WO2008142993A1 - 単結晶の製造方法 - Google Patents
単結晶の製造方法 Download PDFInfo
- Publication number
- WO2008142993A1 WO2008142993A1 PCT/JP2008/058483 JP2008058483W WO2008142993A1 WO 2008142993 A1 WO2008142993 A1 WO 2008142993A1 JP 2008058483 W JP2008058483 W JP 2008058483W WO 2008142993 A1 WO2008142993 A1 WO 2008142993A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- oxygen concentration
- single crystal
- conditions
- controlled
- relationship
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 7
- 239000001301 oxygen Substances 0.000 abstract 7
- 229910052760 oxygen Inorganic materials 0.000 abstract 7
- 239000007789 gas Substances 0.000 abstract 2
- 239000011261 inert gas Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE112008000033.6T DE112008000033B4 (de) | 2007-05-10 | 2008-05-07 | Verfahren zum Herstellen eines Einkristalls |
US12/515,730 US8110042B2 (en) | 2007-05-10 | 2008-05-07 | Method for manufacturing single crystal |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007125848A JP5172202B2 (ja) | 2007-05-10 | 2007-05-10 | 単結晶の製造方法 |
JP2007-125848 | 2007-05-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008142993A1 true WO2008142993A1 (ja) | 2008-11-27 |
Family
ID=40031708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/058483 WO2008142993A1 (ja) | 2007-05-10 | 2008-05-07 | 単結晶の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8110042B2 (ja) |
JP (1) | JP5172202B2 (ja) |
DE (1) | DE112008000033B4 (ja) |
WO (1) | WO2008142993A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5226496B2 (ja) * | 2008-12-17 | 2013-07-03 | Sumco Techxiv株式会社 | シリコン単結晶引上装置 |
EP2611952B1 (en) * | 2010-09-03 | 2021-12-29 | GTAT IP Holding LLC | Method of preparing a silicon single crystal doped with gallium, indium or aluminum |
KR101252915B1 (ko) * | 2010-09-06 | 2013-04-09 | 주식회사 엘지실트론 | 단결정 잉곳 제조방법 |
KR101303422B1 (ko) * | 2011-03-28 | 2013-09-05 | 주식회사 엘지실트론 | 단결정 잉곳의 제조방법 및 이에 의해 제조된 단결정 잉곳과 웨이퍼 |
DE112012003652B4 (de) * | 2011-09-01 | 2019-11-14 | Shin-Etsu Handotai Co., Ltd. | Verfahren zur Herstellung eines Siliziumkristalls |
KR101384060B1 (ko) | 2012-08-03 | 2014-04-09 | 주식회사 엘지실트론 | 실리콘 단결정 잉곳 성장 방법 |
CN113417003A (zh) * | 2021-06-22 | 2021-09-21 | 宁夏中欣晶圆半导体科技有限公司 | 能够降低头部氧含量的大直径单晶硅生产方法及装置 |
JP7359241B2 (ja) * | 2022-03-15 | 2023-10-11 | 株式会社Sumco | シリコン単結晶の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0570279A (ja) * | 1991-09-17 | 1993-03-23 | Nippon Steel Corp | シリコン単結晶の製造方法 |
JP2000233994A (ja) * | 1999-02-10 | 2000-08-29 | Mitsubishi Materials Silicon Corp | シリコン単結晶の製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0777994B2 (ja) * | 1989-11-16 | 1995-08-23 | 信越半導体株式会社 | 単結晶の酸素濃度コントロール方法及び装置 |
EP0509312B1 (en) * | 1991-04-16 | 1995-08-23 | Sumitomo Electric Industries, Limited | Czochralski method using a member for intercepting radiation from raw material molten solution and apparatus therefor |
JP2760932B2 (ja) * | 1993-03-29 | 1998-06-04 | 科学技術振興事業団 | 単結晶引上げ用Si融液の酸素濃度制御方法 |
DE69428302T2 (de) * | 1993-03-29 | 2002-07-04 | Kabushiki Kaisha Toshiba, Kawasaki | Regulierung der Sauerstoffkonzentration in einem Einkristall, der aus einer ein Gruppe V Element enthaltenden Schmelze gezogenen wird. |
US5477805A (en) * | 1993-12-28 | 1995-12-26 | Research Development Corporation Of Japan | Preparation of silicon melt for use in pull method of manufacturing single crystal |
JP2691393B2 (ja) | 1993-12-28 | 1997-12-17 | 科学技術振興事業団 | 単結晶引上げ用Si融液の調整方法 |
JPH09227275A (ja) | 1996-02-28 | 1997-09-02 | Sumitomo Sitix Corp | ドープ剤添加装置 |
US5904768A (en) * | 1996-10-15 | 1999-05-18 | Memc Electronic Materials, Inc. | Process for controlling the oxygen content in silicon wafers heavily doped with antimony or arsenic |
TW554093B (en) * | 2000-02-28 | 2003-09-21 | Shinetsu Handotai Kk | Method for preparing silicon single crystal and silicon single crystal |
DE10250822B4 (de) | 2002-10-31 | 2006-09-28 | Siltronic Ag | Verfahren zur Herstellung eines mit leichtflüchtigem Fremdstoff dotierten Einkristalls aus Silicium |
JP4153293B2 (ja) * | 2002-12-17 | 2008-09-24 | コバレントマテリアル株式会社 | シリコン単結晶引上方法 |
JP2007112663A (ja) * | 2005-10-20 | 2007-05-10 | Sumco Techxiv株式会社 | 半導体単結晶製造装置および製造方法 |
-
2007
- 2007-05-10 JP JP2007125848A patent/JP5172202B2/ja active Active
-
2008
- 2008-05-07 DE DE112008000033.6T patent/DE112008000033B4/de active Active
- 2008-05-07 US US12/515,730 patent/US8110042B2/en active Active
- 2008-05-07 WO PCT/JP2008/058483 patent/WO2008142993A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0570279A (ja) * | 1991-09-17 | 1993-03-23 | Nippon Steel Corp | シリコン単結晶の製造方法 |
JP2000233994A (ja) * | 1999-02-10 | 2000-08-29 | Mitsubishi Materials Silicon Corp | シリコン単結晶の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE112008000033B4 (de) | 2020-02-27 |
US20100050931A1 (en) | 2010-03-04 |
JP2008280212A (ja) | 2008-11-20 |
DE112008000033T5 (de) | 2009-10-08 |
JP5172202B2 (ja) | 2013-03-27 |
US8110042B2 (en) | 2012-02-07 |
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