WO2009122958A1 - 中間層形成塗布液、及び有機エレクトロルミネッセンス素子の製造方法、並びに有機エレクトロルミネッセンス素子 - Google Patents
中間層形成塗布液、及び有機エレクトロルミネッセンス素子の製造方法、並びに有機エレクトロルミネッセンス素子 Download PDFInfo
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- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
- H10K50/171—Electron injection layers
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- the present invention relates to an intermediate layer-forming coating solution used for forming an intermediate layer in an organic electroluminescent element, a method for producing an organic electroluminescent element, and an organic electroluminescent element formed using the same.
- An organic electroluminescence element (hereinafter sometimes referred to as an organic EL element) as one of the light emitting elements.
- An organic EL element includes a light emitting layer containing an organic substance and a pair of electrodes (anode and cathode) sandwiching the light emitting layer. By applying a voltage to the pair of electrodes, holes are injected from the anode. Electrons are injected from the cathode, and these holes and electrons combine in the light emitting layer to emit light.
- an intermediate layer different from the light emitting layer is provided between the electrode and the light emitting layer for the purpose of lowering the driving voltage and extending the life of the element. Examples of such an intermediate layer include an electron injection layer, a hole injection layer, a hole transport layer, and an electron transport layer (see, for example, Patent Document 1 or 2).
- the electron injection layer is formed by a vapor deposition method such as an electron beam (abbreviation EB) vapor deposition method or a resistance heating vapor deposition method.
- a vapor deposition method such as an electron beam (abbreviation EB) vapor deposition method or a resistance heating vapor deposition method.
- EB electron beam
- a resistance heating vapor deposition method since a vacuum apparatus is required to create a vacuum atmosphere, the apparatus and the process are complicated, and there is a problem that the manufacturing cost of the element increases.
- an object of the present invention is to provide a means for forming an intermediate layer by a simple method without requiring a vacuum atmosphere, a method for producing an organic electroluminescent element using the same, and an organic electroluminescent element. It is.
- the present inventors have studied a method of forming an intermediate layer by a coating method that does not require a vacuum atmosphere, and can be used for the coating method and used for forming an intermediate layer.
- the present invention was completed by finding an intermediate layer forming coating solution.
- the present invention provides an intermediate layer in an organic electroluminescence device comprising at least a pair of electrodes, a light-emitting layer provided between the pair of electrodes and containing an organic substance, and an intermediate layer provided between the electrode and the light-emitting layer. It is a coating solution for use in the above-mentioned coating solution, which is obtained by dissolving an alkali metal salt.
- the alkali metal salt is a salt of at least one acid selected from the group consisting of molybdic acid, tungstic acid, tantalum acid, niobic acid, vanadate acid, titanic acid, and zinc acid. It is a layer forming coating solution.
- the present invention is the intermediate layer forming coating solution, wherein the alkali metal salt is a salt of at least one metal selected from the group consisting of lithium, sodium, potassium, rubidium and cesium.
- the present invention is an intermediate layer forming coating solution in which the alkali metal salt is a cesium salt.
- the present invention also provides an intermediate layer forming coating solution in which the alkali metal salt is cesium molybdate.
- the present invention is an intermediate layer forming coating solution containing a surfactant.
- the present invention also provides an intermediate layer forming coating solution having a contact angle of 60 ° or less with respect to a substrate made of polyethylene naphthalate.
- the present invention is an intermediate layer forming coating solution characterized by having a hydrogen ion index of 7 or more and 13 or less.
- the present invention also provides an organic electroluminescence device by forming a pair of electrodes, a light emitting layer provided between the pair of electrodes, and a light emitting layer containing an organic substance, and an intermediate layer provided between the electrode and the light emitting layer.
- a method of manufacturing A method for producing an organic electroluminescent element, comprising forming the intermediate layer by a coating method using the intermediate layer forming coating solution.
- the present invention also includes a pair of electrodes, A light-emitting layer provided between the pair of electrodes and containing an organic substance; An intermediate layer provided between the electrode and the light emitting layer, The intermediate layer is an organic electroluminescence element formed by a coating method using the intermediate layer forming coating solution.
- the intermediate layer can be easily formed by a coating method without creating a vacuum atmosphere.
- FIG. 1 is a front view showing an organic electroluminescence element (hereinafter sometimes referred to as an organic EL element) 1 according to an embodiment of the present invention.
- the organic EL element 1 of the present embodiment is used for a light source, a lighting device, and the like in a display device such as a full color display device, an area color display device, and a liquid crystal display device.
- the organic EL element 1 of this embodiment includes a pair of electrodes (in this embodiment, an anode 2 and a cathode 3), a light emitting layer 4 provided between the pair of electrodes and containing an organic substance, and an electrode (in this embodiment).
- an intermediate layer (electron injection layer 5 in the present embodiment) provided between the cathode 3) and the light emitting layer 4 is provided, and the intermediate layer is formed by a coating method using an intermediate layer forming coating solution described later. Is done.
