 2, 2,. And higher than the energy level at the bottom of the conduction band of the quantum dots 1b, 1b,. Therefore, among the electrons existing in the quantum dots 1b, 1b,..., Electrons having the same energy level as the energy level at the bottom of the conduction band of the quantum dots 1b, 1b,.
- the energy level at the bottom of the conduction band of the electron transfer layer 8 is lower than the energy level at the bottom of the conduction band of the second material layers 2, 2,... It is higher than the energy level at the bottom of the conduction band of 1b, 1b,. Furthermore, the energy level at the top of the valence band of the electron transfer layer 8 is lower than the energy level at the top of the valence band of the second material layers 2, 2,. Furthermore, due to the influence of n doping, the energy level at the bottom of the conduction band and the energy level at the top of the valence band of the electron transfer layer 8 are curved in a downwardly convex shape. This can be explained as follows.
- the electron transfer layer 8 is positively charged, and the energy level at the bottom of the conduction band is curved in a downwardly convex shape by the Coulomb energy due to charging, and the lowermost part of the wetting layers 1a, 1a,. Reach the bottom of the energy level.
- the energy level at the top of the valence band of the electron transfer layer 8 is curved in a convex downward form so that holes existing in the stacked body 3 cannot pass through the electron transfer layer 8. It is configured.
- the electron transfer layer 8 is produced by strongly n-doping so that the energy barrier 8 a existing at the interface between the wetting layer 1 a and the electron transfer layer 8 and the electron transfer layer 8 are negative.
- the thickness of the energy barrier 8b existing at the interface with the electrode 5 is reduced.
- the energy level at the bottom of the conduction band of the hole transport layer 6 is higher than the energy level at the bottom of the conduction band of the second material layers 2, 2,...
- the energy level at the top of the valence band is lower than the energy level at the top of the valence band of the second material layer 2, 2,. Due to the effect of p-doping, the energy level at the bottom of the conduction band and the energy level at the top of the valence band of the hole transport layer 6 are curved in a convex shape.
- the energy level at the bottom of the conduction band of the hole transport layer 6 is curved in a convex shape so that electrons existing in the stacked body 3 cannot pass through the hole transport layer 6.
- the solar cell 20 by strongly p-doping to produce the hole transfer layer 6, the energy barrier 6 a existing at the interface between the second material layer 2 and the hole transfer layer 6, and the hole transfer layer 6 The thickness of the energy barrier 6b existing at the interface with the positive electrode 7 is reduced.
- the solar cell 20 is configured such that holes can pass through the energy barriers 6a and 6b by a tunnel effect that easily occurs when the energy barriers 6a and 6b are sufficiently thin.
- the solar cell 20 the electrons confined in the quantum dots 1b, 1b,... Are transferred to the negative electrodes 5, 5 via the wetting layers 1a, 1a,. Can be moved. And it can prevent reliably the situation where a hole reaches the negative electrodes 5 and 5 by setting it as the form with which the electron moving layers 8, 8, and ... are provided. Therefore, by setting it as this form, according to this invention, in addition to the effect acquired by the solar cell 10, there exists an effect that the quantity of the electron which reaches
- the electron transfer layers 8, 8 can be produced, for example, by evaporating n-doped GaN onto the surfaces of the recesses 4, 4 formed by the same method as the solar cell 10.
- the negative electrodes 5 and 5 in the solar cell 20 can be manufactured by vapor-depositing the material which comprises the negative electrodes 5 and 5 on the surface of the electron moving layers 8 and 8 produced in this way.
- the plurality of wetting layers 1a, 1a,... And the negative electrodes 5, 5 can be connected via the electron transfer layers 8, 8.
- the solar cell 20 the mode in which the electron transfer layers 8, 8 and the wetting layers 1a, 1a,... Are directly connected has been illustrated, but the solar cell of the present invention is not limited to this mode.
- the electron transfer layer and the wetting layer may be connected via an electron mixed layer that activates the interaction of a plurality of electrons.
- the electron mixed layer has an energy level at the bottom of the conduction band of the second material layer 2, 2,. Is lower than the energy level, higher than the energy level at the bottom of the conduction band of the quantum dots 1b, 1b,..., And slightly lower than the energy level at the bottom of the conduction band of the wetting layers 1a, 1a,. make low.
- the electron moved from quantum dot 1b, 1b, ... to the wetting layer 1a, 1a, ... can be moved to an electron mixed layer further.
