WO2010067395A1 - 半導体装置の製造方法及びその製造装置 - Google Patents
半導体装置の製造方法及びその製造装置 Download PDFInfo
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- WO2010067395A1 WO2010067395A1 PCT/JP2008/003642 JP2008003642W WO2010067395A1 WO 2010067395 A1 WO2010067395 A1 WO 2010067395A1 JP 2008003642 W JP2008003642 W JP 2008003642W WO 2010067395 A1 WO2010067395 A1 WO 2010067395A1
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- insulating film
- semiconductor device
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- dielectric constant
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 95
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 92
- 238000000034 method Methods 0.000 title abstract description 89
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 29
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- 239000010703 silicon Substances 0.000 claims abstract description 19
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- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 10
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- 125000000217 alkyl group Chemical group 0.000 claims description 8
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Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76825—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. by exposing the layer to particle radiation, e.g. ion implantation, irradiation with UV light or electrons etc.
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76822—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc.
- H01L21/76826—Modification of the material of dielectric layers, e.g. grading, after-treatment to improve the stability of the layers, to increase their density etc. by contacting the layer with gases, liquids or plasmas
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
Definitions
- the present invention relates to a semiconductor device manufacturing method and a manufacturing apparatus thereof.
- the wiring interval is narrowed and the capacitance between wirings is increasing.
- this type of increase in inter-wiring capacitance has greatly affected the operating speed of semiconductor devices.
- the capacitance between wirings has a significant effect on the operation speed.
- interlayer insulation films are made by thermal CVD (chemical It was a silicon oxide film formed by vapor deposition) or plasma CVD.
- the relative dielectric constant of such a silicon oxide film is generally about 4.1.
- Si—OH groups siloxanols
- Si— O—Si bond a siloxane bond
- the atomic density of such an insulating film is low. Furthermore, by using a specific liquid composition, a large amount of nano-sized holes can be formed in the insulating film.
- Such an insulating film has a low dielectric constant, but also has a low mechanical strength. For this reason, such an insulating film has a chemical mechanical polishing method (CMP) for forming a Cu wiring. There is a problem that peeling occurs when mechanical polishing is performed.
- CMP chemical mechanical polishing method
- a part of the bond cut by the electron beam irradiation is left in the insulating film.
- Such dangling bonds are chemically active.
- Si dangling bonds readily react with moisture in the atmosphere (H 2 O) according to the following chemical formula (1) to form Si—OH groups.
- Si—OH groups increase the dielectric constant of the insulating film.
- the insulating film irradiated with the electron beam has a problem of increasing the relative dielectric constant by absorbing moisture in the atmosphere.
- the insulating film is formed of hydrogen gas, a gas containing halogen (for example, NF 3 gas), or an organic Si-based gas containing silanol.
- a method of exposing to is proposed. The exposure time here is 30 minutes.
- the Si dangling bond is terminated by reacting with NF 3 gas or the like according to the following chemical formula (2), so that an increase in the dielectric constant is avoided.
- an object of the method for manufacturing a semiconductor device is to provide a method for manufacturing a semiconductor device that suppresses an increase in dielectric constant of the insulating film caused by processing for enhancing the mechanical strength of the insulating film in a short time. It is.
- the method for manufacturing a semiconductor device is selected from the group consisting of a first step of exposing an insulating film having a siloxane bond to energy rays or plasma, and hydrogen, carbon, nitrogen, and silicon.
- an increase in the dielectric constant of the insulating film caused by a process for enhancing mechanical strength can be suppressed in a short time.
- FIG. 6 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 1); FIG. 6 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 2); FIG. 6 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 3); FIG. 9 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 4); FIG. 9 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 5); FIG. 6 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 6); FIG.
- Example 7 is a process cross-sectional view illustrating the manufacturing method of the semiconductor device according to Example 1 (No. 7); It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 8). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 9). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 10). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 11). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 12). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 13). It is process sectional drawing explaining the manufacturing method of the semiconductor device which concerns on Example 1 (the 14).
- FIG. 1 is a diagram for explaining the relationship between the processing time during which an insulating film is exposed to gas after electron beam irradiation and the effective relative dielectric constant of the insulating film.
- the horizontal axis is the processing time, and the left vertical axis is the effective relative dielectric constant (note that the effective refractive index is a relative dielectric constant calculated based on the capacitance between wirings, and is about 0.3 from the actual relative dielectric constant. Higher.)
- FIG. 1 shows not only the change in effective relative permittivity indicated by a solid line but also the change in defect rate due to stress migration indicated by a broken line. Details of the experimental conditions and the change of the defect rate due to stress migration are described in the explanation to be described later.
- the effective dielectric constant decreases for a while (up to 0.5 minutes in the case of the present embodiment) after exposing the insulating film to the gas, and then has a substantially constant value. To maintain. As the processing time becomes longer, the effective relative dielectric constant increases rapidly. From these results, the present inventor has found that the dielectric constant does not decrease when the time for which the insulating film is exposed to hydrogen gas or the like is too short or too long, and the dielectric constant decreases only within a certain time range. Obtained.
- the semiconductor device manufacturing method of the present embodiment provides a semiconductor device manufacturing method that suppresses an increase in the dielectric constant of an insulating film due to electron beam irradiation or the like in a short time based on such knowledge.
- the exposure of the insulating film to the gas is terminated before the first rise.
- the manufacturing procedure of the sample used for the measurement is as follows.
- a liquid composition containing a silicon compound (trade name: Ceramate NCS, manufactured by Catalytic Chemical Industry Co., Ltd.) is applied onto a Si substrate by spin coating.
- This silicon compound is a silicon compound containing Si, O, C, and H as main components.
- this silicon compound is obtained by, for example, hydrolyzing tetraalkylorthosilicate (TAOS) and alkoxysilane (Alkoxysilane; AS) in the presence of tetraalkylammonium hydroxide (TAAOH). It is.
- TAOS tetraalkylorthosilicate
- Alkoxysilane alkoxysilane
- TAAOH tetraalkylammonium hydroxide
- the alkoxysilane is represented by the following general formula (I).
- X represents any of a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, and a vinyl group.
- R represents any one of a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group, and a vinyl group.
- N is an integer of 0 to 3.
- the film applied on the Si substrate is heated at 100 ° C. for about 5 minutes.
- the organic solvent in the coating film is volatilized.
- the film is baked at 400 ° C. for about 10 minutes.
- an insulating film having a siloxane bond Si—O—Si bond
- This insulating film has a low density.
- micropores having a diameter of 2 nm or less are formed in the insulating film. For this reason, a dielectric constant as low as 2.5 or less is achieved.
- Such an insulating film is hereinafter referred to as a porous insulating film.
- the porous insulating film having a thickness of 160 nm formed as described above is subjected to a process of cutting the bond (hereinafter referred to as an insulating film modification process).
- an insulating film modification process As energy rays used for the insulating film modification treatment, ultraviolet irradiation or plasma was used in addition to the known electron beam irradiation.
- the conditions for electron beam irradiation are as follows.
- the dose and energy of the electron beam are 40 ⁇ C / cm 2 ⁇ min and 5 keV, respectively.
- the irradiation time is 10 minutes. Note that the substrate is not particularly heated during the electron beam irradiation.
- the conditions for ultraviolet irradiation are as follows.
- the illuminance and wavelength of ultraviolet light are 300 mW / cm 2 and 200 to 400 ⁇ m, respectively.
- the irradiation time is 10 minutes.
- the ultraviolet irradiation is performed in a vacuum, and the substrate is not particularly heated.
- the plasma exposure conditions are as follows.
