WO2009057717A1 - 水素分離膜および水素分離膜の孔径制御方法 - Google Patents

水素分離膜および水素分離膜の孔径制御方法 Download PDF

Info

Publication number
WO2009057717A1
WO2009057717A1 PCT/JP2008/069802 JP2008069802W WO2009057717A1 WO 2009057717 A1 WO2009057717 A1 WO 2009057717A1 JP 2008069802 W JP2008069802 W JP 2008069802W WO 2009057717 A1 WO2009057717 A1 WO 2009057717A1
Authority
WO
WIPO (PCT)
Prior art keywords
separation membrane
hydrogen separation
porous substrate
reactor
pore diameter
Prior art date
Application number
PCT/JP2008/069802
Other languages
English (en)
French (fr)
Inventor
Shin-Ichi Nakao
Takashi Sugawara
Kazuki Akamatsu
Yudai Ohta
Original Assignee
Univ Tokyo
Shin-Ichi Nakao
Takashi Sugawara
Kazuki Akamatsu
Yudai Ohta
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Tokyo, Shin-Ichi Nakao, Takashi Sugawara, Kazuki Akamatsu, Yudai Ohta filed Critical Univ Tokyo
Publication of WO2009057717A1 publication Critical patent/WO2009057717A1/ja

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • B01D71/024Oxides
    • B01D71/027Silicium oxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0072Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D69/00Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/10Supported membranes; Membrane supports
    • B01D69/108Inorganic support material
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/50Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification
    • C01B3/501Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion
    • C01B3/503Separation of hydrogen or hydrogen containing gases from gaseous mixtures, e.g. purification by diffusion characterised by the membrane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2323/00Details relating to membrane preparation
    • B01D2323/08Specific temperatures applied
    • B01D2323/081Heating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2325/00Details relating to properties of membranes
    • B01D2325/22Thermal or heat-resistance properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Combustion & Propulsion (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

 水素分離膜は、シリカ源は少なくとも1つ以上のメトキシ基と少なくとも1つ以上の嵩高い基を有するシラン類、テトラアリールオキシシラン類からなる群から選択される少なくとも1種を用い、酸素と不活性ガスとからなる混合ガスと気化させたシリカ源とを化学蒸着法によって多孔質基材の細孔を一部閉塞するように又は狭めるようにシリカを製膜させてなる。水素分離膜の孔径制御方法は、反応器内の多孔質基材11を一定温度に保ち酸素ボンベ20から反応器の側面導入口42に酸素を供給するとともに、不活性ガスにより気化させた気化シリカ源とを側面導入口42から反応器に導入させ、他端口46より吸引し反応器内を減圧にし、多孔質基材11の片側ともう一方側とに差圧を設け多孔質基材11の細孔内にシリカ膜を製膜する。
PCT/JP2008/069802 2007-11-01 2008-10-30 水素分離膜および水素分離膜の孔径制御方法 WO2009057717A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007284764A JP4728308B2 (ja) 2007-11-01 2007-11-01 水素分離膜および水素分離膜の製造方法
JP2007-284764 2007-11-01

Publications (1)

Publication Number Publication Date
WO2009057717A1 true WO2009057717A1 (ja) 2009-05-07

Family

ID=40591101

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069802 WO2009057717A1 (ja) 2007-11-01 2008-10-30 水素分離膜および水素分離膜の孔径制御方法

Country Status (2)

Country Link
JP (1) JP4728308B2 (ja)
WO (1) WO2009057717A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105466967A (zh) * 2014-09-23 2016-04-06 张洪 量热仪及其氧弹
EP3057678A4 (en) * 2013-10-14 2017-07-12 Melior Innovations Inc. Gas-selective polymer derived ceramic membranes, gas separation systems, and methods

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101133099B1 (ko) 2011-01-24 2012-04-04 한국에너지기술연구원 수소 분리막의 제조방법
JP5425839B2 (ja) * 2011-06-03 2014-02-26 株式会社ノリタケカンパニーリミテド ガス分離材の製造方法
WO2016104049A1 (ja) 2014-12-26 2016-06-30 日本碍子株式会社 ガス分離方法
JP6636948B2 (ja) 2014-12-26 2020-01-29 日本碍子株式会社 ガス分離方法
JP6732474B2 (ja) * 2016-02-25 2020-07-29 公益財団法人地球環境産業技術研究機構 水素ガス分離材および膜反応器の製造方法、並びに、水素ガス分離材を用いた水素含有ガスの製造方法
WO2024204658A1 (ja) * 2023-03-31 2024-10-03 学校法人工学院大学 分離方法及び分離装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0838864A (ja) * 1994-07-29 1996-02-13 Nok Corp 水素分離膜およびその製造法
JP2005254161A (ja) * 2004-03-12 2005-09-22 Shinichi Nakao 水素分離膜およびその製造方法
JP2006239663A (ja) * 2005-03-07 2006-09-14 Noritake Co Ltd 水素ガス分離膜の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0838864A (ja) * 1994-07-29 1996-02-13 Nok Corp 水素分離膜およびその製造法
JP2005254161A (ja) * 2004-03-12 2005-09-22 Shinichi Nakao 水素分離膜およびその製造方法
JP2006239663A (ja) * 2005-03-07 2006-09-14 Noritake Co Ltd 水素ガス分離膜の製造方法

