WO2009118943A1 - ナノインプリントフィルムの製造方法、表示装置及び液晶表示装置 - Google Patents
ナノインプリントフィルムの製造方法、表示装置及び液晶表示装置 Download PDFInfo
- Publication number
- WO2009118943A1 WO2009118943A1 PCT/JP2008/070307 JP2008070307W WO2009118943A1 WO 2009118943 A1 WO2009118943 A1 WO 2009118943A1 JP 2008070307 W JP2008070307 W JP 2008070307W WO 2009118943 A1 WO2009118943 A1 WO 2009118943A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- film
- nanoimprint
- ultraviolet
- display device
- mold
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 33
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 23
- 238000000034 method Methods 0.000 title abstract description 45
- 229920005989 resin Polymers 0.000 claims abstract description 25
- 239000011347 resin Substances 0.000 claims abstract description 25
- 230000001678 irradiating effect Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 35
- 238000011282 treatment Methods 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000003825 pressing Methods 0.000 claims description 2
- 238000009751 slip forming Methods 0.000 claims 1
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000576 coating method Methods 0.000 abstract description 9
- 239000010408 film Substances 0.000 description 206
- 230000006870 function Effects 0.000 description 14
- -1 2-ethylhexyl Chemical group 0.000 description 13
- 239000004372 Polyvinyl alcohol Substances 0.000 description 11
- 229920002451 polyvinyl alcohol Polymers 0.000 description 11
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 11
- 239000012528 membrane Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 7
- 239000003999 initiator Substances 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000002310 reflectometry Methods 0.000 description 6
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000011630 iodine Substances 0.000 description 4
- 239000002105 nanoparticle Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical group OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical group CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229940068984 polyvinyl alcohol Drugs 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000009993 protective function Effects 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical class C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 1
- 229940058015 1,3-butylene glycol Drugs 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical group OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- HMIBQFXWSUBFTG-UHFFFAOYSA-N 1-[4-(diethylamino)phenyl]ethanone Chemical compound CCN(CC)C1=CC=C(C(C)=O)C=C1 HMIBQFXWSUBFTG-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical group CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- SXFJDZNJHVPHPH-UHFFFAOYSA-N 3-methylpentane-1,5-diol Chemical compound OCCC(C)CCO SXFJDZNJHVPHPH-UHFFFAOYSA-N 0.000 description 1
- AZMJPDGTDCGKTI-UHFFFAOYSA-N C(C1=CC=CC=C1)C1=C(C=CC=C1)P(C1=CC=CC=C1)(C(C1=C(C=C(C=C1C)C)C)=O)=O Chemical compound C(C1=CC=CC=C1)C1=C(C=CC=C1)P(C1=CC=CC=C1)(C(C1=C(C=C(C=C1C)C)C)=O)=O AZMJPDGTDCGKTI-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- OFSAUHSCHWRZKM-UHFFFAOYSA-N Padimate A Chemical compound CC(C)CCOC(=O)C1=CC=C(N(C)C)C=C1 OFSAUHSCHWRZKM-UHFFFAOYSA-N 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Chemical group 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- MZVQCMJNVPIDEA-UHFFFAOYSA-N [CH2]CN(CC)CC Chemical group [CH2]CN(CC)CC MZVQCMJNVPIDEA-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 150000001558 benzoic acid derivatives Chemical class 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- 125000006226 butoxyethyl group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical group OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical group OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical group C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical group OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FZUGPQWGEGAKET-UHFFFAOYSA-N parbenate Chemical compound CCOC(=O)C1=CC=C(N(C)C)C=C1 FZUGPQWGEGAKET-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920001223 polyethylene glycol Chemical group 0.000 description 1
- 229920001451 polypropylene glycol Chemical group 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
- B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C2791/00—Shaping characteristics in general
- B29C2791/001—Shaping in several steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
- B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
- B29K2105/24—Condition, form or state of moulded material or of the material to be shaped crosslinked or vulcanised
- B29K2105/243—Partially cured
Definitions
- the present invention relates to a method for producing a nanoimprint film, a display device, and a liquid crystal display device. More specifically, the present invention relates to a method for producing a nanoimprint film suitably used for an antireflection film that reflects light on a display surface at a low reflection, and a display device and a liquid crystal display device that include the nanoimprint film on the display surface.
- the surface of a display such as a cathode ray tube (CRT: Cathode Ray Tube) display, a liquid crystal display (LCD: Liquid Crystal Display), a plasma display (PDP: Plasma Display Panel), an electroluminescence (EL) display, etc. has an anti-scratch function.
- a protective member such as a protective film may be attached to the surface of such a display, and this protective film is required because it also functions as an antireflection film that prevents reflection of external light. Functions can be given at once.
- TAC Tri Acetyl Cellulose
- AG Anti Glare
- the polarizing plate is required to have such a function.
- a TAC film as a base material is unwound from a roll, and then stretched in the longitudinal direction and / or the transverse direction, and iodine molecules are adsorbed and oriented in the stretched direction.
- PVA Poly Vinyl Alcohol
- a means for embossing to provide unevenness on the surface of the TAC film is known (for example, see Patent Document 1).
- the stretched PVA film functions as a polarizing film.
- the moth-eye structure has a structure in which the period of unevenness is controlled to be less than or equal to the wavelength of visible light, that is, nano-sized (several tens to several hundreds of nanometers). Since the refractive index can be continuously changed along the depth of the unevenness, the reflection of light on the display surface can be reduced.
- a technique of transferring a shape by pressing nano-sized concavo-convex engraved in a mold against a resin material applied on a substrate a so-called nanoimprint technique is currently attracting attention.
- the nanoimprint technology include thermal nanoimprint technology, UV (Ultraviolet) nanoimprint technology, and the like.
- UV nanoimprint technology for example, a thin film of an ultraviolet curable resin is formed on a transparent substrate, a mold having nano-sized irregularities is pressed on the thin film to form irregularities on the thin film, and then ultraviolet rays are irradiated.
- the thin film is cured to form a nanoimprint film having an inverted mold shape on a transparent substrate.
- iodine normally added to a polarizing film deteriorates when irradiated with ultraviolet rays. Therefore, as a measure for preventing deterioration, it is conceivable to protect iodine adsorbed and oriented on the PVA film from ultraviolet rays by incorporating an ultraviolet absorber into the polarizing plate. Moreover, if an ultraviolet absorber can be added with respect to support members, such as a TAC film at this time, the support member which has ultraviolet-ray absorption ability can be obtained.
