WO2008123436A1 - Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof - Google Patents

Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof Download PDF

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Publication number
WO2008123436A1
WO2008123436A1 PCT/JP2008/056142 JP2008056142W WO2008123436A1 WO 2008123436 A1 WO2008123436 A1 WO 2008123436A1 JP 2008056142 W JP2008056142 W JP 2008056142W WO 2008123436 A1 WO2008123436 A1 WO 2008123436A1
Authority
WO
WIPO (PCT)
Prior art keywords
carried out
copper alloy
mass
production
electronic material
Prior art date
Application number
PCT/JP2008/056142
Other languages
French (fr)
Japanese (ja)
Inventor
Hiroshi Kuwagaki
Original Assignee
Nippon Mining & Metals Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining & Metals Co., Ltd. filed Critical Nippon Mining & Metals Co., Ltd.
Priority to CN2008800101753A priority Critical patent/CN101646791B/en
Priority to KR1020097021841A priority patent/KR101159562B1/en
Publication of WO2008123436A1 publication Critical patent/WO2008123436A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/02Single bars, rods, wires, or strips

Abstract

Disclosed is a Cu-Ni-Si-Co-based alloy reduced in the production of a coarse second phase particle. In the process for producing a Cu-Ni-Si-Co-based alloy; (1) the hot rolling is carried out after heating at 950 to 1050˚C for 1 hour or longer, and the hot rolling termination temperature is fixed at 850˚C or higher, and the cooling is carried out at a rate of 15˚C/s or more; and (2) the solution treatment is carried out at 850 to 1050˚C, and the cooling is carried out at a rate of 15˚C/s or more. Specifically disclosed is a copper alloy for an electronic material, which comprises 1.0 to 2.5 mass% of Ni, 0.5 to 2.5 mass% of Co and 0.30 to 1.20 mass% of Si, with the remainder being Cu and unavoidable impurities. The copper alloy contains no second phase particle having a particle diameter greater than 10 μm, and contains a second phase particle having a particle diameter of 5 to 10 μm at a density of 50 particles/mm2 or less in a cross-section parallel to the rolling direction.
PCT/JP2008/056142 2007-03-30 2008-03-28 Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof WO2008123436A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2008800101753A CN101646791B (en) 2007-03-30 2008-03-28 Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof
KR1020097021841A KR101159562B1 (en) 2007-03-30 2008-03-28 Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007092269A JP4937815B2 (en) 2007-03-30 2007-03-30 Cu-Ni-Si-Co-based copper alloy for electronic materials and method for producing the same
JP2007-092269 2007-03-30

Publications (1)

Publication Number Publication Date
WO2008123436A1 true WO2008123436A1 (en) 2008-10-16

Family

ID=39830921

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/056142 WO2008123436A1 (en) 2007-03-30 2008-03-28 Cu-ni-si-co-based copper alloy for electronic material, and method for production thereof

Country Status (5)

