WO2009081468A1 - コレステリック液晶表示素子 - Google Patents
コレステリック液晶表示素子 Download PDFInfo
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- WO2009081468A1 WO2009081468A1 PCT/JP2007/074665 JP2007074665W WO2009081468A1 WO 2009081468 A1 WO2009081468 A1 WO 2009081468A1 JP 2007074665 W JP2007074665 W JP 2007074665W WO 2009081468 A1 WO2009081468 A1 WO 2009081468A1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133377—Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133502—Antiglare, refractive index matching layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
- G02F1/13718—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on a change of the texture state of a cholesteric liquid crystal
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/02—Function characteristic reflective
Definitions
- the present invention relates to a display element that displays an image using cholesteric liquid crystal, a method for manufacturing the same, and electronic paper and an electronic terminal device using the display element.
- a reflective liquid crystal display device (hereinafter referred to as a “cholesteric liquid crystal display element”) using a liquid crystal composition in which a cholesteric phase is formed (hereinafter referred to as “cholesteric liquid crystal”) displays an image semi-permanently without power supply. It has a memory display function that keeps up. For this reason, since the cholesteric liquid crystal display element only needs to be driven at the time of display rewriting, the power consumption can be reduced as compared with the conventional liquid crystal display element, and it can be made thin and light, and has a vivid color display characteristic and high performance. It has contrast characteristics and high resolution characteristics. Utilizing such characteristics, development of a cholesteric liquid crystal display element for practical use has been performed.
- a cholesteric liquid crystal display element is suitably used for an electronic paper display unit, an electronic book, a mobile terminal device, or a display unit of an electronic terminal device such as a portable device such as an IC card.
- the cholesteric liquid crystal display element includes a pair of substrates encapsulating cholesteric liquid crystal.
- substrate is transparent substrates, such as a glass substrate and a resin substrate.
- a pixel is composed of electrodes provided on both substrates and cholesteric liquid crystal between the electrodes. In order to maintain a pair of substrates at a predetermined interval (cell gap) between adjacent pixels, columnar spacers, wall structures, and the like are arranged.
- the pixel electrode portion where the opposing electrodes are superimposed can control the reflectance of the cholesteric liquid crystal by applying a liquid crystal driving voltage.
- it is difficult to control the reflectance of the cholesteric liquid crystal because there is no electrode for applying the liquid crystal driving voltage in the region between adjacent pixels where the wall structure other than the pixel electrode is disposed.
- By forming a wall structure between adjacent pixel electrodes it is possible to shield adjacent pixels where the cholesteric liquid crystal is uncontrolled while maintaining the aperture ratio of the pixels.
- the alignment state of the cholesteric liquid crystal in the opening is a highly directional reflection state that appears when the liquid crystal flows. That is, the cholesteric liquid crystal in this region is generally always in a planar state and maintains a high reflectance state. For this reason, the opening becomes a factor of reducing the display contrast during black display in which display is performed in a focal conic phase with low reflectivity.
- the object is to provide a pair of substrates, a liquid crystal sealed between the pair of substrates, a first electrode formed on one of the pair of substrates, and a second formed on the other of the pair of substrates.
- the pixel region defined by disposing the first electrode and the second electrode so as to cross each other, and the pixel region surrounding the pixel region between the pair of substrates A wall structure formed outside the region, an opening in which a part of the wall structure is opened so that the liquid crystal circulates, and a reflectance of the liquid crystal formed in the opening to determine the reflectance of the liquid crystal.
- an electronic terminal device that displays an image, and includes the display element of the present invention.
- the object is to provide a display device manufacturing method in which a liquid crystal is sealed between a pair of substrates, wherein a first electrode is formed on one of the pair of substrates, and a second is formed on the other of the pair of substrates.
- Forming a pixel region defined by disposing the first electrode and the second electrode so as to cross each other, and surrounding the pixel region between the pair of substrates As described above, a wall structure is formed outside the pixel region, an opening is formed to open a part of the wall structure so that the liquid crystal flows, and the reflectance of the liquid crystal at the opening is reduced. This is achieved by a method for manufacturing a display element, wherein a reflectance reduction part is formed in the opening.
- the contrast is improved and a good display can be obtained.
- FIG. 3 is a cross-sectional view of the liquid crystal display element according to the embodiment of the present invention, taken along line AA in FIG. It is a figure which shows the state which looked at the conventional liquid crystal display element in the substrate surface normal direction.
- FIG. 5 is a cross-sectional view of a conventional liquid crystal display element taken along line AA in FIG.
- FIG. 1 is an exploded perspective view schematically showing a configuration of a liquid crystal display element 1 according to the present embodiment.
- the liquid crystal display element 1 includes an upper substrate 7 and a lower substrate 9 (a pair of substrates) arranged to face each other with a predetermined cell gap.
- FIG. 1 shows a state where the upper substrate 7 is shifted obliquely upward with respect to the lower substrate 9 for easy understanding.
- a film substrate such as polycarbonate (PC) or polyethylene terephthalate (PET), or a glass substrate is used.
- a cholesteric liquid crystal 3 having a memory property is sealed between the upper and lower substrates 7 and 9.
- the data electrode Dj is connected to a data electrode drive circuit (not shown).
- the scan electrode Si is connected to a scan electrode drive circuit (not shown).
- FIG. 1 illustrates a state where six pixel regions P (1,1) to P (3,2) are arranged in a matrix of 3 rows and 2 columns.
- the pixel region P (i, j) is driven by so-called passive drive by a data electrode drive circuit and a scan electrode drive circuit (not shown).
- a wall surface structure 37 is disposed around the pixel region P so as to surround the pixel region P.
- the wall surface structure 37 is formed outside the pixel region P.
- the pixel region P has a quadrangular shape having four sides when viewed in the normal direction of the substrate surface. Therefore, the wall surface structure 37 viewed in the same direction has a quadrangular frame shape for each pixel region P. Further, when viewed as the entire substrate surface, the wall surface structure 37 has a lattice shape that intersects vertically and horizontally within a rectangular frame.
- An opening 36 is provided at a predetermined side of the frame-shaped wall structure 37 so that a part of the side is opened so that the liquid crystal 3 flows.
- the openings 36 are regularly arranged regularly.
- the wall surface structure 37 is provided with a reflectance reduction unit 34 that is formed in the opening 36 and reduces the reflectance of the liquid crystal 3 at the opening 36.
- the length from the flat portion 34a of the reflectance reduction unit 34 to the upper substrate 7 (hereinafter referred to as “gap”) by the reflectance reduction unit 34 is greater than the cell gap in the pixel region P. Since it becomes short, the reflectance in the opening part 36 can be reduced. Thereby, the contrast of the liquid crystal display element 1 can be improved.