- the interaction of an electron can be activated by colliding the several electron moved to the electron mixed layer.
- the energy level at the top of the valence band of the electron mixed layer is, for example, the same as the energy level at the top of the valence band of the second material layer 2, 2,...
- the energy level at the bottom of the conduction band and the energy level at the top of the valence band of the electron mixture layer can be curved in a downwardly convex form.
- Such an electron mixed layer can be made of, for example, In x Ga 1-x N (0.2 ⁇ x ⁇ 0.8).
- the present invention is not limited to this form.
- the solar cell of the present invention can be configured such that the wetting layer and the positive electrode are connected, and the wetting layer and the negative electrode are not connected.
- a hole transport layer capable of blocking the passage of electrons can be arranged between the wetting layer and the positive electrode, and a plurality of holes are mutually connected between the hole transport layer and the wetting layer. It is preferable to arrange a hole mixed layer that activates the action.
- the solar cell of the present invention is not limited to the form in which the wetting layer and the negative electrode or the positive electrode are connected, but in the form in which the wetting layer, the negative electrode and the positive electrode are connected. Is also possible. Therefore, the solar cell of the present invention in a form in which the wetting layer, the negative electrode, and the positive electrode are connected will be specifically described below.
- FIG. 5 is sectional drawing which shows the example of the form of the solar cell 30 of this invention concerning 3rd Embodiment.
- FIG. 5 only a part of the solar cell 30 is extracted and enlarged. Further, in FIG. 5, some reference numerals are omitted. 5, those having the same configuration as that of the solar cell 10 shown in FIG. 1 are denoted by the same reference numerals as those used in FIG. 1, and the description thereof is omitted as appropriate.
- the solar cell 30 includes a stacked body 3 having a plurality of first material layers 1, 1,... And a plurality of second material layers 2, 2,.
- the electron transport layer 8 and the negative electrode 5 disposed in the recess 4 and the hole transport layer 31 and the positive electrode 32 disposed in the other recess 4 of the stacked body 3 are provided.
- the first material layer 1 includes a wetting layer 1a and quantum dots 1b, 1b,... Connected to the wetting layer 1a.
- the electron transfer layer 8 is disposed between the plurality of wetting layers 1a, 1a,... And the negative electrode 5, and the hole is moved between the plurality of wetting layers 1a, 1a,.
- Layer 31 is disposed.
- the plurality of wetting layers 1a, 1a,... And the negative electrode 5 are connected via the electron transfer layer 8, and the plurality of wetting layers 1a, 1a,. Are connected via a hole moving layer 31.
- the first material layers 1, 1,... Are made of InN
- the second material layers 2, 2,... are made of p-doped GaN.
- the electron transfer layer 8 is made of n-doped GaN
- the hole transfer layer 31 is made of strongly p-doped AlGaN. That is, in the solar cell 30, the first material layer 1, 1,... Corresponds to the n layer, the second material layer 2, 2,...
- the electron transfer layer 8 corresponds to the n + layer.
- the hole transport layer 31 corresponds to the p + layer.
- the quantum dots 1b, 1b,... Have a height of about 1 to 10 nm and a diameter of about 10 to 100 nm.
- the electron transfer layer is interposed between the wetting layers 1a, 1a,. 8 and by disposing the hole moving layer 31 between the wetting layers 1a, 1a,... And the positive electrode 32, only the electrons existing in the laminate 3 are moved to the negative electrode 5. Only holes present in the laminate 3 can be moved to the positive electrode 32. That is, according to the solar cell 30, the electrons confined in the quantum dots 1b, 1b,... Can be moved to the negative electrode 5 through the wetting layers 1a, 1a,. In addition, in the solar cell 30, the wetting layers 1 a, 1 a,... And the positive electrode 32 are connected via the hole moving layer 31.
- the stacked body 3 having the recesses 4 and 4 is manufactured by the same procedure as that of the solar cell 10, and then n-doped GaN is deposited in one recess 4 to thereby form the electron transfer layer 8.
- the material constituting the negative electrode 5 is vapor-deposited on the surface of the formed electron transfer layer 8. Through this step, the negative electrode 5 and the plurality of wetting layers 1a, 1a,... Can be connected via the electron transfer layer 8.
- the hole moving layer 31 is formed by vapor-depositing strongly p-doped AlGaN in the other recess 4, and the material constituting the positive electrode 32 on the surface of the formed hole moving layer 31 (for example, forming a transparent electrode) Can be connected to the positive electrode 32 and the plurality of wetting layers 1a, 1a,... Via the hole moving layer 31.