- the plasma used for the exposure is O 2 plasma generated by applying a high frequency (13.56 MHz) of 200 W to O 2 gas having a pressure of 10 Pa.
- the exposure time is 3 minutes and no particular heating of the substrate is performed.
- the insulating film subjected to the insulating film modification treatment as described above was exposed to a gas such as hydrogen while being shielded from the atmosphere.
- the gases used are hydrogen, methane, ethylene, ammonia, silane, and hexamethyldisilazane.
- the time of exposure to gas is 0.1 to 15 minutes.
- the substrate temperature at that time is from room temperature (25 ° C.) to 400 ° C.
- the following explanation relates to the physical property measurement performed on the sample prepared by the above procedure.
- the relative dielectric constant is calculated based on the capacitance of the evaluation capacitor formed on the insulating film to be evaluated and the thickness of the insulating film.
- the evaluation capacitor is formed by forming an Au electrode having a diameter of 1 mm on an insulating film to be evaluated, and further forming an ohmic electrode on the back surface of the Si substrate on which the insulating film is formed.
- the sample for measuring the effective relative permittivity shown in FIG. 1 is described in Example 1 described later.
- the capacity was measured using an impedance measuring instrument (so-called LCR meter) that measures impedance by applying an alternating current having a frequency of 1 MHz and an effective value of 1 V to the measurement sample.
- LCR meter impedance measuring instrument
- the thickness of the insulating film was measured using spectroscopic ellipsometry.
- the insulating properties of the insulating film deteriorate. This is because the dangling bond or the Si—OH group formed by the reaction of the dangling bond with moisture in the atmosphere forms an energy level that causes a leakage current in the forbidden band. Therefore, the leakage current density is added to the evaluation item.
- the leakage current density is calculated based on the leakage current of the evaluation capacitor and the thickness of the insulating film. Leakage current is measured by using a current-voltage measuring device (so-called IV meter) to increase (or decrease) the voltage in the range of 0V to 20V at intervals of 0.02V and measure the current flowing through the sample. Was done.
- the leakage current density to be evaluated is a value calculated from the leakage current when an electric field of 0.2 MV / cm is applied to the insulating film.
- Elastic modulus is measured by a continuous stiffness measurement method using a nanoindenter.
- the continuous stiffness measurement is performed by operating the indenter at a resonance frequency of 25 Hz and a pushing speed of 0.5 nm / sec.
- the indenter used is a Belkovic indenter with a radius of curvature of 0.2 ⁇ m.
- the elastic modulus is calculated using data when the indenter is pushed to a depth of 0.07 times the thickness of the sample.
- the dangling bond density is measured by irradiating the sample with microwaves having an output of 1 mW and a frequency of 9.17 GHz at room temperature using an electron spin resonance apparatus.
- the magnetic field sweep time is 1 s, and Mn 2+ / MgO is used as the standard sample. The measurement is performed immediately after taking the sample into the atmosphere.
- the sample used for measuring the dangling bond density is obtained by stripping the evaluation target insulating film from the substrate and making it into powder. Using this sample, the dangling bond amount (dangling bond density) per unit weight is determined.
- the dangling bond relative ratio as an evaluation item is a value obtained by normalizing the dangling bond density obtained in this way with the dangling bond density of the sample not subjected to the insulating film modification treatment.
- the measurement of the internal stress of the insulating film is performed using a stress measuring machine.
- the internal stress difference as an evaluation item is the difference between the internal stress of the sample not subjected to the edge film modification treatment and the internal stress of the sample subjected to the insulation film modification treatment.
- Samples 1 to 31 were samples in which exposure to hydrogen gas or the like (hereinafter referred to as dangling bond termination treatment) was effective.
- Comparative Examples 1 to 7 are samples for comparison or samples that did not have the effect of dangling bond termination treatment.
- Electrode beam In the second column, the type of insulating film modification treatment is described.
- Electrode beam “ultraviolet light”, and “O 2 plasma” described in the second column mean electron beam irradiation, ultraviolet irradiation, and exposure to plasma, respectively.
- the type of gas used for dangling bond termination treatment is described.
- the fourth column lists the pressure of the gas during exposure.
- the sample temperature at the dangling bond termination treatment is described.
- the description “ ⁇ ” means that the dangling bond termination treatment was performed without heating the sample.
- the time (processing time) when the dangling bond termination process is performed is described.
- Comparative Example 7 is a sample in which neither the insulating film modification treatment nor the dangling bond termination treatment was performed. As shown in Table 2, the relative dielectric constant of this sample is as small as 2.3. Also, the leakage current is as small as 2.1 ⁇ 10 ⁇ 11 A / cm 2 .
- Comparative Examples 1 to 3 are samples in which only the insulating film modification treatment was performed and the dangling bond termination treatment was not performed.
- the dangling bond relative ratio is dramatically increased to 67-124. Further, the relative dielectric constant is also increased to 2.8 to 2.9. Furthermore, the leakage current density is also 9.8 ⁇ 10 ⁇ 10 A / cm 2 to 2.1 ⁇ 10 ⁇ 9 A / cm 2 , which is 50 times to 100 times that of Comparative Example 7 where the insulating film modification treatment was not performed. Has doubled.
- the elastic modulus which is an index of mechanical strength, is about 2 to 3 times as high as 18 Gpa to 21 Gpa.
- the internal stress difference is also greatly increased to 114 to 155 MPa.
- Comparative Examples 4 to 6 are samples in which there was no effect of dangling bond termination treatment. As shown in Table 2, dangling bond termination treatment is applied to these samples. However, the relative dangling bond ratio of these samples has increased to 51-103. In addition, the relative dielectric constant is also increased to 2.7 to 2.8. Furthermore, the leakage current density is also increased from 6.3 ⁇ 10 ⁇ 10 A / cm 2 to 1.0 ⁇ 10 ⁇ 9 A / cm 2 . This value is 30 to 50 times the leakage current density of Comparative Example 7 where the insulating film modification treatment was not performed. The internal stress difference is also increased to 87 to 144 MPa. Note that the elastic modulus, which is an index of mechanical strength, has also increased by about 2.6 times.
- the dangling bond termination time applied to Comparative Examples 4 to 6 is in a wide range of 0.1 to 15 minutes.
- the pressure of the gas used for dangling bond termination treatment ranges from 1 Pa to 1000 Pa. Nevertheless, the effect of dangling bond termination was not observed.
- the present inventor has found that the dangling bond may be terminated by the gas exposure (dangling bond treatment) for a very short time and at a low gas pressure (see, for example, Sample 7).
- the present inventor prepared samples by variously changing the conditions for dangling bond termination treatment and the type of gas used, and investigated the physical properties thereof.
- Samples 1 to 31 were samples having an effect of dangling bond termination treatment.
- the dangling bond termination treatment was effective with any of the gases described above. That is, the dangling bond relative ratio of Samples 1 to 31 was as low as 1 to 3, which was the same as that of Comparative Example 7 where the insulating film modification treatment was not performed.
- the relative dielectric constants of Samples 1 to 31 are about 2.3 to 2.5, which is the same as that of Comparative Example 7 where the insulating film modification treatment is not performed.
- the leakage currents and internal stress differences of Samples 1 to 30 are comparable to those of Comparative Example 7 where the insulating film modification treatment is not performed.
- the elastic modulus of Samples 1 to 31 is as high as 15 GPa to 20 GPa, which is as high as that of Comparative Examples 1 to 3 where only the insulating film modification treatment is performed.