- the polarizing plate has an ultraviolet absorbing ability as described above, when the ultraviolet ray is irradiated from the opposite side of the side where the fine unevenness pattern is formed as in the method described in Patent Document 2, the polarized light is polarized. Since the ultraviolet rays are absorbed by the plate, the UV nanoimprint technique using an ultraviolet curable resin as a material for the concave-convex pattern cannot be used. Here, a method of irradiating ultraviolet rays from the side on which the fine concavo-convex pattern is formed is also conceivable. However, since the irradiation of ultraviolet rays is usually performed simultaneously with the press-contact of the mold having the concavo-convex pattern, the mold is transparent. It is essential to have sex.
- This invention is made
- the inventors of the present invention studied various methods for producing a nanoimprint film using ultraviolet rays, applied a curable resin on a substrate to form a film, and provided unevenness on the surface of the applied film. Focusing on a series of steps to cure the film provided with unevenness, in order to obtain uniform unevenness in the conventional method and obtain highly accurate unevenness, it is necessary to cure the resin film at the same time as forming the unevenness I found something that happened. On the other hand, when applying the resin film on the substrate, the inventors first applied the resin in a relatively low viscosity state so that the film can be formed with a uniform film thickness on the substrate.
- the present invention is a method for producing a nanoimprint film having nanometer-sized irregularities formed on a substrate, the method comprising producing a UV curable composition on a substrate containing an ultraviolet absorbing component.
- It is a manufacturing method of a nanoimprint film including a third step of forming a film having an uneven surface and a fourth step of performing a curing treatment on the film having an uneven surface to obtain a nanoimprint film.
- nanoimprint film produced by the present invention has nanometer-sized irregularities on the surface.
- “nanometer-sized unevenness” refers to an uneven shape in which the width between vertices of adjacent unevenness is in nanometer units, that is, 1 nm or more and less than 1000 nm.
- the lateral width between the vertices of adjacent irregularities is the lower limit of the visible light wavelength, that is, 380 nm or less, and by doing so, for example, a nanoimprint film capable of reducing reflected light on the display surface of the display device Obtainable.
- the manufacturing method of the nanoimprint film of this invention includes the 1st process of apply
- ultraviolet rays refers to electromagnetic waves having a wavelength range of 1 to 400 nm
- the ultraviolet absorbing component used in the present invention is a component having an absorption maximum around this wavelength range (1 to 420 nm).
- the production method of the present invention is particularly preferably used when the base material contains an ultraviolet absorbing component and thus the base material has ultraviolet non-transmissibility.
- ultraviolet impermeability is improved.
- a film is formed by applying an ultraviolet curable resin on such a substrate.
- the resin to be applied is preferably prepared so as to have a viscosity enough to uniformly apply the film.
- the manufacturing method of the nanoimprint film of this invention includes the 2nd process of irradiating an ultraviolet-ray from the surface side of the said film
- the viscosity of the film applied on the substrate can be increased, and the accuracy when forming irregularities on the film surface in the subsequent process is significantly increased.
- the imprint method of irradiating ultraviolet rays it is not necessary to consider thermal expansion, thermal contraction, etc., as compared with the case of imprinting by performing a thermosetting treatment. Moreover, since it is not necessary to consider the heating and cooling time, the process time can be shortened.
- the manufacturing method of the nanoimprint film of this invention includes the 3rd process of performing uneven
- the size of the unevenness of the nanoimprint film is defined.
- the mold is not limited to a metal material, and is not particularly limited as long as nano-sized irregularities can be formed on the surface of the film.
- the manufacturing method of the nanoimprint film of this invention includes the 4th process of performing a hardening process to the film
- the shape of the unevenness transferred by the mold is fixed, and the nanoimprint film is completed.
- a method of performing heat treatment is used.
- the resin has curability with respect to light other than ultraviolet light, for example, visible light, a method of irradiating light having a wavelength range of visible light may be used.
- visible light refers to electromagnetic waves having a wavelength range of 380 to 780 nm.
- the configuration of the production method of the present invention is not particularly limited as long as such components are formed as essential, and other components may or may not be included. .
- the present invention is particularly preferably used when a mold is used as the unevenness treatment and the mold is made of a material that blocks ultraviolet rays.
- the light shielding means reflecting or absorbing light.
- a material that blocks ultraviolet rays may be used as the mold material. Therefore, for example, a metal that can be easily processed such as aluminum, tantalum, titanium, or silicon can be used as a material constituting the mold, thereby reducing costs compared to, for example, using expensive quartz. Is possible.
- a metal that is easy to process a nanoimprint film having a high-precision uneven shape can be easily produced.
- the mold is a cylindrical body having nanometer-size irregularities formed on the outer peripheral surface, and in the third step, the rotating mold is pressed against the surface of the semi-cured film, and the nanometer-size irregularities are formed. It is preferable to form continuously on the film surface. Since the present invention relates to a technique for processing the surface of the film, for example, unwinding the film wound around a roll, it is preferable in terms of production efficiency that the unevenness treatment is continuously performed on the film surface, Therefore, as a member that performs unevenness processing, a cylindrical body with nanometer-sized unevenness formed on the outer peripheral surface can be used to press the unevenness against the film surface while rotating it, and the uneven shape can be transferred to the film Is efficient.
- a seamless (seamless) surface structure can be formed.
- a mold having such nanometer-sized projections and depressions can be obtained by using, for example, a method using anodization and etching, an electron beam (EB) drawing method using an electron beam, an electron beam lithography method, a stepper exposure method, and the like.
- EB electron beam
- a highly accurate product can be manufactured.
- a conical shape and a pyramid shape are exemplified. As a result, a film whose refractive index gradually changes at a constant rate is produced.
- the substrate preferably has a support member containing an ultraviolet absorbing component and a polarizing element. Since the substrate has a polarizing element containing iodine, the nanoimprint film obtained in the present invention can be used as an antireflection film disposed on the surface of the LCD, and the support member contains an ultraviolet absorbing component. Therefore, the protective function for the polarizing element is fulfilled.
- the present invention is also an invention of a display device provided with a nanoimprint film obtained by the production method of the present invention on a display surface.
- a display device that is excellent in low reflectivity and has little reflection of external light can be obtained.
- Examples of the display device of the present invention include display devices such as CRT, LCD, PDP, and EL.
- the present invention is also a display device including a nanoimprint film formed on a substrate and having nanometer-sized irregularities on the surface, wherein the substrate includes an ultraviolet absorbing component, and the nanoimprint film has a surface side. It is also a display device that has been cured by only irradiation with ultraviolet rays.
