WO2008143004A1 - ドライエッチング方法 - Google Patents
ドライエッチング方法 Download PDFInfo
- Publication number
- WO2008143004A1 WO2008143004A1 PCT/JP2008/058534 JP2008058534W WO2008143004A1 WO 2008143004 A1 WO2008143004 A1 WO 2008143004A1 JP 2008058534 W JP2008058534 W JP 2008058534W WO 2008143004 A1 WO2008143004 A1 WO 2008143004A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- etching method
- dry etching
- etching
- processed
- Prior art date
Links
- 238000001312 dry etching Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/08—Shaping or machining of piezoelectric or electrostrictive bodies
- H10N30/082—Shaping or machining of piezoelectric or electrostrictive bodies by etching, e.g. lithography
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Drying Of Semiconductors (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2008252203A AU2008252203A1 (en) | 2007-05-14 | 2008-05-08 | Dry etching method |
US12/597,645 US20100133233A1 (en) | 2007-05-14 | 2008-05-08 | Dry etching method |
JP2009515143A JP5090443B2 (ja) | 2007-05-14 | 2008-05-08 | ドライエッチング方法 |
CN2008800159148A CN101681826B (zh) | 2007-05-14 | 2008-05-08 | 干式蚀刻方法 |
KR1020097023612A KR101242464B1 (ko) | 2007-05-14 | 2008-05-08 | 건식 식각 방법 |
EP08752425.2A EP2148360B1 (en) | 2007-05-14 | 2008-05-08 | Dry etching method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007127789 | 2007-05-14 | ||
JP2007-127789 | 2007-05-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008143004A1 true WO2008143004A1 (ja) | 2008-11-27 |
Family
ID=40031716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/058534 WO2008143004A1 (ja) | 2007-05-14 | 2008-05-08 | ドライエッチング方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20100133233A1 (ja) |
EP (1) | EP2148360B1 (ja) |
JP (1) | JP5090443B2 (ja) |
KR (1) | KR101242464B1 (ja) |
CN (1) | CN101681826B (ja) |
AU (1) | AU2008252203A1 (ja) |
TW (1) | TWI449101B (ja) |
WO (1) | WO2008143004A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010177540A (ja) * | 2009-01-30 | 2010-08-12 | Panasonic Corp | 基板のドライエッチング方法 |
JP2010178169A (ja) * | 2009-01-30 | 2010-08-12 | Panasonic Corp | 水晶デバイスの製造方法 |
JP2011029459A (ja) * | 2009-07-27 | 2011-02-10 | Ulvac Japan Ltd | デバイスの製造方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110880444B (zh) * | 2019-11-28 | 2022-04-12 | 河北工程大学 | 一种基于等离子体蚀刻的连续双面蚀刻光学器件的装置 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10125769A (ja) | 1996-10-21 | 1998-05-15 | Matsushita Electron Corp | 静電チャック電極構造 |
JPH11150133A (ja) * | 1997-09-04 | 1999-06-02 | Hitachi Ltd | 半導体素子の搭載方法及びそのシステム、半導体素子分離装置並びにicカードの製造方法 |
JP2002059363A (ja) * | 2000-08-23 | 2002-02-26 | Chemitoronics Co Ltd | ウエーハ支持体 |
JP2005101110A (ja) * | 2003-09-22 | 2005-04-14 | Ulvac Japan Ltd | 低誘電率層間絶縁膜のドライエッチング方法 |
JP2006186847A (ja) | 2004-12-28 | 2006-07-13 | Epson Toyocom Corp | 水晶片集合体とその製造方法、フォトマスク、及び水晶振動子 |
JP2007053189A (ja) * | 2005-08-17 | 2007-03-01 | Konica Minolta Holdings Inc | シリコン構造体の製造に用いるマスクパターンを有するシリコン基板及びシリコン構造体の製造方法 |
JP2007096756A (ja) * | 2005-09-29 | 2007-04-12 | Seiko Epson Corp | 基板の製造方法、水晶振動片及びジャイロ振動片 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100278137B1 (ko) * | 1997-09-04 | 2001-01-15 | 가나이 쓰도무 | 반도체소자의 탑재방법 및 그 시스템, 반도체소자 분리장치 및ic카드의 제조방법 |