- the organic EL element 1 of the present embodiment further includes a substrate 6 and a hole injection layer 7 provided between the anode 2 and the light emitting layer 4, and the anode 2, the hole injection layer 7,
- the light emitting layer 4, the electron injection layer 5, and the cathode 3 are laminated in this order, and are manufactured by forming each of them.
- the organic EL element 1 of the present embodiment is a so-called bottom emission type element that extracts light from the light emitting layer 4 from the substrate 6 side, and a substrate 6 having a high transmittance for light in the visible light region is preferably used.
- a substrate that does not change in the process of forming the organic EL element 1 is preferably used, and may be a rigid substrate or a flexible substrate.
- glass, plastic, polymer film, silicon substrate, metal plate, and these are laminated. And the like are preferably used.
- a plastic, a polymer film or the like that has been subjected to a low water permeability treatment can also be used.
- a commercially available substrate can be used as the substrate 6 or can be manufactured by a known method.
- the substrate may be opaque.
- a thin film with low electrical resistance is preferably used. At least one of the anode 2 and the cathode 3 is transparent. For example, in a bottom emission type organic EL element, the anode 2 disposed on the substrate 6 side is transparent and is resistant to light in the visible light region. Those having high transmittance are preferably used.
- a material of the anode 2 a conductive metal oxide film, a metal thin film, or the like is used.
- anode 2 a thin film made of indium oxide, zinc oxide, tin oxide, indium tin oxide (Indium Tin Oxide: abbreviated as ITO), indium zinc oxide (Indium Zinc Oxide: abbreviated as IZO), or the like, Gold, platinum, silver, copper, aluminum, or an alloy containing at least one of these metals is used.
- a thin film made of ITO, IZO, and tin oxide is suitably used because of transmittance and ease of patterning.
- the anode 2 is preferably formed of a material that reflects light from the light emitting layer 4 toward the cathode 3, and the material has a work function of 3.0 eV or more.
- Metals, metal oxides and metal sulfides are preferred.
- a metal thin film having a thickness that reflects light is used.
- Examples of the method for producing the anode 2 include a vacuum deposition method, a sputtering method, an ion plating method, and a plating method.
- an organic transparent conductive film such as polyaniline or a derivative thereof, polythiophene or a derivative thereof may be used.
- the film thickness of the anode can be appropriately selected in consideration of light transmittance and electric conductivity. For example, it is 5 nm to 10 ⁇ m, preferably 10 nm to 1 ⁇ m, and more preferably 20 nm to 500 nm. is there.
- the hole injection layer 7 is a layer having a function of improving the hole injection efficiency from the anode 2.
- the hole injecting material constituting the hole injecting layer 7 is not particularly limited, and a known material can be appropriately used.
- a phenylamine compound, a starburst amine compound, a phthalocyanine compound, a hydrazone derivative examples thereof include carbazole derivatives, triazole derivatives, imidazole derivatives, oxadiazole derivatives having an amino group, oxides such as vanadium oxide, molybdenum oxide, ruthenium oxide, and aluminum oxide, and amorphous carbon, polyaniline, and polythiophene derivatives.
- Coating methods for forming the hole injection layer 7 include spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, dip coating, and spray coating. , Screen printing method, flexographic printing method, offset printing method, inkjet printing method and the like.
- the hole injection layer 7 can be formed by applying the above-described coating solution onto the substrate 6 on which the anode 2 is formed using one of these coating methods.
- dye-based light emitting materials include cyclopentamine derivatives, tetraphenylbutadiene derivative compounds, triphenylamine derivatives, oxadiazole derivatives, pyrazoloquinoline derivatives, distyrylbenzene derivatives, distyrylarylene derivatives, pyrrole derivatives, thiophenes.
- examples thereof include ring compounds, pyridine ring compounds, perinone derivatives, perylene derivatives, oligothiophene derivatives, oxadiazole dimers, pyrazoline dimers, quinacridone derivatives, and coumarin derivatives.
- a central metal includes Al, Zn, Be, or the like, or a rare earth metal such as Tb, Eu, or Dy
- a ligand includes oxadiazole, thiadiazole, phenylpyridine, or phenylbenzo.
- metal complexes having imidazole and quinoline structures such as iridium complexes, platinum complexes, and other metal complexes that emit light from triplet excited states, aluminum quinolinol complexes, benzoquinolinol beryllium complexes, and benzoxazolyl zinc.
- Examples include complexes, benzothiazole zinc complexes, azomethyl zinc complexes, porphyrin zinc complexes, and europium complexes.
- the electron injection layer 5 is provided mainly for improving the efficiency of electron injection from the cathode 3 and can be formed by applying an intermediate layer forming coating solution on the surface of the light emitting layer 4 and then drying it.
- the intermediate layer forming coating solution used when forming the electron injection layer 5 is obtained by dissolving an alkali metal salt.
- the intermediate layer forming coating solution contains at least an alkali metal salt, but may contain a material different from the alkali metal salt. Examples of the material different from the alkali metal salt contained in the intermediate layer forming coating solution include a conductive organic compound and a thickening stabilizer. That is, the electron injection layer 5 formed using the intermediate layer forming coating solution is configured to include an alkali metal salt. In addition, the electron injection layer 5 may be comprised only with alkali metal salt.
