WO2009060906A1 - マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法 - Google Patents

マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法 Download PDF

Info

Publication number
WO2009060906A1
WO2009060906A1 PCT/JP2008/070223 JP2008070223W WO2009060906A1 WO 2009060906 A1 WO2009060906 A1 WO 2009060906A1 JP 2008070223 W JP2008070223 W JP 2008070223W WO 2009060906 A1 WO2009060906 A1 WO 2009060906A1
Authority
WO
WIPO (PCT)
Prior art keywords
board
mirror
electrode
microactuator
display
Prior art date
Application number
PCT/JP2008/070223
Other languages
English (en)
French (fr)
Inventor
Junji Suzuki
Soichi Owa
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2009540083A priority Critical patent/JP5609114B2/ja
Publication of WO2009060906A1 publication Critical patent/WO2009060906A1/ja
Priority to US12/662,719 priority patent/US8699116B2/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
    • B81B3/0021—Transducers for transforming electrical into mechanical energy or vice versa
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H02N1/006—Electrostatic motors of the gap-closing type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches

Abstract

　光学デバイスは、両端が脚部３を介して基板１に対して固定された撓み変形可能な板状部材２を有する。板状部材２は、ミラー４が、接続部１１を介して、板状部材２の撓み変形可能な領域に接続される。板状部材２の中央部と対向して、板状部材２の下側及び上側に固定電極５及び梁部材１４がそれぞれ設けられる。板状部材２の電極と梁部材１４の電極との間に電圧を印加すると、板状部材２が梁部材１４に当接して、ミラー４が一方側へ傾く。板状部材２の電極と固定電極５との間に電圧を印加すると、板状部材２が固定電極５側に当接して、ミラー４が他方側へ傾く。ミラー４自体を変形させずにミラー４の向きのみを変更することを可能にし、静定時間を短縮して駆動をより高速化することができる。  
PCT/JP2008/070223 2007-11-09 2008-11-06 マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法 WO2009060906A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009540083A JP5609114B2 (ja) 2007-11-09 2008-11-06 マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法
US12/662,719 US8699116B2 (en) 2007-11-09 2010-04-29 Microactuator, optical device, display apparatus, exposure apparatus, and method for producing device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-291790 2007-11-09
JP2007291790 2007-11-09

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/662,719 Continuation US8699116B2 (en) 2007-11-09 2010-04-29 Microactuator, optical device, display apparatus, exposure apparatus, and method for producing device

Publications (1)

Publication Number Publication Date
WO2009060906A1 true WO2009060906A1 (ja) 2009-05-14

Family

ID=40625793

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070223 WO2009060906A1 (ja) 2007-11-09 2008-11-06 マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8699116B2 (ja)
JP (1) JP5609114B2 (ja)
TW (1) TWI418850B (ja)
WO (1) WO2009060906A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012000528A1 (en) 2010-07-01 2012-01-05 Carl Zeiss Smt Gmbh Optical system and multi facet mirror
WO2015080057A1 (ja) * 2013-11-27 2015-06-04 株式会社ニコン 空間光変調器、光描画装置、露光装置およびデバイス製造方法
JP2015125219A (ja) * 2013-12-26 2015-07-06 セイコーエプソン株式会社 光スキャナー、画像表示装置およびヘッドマウントディスプレイ
JP2015125220A (ja) * 2013-12-26 2015-07-06 セイコーエプソン株式会社 光スキャナー、画像表示装置およびヘッドマウントディスプレイ
JP2015161765A (ja) * 2014-02-27 2015-09-07 国立大学法人京都大学 静電駆動可変ミラー
JP2021049983A (ja) * 2020-12-03 2021-04-01 国立大学法人九州工業大学 変位変換装置及びその製造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI401525B (zh) * 2009-08-11 2013-07-11 Qisda Corp 光導管以及使用此光導管的投影裝置
FR3058409A1 (fr) * 2016-11-10 2018-05-11 Commissariat A L'energie Atomique Et Aux Energies Alternatives Dispositif microelectromecanique et/ou nanoelectromecanique articule a deplacement hors-plan
CN111258057A (zh) * 2018-11-30 2020-06-09 成都理想境界科技有限公司 一种扫描驱动器及光纤扫描器
KR102390808B1 (ko) * 2020-04-29 2022-05-04 주식회사 위멤스 정전형 광스캐너 패키지 및 제조 방법
WO2024012756A1 (en) * 2022-07-12 2024-01-18 Asml Netherlands B.V. Mirror assembly for micromirror array