JP2001156584A (ja) * | 1999-11-30 | 2001-06-08 | Sony Corp | 圧電素子とその製造方法 |
US6642127B2 (en) * | 2001-10-19 | 2003-11-04 | Applied Materials, Inc. | Method for dicing a semiconductor wafer |
JP2003142979A (ja) * | 2001-10-31 | 2003-05-16 | River Eletec Kk | 水晶振動子及びその製造方法 |
US20050178741A1 (en) * | 2003-05-03 | 2005-08-18 | Yeoh Joon C. | Method of etching porous dielectric |
US20050036267A1 (en) * | 2003-05-20 | 2005-02-17 | Savas Stephen Edward | Clamp for holding and efficiently removing heat from workpieces |
TWI231534B (en) * | 2003-12-11 | 2005-04-21 | Advanced Semiconductor Eng | Method for dicing a wafer |
JP2005286992A (ja) * | 2004-03-02 | 2005-10-13 | Seiko Epson Corp | 圧電振動片、圧電振動子および圧電発振器 |
TWI236058B (en) * | 2004-08-06 | 2005-07-11 | Touch Micro System Tech | Method of performing double side processes upon a wafer |
TWI276844B (en) * | 2006-03-28 | 2007-03-21 | United Microelectronics Corp | Etching method |
JP4197001B2 (ja) * | 2006-04-04 | 2008-12-17 | エプソントヨコム株式会社 | 圧電振動片の製造方法 |
-
2008
- 2008-05-08 JP JP2009515143A patent/JP5090443B2/ja not_active Expired - Fee Related
- 2008-05-08 AU AU2008252203A patent/AU2008252203A1/en not_active Abandoned
- 2008-05-08 US US12/597,645 patent/US20100133233A1/en not_active Abandoned
- 2008-05-08 KR KR1020097023612A patent/KR101242464B1/ko active IP Right Grant
- 2008-05-08 EP EP08752425.2A patent/EP2148360B1/en active Active
- 2008-05-08 CN CN2008800159148A patent/CN101681826B/zh active Active
- 2008-05-08 WO PCT/JP2008/058534 patent/WO2008143004A1/ja active Application Filing
- 2008-05-13 TW TW097117582A patent/TWI449101B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10125769A (ja) | 1996-10-21 | 1998-05-15 | Matsushita Electron Corp | 静電チャック電極構造 |
JPH11150133A (ja) * | 1997-09-04 | 1999-06-02 | Hitachi Ltd | 半導体素子の搭載方法及びそのシステム、半導体素子分離装置並びにicカードの製造方法 |
JP2002059363A (ja) * | 2000-08-23 | 2002-02-26 | Chemitoronics Co Ltd | ウエーハ支持体 |
JP2005101110A (ja) * | 2003-09-22 | 2005-04-14 | Ulvac Japan Ltd | 低誘電率層間絶縁膜のドライエッチング方法 |
JP2006186847A (ja) | 2004-12-28 | 2006-07-13 | Epson Toyocom Corp | 水晶片集合体とその製造方法、フォトマスク、及び水晶振動子 |
JP2007053189A (ja) * | 2005-08-17 | 2007-03-01 | Konica Minolta Holdings Inc | シリコン構造体の製造に用いるマスクパターンを有するシリコン基板及びシリコン構造体の製造方法 |
JP2007096756A (ja) * | 2005-09-29 | 2007-04-12 | Seiko Epson Corp | 基板の製造方法、水晶振動片及びジャイロ振動片 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2148360A4 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010177540A (ja) * | 2009-01-30 | 2010-08-12 | Panasonic Corp | 基板のドライエッチング方法 |
JP2010178169A (ja) * | 2009-01-30 | 2010-08-12 | Panasonic Corp | 水晶デバイスの製造方法 |
JP2011029459A (ja) * | 2009-07-27 | 2011-02-10 | Ulvac Japan Ltd | デバイスの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2148360B1 (en) | 2014-01-22 |
CN101681826B (zh) | 2011-08-10 |
EP2148360A1 (en) | 2010-01-27 |
AU2008252203A1 (en) | 2008-11-27 |
JPWO2008143004A1 (ja) | 2010-08-05 |
CN101681826A (zh) | 2010-03-24 |
EP2148360A4 (en) | 2010-07-21 |
US20100133233A1 (en) | 2010-06-03 |
TWI449101B (zh) | 2014-08-11 |
TW200903633A (en) | 2009-01-16 |
KR20100016479A (ko) | 2010-02-12 |
KR101242464B1 (ko) | 2013-03-12 |
JP5090443B2 (ja) | 2012-12-05 |
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