- the nanoimprint film included in the display device of the present invention is made of a material that is cured by ultraviolet irradiation, and the substrate on which the nanoimprint film is formed contains an ultraviolet absorbing component. Therefore, when such a nanoimprint film is cured by ultraviolet irradiation from the back surface, it is difficult to obtain a good film.
- the display device of the present invention has a nanoimprint film formed only by ultraviolet irradiation from the surface side, so that a high-quality film is obtained and excellent in low reflectivity. Moreover, since the base material itself has an ultraviolet absorbing function, a thin surface base material can be produced. Therefore, it can be said that the display device of the present invention is a display device having an ultraviolet absorbing function and low reflectivity and having a thin surface base material.
- the present invention is also a liquid crystal display device including a pair of substrates and a liquid crystal layer sandwiched between the pair of substrates, wherein one of the pair of substrates includes a base material and nanostructures formed on the base material.
- the display surface side surface is provided with a nanoimprint film having irregularities of metric size on the surface
- the substrate has a support member containing an ultraviolet absorbing component, and a polarizing element
- the nanoimprint film has ultraviolet rays from the surface side.
- the polarizing plate normally provided in the liquid crystal display device is preferably configured to include a base material having an ultraviolet absorbing component from the viewpoint of the protective function of the polarizing element.
- the nanoimprint film provided in the liquid crystal display device of the present invention is made of a material that is cured by ultraviolet irradiation, and the substrate on which the nanoimprint film is formed contains an ultraviolet absorbing component. Therefore, when such a nanoimprint film is cured by ultraviolet irradiation from the back surface, it is difficult to obtain a good film.
- the liquid crystal display device of the present invention since the liquid crystal display device of the present invention has a nanoimprint film formed only by ultraviolet irradiation from the surface side, a high-quality film is obtained and is excellent in low reflectivity.
- the base material itself has an ultraviolet absorption function, a thin polarizing plate can be produced. Therefore, it can be said that the liquid crystal display device of the present invention is a liquid crystal display device having a polarizing element protection function and low reflectivity and having a thin polarizing plate.
- the UV nanoimprint method can be used without performing backside exposure, it is easy even if the substrate on which the nanoimprint film material is applied absorbs ultraviolet rays. In addition, it is possible to produce a nanoimprint film having high-precision irregularities.
- Example 1 shows an example of a method for producing a nanoimprint film of the present invention.
- FIG. 1 is a schematic diagram showing a manufacturing process of the nanoimprint film produced in Example 1.
- FIG. The manufacturing method of the nanoimprint film in Example 1 will be described below step by step.
- a base material for forming a nanoimprint film is prepared.
- the substrate is a polarizing plate used for a liquid crystal display device or the like.
- FIG. 2 is a schematic cross-sectional view of a polarizing plate used in Example 1.
- the polarizing plate (base material) 20 includes a first TAC film 21 that is one supporting member, a PVA film 22 that is a polarizing element, and a second TAC that is the other supporting member.
- the film 23 has a film structure in which three layers are laminated.
- the PVA film 22 is stretched in the horizontal direction and / or the vertical direction, and iodine is adsorbed and oriented in the stretching direction on the surface of the PVA film 22.
- At least one of the first TAC film 21 and the second TAC film 23 contains an ultraviolet absorber, and when irradiated with ultraviolet rays having a wavelength range of 1 to 400 nm, at a wavelength at the absorption maximum. Absorbs 50% or more of the ultraviolet irradiation amount (J / cm 2 ).
- both the first TAC film 21 and the second TAC film 23 contain an ultraviolet absorber, and both absorb ultraviolet rays at the above ratio.
- Examples of the ultraviolet absorber include organic compounds such as benzophenone compounds, benzotriazole compounds, benzoate compounds, and triazine compounds, and metal oxides such as silicon oxide, titanium oxide, and tin oxide.
- Such an ultraviolet absorber is present in the TAC film in the form of fine particles, for example.
- a polarizing plate 20 is wound into a roll shape, and can be unwound by rotating the base film roll 11.
- the resin material applied in Example 1 is composed of a resin that has a property of being cured when irradiated with ultraviolet rays (ultraviolet curable).
- a resin that has a property of being cured when irradiated with ultraviolet rays (ultraviolet curable).
- a monomer that absorbs ultraviolet rays to initiate polymerization, or ultraviolet rays alone are used. Even if absorbed, polymerization does not start, but a photopolymerization initiator is added, and the photopolymerization initiator absorbs ultraviolet rays and can be used as an active species to initiate polymerization. Initiators, photosensitizers and the like may be added. Examples of the photopolymerization reaction that occurs at this time include radical polymerization and cationic polymerization.
- radical polymerization for example, monofunctional (meth) acrylate and / or polyfunctional (meth) acrylate is used as a polymerizable monomer component, and a radical reaction is initiated by a photopolymerization initiator.
- Examples of monofunctional (meth) acrylates include methyl, ethyl, propyl, butyl, amyl, 2-ethylhexyl, octyl, nonyl, dodecyl, hexadecyl, octadecyl, cyclohexyl, benzyl, methoxyethyl, butoxyethyl, phenoxyethyl, nonylphenoxy Ethyl, tetrahydrofurfuryl, glycidyl, 2-hydroxyethyl, 2-hydroxypropyl, 3-chloro-2-hydroxypropyl, dimethylaminoethyl, diethylaminoethyl, nonylphenoxyethyl tetrahydrofurfuryl, caprolactone modified tetrahydrofurfuryl, isobornyl, di (Meth) acrylate having a substituent such as cyclopentanyl, dicycl
- polyfunctional (meth) acrylate examples include 1,3-butylene glycol, 1,4-butanediol, 1,5-pentanediol, 3-methyl-1,5-pentanediol, 1,6-hexanediol, Having a substituent such as neopentyl glycol, 1,8-octanediol, 1,9-nonanediol, tricyclodecane dimethanol, ethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, polypropylene glycol ( And (meth) acrylate.
- photopolymerization initiator examples include benzoin isobutyl ether, 2,4-diethylthioxanthone, 2-isopropylthioxanthone, benzyl 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2-benzyl-2-dimethylamino-1 -(4-morpholinophenyl) -butan-1-one, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide and the like.
