WO2010047272A1 - 自発巻回性粘着シート - Google Patents
自発巻回性粘着シート Download PDFInfo
- Publication number
- WO2010047272A1 WO2010047272A1 PCT/JP2009/067869 JP2009067869W WO2010047272A1 WO 2010047272 A1 WO2010047272 A1 WO 2010047272A1 JP 2009067869 W JP2009067869 W JP 2009067869W WO 2010047272 A1 WO2010047272 A1 WO 2010047272A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- pressure
- layer
- sensitive adhesive
- adhesive sheet
- winding
- Prior art date
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- B32B2307/70—Other properties
- B32B2307/732—Dimensional properties
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/16—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
- C09J2301/162—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer the carrier being a laminate constituted by plastic layers only
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2467/00—Presence of polyester
- C09J2467/006—Presence of polyester in the substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
Definitions
- the present invention relates to a self-winding pressure-sensitive adhesive sheet that can be wound spontaneously from the end in the main contraction axis direction by heat or the like to form a cylindrical wound body.
- the self-winding pressure-sensitive adhesive sheet is useful as, for example, a re-peeling pressure-sensitive adhesive sheet such as a wafer temporary fixing pressure-sensitive adhesive sheet or a wafer protecting pressure-sensitive adhesive sheet used in a processing step of a semiconductor silicon wafer or the like.
- the semiconductor silicon wafer needs to be thinned to a thickness of 100 ⁇ m or less, but such a thin film wafer is very brittle and easily broken. Therefore, a method is employed in which, during wafer processing, the wafer is held on a temporary fixing pressure-sensitive adhesive sheet, subjected to appropriate processing, and then peeled off and collected.
- Such a temporary fixing pressure-sensitive adhesive sheet is generally composed of an active energy ray-curable pressure-sensitive adhesive layer.
- the temporary fixing wafer is bonded to a wafer and subjected to processing such as polishing or dicing on the temporarily fixed wafer.
- the adhesive layer is cured by energy ray irradiation, and is used in a method of peeling an adhesive sheet having reduced adhesive strength from a wafer.
- the pressure-sensitive adhesive sheet whose adhesive strength has been reduced by irradiation with active energy rays is still in close contact with the wafer surface by atmospheric pressure. Therefore, in order to peel off the adhesive sheet from the wafer, an operation such as turning up the adhesive sheet is required.
- the edge of the wafer is chipped or damaged due to stress at this time.
- the end of the adhesive sheet attached to the wafer may protrude outward from the end of the wafer.
- it may cause difficulty in peeling by sticking to a surface or a member installed on the polishing surface side of the wafer, such as a dicing tape.
- Japanese Patent No. 3073239 discloses a pressure-sensitive adhesive sheet comprising an active energy ray-curable pressure-sensitive adhesive layer and a heat-shrinkable film in a layer structure. According to this pressure-sensitive adhesive sheet, since the heat-shrinkable film shrinks during active energy ray irradiation, it is possible to prevent the sheet from being stretched or wrinkled due to ultraviolet irradiation or the like. However, the peelability of the adhesive sheet from the wafer is still insufficient.
- Japanese Patent Application Laid-Open No. 2000-129227 discloses a pressure-sensitive adhesive sheet for temporarily fixing a semiconductor wafer comprising a shrinkable film, a rigid film, and an active energy ray-curable pressure-sensitive adhesive layer.
- the active energy ray is irradiated to reduce the adhesive force of the pressure-sensitive adhesive layer, and when the shrinkable film is contracted by a required means, the pressure-sensitive adhesive sheet is deformed, and the wafer, the pressure-sensitive adhesive layer, Since the contact area is reduced, the adhesive sheet can be easily peeled from the wafer.
- the adhesive sheet after heating was indefinitely deformed, for example, due to the shrinkage of the shrinkable film from multiple directions.
- peeling and adherend destruction could occur.
- the axial direction differs from the main shrinkable axial direction due to residual stress during production and due to stress or thermal strain applied to the adhesive sheet during the manufacturing process. It is thought that this is because secondary contraction (one or more contractions having relatively weak contraction force) occurs and these are combined to contract.
- the adherend area When the adherend area is small, the deformation of the pressure-sensitive adhesive sheet caused by the secondary shrinkage as described above is small, so there is a tendency for the problem at the time of peeling to be small. In some cases, the shrinkage also increases and eventually inhibits the shrinkage in the main shrinkage axis direction.
- the pressure-sensitive adhesive sheet of a size widely used as a wafer is likely to cause shrinkage inhibition in the main shrinkage axis direction as described above, so that an imperfection in which a part of the pressure-sensitive adhesive sheet remains adhered to the wafer after peeling. For example, the adherend may be damaged or the cured adhesive may fall off the adhesive sheet and contaminate the wafer due to uneven peeling or uneven stress during shrinkage.
- a wafer that has been ground very thin has a problem of warping.
- semiconductor wafers have been increased in size to 8 inches and 12 inches, and further thinning is required for IC card applications.
- warping of the semiconductor wafer after grinding tends to occur, and it is a major issue to eliminate the warpage.
- an ultra-thin chip such as an IC card or a stacked IC (Stacked Integrated Circuits)
- the thickness of the final wafer is required to be less than 100 ⁇ m, the warpage is increased.
- the wafer warpage after grinding is greatly influenced by the warpage of the wafer itself, but it has been found that the factor due to the residual stress of the temporary fixing adhesive sheet is larger than that.
- distortion in the temporary fixing pressure-sensitive adhesive sheet due to tensile stress or pressing pressure during bonding becomes a factor that causes a large warp after the wafer is thinned. Therefore, in order to reduce the residual stress, not only a method for bonding the temporary fixing pressure-sensitive adhesive sheet but also a configuration in which the residual stress is not generated in the temporary fixing pressure-sensitive adhesive sheet is required (Patent Document 3). ).
- Japanese Patent No. 3073239 Japanese Unexamined Patent Publication No. 2000-129227 Japanese Unexamined Patent Publication No. 2000-212524
- the object of the present invention is to suppress the warpage of the adherend that occurs when the adherend is ground, and after grinding, the adherend can be prevented from being damaged or contaminated.
- An object of the present invention is to provide an adhesive sheet that can be peeled off very easily.
- the tape is first picked up at the end of the adherend, and then the tape is pulled and peeled off in order to create a trigger for peeling.
- do not pick up the tape with a fragile adherend and do not damage the adherend by minimizing the peel stress by rubbing the tape, that is, by increasing the peel angle as much as possible. , Often make a peeling trigger.
- the pressure-sensitive adhesive sheet can be peeled from the fragile adherend by peeling the tape so as to maintain the largest peel angle as possible.
- the present inventors when imparting easy peelability by heat and other stimuli, can be deformed as if the carpet was wound up as the shape at the time of tape peeling (hereinafter, such a deformed thing is referred to as “cylinder”). It was considered to be an adhesive sheet meeting the purpose. This is because peeling while causing such deformation means that the peel angle in peeling is kept as large as possible, and the peeling stress on the adherend is minimized. That is, it means that the possibility of damaging a fragile adherend can be minimized. Furthermore, since the peeling stress is small, the possibility that the pressure-sensitive adhesive is peeled off to the adherend is reduced, so that the possibility that the adherend is contaminated by peeling can be reduced. Further, even if the wafer is bonded to a member on the wafer polishing surface side, the peeling stress can be minimized, so that the possibility of damaging the wafer is reduced.
- an elastic layer and a rigid film layer each having predetermined physical properties are laminated as a constraining layer for constraining the shrinkage of the shrinkable film layer on a shrinkable film layer that shrinks in at least one axial direction by a stimulus such as heat. Furthermore, when the pressure-sensitive adhesive sheet obtained by laminating the pressure-sensitive adhesive layer gives a stimulus such as heat, the shrinkage force of the shrinkable film and the repulsive force against the shrinkage force of the shrinkable film in the constraining layer become driving forces.
- the outer edge part (end part) is lifted up, and is wound spontaneously from the end part in one direction or from the opposite two end parts to the center (center of the two end parts) with the shrinkable film layer side inward. It was found that the pressure-sensitive adhesive sheet can be peeled off from the adherend very easily and cleanly without forming one or two cylindrical wound bodies, and therefore, the adherend is not damaged by the stress at the time of peeling.
- the formation of a cylindrical wound body by spontaneous contraction when a stimulus that causes contraction such as heat is applied is referred to as “spontaneous winding”.
- the present inventors have found that warpage after wafer thinning can be greatly reduced by providing an intermediate layer having a specific shear modulus between the rigid film layer and the pressure-sensitive adhesive layer. It was. Specifically, an adhesive sheet having a five-layer structure of shrinkable film layer / elastic layer / rigid film layer / intermediate layer / adhesive layer is bonded to an 8-inch mirror wafer, and the wafer is ground to a thickness of 25 ⁇ m. It has been found that the wafer is hardly warped and can be transported without being damaged. This is considered to be because the intermediate layer relieves the tensile stress of the composite base material composed of the shrinkable film layer / elastic layer / rigid film layer.
- the present invention is a pressure-sensitive adhesive sheet in which a shrinkable film layer, an elastic layer, a rigid film layer, an intermediate layer, and a pressure-sensitive adhesive layer satisfying the following conditions are laminated in this order, and by applying a stimulus that causes shrinkage,
- a self-winding pressure-sensitive adhesive sheet that can be wound spontaneously from one end to one direction or from two opposite ends toward the center to form one or two cylindrical wound bodies.
- Elastic layer thickness is 15 to 150 ⁇ m
- shear modulus at 80 ° C. is 1 ⁇ 10 4 Pa to 5 ⁇ 10 6 Pa
- Intermediate layer shear modulus at 23 ° C.
- Adhesive layer The adhesive strength of the adhesive layer or the adhesive layer after the low-adhesion treatment (180 ° peel peeling, against silicon mirror wafer, pulling speed 300 mm / min) is 6.5 N / 10 mm or less.
- the shrinkable film layer is preferably composed of a heat shrinkable film having a heat shrinkage rate in the main shrinkage direction of 30 to 90% at a predetermined temperature in the range of 70 to 180 ° C.
- the shrinkage rate (%) means a value calculated from the formula [(dimension before shrinkage ⁇ dimension after shrinkage) / (dimension before shrinkage)] ⁇ 100. Unless otherwise noted, the contraction rate in the main contraction axis direction is shown.
- the product of the shear modulus and thickness of the elastic layer at 80 ° C. is preferably in the range of 1 to 1000 N / m.
- the product of Young's modulus and thickness of the rigid film layer at 80 ° C. is preferably 3.0 ⁇ 10 5 N / m or less.
- the ratio (r / L) to the length L in the direction is preferably in the range of 0.001 to 0.333.
- the lower limit value of r / L decreases as the length L in the sheet winding direction increases.
- the spontaneous winding adhesive sheet of the present invention even if the temporarily fixed adherend is ground to a thickness of 100 ⁇ m or less, it is possible to suppress the occurrence of warpage of the adherend.
