WO2009099084A1 - 石英ガラスルツボ - Google Patents
石英ガラスルツボ Download PDFInfo
- Publication number
- WO2009099084A1 WO2009099084A1 PCT/JP2009/051845 JP2009051845W WO2009099084A1 WO 2009099084 A1 WO2009099084 A1 WO 2009099084A1 JP 2009051845 W JP2009051845 W JP 2009051845W WO 2009099084 A1 WO2009099084 A1 WO 2009099084A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- quartz glass
- crucible
- straight body
- surface layer
- corner portion
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
Definitions
- the present invention relates to a quartz glass crucible used for pulling a silicon single crystal. More specifically, the present invention relates to a quartz glass crucible that is difficult to cause inward deformation at a high temperature even when it is a large diameter crucible.
- a silicon single crystal used as a semiconductor material is mainly manufactured by a method of crystallizing a silicon melt contained in a quartz glass crucible while pulling upward.
- a quartz glass crucible used for pulling up the silicon single crystal has a known inner surface layer made of synthetic quartz glass for the purpose of improving the quality of the single crystal because its inner surface layer is in contact with molten silicon.
- Synthetic quartz glass has a slightly lower high-temperature viscosity than natural quartz glass. Therefore, in order to increase the high-temperature strength of the crucible, a crucible with an inner surface layer formed of synthetic quartz glass and an outer surface layer formed of natural quartz glass is known. (Patent Documents 1 to 3).
- the outer surface layer and the inner surface layer of the crucible are made of natural quartz glass, while the synthetic quartz glass layer is lined from the bottom of the crucible to the inner surface of the corner portion, thereby preventing crucibles that prevent hot water surface vibration during pulling up. It has been reported (Patent Document 5).
- a quartz glass crucible has been reported in which the oxygen concentration of single crystal silicon is made uniform by providing a taper so that the straight body portion of the crucible opens outward and upward (Patent Document 6).
- the inner layer is formed of a synthetic quartz glass layer, and the outer layer is formed of carbon as a countermeasure against inversion and buckling during use.
- a quartz glass crucible with an increased resistance has also been reported (Patent Document 7). JP-A-1-261293 Japanese Patent Laid-Open No. 1-275496 Japanese Patent Laid-Open No. 03-40989 Japanese Patent Laid-Open No. 04-21487 WO 2004/097080 JP-A-57-38398 Japanese Patent Laid-Open No. 2007-076974
- a crucible whose inner layer is made of synthetic quartz glass has less impurities mixed into single crystal silicon and is effective in improving the single crystallization rate and crystal quality of single crystal, but synthetic quartz glass is hotter than natural quartz glass. Since the viscosity is slightly low, the straight barrel portion of the crucible is liable to be deformed inwardly during pulling, which causes interruption of the pulling and a decrease in the crystallization rate. In particular, when the crucible is increased in size, the wall temperature during use increases, and this problem is likely to occur (Patent Documents 1 to 3). The same applies to a crucible in which a synthetic quartz glass layer is lined on the inner surface of the corner portion from the bottom of the crucible (Patent Document 5).
- a crucible in which aluminum oxide or silicon nitride is interposed as a crystallization accelerator between a natural silica glass layer and a synthetic silica glass layer improves the strength of the crucible due to the formation of the crystallized layer. It is not sufficient to obtain the strength to prevent, especially for large crucibles. Moreover, peeling or cracking due to the difference in thermal expansion between the crystallized layer and the silica glass layer is likely to occur, and the silicon melt being pulled may leak (Patent Document 4).
- the crucible provided with a taper so that the upper part of the crucible is opened outwardly upward can easily prevent the upper part of the crucible installed on the susceptor from falling to the outer susceptor at high temperatures, thereby preventing the internal collapse ( Patent Document 6).
- Patent Document 6 Even if the crucible's straight body is open upward, if there is a gap between the crucible's corner and the susceptor, the crucible's corner is gradually pulled up while being pulled up. As a result of this deformation, the straight body portion becomes vertically or slightly inclined inward as a result of this deformation, and there is a risk of inward tilting.
- deformation during pulling can cause dislocations and variations in crystal quality.
- quartz glass crucibles with the upper end of the crucible opened outward and the outer layer made of carbon have a complicated manufacturing method because the crucible has a double structure, which makes it difficult to process and handle.