- the hole moving layer 6 or the hole moving layer 31 is exemplified by a strongly p-doped AlGaN, but the solar cell of the present invention is in this form. It is not limited.
- the hole transport layer provided in the solar cell of the present invention can also be composed of other materials such as strongly p-doped GaN.
- the solar cell of this invention was illustrated. Is not limited to this form.
- the recesses provided in the solar cell of the present invention can have a form in which the interval between the openings is wide and the depth is shallow (for example, about several ⁇ m or more).
- the negative electrode 5, the positive electrode 7, or the positive electrode 32 arrange
- the laminated body 3 having the second material layers 2, 2,... are illustrated, but the present invention is not limited to the embodiment. Therefore, in the following, the solar cell of the present invention having a first material layer and a second material layer formed so as to be inclined with respect to a horizontal plane, and a negative electrode and a positive electrode arranged substantially horizontally, This will be specifically described.
- FIG. 6 is sectional drawing which shows the example of the form of the solar cell 40 of this invention concerning 4th Embodiment. In FIG. 6, only a part of the solar cell 40 is extracted and enlarged. Further, in FIG. 6, some reference numerals are omitted.
- the solar cell 40 includes a plurality of first material layers 41, 41,... And a plurality of second material layers 42, 42,.
- the stacked body 43, the electron transfer layer 44 disposed substantially horizontally on the top surface of the stack 43 so as to be in contact with the stack 43, and substantially horizontally so as to contact the electron transport layer 44 on the top surface of the electron transport layer 44.
- the negative electrode 45 disposed, the hole moving layer 46 disposed substantially horizontally on the lower surface of the stacked body 43 so as to be in contact with the stacked body 43, and the lower surface of the hole moving layer 46 so as to be in contact with the hole moving layer 46 And a positive electrode 47 arranged substantially horizontally.
- the first material layer 41 includes a wetting layer 41a formed so as to be inclined with respect to a horizontal plane, and quantum dots 41b, 41b,... Connected to the wetting layer 41a.
- the first material layers 41, 41, ... are made of InAs
- the second material layers 42, 42, ... are made of p-doped GaAs.
- the electron transfer layer 44 is made of n-doped GaAs
- the hole transfer layer 46 is made of strongly p-doped GaAs. That is, in the solar cell 40, the first material layers 41, 41,... Correspond to the n layer, the second material layers 42, 42,...
- the quantum dots 41b, 41b,... Have a height of about 1 to 10 nm and a diameter of about 10 to 100 nm.
- the plurality of wetting layers 41a, 41a,... Formed so as to be inclined with respect to the horizontal plane, and the negative electrode 45 arranged substantially horizontally are arranged via the electron transfer layer 44.
- a plurality of wetting layers 41a, 41a,... Formed so as to be inclined with respect to a horizontal plane and a positive electrode 47 arranged substantially horizontally are connected via a hole moving layer 46.
- a some wetting layer, a negative electrode, and a positive electrode can be connected, without forming a recessed part. Therefore, by adopting such a configuration, in addition to the effect obtained by the solar cell 30, it is possible to provide the solar cell 40 that has the effect of further improving productivity.
- FIG. 7 is a diagram showing an example of one process included in the manufacturing process of the solar cell 40.
- a part of the process of manufacturing the stacked body 43 formed to be inclined with respect to the horizontal plane and the process of forming the electron transfer layer 44 on the upper surface of the stacked body 43 are shown in a simplified manner. Further, in FIG. 7, some reference numerals are omitted.
- a layer 48 (a layer corresponding to the hole transport layer 46) composed of strongly p-doped GaAs on a predetermined substrate. In the same manner).
- a layer 49 whose second surface is inclined with respect to the horizontal plane A layer corresponding to the layer 42.
- InAs is deposited while moving the stage on which the layer 49, the layer 48, and the like are moved from the left side to the right side in FIG.
- a layer 50 (a layer corresponding to the first material layer 41. The same applies hereinafter) that is inclined with respect to the horizontal plane is produced.
- a step of producing a layer 49 having an upper surface inclined with respect to the horizontal plane on the surface of the layer 50 and producing a layer 50 having an upper surface inclined with respect to the horizontal plane on the surface of the layer 49 can be manufactured.