- a stimulus such as heating that causes contraction, and is usually applied from the end (one end or two opposite ends) in the direction of the main contraction axis. While peeling from the body, it is wound spontaneously to form a cylindrical wound body, so that the adherend is not damaged, or the adherend is not contaminated by incomplete peeling. It can be easily removed. For this reason, it is particularly useful as an adhesive sheet for temporary fixing to be adhered to an adherend to be thinly ground.
- FIG. 1 It is a schematic sectional drawing which shows an example of the spontaneous winding adhesive sheet of this invention.
- (A) to (D) are views (perspective views) showing a state where the spontaneous winding adhesive sheet of the present invention is wound spontaneously.
- FIG. 1 shows an example of the processing method of the to-be-adhered body which uses the spontaneous winding adhesive sheet of this invention.
- the spontaneous winding pressure-sensitive adhesive sheet according to the present invention is a pressure-sensitive adhesive sheet in which a shrinkable film layer, an elastic layer as a constraining layer and a rigid film layer, an intermediate layer, and a pressure-sensitive adhesive layer are laminated in this order, and causes shrinkage. It is an adhesive sheet that can be wound spontaneously from one end to one direction or from two opposite ends toward the center by applying a stimulus to form one or two cylindrical wound bodies.
- FIG. 1 is a schematic sectional view showing an example of the spontaneous winding adhesive sheet of the present invention.
- a spontaneous winding adhesive sheet 1 shown in FIG. 1 includes a shrinkable film layer 11, an elastic layer 12 and a rigid film layer 13 as a constraining layer that restrains the shrinkage of the shrinkable film layer 11, and an intermediate layer 14.
- the pressure-sensitive adhesive layer 15 is laminated in order.
- the shrinkable film layer may be any film layer that has shrinkability in at least one axial direction, and may be any of a heat shrinkable film, a film that exhibits shrinkage by light, a film that shrinks by electrical stimulation, and the like. May be. Especially, it is preferable that it is comprised with the heat-shrinkable film from viewpoints, such as working efficiency.
- the shrinkable film layer may be shrinkable only in one axial direction, or has a primary shrinkage in a certain direction (uniaxial direction) and a direction different from the direction (for example, in this direction). It may have secondary contractility in the direction perpendicular to the surface.
- the shrinkable film layer may be a single layer or a multilayer composed of two or more layers.
- the shrinkage ratio in the main shrinkage direction of the shrinkable film constituting the shrinkable film layer is preferably 30 to 90%.
- the shrinkage rate in the main shrinkage direction of the heat-shrinkable film is at a predetermined temperature in the range of 70 to 180 ° C. (eg, 95 ° C., 140 ° C., etc.) Preferably, it is 30 to 90%.
- the shrinkage rate in the direction other than the main shrinkage direction of the shrinkable film constituting the shrinkable film layer is preferably 10% or less, more preferably 5% or less, and particularly preferably 3% or less.
- the heat shrinkability of the heat-shrinkable film can be imparted, for example, by subjecting the film extruded by an extruder to a stretching process.
- the heat-shrinkable film examples include one or two selected from polyesters such as polyethylene terephthalate, polyolefins such as polyethylene and polypropylene, polynorbornene, polyimide, polyamide, polyurethane, polystyrene, polyvinylidene chloride, and polyvinyl chloride.
- a uniaxially stretched film made of more than one kind of resin may be mentioned.
- a monoaxially stretched film made of a polyester resin, a polyolefin resin (including a cyclic polyolefin resin) such as polyethylene, polypropylene, polynorbornene, or a polyurethane resin is superior in terms of excellent workability of the adhesive. preferable.
- Such heat-shrinkable films include “Space Clean” by Toyobo, “Fancy Wrap” by Gunze, “Trephan” by Toray, “Lumiler” by Toray, and “Arton” by JSR. "Zeonor” manufactured by ZEON Corporation, “Suntec” manufactured by Asahi Kasei Corporation, and other commercial products can be used.
- the elastic layer and / or the pressure-sensitive adhesive layer of the spontaneous winding pressure-sensitive adhesive sheet is an elastic layer and / or a pressure-sensitive adhesive layer formed using an active energy ray-curable pressure-sensitive adhesive
- the elastic layer and In curing the pressure-sensitive adhesive layer when the active energy ray is irradiated through the shrinkable film layer, the shrinkable film layer can transmit a predetermined amount or more of the active energy ray (for example, a resin having transparency). It is necessary to consist of.
- the thickness of the shrinkable film layer is generally 5 to 300 ⁇ m, preferably 10 to 100 ⁇ m.
- the rigidity becomes high and spontaneous winding does not occur, and the shrinkable film layer and the constraining layer are separated from each other, and the laminate is easily broken.
- a film having a high rigidity has a large elastic deformation force caused by the stress remaining when the tape is bonded, and warpage tends to increase when the wafer is thinned.
- the surface of the shrinkable film layer is used to improve the adhesion and retention of adjacent layers. For this reason, conventional surface treatments such as chromic acid treatment, ozone exposure, flame exposure, high-voltage impact exposure, and ionizing radiation treatment are used. Or a physical treatment, a coating treatment with a primer (for example, an adhesive substance, etc.) may be applied.
- the constraining layer constrains the shrinkage of the shrinkable film layer and generates a reaction force, thereby generating a couple of forces as a whole of the laminated body and a driving force that causes winding. Further, this constraining layer suppresses secondary shrinkage in a direction different from the main shrinkage direction of the shrinkable film layer, and shrinkage of the shrinkable film layer, which is not necessarily uniform even though it is uniaxial shrinkage. It is thought that there is a function that the direction converges in one direction.
- the repulsive force against the shrinkage force of the shrinkable film layer in the constraining layer becomes a driving force, and the outer edge portion (one end of the pressure-sensitive adhesive sheet) Part or two opposite ends), the tube is wound spontaneously in one direction or the center direction (usually the main shrinkage axis direction of the heat-shrinkable film) from the end, with the shrinkable film layer side inward It is considered that a wound body is formed.
- this constraining layer can prevent the shear force generated by the shrink deformation of the shrinkable film layer from being transmitted to the pressure-sensitive adhesive layer or the adherend, so that the pressure-sensitive adhesive layer has a reduced pressure-sensitive adhesive force at the time of re-peeling. It is possible to prevent damage to the adherend (for example, the cured adhesive layer), damage to the adherend, contamination of the adherend with the damaged adhesive layer, and the like.
- the constraining layer expresses the function of constraining the contraction of the shrinkable film layer, it has elasticity and adhesiveness to the shrinkable film layer (including tackiness). Further, the constraining layer preferably has a certain degree of toughness or rigidity in order to form a cylindrical wound body smoothly.
- the constraining layer in the present invention is composed of an elastic layer and a rigid film layer.
- the elastic layer is preferably easily deformed under the temperature when the shrinkable film layer is contracted (the temperature when the spontaneously wound adhesive sheet is peeled), that is, in a rubber state.
- the elastic layer is preferably one whose fluidity is suppressed by three-dimensional crosslinking or the like.
- the elastic layer also has a uniform shrinkage by resisting the weak force component of the non-uniform shrinkage force of the shrinkable film layer and preventing the shrinkage deformation due to the weak force component depending on the thickness of the elastic layer. It has the effect of converting in the direction.
- the warpage caused by wafer grinding is thought to be caused by the stress when the adhesive sheet is bonded to the wafer, and the shrinkable film is elastically deformed by this residual stress, but the elastic layer relaxes this residual stress. It also works to reduce warpage.
- the shear modulus of the elastic layer in the present invention is 1 ⁇ 10 4 Pa to 5 ⁇ 10 6 Pa, preferably 0.05 ⁇ 10 6 Pa to 3 ⁇ 10 6 Pa at the peeling temperature (for example, 80 ° C.). is there. If the shear elastic modulus is too small, the effect of converting the shrinkage stress of the shrinkable film layer into the stress necessary for winding is poor, and conversely, if it is too large, the rigidity increases, resulting in poor winding properties. A material having high elasticity is poor in tackiness, making it difficult to produce a laminate, and has a poor function of relieving residual stress.
- the thickness of the elastic layer is 15 to 150 ⁇ m.
- contraction of a shrinkable film layer is hard to be obtained, and the effect of stress relaxation becomes small.
- it is too thick the spontaneous winding property is lowered, and the handling property and the economical property are inferior.
- the product of shear modulus (for example, value at 80 ° C.) and thickness (shear modulus ⁇ thickness) of the elastic layer is preferably 1 to 1000 N / m, more preferably 1 to 150 N / m, and still more preferably 1.2. ⁇ 100 N / m.
- the elastic layer is preferably made of a resin having adhesiveness and a glass transition temperature of, for example, 50 ° C. or lower, preferably room temperature (25 ° C.) or lower, more preferably 0 ° C. or lower.
- the adhesive strength of the elastic layer on the shrinkable film layer side is a value of 180 ° peel peel test (according to JIS Z 0237, tensile speed 300 mm / min, 50 ° C.), preferably in the range of 0.5 N / 10 mm or more. It is. When this adhesive force is too low, peeling tends to occur between the shrinkable film layer and the elastic layer.
- the elastic layer when the pressure-sensitive adhesive layer is an active energy ray-curable pressure-sensitive adhesive layer, it is formed of a material that easily transmits active energy rays, and the thickness can be appropriately selected from the viewpoints of manufacturing and workability. It is preferable that the film is easy to form and has excellent moldability.
- non-foaming material made of foam material (foamed film) such as urethane foam or acrylic foam whose surface (at least the surface on the shrinkable film layer side) has been subjected to adhesion treatment, rubber, thermoplastic elastomer, etc.
- Resin films including sheets
- the pressure-sensitive adhesive used for the pressure-sensitive adhesive treatment is not particularly limited.
- acrylic pressure-sensitive adhesive rubber pressure-sensitive adhesive, vinyl alkyl ether pressure-sensitive adhesive, silicone pressure-sensitive adhesive, polyester pressure-sensitive adhesive, polyamide pressure-sensitive adhesive, urethane type
- pressure-sensitive adhesives such as pressure-sensitive adhesives and styrene-diene block copolymer-based pressure-sensitive adhesives can be used singly or in combination.
- an acrylic pressure-sensitive adhesive is preferably used from the viewpoint of adjusting the adhesive strength.
- the resin of the adhesive used for the adhesion treatment and the resin of the foamed film or the non-foamed resin film are preferably the same type of resin in order to obtain high affinity.
- an acrylic adhesive is used for the adhesive treatment, an acrylic foam or the like is suitable as the resin film.
- the elastic layer may be formed of a resin composition having adhesiveness such as a cross-linked acrylic pressure-sensitive adhesive.
- a resin composition having adhesiveness such as a cross-linked acrylic pressure-sensitive adhesive.
- Such a layer (adhesive layer) formed with a cross-linked acrylic pressure-sensitive adhesive can be manufactured by a relatively simple method without the need for a separate pressure-sensitive treatment, and is excellent in productivity and economy. Preferably used.
- the cross-linked acrylic pressure-sensitive adhesive has a configuration in which a cross-linking agent is added to an acrylic pressure-sensitive adhesive having an acrylic polymer as a base polymer.
- the acrylic polymer include (meth) methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, and the like.
