WO2009044871A1 - 電子源及び電子ビーム装置 - Google Patents

電子源及び電子ビーム装置 Download PDF

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Publication number
WO2009044871A1
WO2009044871A1 PCT/JP2008/068077 JP2008068077W WO2009044871A1 WO 2009044871 A1 WO2009044871 A1 WO 2009044871A1 JP 2008068077 W JP2008068077 W JP 2008068077W WO 2009044871 A1 WO2009044871 A1 WO 2009044871A1
Authority
WO
WIPO (PCT)
Prior art keywords
electron
electron source
filament
beam apparatus
long
Prior art date
Application number
PCT/JP2008/068077
Other languages
English (en)
French (fr)
Inventor
Ryozo Nonogaki
Yoshinori Terui
Original Assignee
Denki Kagaku Kogyo Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo Kabushiki Kaisha filed Critical Denki Kagaku Kogyo Kabushiki Kaisha
Priority to EP08836265.2A priority Critical patent/EP2197015B1/en
Priority to JP2009536111A priority patent/JP5171836B2/ja
Priority to US12/680,918 priority patent/US8519608B2/en
Publication of WO2009044871A1 publication Critical patent/WO2009044871A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/18—Supports; Vibration-damping arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0216—Means for avoiding or correcting vibration effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06308—Thermionic sources
    • H01J2237/06316—Schottky emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Solid Thermionic Cathode (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

　電子源を用いる装置が外部より振動を受けても、安定した電子線を与える電子源を提供する。 絶縁碍子（５）と、絶縁碍子（５）に間隔を空けて配置された２つの導電端子（４）と、導電端子（４）の間に張られている長尺のフィラメント（３）と、フィラメント（３）に取り付けられた電子放射部を有する針状の陰極（１）とを備える電子源であって、フィラメント（３）の軸方向に対する垂直断面形状が長方向と短方向を有し、長方向の最大長がその短方向の最大長の１．５倍以上５倍以下である電子源。
PCT/JP2008/068077 2007-10-05 2008-10-03 電子源及び電子ビーム装置 WO2009044871A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08836265.2A EP2197015B1 (en) 2007-10-05 2008-10-03 Electron source and electron beam apparatus
JP2009536111A JP5171836B2 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置
US12/680,918 US8519608B2 (en) 2007-10-05 2008-10-03 Electron source and electron beam apparatus

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-262046 2007-10-05
JP2007262046 2007-10-05
PCT/JP2008/054359 WO2009044564A1 (ja) 2007-10-05 2008-03-11 電子源及び電子ビーム装置
JPPCT/JP2008/054359 2008-03-11

Publications (1)

Publication Number Publication Date
WO2009044871A1 true WO2009044871A1 (ja) 2009-04-09

Family

ID=40525996

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2008/054359 WO2009044564A1 (ja) 2007-10-05 2008-03-11 電子源及び電子ビーム装置
PCT/JP2008/068077 WO2009044871A1 (ja) 2007-10-05 2008-10-03 電子源及び電子ビーム装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054359 WO2009044564A1 (ja) 2007-10-05 2008-03-11 電子源及び電子ビーム装置

Country Status (4)

Country Link
US (1) US8519608B2 (ja)
EP (1) EP2197015B1 (ja)
JP (1) JP5171836B2 (ja)
WO (2) WO2009044564A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240029989A1 (en) * 2020-12-25 2024-01-25 Denka Company Limited Electron source, method for manufacturing same, and device provided with electron source

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8896195B2 (en) * 2010-10-21 2014-11-25 Hermes Microvision, Inc. Filament for electron source
JP6043476B2 (ja) * 2011-10-12 2016-12-14 株式会社日立ハイテクノロジーズ イオン源およびそれを用いたイオンビーム装置
CN109791862A (zh) 2016-08-08 2019-05-21 Asml荷兰有限公司 电子发射器及其制造方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827623A (ja) 1971-07-16 1973-04-12
JPS4827623Y1 (ja) * 1969-12-26 1973-08-15
JPS55148339A (en) 1979-05-09 1980-11-18 Mitsubishi Electric Corp Direct heat type cathode frame body
JPH0541057U (ja) * 1991-10-31 1993-06-01 川崎製鉄株式会社 電子ビーム照射装置
JP2004265614A (ja) 2003-02-03 2004-09-24 Denki Kagaku Kogyo Kk 電子源
JP2005222945A (ja) 2004-02-03 2005-08-18 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法
JP2005332677A (ja) 2004-05-19 2005-12-02 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法
JP2005339922A (ja) 2004-05-26 2005-12-08 Denki Kagaku Kogyo Kk 電子源及びその製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5718655B2 (ja) 1974-11-12 1982-04-17
JPS53128971A (en) 1977-04-18 1978-11-10 Hitachi Ltd Manufacture of electron radiation cathode
JPS55109343A (en) 1979-02-16 1980-08-22 Chiyou Lsi Gijutsu Kenkyu Kumiai Cathode for electron gun
JPH0619956B2 (ja) 1986-03-19 1994-03-16 日本電気株式会社 線源グリツド
JPH04215231A (ja) 1990-12-10 1992-08-06 Hitachi Ltd 電子管用ヘリカルコイル陰極
JPH0541057A (ja) 1991-08-05 1993-02-19 Tdk Corp 磁気テープカセツトにおけるフロントリツド
JP4215231B2 (ja) 2001-05-21 2009-01-28 株式会社リコー 画像読み取り装置及び画像形成装置
JP3832402B2 (ja) * 2002-08-12 2006-10-11 株式会社日立製作所 カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置
JP5155666B2 (ja) 2004-12-22 2013-03-06 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー グリコロニトリルの合成のための方法
JP4827623B2 (ja) 2006-06-08 2011-11-30 新電元工業株式会社 圧入端子

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4827623Y1 (ja) * 1969-12-26 1973-08-15
JPS4827623A (ja) 1971-07-16 1973-04-12
JPS55148339A (en) 1979-05-09 1980-11-18 Mitsubishi Electric Corp Direct heat type cathode frame body
JPH0541057U (ja) * 1991-10-31 1993-06-01 川崎製鉄株式会社 電子ビーム照射装置
JP2004265614A (ja) 2003-02-03 2004-09-24 Denki Kagaku Kogyo Kk 電子源
JP2005222945A (ja) 2004-02-03 2005-08-18 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法
JP2005332677A (ja) 2004-05-19 2005-12-02 Denki Kagaku Kogyo Kk 電子源の製造方法と使用方法
JP2005339922A (ja) 2004-05-26 2005-12-08 Denki Kagaku Kogyo Kk 電子源及びその製造方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
D. TUGGLE, J. VAC. SCI. TECHNOL., vol. 16, 1979, pages 1699
See also references of EP2197015A4

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240029989A1 (en) * 2020-12-25 2024-01-25 Denka Company Limited Electron source, method for manufacturing same, and device provided with electron source

Also Published As

Publication number Publication date
EP2197015A1 (en) 2010-06-16
JPWO2009044871A1 (ja) 2011-02-10
US8519608B2 (en) 2013-08-27
WO2009044564A1 (ja) 2009-04-09
US20100237762A1 (en) 2010-09-23
EP2197015A4 (en) 2012-01-04
JP5171836B2 (ja) 2013-03-27
EP2197015B1 (en) 2014-02-19

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