Country Link
JP (1) JP4937815B2 (en)
KR (1) KR101159562B1 (en)
CN (1) CN101646791B (en)
TW (1) TW200900515A (en)
WO (1) WO2008123436A1 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2194151B1 (en) * 2007-09-28 2014-08-13 JX Nippon Mining & Metals Corporation Cu-ni-si-co-base copper alloy for electronic material and process for producing the copper alloy
JP4596490B2 (en) * 2008-03-31 2010-12-08 Jx日鉱日石金属株式会社 Cu-Ni-Si-Co-based copper alloy for electronic materials and method for producing the same
KR101331339B1 (en) * 2008-12-01 2013-11-19 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Cu-ni-si-co based copper ally for electronic materials and manufacturing method therefor
JP5261161B2 (en) * 2008-12-12 2013-08-14 Jx日鉱日石金属株式会社 Ni-Si-Co-based copper alloy and method for producing the same
JP4708485B2 (en) 2009-03-31 2011-06-22 Jx日鉱日石金属株式会社 Cu-Co-Si based copper alloy for electronic materials and method for producing the same
JP5578827B2 (en) * 2009-10-13 2014-08-27 Dowaメタルテック株式会社 High-strength copper alloy sheet and manufacturing method thereof
JP4677505B1 (en) 2010-03-31 2011-04-27 Jx日鉱日石金属株式会社 Cu-Ni-Si-Co-based copper alloy for electronic materials and method for producing the same
JP5961335B2 (en) 2010-04-05 2016-08-02 Dowaメタルテック株式会社 Copper alloy sheet and electrical / electronic components
JP4830035B2 (en) 2010-04-14 2011-12-07 Jx日鉱日石金属株式会社 Cu-Si-Co alloy for electronic materials and method for producing the same
JP4672804B1 (en) * 2010-05-31 2011-04-20 Jx日鉱日石金属株式会社 Cu-Co-Si based copper alloy for electronic materials and method for producing the same
JP4708497B1 (en) 2010-06-03 2011-06-22 Jx日鉱日石金属株式会社 Cu-Co-Si alloy plate and method for producing the same
JP4834781B1 (en) 2010-08-24 2011-12-14 Jx日鉱日石金属株式会社 Cu-Co-Si alloy for electronic materials
JP2012072470A (en) 2010-09-29 2012-04-12 Jx Nippon Mining & Metals Corp Cu-Co-Si-BASED COPPER ALLOY FOR ELECTRONIC MATERIAL AND METHOD FOR PRODUCING THE SAME
CN102560191A (en) * 2010-12-09 2012-07-11 北京有色金属研究总院 High-performance elastic copper alloy and preparation and processing method thereof
JP5441876B2 (en) * 2010-12-13 2014-03-12 Jx日鉱日石金属株式会社 Cu-Ni-Si-Co-based copper alloy for electronic materials and method for producing the same
JP5451674B2 (en) 2011-03-28 2014-03-26 Jx日鉱日石金属株式会社 Cu-Si-Co based copper alloy for electronic materials and method for producing the same
JP4799701B1 (en) * 2011-03-29 2011-10-26 Jx日鉱日石金属株式会社 Cu-Co-Si based copper alloy strip for electronic materials and method for producing the same
JP6039999B2 (en) 2012-10-31 2016-12-07 Dowaメタルテック株式会社 Cu-Ni-Co-Si based copper alloy sheet and method for producing the same
JP5647703B2 (en) 2013-02-14 2015-01-07 Dowaメタルテック株式会社 High-strength Cu-Ni-Co-Si-based copper alloy sheet, its manufacturing method, and current-carrying parts
CN106636734B (en) * 2015-10-30 2019-01-15 北京有色金属研究总院 High-intensitive, highly conductive, high resistance to stress relaxation copper alloy elastic material and preparation method thereof
CN105316523A (en) * 2015-12-02 2016-02-10 苏州龙腾万里化工科技有限公司 Durable resistance alloy for milling machine regulator
KR102590060B1 (en) * 2016-03-31 2023-10-18 도와 메탈테크 가부시키가이샤 Cu-Ni-Si based copper alloy sheet and manufacturing method
CN105908015A (en) * 2016-05-05 2016-08-31 太仓小小精密模具有限公司 Anti-oxidization copper alloy mold material
CN106399749B (en) * 2016-10-05 2018-01-05 宁波兴业盛泰集团有限公司 A kind of high strength and high flexibility cupro-nickel Si system alloy material and preparation method thereof
CN106756202A (en) * 2016-11-23 2017-05-31 宁波兴业盛泰集团有限公司 A kind of blaster fuse frame material complicated pluralism Cu alloy material and preparation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58123846A (en) * 1982-01-20 1983-07-23 Nippon Mining Co Ltd Lead material for semiconductor apparatus
JPS63143230A (en) * 1986-12-08 1988-06-15 Nippon Mining Co Ltd Precipitation strengthening high tensile copper alloy having high electrical conductivity
JP2006283120A (en) * 2005-03-31 2006-10-19 Nikko Metal Manufacturing Co Ltd Cu-Ni-Si-Co-Cr BASED COPPER ALLOY FOR ELECTRONIC MATERIAL, AND ITS PRODUCTION METHOD
JP2007136467A (en) * 2005-11-15 2007-06-07 Hitachi Cable Ltd Cast ingot of copper alloy, method for producing cast ingot of copper alloy, method for producing copper alloy strip and production device for cast ingot of copper alloy

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3699701B2 (en) * 2002-10-31 2005-09-28 日鉱金属加工株式会社 Easy-to-process high-strength, high-conductivity copper alloy

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58123846A (en) * 1982-01-20 1983-07-23 Nippon Mining Co Ltd Lead material for semiconductor apparatus
JPS63143230A (en) * 1986-12-08 1988-06-15 Nippon Mining Co Ltd Precipitation strengthening high tensile copper alloy having high electrical conductivity
JP2006283120A (en) * 2005-03-31 2006-10-19 Nikko Metal Manufacturing Co Ltd Cu-Ni-Si-Co-Cr BASED COPPER ALLOY FOR ELECTRONIC MATERIAL, AND ITS PRODUCTION METHOD
JP2007136467A (en) * 2005-11-15 2007-06-07 Hitachi Cable Ltd Cast ingot of copper alloy, method for producing cast ingot of copper alloy, method for producing copper alloy strip and production device for cast ingot of copper alloy

Also Published As

Publication number Publication date
TWI367952B (en) 2012-07-11
CN101646791A (en) 2010-02-10
CN101646791B (en) 2011-11-16
KR101159562B1 (en) 2012-06-26
TW200900515A (en) 2009-01-01
JP4937815B2 (en) 2012-05-23
KR20090122303A (en) 2009-11-26
JP2008248333A (en) 2008-10-16

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