WO2010047039A1 - 単結晶直径の検出方法、及びこれを用いた単結晶の製造方法、並びに単結晶製造装置 - Google Patents
単結晶直径の検出方法、及びこれを用いた単結晶の製造方法、並びに単結晶製造装置 Download PDFInfo
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- WO2010047039A1 WO2010047039A1 PCT/JP2009/004809 JP2009004809W WO2010047039A1 WO 2010047039 A1 WO2010047039 A1 WO 2010047039A1 JP 2009004809 W JP2009004809 W JP 2009004809W WO 2010047039 A1 WO2010047039 A1 WO 2010047039A1
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- single crystal
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- 239000013078 crystal Substances 0.000 title claims abstract description 342
- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 claims abstract description 33
- 239000000155 melt Substances 0.000 claims abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 20
- 239000010703 silicon Substances 0.000 claims abstract description 20
- 238000001514 detection method Methods 0.000 claims description 46
- 238000004033 diameter control Methods 0.000 claims description 7
- 238000002231 Czochralski process Methods 0.000 abstract 1
- 238000002789 length control Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- 230000005499 meniscus Effects 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/26—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using television detectors; using photo or X-ray detectors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1004—Apparatus with means for measuring, testing, or sensing
- Y10T117/1008—Apparatus with means for measuring, testing, or sensing with responsive control means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
Definitions
- the present invention relates to a method for detecting the diameter of a single crystal when a single crystal is pulled from a silicon melt contained in a crucible by the Czochralski method (CZ method), a method for producing a single crystal using the same, and
- the present invention relates to a single crystal manufacturing apparatus.
- single crystals by the CZ method have been improved in quality, such as defect-free crystals, and larger in size with a diameter of 300 mm or more.
- the single crystal diameter is too thick than the target due to errors in detection of the single crystal diameter, it will affect the cutting loss during finishing and waste a large amount of raw materials. become.
- a meniscus ring seen at the boundary between the crystal in the furnace and the melt surface is usually photographed using a TV camera fixed to the chamber window. Then, the maximum diameter (diameter) and position of the meniscus ring is measured from this captured image with an image processor, and the diameter value of the single crystal is determined based on the camera mounting angle, the lens used, the distance to the crystal, etc. Is calculated.
- this detection method changes the relative position of the camera and the crystal, such as when the camera is slightly displaced due to the resetting of the chamber after the batch is completed, or when the melt surface position during crystal pulling is different from the expected position. In such a case, an error has occurred in the calculation of the diameter value.
- the melt in the crucible is reduced by the amount of the single crystal, and the melt surface position is lowered. Therefore, the descending amount is calculated, and the crucible is raised by the vertical driving device of the crucible so that the melt surface position becomes the original position.
- the melt surface position may change because the calculated value does not match the actual descent amount.
- FIG. 7 when the melt surface gradually falls, even if the single crystal has the same diameter, the distance from the camera to the crystal is increased, and the captured image becomes smaller. The diameter is detected thinly, and an error occurs.
- the present invention relates to a detection method for improving the detection accuracy of a single crystal diameter, and a method for manufacturing a single crystal, which performs diameter control with high accuracy based on the detection result, and grows the single crystal with high yield and industrial stability. It aims at providing the manufacturing apparatus.
- the present invention is a method for detecting the diameter of a single crystal when pulling up a single crystal from a silicon melt contained in a crucible by the Czochralski method, and at least the single crystal Two units installed at opposite ends of the diameter of the single crystal at the growth point of the single crystal, which is the contact point between the single crystal and the melt surface, separated from each other by the same distance as the target diameter when forming the straight body portion
- the single crystal diameter detection method is characterized in that both ends of the growth point of the single crystal are photographed from outside the furnace using the above camera, and the diameter of the single crystal is detected from the photographed image.
- the diameter of the single crystal can be detected based on the target diameter of the single crystal. Therefore, the diameter of the single crystal can be detected without being affected by the detection error caused by the change in the relative position between the camera and the single crystal, which has occurred in the conventional detection method. Moreover, the detection accuracy of the diameter of a single crystal can be improved, and the yield of a single crystal can be improved.
- the diameter of the single crystal is the horizontal distance between one end of the single crystal growth point and the center of the captured image in the images captured by the two cameras, respectively. It is preferable to detect and sum the detected distances to obtain and detect a deviation amount of the diameter of the single crystal with respect to the target diameter of the single crystal.