- the wall surface structure 37 is formed of an adhesive member.
- the wall surface structure 37 is bonded to both the pair of substrates 7 and 9 except for the opening 36.
- the wall surface structure 37 is formed on one substrate by patterning a photoresist using, for example, a photolithography method.
- the reflectance reduction part 34 is formed integrally with the wall surface structure 37.
- the sealing material 21 is disposed on the outer periphery surrounding the entire wall structure 37.
- the sealing material 21 is formed by a printing process using a thermosetting or UV curable adhesive.
- the sealing material 21 is disposed on the outer peripheral portion between the upper and lower substrates 7 and 9 and surrounds the plurality of pixel regions P and the wall surface structure 37.
- a conventional spherical spacer or columnar spacer may be used together with the wall surface structure 37.
- the sealing material 21 at one end of the upper and lower substrates 7 and 9 is opened, and a liquid crystal injection port 38 at the time of liquid crystal dip injection is arranged.
- the liquid crystal injection port 38 after the liquid crystal is injected is sealed with a sealing material.
- the entire pixel region P is connected to the injection port 38 through each opening 36.
- the liquid crystal 3 sealed with the sealing material 21 and the sealing material is filled in the entire inner space surrounded by the sealing material 21.
- FIG. 2 shows a state in which the liquid crystal display element 1 is viewed in the normal direction of the substrate surface.
- FIG. 3 shows a cross section taken along line AA in FIG.
- six pixel regions P are illustrated for convenience of illustration, but generally a larger number of pixel regions P are arranged in a matrix.
- FIG. 2 shows a partial region of the pixel region P arranged in a large number. The shape structure of the pixel region P, the wall surface structure 37, and the opening 36 will be described in more detail with reference to FIGS. 2 and 3 together with FIG.
- the pixel region P (i, j) has a four-sided shape in which the scanning electrode Si and the data electrode Dj overlap each other when viewed in the normal direction of the substrate surface.
- the pixel region P (i, j) has, for example, a square shape.
- the wall surface structure 37 has a quadrangular frame-like structure along each side of the four sides of the pixel shape in the pixel region P (i, j).
- the width of the wall surface structure 37 is the same as or narrower than the width between adjacent data electrodes DD on the upper substrate 7, and the same or smaller than the width between adjacent scanning electrodes SS on the lower substrate 9. Is formed. For this reason, the wall surface structure 37 is arrange
- the opening 36 having a part of the frame-shaped wall structure 37 opened serves as a liquid crystal circulation port for filling the liquid crystal in the entire pixel region P when liquid crystal dip is injected in the panel manufacturing process.
- the openings 36 are respectively formed on opposite sides of the wall surface structure 37.
- the opening 36 is formed at substantially the center of the opposite sides.
- the reflectance reduction part 34 formed in the opening 36 has a wall surface shape having a height tr lower than the height tw of the wall surface structure 37.
- the reflectance reduction part 34 has a flat part 34 a formed on the surface facing the upper substrate 7.
- the height tr of the reflectance reduction unit 34 is lower than the height tw of the wall surface structure 37. For this reason, even if both the substrates 7 and 9 are bonded together, the opening through which the liquid crystal 3 can flow can be maintained in the opening 36.
- the opening 36 is formed at the same position in the configuration. Therefore, in the same j row, the openings 36 are continuously arranged in a row on the extension line of the wall surface structure 37. This configuration is the same for the adjacent column j + 1 and the like.
- FIG. 4 shows a state in which the conventional liquid crystal display element 100 is viewed in the normal direction of the substrate surface.
- FIG. 5 shows a cross section taken along line AA in FIG. 4 and 5, the same components as those of the liquid crystal display element 1 of the present embodiment are denoted by the same reference numerals, and the description thereof is omitted.
- the wall surface structure 137 has a cross shape.
- the wall surface structures 137 are respectively disposed between the four adjacent pixel regions P. For this reason, the wall surface structure 137 is disposed along each corner of the pixel shape in the pixel region P (i, j).
- the width of the wall structure 137 is the same as or narrower than the width between adjacent data electrodes DD on the upper substrate 7, and the same or smaller than the width between adjacent scanning electrodes SS on the lower substrate 9. Is formed. Thereby, the wall surface structure 137 is arrange
- the length of the wall surface structure 137 extending along each side of the pixel region P (i, j) is shorter than the length of one side of the pixel region P (i, j). For this reason, an opening 136 in which the wall surface structure 137 is not formed is disposed in the approximate center of each side of the pixel region P (i, j).
- the opening 136 functions as a liquid crystal distribution port for filling all the pixel regions P with liquid crystal at the time of liquid crystal dip injection in the panel manufacturing process.
- the liquid crystal 3 flows to the adjacent pixels through the opening 136 when the liquid crystal dip is injected. For this reason, as shown in FIG. 5, when the liquid crystal dip injection is completed, the liquid crystal 3 is filled in the opening 136 in addition to the entire pixel region P.
- the cell gap at the opening 136 of the liquid crystal display element 100 is substantially equal to the height tw of the wall structure 137.
- the liquid crystal display element 1 of the present embodiment also fills the opening 36 with the liquid crystal 3 when the liquid crystal dip injection is completed, as in the conventional liquid crystal display element 100.
- the liquid crystal display element 1 has the reflectance reduction part 34 in the opening 36, the gap in the opening 36 is smaller than the height tw of the wall surface structure 37.
- the liquid crystal 3 sealed in the pixel region P is based on the potential difference between the potential applied to the scanning electrode S and the potential applied to the data electrode D, and is in a planar state that reflects light of a predetermined color or a focal that transmits light.
- One of the conic states are disposed outside the pixel region P, and the electrodes S and D are not formed. For this reason, no voltage is applied to the liquid crystal 3 sealed in the openings 36 and 136.
- the state in which the liquid crystal 3 flows is generally a planar state having a high reflectance.
- the liquid crystal 3 in the openings 36 and 136 is in the planar state and thus reflects light. Thereby, the contrast of the liquid crystal display elements 1 and 100 is lowered.
- FIG. 6 is a graph showing the relationship between the cell gap and the reflectance of the cholesteric liquid crystal.
- the horizontal axis represents the cell gap ( ⁇ m), and the vertical axis represents the reflectance (%).
- the curve based on the ⁇ mark indicates the reflectance characteristic of red (R) light
- the curve based on the ⁇ mark indicates the reflectance characteristic of green (G) light
- the curve based on the ⁇ mark is blue (B ) Shows the light reflectance characteristics.