- it is very difficult to handle in a state where the cleanliness of the inner surface layer of the quartz glass is maintained by completely suppressing the mixing of carbon particles from the outer surface carbon layer into the inner surface glass layer Patent Document 7.
- a quartz glass crucible according to the present invention includes an outer surface layer formed of natural quartz glass and an inner surface layer formed of synthetic quartz glass, and the straight body portion opens outwardly upward.
- the synthetic quartz glass inner surface layer of the corner portion has a thickness of 20% to 80% of the wall thickness of the central portion of the corner portion. It is characterized by being formed thinner than the inner surface layer of the synthetic quartz glass.
- the straight body portion has a shape that opens outward toward the upper side, there is no inclining at a high temperature, and the maximum thickness of the inner surface layer made of synthetic quartz glass at the corner portion Is 20% or more of the maximum thickness of the corner portion, so that the corner portion of the crucible installed on the susceptor tends to adhere to the susceptor at high temperatures, and the maximum inner layer thickness is equal to the maximum thickness of the corner portion. It is limited to 80% or less, and since the inner surface layer made of synthetic quartz glass at the straight body and the bottom is formed thinner than the inner surface layer of the corner portion, the strength of the corner portion is sufficiently ensured even at high temperatures. Moreover, since the straight body portion and the bottom portion have sufficient strength, deformation such as sinking does not occur. Therefore, an excellent single crystal pulling effect can be obtained even in a large crucible.
- the difference in inner diameter between the lower end and the upper end of the straight body portion opened outward is upward is 0.1% or more. If the inner diameter difference between the upper end and the lower end of the open part of the straight body part is 0.1% or more, the force that the upper end of the crucible receives toward the outside increases, so it is possible to reliably prevent the crucible from falling inside. Can do.
- the range from the upper end of the straight body portion to the corner portion may be a shape that opens outwardly upward, or the range within 50 mm from the upper end of the straight body portion is the vertical portion,
- the range from the lower end of the portion to the corner portion may be a shape that opens outwardly upward.
- the inner diameter difference between the lower end and the upper end of the outer opening portion is preferably 0.1% or more. Since both of them have a shape that opens outward as viewed from the whole of the straight body part, it is possible to increase the force that the upper end of the crucible receives outwards, and to reliably prevent the crucible from falling inside. Can do.
- the thickness of the straight body portion is thin toward the upper end portion.
- the upper end part of the crucible straight body part can be made lighter than the lower part, and the possibility of inward collapse can be further reduced.
- the present invention it is possible to provide a quartz glass crucible that is not easily deformed such as falling down and sinking at a high temperature when pulled up even if it is a large-diameter crucible.
- 10-quartz glass crucible 11-straight barrel portion, 11a-upper end of straight barrel portion, 11b-lower end of straight barrel portion, 11c-lower end of vertical portion of straight barrel portion, 12-corner portion, 13-bottom portion, 20- Outer surface layer, 21-Inner surface layer, 30-Quartz glass crucible
- FIG. 1 is a schematic cross-sectional view showing the structure of a quartz glass crucible according to the first embodiment of the present invention.
- a quartz glass crucible 10 As shown in FIG. 1, a quartz glass crucible 10 according to the present embodiment is used for pulling a silicon single crystal, and an outer surface layer 20 is formed of natural quartz glass, and an inner surface layer 21 is a synthetic quartz glass. Is formed by.
- Natural quartz glass means silica glass produced by melting natural raw materials such as natural quartz and quartzite. In general, natural quartz has the characteristics that the concentration of metal impurities is higher and the concentration of OH groups is lower than that of synthetic quartz.
- the content of Al contained in natural quartz is 1 ppm or more
- the content of alkali metals (Na, K and Li) is 0.05 ppm or more
- the content of OH groups is less than 60 ppm.
- the synthetic quartz glass means a silica glass produced by melting a synthetic raw material produced by, for example, hydrolysis of silicon alkoxide.
- synthetic quartz has the characteristics that the concentration of metal impurities is lower than that of natural quartz and the concentration of OH groups is high.
- the content of each metal impurity (Al, Na, K, Li, etc.) contained in the synthetic quartz is less than 0.05 ppm, and the content of OH groups is 30 ppm or more.
- synthetic quartz to which metal impurities such as Al is added is also known, the judgment of synthetic quartz or natural quartz should not be judged based on one element, but based on a plurality of elements Should be judged.