- a homo- or copolymer of (meth) acrylic acid alkyl ester such as acrylic acid C 1 -C 20 alkyl ester; the (meth) acrylic acid alkyl ester and other copolymerizable monomers [for example, acrylic acid, methacrylic acid, Carboxyl group or acid anhydride group-containing monomers such as itaconic acid, fumaric acid and maleic anhydride; hydroxyl group-containing monomers such as 2-hydroxyethyl (meth) acrylate; amino group-containing monomers such as morpholyl (meth) acrylate; Amide group-containing monomers such as (meth) acrylamide; (meth) acrylonitrile Like copolymer of (meth) having an alicyclic hydrocarbon group such as isobornyl acrylate (meth) acrylic acid esters]; cyano group-containing monomers such as.
- Acrylic polymers include, in particular, one or more (meth) acrylic acid C 1 -C 12 alkyl esters such as ethyl acrylate, butyl acrylate, 2-ethylhexyl acrylate, and hydroxyl groups such as 2-hydroxyethyl acrylate.
- the acrylic polymer is prepared, for example, as a high-viscosity liquid prepolymer by polymerizing the above-exemplified monomer components (and polymerization initiators) without solvent (such as ultraviolet rays).
- a crosslinked acrylic pressure-sensitive adhesive composition can be obtained by adding a crosslinking agent to the prepolymer.
- a crosslinked acrylic pressure-sensitive adhesive composition can also be obtained.
- the crosslinking agent is not particularly limited.
- an isocyanate crosslinking agent a melamine crosslinking agent, an epoxy crosslinking agent, an acrylate crosslinking agent (polyfunctional acrylate), a (meth) acrylic acid ester having an isocyanate group, or the like is used. it can.
- the acrylate-based crosslinking agent include hexanediol diacrylate, 1,4-butanediol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, and the like.
- Examples of the (meth) acrylic acid ester having an isocyanate group include 2-isocyanatoethyl acrylate and 2-isocyanatoethyl methacrylate.
- a crosslinking agent ultraviolet (UV) reactive crosslinking agents, such as an acrylate type crosslinking agent (polyfunctional acrylate) and (meth) acrylic acid ester which has an isocyanate group, are preferable.
- the addition amount of the crosslinking agent is usually about 0.01 to 15 parts by mass, preferably about 0.05 to 12 parts by mass with respect to 100 parts by mass of the base polymer.
- the crosslinked acrylic pressure-sensitive adhesive is a crosslinking accelerator, a tackifier (for example, rosin derivative resin, polyterpene resin, petroleum resin, oil-soluble phenol resin, etc.), thickener, plasticizer
- a tackifier for example, rosin derivative resin, polyterpene resin, petroleum resin, oil-soluble phenol resin, etc.
- thickener for example, rosin derivative resin, polyterpene resin, petroleum resin, oil-soluble phenol resin, etc.
- plasticizer plasticizer
- an appropriate additive such as a filler, an anti-aging agent and an antioxidant may be contained.
- the cross-linked acrylic pressure-sensitive adhesive layer as the elastic layer has a desired thickness and area by, for example, a known method such as a cast method using a cross-linked acrylic pressure-sensitive adhesive composition obtained by adding a cross-linking agent to the prepolymer.
- An elastic layer suitable for the purpose can be easily obtained by forming a film and irradiating light again to advance the crosslinking reaction (and polymerization of the unreacted monomer). Since the elastic layer (crosslinked acrylic pressure-sensitive adhesive layer) obtained in this way has self-adhesiveness, it can be used as it is bonded between the shrinkable film layer and the rigid film layer.
- the cross-linked acrylic pressure-sensitive adhesive layer as the elastic layer is coated on the surface of the rigid film layer with the cross-linked acrylic pressure-sensitive adhesive composition in which the acrylic polymer and the cross-linking agent are dissolved in a solvent. It can also be obtained by irradiating light after the shrinkable film layer is bonded to the top.
- the pressure-sensitive adhesive layer is an active energy ray-curable pressure-sensitive adhesive layer
- the cross-linked acrylic pressure-sensitive adhesive is removed by active energy ray irradiation (light irradiation) when curing the pressure-sensitive adhesive layer during re-peeling. It may be cured (crosslinked).
- beads such as glass beads and resin beads may be added to the constituent components of the elastic layer in the present invention. Addition of glass beads or resin beads to the elastic layer is advantageous in that the adhesive properties and shear modulus can be easily controlled.
- the average particle size of the beads is, for example, about 1 to 100 ⁇ m, preferably about 1 to 20 ⁇ m.
- the amount of beads added is, for example, 0.1 to 10 parts by mass, preferably 1 to 4 parts by mass with respect to 100 parts by mass as a whole of the elastic layer. If the addition amount is too large, the adhesive properties may be deteriorated. If the addition amount is too small, the above-mentioned effect tends to be insufficient.
- the rigid film layer has a function of generating a reaction force with respect to the shrinkage force of the shrinkable film layer by giving rigidity or toughness to the constraining layer, and thus generating a couple necessary for winding.
- the rigid film constituting the rigid film layer examples include polyesters such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate; polyolefins such as polyethylene and polypropylene; polyimides; polyamides; polyurethanes; styrenic resins such as polystyrenes; A film made of one or more resins selected from polyvinyl chloride and the like.
- a polyester resin film, a polypropylene film, a polyamide film, and the like are preferable from the viewpoint of excellent coating workability of the pressure-sensitive adhesive.
- the rigid film layer may be a single layer or a multilayer in which two or more layers are laminated.
- the rigid film constituting the rigid film layer is non-shrinkable, and the shrinkage rate is, for example, 5% or less, preferably 3% or less, more preferably 1% or less.
- the thickness of the rigid film layer is, for example, about 20 to 150 ⁇ m, preferably 25 to 95 ⁇ m, more preferably 30 to 90 ⁇ m, and particularly preferably about 30 to 80 ⁇ m. If the thickness is too thin, it is difficult to obtain a wound cylindrical wound body having a well-formed shape, and if it is too thick, the self-winding property is lowered, and the handling property and the economical efficiency are inferior.
- the product of Young's modulus and thickness (Young's modulus ⁇ thickness) of the rigid film layer is preferably 3.0 ⁇ 10 5 N / m or less (eg, 1.0 ⁇ 10 10) at the peeling temperature (eg, 80 ° C.). 2 to 3.0 ⁇ 10 5 N / m), more preferably 2.8 ⁇ 10 5 N / m or less (for example, 1.0 ⁇ 10 3 to 2.8 ⁇ 10 5 N / m). If the product of Young's modulus and thickness of the rigid film layer is too small, the effect of converting the shrinkage stress of the shrinkable film layer into a winding stress is poor, and the directional convergence action tends to decrease. Winding is easily suppressed.
- the Young's modulus of the rigid film layer is preferably 3 ⁇ 10 6 to 2 ⁇ 10 10 N / m 2 , more preferably 1 ⁇ 10 8 to 1 ⁇ 10 10 N / m 2 at the peeling temperature (for example, 80 ° C.). It is. If the Young's modulus is too small, it is difficult to obtain a cylindrical wound body with a well-formed shape. Conversely, if the Young's modulus is too large, spontaneous winding is difficult to occur.
- the rigid film layer is formed of a material that easily transmits active energy rays when the adhesive layer is an active energy ray-curable adhesive layer, and the thickness can be appropriately selected from the viewpoint of manufacturing and workability. It is preferable that it is excellent in moldability that can be easily formed into a film shape.
- the trade names “Lumirror” manufactured by Toray Industries, Inc.
- “Trephan” manufactured by Toray Industries, Inc.
- “Teonex” manufactured by Teijin Ltd.
- Kapton Toray Industries, Inc.
- -Commercial products such as DuPont Co., Ltd.
- the pressure-sensitive adhesive layer in the present invention exhibits sufficient adhesive force to hold and temporarily fix the wafer when performing processing such as grinding on the wafer, and after the processing is completed, without damaging the wafer, Further, it is preferable that the adhesive layer can be peeled off spontaneously without any adhesive residue.
- the adhesive strength of the adhesive layer at the time of peeling is, for example, normal temperature It is characterized by being 6.5 N / 10 mm or less, particularly 6.0 N / 10 mm or less at (25 ° C.).
- an adhesive layer having a low adhesive force can be originally used for the adhesive layer, the adhesive layer has adhesiveness that can be reliably adhered to an adherend, and after a predetermined role is finished, some method is used.
- a re-peelable pressure-sensitive adhesive layer capable of reducing or eliminating the pressure-sensitive adhesiveness by (low-tackifying treatment) is preferable.
- Such a removable pressure-sensitive adhesive layer can be configured in the same manner as the pressure-sensitive adhesive layer of a known removable pressure-sensitive adhesive sheet.
- an active energy ray-curable pressure-sensitive adhesive layer is particularly preferable.
- the active energy ray-curable pressure-sensitive adhesive layer has an adhesive property at an early stage, and forms a three-dimensional network structure by irradiation with active energy rays such as infrared rays, visible rays, ultraviolet rays, X-rays, and electron beams.
- An elastic material can be used, and an active energy ray-curable adhesive or the like can be used as such a material.
- the active energy ray-curable pressure-sensitive adhesive contains a compound obtained by chemically modifying an active energy ray reactive functional group for imparting active energy ray curability, or an active energy ray curable compound (or active energy ray curable resin). To do.
- the active energy ray-curable pressure-sensitive adhesive contains a base material chemically modified with an active energy ray-reactive functional group or an active energy ray-curable compound (or active energy ray-curable resin) in the base material. Those composed of the prepared composition are preferably used.
- a conventionally known pressure-sensitive adhesive such as a pressure-sensitive adhesive (pressure-sensitive adhesive) can be used.
- a pressure-sensitive adhesive pressure-sensitive adhesive
- rubber polymers such as natural rubber, polyisobutylene rubber, styrene / butadiene rubber, styrene / isoprene / styrene block copolymer rubber, recycled rubber, butyl rubber, polyisobutylene rubber, and NBR were used as the base polymer.
- Examples include rubber adhesives; silicone adhesives; acrylic adhesives, and the like. Among these, an acrylic pressure-sensitive adhesive is preferable.
- the base material may be composed of one kind or two or more kinds of ingredients.
- acrylic pressure-sensitive adhesive examples include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, t-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (meth) (Meth) acrylic acid alkyl esters such as octyl acrylate C 1 -C 20 alkyl ester homopolymers or copolymers; alkyl (meth) acrylates and other copolymerizable monomers [for example Carboxyl group or acid anhydride group-containing monomers such as acrylic acid, methacrylic acid, itaconic acid, fumaric acid, maleic anhydride; hydroxyl group-containing monomers such as 2-hydroxyethyl (meth) acrylate; morpholyl (meth) acrylate Amino group-containing monomers such as; amide group-containing monomers such as (meth) acrylamide ] Acrylic pressure-
- Active energy ray-reactive functional groups used for chemical modification for curing active energy ray-curable adhesives and active energy ray-curable compounds include infrared rays, visible rays, ultraviolet rays, X-rays, electron beams, etc. Although it will not specifically limit if it can be hardened
- Examples of the active energy ray-reactive functional group used for chemical modification include functional groups having a carbon-carbon multiple bond such as acryloyl group, methacryloyl group, vinyl group, allyl group, and acetylene group. These functional groups can form radicals by cleavage of carbon-carbon multiple bonds upon irradiation with active energy rays, and these radicals can form a cross-linking point to form a three-dimensional network structure.