- the amount of deviation of the diameter of the single crystal relative to the target diameter of the single crystal is obtained, and the diameter of the single crystal is detected, so that the diameter of the single crystal can be detected based on the target diameter of the single crystal. it can. Therefore, the magnitude relationship between the detected single crystal diameter and the target diameter of the single crystal can be accurately and quickly determined from the deviation amount of the single crystal diameter.
- the diameter of the single crystal can be detected.
- the diameter of the single crystal is detected using one or two cameras for detecting the cone portion diameter, and when forming the straight body portion of the single crystal, the diameter of the straight cylinder is detected.
- the diameter of the single crystal can be detected using the two cameras for detection. In this way, a single crystal with a large aperture can be used by measuring the diameter of the single crystal using different cameras when forming the cone portion and the straight body portion of the single crystal. Can be reliably detected with high accuracy.
- the diameter of the single crystal is detected by at least one of the methods described above, and the single crystal is pulled up and manufactured based on the detection result while controlling the diameter of the single crystal.
- a method for producing a single crystal is provided. As described above, according to the method for detecting a single crystal diameter of the present invention, the diameter of the single crystal can be accurately detected without being affected by the change in the relative position between the camera and the single crystal. In the present invention, since the diameter of the single crystal can be controlled with high accuracy based on the detection result, a single crystal having a stable diameter can be manufactured with a high yield.
- the single crystal production apparatus of the present invention is installed at the opposite ends of the single crystal diameter at the single crystal growth point, separated by the same distance as the target diameter at the time of forming the straight body of the single crystal.
- Two ends of the single crystal growth point are photographed using two cameras, the diameter of the single crystal is detected from the photographed image, and the diameter of the single crystal is controlled based on the detection result. Therefore, the diameter of the single crystal can be detected with reference to the target diameter of the single crystal, and even if the relative position between the camera and the single crystal changes, no error occurs and the single crystal It can be set as the apparatus which can detect a diameter accurately.
- the apparatus can be improved in production yield of the single crystal.
- the diameter of the single crystal is the horizontal distance between one end of the single crystal growth point and the center of the photographed image in the images photographed by the two cameras, respectively. It is preferable to detect and sum the detected distances to obtain and detect a deviation amount of the diameter of the single crystal with respect to the target diameter of the single crystal. Thereby, the diameter of the single crystal can be detected based on the target diameter when the straight body of the single crystal is formed. Therefore, it is possible to provide an apparatus capable of accurately and quickly discriminating the magnitude relationship between the detected single crystal diameter and the target diameter of the single crystal.
- the apparatus which can detect the diameter of a single crystal.
- the two cameras are installed for detecting a diameter of the straight body when forming the straight body portion of the single crystal, and in addition to the camera, the single crystal cone It is preferable that one or two cameras are installed for detecting the cone part diameter at the time of forming the part.
- the camera is installed according to the use for detecting the diameter of the cone of the single crystal and the diameter of the straight body, and compared with the case where the diameter of the single crystal is measured with one camera regardless of the use.
- a device capable of reliably detecting the diameter of a large-diameter single crystal can be obtained.
- the diameter of a single crystal can be detected with high accuracy. And based on this detection result, it is possible to control the diameter of a single crystal with high precision. Therefore, a single crystal having a stable diameter can be manufactured with a high yield.
- the present invention will be described more specifically.
- the meniscus ring seen at the boundary between the crystal and the melt surface is photographed with a single camera, and the diameter of the single crystal is detected from the image.
- the relative position between the camera and the single crystal was changed due to the position shift and the melt surface position change, resulting in an error in the detection of the single crystal diameter.
- the present inventors have two cameras that are installed at the opposite ends of the diameter of the single crystal at the growth point of the single crystal and facing each other at the same distance as the target diameter when the straight body of the single crystal is formed. Using this method, the diameter of the single crystal can be detected without being affected by the change in the relative position between the camera and the single crystal. An attempt was made to detect the diameter of a single crystal based on the target diameter at the time.
- each camera is placed at the same distance as the target diameter when the straight body of the single crystal is formed, and the camera is connected to the single crystal at the growth point of the single crystal. Were placed opposite to each other at both ends of the diameter. In other words, the two cameras are separated from each other by the target diameter of the single crystal so that the straight line connecting the respective cameras is parallel to both ends of the growth point of the single crystal on the silicon melt surface accommodated in the crucible. It will be installed. Using these cameras, both ends of the growth point of the single crystal were photographed from outside the furnace, and the diameter of the single crystal was detected from the image.
- FIG. 2 is a schematic view of the photographing range and camera image of the camera in the present invention.