- the quartz glass crucible 10 includes a straight barrel portion 11 that forms an upstanding side wall portion, a curved corner portion 12 that continues to the lower end of the straight barrel portion 11, and a relatively flat portion that continues to the corner portion 12. It has a bottom part 13 and has a bowl-like shape in which the straight body part 11 opens outwardly upward.
- the boundary between the straight body portion 11 and the corner portion 12 is a position where the tangential inclination angle of the crucible wall surface, which is constant in the straight body portion 11, starts to change.
- the boundary between the corner portion 12 and the bottom portion 13 differs depending on whether the bottom of the crucible is a round bottom or a flat bottom, and in the present invention, it is not necessary to clarify in particular, but for example with respect to the XY plane orthogonal to the central axis (Z axis) of the crucible
- a region where the tangential inclination angle of the crucible wall surface is 10 degrees or more can be defined as the corner portion 12, and a region where the tangential inclination angle is less than 10 degrees can be defined as the bottom portion 13.
- the outer portion (outer surface layer) 20 of the entire crucible from the straight body portion 11 to the corner portion 12 and the bottom portion 13 is formed of natural quartz glass. Therefore, the crucible strength at a high temperature is higher than that formed by synthetic quartz glass, and the crucible is not easily deformed.
- the inner part (inner surface layer) 21 of the entire crucible from the straight body part 11 to the corner part 12 and the bottom part 13 is formed of synthetic quartz glass. Since the inner surface layer 21 in contact with the silicon melt is formed of a synthetic quartz glass layer having a high purity, it is possible to pull up a silicon single crystal having a very low impurity concentration.
- the thickness of the inner surface layer 21 made of synthetic quartz glass in the straight barrel portion 11 and the bottom portion 13 excluding the corner portion 12 is about 5% to 50% with respect to the thickness of the straight barrel portion 11 and the thickness of the bottom portion 13. I just need it.
- the maximum layer thickness t1 of the inner surface layer 21 made of synthetic quartz glass of the corner portion 12 is 20% or more and 80% or less of the wall thickness t0 of the corner portion 12 at the same position.
- the maximum thickness t1 of the inner surface layer 21 is larger than the layer thicknesses t2 and t3 of the inner surface layer 21 of the straight body portion 11 and the bottom portion 13, and the inner surface layer 21 of the straight body portion 11 and the bottom portion 13 is formed in the corner portion 12. It is formed thinner than the inner surface layer 21.
- the quartz glass crucible 10 is formed such that the maximum layer thickness t1 of the corner portion 12 is 20% or more of the wall thickness t0 of the corner portion 12, and the maximum inner surface layer 21 made of synthetic quartz glass of the straight barrel portion 11 and the bottom portion 13 is formed. Since the layer thickness is larger than t2 and t3, when the crucible is installed on the susceptor, the corner portion 12 of the crucible is slightly softer than the straight body portion 11 at a high temperature at the time of pulling up. When the silicon melts, the corner portion 12 comes into close contact with the susceptor, and the crucible is stably supported by the susceptor. On the other hand, since the straight body part 11 is formed so as to open outward and receives an outward force, the straight body part 11 does not fall inward while the pulling is continued.
- the layer thickness of the inner surface layer 21 of the corner portion 12 is less than 20% of the thickness of the corner portion 12, it is difficult to soften at a high temperature at the time of silicon melting, the corner portion 12 does not adhere to the susceptor, and the corner portion 12 Since the gap remains between the susceptor and the susceptor, the gap may cause deformation of the entire crucible when the pulling is continued. Due to the deformation of the entire crucible, the straight body portion that was originally open outwardly also becomes a shape that is inclined slightly inward vertically or upward, and may eventually fall inward.
- the maximum layer thickness t 1 of the inner surface layer 21 of the corner portion 12 is 80% or less of the wall thickness t 0 of the corner portion 12. If the synthetic quartz glass inner layer is thicker than 80%, it is not preferable because the softening of the corner portion is increased and the sinking tends to occur. Further, since the inner surface layer 21 made of synthetic quartz glass in the straight body portion 11 and the bottom portion 13 is formed thinner than the inner surface layer 21 made of synthetic quartz glass in the corner portion 12, the straight body portion 11 and the bottom portion 13 are formed in the corner portion 12. It is more difficult to soften and deform.
- the quartz glass crucible 10 has a shape in which the straight body portion 11 is opened outward (upwardly open shape). For this reason, since the straight body part 11 receives outward force, even if the strength of the crucible is slightly softened at a high temperature at the time of pulling up, it is possible to prevent inward collapse.