- the alkali metal salt is a salt of at least one metal selected from the group consisting of lithium, sodium, potassium, rubidium, and cesium, and among these, preferably selected from the group consisting of sodium, potassium, cesium, and lithium. And at least one metal salt, most preferably a cesium salt. Since the work function of the alkali metal is low, the electron injection layer 5 formed using the intermediate layer forming coating liquid facilitates electron injection from the cathode 3. Thereby, the drive voltage of the organic EL element 1 can be lowered.
- the alkali metal salt is preferably a salt of at least one acid selected from the group consisting of molybdic acid, tungstic acid, tantalum acid, niobic acid, vanadate acid, titanic acid, and zinc acid.
- Examples of the alkali metal salt include general formulas M 2 MoO 4 , M 2 WO 4 , M 2 Ta 2 O 6 , M 2 Nb 2 O 6 , M 3 VO 4 , M 2 V 2 O 6 , M 2 TiO 3 , it can be mentioned salt represented by M 2 ZnO 2 (where, M represents an alkali metal.).
- the alkali metal salt may be a salt of one or more kinds of alkali metals and one or more kinds of acids, such as lithium sodium tungstate molybdate, sodium cesium niobate molybdate, cesium vanadate tantalate, etc. Can be mentioned. Further, the alkali metal salt is preferably a cesium salt, for example, a cesium salt of at least one acid selected from the group consisting of molybdic acid, tungstic acid, tantalum acid, niobic acid, vanadate acid, and titanic acid. Can be mentioned. Among these, cesium molybdate (Cs 2 MoO 4 ) is preferable as the alkali metal salt.
- the driving voltage of the organic EL element 1 is effectively reduced. be able to. Further, since the alkali metal salt is less reactive than the alkali metal alone, it is possible to form the electron injection layer 5 having a small change with time by using the intermediate layer forming coating solution.
- the solvent for the intermediate layer forming coating solution is not particularly limited as long as it dissolves the alkali metal salt described above, and preferably contains alcohol and / or water.
- the intermediate layer forming coating solution further contains a surfactant. Since the surface tension of the intermediate layer forming coating solution is lowered by this surfactant, the wettability with respect to the layer to which the intermediate layer forming coating solution is applied (in this embodiment, the light emitting layer 4) is improved, and the intermediate layer forming coating solution is improved.
- the thickness of the intermediate layer (electron injection layer 5 in the present embodiment) formed by using can be made uniform.
- surfactants include anionic surfactants, cationic surfactants, zwitterionic (amphoteric) surfactants, and nonionic surfactants.
- Polyalkyl alcohol alkyl ether, polyhydric alcohol alkyl ester, polyoxyethylene alkyl ether, polyoxyethylene alkyl ester, polyoxypropylene alkyl ether, polyoxypropylene alkyl ester, and acetylene glycol, or hydrogen of these alkyl groups Mention may be made of fluorine-based nonionic surfactants in which at least some of the atoms are replaced by fluorine atoms.
- the contact angle of the intermediate layer-forming coating solution with respect to the PET substrate may be 60 ° or less.
- the intermediate layer forming coating solution can be obtained by dissolving the alkali metal salt described above in a solvent such as alcohol and / or water described above. As described above, a surfactant may be further added. Further, the intermediate layer forming coating solution may be a liquid in which an alkali metal salt is precipitated when the intermediate layer forming coating solution is dried, and does not need to be obtained by dissolving the alkali metal salt.
- Examples of the method for applying the intermediate layer forming coating solution on the surface of the light emitting layer 4 include spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, and dip coating.
- Coating methods such as coating method, slit coating method, capillary coating method, spray coating method, nozzle coating method, gravure printing method, screen printing method, flexographic printing method, offset printing method, reverse printing method, inkjet printing method, etc. Can be used.
- the gravure printing method, the screen printing method, the flexographic printing method, the offset printing method, the reverse printing method, and the ink jet printing method are preferable in that pattern formation and multicolor coating are easy.
- the layer thickness of the electron injection layer 5 varies depending on the material used, and is selected so that the driving voltage and the light emission efficiency are appropriate values. At least a thickness that does not cause pinholes is required. Too much is not preferable because the driving voltage of the element increases. Therefore, the thickness of the electron injection layer 5 is usually 1 nm to 1 ⁇ m. The thickness is preferably 2 nm to 500 nm, more preferably 3 nm to 200 nm.
- the material of the cathode 3 is preferably a material having a low work function and easy electron injection into the light emitting layer 4 and a material having high electrical conductivity. In addition, when light is extracted from the anode 2 side, a material having a high visible light reflectance is preferable in order to reflect light from the light emitting layer 4 to the anode 2 side.
- metals such as alkali metals, alkaline earth metals, transition metals, and Group III-B metals can be used.
- alloys include magnesium-silver alloys, magnesium-indium alloys, magnesium-aluminum alloys, indium-silver alloys, lithium-aluminum alloys, lithium-magnesium alloys, lithium-indium alloys, calcium-aluminum alloys, and the like. It can.