- photosensitizer examples include trimethylamine, methyldimethanolamine, triethanolamine, p-diethylaminoacetophenone, ethyl p-dimethylaminobenzoate, isoamyl p-dimethylaminobenzoate, N, N-dimethylbenzylamine and 4 And 4'-bis (diethylamino) benzophenone.
- an epoxy resin containing a cationic polymerization type photopolymerization initiator is used.
- the epoxy resin include bisphenol A-epichlorohydrin type, long chain aliphatic type, glycidyl ester type, glycidyl ether type, alicyclic, brominated, heterocyclic type and the like.
- the cationic polymerization type photopolymerization initiator include sulfonium salts, iodonium salts, diazonium salts and the like.
- the resin material applied at this time preferably has a viscosity that can form the film 30 with a substantially uniform thickness over the entire base film 20, for example, using an organic solvent or the like. It is preferable to proceed to the coating step after the viscosity is properly adjusted by adjusting the viscosity.
- the resin material to be applied is also preferably a material whose viscosity can be easily adjusted by irradiation with ultraviolet rays 13. This improves manufacturing efficiency.
- a preferable viscosity range for uniform application is 1 ⁇ 10 ⁇ 3 to 1 (Pa ⁇ s). By setting it as such a range, a good quality film with little film thickness nonuniformity can be produced.
- the light source a fluorescent lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, or the like can be used. The light source is appropriately changed according to the material used.
- the base film 20 has a characteristic of absorbing the ultraviolet rays 13, the irradiation of the ultraviolet rays 13 is performed from the surface side of the film 30 in this step. This treatment can be performed at room temperature.
- Irradiation with ultraviolet rays 13 causes photopolymerization within the ultraviolet curable resin film and proceeds with curing, so that the viscosity of the applied film 30 is improved.
- the process of completely curing the film 30 is not performed, but only semi-curing is performed.
- the degree of curing at this time is preferably set so that 40 to 60% by weight of the entire resin is cured so that the next uneven treatment can be performed satisfactorily. Since an appropriate value of the irradiation amount of the ultraviolet ray 13 varies depending on the material used, for example, it is set appropriately by using it as a reference value according to the irradiation conditions of 300 to 3000 J / cm 2 for irradiation in the following fourth step.
- the material of the film 30 is preferably a material whose viscosity can be controlled by the amount of ultraviolet irradiation. Moreover, it is preferable that it is a material with a fixed width
- the mold roll 15 is a cylindrical body having a conical (cone shape) or pyramid-shaped unevenness with a width between vertices of 50 to 500 nm and a depth of 50 to 1000 nm formed on the outer peripheral surface.
- the depth of the mold roll 15 is 50 to 500 nm.
- the depth of the mold roll and the depth of the unevenness formed on the film may differ depending on the type of the release agent used for improving the releasability during imprinting.
- the dimensions of the cylinder are, for example, an inner diameter of 250 mm, an outer diameter of 260 mm, and a length of 400 mm.
- such a mold roll 15 is obtained by cutting and polishing a cylindrical aluminum tube produced by extrusion, and then performing aluminum anodic oxidation and etching on the smooth aluminum surface of the obtained polished aluminum tube. It can produce by repeating 3 times.
- the mold roll 15 is produced by simultaneously anodizing and etching the outer periphery of a cylindrical aluminum tube, and has a seamless (seamless) structure. Therefore, according to such a mold roll, seamless nanometer-sized irregularities can be continuously transferred to the film 30.
- a cylindrical pinch roll 16 is disposed at a position where the base film 20 is in contact with the outer peripheral surface of the mold roll 15 so as to face the outer peripheral surface of the mold roll 15. At this position, the base film 20 is sandwiched between the mold roll 15 and the pinch roll 16, and the mold roll 15 and the film 30 are pressed and adhered, whereby the surface shape of the mold roll 15 is transferred to the surface of the film 30. As a result, a film 40 having irregularities on the surface is formed.
- the width of the base film 20 is smaller than the length of the mold roll 15 and the pinch roll 16.
- the pinch roll 16 is made of rubber. After the concavo-convex shape is transferred to the surface of the film 30, the base film 20 proceeds toward the pinch roll 17 along the outer peripheral surface of the mold roll 15, and proceeds to the next step through the pinch roll.
- irradiation with ultraviolet rays 18 is performed as a curing process.
- the amount of ultraviolet irradiation at the time of curing needs to be appropriately changed depending on the material used, but is usually in the range of 300 to 3000 (mJ / cm 2 ).
- the curing treatment performed at this time is preferably performed by ultraviolet irradiation as in the second step because the material of the film 40 has ultraviolet curing properties.
- the base film 20 has the characteristic which absorbs an ultraviolet-ray in Example 1, the irradiation of the ultraviolet-ray 18 is performed from the surface side of the film
- the irradiation with the ultraviolet rays 18 is preferably performed in a nitrogen atmosphere.
- the type of curing treatment is not particularly limited.
- the material of the film 40 when the material of the film 40 has thermosetting properties, it may be cured by heat treatment, and the material of the film 40 has visible light curing properties. If it has, it may be cured by irradiation with visible light. Therefore, in the fourth step, a plurality of these treatments may be performed in combination.
- the material of the film 40 preferably has both ultraviolet curable properties and thermosetting properties.
- the process of performing the irradiation of the light which has the wavelength range of both an ultraviolet-ray and visible light performed combining ultraviolet irradiation and a heating, combining visible light irradiation and a heating, is mentioned. Thereby, it becomes possible to shorten process time.
- the film 40 is cured, the uneven shape formed on the surface is fixed, so that the nanoimprint film is completed.
- the lamination film supplied from the lamination film roll 51 is bonded to the surface side of the film 40 by the pinch roll 52.
- the laminated film 50 of the base film, the nanoimprint film, and the lamination film is wound to produce the laminated film roll 53.
- FIG. 3 is a schematic cross-sectional view of the nanoimprint film produced in Example 1.
- (A) is the cross-sectional structure of a nanoimprint film
- (b) shows the refractive index of the light which injects into a nanoimprint film.
- the nanoimprint film 40 produced in Example 1 is composed of a bottom surface portion 41 on which unevenness is not formed and a nanometer-sized uneven portion 42 formed on the surface.
- the shape of each of the irregularities is a tapered pyramid shape or a cone shape.
- Such a concavo-convex portion 42 is formed with a width between adjacent concavo-convex vertices of 50 to 500 nm.
- the reflectance on the film surface can be greatly reduced by adjusting the width between the apexes of the adjacent irregularities.
- the height of the unevenness is 50 to 500 nm. By setting it as this range, the reflectance on the film surface can be greatly reduced.