- the stacked body Z is cut into a predetermined size, whereby a first material having a wetting layer 41a composed of InAs and quantum dots 41b, 41b,...
- a stacked body 43 including a layer 41 and a plurality of second material layers 42 each composed of p-doped GaAs can be produced.
- n-doped GaAs may be deposited on the upper surface of the multilayer body Z before the fabrication of the multilayer body Z is completed.
- the negative electrode 45 can be produced by evaporating a material constituting the negative electrode 45 (for example, a material that can constitute a transparent electrode) on the upper surface of the produced electron moving layer 44.
- the positive electrode 47 is formed of a material constituting the positive electrode 47 (for example, a material capable of constituting a transparent electrode) on the surface opposite to the surface of the hole moving layer 46 where the stacked body 43 is to be formed. It can be produced by vapor deposition.
- the plurality of wetting layers 41a, 41a,... Formed so as to be inclined with respect to the horizontal plane, and the negative electrode 45 and the positive electrode 47 are respectively moved by electrons.
- the layer 44 and the hole transport layer 46 can be connected.
- the material which can comprise the 1st material layer 41 and the 2nd material layer 42 is not limited to these.
- the first material layer 41 can also be composed of, for example, InN.
- the second material layer 42 can be composed of p-doped GaN.
- the second material layer 42 is formed, for example, after forming a layer composed of p-doped GaN on the surface of the sapphire substrate. By depositing p-doped GaN while moving the arranged sapphire substrate, the second material layer 42 inclined with respect to the horizontal plane can be produced.
- the electron transfer layer 8 or the electron transfer layer 44 is disposed between the wetting layer 1a or the wetting layer 41a and the negative electrode 5 or the negative electrode 45, and the wetting layer.
- the hole moving layer 31 or the hole moving layer 46 is disposed between the la or the wetting layer 41a and the positive electrode 32 or the positive electrode 47 is illustrated, the present invention is not limited to the embodiment. It is preferable to further dispose an electron mixed layer that activates the interaction of electrons between the wetting layer and the negative electrode. In addition, it is preferable to dispose a hole mixture layer that activates the interaction of holes between the wetting layer and the positive electrode.
- the solar cell of this invention can also be set as the form by which only 1 layer of each 1st material layer and 2nd material layer are provided.
- the laminate has a plurality of first material layers and a plurality of second material layers. Is preferred.