- the gas for which dangling bond termination treatment has been effective is a gas containing at least one element selected from the group consisting of hydrogen, carbon, nitrogen, and silicon as a constituent element. These gases are chemically active, unlike an inert gas such as Ar.
- nitrogen gas contains nitrogen as a constituent element, it does not terminate Si dangling bonds because it is inactive. Also, H 2 O gas cannot be used because it generates Si—OH bonds.
- FIG. 1 is a diagram for explaining the relationship between the time required for the dangling bond termination process and the effective relative dielectric constant of the insulating film.
- the solid line represents the change in effective relative permittivity.
- the horizontal axis is the processing time.
- the left vertical axis is the effective relative dielectric constant.
- the data shown in FIG. 1 is calculated from the capacitance of the wiring formed in the interlayer insulating film manufactured under the same conditions as Samples 7 and 16 to 19 and Comparative Examples 5 and 6 (with regard to the configuration of the sample). See Example 1 below).
- the insulating film modification treatment applied to the sample is electron beam irradiation.
- the gas used for dangling bond termination treatment is ethylene.
- the pressure of ethylene gas is 1.0 Pa, and the sample temperature is room temperature (25 ° C.).
- the dielectric constant of the insulating film subjected to the insulating film modification treatment decreases for 0.5 minutes from the start due to gas exposure.
- the relative permittivity increases rapidly when the gas exposure exceeds 10 minutes.
- the decrease in the dielectric constant in the initial stage of gas exposure is considered to occur because the dangling bonds are terminated by the gas used.
- the increase in relative permittivity due to long-term exposure to ethylene gas is considered to occur because active species (for example, ethylene from which one H has been removed) generated by the end of dangling increase in the atmosphere.
- active species for example, ethylene from which one H has been removed
- active species are present in a large amount in the atmosphere, for example, H atoms are deprived from Si—H bonds forming the insulating film, and new dangling bonds are formed.
- the manufacturing method of the semiconductor device is based on such knowledge.
- a first step of exposing an insulating film having a siloxane bond for example, the porous insulating film
- an energy beam for example, an electron beam or an ultraviolet ray
- plasma for example, O 2 plasma
- the method for manufacturing the semiconductor device includes a gas containing at least one element selected from the group consisting of hydrogen, carbon, nitrogen, and silicon as a constituent element (excluding N 2 and H 2 O gas; for example, , Ethylene) is exposed to the second step.
- a gas containing at least one element selected from the group consisting of hydrogen, carbon, nitrogen, and silicon as a constituent element excluding N 2 and H 2 O gas; for example, , Ethylene
- the relative dielectric constant of the insulating film first increases after the relative dielectric constant of the insulating film decreases due to the exposure of the gas to the insulating film.
- the exposure ends before the time point (see FIG. 1).
- the relative permittivity drop ends between 0.2 and 0.5 minutes after the start of gas exposure, and first rises between 10 and 15 minutes after the start of gas exposure.
- the exposure time is preferably 0.5 minutes or more and 10 minutes or less, more preferably 1 minute or more and 5 minutes or less.
- Such exposure time is much shorter than the gas exposure time of 30 minutes in the conventional method in which an insulating film is irradiated with an electron beam simultaneously with firing. Therefore, according to the manufacturing method of the semiconductor device, an increase in the dielectric constant of the insulating film caused by the treatment for enhancing the mechanical strength (such as electron beam irradiation) can be suppressed in a short time.
- the productivity of the semiconductor device is improved.
- FIG. 4 is a diagram for explaining the relationship between the effective relative permittivity of the insulating film subjected to termination treatment and the gas pressure used for termination treatment.
- the horizontal axis represents the gas pressure used for the termination process.
- the left vertical axis represents the effective relative dielectric constant of the insulating film.
- FIG. 4 shows not only the change in the effective relative dielectric constant indicated by the solid line but also the change in the defect rate due to the stress migration indicated by the broken line. The explanation regarding the stress migration is described in an embodiment described later.
- the data shown in FIG. 4 is calculated from the capacitance of the wiring formed in the interlayer insulating film manufactured under the same conditions as Samples 3, 7 to 10 and Comparative Example 4 (for details, refer to the following examples). ).
- the insulating film modification treatment applied to the sample is electron beam irradiation.
- the gas used for dangling bond termination treatment is ethylene.
- the exposure time to ethylene gas is 0.5 minutes and the sample temperature is room temperature.
- the decrease in the dielectric constant in the low pressure region is considered to be due to termination of dangling bonds by ethylene gas.
- the increase in the relative permittivity in the high pressure region is caused by the fact that active species generated by dangling termination (for example, ethylene from which one H has been removed) increases in the atmosphere, and a new dangling bond is added to the insulating film. This is thought to be due to the formation of
- the pressure of the gas during the exposure is preferably 0.05 Pa or more and 700 Pa or less, more preferably 0.1 Pa or more and 100 Pa or less, and 1 Pa or more. 50 Pa or less is most preferable (see FIG. 4).
- the gas exposure time required to lower the dielectric constant of the insulating film is much shorter than the gas exposure time (30 minutes) of the conventional method (for example, 0.5 Min).
- an increase in the dielectric constant of the insulating film caused by the treatment for enhancing the mechanical strength (such as electron beam irradiation) can be suppressed in a short time. Therefore, according to the method for manufacturing a semiconductor device, the productivity of the semiconductor device is improved.
- the gas used in the second step is preferably any one gas selected from the group consisting of hydrogen, methane, ethylene, ammonia, silane, and hexamethyldisilazane (FIGS. 2 and 2). 3).
- FIG. 5 is a diagram illustrating the configuration of the manufacturing apparatus 2 used in the semiconductor device manufacturing method described in the present embodiment.
- the manufacturing apparatus 2 includes a processing chamber 8 including a generator 10 that generates an energy ray (for example, an electron beam or an ultraviolet ray) to which the insulating film 6 is exposed while being shielded from the atmosphere.
- a generator 10 that generates an energy ray (for example, an electron beam or an ultraviolet ray) to which the insulating film 6 is exposed while being shielded from the atmosphere.
- the present manufacturing apparatus 2 uses a gas containing at least one element selected from the group consisting of hydrogen, carbon, nitrogen, and silicon as a constituent element (excluding nitrogen and H 2 O gas).
- a gas introduction device 18 for terminating the introduction of the gas is provided before the first rise after the dielectric constant of the insulating film 6 is lowered after being introduced into the processing chamber 8.
- the processing chamber 8 includes a generator 10 that irradiates the entire surface of the insulating film 6 with the electron beam 9.
- a sample support 12 on which the semiconductor substrate 4 is placed is provided inside the processing chamber 8.
- the sample support 12 is made as a hot plate having a heating device 14 so that the insulating film 6 formed on the semiconductor substrate 4 can be heated.
- the processing chamber 8 is exhausted through the vacuum exhaust port 16.
- an on-off valve, a pressure adjusting device, an exhaust pump (vacuum pump), and the like are installed on the downstream side of the vacuum exhaust port 16. Therefore, the insulating film 6 can be exposed to the energy rays while the atmosphere is exhausted from the inside of the processing chamber 8.
- the present manufacturing apparatus 2 introduces a predetermined gas into the processing chamber 8 while maintaining a state cut off from the atmosphere, and when the relative dielectric constant of the insulating film 6 decreases and then rises for the first time.
- a gas introduction device 18 for terminating the introduction of the gas is provided.
- the predetermined gas is a gas containing at least one element selected from the group consisting of hydrogen, carbon, nitrogen, and silicon as a constituent element (except for N 2 and H 2 O gases). .
- the predetermined gas is preferably any one gas selected from the group consisting of hydrogen, methane, ethylene, ammonia, silane, and hexamethyldisilazane.