- the nanoimprint film 40 produced in Example 1 can realize low reflection. As light travels from one medium to another, it refracts at the interface of these media. The degree of refraction is determined by the refractive index of the medium through which light travels. For example, it has a refractive index of about 1.0 for air and about 1.5 for resin. As described above, in Example 1, the unevenness 42 formed on the surface of the nanoimprint film 40 has a pyramidal or conical shape, that is, gradually increases in width toward the tip of the unevenness. It has a shape that becomes smaller. Therefore, as shown in FIG.
- the refractive index of the film constituting material (from about 1.0 for the resin) from the refractive index of air is about 1.0. Up to 5), it can be considered that the refractive index continuously increases gradually. Since the amount of reflected light is proportional to the difference in refractive index between the media, the reflectance on the film surface can be greatly reduced by making the light refractive interface virtually non-existent in this way. .
- Such a surface structure is generally called a “moth eye structure”.
- the polarizing plate (laminated film) 50 includes a first TAC film 21 that is one supporting member, a PVA film 22 that is a polarizing element, and a second supporting member that is the other supporting member.
- the TAC film 23 and the nanoimprint film 40 having nanometer-sized irregularities on the surface thereof are laminated.
- a polarizing plate 50 is, for example, a liquid crystal capable of reducing reflection of external light on the display surface by disposing the nanoimprint film on the display surface of the liquid crystal display device so that the nanoimprint film is positioned on the display surface side.
- the liquid crystal display device can be a display device.
- an array substrate, a liquid crystal layer, and a color filter substrate are arranged in this order toward the display surface, and a polarizing plate is provided on each surface of the array substrate and the color filter substrate.
- the nanoimprint film as the antireflection film is attached to the surface of the polarizing plate on the color filter substrate on the display surface side.
- the TAC films 21 and 23 as the base material themselves have an ultraviolet absorption function, the thickness of the polarizing plate 50 is thin, and the entire apparatus is thinned.
- the liquid crystal display device produced in Example 1 is a liquid crystal display device that has a polarizing element protection function and low reflectivity, and has a thin polarizing plate (surface base material).
- FIG. 3 is a schematic diagram illustrating a manufacturing process of a nanoimprint film produced in Example 1.
- FIG. 1 is a schematic cross-sectional view of a polarizing plate used in Example 1.
- FIG. It is a cross-sectional schematic diagram of the nanoimprint film produced in Example 1, (a) shows the cross-sectional structure of a nanoimprint film, (b) shows the refractive index of the light which injects into a nanoimprint film.
- 1 is a schematic cross-sectional view showing a polarizing plate provided with a nanoimprint film produced in Example 1.
- Base film roll 12 Die coater 13: Ultraviolet ray (second step) 14, 16, 17, 52: Pinch roll 15: Mold roll 18: Ultraviolet light (fourth step)
Abstract
Description
実施例1では、本発明のナノインプリントフィルムの製造方法の一例を示す。図1は、実施例1で作製されるナノインプリントフィルムの製造工程を示す模式図である。実施例1におけるナノインプリントフィルムの製造方法について、以下、順を追って説明する。
まず、ナノインプリントフィルムを形成するための基材を準備する。実施例1において基材は液晶表示装置等に用いられる偏光板である。図2は、実施例1で用いられる偏光板の断面模式図である。図2に示すように、偏光板(基材)20は、一方の支持部材である第一のTACフィルム21、偏光素子であるPVAフィルム22、及び、もう一方の支持部材である第二のTACフィルム23の3つの層が積層されたフィルム構造を有している。PVAフィルム22は、横方向及び/又は縦方向に延伸されており、PVAフィルム22表面にはヨウ素が延伸方向に吸着配向されている。第一のTACフィルム21及び第二のTACフィルム23の少なくとも一方には紫外線吸収剤が含有されており、1~400nmの波長域を有する紫外線が照射されたときに、その吸収極大での波長において、紫外線照射量(J/cm2)の50%以上を吸収する。好ましくは、第一のTACフィルム21及び第二のTACフィルム23のいずれもが紫外線吸収剤を含有しており、いずれもが上記割合で紫外線を吸収する。紫外線吸収剤としては、例えば、ベンゾフェノン系化合物、ベンゾトリアゾール系化合物、ベンゾエート系化合物、トリアジン系化合物などの有機化合物、酸化ケイ素、酸化チタン、酸化スズ等の金属酸化物等が挙げられる。このような紫外線吸収剤は、例えば、微粒子の状態でTACフィルム内に存在する。図1に示すように、実施例1においてこのような偏光板20は、巻き付けられてロール状となっており、その基材フィルムロール11を回転させることで巻き出すことができる。