- the (meth) acryloyl group can exhibit relatively high reactivity to active energy rays, and can be selected from a wide variety of acrylic adhesives and used in combination. From the viewpoint of sex.
- a monomer containing a reactive functional group such as a hydroxyl group or a carboxyl group for example, 2-hydroxy (meth) acrylate
- the ratio of the monomer containing a reactive functional group in the reactive functional group-containing acrylic polymer is, for example, 5 to 40% by mass, preferably 10 to 30% by mass, based on the total monomers.
- the amount of the compound having a reactive functional group reactive group and an active energy ray reactive functional group in the molecule when reacting with the reactive functional group-containing acrylic polymer is the reactive functional group-containing acrylic type.
- the amount is, for example, 50 to 100 mol%, preferably 60 to 95 mol%, based on the reactive functional group (hydroxyl group, carboxyl group, etc.) in the polymer.
- Examples of the active energy ray-curable compound include trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4 -Compounds having two or more carbon-carbon double bonds such as poly (meth) acryloyl group-containing compounds such as butanediol diacrylate, 1,6-hexanediol diacrylate, and polyethylene glycol diacrylate. These compounds may be used alone or in combination of two or more.
- a poly (meth) acryloyl group-containing compound is preferable, and is exemplified in, for example, Japanese Patent Application Laid-Open No. 2003-292916.
- the poly (meth) acryloyl group-containing compound may be referred to as an “acrylate cross-linking agent”.
- an organic salt such as an onium salt and a compound having a plurality of heterocyclic rings in the molecule
- an organic salt is cleaved by irradiation with active energy rays to generate ions, which can be a starting species to cause a ring-opening reaction of a heterocyclic ring to form a three-dimensional network structure.
- organic salts examples include iodonium salts, phosphonium salts, antimonium salts, sulfonium salts, borate salts, and the like
- heterocycles in the compound having a plurality of heterocycles in the molecule include oxirane, oxetane, and oxolane. , Thiirane, aziridine and the like. Specifically, compounds described in the Technical Information Association, photocuring technology (2000), and the like can be used.
- the active energy ray-curable resin examples include ester (meth) acrylate, urethane (meth) acrylate, epoxy (meth) acrylate, melamine (meth) acrylate, and acrylic resin (meth) having a (meth) acryloyl group at the molecular end.
- Photosensitive reactive group-containing polymers such as acrylates, thiol-ene addition type resins having an allyl group at the molecular end, photocationic polymerization type resins, cinnamoyl group-containing polymers such as polyvinyl cinnamate, diazotized amino novolak resins and acrylamide type polymers Or an oligomer etc. are mentioned.
- examples of the polymer that reacts with a high active energy ray include epoxidized polybutadiene, unsaturated polyester, polyglycidyl methacrylate, polyacrylamide, and polyvinylsiloxane.
- the said base material is not necessarily required.
- the acrylic polymer or an acrylic polymer chemically modified with an active energy ray-reactive functional group (acrylic having an active energy ray-reactive functional group introduced in the side chain) is used.
- a combination of an active energy ray-curable compound (such as a compound having two or more carbon-carbon double bonds) and the like.
- the combination is preferable from the viewpoint of reactivity and workability because it includes an acrylate group that exhibits relatively high reactivity with active energy rays and can be selected from various acrylic adhesives.
- Specific examples of such a combination include a combination of an acrylic polymer having an acrylate group introduced into the side chain and a compound having two or more functional groups having carbon-carbon double bonds (particularly acrylate groups). Can be mentioned.
- those disclosed in Japanese Patent Application Laid-Open No. 2003-292916 can be used.
- Examples of a method for preparing an acrylic polymer having an acrylate group introduced into the side chain include, for example, an isocyanate compound such as acryloyloxyethyl isocyanate or methacryloyloxyethyl isocyanate on an acrylic polymer containing a hydroxyl group in the side chain.
- an isocyanate compound such as acryloyloxyethyl isocyanate or methacryloyloxyethyl isocyanate on an acrylic polymer containing a hydroxyl group in the side chain.
- a method of bonding via a urethane bond, or the like can be used.
- the compounding amount of the active energy ray-curable compound is, for example, 100 parts by mass of the base material (for example, the acrylic polymer or the acrylic polymer chemically modified with the active energy ray-reactive functional group).
- the range is about 0.5 to 200 parts by mass, preferably 5 to 180 parts by mass, and more preferably about 20 to 130 parts by mass.
- the active energy ray-curable pressure-sensitive adhesive is blended with an active energy ray polymerization initiator for curing a compound imparting active energy ray curability for the purpose of improving the reaction rate for forming a three-dimensional network structure. Also good.
- the active energy ray polymerization initiator a known or commonly used polymerization initiator can be appropriately selected according to the type of active energy ray to be used (for example, infrared ray, visible ray, ultraviolet ray, X-ray, electron beam, etc.). From the viewpoint of work efficiency, a compound capable of initiating photopolymerization with ultraviolet rays is preferred.
- Typical active energy ray polymerization initiators include ketone initiators such as benzophenone, acetophenone, quinone, naphthoquinone, anthraquinone, fluorenone; azo initiators such as azobisisobutyronitrile; benzoyl peroxide, perbenzoic acid Examples thereof include, but are not limited to, peroxide-based initiators. Examples of commercially available products include trade names “Irgacure 184”, “Irgacure 651”, and “Irgacure 2959” manufactured by Ciba Japan.
- Active energy ray polymerization initiators can be used alone or in admixture of two or more.
- the compounding amount of the active energy ray polymerization initiator is usually about 0.01 to 10 parts by mass, preferably about 1 to 8 parts by mass with respect to 100 parts by mass of the base material.
- the active energy ray-curable pressure-sensitive adhesive has a crosslinking agent, a curing (crosslinking) accelerator, a tackifier, a vulcanizing agent, and a thickening agent in order to obtain appropriate tackiness before and after the active energy ray curing.
- a crosslinking agent such as an agent, appropriate additives such as an anti-aging agent and an antioxidant are blended as necessary.
- active energy ray-curable pressure-sensitive adhesive for example, a composition in which an active energy ray-curable compound is blended in a base material (pressure-sensitive adhesive), preferably UV curing in which a UV-curable compound is blended in an acrylic pressure-sensitive adhesive.
- a mold adhesive is used.
- UV curing including a side chain acrylate-containing acrylic pressure-sensitive adhesive, an acrylate-based crosslinking agent (poly (meth) acryloyl group-containing compound; polyfunctional acrylate), and an ultraviolet polymerization initiator A mold adhesive is used.
- the side chain acrylate-containing acrylic pressure-sensitive adhesive means an acrylic polymer having an acrylate group introduced in the side chain, and the same ones as described above can be prepared and used in the same manner.
- the acrylate-based crosslinking agent is a low molecular compound exemplified above as a poly (meth) acryloyl group-containing compound.
- As the ultraviolet polymerization initiator those exemplified above as typical active energy ray polymerization initiators can be used.
- an inactive energy ray-curable pressure-sensitive adhesive using the acrylic pressure-sensitive adhesive as a base material can be used as the pressure-sensitive adhesive layer.
- one having an adhesive strength smaller than the peeling stress when generating the cylindrical wound body can be adapted.
- a 180 ° peel test using a silicon mirror wafer as an adherend (room temperature) (At 25 ° C.) of 6.5 N / 10 mm or less for example, 0.05 to 6.5 N / 10 mm, preferably 0.2 to 6.5 N / 10 mm, particularly 6.0 N / 10 mm or less (for example, 0 0.05 to 6.0 N / 10 mm, preferably 0.2 to 6.0 N / 10 mm).
- (meth) acrylic acid alkyl ester for example, methyl (meth) acrylate, ethyl (meth) acrylate, (Meth) acrylic acid C 1 -C 20 alkyl ester such as butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, octyl (meth) acrylate, etc.
- a monomer having a reactive functional group for example, acrylic Carboxyl group or acid anhydride group-containing monomers such as acid, methacrylic acid, itaconic acid, fumaric acid, maleic anhydride; hydroxyl group-containing monomers such as 2-hydroxyethyl (meth) acrylate; morpholyl (meth) acrylate, etc.
- Amino group-containing monomer amide group-containing monomer such as (meth) acrylamide] and the like
- a copolymer with other copolymerizable monomer for example, (meth) acrylic acid ester having a cycloaliphatic hydrocarbon group such as isobornyl (meth) acrylate, acrylonitrile, etc.
- An acrylic pressure-sensitive adhesive that is crosslinked by adding a crosslinking agent capable of reacting with a group [for example, an isocyanate-based crosslinking agent, a melamine-based crosslinking agent, an epoxy-based crosslinking agent, or the like] is preferably used.
- the pressure-sensitive adhesive layer may be formed by, for example, applying a coating liquid prepared by adding a pressure-sensitive adhesive, an active energy ray-curable compound, and a solvent as necessary to the surface of the intermediate layer, on an appropriate release liner (separator).
- the pressure-sensitive adhesive layer can be formed by applying the coating solution, and then transferred (transferred) onto the intermediate layer. In the case of transfer, voids (voids) may remain at the interface with the intermediate layer. In this case, a heating and pressurizing process can be performed by an autoclave process or the like, and the voids can be diffused and eliminated.
- the pressure-sensitive adhesive layer may be either a single layer or multiple layers.
- beads such as glass beads and resin beads may be added to the constituent components of the pressure-sensitive adhesive layer.
- the average particle size of the beads is, for example, about 1 to 100 ⁇ m, preferably about 1 to 20 ⁇ m.
- the added amount of the beads is, for example, 25 to 200 parts by mass, preferably 50 to 100 parts by mass with respect to 100 parts by mass of the entire pressure-sensitive adhesive layer. If the amount is too large, poor dispersion may occur and it may be difficult to apply the pressure-sensitive adhesive. If the amount is too small, the above effect tends to be insufficient.
- the thickness of the pressure-sensitive adhesive layer is generally 10 to 200 ⁇ m, preferably 20 to 100 ⁇ m, and more preferably 30 to 60 ⁇ m. If the thickness is too thin, the adhesive force is insufficient, so that it is difficult to hold and temporarily fix the adherend, and if it is too thick, it is uneconomical and tends to be inferior in handleability.
- the intermediate layer in the invention is located between the rigid film layer and the pressure-sensitive adhesive layer, and relieves the tensile stress of the composite base material composed of the shrinkable film layer / elastic layer / rigid film layer, and grinds the wafer extremely thinly. It is a layer having a function of suppressing the warpage of the wafer that occurs during the process, and exhibits a low elasticity as compared with the rigid film layer.
- the shear modulus of the intermediate layer at 23 ° C. is about 1 ⁇ 10 4 Pa to 4 ⁇ 10 7 Pa, preferably 1 ⁇ 10 5 in terms of ease of sticking the adhesive sheet and workability such as tape cutting. It is about Pa to 2 ⁇ 10 7 Pa. If the shear modulus at 23 ° C. is less than 1 ⁇ 10 4 Pa, the intermediate layer may protrude from the outer periphery of the wafer due to the wafer grinding pressure, and the wafer may be damaged. Moreover, when the shear modulus at 23 ° C. exceeds 4 ⁇ 10 7 Pa, the function of suppressing warpage tends to be reduced.
