WO2008129819A1 - 表示素子の製造方法、表示素子の製造装置、及び表示素子 - Google Patents

表示素子の製造方法、表示素子の製造装置、及び表示素子 Download PDF

Info

Publication number
WO2008129819A1
WO2008129819A1 PCT/JP2008/000695 JP2008000695W WO2008129819A1 WO 2008129819 A1 WO2008129819 A1 WO 2008129819A1 JP 2008000695 W JP2008000695 W JP 2008000695W WO 2008129819 A1 WO2008129819 A1 WO 2008129819A1
Authority
WO
WIPO (PCT)
Prior art keywords
display element
flexible substrate
forming
partition wall
element manufacturing
Prior art date
Application number
PCT/JP2008/000695
Other languages
English (en)
French (fr)
Inventor
Tomohide Hamada
Kei Nara
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to KR1020147017977A priority Critical patent/KR101538281B1/ko
Priority to EP08720574.6A priority patent/EP2138992B1/en
Priority to JP2009510771A priority patent/JP5234523B2/ja
Priority to CN2008800116763A priority patent/CN101681570B/zh
Priority to KR1020097023597A priority patent/KR101506357B1/ko
Publication of WO2008129819A1 publication Critical patent/WO2008129819A1/ja

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • H01J9/242Spacers between faceplate and backplate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/191Deposition of organic active material characterised by provisions for the orientation or alignment of the layer to be deposited
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133302Rigid substrates, e.g. inorganic substrates
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133308Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133325Assembling processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60Forming conductive regions or layers, e.g. electrodes
    • H10K71/611Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing

Landscapes

  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Thin Film Transistor (AREA)

Abstract

高精度な駆動回路又は薄膜トランジスタを可撓性の基板に形成する表示素子の製造方法、製造装置、及び表示素子の提供を課題とする。本発明の表示素子の製造装置(100)は、可撓性の基板(FB)を第1方向に搬送する搬送部(RL)と、可撓性の基板に基準マークを形成するマーク形成部(10)と、可撓性の基板に隔壁を形成する隔壁形成部(10)と、基準マークに基づいて隔壁に対して所定の位置に導電部材を塗布する塗布部(20)と、を有する。
PCT/JP2008/000695 2007-04-13 2008-03-24 表示素子の製造方法、表示素子の製造装置、及び表示素子 WO2008129819A1 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020147017977A KR101538281B1 (ko) 2007-04-13 2008-03-24 표시 소자의 제조 방법과 제조 장치
EP08720574.6A EP2138992B1 (en) 2007-04-13 2008-03-24 Display element manufacturing method
JP2009510771A JP5234523B2 (ja) 2007-04-13 2008-03-24 表示素子の製造方法、表示素子の製造装置、及び表示素子製造用のシート基板
CN2008800116763A CN101681570B (zh) 2007-04-13 2008-03-24 显示元件的制造方法、显示元件的制造装置及显示元件
KR1020097023597A KR101506357B1 (ko) 2007-04-13 2008-03-24 표시 소자의 제조 방법과 제조 장치, 표시 소자 제조용 시트 기판, 및 도포 유닛

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007105464 2007-04-13
JP2007-105464 2007-04-13

Publications (1)

Publication Number Publication Date
WO2008129819A1 true WO2008129819A1 (ja) 2008-10-30

Family

ID=39854137

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/000695 WO2008129819A1 (ja) 2007-04-13 2008-03-24 表示素子の製造方法、表示素子の製造装置、及び表示素子

Country Status (7)