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002351086A (ja) * 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
JP2003029176A (ja) * 2001-07-17 2003-01-29 Mitsubishi Cable Ind Ltd 光スイッチ及びその製造方法、並びに光スイッチシステム
JP2005504355A (ja) * 2001-10-04 2005-02-10 ディーコン エーエス 特に光学用途のための切り替えデバイス
JP2006102934A (ja) * 2004-09-29 2006-04-20 Lucent Technol Inc 適応光学装置で使用するための傾斜またはピストン運動を有するｍｅｍｓミラー
JP2006178447A (ja) * 2000-08-03 2006-07-06 Reflectivity Inc マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2007017769A (ja) * 2005-07-08 2007-01-25 Fujifilm Holdings Corp 光通信用微小薄膜可動素子及び微小薄膜可動素子アレイ
JP2007192902A (ja) * 2006-01-17 2007-08-02 Fujifilm Corp 微小電気機械素子の駆動方法及び微小電気機械素子アレイの駆動方法、微小電気機械素子及び微小電気機械素子アレイ、並びに画像形成装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5285196A (en) 1992-10-15 1994-02-08 Texas Instruments Incorporated Bistable DMD addressing method
US5835256A (en) * 1995-06-19 1998-11-10 Reflectivity, Inc. Reflective spatial light modulator with encapsulated micro-mechanical elements
US6046840A (en) * 1995-06-19 2000-04-04 Reflectivity, Inc. Double substrate reflective spatial light modulator with self-limiting micro-mechanical elements
KR100841147B1 (ko) * 1998-03-11 2008-06-24 가부시키가이샤 니콘 레이저 장치, 자외광 조사 장치 및 방법, 물체의 패턴 검출장치 및 방법
JP2002353105A (ja) 2001-05-24 2002-12-06 Nikon Corp 照明光学装置，該照明光学装置を備えた露光装置，およびマイクロデバイスの製造方法
US6737662B2 (en) * 2001-06-01 2004-05-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
JP2003242873A (ja) * 2002-02-19 2003-08-29 Fujitsu Component Ltd マイクロリレー
US7551048B2 (en) * 2002-08-08 2009-06-23 Fujitsu Component Limited Micro-relay and method of fabricating the same
JP4223246B2 (ja) * 2002-08-08 2009-02-12 富士通コンポーネント株式会社 マイクロリレー及びその製造方法
JP4042551B2 (ja) 2002-12-02 2008-02-06 株式会社ニコン マイクロアクチュエータ装置及び光スイッチシステム
KR100493058B1 (ko) * 2003-04-15 2005-06-02 삼성전자주식회사 소켓 이상 유무를 실시간으로 판단하는 반도체 소자의전기적 검사방법
JP2005024966A (ja) 2003-07-03 2005-01-27 Ricoh Co Ltd 光変調装置
JP2005175177A (ja) 2003-12-11 2005-06-30 Nikon Corp 光学装置及び露光装置
US7242456B2 (en) * 2004-05-26 2007-07-10 Asml Holdings N.V. System and method utilizing a lithography tool having modular illumination, pattern generator, and projection optics portions
US7116463B2 (en) * 2004-07-15 2006-10-03 Optron Systems, Inc. High angular deflection micro-mirror system
US7944599B2 (en) * 2004-09-27 2011-05-17 Qualcomm Mems Technologies, Inc. Electromechanical device with optical function separated from mechanical and electrical function
US7385747B2 (en) * 2005-12-01 2008-06-10 Texas Instruments Incorporated Illumination system with integral modulation technique
JP4731388B2 (ja) * 2006-04-17 2011-07-20 京セラ株式会社 変位デバイス及びそれを用いた可変容量コンデンサ，スイッチ並びに加速度センサ
JP4872453B2 (ja) 2006-05-20 2012-02-08 株式会社ニコン マイクロアクチュエータ、光学デバイス及び表示装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006178447A (ja) * 2000-08-03 2006-07-06 Reflectivity Inc マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2002351086A (ja) * 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
JP2003029176A (ja) * 2001-07-17 2003-01-29 Mitsubishi Cable Ind Ltd 光スイッチ及びその製造方法、並びに光スイッチシステム
JP2005504355A (ja) * 2001-10-04 2005-02-10 ディーコン エーエス 特に光学用途のための切り替えデバイス
JP2006102934A (ja) * 2004-09-29 2006-04-20 Lucent Technol Inc 適応光学装置で使用するための傾斜またはピストン運動を有するｍｅｍｓミラー
JP2007017769A (ja) * 2005-07-08 2007-01-25 Fujifilm Holdings Corp 光通信用微小薄膜可動素子及び微小薄膜可動素子アレイ
JP2007192902A (ja) * 2006-01-17 2007-08-02 Fujifilm Corp 微小電気機械素子の駆動方法及び微小電気機械素子アレイの駆動方法、微小電気機械素子及び微小電気機械素子アレイ、並びに画像形成装置