- the quartz glass crucible 10 is formed so that the range from the upper end 11a of the straight body portion 11 to the corner portion 12 is opened outward.
- the inner diameter difference between the lower end 11b and the upper end 11a of the straight body 11 is preferably 0.1% or more, that is, the inner diameter r2 of the upper end 11a is preferably 1.001r1 or more with respect to the inner diameter r1 of the lower end 11b. If the difference in inner diameter of the straight body portion 11 is less than 0.1%, the inclination toward the outside is small, and depending on the softened state of the straight body portion 11, there is a possibility of falling inward.
- drum 11 so that it may become an outer opening according to the inclination of the outer opening shape of an internal diameter in the said outward opening shape.
- the outer diameter of the straight body 11 may be the same from the lower end to the upper end.
- the thickness including the inner surface layer 21 and the outer surface layer 20 of the crucible straight body portion 11 may be formed thinner toward the upper end portion 11a. If it is this shape, since the upper end part of the crucible straight trunk
- the quartz glass crucible 10 when the silicon single crystal is pulled up, the quartz glass crucible is in close contact with the outer carbon susceptor when the silicon contained in the crucible is melted. Since no deformation occurs during pulling, the rate of dislocation is low and the variation in crystal quality is reduced. In addition, the corner portion can be softened to cope with minute fluctuations in the susceptor shape due to carbon susceptor consumption due to pulling, and the crucible is in close contact with the susceptor shape, so that the single crystallization rate can be increased. .
- FIG. 2 is a schematic cross-sectional view showing the structure of a quartz glass crucible according to the second embodiment of the present invention.
- a portion within 50 mm downward from the upper end 11a of the straight body portion 11 is formed vertically rather than outwardly opening, and the lower end 11c of this vertical portion.
- a range from the corner portion 12 to the corner portion 12 is formed so as to open outward. If the vertical portion is in the range of 50 mm or less from the upper end 11a of the straight body portion 11, the upper end portion of the straight body portion 11 is unlikely to fall inward even if it is formed with the same opening diameter (inner diameter).
- a range from a portion within 50 mm from the upper end of the body portion 11 to the corner portion may be formed as an outward opening.
- the inner diameter difference between the lower end 11b and the upper end 11a (11c) is 0.1% or more, that is, the inner diameter of the upper end 11a (11c) is 0.1% or more larger than the inner diameter of the lower end 11b. preferable.
- the difference in inner diameter is less than 0.1%, the inclination toward the outside is small, and depending on the softened state of the straight body portion 11, there is a possibility of falling inward. Since the other structure is substantially the same as that of the quartz glass crucible according to the first embodiment, the same components are denoted by the same reference numerals and detailed description thereof is omitted.
- the quartz glass crucible 30 according to the present embodiment is in close contact with the outer carbon susceptor when the silicon single crystal is pulled, when the silicon contained in the crucible is melted, similarly to the quartz glass crucible 10. Therefore, since the deformation of the crucible can be suppressed from the initial stage of pulling, and no deformation occurs during the pulling, the rate of dislocation is low and the variation in crystal quality is reduced.
- the corner portion can be softened to cope with minute fluctuations in the susceptor shape due to carbon susceptor consumption due to pulling, and the crucible is in close contact with the susceptor shape, so that the single crystallization rate can be increased. .
- a natural quartz powder was deposited on the inner surface of the rotating carbon mold, a synthetic quartz powder was deposited on the upper side, and arc melting was performed to produce a quartz glass crucible.
- a carbon mold having an inclination with the inner surface opened upward toward the outside is used, and the thickness of the upper end portion and the lower end portion of the crucible straight barrel portion and the thickness of the corner portion are as shown in Table 1.
- natural quartz powder and synthetic quartz powder are deposited, and the synthetic quartz glass layer of the inner surface layer is adjusted so as to have the layer thickness shown in Table 1.
- No. 6 was produced.
- the size of each quartz glass crucible was 50 cm in height, and the height from the lower end to the upper end (upper end of the crucible) of the straight barrel was 35 cm.