- the difference between the band gap of the material constituting the first material layer and the band gap of the material constituting the second material layer can be appropriately selected within a range where the above effects can be achieved. it can. It is preferable to increase the difference between the band gap of the material constituting the first material layer and the band gap of the material constituting the second material layer. Specifically, it is preferably 1 eV or more, and more preferably 2.5 eV or more.
- the solar cell of the present invention can be used for a power source of an electric vehicle, a solar power generation system, or the like.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
Abstract
Description
本発明の第1の態様は、ウェッティング層及び該ウェッティング層に生成された量子ドットを有する第1材料層と、該第1材料層が表面に形成される第2材料層と、負電極及び正電極とを具備し、負電極又は正電極とウェッティング層とが接続され、負電極とウェッティング層とが接続される場合には、ウェッティング層に存在する電子が負電極へと移動可能なように接続され、正電極とウェッティング層とが接続される場合には、ウェッティング層に存在するホールが正電極へと移動可能なように接続されることを特徴とする、太陽電池である。
1a…ウェッティング層
1b…量子ドット
2…第2材料層
3…積層体
4…凹部
5…負電極
6…ホール移動層
6a…エネルギー障壁
6b…エネルギー障壁
7…正電極
8…電子移動層
8a…エネルギー障壁
8b…エネルギー障壁
10…太陽電池
20…太陽電池
30…太陽電池
31…ホール移動層
32…正電極
40…太陽電池
41…第1材料層
41a…ウェッティング層
41b…量子ドット
42…第2材料層
43…積層体
44…電子移動層
45…負電極
46…ホール移動層
47…正電極
48…層
49…層
50…層
図1は、第1実施形態にかかる本発明の太陽電池10の形態例を示す断面図である。図1では、太陽電池10の一部のみを抽出し、拡大して示している。また、図1では、一部符号の記載を省略している。図2は、図1に点線で囲った部位を拡大して示す図である。図1及び図2に示すように、太陽電池10は、複数の第1材料層1、1、…、及び、複数の第2材料層2、2、…を有する積層体3と、積層体3の凹部4、4に配置された負電極5、5と、積層体3の下方に第2材料層2と接触するように配置されたホール移動層6と、ホール移動層6の下方にホール移動層6と接触するように配置された正電極7と、を有している。太陽電池10において、第1材料層1、1、…は、第2材料層2、2、…を構成する半導体(上記半導体Xに相当する半導体)よりも格子定数がやや大きくバンドギャップが小さい半導体(上記半導体Yに相当する半導体)によって形成されている。第1材料層1は、ウェッティング層1a、及び、該ウェッティング層1aと接続された量子ドット1b、1b、…を有し、複数のウェッティング層1a、1a、…と負電極5、5とが直接接続されている。太陽電池10において、第1材料層1、1、…はInNによって構成され、第2材料層2、2、…はpドープされたGaNによって構成され、ホール移動層6は強くpドープされたAlGaNによって構成されている。すなわち、太陽電池10では、第1材料層1、1、…がn層に相当し、第2材料層2、2、…がp層に相当し、ホール移動層6がp+層に相当する。太陽電池10において、量子ドット1b、1b、…は、高さが1~10nm程度、径が10~100nm程度である。
図3は、第2実施形態にかかる本発明の太陽電池20の形態例を示す断面図である。図3では、太陽電池20の一部のみを抽出し、拡大して示している。また、図3では、一部符号の記載を省略している。図3において、図1に示す太陽電池10と同様の構成を採るものには、図1で使用した符号と同符号を付し、その説明を適宜省略する。
図5は、第3実施形態にかかる本発明の太陽電池30の形態例を示す断面図である。図5では、太陽電池30の一部のみを抽出し、拡大して示している。また、図5では、一部符号の記載を省略している。図5において、図1に示す太陽電池10と同様の構成を採るものには、図1で使用した符号と同符号を付し、その説明を適宜省略する。
図6は、第4実施形態にかかる本発明の太陽電池40の形態例を示す断面図である。図6では、太陽電池40の一部のみを抽出し、拡大して示している。また、図6では、一部符号の記載を省略している。
図7に示すように、積層体43を作製するには、例えば、まず、所定の基板の上に、強くpドープされたGaAsによって構成される層48(ホール移動層46に相当する層。以下において同じ。)を作製する。その後、層48を載せた台を、図7の紙面左側から右側へと移動させながら、pドープされたGaAsを蒸着することにより、上面が水平面に対して傾斜している層49(第2材料層42に相当する層。以下において同じ。)を作製する。このようにして、上面が水平面に対して傾斜している層49を作製したら、層49及び層48等を載せた台を、図7の紙面左側から右側へと移動させながら、InAsを蒸着することにより、水平面に対して傾斜している層50(第1材料層41に相当する層。以下において同じ。)を作製する。これ以降は、層50の表面に、上面が水平面に対して傾斜している層49を作製し、当該層49の表面に、上面が水平面に対して傾斜している層50を作製する工程を繰り返すことにより、複数の層49及び複数の層50を有する積層体(以下において、「積層体Z」という。)を作製することができる。このようにして、積層体Zを作製したら、当該積層体Zを所定の大きさへと切断することにより、InAsによって構成されるウェッティング層41a及び量子ドット41b、41b、…を有する第1材料層41、並びに、pドープされたGaAsによって構成される第2材料層42をそれぞれ複数備える積層体43を作製することができる。一方、電子移動層44を作製するには、図7に示すように、例えば、積層体Zの作製が完了する前に、積層体Zの上面へ、nドープされたGaAsを蒸着すれば良い。また、負電極45は、作製した電子移動層44の上面に負電極45を構成する材料(例えば、透明電極を構成し得る材料等。)を蒸着することにより、作製することができる。また、正電極47は、積層体43が作製されるべきホール移動層46の面とは反対側の面に、正電極47を構成する材料(例えば、透明電極を構成し得る材料等。)を蒸着することにより、作製することができる。かかる工程を経て太陽電池40を製造することにより、水平面に対して傾斜するように形成された複数のウェッティング層41a、41a、…と、負電極45及び正電極47とを、それぞれ、電子移動層44及びホール移動層46を介して接続することができる。