- the reflectivities of R light, G light, and B light increase as the cell gap increases, and the reflectivity becomes substantially constant beyond a predetermined cell gap.
- the reflectance of R light and G light is constant at about 43% when the cell gap is larger than about 8.0 ⁇ m, and the reflectance of B light is constant at about 46% when the cell gap is larger than about 6.0 ⁇ m.
- the gap at the opening 36 of the liquid crystal display element 1 of the present embodiment is narrower than the cell gap at the opening 136 of the conventional liquid crystal display element 100 due to the reflectance reduction unit 34. For this reason, the reflectance at the opening 36 is lower than the reflectance at the opening 136. As a result, the liquid crystal display element 1 has a lower reflectivity during black display than conventional ones, and thus can improve contrast.
- FIGS. 7 and 8 are cross-sectional views schematically showing manufacturing steps of the liquid crystal display element 1 according to the present embodiment.
- FIG. 9 shows a main part of the photomask 43 used for forming the wall surface structure 37.
- a transparent conductive film 19a is formed on the entire surface of a lower substrate 9 made of, for example, polycarbonate using a vapor deposition method.
- a material for forming the transparent conductive film 19a for example, IZO (indium / zinc / oxide) is used.
- a resist is applied to the entire surface of the transparent conductive film 19a to form a resist layer 41a.
- the resist layer 41 a is patterned using a mask (not shown) on which the pattern of the scanning electrode S is drawn, thereby forming a resist pattern 41.
- the transparent conductive film 19a is exposed and etched using the resist pattern 41 as a mask. As a result, the transparent conductive film 19 a exposed between the resist patterns 41 is removed, and only the transparent conductive film 19 a under the resist pattern 41 remains on the lower substrate 9.
- the resist pattern 41 is peeled off. Thereby, the scanning electrode S is formed on the lower substrate 9.
- a negative photoresist is applied to the entire surface of the lower substrate 9 to form a resist layer 37a.
- the resist layer 37a is pre-baked as necessary.
- the resist layer 37a is exposed using a photomask 43 on which a pattern of the wall structure is drawn.
- FIG. 9A is a plan view showing the main part of the photomask 43.
- FIG. 9B is an enlarged view of the ⁇ region in FIG. 9A.
- the photomask 43 for forming the wall surface structure 37 is, for example, a semi-transmissive film 43h that attenuates and transmits the intensity of incident light such as ultraviolet light.
- a light shielding film 43s that shields incident light on the substrate.
- the photomask 43 has neither a semi-transmissive film 43h nor a light shielding film 43s and a transmissive region 43t that transmits light with a predetermined light transmittance.
- the light shielding film 43s is disposed in a region corresponding to the pixel region P (see FIG. 2), the transmissive region 43t is disposed in a region corresponding to the wall surface structure 37, and the semi-transmissive film 43h is the reflectance reduction unit 34 (see FIG. 2).
- the semi-transmissive film 43h and the light shielding film 43s are patterned on the substrate.
- the semi-transmissive film 43h is formed in a lattice shape so as to transmit about 56% intensity of incident light.
- the density distribution of the openings of the semipermeable membrane 43h is formed almost uniformly.
- the photomask 43 has a transmission region 43t having a light transmission width equal to or higher than the resolution of the resist layer 37a, and a gray tone that is a semi-transmissive film 43h equal to or lower than the resolution of the resist 37a.
- the height tr of the reflectance reduction unit 34 can be adjusted by the aperture ratio of the semi-transmissive film 43h. The greater the aperture ratio, the greater the amount of light transmitted. For this reason, when a negative photoresist is used, the height tr of the reflectance reduction portion 34 increases as the aperture ratio of the semi-transmissive film 43h increases, and decreases as the aperture ratio decreases.
- the resist layer 37 a in the region corresponding to the transmission region 43 t of the photomask 43 is exposed with an exposure amount greater than the necessary exposure amount.
- the resist layer 37a in the region corresponding to the semi-transmissive film 43h is exposed with an exposure amount less than the required exposure amount, it is not completely exposed. Further, the resist layer 37a in the region corresponding to the light shielding film 43s is hardly exposed. Therefore, when the exposed resist layer 37a is developed, as shown in FIG. 8B, the resist layer 37a in the region corresponding to the light shielding film 43s is completely removed, and the resist layer 37a in the region corresponding to the transmissive region 43t.
- the reflectance reduction part 34 is formed integrally and continuously with the wall structure 37. Since the density distribution of the openings of the semi-transmissive film 43h of the photomask 43 is formed substantially uniformly, the upper surface of the reflectance reduction unit 34 is formed in a substantially flat shape.
- the data electrode D is formed on the upper substrate 7 by the manufacturing method similar to that shown in FIGS.
- an insulating film 18 is formed on the entire surface of the upper substrate 7 so as to cover the data electrodes D (see FIG. 8C).
- a sealing material 21 (see FIG. 1) is applied around the substrate end on the lower substrate 9.
- the sealing material 21 is provided with an injection port 38 (see FIG. 1) for injecting liquid crystal at a part of one end side of the lower substrate 9.
- spacers are dispersed on the lower substrate 9.
- the substrates 7 and 9 are bonded so that the scanning electrode S and the data electrode D intersect and face each other so that passive driving can be performed.
- the sealing material 21 and the wall surface structure 37 are pressurized and heated to be cured to bond the substrates 7 and 9 together. Thereby, an empty cell is formed.
- the inside and outside surroundings of the empty cell are evacuated, the end of the empty cell provided with the injection port 38 is immersed in cholesteric liquid crystal, and the outer periphery is opened to the atmosphere, so that the liquid crystal is contained in the empty cell.
- the injection port 38 is sealed with a sealing material. Thereby, a liquid crystal display panel is completed.
- driving circuits such as a scanning electrode driving circuit and a data electrode driving circuit are connected to the liquid crystal display panel to complete the liquid crystal display element 1.
- Example 1 Since the liquid crystal display panel of this embodiment is manufactured by the above-described manufacturing method, description of the manufacturing process is omitted.
- the upper and lower substrates 7 and 9 polycarbonate substrates having a thickness of 100 ⁇ m are used.
- the scanning electrode S and the data electrode D are formed by depositing a transparent conductive film made of IZO on the substrate surface and then patterning it into a predetermined shape.
- the wall surface structure 37 is formed on the lower substrate 9 using a positive photoresist.
- the shape of the wall surface structure 37 is formed in a lattice shape so as to surround the pixel region P as shown in FIG.
- an opening 36 is provided in the center of each side of the pixel region P.