- the silicon single crystal was pulled up. The results are shown in Table 1.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Abstract
Description
Claims (5)
- シリコン単結晶の引き上げに用いられる石英ガラスルツボであって、天然石英ガラスによって形成された外面層と、合成石英ガラスによって形成された内面層とを備え、直胴部が上方に向かって外側に開いた形状を有し、コーナ部の前記内面層の最大層厚が当該位置における前記コーナ部の肉厚の20%以上~80%以下であり、前記直胴部および底部の前記内面層が前記コーナ部の前記内面層の最大層厚より薄く形成されていることを特徴とする石英ガラスルツボ。
- 前記直胴部の下端と上端の内径差が0.1%以上である請求項1に記載する石英ガラスルツボ。
- 前記直胴部の上端から前記コーナ部に至る範囲が上方に向かって外側に開いた形状である請求項1に記載する石英ガラスルツボ。
- 前記直胴部の上端から50mm以内の範囲が垂直部分であり、前記垂直部分の下端からコーナ部に至る範囲が上方に向かって外側に開いた形状である請求項1に記載する石英ガラスルツボ。
- 前記直胴部の肉厚が上端部に向かって薄く形成されている請求項1に記載する石英ガラスルツボ。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09709309.0A EP2248776A4 (en) | 2008-02-05 | 2009-02-04 | QUARTZ GLASS CRUCIBLE |
JP2009552483A JP5252157B2 (ja) | 2008-02-05 | 2009-02-04 | 石英ガラスルツボ |
US12/866,203 US20100314400A1 (en) | 2008-02-05 | 2009-02-04 | Vitreous silica crucible |
CN200980104583XA CN101970362A (zh) | 2008-02-05 | 2009-02-04 | 石英玻璃坩埚 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008-025057 | 2008-02-05 | ||
JP2008025057 | 2008-02-05 |
Publications (1)
Publication Number | Publication Date |
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WO2009099084A1 true WO2009099084A1 (ja) | 2009-08-13 |
Family
ID=40952158
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2009/051845 WO2009099084A1 (ja) | 2008-02-05 | 2009-02-04 | 石英ガラスルツボ |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100314400A1 (ja) |
EP (1) | EP2248776A4 (ja) |
JP (1) | JP5252157B2 (ja) |
KR (1) | KR20100128288A (ja) |
CN (1) | CN101970362A (ja) |
TW (1) | TWI396780B (ja) |
WO (1) | WO2009099084A1 (ja) |
Cited By (6)
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JP2011121843A (ja) * | 2009-12-14 | 2011-06-23 | Japan Siper Quarts Corp | 単結晶引上げ用ルツボ及び単結晶引上げ方法 |
JP2011121842A (ja) * | 2009-12-14 | 2011-06-23 | Japan Siper Quarts Corp | 単結晶引上げ用ルツボ及び単結晶引上げ方法 |
US20120137963A1 (en) * | 2010-12-01 | 2012-06-07 | Japan Super Quartz Corporation | Vitreous silica crucible |
KR20160091990A (ko) | 2013-12-28 | 2016-08-03 | 가부시키가이샤 섬코 | 석영 유리 도가니 및 그 제조 방법 |
JP2016193809A (ja) * | 2015-04-01 | 2016-11-17 | クアーズテック株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
JP2018528321A (ja) * | 2015-07-03 | 2018-09-27 | プランゼー エスエー | 耐熱金属製容器 |
Families Citing this family (7)
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JP5762945B2 (ja) * | 2011-12-30 | 2015-08-12 | 株式会社Sumco | シリカガラスルツボ |
CN102586856B (zh) * | 2012-02-01 | 2015-03-11 | 江西赛维Ldk太阳能高科技有限公司 | 一种提高硅锭利用率和籽晶使用次数的坩埚及其制备方法 |
US20140261155A1 (en) * | 2013-03-15 | 2014-09-18 | Memc Electronic Materials, Inc. | Crucible for controlling oxygen and related methods |
US9863062B2 (en) | 2013-03-14 | 2018-01-09 | Corner Star Limited | Czochralski crucible for controlling oxygen and related methods |
USD771167S1 (en) | 2013-08-21 | 2016-11-08 | A.L.M.T. Corp. | Crucible |
US10124923B1 (en) * | 2015-11-19 | 2018-11-13 | Creative Edge Design Group Ltd. | Flexible product package with push-up |
JP7150250B2 (ja) * | 2018-08-07 | 2022-10-11 | 株式会社Sumco | 石英ガラスルツボおよび石英ガラスルツボの製造方法 |
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JPS5738398A (en) * | 1980-08-12 | 1982-03-03 | Toshiba Ceramics Co Ltd | Quartz glass crucible for pulling up silicon single crystal |