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
KURAOKA K. ET AL.: "Methanol vapor separation through the silica membrane prepared by the CVD method with the aid of evacuation", SEPARATION AND PURIFICATION TECHNOLOGY, vol. 25, 2001, pages 161 - 166 *
NAGAYO T. ET AL.: "Bunshi Furui Silica Maku no Saikokei Seigyo no Kento", THE SOCIETY OF CHEMICAL ENGINEERS, JAPAN KENKYU HAPPYO KOEN YOSHISHU, vol. 72, 19 March 2007 (2007-03-19), pages 750 *
NOMURA M. ET AL.: "Ko Koritsu Suiso Seizo o Jitsugen suru Ceramic Maku no Saizensen Taiko Kakusan CVD-ho ni yoru Suiso Sentaku Toka Silica Maku Kaihatsu", CERAMICS, vol. 41, no. 11, 1 November 2006 (2006-11-01), pages 917 - 920 *
NOMURA M. ET AL.: "Pore Size Control of a Molecular Sieve Silica Membrane Prepared by a Counter Diffusion CVD Method", JOURNAL OF CHEMICAL ENGINEERING OF JAPAN, vol. 40, no. 13, 10 October 2007 (2007-10-10), pages 1235 - 1241 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3057678A4 (en) * 2013-10-14 2017-07-12 Melior Innovations Inc. Gas-selective polymer derived ceramic membranes, gas separation systems, and methods
CN105466967A (zh) * 2014-09-23 2016-04-06 张洪 量热仪及其氧弹
CN105466967B (zh) * 2014-09-23 2018-08-31 张洪 量热仪及其氧弹

Also Published As

Publication number Publication date
JP4728308B2 (ja) 2011-07-20
JP2009106912A (ja) 2009-05-21

Similar Documents

Publication Publication Date Title
WO2009057717A1 (ja) 水素分離膜および水素分離膜の孔径制御方法
EP1982955A3 (en) Method for producing hydrogen gas separation material
WO2010068419A3 (en) Production of single crystal cvd diamond rapid growth rate
WO2007053607A3 (en) Pumping system for atomic layer deposition
WO2008121478A3 (en) Roll-to-roll plasma enhanced chemical vapor deposition method of barrier layers comprising silicon and carbon
WO2010039363A3 (en) Methods for forming silicon nitride based film or silicon carbon based film
WO2007140424A3 (en) Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
WO2006020424A3 (en) Multi-gas distribution injector for chemical vapor deposition reactors
TW200606276A (en) Vacuum film-forming apparatus
EP2298957A3 (en) Method and apparatus of using solution based precursors for atomic layer deposition
WO2006057709A8 (en) Method for deposition of metal layers from metal carbonyl precursors
WO2007092844A3 (en) Hydrogen separation process
TW200603225A (en) Method of manufacturing carbon nanotube and plasma cvd(chemical vapor deposition) apparatus for implementing thereof
WO2006120449A8 (en) Nanostructure production methods and apparatus
WO2005057630A3 (en) Manufacturable low-temperature silicon carbide deposition technology
ATE438748T1 (de) Vorrichtung und verfahren zur kontinuierlichen gasphasenabscheidung unter atmosphärendruck und deren verwendung
MY156300A (en) A chemical vapour deposition system and process
JP2008260739A (ja) メタン濃縮装置およびメタン濃縮方法
AU2001230874A1 (en) Method for preparation of thermally and mechanically stable metal/porous substrate composite membranes
WO2004048258A8 (en) Method for forming carbon nanotubes
JP6054499B1 (ja) 多孔質グラフェンフィルタの製造方法、これを用いて製造される多孔質グラフェンフィルタ及びこれを用いたフィルタ装置
Wang et al. Effects of surface treatments and annealing on carbon-based molecular sieve membranes for gas separation
PL2264224T3 (pl) Urządzenie do osadzania cienkiej warstwy materiału na podłożu i sposób regeneracji dla takiego urządzenia
EP3476971A3 (en) Silacyclic compounds and methods for depositing silicon-containing films using same
JP2005254161A (ja) 水素分離膜およびその製造方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08845324

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08845324

Country of ref document: EP

Kind code of ref document: A1