- a reflectance reduction portion 34 having a height lower than the average height of the wall surface structure 37 is formed. Since the height of the reflectance reduction part 34 is lower than the average height of the wall surface structure 37, even when the upper and lower substrates 7 and 9 are bonded together, the flat part 34 a that is the uppermost surface of the reflectance reduction part 34 is the upper substrate. 7 is not touched.
- the photomask for forming the wall surface structure 37 has a light shielding film and a transmissive region formed at positions opposite to those of the photomask 43 shown in FIGS. 9 (a) and 9 (b). That is, a photomask is used in which a light shielding film is formed in a region where the wall structure 37 is disposed, and a region where the pixel region P is disposed becomes a transmission region. Further, in order to form the wall surface structure 37 including the reflectance reduction unit 34, the photomask has a light-shielding portion that is a semi-transmissive film having a predetermined aperture ratio (for example, 56%). It has in the area
- the opening 36 is formed on each side of the pixel region P.
- the opening width of the opening 36 is designed to be 14 ⁇ m with respect to a pixel pitch of 220 ⁇ m.
- the opening width refers to the length of the opening 36 in the direction along one side of the pixel region P adjacent to the opening 36.
- the wall surface structure 37 is formed so that the wall surface width is 15 ⁇ m, the height tw (see FIG. 3) is 4.2 ⁇ m, and the height tr of the reflectivity reduction unit 34 is 3.5 ⁇ m.
- An insulating film 18 is formed on the upper substrate 7. In order to maintain a predetermined cell gap, plastic spacers made of divinylbenzene are dispersed on the upper and lower substrates 7 and 9. A cholesteric liquid crystal prepared so as to reflect green light is sealed between the upper and lower substrates 7 and 9.
- the incident angle of light to the liquid crystal display panel was set to 30 °, and the reflectance measuring device was set so that the reflected light was received in front of the liquid crystal display panel, and the reflectance of the liquid crystal display panel immediately after liquid crystal injection was evaluated.
- a predetermined voltage was applied between the upper and lower substrates 7 and 9 to measure the reflectance of the liquid crystal display panel in a planar state or a focal conic state.
- the reflection wavelength is 535 nm in both the planar state and the focal conic state.
- the liquid crystal display panel of this comparative example has the same structure as the liquid crystal display panel provided in the liquid crystal display element 100 shown in FIGS.
- the liquid crystal display panel of this comparative example was manufactured using the same material as in Example 1 and using the same manufacturing method.
- a photomask is used in which a transmission region is formed in a region corresponding to the opening so that no resist remains in the opening when the wall structure is formed.
- Example 2 The liquid crystal display panel of this example is the same as that of Example 1 except that the wall structure 37 is formed of a negative resist.
- the aperture ratio of the semi-transmissive film of the photoresist is formed to be 44%.
- the reflectance of the liquid crystal display panel of this example was evaluated by the same method as in Example 1 above.
- the liquid crystal display panel of this comparative example has the same configuration as that of the comparative example 1 except that the wall structure is formed of a negative resist.
- a photomask having a light shielding film formed in a region corresponding to the opening is used so that the resist does not remain in the opening when the wall structure is formed.
- the reflectance of the liquid crystal display panel of this comparative example was evaluated by the same method as in Example 1 above.
- the reflectance of the standard white plate is a reference (100%)
- the reflectance in the planar state is 30%
- the liquid crystal display panel of Example 2 has a higher contrast ratio than the liquid crystal display panel of this comparative example.
- the liquid crystal display element 1 has the wall surface structure 37 continuously formed in a grid pattern at the peripheral edge of the pixel region P. A part of the wall surface structure 37 is bonded to the upper and lower substrates 7 and 9 in order to maintain the cell gap of the liquid crystal display element 1.
- the wall structure 37 has an opening 36 through which the liquid crystal 3 circulates except for the part.
- the opening 36 has a reflectance reduction part 34.
- the reflectance reduction part 34 is formed at a height lower than the height of the part of the wall surface structure 37 so as not to contact any one of the upper and lower substrates 7 and 9.
- the gap in the opening 36 is smaller than the cell gap in the pixel region P while securing the flow path of the liquid crystal 3.
- the liquid crystal display element 1 can improve the contrast by reducing the reflectance at the opening 36. Thereby, the liquid crystal display element 1 can obtain a good display.
- the opening 36 provided with the reflectance reduction portion 34 can be formed integrally with the wall surface structure 37, so that it is the same as the conventional liquid crystal display element 100.
- the liquid crystal display element 1 can be manufactured with a manufacturing process and a man-hour.
- FIG. 10 is a cross-sectional view of the vicinity of the opening 36 of the liquid crystal display element 1 according to this modification.
- the reflectance reduction unit 34 provided in the opening 36 has a plurality of protrusions 46 that protrude from the lower substrate 9. .
- the protrusions 46 are formed at substantially the same height as the average height of the wall surface structure 37.
- the protrusion 46 is in contact with the upper substrate 9.
- the protrusion 46 may be formed lower than the average height of the wall surface structure 37 so as not to contact the upper substrate 9.
- the plurality of protrusions 46 are arranged at a predetermined interval. For this reason, the gap between the adjacent protrusions 46 functions as a flow path for the liquid crystal 3. Therefore, the liquid crystal display element 1 according to this modification can ensure the circulation of the liquid crystal 3 even when the opening 36 has a protrusion.
- the protrusion 46 has an effect of disturbing the alignment state of the liquid crystal molecules, that is, the helical structure of the liquid crystal molecules. For this reason, the cholesteric liquid crystal filled in the opening 36 is in a homeotropic state and transmits incident light. Thereby, the reflectance at the opening 36 is reduced. For this reason, the contrast of the liquid crystal display element 1 is improved, and the same effect as the liquid crystal display element 1 shown in FIGS. 2 and 3 can be obtained.
- FIG. 11 is an enlarged plan view showing the semi-transmissive film 43h of the photomask 43 used for manufacturing the liquid crystal display element 1 of the present modification.
- the photomask 43 has a semi-transmissive film 43h formed in a lattice shape so as to transmit about 56% intensity of incident light.
- the semi-transmissive film 43h is formed so as to correspond to the formation position of the reflectance reduction part 34.
- the transmittance of the semipermeable membrane 43h is the same as the transmittance of the semipermeable membrane 43h shown in FIG. 9B, but the density distribution of the openings is large. For this reason, the photomask 43 can locally expose the resist layer corresponding to the semi-transmissive film 43h with an exposure amount greater than the necessary exposure amount. As a result, the resist layer exposed with an exposure amount greater than the necessary exposure amount remains in the opening 36 and becomes a protrusion 46.