Country Link
US (1) US9172063B2 (ja)
EP (2) EP2138992B1 (ja)
JP (2) JP5234523B2 (ja)
KR (2) KR101538281B1 (ja)
CN (1) CN101681570B (ja)
TW (1) TWI463528B (ja)
WO (1) WO2008129819A1 (ja)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009157154A1 (ja) * 2008-06-26 2009-12-30 株式会社ニコン 表示素子の製造方法及び製造装置
JP2010205626A (ja) * 2009-03-05 2010-09-16 Musashi Eng Co Ltd 液体材料の塗布方法および塗布装置
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
WO2014010274A1 (ja) * 2012-07-13 2014-01-16 株式会社ニコン 基板処理装置、及びデバイス製造方法
JPWO2013005536A1 (ja) * 2011-07-04 2015-02-23 コニカミノルタ株式会社 有機電子デバイス製造装置
KR20150040885A (ko) 2012-08-06 2015-04-15 가부시키가이샤 니콘 처리 장치 및 디바이스 제조 방법
KR20150067191A (ko) 2012-10-19 2015-06-17 가부시키가이샤 니콘 박막 형성 장치 및 박막 형성 방법
JP2017160057A (ja) * 2012-05-23 2017-09-14 株式会社ニコン 基板つなぎ替え装置
KR20180006489A (ko) 2012-05-24 2018-01-17 가부시키가이샤 니콘 디바이스 제조 방법, 기판 처리 방법 및 미스트에 의한 성막장치
JP2020145419A (ja) * 2012-08-06 2020-09-10 株式会社ニコン デバイス製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455235B (zh) * 2007-09-11 2014-10-01 尼康股份有限公司 A manufacturing method of a display element, and a manufacturing apparatus for a display element
WO2010041403A1 (ja) * 2008-10-10 2010-04-15 株式会社ニコン 可撓性基板、表示素子の製造方法及び表示素子の製造装置
US8399263B2 (en) * 2008-10-21 2013-03-19 Nikon Corporation Method for measuring expansion/contraction, method for processing substrate, method for producing device, apparatus for measuring expansion/contraction, and apparatus for processing substrate
TWI465801B (zh) * 2009-06-15 2014-12-21 Au Optronics Corp 主動元件陣列基板與顯示面板
US20110135405A1 (en) * 2009-12-04 2011-06-09 Akira Miyaji Roller apparatus and transportation apparatus
EP2979294A4 (en) * 2013-03-29 2016-11-30 Applied Materials Inc SUBSTRATE WITH PATTERNED EMBODIMENT FOR FORMING INSULATED AREAS OF A DEVICE
CN105129492B (zh) * 2015-07-23 2017-09-26 合肥京东方光电科技有限公司 一种摩擦布贴布机
KR102642197B1 (ko) * 2016-10-21 2024-03-05 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
CN109427249A (zh) * 2017-08-31 2019-03-05 昆山工研院新型平板显示技术中心有限公司 柔性显示面板及其制作方法
JP2019066750A (ja) * 2017-10-04 2019-04-25 株式会社ジャパンディスプレイ 表示装置
KR20210003358A (ko) 2019-07-01 2021-01-12 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000162640A (ja) * 1998-11-26 2000-06-16 Sanyo Electric Co Ltd 反射型液晶表示装置及びその製造方法
JP2002367523A (ja) * 2001-06-12 2002-12-20 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルとプラズマディスプレイパネルの製造方法
US20020195928A1 (en) 2001-06-25 2002-12-26 Grace Anthony J. Electroluminescent display device and method of making
US20030107212A1 (en) 2001-12-12 2003-06-12 Eastman Kodak Company Lamination method to create a pre-press proof with a thermal mark
JP2005005245A (ja) * 2002-11-08 2005-01-06 Fuji Photo Film Co Ltd 転写素材の転写方法、形状転写方法及び転写装置
JP3698749B2 (ja) 1995-01-11 2005-09-21 株式会社半導体エネルギー研究所 液晶セルの作製方法およびその作製装置、液晶セルの生産システム
US20060055314A1 (en) 2004-09-10 2006-03-16 Semiconductor Energy Laboratory Co., Ltd. Display device, method for manufacturing the same and apparatus for manufacturing the same
JP2006106106A (ja) * 2004-09-30 2006-04-20 Semiconductor Energy Lab Co Ltd 液晶表示装置及びその作製方法、並びに液晶テレビジョン装置
JP2006163418A (ja) * 2004-12-08 2006-06-22 Samsung Sdi Co Ltd 導電パターンの形成方法とそれを利用した薄膜トランジスタ及びその製造方法
JP2006294485A (ja) * 2005-04-13 2006-10-26 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子、その製造方法及び表示装置
JP2007059188A (ja) * 2005-08-24 2007-03-08 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子の製造方法、有機エレクトロルミネッセンス素子