まず、基材フィルムロール11を回転させつつ基材フィルムロール11から、ベルト状の基材フィルム20を図1中の矢印の方向に送り出す。次に、基材フィルム20に対しダイコーター12を用いて樹脂材料を塗布し、膜30を形成する。塗布方法としては、その他にスリットコーター、グラビアコーター等を用いる方法が挙げられる。
続いて、塗布した状態の膜30に対し、膜30の粘度を高めるための紫外線13照射を行う。光源としては、蛍光ランプ、低圧水銀ランプ、高圧水銀ランプ、キセノンランプ、メタルハライドランプ等を用いることができる。光源は、用いる材料に応じて適宜変更する。実施例1において基材フィルム20は、紫外線13を吸収する特性を有しているため、この工程において紫外線13の照射は、膜30の表面側から行われる。この処理は室温で行うことができる。紫外線13の照射によって、紫外線硬化性樹脂膜内では光重合が起こり、硬化が進むため、塗布した膜30の粘度が向上する。ここでは、膜30を完全に硬化させる処理は行わず、半硬化させるにとどめる。このときの硬化の度合いとしては、次の凹凸処理が良好に行われるように、樹脂全体の40~60重量%が硬化する条件とすることが好ましい。紫外線13の照射量は、用いる材料によって適切な値が異なるため、例えば、下記第四工程で照射を行う300~3000J/cm2の照射条件に合わせてそれを基準値とし、適宜設定を行う。したがって、膜30の材料は、紫外線照射量によって粘度を制御することが可能な材料であることが好ましい。また、硬化するための紫外線照射量に一定の幅をもつ材料であることが好ましい。なお、膜30の材料が嫌気性を有する場合には、紫外線13の照射は、窒素雰囲気下で行うことが好ましい。
続いて、基材フィルム20は、ピンチロール14を介して円筒状の金型ロール15へと進み、金型ロール15の外周面に沿って半周分移動する。このとき、基材フィルム20に塗布された膜30が金型ロールの外周面と接する。金型ロール15は、頂点間の幅が50~500nmであり、かつ深さが50~1000nmの円錐状(コーン形状)又は角錐状の複数の凹凸が外周面に形成された円筒体である。好ましくは、金型ロール15の深さは50~500nmである。なお、インプリント時の離型性を高めるために用いられる離型剤の種類によって、金型ロールの深さと、膜に形成される凹凸の深さとが異なることがある。円筒の寸法は、例えば、内径250mm、外径260mm、長さ400mmである。このような金型ロール15は、例えば、押出加工により作製された円筒状のアルミニウム管を切削研磨した後、得られた研磨アルミニウム管の平滑なアルミニウム表面に対し、アルミニウムの陽極酸化とエッチングとを3回繰り返し実施することにより作製することができる。金型ロール15は、円筒状のアルミニウム管の外周を同時に陽極酸化及びエッチングして作製されたものであり、継ぎ目のない(シームレスな)構造を有する。したがって、このような金型ロールによれば、膜30に対し、継ぎ目のないナノメートルサイズの凹凸を連続的に転写することができる。
続いて、凹凸面を有する膜40に対し硬化処理を行う。実施例1においては、硬化処理として紫外線18の照射を行う。硬化処理を行う際の紫外線照射量は、用いる材料によって適宜変更する必要があるが、通常、300~3000(mJ/cm2)の範囲である。このとき行う硬化処理は、膜40の材料が紫外線硬化性を有するため、第二工程と同様、紫外線照射によって行うことが好ましい。また、実施例1において基材フィルム20は、紫外線を吸収する特性を有しているため、第二工程と同様、紫外線18の照射は、膜40の表面側から行う。膜40の材料が嫌気性を有する場合には、紫外線18の照射は、窒素雰囲気下で行うことが好ましい。
12:ダイコーター
13:紫外線(第二工程)
14、16、17、52:ピンチロール
15:金型ロール
18:紫外線(第四工程)
20:基材フィルム、偏光板(基材)
21:第一のTACフィルム
22:偏光素子
23:第二のTACフィルム
30:膜(第一工程で塗布された状態)
40:膜(第三工程で表面に凹凸が形成された状態)、ナノインプリントフィルム
41:底面部位
42:凹凸部位
50:積層フィルム、偏光板
51:ラミネーションフィルムロール
53:積層フィルムロール
Claims (9)
- 基材上に形成された、ナノメートルサイズの凹凸を表面に有するナノインプリントフィルムの製造方法であって、
該製造方法は、紫外線吸収成分を含む基材上に、紫外線硬化性を有する樹脂を塗布して膜を形成する第一工程と、
該膜の表面側から紫外線を照射し、半硬化した膜を形成する第二工程と、
該半硬化した膜の表面に凹凸処理を行い、凹凸面を有する膜を形成する第三工程と、
該凹凸面を有する膜に硬化処理を行い、ナノインプリントフィルムを得る第四工程とを含む
ことを特徴とするナノインプリントフィルムの製造方法。 - 前記第三工程では、金型を膜の表面に押し当てることを特徴とする請求項1記載のナノインプリントフィルムの製造方法。
- 前記第四工程では、凹凸面を有する膜の表面側から紫外線を照射することを特徴とする請求項1又は2記載のナノインプリントフィルムの製造方法。
- 前記金型は、紫外線を遮光する材料で構成されていることを特徴とする請求項2又は3記載のナノインプリントフィルムの製造方法。
- 前記金型は、外周面にナノメートルサイズの凹凸が形成された円筒体であり、
前記第三工程では、半硬化した膜の表面に対し回転する金型を押し当て、ナノメートルサイズの凹凸を膜表面に連続的に形成することを特徴とする請求項2~4のいずれかに記載のナノインプリントフィルムの製造方法。 - 前記基材は、紫外線吸収成分を含む支持部材と、偏光素子とを有することを特徴とする請求項1~5のいずれかに記載のナノインプリントフィルムの製造方法。
- 請求項1~6のいずれかに記載の製造方法で作製されたナノインプリントフィルムを表示面に備えることを特徴とする表示装置。
- 基材上に形成された、ナノメートルサイズの凹凸を表面に有するナノインプリントフィルムを備える表示装置であって、
該基材は、紫外線吸収成分を含み、
該ナノインプリントフィルムは、表面側からの紫外線照射のみで硬化処理されたものであることを特徴とする表示装置。 - 一対の基板及び該一対の基板に挟持された液晶層を備える液晶表示装置であって、
該一対の基板の一方は、基材、及び、該基材上に形成されたナノメートルサイズの凹凸を表面に有するナノインプリントフィルムを表示面側の表面に備え、
該基材は、紫外線吸収成分を含む支持部材と、偏光素子とを有し、
該ナノインプリントフィルムは、表面側からの紫外線照射のみで硬化処理されたものである
ことを特徴とする液晶表示装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2008801226046A CN101909858A (zh) | 2008-03-24 | 2008-11-07 | 纳米压印薄膜的制造方法、显示装置以及液晶显示装置 |
JP2010505267A JP4964985B2 (ja) | 2008-03-24 | 2008-11-07 | ナノインプリントフィルムの製造方法 |
US12/735,298 US8384862B2 (en) | 2008-03-24 | 2008-11-07 | Production method of nanoimprint film, display device, and liquid crystal display device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008076473 | 2008-03-24 | ||
JP2008-076473 | 2008-03-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009118943A1 true WO2009118943A1 (ja) | 2009-10-01 |
Family
ID=41113166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/070307 WO2009118943A1 (ja) | 2008-03-24 | 2008-11-07 | ナノインプリントフィルムの製造方法、表示装置及び液晶表示装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8384862B2 (ja) |
JP (1) | JP4964985B2 (ja) |
CN (1) | CN101909858A (ja) |
WO (1) | WO2009118943A1 (ja) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010243908A (ja) * | 2009-04-08 | 2010-10-28 | Toshiba Mobile Display Co Ltd | 液晶表示装置 |