- a transparent conductive electrode can be used as the cathode 3, for example, a thin film made of a conductive metal oxide such as indium oxide, zinc oxide, tin oxide, ITO and IZO, polyaniline or a derivative thereof, polythiophene or a derivative thereof.
- a thin film made of a conductive organic material such as can be used.
- the cathode may have a laminated structure of two or more layers.
- the electron injection layer 5 can be formed by a coating method by using an intermediate layer forming coating solution. Accordingly, it is not necessary to create a vacuum atmosphere as compared with the conventional technique of forming the electron injection layer 5 in a vacuum atmosphere such as a vapor deposition method, and the electron injection layer 5 can be easily formed. 1 manufacturing cost can be reduced.
- the electron injection layer 5 in contact with the cathode 3 is formed using an intermediate layer forming coating solution obtained by dissolving an alkali metal salt, the driving voltage of the organic EL element 1 can be lowered.
- the organic EL element only needs to have at least the light emitting layer 4 provided between the anode 2 and the cathode 3, and the layer configuration between the anode 2 and the cathode 3 is the organic EL element 1 of the above-described embodiment. It is not limited to the layer structure. Although one light emitting layer is usually provided, the present invention is not limited to this, and two or more light emitting layers may be provided. In that case, two or more light-emitting layers can be stacked in direct contact with each other, and a layer other than the light-emitting layer can be provided between the layers.
- a layer configuration provided between the anode 2 and the cathode 3 will be described. In the following description, overlapping descriptions of the anode, cathode, light emitting layer, hole injection layer, and electron injection layer may be omitted.
- Examples of the layer provided between the cathode and the light emitting layer include an electron injection layer, an electron transport layer, and a hole blocking layer.
- the layer located on the side close to the cathode is called the electron injection layer
- the layer located on the side close to the light emitting layer Is called an electron transport layer.
- Examples of the layer provided between the anode and the light emitting layer include the above-described hole injection layer, hole transport layer, and electron block layer.
- the layer located on the side close to the anode is called the hole injection layer, and is located on the side close to the light emitting layer.
- the layer is referred to as a hole transport layer.
- the hole injection layer is a layer having a function of improving hole injection efficiency from the anode.
- the hole transport layer is a layer having a function of improving hole injection from the anode, the hole injection layer, or the hole transport layer closer to the anode.
- the electron blocking layer is a layer having a function of blocking electron transport. The hole injection layer or the hole transport layer may also serve as the electron blocking layer.
- the electron injection layer and the hole injection layer may be collectively referred to as a charge injection layer, and the electron transport layer and the hole transport layer may be collectively referred to as a charge transport layer.
- the electron block layer and the hole block layer may be collectively referred to as a charge block layer.
- Anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode b) Anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / cathode c) Anode / hole injection layer / hole transport layer / light emitting layer / electron injection layer / cathode d) Anode / hole injection layer / hole transport layer / light emitting layer / cathode e) Anode / hole injection layer / light emitting layer / Electron transport layer / electron injection layer / cathode f) Anode / hole injection layer / light emitting layer / electron transport layer / cathode g) Anode / hole injection layer / light emitting layer / electron injection layer / cathode h) Anode / hole injection Layer / light injection layer / light emitting layer / electron injection layer / cathode g
- the organic EL element may have two or more light emitting layers.
- the following examples can be given as the element configuration of an organic EL element having two light emitting layers.
- an element structure of the organic EL element having three or more light emitting layers when (electrode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer) is one repeating unit, The following examples including two or more repeating units can be given. r) Anode / charge injection layer / hole transport layer / light emitting layer / electron transport layer / charge injection layer / repeat unit / repeat unit /... / cathode
- an electron transport material constituting the electron transport layer an oxadiazole derivative, anthraquinodimethane or a derivative thereof, benzoquinone or a derivative thereof, naphthoquinone or a derivative thereof, anthraquinone or a derivative thereof, tetracyanoanthraquinodimethane or a derivative thereof, Fluorenone derivatives, diphenyldicyanoethylene or derivatives thereof, diphenoquinone derivatives, or metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorene or derivatives thereof, and the like can be given.
- electron transport materials include oxadiazole derivatives, benzoquinone or derivatives thereof, anthraquinones or derivatives thereof, metal complexes of 8-hydroxyquinoline or derivatives thereof, polyquinoline or derivatives thereof, polyquinoxaline or derivatives thereof, polyfluorenes Or a derivative thereof, preferably 2- (4-biphenylyl) -5- (4-tert-butylphenyl) -1,3,4-oxadiazole, benzoquinone, anthraquinone, tris (8-quinolinol) aluminum, and polyquinoline. preferable.
- a film formation method of the electron transport layer in the case of a low molecular electron transport material, a vacuum deposition method from a powder, or a method by film formation from a solution or a molten state can be exemplified, and in a polymer electron transport material, Examples thereof include a method by film formation from a solution or a molten state. In film formation from a solution or a molten state, a polymer binder may be further used in combination. Examples of the method for forming an electron transport layer from a solution include the same film formation method as the method for forming a hole transport layer from a solution described above.