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02130567A (ja) * 1988-11-10 1990-05-18 Matsushita Electric Ind Co Ltd カラー静電記録装置
JP2946201B2 (ja) * 1997-04-17 1999-09-06 株式会社東京機械製作所 付加印刷装置付き輪転機及び付加印刷装置付き印刷ユニット
JP4948726B2 (ja) * 1999-07-21 2012-06-06 イー インク コーポレイション 電子ディスプレイを制御するための電子回路素子を作製する好適な方法
JP3956572B2 (ja) * 2000-03-13 2007-08-08 セイコーエプソン株式会社 液晶装置用基板の製造方法
US6655281B1 (en) * 2000-08-08 2003-12-02 3M Innovative Properties Company Flexographic printing elements with improved air bleed
JP3771157B2 (ja) * 2000-10-13 2006-04-26 シャープ株式会社 表示装置の駆動方法および液晶表示装置の駆動方法
US6765348B2 (en) * 2001-01-26 2004-07-20 Xerox Corporation Electroluminescent devices containing thermal protective layers
WO2003001490A2 (en) * 2001-06-25 2003-01-03 Avery Dennison Corporation Hybrid display device
GB2379412A (en) * 2001-09-10 2003-03-12 Seiko Epson Corp Deposition of soluble materials
TW594431B (en) * 2002-03-01 2004-06-21 Asml Netherlands Bv Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
GB0207134D0 (en) * 2002-03-27 2002-05-08 Cambridge Display Tech Ltd Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained
GB2388709A (en) * 2002-05-17 2003-11-19 Seiko Epson Corp Circuit fabrication method
JP4549866B2 (ja) * 2003-02-05 2010-09-22 株式会社半導体エネルギー研究所 表示装置の製造方法
US20070157873A1 (en) * 2003-09-12 2007-07-12 Hauptmann Jonas R Method of fabrication and device comprising elongated nanosize elements
JP3826145B2 (ja) 2004-07-16 2006-09-27 株式会社クラレ 集光フィルム、液晶パネルおよびバックライト並びに集光フィルムの製造方法
JP4954515B2 (ja) 2004-09-10 2012-06-20 株式会社半導体エネルギー研究所 表示装置の作製方法
JP2006156426A (ja) * 2004-11-25 2006-06-15 Seiko Epson Corp 導電性パターンの形成方法
US8136911B2 (en) * 2005-07-05 2012-03-20 Konica Minolta Holdings, Inc. Patterning apparatus, method for making organic electroluminescent element, organic electroluminescent element, and organic electroluminescent display
JP2007033537A (ja) 2005-07-22 2007-02-08 Sharp Corp 可撓性表示素子の製造装置およびその素子の製造方法
WO2007034647A1 (ja) * 2005-09-20 2007-03-29 Konica Minolta Holdings, Inc. 有機エレクトロルミネッセンス素子の製造方法、有機エレクトロルミネッセンス表示装置