Claims (13)
- ウェッティング層及び前記ウェッティング層に生成された量子ドットを有する第1材料層と、前記第1材料層が表面に形成される第2材料層と、負電極及び正電極とを具備し、
前記負電極又は前記正電極と前記ウェッティング層とが接続され、
前記負電極と前記ウェッティング層とが接続される場合には、前記ウェッティング層に存在する電子が前記負電極へと移動可能なように接続され、
前記正電極と前記ウェッティング層とが接続される場合には、前記ウェッティング層に存在するホールが前記正電極へと移動可能なように接続されることを特徴とする、太陽電池。 - 前記負電極又は前記正電極と前記ウェッティング層とが、直接接続されていることを特徴とする、請求の範囲第1項に記載の量子ドット太陽電池。
- 前記負電極と前記ウェッティング層とが接続される場合には、ホールの通過を阻止可能な電子移動層を介して接続され、
前記正電極と前記ウェッティング層とが接続される場合には、電子の通過を阻止可能なホール移動層を介して接続されることを特徴とする、請求の範囲第1項に記載の太陽電池。 - 前記電子移動層と前記ウェッティング層とが接続される場合には、複数の前記電子の相互作用を活発化させる電子混合層を介して接続され、
前記ホール移動層と前記ウェッティング層とが接続される場合には、複数の前記ホールの相互作用を活発化させるホール混合層を介して接続されることを特徴とする、請求の範囲第3項に記載の太陽電池。 - 前記第1材料層及び前記第2材料層がそれぞれ複数備えられるとともに、前記第1材料層と前記第2材料層とが交互に積層され、
前記負電極と前記ウェッティング層とが接続される場合には、複数の前記ウェッティング層の各々に存在する前記電子が前記負電極へと移動可能なように、前記負電極と複数の前記ウェッティング層とが接続され、
前記正電極と前記ウェッティング層とが接続される場合には、複数の前記ウェッティング層の各々に存在する前記ホールが前記正電極へと移動可能なように、前記正電極と複数の前記ウェッティング層とが接続されていることを特徴とする、請求の範囲第1項~第4項のいずれか1項に記載の太陽電池。 - 複数の前記第1材料層及び複数の前記第2材料層を有する積層体が凹部を具備し、
前記負電極と前記ウェッティング層とが接続される場合には、複数の前記ウェッティング層の各々に存在する前記電子が前記負電極へと移動可能なように、前記凹部に配置された前記負電極と複数の前記ウェッティング層とが接続され、
前記正電極と前記ウェッティング層とが接続される場合には、複数の前記ウェッティング層の各々に存在する前記ホールが前記正電極へと移動可能なように、前記凹部に配置された前記正電極と複数の前記ウェッティング層とが接続されていることを特徴とする、請求の範囲第5項に記載の太陽電池。 - ウェッティング層及び前記ウェッティング層に生成された量子ドットを有する第1材料層と、前記第1材料層が表面に形成される第2材料層と、正電極及び負電極とを具備し、
前記負電極と前記ウェッティング層とが、ホールの通過を阻止可能な電子移動層を介して、前記ウェッティング層に存在する電子が前記負電極へと移動可能なように接続されるとともに、前記正電極と前記ウェッティング層とが、電子の通過を阻止可能なホール移動層を介して、前記ウェッティング層に存在するホールが前記正電極へと移動可能なように接続されていることを特徴とする、太陽電池。 - 前記電子移動層と前記ウェッティング層とが、複数の前記電子の相互作用を活発化させる電子混合層を介して接続されていることを特徴とする、請求の範囲第7項に記載の太陽電池。
- 前記ホール移動層と前記ウェッティング層とが、複数の前記ホールの相互作用を活発化させるホール混合層を介して接続されていることを特徴とする、請求の範囲第7項又は第8項に記載の太陽電池。
- 前記第1材料層及び前記第2材料層が、水平面に対して傾斜するように形成され、
水平面に対して傾斜するように形成された前記ウェッティング層と略水平に配置された前記負電極とが、少なくとも前記電子移動層を介して接続され、
水平面に対して傾斜するように形成された前記ウェッティング層と略水平に配置された前記正電極とが、少なくとも前記ホール移動層を介して接続されていることを特徴とする、請求の範囲第7項~第9項のいずれか1項に記載の太陽電池。 - 前記第1材料層及び前記第2材料層がそれぞれ複数備えられるとともに、前記第1材料層と前記第2材料層とが交互に積層され、
前記負電極と複数の前記ウェッティング層とが、少なくとも前記電子移動層を介して接続され、
前記正電極と複数の前記ウェッティング層とが、少なくとも前記ホール移動層を介して接続されていることを特徴とする、請求の範囲第7項~第10項のいずれか1項に記載の太陽電池。 - 複数の前記第1材料層及び複数の前記第2材料層を有する積層体が少なくとも2以上の凹部を具備し、
2以上の前記凹部の少なくとも1つに配置された前記負電極と複数の前記ウェッティング層とが、少なくとも前記電子移動層を介して接続され、
2以上の前記凹部の少なくとも1つに配置された前記正電極と複数の前記ウェッティング層とが、少なくとも前記ホール移動層を介して接続されていることを特徴とする、請求の範囲第11項に記載の太陽電池。 - 前記第1材料層のバンドギャップと前記第2材料層のバンドギャップとの差が、1eV以上であることを特徴とする、請求の範囲第1項~第12項のいずれか1項に記載の太陽電池。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009801479063A CN102227824B (zh) | 2009-02-09 | 2009-02-09 | 太阳能电池 |
EP09839669.0A EP2395565B1 (en) | 2009-02-09 | 2009-02-09 | Solar cell |