- an intermediate layer forming coating solution was first prepared.
- Example 3 Cs 2 MoO 4 powder (purity 99.9%, manufactured by Furuuchi Chemical Co., Ltd.), ultrapure water (electric resistivity is 15 M ⁇ ⁇ cm or more) and ethanol (purity 99.5%, deer grade 1, manufactured by Kanto Chemical Co., Inc.) ) And a surfactant (Surfinol (registered trademark) 104A: manufactured by Nissin Chemical Co., Ltd.) in a weight ratio of 10: 25: 61: 4, Cs 2 MoO 4 powder, and ultrapure water in this order. The mixture was stirred in a tube, ethanol was then mixed, and then a surfactant was mixed to prepare an intermediate layer forming coating solution.
- a surfactant Surfinol (registered trademark) 104A: manufactured by Nissin Chemical Co., Ltd.
- An untreated ITO substrate (4) an ITO substrate in which an ITO thin film having a thickness of 150 nm is formed by sputtering on a glass substrate that has been subjected to UV-O 3 cleaning treatment for 10 minutes by an apparatus manufactured by Technovision, (5) Al vapor deposition substrate in which an aluminum thin film having a film thickness of 300 nm is formed on a glass substrate by EB method, (6) Polymer light emitting organic material (SCB670, manufactured by Summation) Are formed on a glass substrate by a spin coat method, and a polymer spin film formation substrate on which a polymer with a film thickness of 80 nm is formed, and (7) PEN substrate made of polyethylene naphthalate (PEN) is used.
- the contact angle of the substrate with the intermediate layer forming coating solution prepared in Examples 1 to 3 was measured.
- Table 1 shows the measurement results of contact angles between the intermediate layer forming coating solutions of Examples 1 to 3 and a plurality of types of substrates.
- an intermediate layer forming coating solution in which an alkali metal salt was dissolved could be produced. Further, as shown in Examples 2 and 3, by adding alcohol or a surfactant to ultrapure water, an intermediate layer forming coating solution having a low surface tension and a small contact angle could be obtained.
- Example 11 An organic EL element was produced using the intermediate layer forming coating solution produced in Example 3.
- the configuration of the organic EL device produced in the examples is glass substrate / anode made of ITO thin film / hole injection layer / electron blocking layer / light emitting layer / electron injection layer / cathode, and this is further sealed with sealing glass did.
- the electron injection layer was formed using the intermediate layer forming coating solution prepared in Example 3.
- the filtrate and washings were mixed and then added dropwise to methanol to precipitate the polymer.
- the obtained polymer precipitate was separated by filtration, washed with methanol, and then dried with a vacuum dryer to obtain 192 parts by weight of polymer.