- the gas introduction device 18 includes a valve 20 connected to a gas supply device (not shown) that supplies the predetermined gas. Further, the gas introduction device 18 includes a gas introduction control device 22 that controls opening and closing of the valve 20. The gas introduction control device 22 closes the valve 20 before the first rise after the relative dielectric constant of the insulating film 6 falls, and terminates the introduction of the gas.
- the generator 10 may be an apparatus that generates an electron beam (electron beam source) or an apparatus that generates ultraviolet rays (for example, a high-pressure mercury lamp).
- 6A to 6N are process cross-sectional views illustrating a method for manufacturing a semiconductor device (for example, a graphic integrated circuit device or a microprocessor) according to this embodiment.
- a semiconductor device for example, a graphic integrated circuit device or a microprocessor
- a plurality of transistors having source diffusion layers 28, drain diffusion layers 30, and gate electrodes 32 are formed on the silicon wafer 24 by being separated by the element isolation film 26.
- the gate electrode 32 has a sidewall silicon insulating film 34 and is formed on the gate oxide film (see FIG. 6A).
- an SiO 2 film 36 serving as a first interlayer insulating film is formed on the Si wafer 24 on which the transistor is formed, for example, by a P-CVD method (plasma method). Chemical vapor deposition). Thereafter, a stopper film 38 is formed on the SiO 2 film 36, and a contact hole 40 for extracting an electrode is formed (see FIG. 6B).
- TiO 42 having a thickness of 50 nm is formed inside the contact hole 40. Thereafter, the contact hole 40 is filled with W using a mixed gas of WF 6 gas and hydrogen as a raw material. Further, W deposited on the stop film 38 at this time is removed by chemical mechanical polishing (CMP). Through the above steps, the first conductor plug 44 is formed (see FIG. 6C).
- the SiC film 46 is a SiC: O: H film containing oxygen and hydrogen as constituent elements.
- a porous insulating film is formed on the first SiC: O: H film 46 using the above-mentioned liquid composition (trade name: Ceramate NCS, manufactured by Catalytic Chemical Industry Co., Ltd.) as a raw material (FIG. 6D).
- the thickness of the first porous insulating film 48 formed here is 160 nm, and the relative dielectric constant is 2.3.
- the elastic modulus is 7.8 Gpa.
- the raw material (liquid composition) and the formation procedure of the porous insulating film are as described above.
- the first porous insulating film 48 is an insulating film formed by applying a liquid composition containing a silicon compound to a semiconductor substrate and sintering the applied liquid composition.
- the porous insulating film is an insulating film having a siloxane bond (Si—O—Si bond). Instead of such a porous insulating film, another insulating film having a siloxane bond may be used.
- the dielectric constant of the insulating film is preferably 2.7 or less, and more preferably 2.5 or less.
- the relative dielectric constant of the insulating film is usually 2.0 or more.
- the dielectric constant of the insulating film is preferably 2.0 or more, and more preferably 2.3 or more.
- the first porous insulating film 48 is subjected to an insulating film modification treatment by electron beam irradiation (see FIG. 6E).
- the Si wafer 24 on which the porous insulating film 48 is formed is placed on the sample support 12 of the manufacturing apparatus 2 described with reference to FIG. Thereafter, the inside of the processing chamber 8 is evacuated through the vacuum exhaust port 16 to become a vacuum.
- the porous insulating film 48 is irradiated with the electron beam 9 generated by the generator 10.
- the dose and energy of the electron beam are 40 ⁇ C / cm 2 ⁇ min and 5 keV, respectively.
- the irradiation time of an electron beam is 10 minutes.
- the bond of the first porous insulating film 48 having a siloxane bond is cut by the electron beam irradiation in a state of being cut off from the atmosphere. At this time, the broken bond is recombined to form a strong network of constituent atoms. As a result, the mechanical strength of the first porous insulating film 48 increases to 20 Gpa. On the other hand, the relative dielectric constant of the first porous insulating film 48 increases to 2.9 (effective relative dielectric constant is 3.2).
- the above process is a process of cutting the bond of the porous insulating film 48 having a siloxane bond.
- the gas introduction control device 22 opens the valve 20 connected to an ethylene gas supply device (not shown). Then, ethylene gas flows into the processing chamber 8. The pressure in the processing chamber 8 is maintained at 1 Pa by a pressure adjusting device and an exhaust pump provided on the downstream side of the vacuum exhaust port 16. The introduction of ethylene gas is continued for 0.5 minutes, and then the gas introduction control device 22 closes the valve 20. At this time, the substrate temperature (that is, the temperature of the porous insulating film 48) is room temperature (25 ° C.).
- the first porous insulating film 48 is exposed to the ethylene gas 50 while maintaining the state cut off from the atmosphere (see FIG. 6F).
- unbonded hands (dangling bonds) left in the first porous insulating film 48 without being recombined are terminated.
- the relative dielectric constant of the first porous insulating film 48 increased by the insulating film modification treatment is restored from 2.9 to 2.3.
- the elastic modulus which is an index of mechanical strength, maintains a high value of 17 Gpa.
- the first porous insulating film 48 is subjected to the insulating film modification process and the dangling bond termination process to become the second interlayer insulating film 49.
- the effective dielectric constant of the first porous insulating film 48 changes as shown by the solid line in FIG. 1 with respect to the processing time.
- the effective relative dielectric constant starts to decrease and reaches the minimum value (2.6) in 0.5 minutes. Thereafter, the effective relative dielectric constant stays at this minimum value for a while, and starts increasing when 10 minutes have elapsed.
- the exposure to ethylene gas is terminated at 0.5 minutes before the time when the relative dielectric constant first rises (10 to 15 minutes). Therefore, the valve 20 is closed 0.5 minutes after the introduction of ethylene gas.
- the effective relative dielectric constant is about 0.3 higher than the relative dielectric constant.
- a second SiC: O: H film 52 having a thickness of 30 nm is formed on the first porous insulating film 48 (see FIG. 6H).
- the second SiC: O: H film 52 and the first porous insulating film 48 to be the second interlayer insulating film 49 are formed in a pattern corresponding to the wiring groove formed in the second interlayer insulating film 49.
- Etching is performed by F (fluorine) plasma formed using a mixed gas of CF 4 and CHF 3 as a raw material using a mask. By this etching, a first wiring groove 54 having a width of 100 nm is formed (see FIG. 6I).
- a TaN layer 56 having a thickness of 10 nm and a Cu layer (not shown) having a thickness of 10 nm are formed in the wiring groove 54 by sputtering.
- TaN 56 functions as a diffusion barrier that prevents diffusion of Cu into the insulating film.
- Cu 58 is formed to 600 nm by electrolytic plating using the Cu layer as a seed electrode.
- Cu outside the wiring trench 54 is removed by CMP (see FIG. 6J).
- a first SiN film 62 having a thickness of 30 nm is formed on the first Cu wiring 60 and the second SiC: O: H film 52 by a CVD method (see FIG. 6K).
- a second porous insulating film 64 having a thickness of 180 nm is formed on the second SiC: O: H film 52. Thereafter, the second porous insulating film 64 is subjected to the above-described insulating film modification process and dangling bond termination process. Further, a third SiC: O: H film 66 having a thickness of 30 nm is formed on the second porous insulating film 64.
- a third porous insulating film 68 having a thickness of 160 nm is formed on the third SiC: O: H film 66. Thereafter, the third porous insulating film 68 is subjected to an insulating film modification process and a dangling bond termination process. Further, a fourth SiC: O: H film 70 having a thickness of 30 nm is formed on the third porous insulating film 68 (see FIG. 6L).