- the thickness of the intermediate layer is preferably 10 ⁇ m or more, more preferably 30 ⁇ m or more, and particularly preferably 50 ⁇ m or more. If the thickness of the intermediate layer is less than 10 ⁇ m, it tends to be difficult to effectively suppress wafer warpage due to grinding. In order to maintain grinding accuracy, the thickness of the intermediate layer is preferably less than 150 ⁇ m.
- the intermediate layer preferably has not only a function of relieving the tensile stress, but also has a function of a cushion that absorbs irregularities on the wafer surface during grinding, and the sum of the thickness of the intermediate layer and the pressure-sensitive adhesive layer Is preferably 30 ⁇ m or more, and more preferably 50 to 300 ⁇ m.
- the sum of the thickness of the intermediate layer and the pressure-sensitive adhesive layer is less than 30 ⁇ m, the adhesive strength to the wafer tends to be insufficient, and the unevenness on the wafer surface cannot be absorbed during bonding. There is a tendency that the wafer edge is easily damaged or chipped.
- the sum of the thickness of the intermediate layer and the pressure-sensitive adhesive layer exceeds 300 ⁇ m, the thickness accuracy is lowered, the wafer is easily damaged during grinding, and the spontaneous winding property tends to be reduced. .
- the product of the shear modulus and thickness (shear modulus ⁇ thickness) of the intermediate layer is preferably 15000 N / m or less (eg, 0.1 to 15000 N / m), preferably 3000 N / m or less at 23 ° C., for example ( For example, 3 to 3000 N / m), particularly preferably about 1000 N / m or less (for example, 20 to 1000 N / m). If the product of the shear modulus and thickness of the intermediate layer is too large, it will be difficult to relieve the tensile stress of the composite base material composed of the shrinkable film layer / elastic layer / rigid film layer, and suppress warpage of the wafer due to grinding.
- the wafer Since the unevenness on the wafer surface cannot be absorbed during bonding due to rigidity, the wafer tends to be damaged during grinding or the wafer edge tends to be chipped. If the product of the shear modulus and thickness of the intermediate layer is too small, the intermediate layer protrudes out of the wafer, and edge breakage or breakage tends to occur. Furthermore, the effect
- the material for forming the intermediate layer is not particularly limited.
- the pressure-sensitive adhesive mentioned in the pressure-sensitive adhesive layer polyethylene (PE) generally referred to as a resin film, and an ethylene-vinyl alcohol copolymer are used.
- Various soft resins such as (EVA) and ethylene-ethyl acrylate copolymer (EEA), mixed resins of acrylic resins and urethane polymers, graft polymers of acrylic resins and natural rubber, and the like can be used.
- acrylic monomer that forms the acrylic resin examples include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, t-butyl (meth) acrylate, and (meth) acrylic acid.
- (Meth) acrylic acid alkyl esters such as 2-ethylhexyl and (meth) acrylic acid C 1 -C 20 alkyl esters such as octyl (meth) acrylic acid can be copolymerized alone or with the (meth) acrylic acid alkyl ester And other monomers [for example, monomers containing carboxyl groups or acid anhydride groups such as acrylic acid, methacrylic acid, itaconic acid, fumaric acid, maleic anhydride, etc.].
- a mixed resin of acrylic resin and urethane polymer or a graft polymer of acrylic resin and natural rubber is used in terms of adhesion to the rigid film layer.
- a mixed resin of an acrylic resin and a urethane polymer is preferable.
- the urethane polymer can be produced by a well-known and commonly used method.
- An undercoat layer may be appropriately provided between the intermediate layer and the rigid film layer for the purpose of improving the adhesion between the intermediate layer and the rigid film layer.
- the surface of the intermediate layer may be subjected to mat treatment, corona discharge treatment, primer treatment, and crosslinking treatment (for example, using silane) as necessary.
- Conventional physical or chemical treatment such as chemical cross-linking treatment) can be applied.
- the intermediate layer can be formed by a well-known and conventional method depending on the material form. For example, in the case of exhibiting a solution state, the intermediate layer is applied on the surface of the rigid film layer, on an appropriate release liner (separator). It can be formed by applying a solution to form an intermediate layer and transferring (transferring) it onto the rigid film layer.
- a soft resin or mixed resin as the intermediate layer, a method of extruding and laminating the resin on the rigid film layer, a dry laminate of a resin previously formed into a film, or an adhesive property
- a method of bonding via an undercoat agent can be used.
- the self-winding pressure-sensitive adhesive sheet of the present invention comprises a shrinkable film layer, an elastic layer, a rigid film layer, an intermediate layer, and a pressure-sensitive adhesive layer, laminated means such as a hand roller and a laminator, and atmospheric pressure compression means such as an autoclave. Can be manufactured by appropriately and selectively using them according to the purpose.
- a separator (release liner) may be provided on the pressure-sensitive adhesive layer surface from the viewpoint of protecting the pressure-sensitive adhesive layer surface and preventing blocking.
- the separator is peeled off when the spontaneously peelable pressure-sensitive adhesive sheet is attached to the adherend.
- the separator to be used is not particularly limited, and a known and commonly used release paper or the like can be used.
- a substrate having a release layer such as a plastic film or paper surface-treated with a release agent such as silicone, long-chain alkyl, fluorine, or molybdenum sulfide; polytetrafluoroethylene, polychlorotrifluoroethylene, polyfluoride Low-adhesive substrate made of a fluoropolymer such as vinyl fluoride, polyvinylidene fluoride, tetrafluoroethylene / hexafluoropropylene copolymer, chlorofluoroethylene / vinylidene fluoride copolymer; olefin resin (eg, polyethylene, polypropylene) Etc.) and the like can be used.
- a release layer such as a plastic film or paper surface-treated with a release agent such as silicone, long-chain alkyl, fluorine, or molybdenum sulfide
- a release agent such as silicone, long-chain alkyl, fluorine, or mo
- the spontaneous winding adhesive sheet of the present invention can be used as, for example, a protective adhesive sheet for semiconductors, a fixing adhesive sheet for semiconductor wafers, and more specifically, for example, an adhesive sheet for silicon semiconductor back grinding, a compound It can be used as an adhesive sheet for semiconductor back grinding, an adhesive sheet for silicon semiconductor dicing, an adhesive sheet for compound semiconductor dicing, an adhesive sheet for semiconductor package dicing, an adhesive sheet for glass dicing, an adhesive sheet for ceramic dicing, and the like.
- it is useful as an adhesive sheet for semiconductors such as an adhesive sheet for protecting a semiconductor and an adhesive sheet for fixing a semiconductor wafer.
- the self-winding pressure-sensitive adhesive sheet of the present invention is attached to an adherend and temporarily fixed, and after the required processing is performed on the adherend (workpiece), the pressure-sensitive adhesive layer of the self-winding pressure-sensitive adhesive sheet
- the adhesive force is reduced and a stimulus such as heat causing shrinkage of the shrinkable film layer is applied, and the one end of the spontaneously wound adhesive sheet is oriented in one direction (usually the main shrinkage axis direction) or 2 From the end to the center (usually in the direction of the main contraction axis), it is spontaneously wound to form a 1 or 2 cylindrical wound body and peel from the adherend to obtain a processed product.
- one cylindrical wound body is formed (one-way winding peeling), and the opposite of the spontaneously wound adhesive sheet.
- two cylindrical wound bodies arranged in parallel are formed (two-way winding peeling).
- a typical example of a workpiece is a semiconductor wafer.
- Types of processing include, for example, grinding, cutting, polishing, etching, lathe processing, heating (however, when the shrinkable film layer is a heat-shrinkable film layer, it is limited to a temperature not higher than the heat shrinkage start temperature) Is not particularly limited as long as it is a process that can be performed using the pressure-sensitive adhesive sheet.
- the pressure-sensitive adhesive layer and / or elastic layer is formed of an active energy ray-curable pressure-sensitive adhesive
- the active energy ray is irradiated to the pressure-sensitive adhesive layer and / or elastic layer.
- the pressure-sensitive adhesive layer is cured and loses the adhesive force to the adherend, and the elastic layer is cured to facilitate the transfer of the shrinkage stress of the shrinkable film to the rigid film layer.
- the spontaneous winding property of the adhesive sheet can be further improved.
- the shrinkable film layer is a heat-shrinkable film layer
- the heat-shrinkable film layer is heated by a required heating means
- the shrinkable film layer tends to shrink and deform, so that the outer edge of the pressure-sensitive adhesive sheet rises.
- the adhesive sheet is wound around its outer edge (or two opposite outer edges), and self-runs in one direction (or two directions opposite to each other (center direction)) (or two).
- the cylindrical winding body is formed.
- the shrinking direction of the pressure-sensitive adhesive sheet is adjusted by the constraining layer composed of the elastic layer and the rigid film layer, a cylindrical wound body is quickly formed while winding in a uniaxial direction.
- the heating temperature can be appropriately selected according to the shrinkability of the heat-shrinkable film layer, and is, for example, 70 to 180 ° C., preferably 70 to 140 ° C.
- the irradiation with active energy rays and the heat treatment may be performed simultaneously or in stages. In addition to heating the entire surface of the adherend evenly, the entire surface may be heated in stages, or may be partially heated just to create a peeling trigger. Should be selected as appropriate.
- FIG. 2 is a view (perspective view) showing a state in which the spontaneous winding adhesive sheet of the present invention is spontaneously wound, and (A) is a spontaneous winding property before applying a stimulus that causes shrinkage of the shrinkable film.
- the figure which shows an adhesive sheet (B) is a sheet
- (C) is one cylindrical shape after the winding of a sheet
- (D) is when two cylindrical wound bodies are formed by voluntarily winding from the two opposite ends of the sheet toward the center (usually in the main contraction axis direction of the shrinkable film). It is a figure which shows the state (two-way winding). Whether the spontaneous winding adhesive sheet causes one-way winding or two-way winding depends on the adhesive force of the constraining layer to the shrinkable film layer, the shear modulus of the constraining layer (especially the elastic layer), etc. It depends on.
- symbol L shows the length (it is a diameter, when a sheet
- the symbol r is the diameter of the formed cylindrical wound body (when the diameter of the cylindrical wound body is not constant in the length direction of the wound body as in the case where the sheet is circular or the like) (Diameter) is shown (FIGS. 2C and 2D).
- the value of r / L is preferably in the range of 0.001 to 0.333, more preferably in the range of 0.01 to 0.2.
- the length of L is, for example, 10 to 2000 mm, preferably 300 to 1000 mm.
- the length of the pressure-sensitive adhesive sheet in the direction perpendicular to L is, for example, about 10 to 2000 mm, preferably about 300 to 1000 mm.
- the value of r / L is the shear modulus of the elastic layer constituting the constraining layer, such as the type, composition and thickness of each layer of the shrinkable film layer, constraining layer (elastic layer and rigid film layer), and pressure-sensitive adhesive layer.