- the resulting polymer is referred to as polymer compound 1.
- the polymer compound 1 had a polystyrene equivalent weight average molecular weight of 3.7 ⁇ 10 5 and a number average molecular weight of 8.9 ⁇ 10 4 .
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Abstract
Description
前記中間層形成塗布液を用いて、塗布法によって該中間層を成膜することを特徴とする有機エレクトロルミネッセンス素子の製造方法である。
該一対の電極の間に設けられ、有機物を含む発光層と、
電極及び発光層の間に設けられる中間層とを備え、
該中間層が、前記中間層形成塗布液を用いて塗布法によって形成されている、有機エレクトロルミネッセンス素子である。
2 陽極
3 陰極
4 発光層
5 電子注入層
6 基板
7 正孔注入層
本実施の形態の有機EL素子1は、一対の電極(本実施の形態では陽極2及び陰極3)と、該一対の電極の間に設けられ有機物を含む発光層4と、電極(本実施の形態では陰極3)及び発光層4の間に設けられる中間層(本実施の形態では電子注入層5)とを備え、該中間層は、後述する中間層形成塗布液を用いて塗布法によって形成される。本実施の形態の有機EL素子1は、基板6と、陽極2及び発光層4の間に設けられる正孔注入層7とをさらに備え、基板6上に、陽極2、正孔注入層7、発光層4、電子注入層5及び陰極3がこの順に積層されて構成され、それぞれを成膜することで製造される。
本実施の形態の有機EL素子1は、発光層4からの光を基板6側から取出すいわゆるボトムエミッション型の素子であり、可視光領域の光に対する透過率の高い基板6が好適に用いられる。また基板6としては有機EL素子1を形成する工程において変化しないものが好適に用いられ、リジッド基板でも、フレキシブル基板でもよく、例えばガラス、プラスチック、高分子フィルム、シリコン基板、金属板、これらを積層したものなどが好適に用いられる。さらに、プラスチック、高分子フィルムなどに低透水化処理を施したものを用いることもできる。前記基板6としては、市販のものを使用可能であり、又は公知の方法により製造することができる。なお陰極3側から光を取出すいわゆるトップエミッション型の有機EL素子では、基板は不透光性のものであってもよい。
以下に、陽極2と陰極3との間に設けられる層構成の一例について説明する。なお、以下の説明において、陽極、陰極、発光層、正孔注入層及び電子注入層については、重複する説明を省略する場合がある。
a) 陽極/正孔注入層/正孔輸送層/発光層/電子輸送層/電子注入層/陰極
b) 陽極/正孔注入層/正孔輸送層/発光層/電子輸送層/陰極
c) 陽極/正孔注入層/正孔輸送層/発光層/電子注入層/陰極
d) 陽極/正孔注入層/正孔輸送層/発光層/陰極
e) 陽極/正孔注入層/発光層/電子輸送層/電子注入層/陰極
f) 陽極/正孔注入層/発光層/電子輸送層/陰極
g) 陽極/正孔注入層/発光層/電子注入層/陰極
h) 陽極/正孔注入層/発光層/陰極
i) 陽極/正孔輸送層/発光層/電子輸送層/電子注入層/陰極
j) 陽極/正孔輸送層/発光層/電子輸送層/陰極
k) 陽極/正孔輸送層/発光層/電子注入層/陰極
l) 陽極/正孔輸送層/発光層/陰極
m) 陽極/発光層/電子輸送層/電子注入層/陰極
n) 陽極/発光層/電子輸送層/陰極
o) 陽極/発光層/電子注入層/陰極
p) 陽極/発光層/陰極
(ここで、記号「/」は、この記号「/」を挟む2つの層が隣接して積層されることを示す。以下同じ。)
上記層構成の各例において、発光層と陽極あるいは正孔注入層あるいは正孔輸送層の間に電子ブロック層を挿入することができる。また、発光層と陰極あるいは電子注入層あるいは電子輸送層の間に正孔ブロック層を挿入することもできる。
q) 陽極/正孔注入層/正孔輸送層/発光層/電子輸送層/電子注入層/電極/正孔注入層/正孔輸送層/発光層/電子輸送層/電子注入層/陰極
r) 陽極/電荷注入層/正孔輸送層/発光層/電子輸送層/電荷注入層/繰り返し単位/繰り返し単位/・・・/陰極
正孔輸送層を構成する正孔輸送材料としては、特に制限されないが、例えばN,N’-ジフェニル-N,N’-ジ(3-メチルフェニル)4,4’-ジアミノビフェニル(TPD)、NPB(4,4’-bis[N-(1-naphthyl)-N-phenylamino]biphenyl)等の芳香族アミン誘導体、ポリビニルカルバゾール若しくはその誘導体、ポリシラン若しくはその誘導体、側鎖若しくは主鎖に芳香族アミンを有するポリシロキサン誘導体、ピラゾリン誘導体、アリールアミン誘導体、スチルベン誘導体、トリフェニルジアミン誘導体、ポリアニリン若しくはその誘導体、ポリチオフェン若しくはその誘導体、ポリアリールアミン若しくはその誘導体、ポリピロール若しくはその誘導体、ポリ(p-フェニレンビニレン)若しくはその誘導体、又はポリ(2,5-チエニレンビニレン)若しくはその誘導体などを挙げることができる。
電子輸送層を構成する電子輸送材料としては、オキサジアゾール誘導体、アントラキノジメタン若しくはその誘導体、ベンゾキノン若しくはその誘導体、ナフトキノン若しくはその誘導体、アントラキノン若しくはその誘導体、テトラシアノアンスラキノジメタン若しくはその誘導体、フルオレノン誘導体、ジフェニルジシアノエチレン若しくはその誘導体、ジフェノキノン誘導体、又は8-ヒドロキシキノリン若しくはその誘導体の金属錯体、ポリキノリン若しくはその誘導体、ポリキノキサリン若しくはその誘導体、ポリフルオレン若しくはその誘導体等を挙げることができる。
Cs2MoO4粉末(純度99.9%、フルウチ化学株式会社製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で10:90になるように秤量し、スクリュー管に入れ攪拌して中間層形成塗布液を作製した。Cs2MoO4粉末が完全に溶解していることを目視において確認した。この中間層形成塗布液の表面張力は58.3mN/mであった。作製した中間層形成塗布液と、複数の種類の基板との接触角をそれぞれ測定した結果を下記の表1に示す。pH試験紙を用いてpH(水素イオン指数)を測定したところ約7を示した。