- FIG. 3 is a schematic view of a camera image when the installation angle of the camera of the single crystal manufacturing apparatus of the present invention is changed.
- the center line on the images in FIGS. 2 and 3 is considered to be the same distance as both ends of the target diameter. It is done. Therefore, for example, as shown in FIG. 2, the diameter of the single crystal can be detected as target diameter + difference A + difference B. In this case, even if the setting angle of the camera is changed, as shown in FIG. The diameter of the single crystal is the target diameter + difference A + difference B, which is the same as before changing the camera setting angle.
- the diameter of the single crystal can be detected with reference to the target diameter of the single crystal, so the change in the vertical position can be ignored. all right.
- the distance between the two cameras is kept at the reference single crystal target diameter, if both ends of the growth point of the single crystal can be photographed within the photographing range of the camera, it will affect the detection of the single crystal diameter. I knew I wouldn't.
- the subject centered on the camera does not change the screen center position, and only the size of the image changes. Therefore, when the diameter is equal to the target diameter, the detection point exists on the center line of the camera image even if the position of the melt surface changes.
- the magnitude relationship between the detected diameter and the target diameter can be accurately determined, so the diameter of the single crystal can be determined accurately and quickly. It has also been found that it is possible to control and produce single crystals of stable diameter.
- FIG. 1 is a schematic view showing an example of a single crystal production apparatus of the present invention.
- the single crystal manufacturing apparatus 20 includes a hollow cylindrical chamber 1 and a crucible 5 is disposed at the center thereof.
- This crucible has a double structure, and is an inner holding container made of quartz having a bottomed cylindrical shape (hereinafter simply referred to as “quartz crucible 5a”) and a similarly bottomed fitting adapted to hold the outside of the quartz crucible 5a. It is composed of a cylindrical graphite outer holding container (“graphite crucible 5b”).
- crucibles 5 are fixed to the upper end portion of the support shaft 6 so that they can be rotated and moved up and down, and a resistance heating heater 8 is arranged substantially concentrically outside the crucible. Further, a heat insulating material 9 is concentrically arranged around the outside of the heater 8. And the silicon melt 2 which melt
- the central axis of the crucible 5 filled with the silicon melt 2 is a pull-up wire (or pull-up shaft that rotates at a predetermined speed in the reverse direction or the same direction on the same axis as the support shaft 6. And a seed crystal 4 is held at the lower end of the pulling shaft 7. A silicon single crystal 3 is formed on the lower end surface of the seed crystal 4.
- the single crystal manufacturing apparatus 20 includes a camera 11 for photographing a growth point of the single crystal that is a contact point between the single crystal 3 and the melt surface from outside the furnace, and a diameter control device 12 for controlling the diameter of the single crystal 3. It has.
- the diameter control device 12 outputs signals to the support shaft 6 and the pulling shaft 7 or the heater 8 according to the detection result of the diameter of the single crystal using the camera 11, and the crucible position, the crucible rising speed, the seed crystal.
- the diameter of the single crystal is controlled by controlling the position, pulling speed, heater power, etc.
- the single crystal manufacturing apparatus 20 has two cameras that are set to face each other at the same distance as the target diameter when the straight body part of the single crystal 3 is formed, and are opposed to each other at both ends of the single crystal diameter at the single crystal growth point.
- 11 is used to photograph both ends of the growth point of the single crystal, detect the diameter of the single crystal from the captured image, and control the diameter of the single crystal based on the detection result. Therefore, the diameter of the single crystal can be detected with reference to the target diameter of the single crystal 3, and even if the relative position between the camera 11 and the single crystal 3 changes, no error occurs. It can be set as the apparatus which can detect the diameter of a single crystal accurately. In addition, since the single crystal diameter can be accurately controlled based on the detection result of the single crystal diameter, the apparatus can be improved in the production yield of the single crystal.
- the single crystal has a diameter in the horizontal direction between one end of the growth point of the single crystal and the center of the photographed image in each of the images photographed by two cameras as shown in FIG.
- the apparatus which can detect the diameter of a single crystal.
- two cameras are installed as described above for detecting the diameter of the straight body when forming the straight body portion of the single crystal, and in addition to this, the cone portion when forming the single crystal cone portion is provided.
- One or two cameras can be installed for diameter detection.