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012000528A1 (en) 2010-07-01 2012-01-05 Carl Zeiss Smt Gmbh Optical system and multi facet mirror
US9213245B2 (en) 2010-07-01 2015-12-15 Carl Zeiss Smt Gmbh Optical system and multi facet mirror of a microlithographic projection exposure apparatus
WO2015080057A1 (ja) * 2013-11-27 2015-06-04 株式会社ニコン 空間光変調器、光描画装置、露光装置およびデバイス製造方法
JP6070860B2 (ja) * 2013-11-27 2017-02-01 株式会社ニコン 空間光変調器、光描画装置、露光装置およびデバイス製造方法
US9910268B2 (en) 2013-11-27 2018-03-06 Nikon Corporation Spatial light modulator, photolithographing apparatus, exposure apparatus, and method of manufacturing device
JP2015125219A (ja) * 2013-12-26 2015-07-06 セイコーエプソン株式会社 光スキャナー、画像表示装置およびヘッドマウントディスプレイ
JP2015125220A (ja) * 2013-12-26 2015-07-06 セイコーエプソン株式会社 光スキャナー、画像表示装置およびヘッドマウントディスプレイ
JP2015161765A (ja) * 2014-02-27 2015-09-07 国立大学法人京都大学 静電駆動可変ミラー
JP2021049983A (ja) * 2020-12-03 2021-04-01 国立大学法人九州工業大学 変位変換装置及びその製造方法
JP7129719B2 (ja) 2020-12-03 2022-09-02 国立大学法人九州工業大学 変位変換装置

Also Published As

Publication number Publication date
TWI418850B (zh) 2013-12-11
JP5609114B2 (ja) 2014-10-22
US20100253925A1 (en) 2010-10-07
JPWO2009060906A1 (ja) 2011-03-24
TW200928432A (en) 2009-07-01
US8699116B2 (en) 2014-04-15

Similar Documents

Publication Publication Date Title
WO2009060906A1 (ja) マイクロアクチュエータ、光学デバイス、表示装置、露光装置、及びデバイス製造方法
EP1350758A3 (en) Electrostatic bimorph actuator
WO2009006118A3 (en) Microelectromechanical device with optical function separated from mechanical and electrical function
WO2005026801A3 (en) Apparatus for manipulation of an optical element
WO2006123288A3 (en) Electrowetting element, lens system, electronic device and driving method
WO2008035984A3 (en) Compact polymer lens
EP1351089A3 (en) Optical switch device
GB2427483A (en) Microelectromechanical device with reset electrode
HK1098538A1 (en) Variable optical attenuator
WO2005123387A3 (en) Electro-active adhesive systems
EP1473692A3 (en) Control of mems and light modulator arrays
WO2008048434A3 (en) Segmented optical modulator
WO2009006120A8 (en) Microelectromechanical device with optical function separated from mechanical and electrical function
TW200602256A (en) A structure of a micro electro mechanical system
AU2003300925A1 (en) Varactor apparatuses and methods
EP1986319A3 (en) Variable filter element, variable filter module and fabrication method thereof
TW200515364A (en) Display device
WO2008123525A1 (ja) ファブリペロー型波長可変フィルタおよびその製造方法
AU2003278155A1 (en) Frame for eyeglasses
NO20063820L (no) Sammenstilling og fremgangsmate for avstivning av et fleksibelt ror
TWI265311B (en) Micro-actuator and optical switch using the same
EP1519206A3 (en) Joined multi functional optical device
WO2003088286A3 (en) Electro-optical circuitry having integrated connector and methods for the production thereof
CN101482695A (zh) 曝光中使用的光掩膜
DE69812408T2 (de) Elektrostatischer microantrieb, dreidimensionaler aktive mikrokatheter und verfahren zur herstellung

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08847829

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2009540083

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08847829

Country of ref document: EP

Kind code of ref document: A1