WO2009047949A1 - Polymère photosensible greffé et composition de résine photosensible le comprenant - Google Patents

Polymère photosensible greffé et composition de résine photosensible le comprenant Download PDF

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Publication number
WO2009047949A1
WO2009047949A1 PCT/JP2008/065104 JP2008065104W WO2009047949A1 WO 2009047949 A1 WO2009047949 A1 WO 2009047949A1 JP 2008065104 W JP2008065104 W JP 2008065104W WO 2009047949 A1 WO2009047949 A1 WO 2009047949A1
Authority
WO
WIPO (PCT)
Prior art keywords
meth
acrylate
photosensitive
graft polymer
same
Prior art date
Application number
PCT/JP2008/065104
Other languages
English (en)
Japanese (ja)
Inventor
Takehiro Kinoshita
Original Assignee
Showa Highpolymer Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Highpolymer Co., Ltd. filed Critical Showa Highpolymer Co., Ltd.
Priority to JP2009536952A priority Critical patent/JP5638243B2/ja
Priority to CN2008801106928A priority patent/CN101821299B/zh
Publication of WO2009047949A1 publication Critical patent/WO2009047949A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04—Polymers provided for in subclasses C08C or C08F
    • C08F290/046—Polymers of unsaturated carboxylic acids or derivatives thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

L'invention porte sur un polymère photosensible greffé caractérisé en ce que son polymère ramifié est un macromonomère (a) produit par copolymérisation de 30 à 80 % en mole d'un monomère polymérisable ayant un groupe hydrocarboné cyclique ponté en C10-20 (par exemple le (méth)acrylate de dicyclopentényle) avec 20 à 70 % en mole d'un monomère polymérisable n'ayant pas de groupe hydrocarboné cyclique ponté (par exemple le (méth)acrylate de benzyle), lequel est, de préférence, au moins un élément choisi dans le groupe constitué par le (méth)acrylate de dicyclopentényle, le (méth)acrylate de dicyclopentanyle, le méthacrylate d'isobornyle, le (méth)acrylate d'adamantyle et un composé représenté par la formule (1) et un composé représenté par la formule (2) où R1 représente un hydrogène ou un groupe méthyle.
PCT/JP2008/065104 2007-10-09 2008-08-25 Polymère photosensible greffé et composition de résine photosensible le comprenant WO2009047949A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009536952A JP5638243B2 (ja) 2007-10-09 2008-08-25 グラフトポリマー及びそれを含む感光性樹脂組成物
CN2008801106928A CN101821299B (zh) 2007-10-09 2008-08-25 感光性接枝聚合物以及含有该接枝聚合物的感光性树脂组合物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-263124 2007-10-09
JP2007263124 2007-10-09

Publications (1)

Publication Number Publication Date
WO2009047949A1 true WO2009047949A1 (fr) 2009-04-16

Family

ID=40549097

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065104 WO2009047949A1 (fr) 2007-10-09 2008-08-25 Polymère photosensible greffé et composition de résine photosensible le comprenant

Country Status (5)

Country Link
JP (1) JP5638243B2 (fr)
KR (1) KR101473511B1 (fr)
CN (1) CN101821299B (fr)
TW (1) TWI421631B (fr)
WO (1) WO2009047949A1 (fr)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012087212A (ja) * 2010-10-19 2012-05-10 Kao Corp グラフトポリマー
CN102854742A (zh) * 2011-06-30 2013-01-02 台湾永光化学工业股份有限公司 黑色树脂组合物、黑色基质及遮光层
JP2013237797A (ja) * 2012-05-16 2013-11-28 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型樹脂、活性エネルギー線硬化型ハードコート剤、それらを用いた硬化膜、硬化膜が積層されたプラスチックフィルム、及びプラスチックフィルムを用いた加工製品。
JP2014024919A (ja) * 2012-07-25 2014-02-06 Dnp Fine Chemicals Co Ltd エネルギー線硬化性樹脂組成物、この組成物を用いた保護膜、タッチパネル部材及びタッチパネル部材の製造方法
JP2015011209A (ja) * 2013-06-28 2015-01-19 太陽インキ製造株式会社 光硬化性組成物およびその硬化物
JP2018197318A (ja) * 2017-05-24 2018-12-13 三菱ケミカル株式会社 硬化性組成物、硬化物及び積層体
US20200278610A1 (en) * 2017-12-27 2020-09-03 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices
CN115677939A (zh) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 一种感光性接枝聚合物以及含有其的感光性树脂组合物

