WO2008129684A1 - 情報記録再生装置 - Google Patents
情報記録再生装置 Download PDFInfo
- Publication number
- WO2008129684A1 WO2008129684A1 PCT/JP2007/061829 JP2007061829W WO2008129684A1 WO 2008129684 A1 WO2008129684 A1 WO 2008129684A1 JP 2007061829 W JP2007061829 W JP 2007061829W WO 2008129684 A1 WO2008129684 A1 WO 2008129684A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- recording
- layer
- reproducing apparatus
- recording layer
- information recording
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
- G11B9/1463—Record carriers for recording or reproduction involving the use of microscopic probe means
- G11B9/149—Record carriers for recording or reproduction involving the use of microscopic probe means characterised by the memorising material or structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B9/00—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor
- G11B9/12—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor
- G11B9/14—Recording or reproducing using a method not covered by one of the main groups G11B3/00 - G11B7/00; Record carriers therefor using near-field interactions; Record carriers therefor using microscopic probe means, i.e. recording or reproducing by means directly associated with the tip of a microscopic electrical probe as used in Scanning Tunneling Microscopy [STM] or Atomic Force Microscopy [AFM] for inducing physical or electrical perturbations in a recording medium; Record carriers or media specially adapted for such transducing of information
Abstract
高記録密度及び低消費電力の不揮発性の情報記録再生装置を提供する。 本発明の例に係わる情報記録再生装置は、電極層及び記録層からなる積層構造と、電極層に付加されるバッファ層と、記録層に電圧を印加して記録層に相変化を発生させて情報を記録する手段とを備える。記録層は、少なくとも2種類の陽イオンを有する複合化合物から構成され、陽イオンの少なくとも1種類は、電子が不完全に満たされたd軌道を有する遷移元素である。記録層は、CuxAyXz (0.1≦x≦1.1、0.9≦y≦1.1、1.8≦z≦2.2)で表される材料から構成され、かつ、デラフォサイト構造を有する第1化合物を含む。バッファ層は、M3N4, M3N5, MN2,或いはM4O7,MO2,M2O5で表される材料から構成される。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009510718A JP4792108B2 (ja) | 2007-03-30 | 2007-06-12 | 情報記録再生装置 |
US12/563,703 US20100074001A1 (en) | 2007-03-30 | 2009-09-21 | Information recording/reproducing device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007095341 | 2007-03-30 | ||
JP2007-095341 | 2007-03-30 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/563,703 Continuation-In-Part US20100074001A1 (en) | 2007-03-30 | 2009-09-21 | Information recording/reproducing device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008129684A1 true WO2008129684A1 (ja) | 2008-10-30 |
Family
ID=39875229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/061829 WO2008129684A1 (ja) | 2007-03-30 | 2007-06-12 | 情報記録再生装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20100074001A1 (ja) |
JP (1) | JP4792108B2 (ja) |
TW (1) | TW200839956A (ja) |
WO (1) | WO2008129684A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010521069A (ja) * | 2007-03-14 | 2010-06-17 | ユニヴェルシテ・ドゥ・ナント | Am4x8型遷移元素の四面体アグリゲートを有する空隙尖晶石を電子データ再書き込み可能不揮発性メモリに使用すること及び対応する物質 |
JP2010171332A (ja) * | 2009-01-26 | 2010-08-05 | Toshiba Corp | 不揮発性半導体記憶装置、及びその製造方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008129683A1 (ja) * | 2007-03-30 | 2008-10-30 | Kabushiki Kaisha Toshiba | 情報記録再生装置 |
