WO2008081508A1 - 再生装置及び再生方法 - Google Patents

再生装置及び再生方法 Download PDF

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Publication number
WO2008081508A1
WO2008081508A1 PCT/JP2006/326079 JP2006326079W WO2008081508A1 WO 2008081508 A1 WO2008081508 A1 WO 2008081508A1 JP 2006326079 W JP2006326079 W JP 2006326079W WO 2008081508 A1 WO2008081508 A1 WO 2008081508A1
Authority
WO
WIPO (PCT)
Prior art keywords
liquid
regeneration
regenerated
treatment apparatus
supply
Prior art date
Application number
PCT/JP2006/326079
Other languages
English (en)
French (fr)
Inventor
Tokuo Takamoto
Original Assignee
Hirata Corporation
Three Dyne Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hirata Corporation, Three Dyne Corporation filed Critical Hirata Corporation
Priority to PCT/JP2006/326079 priority Critical patent/WO2008081508A1/ja
Priority to CNA2007800483113A priority patent/CN101600517A/zh
Priority to PCT/JP2007/075131 priority patent/WO2008081872A1/ja
Priority to KR1020097014192A priority patent/KR101126588B1/ko
Priority to TW096150707A priority patent/TWI373362B/zh
Priority to JP2008552152A priority patent/JP5250426B2/ja
Publication of WO2008081508A1 publication Critical patent/WO2008081508A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/42—Regulation; Control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Abstract

　洗浄等の処理において、洗浄液等の液体を使用すると同時に、一旦使用した液体を再生して再生液体として、再度使用することができるようにする。液体を使用する処理装置の使用済み液体を回収する回収手段と、回収した使用済み液体を再生して再生液体にする再生手段と、前記再生液体を前記処理装置に供給する供給手段と、前記回収手段、前記再生手段、及び前記供給手段を制御する制御手段と、を備える再生装置を提供する。前記処理装置と前記再生手段が同時に稼働可能できるように、これらの間で使用済み液体及び前記再生液体を供給する連結手段を備えてよい。  
PCT/JP2006/326079 2006-12-27 2006-12-27 再生装置及び再生方法 WO2008081508A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
PCT/JP2006/326079 WO2008081508A1 (ja) 2006-12-27 2006-12-27 再生装置及び再生方法
CNA2007800483113A CN101600517A (zh) 2006-12-27 2007-12-27 再生装置以及再生方法
PCT/JP2007/075131 WO2008081872A1 (ja) 2006-12-27 2007-12-27 再生装置及び再生方法
KR1020097014192A KR101126588B1 (ko) 2006-12-27 2007-12-27 액체 재생 장치, 재생 시스템 및 재생 방법
TW096150707A TWI373362B (en) 2006-12-27 2007-12-27 Recycling device and method
JP2008552152A JP5250426B2 (ja) 2006-12-27 2007-12-27 再生装置及び再生方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2006/326079 WO2008081508A1 (ja) 2006-12-27 2006-12-27 再生装置及び再生方法

Publications (1)

Publication Number Publication Date
WO2008081508A1 true WO2008081508A1 (ja) 2008-07-10

Family

ID=39588199

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2006/326079 WO2008081508A1 (ja) 2006-12-27 2006-12-27 再生装置及び再生方法
PCT/JP2007/075131 WO2008081872A1 (ja) 2006-12-27 2007-12-27 再生装置及び再生方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/075131 WO2008081872A1 (ja) 2006-12-27 2007-12-27 再生装置及び再生方法

Country Status (4)

Country Link
KR (1) KR101126588B1 (ja)
CN (1) CN101600517A (ja)
TW (1) TWI373362B (ja)
WO (2) WO2008081508A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11402553B2 (en) * 2018-06-14 2022-08-02 Fanuc Corporation Galvanometer mirror and laser machine