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3698749B2 (ja) 1995-01-11 2005-09-21 株式会社半導体エネルギー研究所 液晶セルの作製方法およびその作製装置、液晶セルの生産システム
JP2000162640A (ja) * 1998-11-26 2000-06-16 Sanyo Electric Co Ltd 反射型液晶表示装置及びその製造方法
JP2002367523A (ja) * 2001-06-12 2002-12-20 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルとプラズマディスプレイパネルの製造方法
US20020195928A1 (en) 2001-06-25 2002-12-26 Grace Anthony J. Electroluminescent display device and method of making
US20030107212A1 (en) 2001-12-12 2003-06-12 Eastman Kodak Company Lamination method to create a pre-press proof with a thermal mark
JP2005005245A (ja) * 2002-11-08 2005-01-06 Fuji Photo Film Co Ltd 転写素材の転写方法、形状転写方法及び転写装置
US20060055314A1 (en) 2004-09-10 2006-03-16 Semiconductor Energy Laboratory Co., Ltd. Display device, method for manufacturing the same and apparatus for manufacturing the same
JP2006106106A (ja) * 2004-09-30 2006-04-20 Semiconductor Energy Lab Co Ltd 液晶表示装置及びその作製方法、並びに液晶テレビジョン装置
JP2006163418A (ja) * 2004-12-08 2006-06-22 Samsung Sdi Co Ltd 導電パターンの形成方法とそれを利用した薄膜トランジスタ及びその製造方法
JP2006294485A (ja) * 2005-04-13 2006-10-26 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子、その製造方法及び表示装置
JP2007059188A (ja) * 2005-08-24 2007-03-08 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子の製造方法、有機エレクトロルミネッセンス素子

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2138992A4

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10832977B2 (en) 2008-06-26 2020-11-10 Nikon Corporation Display element manufacturing method and manufacturing apparatus
WO2009157154A1 (ja) * 2008-06-26 2009-12-30 株式会社ニコン 表示素子の製造方法及び製造装置
US9086585B2 (en) 2008-06-26 2015-07-21 Nikon Corporation Display element manufacturing method and manufacturing apparatus
US9917023B2 (en) 2008-06-26 2018-03-13 Nikon Corporation Display element manufacturing method and manufacturing apparatus
JP2010205626A (ja) * 2009-03-05 2010-09-16 Musashi Eng Co Ltd 液体材料の塗布方法および塗布装置
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
JPWO2013005536A1 (ja) * 2011-07-04 2015-02-23 コニカミノルタ株式会社 有機電子デバイス製造装置
JP2017160057A (ja) * 2012-05-23 2017-09-14 株式会社ニコン 基板つなぎ替え装置
KR20200105981A (ko) 2012-05-24 2020-09-09 가부시키가이샤 니콘 디바이스 제조 방법
KR20190039609A (ko) 2012-05-24 2019-04-12 가부시키가이샤 니콘 미스트 성막장치
KR20180006489A (ko) 2012-05-24 2018-01-17 가부시키가이샤 니콘 디바이스 제조 방법, 기판 처리 방법 및 미스트에 의한 성막장치
KR20180120800A (ko) 2012-07-13 2018-11-06 가부시키가이샤 니콘 노광 장치 및 노광 방법
JP2017037347A (ja) * 2012-07-13 2017-02-16 株式会社ニコン デバイス製造方法
JP2016122202A (ja) * 2012-07-13 2016-07-07 株式会社ニコン 露光方法および露光装置
JPWO2014010274A1 (ja) * 2012-07-13 2016-06-20 株式会社ニコン 基板処理装置、及びデバイス製造方法
JP2016085475A (ja) * 2012-07-13 2016-05-19 株式会社ニコン 露光装置、及び照明光学装置
KR20190091574A (ko) 2012-07-13 2019-08-06 가부시키가이샤 니콘 디바이스 제조 방법
KR20150035991A (ko) 2012-07-13 2015-04-07 가부시키가이샤 니콘 기판 처리 장치 및 디바이스 제조 방법
WO2014010274A1 (ja) * 2012-07-13 2014-01-16 株式会社ニコン 基板処理装置、及びデバイス製造方法
KR20180072872A (ko) 2012-08-06 2018-06-29 가부시키가이샤 니콘 처리 장치 및 디바이스 제조 방법
KR20150040885A (ko) 2012-08-06 2015-04-15 가부시키가이샤 니콘 처리 장치 및 디바이스 제조 방법
JP2020145419A (ja) * 2012-08-06 2020-09-10 株式会社ニコン デバイス製造方法
KR20180100715A (ko) 2012-10-19 2018-09-11 가부시키가이샤 니콘 박막 형성 장치 및 박막 형성 방법
KR20150067191A (ko) 2012-10-19 2015-06-17 가부시키가이샤 니콘 박막 형성 장치 및 박막 형성 방법