- the thickness and the Young's modulus and thickness of the rigid film layer can be adjusted to the above ranges.
- the shape of the self-winding pressure-sensitive adhesive sheet is a quadrangle, but is not limited thereto, and can be appropriately selected according to the purpose, and may be any of a circular shape, an elliptical shape, a polygonal shape, and the like.
- FIG. 3 is a schematic view (side view) showing an example of a method for processing an adherend using the spontaneous winding adhesive sheet of the present invention, and includes the following steps. That is, 1. A self-peeling adhesive tape (self-winding adhesive sheet) 1 is bonded to a semiconductor wafer 2. 2. The semiconductor wafer 2 to which the self-peeling adhesive tape 1 is bonded is subjected to a desired process (grinding or the like). 3. A heat treatment or the like is applied to spontaneously wind the self-peeling adhesive tape to form a cylindrical wound body, which is peeled from the semiconductor wafer 2.
- the adherend When the spontaneous winding adhesive sheet of the present invention is used for processing an adherend (workpiece), the adherend is warped even if the adherend is ground thinly to 100 ⁇ m or less. And the adherend can be prevented from being damaged during grinding or conveyance. Further, after completion of the adherend processing, the substrate is energized by applying a stimulus such as heating that causes contraction, and the adherend is normally directed from the end (one end or two opposite ends) in the direction of the main contraction axis. Since the cylindrical wound body is formed by voluntarily winding while peeling from the substrate, damage to the adherend due to stress at the time of peeling can be avoided, and the pressure-sensitive adhesive sheet can be easily applied without being damaged or contaminated. It can be peeled from the body.
- a stimulus such as heating that causes contraction
- the shear modulus of the elastic layer and the rigid film layer and the adhesive force of the elastic layer to the shrinkable film were measured as follows.
- the Young's modulus of the rigid film layer was measured by the following method according to JIS K7127.
- An autograph with a heated hood (trade name “AG-1kNG”, manufactured by Shimadzu Corporation) was used as a tensile tester.
- a rigid film cut into a length of 200 mm and a width of 10 mm was attached at a chuck distance of 100 mm.
- the load was obtained at two points where the strain was 0.2% and 0.45%, and Young's modulus was obtained. This measurement was repeated 5 times for the same sample, and the average value was adopted.
- the tension jig was pulled in the 180 ° direction at a pulling speed of 300 mm / min, and the force (N / 10 mm) when peeling occurred between the shrinkable film layer and the elastic layer was measured.
- a 4-inch mirror silicon wafer manufactured by Shin-Etsu Semiconductor Co., Ltd.
- UV exposure was performed at 500 mJ / cm 2 before measurement.
- the adhesive strength against the trade name “CZ-N”) was measured.
- a non-energy curable pressure-sensitive adhesive was prepared by mixing 2 parts by mass of a mass part and a crosslinking agent (trade name “Coronate L”, manufactured by Nippon Polyurethane Industry Co., Ltd.).
- Adhesive layer / separator laminate 1 in which a non-energy ray curable adhesive layer having a thickness of 30 ⁇ m is provided on the separator [Adhesive strength (180 ° peel peeling, against silicon mirror wafer, pulling speed 300 mm / min): 0.6 N / 10 mm].
- Adhesive layer / separator laminate 2 in which an active energy ray-curable adhesive layer having a thickness of 30 ⁇ m is provided on the separator [Adhesive strength (180 ° peel peeling, against silicon mirror wafer, pulling speed 300 mm / min): 0.01 N / 10 mm or less (after UV irradiation)].
- Example 1 Polyethylene terephthalate film (trade name “Lumirror S-10”, manufactured by Toray Industries, Inc., thickness: 38 ⁇ m, so that the urethane polymer / acrylic monomer mixture obtained in Production Example 1 has a thickness of 50 ⁇ m after curing. Young's modulus (80 ° C.) ⁇ thickness: 1.41 ⁇ 10 5 N / m).
- a PET film (thickness: 38 ⁇ m) that had been subjected to a peeling treatment was overlaid thereon and then coated on the surface of the coated PET film using ultraviolet light (illuminance: 163 mW / cm 2 , light amount: 2100 mJ / mm) using a high-pressure mercury lamp.
- the ester polymer mixed solution is applied to the polyethylene terephthalate film side of the polyethylene terephthalate film / acrylic urethane laminate sheet, and an elastic layer (thickness: 30 ⁇ m, shear modulus (80 ° C.): 2.88 ⁇ 10 5 Pa) is applied.
- a heat-shrinkable film (heat-shrinkable base material) (trade name “Space Clean S5630”, manufactured by Toyobo Co., Ltd., uniaxially stretched polyester film, thickness: 30 ⁇ m) is stacked thereon and laminated using a hand roller.
- a four-layer sheet (shrinkable film layer / elastic layer / rigid film layer / intermediate layer) was obtained.
- a five-layer structure in which the pressure-sensitive adhesive layer side of the pressure-sensitive adhesive layer / separator laminate 1 obtained in Production Example 2 is laminated on the acrylic / urethane layer side of a four-layer sheet and the pressure-sensitive adhesive layer surface is protected by a separator.
- Example 2 On a polyethylene terephthalate film (trade name “Lumirror S-10”, manufactured by Toray Industries, Inc., thickness: 38 ⁇ m, Young's modulus (80 ° C.) ⁇ thickness: 1.41 ⁇ 10 5 N / m), an EEA resin film (Mitsui ⁇ Production name “AR201” manufactured by DuPont Chemical, thickness: 60 ⁇ m, shear modulus (23 ° C.): 1.40 ⁇ 10 5 Pa) are extruded and laminated, and a polyethylene terephthalate film / EEA laminated sheet (rigid film layer / intermediate) Layer).
- a polyethylene terephthalate film trade name “Lumirror S-10”, manufactured by Toray Industries, Inc., thickness: 38 ⁇ m, Young's modulus (80 ° C.) ⁇ thickness: 1.41 ⁇ 10 5 N / m
- an EEA resin film Mitsubishi Chemical, thickness: 60 ⁇ m, shear modulus (23 ° C
- a pressure-sensitive adhesive sheet 2 having a five-layer structure was obtained in the same manner as in Example 1 except that the obtained polyethylene terephthalate film / EEA laminate sheet was used instead of the polyethylene terephthalate film / acrylic urethane laminate sheet.
- Example 3 instead of the ester polymer mixed solution, 100 parts by mass of an acrylic polymer (trade name “Leocoat R1020S”, manufactured by Daiichi Lace Co., Ltd.), a crosslinking agent [trade name “DPHA40H” (pentaerythritol-modified acrylate, Nippon Kayaku Co., Ltd.) 10 parts by mass, trade name “Tetrad C” (Mitsubishi Gas Chemical Co., Ltd.) 0.25 parts by mass, and trade name “Coronate L” (manufactured by Nippon Polyurethane Industry Co., Ltd.) 2 parts by mass], active energy ray polymerization started An elastic layer (thickness: 30 ⁇ m, shear modulus (80 ° C.): 7.20) using an acrylic polymer solution in which 3 parts by mass of an agent (trade name “Irgacure 184”, manufactured by Ciba Japan Co., Ltd.) is dissolved in methyl ethyl ketone.
- Example 4 Five-layer structure in the same manner as in Example 1 except that the pressure-sensitive adhesive layer / separator laminate 1 obtained in Production Example 3 was used instead of the pressure-sensitive adhesive layer / separator laminate 1 obtained in Production Example 2. The adhesive sheet 4 was obtained.
- Comparative Example 2 The pressure-sensitive adhesive layer / separator laminate 1 obtained in Production Example 2 was laminated on the acrylic / urethane layer side of the polyethylene terephthalate film / acrylic / urethane laminate sheet obtained in Example 1, and the pressure-sensitive adhesive layer was adhered.
- PSA in the column of the pressure-sensitive adhesive layer means a pressure-sensitive pressure-sensitive adhesive
- UV means an ultraviolet curable pressure-sensitive adhesive
- AU in the middle layer column
- EA means an ethylene-ethyl acrylate copolymer
- PET in the column of rigid substrate means polyethylene terephthalate
- TEZ in the column of heat shrinkable substrate means a heat shrinkable substrate.
- G ′ means a shear modulus
- E ′ means a Young's modulus.
- edge chipping edge chipping
- ⁇ Wafer warpage test> When the grinding test result is ⁇ or ⁇ , the wafer with the adhesive sheet adhered to the surface plate is placed so that the adhesive sheet is on the upper side, and the two points farthest from the surface plate to the wafer The distance (mm) was measured and the average value was obtained.
- Example 3 Each pressure-sensitive adhesive sheet obtained in Examples and Comparative Examples is cut into a circular shape having the same size as a 4-inch silicon wafer and bonded to a 4-inch silicon wafer (thickness: 525 ⁇ m) until the back surface of the wafer reaches a thickness of 100 ⁇ m. Grinded.
- Example 3 In which the elastic layer is made of an active energy ray-curable pressure-sensitive adhesive
- Example 4 In which the pressure-sensitive adhesive layer is an active energy ray-curable pressure-sensitive adhesive layer, ultraviolet rays are irradiated from the pressure-sensitive adhesive sheet side with an intensity of 500 mJ / cm 2.
- the elastic layer was cured in Example 3
- the pressure-sensitive adhesive layer was cured in Example 4.
- the pressure-sensitive adhesive sheet is placed on a hot stage with an adsorption chuck so that the pressure-sensitive adhesive layer is in contact with the hot stage and heated at a predetermined temperature to cause thermal contraction of the shrinkable film layer constituting the pressure-sensitive adhesive sheet, Evaluation was made according to the following criteria.
- Example 3 in which the elastic layer is made of an active energy ray-curable pressure-sensitive adhesive
- Example 4 in which the pressure-sensitive adhesive layer is an active energy ray-curable pressure-sensitive adhesive layer
- ultraviolet rays are irradiated from the pressure-sensitive adhesive sheet side with an intensity of 500 mJ / cm 2.
- the elastic layer was cured in Example 3, and the pressure-sensitive adhesive layer was cured in Example 4.
- one end of the pressure-sensitive adhesive sheet was immersed in warm water at 80 ° C. along the shrinkage axis direction of the shrink film to promote deformation.
- the diameter (r: mm) was calculated
- the self-winding pressure-sensitive adhesive sheet of the present invention it is possible to suppress the warping of the adherend that occurs when grinding the adherend, and after grinding, stimulation such as heating that causes shrinkage.
- the cylindrical winding body is formed by voluntarily winding while peeling from the adherend in the direction of the main contraction axis from the end portion (one end portion or the two opposite ends). It can be removed very easily from the surface of the adherend without damaging the adherend or contaminating the adherend due to incomplete peeling.
- the self-winding pressure-sensitive adhesive sheet of the present invention is useful as a re-peeling pressure-sensitive adhesive sheet such as a temporary wafer fixing pressure-sensitive adhesive sheet or a wafer protecting pressure-sensitive adhesive sheet used in a processing step of a semiconductor silicon wafer or the like.