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5358005B2 (ja) * 2011-09-22 2013-12-04 富士フイルム株式会社 ポジ型感光性アクリル樹脂およびポジ型感光性樹脂組成物
TWI603983B (zh) * 2012-08-10 2017-11-01 Nippon Shokubai Co Ltd Hardening resin composition and its use
CN102827526B (zh) * 2012-08-23 2015-04-15 京东方科技集团股份有限公司 高阻抗材料以及包括该材料的显示基板黑矩阵和液晶显示装置
JP5915956B2 (ja) * 2013-07-25 2016-05-11 山栄化学株式会社 半田バンプ形成用樹脂組成物、及び半田バンプ形成方法
CN105037627B (zh) * 2015-08-21 2017-01-25 深圳市联深化学技术有限公司 一种低聚树脂及其制备方法和其在彩色光阻剂中的应用
CN105669892B (zh) * 2016-03-17 2019-07-26 上海昭和高分子有限公司 一种溶剂型共聚树脂及其组合物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08259876A (ja) * 1995-03-24 1996-10-08 Japan Synthetic Rubber Co Ltd カラ−フィルタ−用有機顔料分散液
JPH09146272A (ja) * 1995-11-27 1997-06-06 Fuji Photo Film Co Ltd 感放射線性組成物
JP2001089533A (ja) * 1999-09-24 2001-04-03 Showa Highpolymer Co Ltd 感光性樹脂
JP2005316388A (ja) * 2004-03-30 2005-11-10 Jsr Corp カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
JP2006058821A (ja) * 2004-08-24 2006-03-02 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007070584A (ja) * 2005-09-09 2007-03-22 Hitachi Chem Co Ltd 着色組成物、感光性着色樹脂組成物、着色画像形成用感光液、着色画像の製造法、カラーフィルタの製造法及びカラーフィルタ
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置

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JP3087871B2 (ja) * 1992-06-02 2000-09-11 東亞合成株式会社 多分岐構造を有するマクロモノマーの製造方法
JP4758652B2 (ja) * 2004-01-19 2011-08-31 大日精化工業株式会社 優れた顔料分散性を有するグラフトコポリマーの製造方法、該グラフトコポリマー類を利用するエマルジョン類の製造方法、及び該グラフトコポリマー類またはエマルジョン類を利用している顔料分散液類
JP4539165B2 (ja) * 2004-05-12 2010-09-08 Ｊｓｒ株式会社 感放射線性樹脂組成物、スペーサー、およびその形成方法、並びに液晶表示素子
JP4522915B2 (ja) * 2005-06-24 2010-08-11 大日本印刷株式会社 カラーフィルター用インクジェットインク、カラーフィルター、及び液晶表示装置
JP2008195768A (ja) * 2007-02-09 2008-08-28 Canon Inc 液体組成物及びインクジェット用インク

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08259876A (ja) * 1995-03-24 1996-10-08 Japan Synthetic Rubber Co Ltd カラ−フィルタ−用有機顔料分散液
JPH09146272A (ja) * 1995-11-27 1997-06-06 Fuji Photo Film Co Ltd 感放射線性組成物
JP2001089533A (ja) * 1999-09-24 2001-04-03 Showa Highpolymer Co Ltd 感光性樹脂
JP2005316388A (ja) * 2004-03-30 2005-11-10 Jsr Corp カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置
JP2006058821A (ja) * 2004-08-24 2006-03-02 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、及び液晶表示装置
JP2007070584A (ja) * 2005-09-09 2007-03-22 Hitachi Chem Co Ltd 着色組成物、感光性着色樹脂組成物、着色画像形成用感光液、着色画像の製造法、カラーフィルタの製造法及びカラーフィルタ
JP2007199685A (ja) * 2005-12-28 2007-08-09 Fujifilm Electronic Materials Co Ltd 光硬化性着色組成物及びカラーフィルタ、並びに液晶表示装置

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012087212A (ja) * 2010-10-19 2012-05-10 Kao Corp グラフトポリマー
CN102854742A (zh) * 2011-06-30 2013-01-02 台湾永光化学工业股份有限公司 黑色树脂组合物、黑色基质及遮光层
JP2013237797A (ja) * 2012-05-16 2013-11-28 Arakawa Chem Ind Co Ltd 活性エネルギー線硬化型樹脂、活性エネルギー線硬化型ハードコート剤、それらを用いた硬化膜、硬化膜が積層されたプラスチックフィルム、及びプラスチックフィルムを用いた加工製品。
JP2014024919A (ja) * 2012-07-25 2014-02-06 Dnp Fine Chemicals Co Ltd エネルギー線硬化性樹脂組成物、この組成物を用いた保護膜、タッチパネル部材及びタッチパネル部材の製造方法
JP2015011209A (ja) * 2013-06-28 2015-01-19 太陽インキ製造株式会社 光硬化性組成物およびその硬化物
US11043643B2 (en) 2015-11-18 2021-06-22 Altana Ag Crosslinkable polymeric materials for dielectric layers in electronic devices
JP2018197318A (ja) * 2017-05-24 2018-12-13 三菱ケミカル株式会社 硬化性組成物、硬化物及び積層体
JP7052222B2 (ja) 2017-05-24 2022-04-12 三菱ケミカル株式会社 硬化性組成物、硬化物及び積層体
US20200278610A1 (en) * 2017-12-27 2020-09-03 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
US11703759B2 (en) * 2017-12-27 2023-07-18 Fujifilm Corporation Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel
CN115677939A (zh) * 2022-11-25 2023-02-03 茂名清荷科技有限公司 一种感光性接枝聚合物以及含有其的感光性树脂组合物

Also Published As

Publication number Publication date
JPWO2009047949A1 (ja) 2011-02-17
CN101821299A (zh) 2010-09-01
JP5638243B2 (ja) 2014-12-10
CN101821299B (zh) 2012-10-10
TWI421631B (zh) 2014-01-01
KR20100071092A (ko) 2010-06-28
TW200933293A (en) 2009-08-01
KR101473511B1 (ko) 2014-12-16

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