- the liquid crystal display element 1 according to this modification can be manufactured by the same manufacturing method as the liquid crystal display element 1 shown in FIG. 2 by using a pattern in which the aperture ratio of the semi-transmissive film 43h changes spatially.
- FIG. 12 is a cross-sectional view of the vicinity of the opening 36 of the liquid crystal display element 1 according to this modification.
- the reflectance reduction unit 34 provided in the opening 36 has a wall surface shape including an uneven portion 48 formed on the surface facing the upper substrate 7. have.
- the height of the concave portion of the concavo-convex portion 48 is formed lower than the average height of the wall surface structure 37.
- the convex portion of the concave and convex portion 48 is formed at a height substantially equal to the average height of the wall surface structure 37 and is in contact with the upper substrate 7.
- grooved part 48 may be formed lower than the average height of the wall surface structure 37, and may not contact the upper board
- the concave portion of the concave and convex portion 48 is lower than the height of the wall surface structure 37. Therefore, the gap between the upper substrate 7 and the reflectance reduction unit 34 functions as a flow path for the liquid crystal 3. Thereby, the liquid crystal display element 1 according to the present modification can ensure the circulation of the liquid crystal even if the reflectance reducing unit 34 has the uneven portion 48.
- the concavo-convex portion 48 has the effect of disturbing the alignment state of the liquid crystal molecules, that is, the helical structure of the liquid crystal molecules, similarly to the protrusion 46 of the first modification.
- the cholesteric liquid crystal present in the opening 36 is in a homeotropic state and transmits incident light. Thereby, the reflectance at the opening 36 is reduced. Further, the gap at the opening 36 becomes smaller than the cell gap of the pixel region P by the reflectance reduction unit 34.
- the reflectance at the opening 36 decreases due to the same effect as the liquid crystal display element 1 shown in FIG. Thereby, the contrast is improved, and the liquid crystal display element 1 of the present modification can obtain the same effect as the liquid crystal display element 1 shown in FIG.
- FIG. 13 is an enlarged plan view showing the semi-transmissive film 43h of the photomask 43 used for manufacturing the liquid crystal display element 1 of the present modification.
- the photomask 43 has a semi-transmissive film 43h formed in a lattice shape so as to transmit about 56% intensity of incident light.
- the semi-transmissive film 43h is formed so as to correspond to the formation position of the reflectance reduction part 34.
- the transmittance of the semipermeable membrane 43h is substantially the same as the transmittance of the semipermeable membrane 43h shown in FIG.
- the density distribution of the openings of the semipermeable membrane 43h is smaller than the density distribution of the openings of the semipermeable membrane 43h shown in FIG.
- the photomask 43 in this modification is not opened to such an extent that the resist layer can be exposed with an exposure amount greater than the required exposure amount, like the photomask 43 shown in FIG.
- the photomask 43 in this modification has a density distribution in the opening, the exposure amount can be locally increased although it cannot be exposed more than necessary.
- the reflectance reduction part 34 provided with the uneven part 48 is formed in the opening part of the wall surface structure 37.
- the liquid crystal display element 1 according to this modification can be manufactured by the same manufacturing method as the liquid crystal display element 1 shown in FIG. 2 by using a pattern in which the aperture ratio of the semi-transmissive film 43h changes spatially.
- FIG. 14 shows a state in which the liquid crystal display element 1 according to this modification is viewed in the normal direction of the substrate surface.
- the opening 36 of the liquid crystal display element 1 according to the present modification is located on the opposite side of the wall structure 37 that extends substantially parallel to the scanning electrode Si. It is formed at one end.
- the opening 36 is formed at the same position in the configuration. Therefore, in the same j row, the openings 36 are continuously arranged in a row on the extension line of the wall surface structure 37. This configuration is the same for the adjacent column j + 1 and the like.
- the reflectance reduction part 34 formed in the opening 36 is formed in the same wall shape as the reflectance reduction part 34 shown in FIGS.
- the reflectance reduction unit 34 has a flat portion 34 a having a flat shape on the surface facing the upper substrate 7.
- the shape of the reflectance reduction unit 34 is not limited to the shape shown in FIG. 14, and may naturally be the shape shown in FIG. 10 or 12.
- the side surface of the pixel region P is surrounded and closed by a wall surface structure 37 except for the opening 36.
- the liquid crystal in the pixel region P can move out of the pixel region P through the opening 36. Therefore, the liquid crystal display element 1 according to this modification can ensure the flow of the liquid crystal 3.
- the liquid crystal display element 1 has the reflectance reduction part 34 in the opening part 36, the reflectance in the opening part 36 falls by the effect similar to the liquid crystal display element 1 shown in FIG. Thereby, the contrast is improved, and the liquid crystal display element 1 of the present modification can obtain the same effect as the liquid crystal display element 1 shown in FIG.
- the manufacturing method of the display element according to this modification can be manufactured by the same manufacturing method as the liquid crystal display element 1 shown in FIG. 2 only by changing the formation position of the semi-transmissive film 43h.
- Example 2 Next, an example of the liquid crystal display element 1 according to this modification will be described.
- the upper and lower substrates 7 and 9 were polycarbonate substrates having a plate thickness of 100 ⁇ m.
- a transparent conductive film made of IZO was formed by vapor deposition.
- a wall structure 37 for bonding and fixing the substrates 7 and 9 when the two substrates 7 and 9 are bonded together is formed of a negative photoresist.
- the wall surface structure 37 has a pattern that is continuous in the vertical direction and a pattern in which openings 36 are formed in the horizontal direction.
- the wall surface structure 37 When the opening 36 is removed, the wall surface structure 37 has a continuous U-shape.
- the wall surface structure 37 has, for example, an opening 36 that is a non-adhesive wall surface that does not contact the upper substrate 7 between a continuous wall surface extending in a direction substantially parallel to the extending direction of the data electrode Dj and the U-shaped tip. is doing.
- a reflectance reduction portion 34 is formed in the opening 36.
- the reflectance reduction unit 34 has an appropriate aperture ratio equivalent to that of the light shielding film 43h shown in FIG. 9B, and is a photomask provided with a light shielding film at a position corresponding to the reflectance reduction unit 34 shown in FIG. Is formed integrally with the wall surface structure 37.
- a photomask having the same aperture ratio and a density distribution of the light shielding film May be used.
- the opening 36 is formed on two opposite sides of the wall surface structure 37 surrounding the pixel region P.
- the opening width of the opening 36 is designed to be 14 ⁇ m with respect to a pixel pitch of 220 ⁇ m.