JP2011238721A (ja) * | 2010-05-10 | 2011-11-24 | Toray Eng Co Ltd | インプリント加工装置、インプリント加工方法およびインプリント加工物 |
JP2011247918A (ja) * | 2010-05-24 | 2011-12-08 | Kri Inc | 低屈折率膜及び反射防止膜 |
WO2012063948A1 (ja) * | 2010-11-12 | 2012-05-18 | 株式会社日立ハイテクノロジーズ | 金型の微細パターン面清掃方法とそれを用いたインプリント装置 |
JP2012150460A (ja) * | 2010-12-27 | 2012-08-09 | Sumitomo Chemical Co Ltd | 光学フィルムの製造方法、偏光板および画像表示装置 |
KR20120112078A (ko) * | 2011-03-29 | 2012-10-11 | 스미또모 가가꾸 가부시키가이샤 | 광학 필름의 제조 방법, 편광판 및 화상 표시 장치 |
JP2012204375A (ja) * | 2011-03-23 | 2012-10-22 | Waseda Univ | 微細パターンを表面に有する物品の製造方法 |
JP2014115403A (ja) * | 2012-12-07 | 2014-06-26 | Asahi Kasei E-Materials Corp | 複合型機能性フィルムの製造方法 |
JP2014151626A (ja) * | 2013-02-13 | 2014-08-25 | Hikari Kinzoku Kogyosho:Kk | 樹脂成形品の製造方法 |
WO2015136734A1 (ja) * | 2014-03-14 | 2015-09-17 | シャープ株式会社 | 光学素子及び表示装置 |
CN107323118A (zh) * | 2017-07-06 | 2017-11-07 | 华南理工大学 | 一种uv固化预处理银导电薄膜的制备方法 |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20100064215A (ko) * | 2008-12-04 | 2010-06-14 | 삼성전자주식회사 | 표시 장치 |
US20110244187A1 (en) * | 2010-04-06 | 2011-10-06 | Modilis Holdings Llc | Internal Cavity Optics |
ES2728251T3 (es) * | 2011-05-10 | 2019-10-23 | Csem Ct Suisse Delectronique Microtechnique Sa Rech Developpement | Dispositivo óptico que comprende al menos un polarizador con una estructura submicrométrica antirreflectante |
CN102162869A (zh) * | 2011-05-17 | 2011-08-24 | 河南三阳光电有限公司 | 一种柱镜光栅的制备工艺 |
TWI494619B (zh) * | 2011-06-09 | 2015-08-01 | Innolux Corp | 液晶顯示裝置 |
KR20140088171A (ko) * | 2011-10-25 | 2014-07-09 | 유니-픽셀 디스플레이스, 인코포레이티드 | Uv 경화의 최적화 |
CN104133264A (zh) * | 2013-05-02 | 2014-11-05 | 罗伯特·彼得科维奇 | 制备偏光片的方法 |
CN104133263A (zh) * | 2013-05-02 | 2014-11-05 | 罗伯特·彼得科维奇 | 偏光片的制备方法 |
CN104167949B (zh) * | 2013-05-16 | 2016-03-23 | 纳米新能源(唐山)有限责任公司 | 摩擦发电机的制造方法及摩擦发电机 |
KR20170129195A (ko) | 2015-07-24 | 2017-11-24 | 후아웨이 테크놀러지 컴퍼니 리미티드 | 카메라 모듈 및 단말기 |
JP6809824B2 (ja) * | 2016-07-04 | 2021-01-06 | 日東電工株式会社 | 光学積層体の製造方法、および光学積層体中間体 |
CN107300807A (zh) * | 2017-06-01 | 2017-10-27 | 武汉华星光电技术有限公司 | 一种光学元件、液晶显示模组及蛾眼微结构的制备方法 |
CN109426013B (zh) * | 2017-08-23 | 2020-06-23 | 京东方科技集团股份有限公司 | 一种彩膜基板缺陷的分析方法、检测修复方法及装置 |
CN108177453A (zh) * | 2018-02-07 | 2018-06-19 | 江苏劲嘉新型包装材料有限公司 | 立体凹凸纹的印刷方法 |
WO2020075561A1 (ja) * | 2018-10-12 | 2020-04-16 | 大日本印刷株式会社 | 化粧板、透明性樹脂フィルム及び化粧板の製造方法 |
US20220024113A1 (en) * | 2018-12-03 | 2022-01-27 | Jesus Francisco Barberan Latorre | Method and device for obtaining a raised pattern on a substrate |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264520A (ja) * | 2000-03-16 | 2001-09-26 | Dainippon Printing Co Ltd | 反射防止フィルム、偏光素子、および表示装置、ならびに反射防止フィルムの製造方法 |
JP2004205990A (ja) * | 2002-12-26 | 2004-07-22 | Dainippon Printing Co Ltd | 反射防止性能を有する微細凹凸パターンの作製方法及び反射防止物品 |
JP2006039450A (ja) * | 2004-07-30 | 2006-02-09 | Seiko Epson Corp | 反射防止膜の形成方法、反射防止膜の形成装置、反射防止膜および光学部品 |
JP2006062240A (ja) * | 2004-08-27 | 2006-03-09 | Fuji Photo Film Co Ltd | 防眩性反射防止フィルムの製造方法及び防眩性反射防止フィルム |
WO2007040023A1 (ja) * | 2005-10-03 | 2007-04-12 | Konica Minolta Opto, Inc. | 凹凸パターンフイルムの製造方法及び製造装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003004916A (ja) * | 2001-06-20 | 2003-01-08 | Dainippon Printing Co Ltd | 表示装置の窓材、その製造方法、及び表示装置 |
US6888676B2 (en) * | 2003-03-20 | 2005-05-03 | Nokia Corporation | Method of making polarizer and antireflection microstructure for mobile phone display and window |
TWI417564B (zh) * | 2005-02-21 | 2013-12-01 | Dainippon Printing Co Ltd | Manufacturing method and manufacturing apparatus for optical laminate |
WO2007034715A1 (ja) * | 2005-09-21 | 2007-03-29 | Konica Minolta Opto, Inc. | 防眩性反射防止フィルム及び防眩性反射防止フィルムの製造方法 |
KR100881982B1 (ko) * | 2006-09-08 | 2009-02-05 | 주식회사 엘지화학 | 편광막용 이색성 염료, 이를 포함하는 편광막 조성물, 이를이용한 내구성이 우수한 편광판 제조방법 및 이에 따라제조된 편광판 |
-
2008
- 2008-11-07 CN CN2008801226046A patent/CN101909858A/zh active Pending
- 2008-11-07 US US12/735,298 patent/US8384862B2/en active Active
- 2008-11-07 JP JP2010505267A patent/JP4964985B2/ja active Active
- 2008-11-07 WO PCT/JP2008/070307 patent/WO2009118943A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001264520A (ja) * | 2000-03-16 | 2001-09-26 | Dainippon Printing Co Ltd | 反射防止フィルム、偏光素子、および表示装置、ならびに反射防止フィルムの製造方法 |