- the second and third porous insulating films 64 and 68 become the third and fourth interlayer insulating films 72 and 74, respectively.
- the method for forming the second and third porous insulating films 64 and 68 is the same as the method for forming the first porous insulating film 48.
- the insulating film modification treatment and dangling bond termination treatment applied to the second and third porous insulation films 64 and 68 are the same as the insulating film modification treatment and dangling treatment applied to the first porous insulation film 48. This is the same process as the bond termination process.
- the second and third layers are formed by F (fluorine) plasma formed using a mixed gas of CF 4 and CHF 3 as a raw material.
- the porous insulating films 64 and 68 are etched.
- the porous insulating film 64 and the first SiN film 62 are sequentially etched. By this etching, a via hole 75 is formed (see FIG. 6M).
- the fourth SiC: O: H film 70 and the third porous insulating film 68 are made of CF 4 and CHF using a resist mask corresponding to the wiring groove formed in the fourth interlayer insulating film 74.
- Etching is performed by F (fluorine) plasma generated using the mixed gas 3 as a raw material. By this etching, a second wiring trench 76 having a width of 100 nm is formed (see FIG. 6M).
- a TaN layer 78 having a thickness of 10 nm and a Cu layer (not shown) having a thickness of 10 nm are formed in the via hole 75 and the second wiring groove 76 by sputtering.
- TaN 78 functions as a diffusion barrier that prevents diffusion of Cu into the insulating film.
- Cu 80 is formed to 1400 nm by electrolytic plating using the Cu layer as a seed electrode. Further, Cu outside the second wiring trench 76 is removed by CMP.
- the second Cu wiring 82 and the second plug 84 are formed.
- a second SiN film 86 having a thickness of 30 nm is formed on the second Cu wiring 82 and the fourth SiC: O: H film 70 by CVD (see FIG. 6N).
- the number of wiring layers is not limited to two.
- the fifth and sixth interlayer insulating films, the third interlayer insulating films 72 and 74, the second plug 84, and the second Cu wiring 82 are formed by the same process as the above process.
- a plug and a third Cu wiring may be formed.
- the porous insulating film that becomes the interlayer insulating film is subjected to an insulating film modification treatment. Therefore, since the mechanical strength of the porous insulating film is enhanced, the porous insulating film will not be peeled off even when CMP for forming a wiring groove or the like is performed.
- the dangling bond termination treatment is applied to the porous insulating film that becomes the interlayer insulating film. Therefore, an increase in the dielectric constant due to the insulating film modification treatment is suppressed. For this reason, the capacitance between wirings is reduced, and the signal delay time of the semiconductor device provided with these porous insulating films is also reduced.
- the dangling bond termination process performed in this embodiment is a process in which the porous insulating film is only exposed to ethylene gas for a very short time (0.5 minutes). Therefore, according to this embodiment, an interlayer insulating film with enhanced mechanical strength and low dielectric constant can be formed in a short time.
- 7 and 8 are tables for explaining characteristics (effective relative dielectric constant and defect rate due to stress migration) of semiconductor devices manufactured by variously changing the dangling bond termination process conditions.
- the third to sixth columns describe the conditions for dangling bond termination treatment.
- the seventh and eighth columns describe characteristics obtained by measuring the semiconductor device. Note that the semiconductor device used for the measurement was the semiconductor device described with reference to FIGS. 6A to 6N except for the insulating film modification treatment applied to the porous insulating film serving as the interlayer insulating film and the dangling bond termination conditions. Has substantially the same structure. However, there are three wiring layers.
- the method for measuring the effective relative permittivity is as described above. However, the measurement of the capacitance between the Cu wirings is performed between the wirings separated vertically by the interlayer insulating film.
- Defective rate due to stress migration is the proportion of wiring whose wiring resistance has increased by 50% or more due to heat treatment.
- the temperature and time of the heat treatment are 200 ° C. and 500 hours.
- the defect rate due to stress migration is described.
- the stress migration failure rate is not 6%.
- the defect rate due to stress migration rapidly increases to 76% to 84% (see Comparative Examples 1 to 3).
- the defect rate due to stress migration decreases to 6% to 25% (see Sample 1 to Sample 31).
- the change in the defect rate due to stress migration with respect to the processing time of dangling bond termination processing is indicated by a broken line.
- the defect rate due to stress migration changes in substantially the same manner as the relative dielectric constant indicated by the solid line. This fact indicates that both changes are due to the same factors, the disappearance and reoccurrence of dangling bonds. Note that the change in the defect rate due to stress migration shown in FIG. 1 is based on the data described in Tables 3 and 4.
- the change in the defect rate due to stress migration with respect to the pressure of the gas used for dangling bond termination treatment is indicated by a broken line. Even with the gas pressure, the stress migration failure rate changes in substantially the same manner as the relative dielectric constant (solid line). This fact also shows that both changes are due to the same factors, the disappearance and reoccurrence of dangling bonds.
- the change in the defect rate due to stress migration shown in FIG. 4 is also based on the data described in Tables 3 and 4.
- FIG. 9 is a diagram for explaining the relationship between the temperature of dangling bond termination treatment and the defect rate (broken line) due to stress migration.
- the change in effective relative permittivity with respect to the processing temperature is also shown by a solid line.
- the horizontal axis is the processing temperature.
- the right vertical axis represents the defect rate due to stress migration.
- the left vertical axis is the effective relative dielectric constant.
- the change in the defect rate shown in FIG. 9 is based on the data measured for samples 7 and 11 to 15 in Tables 3 and 4.
- the relative permittivity is substantially constant regardless of the temperature, but the defect rate due to stress migration increases rapidly when the processing temperature exceeds 400 ° C.
- the termination process speed increases.
- the temperature of the termination treatment is 50 ° C. or higher, an increase in termination speed is clearly recognized.
- an increase in processing temperature is preferable.
- the processing temperature exceeds 400 ° C., the failure rate due to stress migration increases rapidly.
- the temperature of the insulating film when the insulating film is exposed to gas is preferably 0 ° C. or higher and 400 ° C. or lower, more preferably 50 ° C. or higher and 300 ° C. or lower, and 100 Most preferably, the temperature is at least 200 ° C.
- the said insulating film can be heated with the heating apparatus 14 provided in the sample support stand 12 (refer FIG. 5).
- the porous insulating films 48, 64 and 68 after the dangling bond termination treatment are exposed to F plasma and etched. . Further, the porous insulating films 48, 64, and 68 are also exposed to O 2 plasma used for ashing processing for removing the resist mask film used for the reactive ion etching.
- dangling bonds are formed in the vicinity of the etched surfaces of the porous insulating films 48, 64, and 68.
- a dangling bond termination process is performed after the reactive ion etching using F plasma and the ashing process using O 2 plasma and before proceeding to the next step.
- the insulating film modification treatment process may be a process for processing the insulating film instead of the above-described process for increasing the mechanical strength of the insulating film.
- the processing for processing the insulating film is, for example, a process of etching the insulating film by plasma exposure or a process of removing the photoresist film formed on the insulating film by plasma exposure as described above. is there.
- the process for processing the insulating film may be a process in which both the reactive etching and the ashing process are performed.
- the energy beam that exposes the insulating film is an electron beam.
- the energy rays that expose the insulating film may be ultraviolet rays.
- This example relates to a method for manufacturing a semiconductor device in which a bond of an insulating film is cut by exposure to plasma.
- FIG. 10 is a diagram illustrating the configuration of the manufacturing apparatus 88 used in this embodiment.