- the wall width of the opening 36 was 15 ⁇ m.
- the wall surface height of the wall structure 37 is 4.2 ⁇ m.
- the opening height of the reflectance reduction part 34 is 3.5 ⁇ m.
- the sealing material 12 was provided with an inlet opening for liquid crystal injection at the end of the substrate.
- Two substrates 7 and 9 were bonded together and pressed and heated to be bonded.
- the empty cell prepared as described above was brought into a vacuum state, and the end of the empty cell was immersed in cholesteric liquid crystal prepared so as to reflect green light, and the liquid crystal was injected by opening to the atmosphere.
- the reflectance of the liquid crystal display panel immediately after liquid crystal injection was evaluated by the same method as in Example 1 above.
- the reflectivity in the planar state was 30.4%
- the reflection wavelength is 535 nm in both the planar state and the focal conic state.
- FIG. 15 schematically shows a cross-sectional configuration of the liquid crystal display element 1 capable of full color display using a cholesteric liquid crystal.
- the present liquid crystal display element 1 is configured by laminating a blue (B) liquid crystal display element 1b, a green (G) liquid crystal display element 1g, and a red (R) liquid crystal display element 1r in order from the display surface.
- B blue
- G green
- R red
- the upper substrate 7b side above is the display surface
- external light solid arrow
- the observer's eyes and the observation direction are schematically shown above the upper substrate 7b.
- the B liquid crystal display element 1b has a blue (B) liquid crystal layer 3b formed between a pair of upper and lower substrates 7b and 9b, and a pulse voltage source 41b for applying a predetermined pulse voltage to the B liquid crystal layer 1b. is doing.
- the B liquid crystal layer 3b includes cholesteric liquid crystal that reflects blue light in a planar state.
- the G liquid crystal display element 1g includes a green (G) liquid crystal layer 3g formed between a pair of upper and lower substrates 7g and 9g, and a pulse voltage source 41g that applies a predetermined pulse voltage to the G liquid crystal layer 3g. is doing.
- the G liquid crystal layer 3g includes cholesteric liquid crystal that reflects green light in a planar state.
- the R liquid crystal display element 1r includes a red (R) liquid crystal layer 3r formed between a pair of upper and lower substrates 7r and 9r, and a pulse voltage source 41r that applies a predetermined pulse voltage to the R liquid crystal layer 3r. is doing.
- the R liquid crystal layer 3r has a cholesteric liquid crystal that reflects red light in a planar state.
- a visible light absorbing layer 15 is disposed on the back surface of the lower substrate 9r of the R display portion 1r.
- the driving voltage tends to be higher for cholesteric liquid crystals that reflect light of shorter wavelengths.
- the drive voltage becomes lower as the cell gap d is narrower. Therefore, in order to make the driving voltages of the liquid crystal layers 3b, 3g, and 3r equal, the cell gaps of the liquid crystal layers 3b, 3g, and 3r may be made different to make the cell gap of the B liquid crystal layer 3b the smallest.
- the liquid crystal display element 1 has a memory property, and can display a bright and colorful full color display without consuming electric power except during screen rewriting.
- the liquid crystal display element 1 according to the present embodiment is suitable as a display element for electronic paper because it is excellent in flexibility and excellent in impact resistance and pressure resistance to the display surface.
- Electronic paper using the liquid crystal display element 1 as a display element can be applied to electronic books, electronic newspapers, electronic posters, electronic dictionaries, and the like.
- the liquid crystal display element 1 according to the present embodiment is also suitable for a display element of a portable device that requires flexibility and a wide storage temperature, such as a portable terminal such as a PDA (Personal Data Assistant) or a wristwatch.
- the present invention can also be applied to display devices in various fields such as a display element of a paper type computer display that is expected to be realized in the future and a display for display in a store or the like.
- FIG. 16 shows a specific example of electronic paper EP provided with the liquid crystal display element 1 according to the present embodiment.
- FIG. 16A shows an electronic paper EP having a configuration in which a nonvolatile memory 1m in which image data is stored in advance is inserted into and removed from the liquid crystal display element 1 according to the present embodiment.
- image data can be displayed by storing image data stored in a personal computer or the like in the non-volatile memory 1m and mounting the image data on the electronic paper EP.
- FIG. 16B shows an electronic paper EP having a configuration in which the nonvolatile memory 1m is built in the liquid crystal display element 1 according to the present embodiment.
- image data can be displayed by storing image data in the nonvolatile memory 1m by wire from the terminal 1t storing the image data (the terminal 1t may constitute a part of the electronic paper EP).
- FIG. 16C shows an example in which the terminal 1t and the liquid crystal display element 1 have a wireless transmission / reception system (for example, a wireless LAN or Bluetooth).
- the image data can be displayed by storing the image data in the nonvolatile memory 1m by the wireless communication 1wl from the terminal 1t storing the image data.
- the present invention is not limited to the above embodiment, and various modifications can be made.
- the liquid crystal display element 1 having a single-layer structure or a three-layer structure in which the liquid crystal display elements 1b, 1g, and 1r for B, G, and R are stacked has been described as an example. Not limited to. Even a structure in which two or more layers of liquid crystal display elements are stacked is applicable.