- a camera is installed for each application for detecting the cone diameter of a single crystal and for detecting the diameter of a straight body, compared with the case of measuring the diameter of a single crystal with a single camera regardless of the application. Therefore, it is possible to install a camera with a narrow measurement field of view. Further, by using a camera with a narrow measurement field of view, measurement accuracy can be improved, and a device capable of reliably detecting the diameter of a large-diameter single crystal can be obtained.
- the diameter of the single crystal is detected as follows.
- images are obtained by photographing both ends of the growth point of the single crystal using two cameras on the left and right.
- the diameter of the single crystal is detected from the image.
- the two cameras on the left and right are located at positions separated by the target diameter, and are further installed on both ends of the growth point of the single crystal. It is something to shoot from. Therefore, the diameter of the single crystal can be detected based on the target diameter of the single crystal. Therefore, the diameter of the single crystal can be detected without being affected by the detection error caused by the change in the relative position between the camera and the single crystal, which has occurred in the conventional detection method. And the yield of single crystals can be improved.
- the diameter of the single crystal can be detected.
- one or two cameras for detecting the cone part diameter are used to detect the diameter of the single crystal, and when forming a single crystal straight cylinder part, The diameter of the single crystal can also be detected using two cameras. In this way, at the time of forming the cone portion and the straight body portion of the single crystal, by measuring the diameter of the single crystal using a different camera, even when measured using a camera with a narrow measurement field of view, The diameter of a single crystal having a large diameter can be detected with high accuracy.
- the diameter of a single crystal can be detected accurately. Based on the detection result, the single crystal is pulled up while controlling the diameter of the single crystal, whereby the diameter is controlled with high accuracy and a single crystal having a stable diameter can be manufactured with a high yield.
- Example 2 A silicon raw material was filled in a crucible using a single crystal manufacturing apparatus as shown in FIG. 1, and the silicon raw material was melted with a heater to obtain a silicon melt. Then, as shown in FIG. 2, the single crystal diameter was detected using two cameras, and a silicon single crystal having a diameter of 203 mm was pulled up and manufactured based on the detection result while controlling the single crystal diameter. Thereafter, the diameter of the produced single crystal was measured outside the furnace.
- FIG. 5 shows the actual diameter of the single crystal and the detection result.
- the diameter is the length direction of the straight body portion. It turns out that it became a taper-like crystal gradually becoming thicker. Further, the actual single crystal diameter had an error of 2 mm or more. This is considered to be caused by a measurement error due to a change in the melt surface position.
- the diameter of the single crystal can be detected almost in agreement with the actual diameter from the beginning to the end of the straight body of the single crystal, and the diameter of the single crystal is stable with accuracy within 1 mm from the desired diameter.
- the single crystal diameter detection error is 2 mm or more, and it can be seen that a crystal having a desired diameter cannot be obtained.
- the diameter of the single crystal can be detected with high accuracy.
- the diameter of the single crystal is accurately detected, and the single crystal is pulled up while controlling the diameter of the single crystal based on the detection result. Therefore, the diameter of the single crystal can be controlled with high accuracy. As a result, a single crystal can be manufactured with a high yield.
Abstract
Description
このように、単結晶の目標直径に対する単結晶の直径のずれ量を求めて、単結晶の直径を検出することで、単結晶の目標直径を基準にして、単結晶の直径を検出することができる。そのため、単結晶の直径のずれ量から、検出した単結晶直径と単結晶の目標直径との大小関係が正確かつ迅速に判別することができる。また、画像における水平方向の距離から、単結晶の直径のずれ量を求めることで、カメラと単結晶との相対位置の鉛直方向の変化に伴う検出誤差の影響を受けることがなく、高精度に単結晶の直径を検出することができる。
このように、単結晶のコーン部形成時と直胴部形成時において、異なるカメラを用いて単結晶の直径を測定することで、測定視野の狭いカメラを用いることができ、大口径の単結晶の直径を確実に精度良く検出することができる。
前述のように、本発明の単結晶直径の検出方法によれば、単結晶の直径をカメラと単結晶との相対位置の変化の影響を受けることがなく、精度良く検出することができる。そして、本発明では、この検出結果に基づいて、高精度に単結晶の直径を制御することができるため、直径の安定した単結晶を歩留まり良く製造することができる。
これにより、単結晶の直胴部形成時における目標直径を基準にして、単結晶の直径を検出することができる。そのため、検出した単結晶直径と単結晶の目標直径との大小関係が正確かつ迅速に判別可能な装置とすることができる。また、画像における水平方向の距離から、単結晶の直径のずれ量を求めることで、カメラと単結晶との相対位置の鉛直方向の変化に伴う検出誤差の影響を受けることがなく、高精度に単結晶の直径を検出することができる装置とすることができる。
このように、単結晶のコーン部直径検出用と直胴直径検出用として、用途別にカメラが設置されていることで、用途に関係なく1台のカメラで単結晶の直径を測定する場合と比較して、測定視野の狭いカメラを設置することが可能である。また、測定視野の狭いカメラを用いることができることで、大口径の単結晶の直径を確実に精度良く検出することができる装置とすることができる。
前述のように、従来は、1台のカメラで結晶と融液面との境界に見られるメニスカスリングを撮影して、その画像から単結晶の直径を検出していたが、この方法では、カメラの位置ずれや融液面位置の変化により、カメラと単結晶との相対位置が変化して、単結晶直径の検出に誤差が生じていた。
続いて、同一直径の単結晶を用いて、カメラの設置角度を変更して、単結晶の直径を検出したところ、実際の単結晶の直径と一致することがわかった。
ここで、図2は本発明におけるカメラの撮影範囲およびカメラ画像の概略図である。また、図3は本発明の単結晶製造装置のカメラの設置角度を変更した場合におけるカメラ画像の概略図である。
また、2台のカメラの距離が基準となる単結晶の目標直径に保たれていることで、カメラの撮影範囲内に単結晶の成長点の両端が撮影できれば、単結晶直径の検出には影響しないこともわかった。
カメラと単結晶との相対位置を変更したことで、図4に示すように、単結晶は小さく見えるが、単結晶の成長点の両端は、常に画像の中心線上に存在することがわかった。そのため、カメラと単結晶との相対位置の変化の影響を受けることなく、単結晶直径を検出することができることがわかった。すなわち、被写体とカメラの相対位置の変化で、カメラから被写体の距離が変化する場合、カメラに写る被写体は、画面中心位置は変化せず、像の大きさのみが変化する。したがって、直径が目標直径通りの場合、融液面の位置が変化しても、検出点はカメラの画像の中心線上に存在することになる。
図1は本発明の単結晶の製造装置の一例を示す概略図である。
これにより、図2に示すように、単結晶の直胴部形成時における目標直径を基準にして、単結晶の直径=目標直径+差分A+差分Bとして、検出することができる。そのため、検出した単結晶直径と単結晶の目標直径との大小関係が正確かつ迅速に判別可能な装置とすることができる。また、画像における水平方向の距離から、単結晶の直径のずれ量を求めることで、カメラと単結晶との相対位置の鉛直方向の変化に伴う検出誤差の影響を受けることがなく、高精度に単結晶の直径を検出することができる装置とすることができる。
このように、単結晶のコーン部直径検出用と直胴直径検出用として、用途別にカメラが設置されることで、用途に関係なく1台のカメラで単結晶の直径を測定する場合と比較して、測定視野の狭いカメラを設置することが可能である。また、測定視野の狭いカメラを用いることで、測定精度を向上させることができ、大口径の単結晶の直径を確実に精度良く検出することができる装置とすることができる。
このとき、図2に示すように、左右の2台のカメラは、目標直径分だけ離れた位置にあり、さらに単結晶の成長点の両端にそれぞれ正対して設置したものを用いて、炉外から撮影するものである。そのため、単結晶の目標直径を基準にして、単結晶の直径を検出することができる。従って、従来の検出方法で生じていたカメラと単結晶との相対位置の変化に伴う検出誤差の影響を受けることがなく、単結晶の直径を検出することができ、単結晶の直径の検出精度が向上して、また、単結晶の歩留まりを向上させることができる。
これにより、図2に示すように、単結晶の直胴部形成時における目標直径を基準にして、単結晶の直径=目標直径+差分A+差分Bとして、検出することができる。そのため、検出した単結晶直径と単結晶の目標直径との大小関係を正確かつ迅速に判別することができる。また、画像における水平方向の距離から、単結晶の直径のずれ量を求めることで、カメラと単結晶との相対位置の鉛直方向の変化に伴う検出誤差の影響を受けることがなく、高精度に単結晶の直径を検出することができる。
このように、単結晶のコーン部形成時と直胴部形成時において、異なるカメラを用いて単結晶の直径を測定することで、測定視野の狭いカメラを用いて測定した場合であっても、大口径の単結晶の直径を精度良く検出することができる。
(実施例)
図1に示すような単結晶製造装置を用いて、ルツボ内にシリコン原料を充填し、そのシリコン原料をヒーターで溶解して、シリコン融液とした。そして、図2に示すように2台のカメラを使用して単結晶直径を検出し、その検出結果に基づいて、単結晶直径を制御しつつ、直径203mmのシリコン単結晶を引上げて製造した。その後、製造した単結晶の直径を炉外に出して実際に測定した。ここで、図5に単結晶の実直径と検出結果を示す。
実施例の単結晶の引上げ時において、直径制御用の2台のカメラとは別に従来の単結晶直径の検出方法のように1台のカメラを使用して、結晶と融液面との境界に見られるメニスカスリングを撮影し、その画像から単結晶の直径を検出した。ここで、図6に単結晶の実直径と検出結果を示す。
Claims (7)
- チョクラルスキー法により、ルツボ内に収容したシリコン融液から単結晶を引き上げる際に、単結晶の直径を検出する方法であって、少なくとも、前記単結晶の直胴部形成時における目標直径と同じ距離だけ離れ、前記単結晶と融液面との接点である単結晶の成長点における前記単結晶の直径の両端に、それぞれ正対して設置した2台のカメラを用いて、前記単結晶の成長点の両端をそれぞれ炉外から撮影し、該撮影した画像から前記単結晶の直径を検出することを特徴とする単結晶直径の検出方法。
- 前記単結晶の直径は、前記2台のカメラでそれぞれ撮影した画像における前記単結晶の成長点の一端と前記撮影した画像の中心との水平方向の距離をそれぞれ検出し、該検出した距離を合計して、前記単結晶の目標直径に対する前記単結晶の直径のずれ量を求めて検出することを特徴とする請求項1に記載の単結晶直径の検出方法。
- 前記単結晶のコーン部形成時には、コーン部直径検出用の1台または2台のカメラを用いて、前記単結晶の直径を検出し、前記単結晶の直胴部形成時には、直胴直径検出用の前記2台のカメラを用いて、前記単結晶の直径の検出を行うことを特徴とする請求項1または請求項2に記載の単結晶直径の検出方法。
- 少なくとも、請求項1ないし請求項3のいずれか1項に記載の方法により単結晶の直径を検出し、該検出結果に基づいて、前記単結晶の直径を制御しつつ、単結晶を引き上げて製造することを特徴とする単結晶の製造方法。
- チョクラルスキー法により、ルツボ内に収容したシリコン融液から単結晶を引き上げてシリコン単結晶を製造する単結晶製造装置であって、少なくとも、前記シリコン融液を収容するルツボと、前記単結晶と融液面との接点である単結晶の成長点を炉外から撮影するカメラと、前記単結晶の直径を制御する直径制御装置とを備え、前記カメラが前記単結晶の直胴部形成時における目標直径と同じ距離だけ離れ、前記単結晶の成長点における前記単結晶の直径の両端に、それぞれ正対して2台設置されたものであり、該2台のカメラを用いて、前記単結晶の成長点の両端を撮影した画像から、前記単結晶の直径を検出し、該検出結果に基づいて、前記直径制御装置によって前記単結晶の直径を制御するものであることを特徴とする単結晶製造装置。
- 前記単結晶の直径は、前記2台のカメラでそれぞれ撮影した画像における前記単結晶の成長点の一端と前記撮影した画像の中心との水平方向の距離をそれぞれ検出し、該検出した距離を合計して、前記単結晶の目標直径に対する前記単結晶の直径のずれ量を求めて検出するものであることを特徴とする請求項5に記載の単結晶製造装置。
- 前記2台のカメラは、前記単結晶の直胴部形成時の直胴直径検出用に設置されたものであり、該カメラの他に、前記単結晶のコーン部形成時のコーン部直径検出用に1台または2台のカメラが設置されたものであることを特徴とする請求項5または請求項6に記載の単結晶製造装置。
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CN108138355A (zh) * | 2015-10-14 | 2018-06-08 | 信越半导体株式会社 | 单晶制造装置以及熔液面位置的控制方法 |
CN108344742A (zh) * | 2018-04-13 | 2018-07-31 | 太原理工大学 | 一种基于多帧图像运动信息的蓝宝石接种检测装置和方法 |
WO2022185789A1 (ja) * | 2021-03-01 | 2022-09-09 | 信越半導体株式会社 | 原料融液の表面の状態の検出方法、単結晶の製造方法、及びcz単結晶製造装置 |
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JP6036709B2 (ja) * | 2014-01-07 | 2016-11-30 | 信越半導体株式会社 | シリコン単結晶の直径検出用カメラのカメラ位置の調整方法及びカメラ位置調整治具 |
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