- the configuration of the manufacturing apparatus 88 is the same as that of the manufacturing apparatus 2 according to the first embodiment described with reference to FIG. 5 except that a plasma generating apparatus 89 is provided instead of the energy beam generating apparatus 10. Therefore, the following description relates to the difference.
- the plasma generator 89 includes a counter electrode 90 that faces the sample support 12 and a high-frequency power source 92 (RF power source) that applies a high frequency between the counter electrode 90 and the sample support 12.
- RF power source RF power source
- the counter electrode 90 is provided with a gas inlet 94 for supplying a plasma source gas 91 (for example, O 2 gas). Further, the counter electrode 90 is provided with a jet port 96 for jetting the gas into the processing chamber 8.
- a plasma source gas 91 for example, O 2 gas.
- the plasma source gas is supplied into the processing chamber 8 from the jet port and exhausted through the vacuum exhaust port 16. At this time, the inside of the processing chamber 8 is maintained at a constant pressure by a pressure adjusting device (not shown). In this state, when the high frequency power source 92 applies high frequency power between the counter electrode 90 and the sample support 12, plasma is generated.
- the gas used as the raw material of plasma is, for example, O 2 gas or H 2 gas.
- the high frequency power supplied from the high frequency power source 92 is 200 W, for example.
- the pressure of the source gas 91 during plasma generation is, for example, 10 Pa.
- the elastic modulus of the insulating film increases as in the case of exposure to energy rays (see Comparative Example 3 in Table 2). That is, the mechanical strength of the insulating film is also enhanced by exposure to plasma. In addition, the dielectric constant of the insulating film increases. Note that the mechanical strength of the insulating film is enhanced because electrons and ions in the plasma cut the bond of the insulating film.
- the manufacturing method of the semiconductor device of this example is substantially the same as the manufacturing method of the semiconductor device of Example 1 except that the insulating film modification treatment is performed using the manufacturing apparatus 88 described above.
- Tables 3 and 4 also describe the characteristics of the semiconductor device manufactured using O 2 plasma (Sample 26 to Sample 31, Comparative Example 3).
- the dielectric constant of the insulating film increased by exposure to O 2 plasma can be suppressed by short-time exposure to ethylene gas or the like (see Tables 3 and 4).
- Tables 1 to 4 show that, as an insulating film modification treatment (for enhancing mechanical strength), ultraviolet irradiation and exposure of the insulating film to plasma are effective as well as known electron beam irradiation. It is shown that.
- the devices used for these insulating film modification treatments do not require a high voltage source unlike an electron beam irradiation source, so the configuration is simple and inexpensive. Further, unlike the electron beam irradiation, the ultraviolet irradiation and the plasma exposure are excellent in that the damage given to the electronic device formed on the Si substrate as a base is small.
- a liquid composition containing a silicon compound manufactured using TAOS and AS as raw materials is baked to form an insulating film, and the insulating film is subjected to an insulating film modification process and a dangling bond termination process. It is a manufacturing method.
- the insulating film used for manufacturing the semiconductor device is not limited to such an insulating film.
- the liquid composition that is fired to become an insulating film may contain the following silicon compound.
- This silicon compound (A) is a silicon compound obtained by mixing AS or its hydrolyzate or partial hydrolyzate with an intermediate after TAOS is hydrolyzed or partially hydrolyzed in the presence of TAAOH.
- this silicon compound (A) is a silicon compound obtained by hydrolyzing a part or all of the silicon compound obtained by mixing.
- TAOS is Tetraalkylorthosilicate.
- TAAOH is Tetraalkylammonium hydroxide.
- AS is Alkoxysilane represented by the following general formula (II). *
- X represents any of a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, a fluorine-substituted alkyl group, an aryl group, and a vinyl group.
- R represents any one of a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group, and a vinyl group.
- N is an integer of 0 to 3.
- such an insulating film is also a so-called nanoclustering silica (NCS: Nanoclustering Silica) including pores of a nano size (diameter: 1 nm to 10 nm) as in the case of the insulating film described in the above embodiments.
- NCS Nanoclustering Silica
- the insulating film used in the manufacture of the semiconductor device is an insulating film mainly containing silicon and oxygen (SiO-containing insulating film) or an insulating film mainly containing silicon, oxygen and carbon (SiOC-containing insulating film).
- the insulating film is an insulating film mainly containing silicon, oxygen, carbon and hydrogen (SiOCH-containing insulating film) or an insulating film mainly containing silicon, oxygen, carbon and nitrogen (SiOCN-containing insulating film). It may be.
- the insulating film may be an insulating film containing silicon, oxygen, carbon, nitrogen, and hydrogen as main components (also referred to as a SiOCNH-containing insulating film). “Main component” means that other components may coexist to the extent that the function as an insulating film is not impaired.
- the SiO-containing insulating film is an insulating film having an atomic composition ratio close to SiO 2 .
- the nanoclustering silica (having a relative dielectric constant of about 2.25) is a kind of SiO-containing insulating film.
- a porous carbon doped SiO 2 film (Porous Carbon Doped SiO 2 film) formed by adding a thermally decomposable compound to a carbon doped SiO 2 film (Carbon Dorped SiO 2 film) and further thermally decomposing the thermally decomposable compound.
- a relative dielectric constant of about 2.5) is also a kind of SiO-containing insulating film.
- An insulating film manufactured using polycarbosilane or polycarboxysilane as a raw material is also a kind of SiOC-containing insulating film or SiOCH-containing insulating film.
- Organic or inorganic SOG spin on glass; relative dielectric constant of about 2.7 is a kind of SiOC-containing insulating film or SiOCH-containing insulating film.
- SiOCN-containing insulating film or the SiOCHN-containing insulating film a SiOCHN-containing insulating film such as a SiC: N film (having a relative dielectric constant of about 7) by, for example, CVD is known.
- the present invention because SiOH groups are likely to be generated.
- the present invention is particularly preferably applied when the silicon-based insulating film is a SiOCH-containing insulating film.
- the insulating film is subjected to the dangling bond termination process while being insulated from the atmosphere after being subjected to the insulating film modification process.
- the insulating film may be subjected to dangling bond termination treatment after being once exposed to the atmosphere for a short time.
- the gas used for dangling bond termination treatment may be a gas other than the above-described gas (for example, ethylene gas), for example, a gas having halogen as a constituent element, such as NF 3 gas.
- a gas other than the above-described gas for example, ethylene gas
- a gas having halogen as a constituent element such as NF 3 gas.