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Abstract
Description
1b 青色(B)用液晶表示素子
1g 緑色(G)用液晶表示素子
1r 赤色(R)用液晶表示素子
3 液晶
3b B用液晶層
3g G用液晶層
3r R用液晶層
7、7b、7g、7r 上基板
9、9b、9g、9r 下基板
15 可視光吸収層
21 シール材
34 反射率低減部
34a 平坦部
36 開口部
37 壁面構造体
38 注入口
41b、41g、41r パルス電圧源
43 フォトマスク
43h 半透過膜
43s 遮光膜
43t 透過領域
46 突起部
48 凹凸部
D データ電極
P 画素領域
S 走査電極
(実施例1)
本実施例の液晶表示パネルは、上述の製造方法により製造されているので、製造工程の説明は省略する。上下基板7、9には、厚さが100μmのポリカーボネート製基板が用いられている。走査電極S及びデータ電極Dは、基板表面にIZOからなる透明導電膜を蒸着した後に所定形状にパターニングして形成されている。壁面構造体37はポジ型フォトレジストを用いて下基板9上に形成されている。壁面構造体37の形状は、図2に示すように、画素領域Pを囲むように格子状に形成されている。
本比較例の液晶表示パネルは、図4及び図5に示す液晶表示素子100に備えられた液晶表示パネルと同様の構造を有している。本比較例の液晶表示パネルは、上記実施例1と同様の材料を用い、且つ同様の製造方法により製造された。本変形例では、壁面構造体の形成時に開口部にレジストが残存しないように、開口部に対応する領域に透過領域を形成したフォトマスクが用いられる。
本実施例の液晶表示パネルは、壁面構造体37がネガ型のレジストで形成されている点を除いて、上記実施例1と同様である。反射率低減部34の高さを本実施例と上記実施例1とで同じにするため、フォトレジストの半透過膜の開口率は44%に形成されている。
本比較例の液晶表示パネルは、壁面構造体がネガ型のレジストで形成されている点を除いて、上記比較例1と同様の構成を有している。本比較例では、壁面構造体の形成時に開口部にレジストが残存しないように、開口部に対応する領域に遮光膜が形成されたフォトマスクが用いられる。
次に、本変形例による液晶表示素子1の実施例について説明する。図14に示す構造の開口部36及び壁面構造体37が形成された液晶表示素子1を作製した。壁面構造体37を形成するためのフォトマスクのマスクパターンを除いて、本実施例の液晶表示素子1は図7(a)乃至図8(c)に示す製造方法で作製された。上下基板7、9は、板厚100μmのポリカーボネート製基板を用いた。上下基板7、9表面の走査電極Si及びデータ電極Djは、IZOからなる透明導電膜を蒸着により形成した。一方の例えば下基板9には、2枚の基板7、9を貼り合わせたときに、基板7、9間を接着・固定するための壁面構造体37をネガ型フォトレジストにより形成した。壁面構造体37は、注入口を鉛直上方に向けた場合、鉛直方向に切れ目無く連続したパターンと、水平方向に開口部36が形成されたパターンとを有している。
図15は、コレステリック液晶を用いるフルカラー表示が可能な液晶表示素子1の断面構成を模式的に示している。本液晶表示素子1は、表示面から順に、青色(B)用液晶表示素子1b、緑色(G)用液晶表示素子1g、赤色(R)用液晶表示素子1rが積層されて構成されている。図示において、上方の上基板7b側が表示面であり、外光(実線矢印)は上基板7b上方から表示面に向かって入射するようになっている。なお、上基板7b上方に観測者の目及びその観察方向(破線矢印)を模式的に示している。
上記実施の形態では、単層構造、またはB、G、R用液晶表示素子1b、1g、1rが積層された3層構造の液晶表示素子1を例に挙げて説明したが、本発明はこれに限られない。2層、あるいは4層以上の液晶表示素子を積層した構造であっても適用可能である。
Claims (20)
- 一対の基板と、
前記一対の基板間に封止された液晶と、
前記一対の基板の一方に形成された第1の電極と、
前記一対の基板の他方に形成された第2の電極と、
前記第1の電極と前記第2の電極とが交差するように対向して配置することで画定された画素領域と、
前記一対の基板間に前記画素領域を囲むように前記画素領域外に形成された壁面構造体と、
前記液晶が流通するように前記壁面構造体の一部を開口した開口部と、
前記開口部に形成されて前記開口部での前記液晶の反射率を低減する反射率低減部と
を有することを特徴とする表示素子。 - 請求項1記載の表示素子において、
前記反射率低減部は、前記壁面構造体と一体的に形成されていること
を特徴とする表示素子。 - 請求項2記載の表示素子において、
前記反射率低減部は、前記壁面構造体より高さの低い壁面形状を有すること
を特徴とする表示素子。 - 請求項3記載の表示素子において、
前記反射率低減部は、前記一対の基板のいずれか一方との対向面に形成された平坦部を有すること
を特徴とする表示素子。 - 請求項3記載の表示素子において、
前記反射率低減部は、前記一対の基板のいずれか一方との対向面に形成された凹凸部を有すること
を特徴とする表示素子。 - 請求項1記載の表示素子において、
前記反射率低減部は、前記一対の基板のいずれか一方から突出して形成された突起部を有すること
を特徴とする表示素子。 - 請求項1乃至6のいずれか1項に記載の表示素子において、
前記画素領域が、4辺形状であること
を特徴とする表示素子。 - 請求項7記載の表示素子において、
前記開口部は、前記辺のほぼ中央に形成されていること
を特徴とする表示素子。 - 請求項7記載の表示素子において、
前記開口部は、前記対向する辺の一端部に形成されていること
を特徴とする表示素子。 - 請求項1記載の表示素子において、
前記壁面構造体の幅は、一の基板に形成された隣接する前記電極の間隔と同じ、あるいは狭いこと
を特徴とする表示素子。 - 請求項1記載の表示素子において、
前記壁面構造体は、前記一対の基板の双方に接着されていること
を特徴とする表示素子。 - 請求項1記載の表示素子において、
前記液晶は、メモリ性を有することを特徴とする表示素子。 - 請求項13記載の表示素子において、
前記液晶は、コレステリック液晶であることを特徴とする表示素子。 - 請求項1記載の表示素子が2層以上積層されていること
を特徴とする表示素子。 - 請求項1記載の表示素子が3層積層され、
一の前記液晶は、青色の光を反射し、
他の前記液晶は、緑色の光を反射し、
さらに他の前記液晶は、赤色の光を反射すること
を特徴とする表示素子。 - 画像を表示する電子ペーパーにおいて、
請求項1記載の表示素子を備えていることを特徴とする電子ペーパー。 - 画像を表示する電子端末装置において、
請求項1記載の表示素子を備えていることを特徴とする電子端末装置。 - 一対の基板間に液晶を封止して製造する表示素子の製造方法において、
前記一対の基板の一方に第1の電極を形成し、
前記一対の基板の他方に第2の電極を形成し、
前記第1の電極と前記第2の電極とが交差するように対向して配置することで画定される画素領域を形成し、
前記一対の基板間に前記画素領域を囲むように前記画素領域外に壁面構造体を形成し、
前記液晶が流通するように前記壁面構造体の一部を開口する開口部を形成し、
前記開口部での前記液晶の反射率を低減する反射率低減部を前記開口部に形成すること
を特徴とする表示素子の製造方法。 - 請求項18記載の表示素子の製造方法において、
前記反射率低減部を前記壁面構造体と一体的に同時に形成すること
を特徴とする表示素子。 - 請求項18記載の表示素子の製造方法において、
前記反射率低減部を前記壁面構造体より高さの低い壁面形状に形成すること
を特徴とする表示素子の製造方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009546885A JP5182294B2 (ja) | 2007-12-21 | 2007-12-21 | コレステリック液晶表示素子 |
KR1020107008812A KR101115707B1 (ko) | 2007-12-21 | 2007-12-21 | 표시 소자 및 그 제조 방법 및 그것을 이용한 전자 페이퍼 및 전자 단말 장치 |
CN2007801020301A CN101903823B (zh) | 2007-12-21 | 2007-12-21 | 显示元件及其制造方法以及电子纸张及电子终端装置 |
PCT/JP2007/074665 WO2009081468A1 (ja) | 2007-12-21 | 2007-12-21 | コレステリック液晶表示素子 |
US12/785,912 US20100231843A1 (en) | 2007-12-21 | 2010-05-24 | Liquid crystal display element, method of manufacturing the element, and electronic paper and electronic terminal apparatus utilizing the element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/074665 WO2009081468A1 (ja) | 2007-12-21 | 2007-12-21 | コレステリック液晶表示素子 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US12/785,912 Continuation US20100231843A1 (en) | 2007-12-21 | 2010-05-24 | Liquid crystal display element, method of manufacturing the element, and electronic paper and electronic terminal apparatus utilizing the element |