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Abstract
Description
弾性層:厚みが15~150μm、80℃におけるずり弾性率が1×104Pa~5×106Paである
中間層:23℃におけるずり弾性率が1×104Pa~4×107Pa
粘着剤層:粘着剤層又は低粘着化処理後の粘着剤層の粘着力(180°ピール剥離、対シリコンミラーウェハ、引張り速度300mm/分)が6.5N/10mm以下である
収縮性フィルム層としては、少なくとも1軸方向に収縮性を有するフィルム層であればよく、熱収縮性フィルム、光により収縮性を示すフィルム、電気的刺激により収縮するフィルム等の何れで構成されていてもよい。なかでも、作業効率等の観点から、熱収縮性フィルムで構成されているのが好ましい。収縮性フィルム層は、1軸方向のみに収縮性を有していてもよいし、或る方向(1軸方向)に主たる収縮性を有し、該方向とは異なる方向(例えば、該方向に対して直交する方向)に副次的な収縮性を有していてもよい。収縮性フィルム層は単層であってもよく、2以上の層からなる複層であってもよい。
拘束層は収縮性フィルム層の収縮を拘束し、反作用力を生み出すことにより、積層体全体として偶力を生み出し、巻回を引き起こす駆動力となる。また、この拘束層により、収縮性フィルム層の主収縮方向とは異なる方向の副次的収縮が抑制され、1軸収縮性とは言っても必ずしも一様とは言えない収縮性フィルム層の収縮方向が一方向に収斂する働きもあると考えられる。このため、粘着シートに収縮性フィルム層の収縮を促す熱等の刺激を与えると、拘束層における収縮性フィルム層の収縮力に対する反発力が駆動力となって、粘着シートの外縁部(1端部又は対向する2端部)が浮き上がり、収縮性フィルム層側を内にして、端部から1方向又は中心方向(通常、熱収縮性フィルムの主収縮軸方向)へ自発的に巻回して筒状巻回体が形成されるものと考えられる。また、この拘束層により、収縮性フィルム層の収縮変形により生じる剪断力が粘着剤層や被着体に伝達されるのを防ぐことができるため、再剥離時の粘着力の低下した粘着剤層(例えば、硬化した粘着剤層)の破損や、被着体の破損、前記破損した粘着剤層による被着体の汚染等を防止できる。
弾性層は、収縮性フィルム層の収縮時の温度下(自発巻回性粘着シートの剥離時の温度下)で変形しやすいこと、すなわちゴム状態であることが好ましい。但し、流動性のある材料では、十分な反作用力が生じず、最終的には収縮性フィルム単独で収縮してしまい、変形(自発巻回)を起こすことができない。従って、弾性層は3次元架橋等により流動性を抑えたものが好ましい。また、弾性層は、その厚みによっても、収縮性フィルム層の非一様な収縮力のうち弱い力の成分に抵抗して、該弱い力の成分による収縮変形を防ぐことで、一様な収縮方向へと変換する作用を有する。ウェハ研削後によって生じる反りは、ウェハへ粘着シートを貼り合わせる際の応力が残存し、この残存応力によって収縮性フィルムが弾性変形することによって生じると考えられるが、弾性層はこの残存応力を緩和して反りを低下させる働きもある。
剛性フィルム層は拘束層に剛性あるいは靱性を付与することで、収縮性フィルム層の収縮力に対して反作用の力を生み出し、ひいては巻回に必要な偶力を発生する機能を有する。剛性フィルム層を設けることにより、収縮性フィルム層に熱等の収縮原因となる刺激が付与された際、粘着シートが途中で停止したり方向がずれたりすることなく円滑に自発巻回し、形の整った筒状巻回体を形成することができる。
本発明における粘着剤層は、ウェハに研削などの加工処理を施す時は、ウェハを保持、仮固定するのに十分な粘着力を発揮し、加工処理終了後は、ウェハを破損することなく、また、糊残りすることなく自発巻回して剥離することができることが好ましく、剥離時における粘着剤層の粘着力(180°ピール剥離、対シリコンミラーウェハ、引張り速度300mm/分)としては、例えば常温(25℃)で、6.5N/10mm以下、特に6.0N/10mm以下であることを特徴とする。
発明における中間層は、上記剛性フィルム層と粘着剤層との間に位置し、収縮性フィルム層/弾性層/剛性フィルム層からなる複合基材の引っ張り応力を緩和して、ウェハを極めて薄く研削する際に発生するウェハの反りを抑制する働きを有する層であり、上記剛性フィルム層と比べて低弾性を示すことを特徴とする。
次に、本発明の自発巻回性粘着シートを用いた被着体の加工方法について説明する。本発明の自発巻回性粘着シートを被着体に貼着して仮固定し、被着体(被加工物)に所要の加工を施した後、自発巻回性粘着シートの粘着剤層の粘着力を低下させるとともに、収縮性フィルム層の収縮原因となる熱等の刺激を付与し、自発巻回性粘着シートの1端部から1方向(通常、主収縮軸方向)へ又は対向する2端部から中心に向かって(通常、主収縮軸方向へ)自発的に巻回させ、1又は2個の筒状巻回体を形成させることにより被着体から剥離し、加工品を得ることができる。なお、自発巻回性粘着シートの1端部から1方向へ自発巻回する場合は、1個の筒状巻回体が形成され(一方向巻回剥離)、自発巻回性粘着シートの対向する2端部から中心に向かって自発的に巻回する場合は、平行に並んだ2個の筒状巻回体が形成される(二方向巻回剥離)。
1.半導体ウェハ2に自発剥離性粘着テープ(自発巻回性粘着シート)1を貼り合わせる。
2.自発剥離性粘着テープ1を貼り合わせた半導体ウェハ2に所用の加工(研削処理等)を施す。
3.加熱処理等を施して、自発剥離性粘着テープを自発的に巻回させて筒状巻回体を形成させ、半導体ウェハ2から剥離する。
剛性フィルム層のヤング率はJIS K7127に準じ以下の方法で測定した。
引張り試験機として加温フード付きオートグラフ(商品名「AG-1kNG」、島津製作所社製)を用いた。長さ200mm×幅10mmに切り取った剛性フィルムをチャック間距離100mmで取り付けた。
加温フードにより80℃の雰囲気にした後、引張り速度5mm/分で試料を引張り、応力-歪み相関の測定値を得た。歪みが0.2%と0.45%の2点について荷重を求めヤング率を得た。この測定を同一試料について5回繰り返し、その平均値を採用した。
実施例及び比較例に記述されている弾性層を1.5mm~2mmの厚みで作製した後、これを直径7.9mmのポンチで打ち抜き、測定用の試料とした。
粘弾性スペクトロメーター(商品名「ARES」、Rheometric Scientific 社製)を用いて、温度80℃、チャック圧100g重、ずりを周波数1Hzに設定して測定を行った[ステンレススチール製8mmパラレルプレート(ティエーインスツルメンツ社製、型式708.0157)を使用]。
製造例1で得られたウレタンポリマー・アクリル系モノマー混合物を、硬化後の厚みが50μmとなるように、塗布、硬化して中間層を得た。得られた中間層を、直径7.9mmのポンチで打ち抜き、測定用の試料とした。
粘弾性スペクトロメーター(商品名「ARES」、Rheometric Scientific 社製)を用いて、温度23℃、チャック圧100g重、ずりを周波数1Hzに設定して測定を行った[ステンレススチール製8mmパラレルプレート(ティエーインスツルメンツ社製、型式708.0157)を使用]。
製造例2で得られた非活性エネルギー線硬化型粘着剤の積層体をポリエチレンテレフタレート基材(厚み38μm)にハンドローラーを用いて貼り合わせた。これを幅10mmに切断し、剥離シートを除去した後に4インチミラーシリコンウェハ(信越半導体社製、商品名「CZ-N」)にハンドローラーで貼り合わせた。これをピール剥離試験機の引張り治具を粘着シートを用いて貼り合わせた。引張り治具を180°方向に、引張り速度300mm/分で引張り、収縮性フィルム層と弾性層との間で剥離が生じたときの力(N/10mm)を測定した。
なお、製造例3で得た活性エネルギー線硬化型粘着剤層については、測定前に紫外線露光を500mJ/cm2を行った以外は上記と同様の方法で4インチミラーシリコンウェハ(信越半導体社製、商品名「CZ-N」)に対する粘着力を測定した。
冷却管、温度計及び撹拌装置を備えた反応容器に、アクリル系モノマーとしてアクリル酸t-ブチル50質量部、アクリル酸30質量部、アクリル酸ブチル20質量部と、多官能モノマーとしてトリメチロールプロパントリアクリレート1質量部、活性エネルギー線重合開始剤として1-[4-(2-ヒドロキシエトキシ)フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン(商品名「イルガキュア2959」、チバ・ジャパン社製)0.1質量部、及びポリオールとしてポリオキシテトラメチレングリコール(分子量:650、三菱化学(株)製)73.4質量部、ウレタン反応触媒としてジブチルスズジラウレート0.05質量部を投入し、撹拌しながらキシリレンジイソシアネート26.6質量部を滴下して、65℃で2時間反応させ、ウレタンポリマー・アクリル系モノマー混合物を得た。なお、ポリイソシアネート成分とポリオール成分の使用量は、NCO/OH(当量比)=1.25であった。
アクリル系共重合体[ブチルアクリレート:アクリル酸=100:3(質量比)を共重合して得られたもの]100質量部に、商品名「テトラッドC」(三菱ガス化学社製)0.7質量部、架橋剤(商品名「コロネートL」、日本ポリウレタン工業社製)2質量部を混合して非エネルギー硬化型粘着剤を調製した。
得られた非エネルギー線硬化型粘着剤を、アプリケータを用いてセパレータ(商品名「MRF38」、三菱ポリエステルフィルム(株)製)上に塗工した後、溶媒などの揮発物を乾燥して、厚み30μmの非エネルギー線硬化型粘着剤層がセパレータ上に設けられた粘着剤層/セパレータ積層体1[粘着力(180°ピール剥離、対シリコンミラーウェハ、引張り速度300mm/分):0.6N/10mm]を得た。
アクリル系重合体[ブチルアクリレート:エチルアクリレート:2-ヒドロキシエチルアクリレート=50:50:20(質量比)を共重合して得られたもの]の2-ヒドロキシエチルアクリレート由来の水酸基の80%をメタクリロイルオキシエチルイソシアナート(2-イソシアナトエチルメタクリレート)と結合させ、側鎖にメタクリレート基を有するアクリル系重合体を製造した。この側鎖にメタクリレート基を有するアクリル系重合体100質量部に対して、炭素-炭素2重結合を有する官能基を2つ以上含む化合物として、商品名「紫光UV1700」(日本合成化学工業社製)50質量部、活性エネルギー線重合開始剤(商品名「イルガキュア184」、チバ・ジャパン社製)3質量部、架橋剤(商品名「コロネートL」、日本ポリウレタン工業社製)1.5質量部を混合して活性エネルギー線硬化型粘着剤を調製した。
得られた活性エネルギー線硬化型粘着剤を、アプリケータを用いてセパレータ(商品名「MRF38」、三菱ポリエステルフィルム(株)製)上に塗工した後、溶媒などの揮発物を乾燥して、厚み30μmの活性エネルギー線硬化型粘着剤層がセパレータ上に設けられた粘着剤層/セパレータ積層体2[粘着力(180°ピール剥離、対シリコンミラーウェハ、引張り速度300mm/分):0.01N/10mm以下(UV照射後)]を得た。