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Abstract
Description
vapor deposition)やプラズマCVDにより形成されシリコン酸化膜であった。このようなシリコン酸化膜の比誘電率は、一般的には4.1程度である。
mechanical polishing)を施すと剥離してしまうという問題がある。
6・・・絶縁膜 8・・・処理室 9・・・電子線
10・・・発生装置 11・・・ガス 12・・・試料支持台
14・・・加熱装置 18・・・ガス導入装置
20・・・バルブ 22・・・ガス導入制御装置
24・・・シリコンウェハ 26・・・素子間分離膜
28・・・ソース拡散層 30・・・ドレイン拡散層
32・・・ゲート電極 34・・・サイドウォールシリコン系絶縁膜
36・・SiO2膜 38・・・ストッパ膜
40・・・コンタクトホール 42・・・TiO
44・・・第1の導体プラグ 46・・・SiC膜(第1のSiC:O:H膜)
48・・第1の多孔質絶縁膜 49・・・第2の層間絶縁膜
50・・・エチレンガス 52・・・第2のSiC:O:H膜
54・・・第1の配線溝 56・・・TaN層
58・・・Cu 60・・・第1のCu配線
62・・・第1のSiN膜 64・・・第2の多孔質絶縁膜
66・・・第3のSiC:O:H膜 68・・・第3の多孔質絶縁膜
70・・・第4のSiC:O:H膜 72・・・第3の層間絶縁膜
74・・・第4の層間絶縁膜 75・・・ビアホール
76・・・第2の配線溝 78・・・TaN層 80・・・Cu
82・・・第2のCu配線 84・・・第2の導体プラグ
86・・・第2のSiN膜 88・・・製造装置(実施例2)
89・・・プラズマの発生装置 90・・・対向電極
91・・・原料ガス 92・・・高周波電源 94・・・ガス導入口
96・・・噴出口
ここで、Xは、水素原子、フッ素原子、炭素数1~8のアルキル基、フッ素置換アルキル基、アリール基、及びビニル基の何れかを表す。また、Rは、水素原子、炭素数1~8のアルキル基、アリール基、及びビニル基の何れかを表す。また、nは、0~3の整数である。
比誘電率は、評価対象の絶縁膜に形成した評価用コンデンサの容量と、当該絶縁膜の厚さに基づいて算出されたものである。
リーク電流密度は、上記評価用コンデンサのリーク電流と絶縁膜の厚さに基づいて算出されたもである。リーク電流の測定は、電流―電圧測定器(所謂、I-Vメータ)を用いて、電圧を0V~20Vの範囲で0.02V間隔で増加(又は減少)させて試料に流れる電流を測定することにより行った。評価対象となるリーク電流密度は、絶縁膜に0.2MV/cmの電界が印加された時のリーク電流から算出された値である。
弾性率が高い膜ほど、絶縁膜の機械的強度は高くなる。そこで、機械的強度の指標として、弾性率も評価項目に加えられた。
ダングリングボンド密度の計測に用いられる試料は、評価対象の絶縁膜を基板からはぎ取り、粉末にしたものである。この試料を用いて、単位重量当たりのダングリングボンド量(ダングリングボンド密度)が求められる。
絶縁膜に内部応力が発生すると、層間絶縁膜によって覆われた配線のストレスマイグレーションが促進される。そこで、絶縁膜変性処理前後における絶縁膜の内部応力差も評価項目に加えられた。
従って、本半導体装置の製造方法によれば、半導体装置の生産性が向上する。
chemical vapor deposition)によって形成される。その後、このSiO2膜36の上にストッパ膜38が形成され、更に、電極取り出し用のコンタクトホール40が形成される(図6B参照)。
上述した例は、TAOSおよびASを原料として製造されるケイ素化合物を含む液状組成物を焼成して絶縁膜を形成し、この絶縁膜に絶縁膜変性処理及びダングリングボンド終端処理を施す半導体装置の製造方法である。
ここで、Xは、水素原子、フッ素原子、炭素数1~8のアルキル基、フッ素置換アルキル基、アリール基、及びビニル基の何れかを表す。また、Rは、水素原子、炭素数1~8のアルキル基、アリール基、及びビニル基の何れかを表す。また、nは、0~3の整数である。
on glass;比誘電率は約2.7)も、SiOC含有絶縁膜またはSiOCH含有絶縁膜の一種である。
Claims (17)
- シロキサン結合を有する絶縁膜を、エネルギー線又はプラズマに曝す第1の工程と、
水素、炭素、窒素、及びシリコンからなる群から選ばれる少なくても一つの元素を構成元素として含むガス(但し、N2及びH2Oガスを除く)に前記絶縁膜を曝露する第2の工程とを備え、
前記第2の工程において、前記絶縁膜に対する前記ガスの暴露によって前記絶縁膜の比誘電率が下降した後、前記絶縁膜の比誘電率が最初に上昇する時点よりも前に、前記曝露を終了する
ことを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記曝露を行う時間が、0.5分以上で且つ10分以下であることを、
特徴とする半導体装置の製造方法。 - 請求項1又は2に記載の半導体装置の製造方法において、
前記曝露中に於ける前記ガスの圧力が、0.05Pa以上で且つ700Pa以下であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至3の何れか1項に記載の半導体装置の製造方法において、
前記絶縁膜が、配線が形成される層間絶縁膜であって、
前記第2の工程における前記絶縁膜の温度が、0℃以上400℃以下であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至4の何れか1項に半導体装置の製造方法において、
前記ガスが、水素、メタン、エチレン、アンモニア、シラン、及びヘキサメチルジシラザンからなる群から選ばれた何れか一つのガスであることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至5の何れか1項に記載の半導体装置の製造方法において、
前記エネルギー線が電子線又は紫外線であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至6の何れか1項に記載の半導体装置の製造方法において、
前記第1の工程が、前記絶縁膜の機械的強度を増加させる工程であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至7の何れか1項に記載の半導体装置の製造方法において、
前記第1の工程が、前記絶縁膜を加工する工程であることを、
特徴とする半導体装置の製造方法。 - 請求項8に記載の半導体装置の製造方法において、
前記第1の工程が、前記絶縁膜をプラズマに曝してエッチングする工程及び前絶縁膜の上に形成されたフォトレジスト膜をプラズマに曝して除去する工程の何れか一方又は双方であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至9の何れか1項に記載の半導体装置の製造方法において、
前記絶縁膜の比誘電率が2.7以下で2.0以上であることを、
特徴とする半導体装置の製造方法。 - 請求項1乃至10の何れか1項に記載の半導体装置の製造方法において、
前記絶縁膜が、ケイ素化合物を含む液状組成物を半導体基板に塗布し、塗布した前記液状組成物を焼結して形成した絶縁膜であることを、
特徴とする半導体装置の製造方法。 - 請求項11に記載の半導体装置の製造方法において、
前記ケイ素化合物が、
テトラアルキルオルソシリケート(TAOS)および下記一般式(I)で示されるアルコキシシラン(AS)を、テトラアルキルアンモニウムハイドロオキサイド(TAAH)の存在下で加水分解して得られるケイ素化合物であることを、
特徴とする半導体装置の製造方法。
XnSi(OR)4-n (I)
(式中、Xは水素原子、フッ素原子、または炭素数1~8のアルキル基、フッ素置換アルキル基、アリール基もしくはビニル基を表し、Rは水素原子、または炭素数1~8のアルキル基、アリール基もしくはビニル基を表す。また、nは0~3の整数である。) - 請求項11に記載の半導体装置の製造方法において、
前記ケイ素化合物が、
テトラアルキルオルソシリケート(TAOS)をテトラアルキルアンモニウムハイドロオキサイド(TAAOH)の存在下で加水分解または部分加水分解した後の中間体に、下記一般式(II)で示されるアルコキシシラン(AS)または前記アルコキシシランの加水分解物もしくは部分加水分解物を混合して得られるケイ素化合物、又は当該ケイ素化合物の一部または全部を加水分解して得られるケイ素化合物であることを、
特徴とする半導体装置の製造方法。
XnSi(OR)4-n (II)
(式中、Xは水素原子、フッ素原子、または炭素数1~8のアルキル基、フッ素置換アルキル基、アリール基もしくはビニル基を表し、Rは水素原子、または炭素数1~8のアルキル基、アリール基もしくはビニル基を表す。また、nは0~3の整数である。) - シロキサン結合を有する絶縁膜の結合手を切断する第1の工程と、
水素、炭素、窒素、及びシリコンからなる群から選ばれる少なくても一つの元素を構成元素として含むガス(但し、窒素及びH2Oガスを除く)に前記絶縁膜を曝露する第2の工程とを備え、
前記第2の工程において、前記絶縁膜に対する前記ガスの暴露によって前記絶縁膜の比誘電率が下降した後、前記絶縁膜の比誘電率が最初に上昇する時点よりも前に、前記曝露を終了する
ことを特徴とする半導体装置の製造方法。 - 絶縁膜が曝されるエネルギー線又はプラズマを生成する発生装置を備える処理室と、
水素、炭素、窒素、及びシリコンからなる群から選ばれる少なくても一つの元素を構成元素として含むガス(但し、N2及びH2Oガスを除く)を前記処理室に導入し、且つ前記絶縁膜の比誘電率が降下した後、最初に上昇する時点より前に前記ガスの導入を終了するガス導入装置を、
具備する半導体装置の製造装置。 - 請求項15に記載の半導体装置の製造装置において、
前記発生装置が電子線又は紫外線を発生する装置であることを、
特徴とする半導体装置の製造装置。 - 請求項15又は請求項16に記載の半導体装置の製造装置において、
前記ガスが、水素、メタン、エチレン、アンモニア、シラン、及びヘキサメチルジシラザンからなる群から選ばれる何れか一つのガスであることを、
特徴とする半導体装置の製造装置。
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001203194A (ja) * | 1999-09-02 | 2001-07-27 | Applied Materials Inc | 低κ誘電体に対する損傷を最小にする金属プラグの事前清浄化方法 |