WO2010029607A1 (ja) | 2008-09-09 | 2010-03-18 | 株式会社 東芝 | 情報記録再生装置 |
US10756263B2 (en) * | 2018-05-23 | 2020-08-25 | Purdue Research Foundation | Phase transition based resistive random-access memory |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002362923A (ja) * | 2001-06-05 | 2002-12-18 | Nippon Shokubai Co Ltd | 金属酸化物系粒子の製法 |
JP2005276952A (ja) * | 2004-03-23 | 2005-10-06 | Japan Science & Technology Agency | 二次元酸化物自然超格子を用いた熱電材料とその熱電特性の調整方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6204139B1 (en) * | 1998-08-25 | 2001-03-20 | University Of Houston | Method for switching the properties of perovskite materials used in thin film resistors |
EP1153434A1 (en) * | 1999-02-17 | 2001-11-14 | International Business Machines Corporation | Microelectronic device for storing information and method thereof |
WO2003079463A2 (en) * | 2002-03-15 | 2003-09-25 | Axon Technologies Corporation | Programmable structure, an array including the structure, and methods of forming the same |
WO2004068604A1 (ja) * | 2003-01-30 | 2004-08-12 | Matsushita Electric Industrial Co., Ltd. | 熱スイッチ素子およびその製造方法 |
JP4146325B2 (ja) * | 2003-10-08 | 2008-09-10 | 株式会社東芝 | 巨大磁気抵抗効果素子 |
JP4499740B2 (ja) * | 2003-12-26 | 2010-07-07 | パナソニック株式会社 | 記憶素子、メモリ回路、半導体集積回路 |
KR101046868B1 (ko) * | 2004-04-16 | 2011-07-06 | 파나소닉 주식회사 | 가변저항을 갖는 박막 메모리 장치 |
JP4529654B2 (ja) * | 2004-11-15 | 2010-08-25 | ソニー株式会社 | 記憶素子及び記憶装置 |
US7636257B2 (en) * | 2005-06-10 | 2009-12-22 | Macronix International Co., Ltd. | Methods of operating p-channel non-volatile memory devices |
KR100723872B1 (ko) * | 2005-06-30 | 2007-05-31 | 한국전자통신연구원 | 급격한 금속-절연체 전이를 이용한 메모리소자 및 그동작방법 |
-
2007
- 2007-06-12 JP JP2009510718A patent/JP4792108B2/ja not_active Expired - Fee Related
- 2007-06-12 WO PCT/JP2007/061829 patent/WO2008129684A1/ja active Application Filing
- 2007-06-12 TW TW096121210A patent/TW200839956A/zh not_active IP Right Cessation
-
2009
- 2009-09-21 US US12/563,703 patent/US20100074001A1/en not_active Abandoned
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002362923A (ja) * | 2001-06-05 | 2002-12-18 | Nippon Shokubai Co Ltd | 金属酸化物系粒子の製法 |
JP2005276952A (ja) * | 2004-03-23 | 2005-10-06 | Japan Science & Technology Agency | 二次元酸化物自然超格子を用いた熱電材料とその熱電特性の調整方法 |
Non-Patent Citations (1)
Title |
---|
SAKAMOTO T. ET AL.: "Kotai Denkaishitsu Memory", OYO BUTSURI, vol. 75, no. 9, pages 1126 - 1130, XP003023919 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010521069A (ja) * | 2007-03-14 | 2010-06-17 | ユニヴェルシテ・ドゥ・ナント | Am4x8型遷移元素の四面体アグリゲートを有する空隙尖晶石を電子データ再書き込み可能不揮発性メモリに使用すること及び対応する物質 |
KR101416725B1 (ko) | 2007-03-14 | 2014-07-09 | 위니베르시떼 드 낭뜨 | 전자 데이터를 재기록가능한 비휘발성 메모리의 am4x8 타입의 전이 원소의 사면체 집합체를 갖는 라쿠나 스피넬의 용도 및 대응하는 재료 |
JP2010171332A (ja) * | 2009-01-26 | 2010-08-05 | Toshiba Corp | 不揮発性半導体記憶装置、及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI343095B (ja) | 2011-06-01 |
TW200839956A (en) | 2008-10-01 |
JPWO2008129684A1 (ja) | 2010-07-22 |
JP4792108B2 (ja) | 2011-10-12 |
US20100074001A1 (en) | 2010-03-25 |
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