US13/131,631 US20110290311A1 (en) | 2009-02-09 | 2009-02-09 | Solar cell |
JP2010549328A JP5029764B2 (ja) | 2009-02-09 | 2009-02-09 | 太陽電池 |
PCT/JP2009/052160 WO2010089892A1 (ja) | 2009-02-09 | 2009-02-09 | 太陽電池 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2009/052160 WO2010089892A1 (ja) | 2009-02-09 | 2009-02-09 | 太陽電池 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010089892A1 true WO2010089892A1 (ja) | 2010-08-12 |
Family
ID=42541813
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/052160 WO2010089892A1 (ja) | 2009-02-09 | 2009-02-09 | 太陽電池 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110290311A1 (ja) |
EP (1) | EP2395565B1 (ja) |
JP (1) | JP5029764B2 (ja) |
CN (1) | CN102227824B (ja) |
WO (1) | WO2010089892A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011233810A (ja) * | 2010-04-30 | 2011-11-17 | Toyota Motor Corp | 光電変換素子及びその製造方法 |
US20120097228A1 (en) * | 2010-10-21 | 2012-04-26 | Sharp Kabushiki Kaishao | Solar cell |
US20120285537A1 (en) * | 2011-05-09 | 2012-11-15 | Sharp Kabushiki Kaisha | Solar cell |
CN107017312A (zh) * | 2015-09-17 | 2017-08-04 | 三星电子株式会社 | 光电器件和包括该光电器件的电子装置 |
US10256355B2 (en) | 2015-08-28 | 2019-04-09 | Kyocera Corporation | Photoelectric converter with a multi-layered quantum dot film |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102012388B1 (ko) * | 2013-03-13 | 2019-08-20 | 삼성전자주식회사 | 태양 전지 |
KR102491856B1 (ko) * | 2017-12-18 | 2023-01-27 | 삼성전자주식회사 | 복수의 양자점층을 포함하는 광전 소자 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09237908A (ja) * | 1996-02-28 | 1997-09-09 | Oki Electric Ind Co Ltd | 太陽電池 |
JPH11330606A (ja) | 1998-05-20 | 1999-11-30 | Fujitsu Ltd | 光半導体装置 |
JP2002141531A (ja) * | 2000-11-01 | 2002-05-17 | Sharp Corp | 太陽電池およびその製造方法 |
JP2006114815A (ja) | 2004-10-18 | 2006-04-27 | Fujitsu Ltd | 太陽電池 |
JP2006295219A (ja) | 2006-07-14 | 2006-10-26 | Fujitsu Ltd | 半導体レーザ |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100631980B1 (ko) * | 2005-04-06 | 2006-10-11 | 삼성전기주식회사 | 질화물 반도체 소자 |
US8829336B2 (en) * | 2006-05-03 | 2014-09-09 | Rochester Institute Of Technology | Nanostructured quantum dots or dashes in photovoltaic devices and methods thereof |
JP4937673B2 (ja) * | 2006-08-15 | 2012-05-23 | 富士通株式会社 | 半導体発光素子、その製造方法および半導体発光装置 |
-
2009
- 2009-02-09 EP EP09839669.0A patent/EP2395565B1/en not_active Not-in-force
- 2009-02-09 JP JP2010549328A patent/JP5029764B2/ja not_active Expired - Fee Related
- 2009-02-09 CN CN2009801479063A patent/CN102227824B/zh not_active Expired - Fee Related
- 2009-02-09 WO PCT/JP2009/052160 patent/WO2010089892A1/ja active Application Filing
- 2009-02-09 US US13/131,631 patent/US20110290311A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09237908A (ja) * | 1996-02-28 | 1997-09-09 | Oki Electric Ind Co Ltd | 太陽電池 |
JPH11330606A (ja) | 1998-05-20 | 1999-11-30 | Fujitsu Ltd | 光半導体装置 |