Publications (1)
Publication Number | Publication Date |
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WO2009081468A1 true WO2009081468A1 (ja) | 2009-07-02 |
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PCT/JP2007/074665 WO2009081468A1 (ja) | 2007-12-21 | 2007-12-21 | コレステリック液晶表示素子 |
Country Status (5)
Country | Link |
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US (1) | US20100231843A1 (ja) |
JP (1) | JP5182294B2 (ja) |
KR (1) | KR101115707B1 (ja) |
CN (1) | CN101903823B (ja) |
WO (1) | WO2009081468A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009222915A (ja) * | 2008-03-14 | 2009-10-01 | Fuji Xerox Co Ltd | 液晶表示媒体及びその製造方法 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8149373B2 (en) * | 2009-05-28 | 2012-04-03 | Chunghwa Picture Tubes, Ltd. | Liquid crystal display |
CN102692752B (zh) * | 2012-06-07 | 2015-03-25 | 深圳市华星光电技术有限公司 | 液晶显示面板及其制作方法 |
KR20140094217A (ko) * | 2013-01-21 | 2014-07-30 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
KR20140118623A (ko) * | 2013-03-29 | 2014-10-08 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
CN103823323B (zh) * | 2014-03-21 | 2016-08-17 | 大连龙宁科技有限公司 | 一种多组分胆甾型液晶电子纸的封装结构及其制造方法 |
KR102405312B1 (ko) * | 2015-10-06 | 2022-06-02 | 엘지디스플레이 주식회사 | 광 제어장치, 그를 포함한 투명표시장치 및 그의 제조방법 |
US10670905B2 (en) * | 2017-02-10 | 2020-06-02 | Microsoft Techonology Licensing, Llc | Black matrix structures for displays devices |
CN107168578B (zh) * | 2017-05-12 | 2019-09-27 | 京东方科技集团股份有限公司 | 内嵌式触控显示面板及其制作方法、显示装置 |
CN108614374A (zh) * | 2018-04-24 | 2018-10-02 | 深圳市华星光电半导体显示技术有限公司 | 一种柔性液晶显示面板和柔性液晶显示器 |
CN108594542B (zh) * | 2018-06-22 | 2024-05-10 | 浙江富申科技有限公司 | 分区域显示的胆甾型液晶电子纸显示装置及其制作方法 |
CN111552112B (zh) * | 2020-05-25 | 2023-09-01 | Tcl华星光电技术有限公司 | 显示面板 |
CN115586675B (zh) * | 2022-09-28 | 2023-09-19 | 惠科股份有限公司 | 电子纸显示器及其制备方法 |
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JP2001305551A (ja) * | 2000-04-18 | 2001-10-31 | Fuji Xerox Co Ltd | コレステリック液晶表示素子 |
JP2001311952A (ja) * | 2000-04-28 | 2001-11-09 | Fuji Xerox Co Ltd | 表示素子 |
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JPH09127524A (ja) * | 1995-11-06 | 1997-05-16 | Sharp Corp | 液晶表示素子 |
US6337730B1 (en) * | 1998-06-02 | 2002-01-08 | Denso Corporation | Non-uniformly-rigid barrier wall spacers used to correct problems caused by thermal contraction of smectic liquid crystal material |
TW535024B (en) * | 2000-06-30 | 2003-06-01 | Minolta Co Ltd | Liquid display element and method of producing the same |
JP2004219948A (ja) * | 2003-01-17 | 2004-08-05 | Nippon Hoso Kyokai <Nhk> | 液晶光学素子およびその製造方法 |
JP2005189662A (ja) * | 2003-12-26 | 2005-07-14 | Fujitsu Display Technologies Corp | 液晶表示装置及びその製造方法 |
KR100715756B1 (ko) * | 2004-03-09 | 2007-05-08 | 샤프 가부시키가이샤 | 액정 표시 장치 |
JP4871265B2 (ja) * | 2005-03-18 | 2012-02-08 | 富士通株式会社 | 液晶表示素子 |
EP1903383B1 (en) * | 2005-07-11 | 2012-09-12 | Fujitsu Ltd. | Liquid crystal display element |
-
2007
- 2007-12-21 CN CN2007801020301A patent/CN101903823B/zh not_active Expired - Fee Related
- 2007-12-21 WO PCT/JP2007/074665 patent/WO2009081468A1/ja active Application Filing
- 2007-12-21 JP JP2009546885A patent/JP5182294B2/ja active Active
- 2007-12-21 KR KR1020107008812A patent/KR101115707B1/ko not_active IP Right Cessation
-
2010
- 2010-05-24 US US12/785,912 patent/US20100231843A1/en not_active Abandoned
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JPH1068934A (ja) * | 1996-07-26 | 1998-03-10 | Sharp Corp | 液晶装置及びその製造方法 |
JP2001305551A (ja) * | 2000-04-18 | 2001-10-31 | Fuji Xerox Co Ltd | コレステリック液晶表示素子 |
JP2001311952A (ja) * | 2000-04-28 | 2001-11-09 | Fuji Xerox Co Ltd | 表示素子 |
Cited By (1)
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JP2009222915A (ja) * | 2008-03-14 | 2009-10-01 | Fuji Xerox Co Ltd | 液晶表示媒体及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101903823B (zh) | 2012-02-08 |
US20100231843A1 (en) | 2010-09-16 |
JPWO2009081468A1 (ja) | 2011-05-06 |
KR101115707B1 (ko) | 2012-03-06 |
CN101903823A (zh) | 2010-12-01 |
JP5182294B2 (ja) | 2013-04-17 |
KR20100059999A (ko) | 2010-06-04 |
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