JP2005503673A (ja) * | 2001-09-14 | 2005-02-03 | アクセリス テクノロジーズ インコーポレーテッド | 多孔性低誘電率材料のための紫外線硬化処理 |
JP2007053300A (ja) * | 2005-08-19 | 2007-03-01 | Fujitsu Ltd | シリカ系被膜の製造方法、シリカ系被膜および半導体装置 |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6652922B1 (en) * | 1995-06-15 | 2003-11-25 | Alliedsignal Inc. | Electron-beam processed films for microelectronics structures |
US6284050B1 (en) * | 1998-05-18 | 2001-09-04 | Novellus Systems, Inc. | UV exposure for improving properties and adhesion of dielectric polymer films formed by chemical vapor deposition |
US6177143B1 (en) * | 1999-01-06 | 2001-01-23 | Allied Signal Inc | Electron beam treatment of siloxane resins |
JP3888794B2 (ja) * | 1999-01-27 | 2007-03-07 | 松下電器産業株式会社 | 多孔質膜の形成方法、配線構造体及びその形成方法 |
KR100364054B1 (ko) * | 1999-06-08 | 2003-02-07 | 에이에스엠 저펜 가부시기가이샤 | 반도체 기판상의 실리콘 폴리머 절연막 및 그 형성방법 |
US20030104225A1 (en) * | 2000-02-01 | 2003-06-05 | Jsr Corporation | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device |
US20030157340A1 (en) * | 2000-02-01 | 2003-08-21 | Jsr Corporation | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device |
JP4195773B2 (ja) * | 2000-04-10 | 2008-12-10 | Jsr株式会社 | 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜 |
US6902771B2 (en) * | 2000-02-01 | 2005-06-07 | Jsr Corporation | Process for producing silica-based film, silica-based film, insulating film, and semiconductor device |
JP3419745B2 (ja) * | 2000-02-28 | 2003-06-23 | キヤノン販売株式会社 | 半導体装置及びその製造方法 |
KR100797202B1 (ko) * | 2000-06-23 | 2008-01-23 | 허니웰 인터내셔널 인코포레이티드 | 손상된 실리카 유전 필름에 소수성을 부여하는 방법 및 손상된 실리카 유전 필름 처리 방법 |
US6746969B2 (en) * | 2000-10-20 | 2004-06-08 | Kabushiki Kaisha Toshiba | Method of manufacturing semiconductor device |
TW559860B (en) * | 2001-05-10 | 2003-11-01 | Toshiba Corp | Method for manufacturing semiconductor device |
US20040058090A1 (en) * | 2001-09-14 | 2004-03-25 | Carlo Waldfried | Low temperature UV pretreating of porous low-k materials |
US6756085B2 (en) * | 2001-09-14 | 2004-06-29 | Axcelis Technologies, Inc. | Ultraviolet curing processes for advanced low-k materials |
US7083991B2 (en) * | 2002-01-24 | 2006-08-01 | Novellus Systems, Inc. | Method of in-situ treatment of low-k films with a silylating agent after exposure to oxidizing environments |
JP4225765B2 (ja) * | 2002-10-31 | 2009-02-18 | 日揮触媒化成株式会社 | 低誘電率非晶質シリカ系被膜の形成方法および該方法より得られる低誘電率非晶質シリカ系被膜 |
US7709371B2 (en) * | 2003-01-25 | 2010-05-04 | Honeywell International Inc. | Repairing damage to low-k dielectric materials using silylating agents |
US7074727B2 (en) * | 2003-07-09 | 2006-07-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | Process for improving dielectric properties in low-k organosilicate dielectric material |
US7147900B2 (en) * | 2003-08-14 | 2006-12-12 | Asm Japan K.K. | Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation |
US7345000B2 (en) * | 2003-10-10 | 2008-03-18 | Tokyo Electron Limited | Method and system for treating a dielectric film |
US7553769B2 (en) * | 2003-10-10 | 2009-06-30 | Tokyo Electron Limited | Method for treating a dielectric film |
US7611996B2 (en) * | 2004-03-31 | 2009-11-03 | Applied Materials, Inc. | Multi-stage curing of low K nano-porous films |
JP5057647B2 (ja) * | 2004-07-02 | 2012-10-24 | 東京エレクトロン株式会社 | 半導体装置の製造方法および半導体装置の製造装置 |
US20060128166A1 (en) * | 2004-12-09 | 2006-06-15 | Fujitsu Limited | Semiconductor device fabrication method |
CN1787186A (zh) * | 2004-12-09 | 2006-06-14 | 富士通株式会社 | 半导体器件制造方法 |
US7357977B2 (en) * | 2005-01-13 | 2008-04-15 | International Business Machines Corporation | Ultralow dielectric constant layer with controlled biaxial stress |
JP4634923B2 (ja) * | 2005-12-15 | 2011-02-16 | 株式会社東芝 | 絶縁膜の製造方法、トランジスタの製造方法及び電子デバイスの製造方法 |
-
2008
- 2008-12-08 JP JP2010541893A patent/JP5565314B2/ja not_active Expired - Fee Related
- 2008-12-08 KR KR1020117013134A patent/KR101350020B1/ko not_active IP Right Cessation
- 2008-12-08 WO PCT/JP2008/003642 patent/WO2010067395A1/ja active Application Filing
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2011
- 2011-05-20 US US13/112,579 patent/US20110223766A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001203194A (ja) * | 1999-09-02 | 2001-07-27 | Applied Materials Inc | 低κ誘電体に対する損傷を最小にする金属プラグの事前清浄化方法 |
JP2005503673A (ja) * | 2001-09-14 | 2005-02-03 | アクセリス テクノロジーズ インコーポレーテッド | 多孔性低誘電率材料のための紫外線硬化処理 |
JP2007053300A (ja) * | 2005-08-19 | 2007-03-01 | Fujitsu Ltd | シリカ系被膜の製造方法、シリカ系被膜および半導体装置 |
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US20110223766A1 (en) | 2011-09-15 |
JPWO2010067395A1 (ja) | 2012-05-17 |
JP5565314B2 (ja) | 2014-08-06 |
KR101350020B1 (ko) | 2014-01-13 |
KR20110091533A (ko) | 2011-08-11 |
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