Also Published As

Publication number Publication date
JP5448256B2 (ja) 2014-03-19
EP2138992A1 (en) 2009-12-30
JP5234523B2 (ja) 2013-07-10
TWI463528B (zh) 2014-12-01
US9172063B2 (en) 2015-10-27
EP2138992B1 (en) 2017-08-02
KR101506357B1 (ko) 2015-03-26
TW200913004A (en) 2009-03-16
JP2013033741A (ja) 2013-02-14
KR20100016474A (ko) 2010-02-12
CN101681570B (zh) 2013-09-04
US20080254704A1 (en) 2008-10-16
KR101538281B1 (ko) 2015-07-22
EP2138992A4 (en) 2011-06-22
CN101681570A (zh) 2010-03-24
JPWO2008129819A1 (ja) 2010-07-22
KR20140097526A (ko) 2014-08-06
EP3249635A1 (en) 2017-11-29

Similar Documents

Publication Publication Date Title
WO2008129819A1 (ja) 表示素子の製造方法、表示素子の製造装置、及び表示素子
WO2009031288A1 (ja) 表示素子の製造方法、表示素子の製造装置、及び表示装置
TW200623425A (en) Method of forming at least one thin film device
AU2003231077A1 (en) Process for forming a patterned thin film conductive structure on a substrate
AU2002337959A1 (en) Organic thin film transistor with polymeric interface
WO2009019920A1 (ja) 回路基板及び表示装置
AU2002331736A1 (en) Surface modifying layers for organic thin film transistors
ATE556778T1 (de) Mikrofluidvorrichtung mit elektronischen dünnfilmbauelementen
EP1947551A3 (en) Transparent conductive film , method for production thereof and touch panel therewith
TW200721279A (en) Method of forming pattern, film structure, electrooptical device and electronic equipment
WO2009014901A3 (en) System and method for making a film having a matte finish
TW200507279A (en) Thin-film semiconductor substrate, method of manufacturing the same; apparatus for and method of crystallization;Thin-film semiconductor apparatus, method of manufacturing the same;
WO2010033836A3 (en) Thin film high definition dimensional image display device and methods of making same
WO2008108042A1 (ja) 表示パネル用基板、表示パネル、表示装置、および表示パネル用基板の製造方法
WO2008078516A1 (ja) 酸化シリコン薄膜の製造装置及び形成方法
WO2008064055A3 (en) Printing, depositing, or coating on flowable substrates
EP1993122A3 (en) Semiconductor Layer for Thin Film Transistors
WO2008070830A3 (en) Components for use in electro-optic displays
AU2002329098A1 (en) An etchant for a wiring, a method for manufacturing the wiring using the etchant, a thin film transistor array panel including the wiring, and a method for manufacturing the same
TW200612562A (en) Interferometric modulators with thin film transistors
GB2439599B (en) Thin film transistor array substrate and method fabricating the same
WO2009072226A1 (ja) 可撓性を有する表示装置
TW200737589A (en) Electronic device and antenna structure thereof
TW200713597A (en) Thin film conductor and method of fabrication
EP2136606A4 (en) SUBSTRATE FOR AN ORGANIC THIN FILM TRANSISTOR, METHOD FOR THE PRODUCTION THEREOF, DISPLAY SHEET, AND METHOD FOR THE PRODUCTION THEREOF

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880011676.3

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08720574

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009510771

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

REEP Request for entry into the european phase

Ref document number: 2008720574

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2008720574

Country of ref document: EP

ENP Entry into the national phase

Ref document number: 20097023597

Country of ref document: KR

Kind code of ref document: A