JP2002141531A (ja) * | 2000-11-01 | 2002-05-17 | Sharp Corp | 太陽電池およびその製造方法 |
JP2006114815A (ja) | 2004-10-18 | 2006-04-27 | Fujitsu Ltd | 太陽電池 |
JP2006295219A (ja) | 2006-07-14 | 2006-10-26 | Fujitsu Ltd | 半導体レーザ |
Non-Patent Citations (1)
Title |
---|
See also references of EP2395565A4 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011233810A (ja) * | 2010-04-30 | 2011-11-17 | Toyota Motor Corp | 光電変換素子及びその製造方法 |
US20120097228A1 (en) * | 2010-10-21 | 2012-04-26 | Sharp Kabushiki Kaishao | Solar cell |
US20120285537A1 (en) * | 2011-05-09 | 2012-11-15 | Sharp Kabushiki Kaisha | Solar cell |
US10256355B2 (en) | 2015-08-28 | 2019-04-09 | Kyocera Corporation | Photoelectric converter with a multi-layered quantum dot film |
CN107017312A (zh) * | 2015-09-17 | 2017-08-04 | 三星电子株式会社 | 光电器件和包括该光电器件的电子装置 |
CN107017312B (zh) * | 2015-09-17 | 2021-11-26 | 三星电子株式会社 | 光电器件和包括该光电器件的电子装置 |
Also Published As
Publication number | Publication date |
---|---|
CN102227824A (zh) | 2011-10-26 |
US20110290311A1 (en) | 2011-12-01 |
EP2395565A4 (en) | 2013-09-18 |
EP2395565B1 (en) | 2017-04-19 |
JP5029764B2 (ja) | 2012-09-19 |
CN102227824B (zh) | 2013-07-10 |
EP2395565A1 (en) | 2011-12-14 |
JPWO2010089892A1 (ja) | 2012-08-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5029764B2 (ja) | 太陽電池 | |
EP2458642B1 (en) | Photoelectric conversion element | |
JP2007184512A (ja) | 赤外線検知器 | |
TWI602315B (zh) | 具有經組構成效能更佳之低帶隙主動層之感光元件及相關方法 | |
WO2016160720A1 (en) | Ultraviolet light emitting diodes with tunnel junction | |
US9496434B2 (en) | Solar cell and method for producing solar cell | |
JP5256268B2 (ja) | 太陽電池 | |
CN106025798B (zh) | 一种异质结半导体激光器及其制备方法 | |
US8994005B2 (en) | Vertically correlated clusters of charged quantum dots for optoelectronic devices, and methods of making same | |
JP6030971B2 (ja) | 受光素子および受光素子を備えた太陽電池 | |
JP5555602B2 (ja) | 太陽電池 | |
JP5341949B2 (ja) | 太陽電池 | |
JP6258712B2 (ja) | 受光素子および受光素子を備えた太陽電池 | |
JP6415197B2 (ja) | 光電変換素子、太陽電池及び光センサー | |
JP6312450B2 (ja) | 受光素子および受光素子を備えた太陽電池 | |
JP2015079870A (ja) | 太陽電池 | |
JP2011066210A (ja) | 太陽電池 | |
JP2011233810A (ja) | 光電変換素子及びその製造方法 | |
JP2011100915A (ja) | 光電変換素子 | |
WO2014199462A1 (ja) | 太陽電池セルおよびその製造方法 | |
JP2013046007A (ja) | 光電変換素子及びその製造方法 | |
JP2011086774A (ja) | 太陽電池 | |
JP2010287713A (ja) | 光電変換素子 | |
JP2016058540A (ja) | 光電変換素子 | |
WO2012100038A2 (en) | Photovoltaic cells with quantum dots with built-in-charge and methods of making same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200980147906.3 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 09839669 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2010549328 Country of ref document: JP |
|
REEP | Request for entry into the european phase |
Ref document number: 2009839669 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2009839669 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13131631 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |