WO2010032944A3 - 수소 투과 방지막 - Google Patents

수소 투과 방지막 Download PDF

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Publication number
WO2010032944A3
WO2010032944A3 PCT/KR2009/005234 KR2009005234W WO2010032944A3 WO 2010032944 A3 WO2010032944 A3 WO 2010032944A3 KR 2009005234 W KR2009005234 W KR 2009005234W WO 2010032944 A3 WO2010032944 A3 WO 2010032944A3
Authority
WO
WIPO (PCT)
Prior art keywords
hydrogen
permeation
membrane
preventing hydrogen
adsorption layer
Prior art date
Application number
PCT/KR2009/005234
Other languages
English (en)
French (fr)
Other versions
WO2010032944A2 (ko
Inventor
김용일
김인중
이윤희
이경석
남승훈
Original Assignee
한국표준과학연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국표준과학연구원 filed Critical 한국표준과학연구원
Priority to US13/119,308 priority Critical patent/US8481999B2/en
Publication of WO2010032944A2 publication Critical patent/WO2010032944A2/ko
Publication of WO2010032944A3 publication Critical patent/WO2010032944A3/ko

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • C—CHEMISTRY; METALLURGY
    • C21—METALLURGY OF IRON
    • C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D3/00—Diffusion processes for extraction of non-metals; Furnaces therefor
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C01B3/503—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/508—Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by selective and reversible uptake by an appropriate medium, i.e. the uptake being based on physical or chemical sorption phenomena or on reversible chemical reactions

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Photovoltaic Devices (AREA)

Abstract

본 발명은 수소가 막을 투과하여 확산 배출되는 것과 수소이온이 물질 내부로의 확산으로 인한 재료의 수소취성을 방지하는 하기 위한 수소 투과 방지막에 관한 것으로, 상세하게는 p형 불순물이 도핑된 반도체층과 n형 불순물이 도핑된 반도체층의 빌트 인 전위 및 역방향 바이어스에 의해 인가된 전위에 의해 수소 이온의 투과를 방지하며, 수소 분자를 흡착하는 흡착층을 구비하여 수소 분자의 투과를 일차적으로 방지하며, 상기 흡착층을 전도성 물질로 구성하여 상기 역방향 바이어스의 인가 전극으로 사용함과 동시에 흡착층 내에 흡착된 수소의 이온화를 야기하여 수소 분자의 투과를 이차적으로 방지 및 수소취성을 방지 하는데 특징이 있다.
PCT/KR2009/005234 2008-09-17 2009-09-15 수소 투과 방지막 WO2010032944A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/119,308 US8481999B2 (en) 2008-09-17 2009-09-15 Hydrogen penetration barrier

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020080091158A KR100976196B1 (ko) 2008-09-17 2008-09-17 수소 투과 방지막
KR10-2008-0091158 2008-09-17

Publications (2)

Publication Number Publication Date
WO2010032944A2 WO2010032944A2 (ko) 2010-03-25
WO2010032944A3 true WO2010032944A3 (ko) 2010-06-24

Family

ID=42039992

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/005234 WO2010032944A2 (ko) 2008-09-17 2009-09-15 수소 투과 방지막

Country Status (3)

Country Link
US (1) US8481999B2 (ko)
KR (1) KR100976196B1 (ko)
WO (1) WO2010032944A2 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101491210B1 (ko) 2012-10-25 2015-02-09 전북대학교산학협력단 프로톤 스케빈져층 및 이를 포함하는 능동형 수소투과 차단층
KR101482854B1 (ko) 2013-05-15 2015-01-15 전북대학교산학협력단 수소투과 차단막 및 이를 포함하는 수소저장 장치
AU2015256387B2 (en) * 2014-05-07 2018-07-19 Cardiac Pacemakers, Inc. Implantable medical device with a hydrogen getter
DE102016003104A1 (de) * 2016-03-15 2017-09-21 Merck Patent Gmbh Behälter umfassend eine Formulierung enthaltend mindestens einen organischen Halbleiter
US9577083B1 (en) 2016-03-16 2017-02-21 Northrop Grumman Systems Corporation Embedded hydrogen inhibitors for semiconductor field effect transistors
CN106925136B (zh) * 2017-03-31 2019-11-15 华南理工大学 一种阴离子掺杂的钙钛矿型混合导体透氢膜材料及其制备方法与应用
JP2023521829A (ja) 2020-04-14 2023-05-25 ラシルク，インコーポレイテッド 水素劣化の抑制

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063126A (en) * 1988-11-16 1991-11-05 Mita Industrial Co., Ltd. Electrophotographic photosensitive material
JPH0576738A (ja) * 1991-09-25 1993-03-30 Mitsubishi Heavy Ind Ltd 水素ガス分離膜
JP2007283184A (ja) * 2006-04-14 2007-11-01 Tokyo Univ Of Agriculture & Technology 水素分離薄膜及びその製造方法。
US7402234B2 (en) * 2002-09-23 2008-07-22 Battelle Energy Alliance, Llc Polymeric hydrogen diffusion barrier, high-pressure storage tank so equipped, method of fabricating a storage tank and method of preventing hydrogen diffusion

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3553147B2 (ja) * 1994-09-05 2004-08-11 三菱電機株式会社 半導体層の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5063126A (en) * 1988-11-16 1991-11-05 Mita Industrial Co., Ltd. Electrophotographic photosensitive material
JPH0576738A (ja) * 1991-09-25 1993-03-30 Mitsubishi Heavy Ind Ltd 水素ガス分離膜
US7402234B2 (en) * 2002-09-23 2008-07-22 Battelle Energy Alliance, Llc Polymeric hydrogen diffusion barrier, high-pressure storage tank so equipped, method of fabricating a storage tank and method of preventing hydrogen diffusion
JP2007283184A (ja) * 2006-04-14 2007-11-01 Tokyo Univ Of Agriculture & Technology 水素分離薄膜及びその製造方法。

Also Published As

Publication number Publication date
US8481999B2 (en) 2013-07-09
US20110175078A1 (en) 2011-07-21
KR100976196B1 (ko) 2010-08-17
KR20100032153A (ko) 2010-03-25
WO2010032944A2 (ko) 2010-03-25

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