JPS6126593A (ja) * | 1984-07-13 | 1986-02-05 | Toshiba Ceramics Co Ltd | シリコン単結晶引上用カ−ボンルツボ |
JPH01261293A (ja) * | 1988-04-12 | 1989-10-18 | Mitsubishi Metal Corp | シリコン単結晶引上げ用石英ルツボ |
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WO2002014587A1 (fr) * | 2000-08-15 | 2002-02-21 | Shin-Etsu Handotai Co., Ltd. | Creuset en quartz et procede de fabrication d'un monocristal |
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GB816334A (en) * | 1954-12-24 | 1959-07-08 | Telefunken Gmbh | Improvements in or relating to crucibles |
JP4592037B2 (ja) * | 2000-05-31 | 2010-12-01 | 信越石英株式会社 | 石英ガラスルツボの製造方法 |
JP4447738B2 (ja) * | 2000-05-31 | 2010-04-07 | 信越石英株式会社 | 多層構造の石英ガラスルツボの製造方法 |
WO2004106247A1 (ja) * | 2003-05-30 | 2004-12-09 | Shin-Etsu Quartz Products Co., Ltd. | シリコン単結晶引上げ用石英ガラスルツボ |
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2009
- 2009-02-04 CN CN200980104583XA patent/CN101970362A/zh active Pending
- 2009-02-04 WO PCT/JP2009/051845 patent/WO2009099084A1/ja active Application Filing
- 2009-02-04 US US12/866,203 patent/US20100314400A1/en not_active Abandoned
- 2009-02-04 KR KR1020107019593A patent/KR20100128288A/ko active IP Right Grant
- 2009-02-04 EP EP09709309.0A patent/EP2248776A4/en not_active Withdrawn
- 2009-02-04 JP JP2009552483A patent/JP5252157B2/ja active Active
- 2009-02-05 TW TW098103733A patent/TWI396780B/zh not_active IP Right Cessation
Patent Citations (7)
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JPS5738398A (en) * | 1980-08-12 | 1982-03-03 | Toshiba Ceramics Co Ltd | Quartz glass crucible for pulling up silicon single crystal |
JPS6126593A (ja) * | 1984-07-13 | 1986-02-05 | Toshiba Ceramics Co Ltd | シリコン単結晶引上用カ−ボンルツボ |
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JP2011121843A (ja) * | 2009-12-14 | 2011-06-23 | Japan Siper Quarts Corp | 単結晶引上げ用ルツボ及び単結晶引上げ方法 |
JP2011121842A (ja) * | 2009-12-14 | 2011-06-23 | Japan Siper Quarts Corp | 単結晶引上げ用ルツボ及び単結晶引上げ方法 |
US20120137963A1 (en) * | 2010-12-01 | 2012-06-07 | Japan Super Quartz Corporation | Vitreous silica crucible |
US9347148B2 (en) * | 2010-12-01 | 2016-05-24 | Sumco Corporation | Vitreous silica crucible with specific ratio of transparent layer and bubble-containing layer thicknesses |
KR20160091990A (ko) | 2013-12-28 | 2016-08-03 | 가부시키가이샤 섬코 | 석영 유리 도가니 및 그 제조 방법 |
CN105849320A (zh) * | 2013-12-28 | 2016-08-10 | 胜高股份有限公司 | 石英玻璃坩埚及其制造方法 |
US9863061B2 (en) | 2013-12-28 | 2018-01-09 | Sumco Corporation | Vitreous silica crucible and method for manufacturing the same |
JP2016193809A (ja) * | 2015-04-01 | 2016-11-17 | クアーズテック株式会社 | シリコン単結晶引き上げ用石英ガラスルツボ |
JP2018528321A (ja) * | 2015-07-03 | 2018-09-27 | プランゼー エスエー | 耐熱金属製容器 |
Also Published As
Publication number | Publication date |
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TW200940753A (en) | 2009-10-01 |
CN101970362A (zh) | 2011-02-09 |
EP2248776A1 (en) | 2010-11-10 |
EP2248776A4 (en) | 2013-10-30 |
US20100314400A1 (en) | 2010-12-16 |
KR20100128288A (ko) | 2010-12-07 |
TWI396780B (zh) | 2013-05-21 |
JP5252157B2 (ja) | 2013-07-31 |
JPWO2009099084A1 (ja) | 2011-05-26 |
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