Cs2MoO4粉末(純度99.9%、フルウチ化学株式会社製)と超純水(電気抵抗率が15MΩ・cm以上)とエタノール(純度99.5%、鹿1級、関東化学株式会社製)とを重量比で10:26:63になるように秤量し、Cs2MoO4粉末、超純水の順にスクリュー管に入れ攪拌し、その後エタノールを混合し中間層形成塗布液を作製した。Cs2MoO4粉末が完全に溶解していることを目視において確認した。この中間層形成塗布液の表面張力は22.6mN/mであった。作製した中間層形成塗布液と、複数の種類の基板との接触角をそれぞれ測定した結果を下記の表1に示す。pH試験紙を用いてpHを測定したところ約8~9を示した。
Cs2MoO4粉末(純度99.9%、フルウチ化学株式会社製)と超純水(電気抵抗率が15MΩ・cm以上)とエタノール(純度99.5%、鹿1級、関東化学株式会社製)と界面活性剤(サーフィノール(登録商標)104A:日信化学社製)を重量比で10:25:61:4になるように秤量し、Cs2MoO4粉末、超純水の順にスクリュー管に入れ攪拌し、その後エタノールを混合し、その後界面活性剤を混合して中間層形成塗布液を作製した。Cs2MoO4粉末が完全に溶解していることを目視において確認した。この中間層形成塗布液の表面張力は26.6mN/mであった。作製した中間層形成塗布液と、複数の種類の基板との接触角を測定した結果を表1に示す。pH試験紙を用いてpHを測定したところ約8~9を示した。
Cs3VO4粉末(純度99.9%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で1:99になるように秤量しスクリュー管に入れ攪拌し中間層形成塗布液を作製した。目視において完全に溶解していることを確認した。pH試験紙を用いてpHを測定したところ約7を示した。
CsVO3粉末(純度99.9%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で1:99になるように秤量し、スクリュー管に入れ攪拌して中間層形成塗布液を作製した。CsVO3粉末が完全に溶解していることを目視において確認した。pH試験紙を用いてpHを測定したところ約12を示した。
CsVO3粉末(純度99.9%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で30:70になるように秤量し、スクリュー管に入れ攪拌し中間層形成塗布液を作製した。pH試験紙を用いて上澄み液のpHを測定したところ約13を示した。
K2MoO4粉末(純度98%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で1:99になるように秤量し、スクリュー管に入れ攪拌し中間層形成塗布液を作製した。目視において完全に溶解していることを確認した。pH試験紙を用いてpHを測定したところ約7.5を示した。
K2MoO4粉末(純度98%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で30:70になるように秤量し、スクリュー管に入れ攪拌し、中間層形成塗布液を作製した。pH試験紙を用いて上澄み液のpHを測定したところ約9を示した。
Na2MoO4粉末(純度>98%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で1:99になるように秤量し、スクリュー管に入れ攪拌し、中間層形成塗布液を作製した。目視において完全に溶解していることを確認した。pH試験紙を用いてpHを測定したところ約7を示した。
Na2MoO4粉末(純度>98%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)とを重量比で30:70になるように秤量し、スクリュー管に入れ攪拌し中間層形成塗布液を作製した。pH試験紙を用いて上澄み液のpHを測定したところ約8を示した。
BaMoO4粉末(純度>99.9%、Aldrich製)と超純水(電気抵抗率が15MΩ・cm以上)を重量比で1:99になるように秤量し、スクリュー管に入れ攪拌し溶液を作製した。目視においてBaMoO4粉末がほとんど溶解していないことを確認した。pH試験紙を用いてpHを測定したところ約7を示した。
データフィジックス社(独)社製の型番OCA-20の測定装置を測定に用いた。表面張力の測定は、まずシリンジに溶液を充填して、外径1.4mmの金属針をシリンジに装着し、該金属針から溶液を出し、溶液が金属針から離れる直前の形状を画像解析することによって行った。
実施例3で作製した中間層形成塗布液を用いて有機EL素子を作製した。実施例で作製した有機EL素子の構成は、ガラス基板/ITO薄膜から成る陽極/正孔注入層/電子ブロック層/発光層/電子注入層/陰極であり、これをさらに封止ガラスによって封止した。なお、電子注入層を実施例3で作製した中間層形成塗布液を用いて形成した。
上記電子ブロック層となる高分子化合物1を合成した。まず攪拌翼、バッフル、長さ調整可能な窒素導入管、冷却管、及び温度計を備えるセパラブルフラスコに2,7-ビス(1,3,2-ジオキサボロラン-2-イル)-9,9-ジオクチルフルオレン158.29重量部と、ビス-(4-ブロモフェニル)-4-(1-メチルプロピル)-ベンゼンアミン136.11重量部と、トリカプリルメチルアンモニウムクロリド(ヘンケル社製Aliquat 336)27重量部と、トルエン1800重量部とを仕込み、窒素導入管から窒素を導入しながら、攪拌下90℃まで昇温した。酢酸パラジウム(II)0.066重量部と、トリ(o-トルイル)ホスフィン0.45重量部とを加えた後、17.5%炭酸ナトリウム水溶液573重量部を1時間かけて滴下した。滴下終了後、窒素導入管を液面より引き上げ、還流下7時間保温した後、フェニルホウ酸3.6重量部を加え、14時間還流下保温し、室温まで冷却した。反応液水層を除いた後、反応液油層をトルエンで希釈し、3%酢酸水溶液、イオン交換水で洗浄した。分液油層にN,N-ジエチルジチオカルバミド酸ナトリウム三水和物13重量部を加え4時間攪拌した後、活性アルミナとシリカゲルとの混合カラムに通液し、トルエンを通液してカラムを洗浄した。濾液及び洗液を混合した後、メタノールに滴下して、ポリマーを沈殿させた。得られたポリマー沈殿を濾別し、メタノールで沈殿を洗浄した後、真空乾燥機でポリマーを乾燥させ、ポリマー192重量部を得た。得られたポリマーを高分子化合物1とよぶ。高分子化合物1のポリスチレン換算重量平均分子量は、3.7×105であり、数平均分子量は8.9×104あった。