JP2004205990A (ja) * | 2002-12-26 | 2004-07-22 | Dainippon Printing Co Ltd | 反射防止性能を有する微細凹凸パターンの作製方法及び反射防止物品 |
JP2006039450A (ja) * | 2004-07-30 | 2006-02-09 | Seiko Epson Corp | 反射防止膜の形成方法、反射防止膜の形成装置、反射防止膜および光学部品 |
JP2006062240A (ja) * | 2004-08-27 | 2006-03-09 | Fuji Photo Film Co Ltd | 防眩性反射防止フィルムの製造方法及び防眩性反射防止フィルム |
WO2007040023A1 (ja) * | 2005-10-03 | 2007-04-12 | Konica Minolta Opto, Inc. | 凹凸パターンフイルムの製造方法及び製造装置 |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010243908A (ja) * | 2009-04-08 | 2010-10-28 | Toshiba Mobile Display Co Ltd | 液晶表示装置 |
JP2011238721A (ja) * | 2010-05-10 | 2011-11-24 | Toray Eng Co Ltd | インプリント加工装置、インプリント加工方法およびインプリント加工物 |
JP2011247918A (ja) * | 2010-05-24 | 2011-12-08 | Kri Inc | 低屈折率膜及び反射防止膜 |
WO2012063948A1 (ja) * | 2010-11-12 | 2012-05-18 | 株式会社日立ハイテクノロジーズ | 金型の微細パターン面清掃方法とそれを用いたインプリント装置 |
JP2012150460A (ja) * | 2010-12-27 | 2012-08-09 | Sumitomo Chemical Co Ltd | 光学フィルムの製造方法、偏光板および画像表示装置 |
JP2012204375A (ja) * | 2011-03-23 | 2012-10-22 | Waseda Univ | 微細パターンを表面に有する物品の製造方法 |
KR20120112078A (ko) * | 2011-03-29 | 2012-10-11 | 스미또모 가가꾸 가부시키가이샤 | 광학 필름의 제조 방법, 편광판 및 화상 표시 장치 |
JP2012214034A (ja) * | 2011-03-29 | 2012-11-08 | Sumitomo Chemical Co Ltd | 光学フィルムの製造方法、偏光板および画像表示装置 |
KR101907695B1 (ko) | 2011-03-29 | 2018-12-07 | 스미또모 가가꾸 가부시키가이샤 | 광학 필름의 제조 방법, 편광판 및 화상 표시 장치 |
JP2014115403A (ja) * | 2012-12-07 | 2014-06-26 | Asahi Kasei E-Materials Corp | 複合型機能性フィルムの製造方法 |
JP2014151626A (ja) * | 2013-02-13 | 2014-08-25 | Hikari Kinzoku Kogyosho:Kk | 樹脂成形品の製造方法 |
WO2015136734A1 (ja) * | 2014-03-14 | 2015-09-17 | シャープ株式会社 | 光学素子及び表示装置 |
JPWO2015136734A1 (ja) * | 2014-03-14 | 2017-04-06 | シャープ株式会社 | 光学素子及び表示装置 |
US10365410B2 (en) | 2014-03-14 | 2019-07-30 | Sharp Kabushiki Kaisha | Optical element and display device |
CN107323118A (zh) * | 2017-07-06 | 2017-11-07 | 华南理工大学 | 一种uv固化预处理银导电薄膜的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
US20100291317A1 (en) | 2010-11-18 |
JPWO2009118943A1 (ja) | 2011-07-21 |
US8384862B2 (en) | 2013-02-26 |
CN101909858A (zh) | 2010-12-08 |
JP4964985B2 (ja) | 2012-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4964985B2 (ja) | ナノインプリントフィルムの製造方法 | |
US20170348943A1 (en) | Optical body, optical film adhesive body, and method for manufacturing optical body | |
JP5889067B2 (ja) | 光学フィルムの製造方法 | |
US11693156B2 (en) | Optical body, film adhesive body, and method for manufacturing optical body | |
EP3462081B1 (en) | Optical body, method for manufacturing optical body, and light-emitting apparatus | |
JP6185088B2 (ja) | 積層フィルムの製造方法 | |
JP2010177457A (ja) | インプリント用のロール状転写フィルムの製造方法、およびインプリント用のロール状転写フィルム | |
JP2010225785A (ja) | インプリント用の転写フィルムの製造方法、及びインプリント用の転写フィルム | |
JP2011125821A (ja) | ハードコートフィルムの製造方法、偏光板および画像表示装置 | |
JP5912517B2 (ja) | 光学フィルムの製造方法、偏光板の製造方法および画像表示装置の製造方法 | |
JP7323986B2 (ja) | 防眩フィルム | |
JP5987268B2 (ja) | ハードコートフィルム、偏光板および画像表示装置 | |
JP2010250237A (ja) | レンズシート製造方法 | |
TW201941913A (zh) | 樹脂積層光學體及其製造方法 | |
JP6125749B2 (ja) | 光学フィルム、偏光板および画像表示装置 | |
JP2013186455A (ja) | ハードコートフィルム製造方法 | |
JP2022077996A (ja) | 偏光板及びこれを含む画像表示装置 | |
JP2016071086A (ja) | 機能性フィルムの製造方法及び機能性フィルム | |
WO2012057358A1 (ja) | 光学フィルムおよびその製造方法、偏光板、ならびに画像表示装置 | |
EP2281681B1 (en) | Control of Surface Smoothness by Light Orientation | |
TW202134697A (zh) | 偏光件之製造方法 | |
KR20120122919A (ko) | 광학 필름의 제조 방법, 편광판 및 화상 표시 장치 | |
JP2013174638A (ja) | 光学フィルムの製造方法、偏光板および画像表示装置 | |
JP2018126890A (ja) | 保護フィルム付き金型及び凹凸構造を有する物品の製造方法 | |
JP2011123097A (ja) | 成形体の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 200880122604.6 Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08873571 Country of ref document: EP Kind code of ref document: A1 |
|
ENP | Entry into the national phase |
Ref document number: 2010505267 Country of ref document: JP Kind code of ref document: A |
|
WWE | Wipo information: entry into national phase |
Ref document number: 12735298 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 08873571 Country of ref document: EP Kind code of ref document: A1 |