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT509587B1 (de) * 2010-10-11 2011-10-15 Tms Transport Und Montagesysteme Gmbh Verfahren und eine reinigungsanlage zum reinigen industriell gefertigter bauteile
TWI630652B (zh) 2014-03-17 2018-07-21 斯克林集團公司 基板處理裝置及使用基板處理裝置之基板處理方法
CN104056798B (zh) * 2014-05-21 2016-02-03 上海和辉光电有限公司 清洗液的回收和供给设备及方法
CN104858178A (zh) * 2014-09-15 2015-08-26 杜正阔 一种清洗液可以汽化加压液化再生的超声清洗机技术
JP6499414B2 (ja) * 2014-09-30 2019-04-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN110871192A (zh) * 2019-10-30 2020-03-10 宁波兰羚钢铁实业有限公司 一种纵剪加工减少钢卷表面重涂油和油污的方法
KR102598967B1 (ko) * 2020-09-07 2023-11-06 현대자동차주식회사 피처리액 처리장치 및 처리방법
CN113426752B (zh) * 2021-06-28 2023-01-03 北京七星华创集成电路装备有限公司 掩膜板的清洗设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083774A (ja) * 1994-06-17 1996-01-09 Daido Steel Co Ltd 鋼材の酸洗方法および酸洗装置
JPH10158874A (ja) * 1996-11-29 1998-06-16 Sumitomo Metal Ind Ltd 鋼板の洗浄装置
JP2000334400A (ja) * 1999-05-31 2000-12-05 Nakajima Kogyo:Kk 洗浄システム
JP2002180278A (ja) * 2000-12-07 2002-06-26 Sanyo Special Steel Co Ltd 鋼材塩酸酸洗槽の塩酸濃度制御方法および鋼材の酸洗方法
JP2002532628A (ja) * 1998-11-12 2002-10-02 ゼネラル・エレクトリック・カンパニイ 物品から皮膜を剥離しクリーニングする装置および方法
JP2002320824A (ja) * 2001-04-27 2002-11-05 Nippon Parkerizing Co Ltd 廃酸溶液の酸回収方法
JP2006223917A (ja) * 2005-02-15 2006-08-31 Sanyo Electric Co Ltd 溶剤回収機能付き蒸留装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2758813B2 (ja) * 1993-11-04 1998-05-28 出光興産株式会社 細管の洗浄方法および装置
JP2000292932A (ja) * 1999-04-09 2000-10-20 Seiko Epson Corp レジスト処理装置
JP3697123B2 (ja) * 1999-11-19 2005-09-21 三菱重工業株式会社 印刷機の廃液再生装置
KR100753629B1 (ko) * 2006-05-26 2007-08-29 세메스 주식회사 기판 처리 장치 및 방법

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083774A (ja) * 1994-06-17 1996-01-09 Daido Steel Co Ltd 鋼材の酸洗方法および酸洗装置
JPH10158874A (ja) * 1996-11-29 1998-06-16 Sumitomo Metal Ind Ltd 鋼板の洗浄装置
JP2002532628A (ja) * 1998-11-12 2002-10-02 ゼネラル・エレクトリック・カンパニイ 物品から皮膜を剥離しクリーニングする装置および方法
JP2000334400A (ja) * 1999-05-31 2000-12-05 Nakajima Kogyo:Kk 洗浄システム
JP2002180278A (ja) * 2000-12-07 2002-06-26 Sanyo Special Steel Co Ltd 鋼材塩酸酸洗槽の塩酸濃度制御方法および鋼材の酸洗方法
JP2002320824A (ja) * 2001-04-27 2002-11-05 Nippon Parkerizing Co Ltd 廃酸溶液の酸回収方法
JP2006223917A (ja) * 2005-02-15 2006-08-31 Sanyo Electric Co Ltd 溶剤回収機能付き蒸留装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11402553B2 (en) * 2018-06-14 2022-08-02 Fanuc Corporation Galvanometer mirror and laser machine

Also Published As

Publication number Publication date
KR20090097912A (ko) 2009-09-16
TWI373362B (en) 2012-10-01
CN101600517A (zh) 2009-12-09
WO2008081872A1 (ja) 2008-07-10
TW200918147A (en) 2009-05-01
KR101126588B1 (ko) 2012-03-27

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