ポリスチレン換算重量平均分子量及び数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により求めた。GPCの検量線の作成にはポリマーラボラトリーズ社製標準ポリスチレンを使用した。測定する重合体は、約0.02重量%の濃度になるようテトラヒドロフランに溶解させ、GPCに10μL注入した。GPC装置は島津製作所製LC-10ADvpを用いた。カラムは、ポリマーラボラトリーズ社製PLgel 10μm MIXED-Bカラム(300×7.5mm)を2本直列に接続して用い、移動相としてテトラヒドロフランを25℃、1.0mL/minの流速で流した。検出器にUV検出器を用い、228nmの吸光度を測定した。
東京システム開発社製の有機EL測定装置を用いて電流‐電圧‐輝度、発光スペクトルの測定を行なった。本実施例で作製した有機EL素子に約12Vの電圧を印加したところ、正面輝度が1000cd/m2となった。このときの電流密度は0.088A/cm2であり、EL発光スペクトルは460nmにピークを示した。このように、中間層形成塗布液を用いて塗布法によって形成された電子注入層を備える有機EL素子が発光することを確認した。
Claims (11)
- 少なくとも一対の電極と、該一対の電極の間に設けられ、有機物を含む発光層と、電極及び発光層の間に設けられる中間層とを備える有機エレクトロルミネッセンス素子における中間層の形成に用いるための塗布液であって、
アルカリ金属塩を溶解して得られることを特徴とする、上記塗布液。 - 前記アルカリ金属塩が、モリブデン酸、タングステン酸、タンタル酸、ニオブ酸、バナジウム酸、チタン酸、及び亜鉛酸から成る群から選択される少なくとも1種の酸の塩である、請求項1記載の塗布液。
- 前記アルカリ金属塩が、リチウム、ナトリウム、カリウム、ルビジウム及びセシウムから成る群から選択される少なくとも1種の金属の塩である、請求項1又は2記載の塗布液。
- 前記アルカリ金属塩がセシウム塩である、請求項1~3のいずれか1項に記載の塗布液。
- 前記アルカリ金属塩がモリブデン酸セシウムである、請求項1~4のいずれか1項に記載の塗布液。
- アルコール及び/又は水を含む、請求項1~5のいずれか1項に記載の塗布液。
- 界面活性剤を含む、請求項1~6のいずれか1項に記載の塗布液。
- ポリエチレンナフタレートから成る基板に対する接触角が60°以下である、請求項1~7のいずれか1項に記載の中間層形成塗布液。
- 水素イオン指数が7以上13以下である、請求項1~8のいずれか1項に記載の塗布液。
- 少なくとも一対の電極と、該一対の電極の間に設けられ、有機物を含む発光層と、電極及び発光層の間に設けられる中間層とをそれぞれ成膜することで有機エレクトロルミネッセンス素子を製造する方法であって、
請求項1~9のいずれか1項に記載の塗布液を用いて、塗布法によって該中間層を成膜する、上記方法。 - 一対の電極と、
該一対の電極の間に設けられ、有機物を含む発光層と、
電極及び発光層の間に設けられる中間層とを少なくとも備え、
該中間層が、請求項1~9のいずれか1項に記載の塗布液を用いて、塗布法によって形成されている、有機エレクトロルミネッセンス素子。
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JPH0917574A (ja) | 1995-04-27 | 1997-01-17 | Pioneer Electron Corp | 有機エレクトロルミネッセンス素子 |
JPH10270172A (ja) * | 1997-01-27 | 1998-10-09 | Junji Kido | 有機エレクトロルミネッセント素子 |
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JP2000164359A (ja) * | 1998-11-25 | 2000-06-16 | Idemitsu Kosan Co Ltd | 有機エレクトロルミネッセンス素子 |
JP2000243569A (ja) | 1999-02-16 | 2000-09-08 | Pioneer Electronic Corp | 有機エレクトロルミネセンス素子及びその製造方法 |
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Non-Patent Citations (1)
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See also references of EP2273578A4 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011039323A3 (de) * | 2009-09-30 | 2011-06-23 | Osram Opto Semiconductors Gmbh | Organische elektronische vorrichtung und verfahren zu dessen herstellung |
US9520570B2 (en) | 2009-09-30 | 2016-12-13 | Osram Oled Gmbh | Organic electronic device and method for the production thereof |
US11171289B2 (en) * | 2017-05-02 | 2021-11-09 | Lg Chem, Ltd. | Method for manufacturing organic solar cell and organic solar cell manufactured using same |
Also Published As
Publication number | Publication date |
---|---|
US8358061B2 (en) | 2013-01-22 |
EP2273578A1 (en) | 2011-01-12 |
US20110018432A1 (en) | 2011-01-27 |
TW200946604A (en) | 2009-11-16 |
CN101981723A (zh) | 2011-02-23 |
JP2009246124A (ja) | 2009-10-22 |
EP2273578A4 (en) | 2012-01-25 |
JP5515234B2 (ja) | 2014-06-11 |
KR20110000732A (ko) | 2011-01-05 |
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