製造例1で得られたウレタンポリマー・アクリル系モノマー混合物を、硬化後の厚みが50μmとなるように、ポリエチレンテレフタレートフィルム(商品名「ルミラー S-10」、東レ(株)製、厚み:38μm、ヤング率(80℃)×厚み:1.41×105N/m)上に塗布した。この上に、剥離処理をしたPETフィルム(厚み:38μm)を重ねて被覆した後、この被覆したPETフィルム面に、高圧水銀ランプを使用して紫外線(照度:163mW/cm2、光量:2100mJ/cm2)を照射して硬化させて、アクリル・ウレタン層(ずり弾性率(23℃):1.89×106Pa)を形成し、ポリエチレンテレフタレートフィルム/アクリル・ウレタン積層シート(剛性フィルム層/中間層)を得た。
次に、エステル系重合体(商品名「PLACCEL CD220PL」、ダイセル化学工業(株)製)100質量部と、セバシン酸10質量部から得られた重合物)100質量部と、架橋剤(商品名「コロネートL」、日本ポリウレタン工業社製)10質量部を混合して、エステル系重合体混合液を得た。
エステル系重合体混合液を、ポリエチレンテレフタレートフィルム/アクリル・ウレタン積層シートのポリエチレンテレフタレートフィルム側に塗布して弾性層(厚み:30μm、ずり弾性率(80℃):2.88×105Pa)を形成し、その上に、熱収縮性フィルム(熱収縮基材)(商品名「スペースクリーンS5630」、東洋紡社製、1軸延伸ポリエステルフィルム、厚み:30μm)を重ね、ハンドローラーを使用して積層し、4層シート(収縮性フィルム層/弾性層/剛性フィルム層/中間層)を得た。
製造例2で得られた粘着剤層/セパレータ積層体1の粘着剤層側を、4層シートのアクリル・ウレタン層側に積層して、粘着剤層表面をセパレータで保護した5層構造(収縮性フィルム層/弾性層/剛性フィルム層/中間層/粘着剤層)の粘着シート1を得た。
ポリエチレンテレフタレートフィルム(商品名「ルミラー S-10」、東レ(株)製、厚み:38μm、ヤング率(80℃)×厚み:1.41×105N/m)上に、EEA樹脂フィルム(三井・デュポンケミカル製、商品名「AR201」、厚み:60μm、ずり弾性率(23℃):1.40×105Pa)を押出しラミネートして、ポリエチレンテレフタレートフィルム/EEA積層シート(剛性フィルム層/中間層)を得た。
ポリエチレンテレフタレートフィルム/アクリル・ウレタン積層シートの代わりに、得られたポリエチレンテレフタレートフィルム/EEA積層シートを使用した以外は実施例1と同様にして、5層構造の粘着シート2を得た。
エステル系重合体混合液の代わりに、アクリル系重合体(商品名「レオコートR1020S」、第一レース社製)100質量部、架橋剤[商品名「DPHA40H」(ペンタエリスリトール変性アクリレート、日本化薬社製)10質量部、商品名「テトラッドC」(三菱ガス化学社製)0.25質量部、及び、商品名「コロネートL」(日本ポリウレタン工業社製)2質量部]、活性エネルギー線重合開始剤(商品名「イルガキュア184」、チバ・ジャパン社製)3質量部をメチルエチルケトンに溶解したアクリル系重合体溶液を使用して弾性層(厚み:30μm、ずり弾性率(80℃):7.20×105Pa(UV照射後))を形成した以外は実施例1と同様にして、5層構造の粘着シート3を得た。
製造例2で得られた粘着剤層/セパレータ積層体1の代わりに、製造例3で得られた粘着剤層/セパレータ積層体2を使用した以外は実施例1と同様にして、5層構造の粘着シート4を得た。
ポリエチレンテレフタレートフィルム/アクリル・ウレタン積層シートの代わりに、ポリエチレンテレフタレートフィルム(商品名「ルミラー S-10」、東レ(株)製、厚み:38μm、ヤング率(80℃)×厚み:1.41×105N/m)を使用した以外は実施例1と同様にして、粘着剤層表面をセパレータで保護した4層構造(収縮性フィルム層/弾性層/剛性フィルム層/粘着剤層)の粘着シート5を得た。
実施例1で得られたポリエチレンテレフタレートフィルム/アクリル・ウレタン積層シートのアクリル・ウレタン層側に、製造例2で得られた粘着剤層/セパレータ積層体1の粘着剤層側を積層して、粘着剤層表面をセパレータで保護した3層構造(剛性フィルム層/中間層/粘着剤層)の粘着シート6を得た。
実施例及び比較例で得られた各粘着シートを、テープ貼り合わせ装置(商品名「DR-3000II」、日東精機社製、ステージ温度:24℃)を用いて、8インチミラーウェハに貼り合わせ、ウェハ研削装置(商品名「DFG8560」、ディスコ社製)で25μm厚みまで研削し、研削後のウェハの状態を目視で観察し、下記基準により評価した。
評価基準:
研削後、ウェハの割れがなく、端部欠け(エッジチッピング)の大きさが30μm以下:○
研削後、ウェハの割れが無く、エッジチッピングが30μm以上のもの:△
研削後、ウェハが割れた:×
上記研削試験結果が○もしくは△について、定盤に粘着シートが貼着した状態のウェハを、粘着シートが上側となるように設置し、定盤からウェハまでの距離で最も離れた位置2点について距離(mm)を測定し平均値を求めた。
実施例及び比較例で得た各粘着シートを4インチシリコンウェハと同じ大きさの円形状に切断して4インチシリコンウェハ(厚み:525μm)に貼り合わせ、ウェハの裏面を厚みが100μmになるまで研削した。
弾性層が活性エネルギー線硬化型粘着剤からなる実施例3及び粘着剤層が活性エネルギー線硬化型粘着剤層である実施例4については、粘着シート側から紫外線を500mJ/cm2の強度で照射することにより、実施例3では弾性層、実施例4では粘着剤層を硬化させた。
粘着シートを、吸着チャック付きホットステージ上に、粘着剤層がホットステージと接するように裁置して所定温度で加熱し、粘着シートを構成する収縮性フィルム層の熱収縮を起こさせるようにし、下記基準に従って評価した。
評価基準:
加熱により、粘着シートの外縁部(1端部)から反対側の外縁部へ一方向に巻回して円筒状に丸まり、ウェハを破損することなくウェハから速やかに剥離した場合(一方向巻回剥離):◎
加熱により、粘着シートの対向する2つの端部から中心に向かって巻回して2つの筒状巻回体が形成され、ウェハを破損することなくウェハから速やかに剥離した場合(二方向巻回剥離):○
加熱により、粘着シートが収縮性フィルム層と弾性層との間で破損したり、円筒状にきれいに丸まらなかった場合:×
加熱しても変化がなかった場合:□
実施例及び比較例で得られた粘着シートを100mm×100mmに切断した(L:100mm)。
弾性層が活性エネルギー線硬化型粘着剤からなる実施例3及び粘着剤層が活性エネルギー線硬化型粘着剤層である実施例4については、粘着シート側から紫外線を500mJ/cm2の強度で照射することにより、実施例3では弾性層、実施例4では粘着剤層を硬化させた。
その後、粘着シートの1端部を収縮フィルムの収縮軸方向に沿って80℃の温水に浸漬し、変形を促した。筒状巻回体となったものについては、直径(r:mm)を定規をもちいて求め、この値を100mmで除してr/Lとした。
2 半導体ウェハ
11 収縮性フィルム層
12 弾性層
13 剛性フィルム層
14 中間層
15 粘着剤層
Claims (5)
- 下記条件を満たす収縮性フィルム層、弾性層、剛性フィルム層、中間層、及び粘着剤層がこの順に積層された粘着シートであって、収縮原因となる刺激の付与により、1端部から1方向へ又は対向する2端部から中心に向かって自発的に巻回して1又は2個の筒状巻回体を形成しうる自発巻回性粘着シート。
弾性層:厚みが15~150μm、80℃におけるずり弾性率が1×104Pa~5×106Paである
中間層:23℃におけるずり弾性率が1×104Pa~4×107Pa
粘着剤層:粘着剤層又は低粘着化処理後の粘着剤層の粘着力(180°ピール剥離、対シリコンミラーウェハ、引張り速度300mm/分)が6.5N/10mm以下である - 収縮性フィルム層が、主収縮方向の熱収縮率が70~180℃の範囲の所定温度において30~90%である熱収縮性フィルムで構成されている請求項1記載の自発巻回性粘着シート。
- 80℃における弾性層のずり弾性率と厚みの積が1~1000N/mの範囲である請求項1又は2記載の自発巻回性粘着シート。
- 80℃における剛性フィルム層のヤング率と厚みの積が3×105N/m以下である請求項1~3の何れかの項に記載の自発巻回性粘着シート。
- 当該自発巻回性粘着シートに収縮原因となる刺激を与えて収縮させたときに自発的に巻回して形成される筒状巻回体の直径rと該自発巻回性粘着シートの巻回方向の長さLとの比(r/L)が、0.001~0.333の範囲である請求項1~4の何れかの項に記載の自発巻回性粘着シート。
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JP2012015256A (ja) * | 2010-06-30 | 2012-01-19 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
US8652942B2 (en) | 2010-10-14 | 2014-02-18 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for manufacturing electronic parts |
US8975347B2 (en) | 2010-10-14 | 2015-03-10 | Denki Kagaku Kogyo Kabushiki Kaisha | Method for manufacturing electronic component |
WO2012165201A1 (ja) * | 2011-06-02 | 2012-12-06 | 株式会社きもと | 易剥離性粘着フィルム |
US20140087180A1 (en) * | 2011-06-02 | 2014-03-27 | Kimoto Co., Ltd. | Easily releasable adhesive film |
JPWO2012165201A1 (ja) * | 2011-06-02 | 2015-02-23 | 株式会社きもと | 易剥離性粘着フィルム |
TWI668077B (zh) * | 2014-12-24 | 2019-08-11 | 日商信越化學工業股份有限公司 | 晶圓之暫時接著方法及薄型晶圓之製造方法 |
JPWO2018181240A1 (ja) * | 2017-03-31 | 2020-02-06 | 古河電気工業株式会社 | 半導体ウェハ表面保護用粘着テープ及び半導体ウェハの加工方法 |
JP7079200B2 (ja) | 2017-03-31 | 2022-06-01 | 古河電気工業株式会社 | 半導体ウェハ表面保護用粘着テープ及び半導体ウェハの加工方法 |
Also Published As
Publication number | Publication date |
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EP2341114A1 (en) | 2011-07-06 |
TW201022397A (en) | 2010-06-16 |
JP2010100686A (ja) | 2010-05-06 |
CN102197103A (zh) | 2011-09-21 |
US20110195248A1 (en) | 2011-08-11 |
EP2341114A4 (en) | 2014-03-26 |
KR20110079647A (ko) | 2011-07-07 |
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