WO2006027106A1 - Verfahren zum abscheiden von photokatalytischen titanoxid-schichten - Google Patents

Verfahren zum abscheiden von photokatalytischen titanoxid-schichten Download PDF

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Publication number
WO2006027106A1
WO2006027106A1 PCT/EP2005/009129 EP2005009129W WO2006027106A1 WO 2006027106 A1 WO2006027106 A1 WO 2006027106A1 EP 2005009129 W EP2005009129 W EP 2005009129W WO 2006027106 A1 WO2006027106 A1 WO 2006027106A1
Authority
WO
WIPO (PCT)
Prior art keywords
titanium oxide
deposited
layer
photocatalytic
oxide layer
Prior art date
Application number
PCT/EP2005/009129
Other languages
German (de)
English (en)
French (fr)
Inventor
Bert Scheffel
Christoph Metzner
Olaf Zywitzki
Volker Kirchhoff
Thomas Modes
Original Assignee
Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. filed Critical Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
Priority to JP2007529329A priority Critical patent/JP4847957B2/ja
Publication of WO2006027106A1 publication Critical patent/WO2006027106A1/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation
PCT/EP2005/009129 2004-09-03 2005-08-24 Verfahren zum abscheiden von photokatalytischen titanoxid-schichten WO2006027106A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007529329A JP4847957B2 (ja) 2004-09-03 2005-08-24 光触媒性酸化チタン層を析出する方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004042650A DE102004042650B4 (de) 2004-09-03 2004-09-03 Verfahren zum Abscheiden von photokatalytischen Titanoxid-Schichten
DE102004042650.3 2004-09-03

Publications (1)

Publication Number Publication Date
WO2006027106A1 true WO2006027106A1 (de) 2006-03-16

Family

ID=35385907

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/009129 WO2006027106A1 (de) 2004-09-03 2005-08-24 Verfahren zum abscheiden von photokatalytischen titanoxid-schichten

Country Status (5)

Country Link
JP (1) JP4847957B2 (zh)
KR (1) KR20070048723A (zh)
CN (1) CN101018882A (zh)
DE (1) DE102004042650B4 (zh)
WO (1) WO2006027106A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8419857B2 (en) 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009051439A1 (de) 2009-10-30 2011-05-05 Gottfried Wilhelm Leibniz Universität Hannover Metallisch beschichtetes oder teilbeschichtetes Substrat und Verfahren zu dessen Herstellung
DE102010023418A1 (de) * 2010-06-11 2011-12-15 Uhde Gmbh Ein- oder mehrseitige Substratbeschichtung

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5958194A (en) * 1997-09-18 1999-09-28 Glazier; Alan N. Gas permeable elastomer contact lens bonded with titanium and/or oxides thereof
US20020107144A1 (en) * 1994-10-31 2002-08-08 Akira Fujishima Illuminating devices and window glasses employing titanium dioxide photocatalysts

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3258023B2 (ja) * 1994-10-31 2002-02-18 財団法人神奈川科学技術アカデミー 酸化チタン光触媒構造体及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020107144A1 (en) * 1994-10-31 2002-08-08 Akira Fujishima Illuminating devices and window glasses employing titanium dioxide photocatalysts
US5958194A (en) * 1997-09-18 1999-09-28 Glazier; Alan N. Gas permeable elastomer contact lens bonded with titanium and/or oxides thereof

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
METZNER C ET AL: "Plasma-activated electron beam deposition with diffuse cathodic vacuum arc discharge (SAD): a technique for coating strip steel", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, vol. 86-87, no. 1-3, 15 December 1996 (1996-12-15), pages 769 - 775, XP002330053, ISSN: 0257-8972 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8419857B2 (en) 2009-03-31 2013-04-16 United Technologies Corporation Electron beam vapor deposition apparatus and method of coating

Also Published As

Publication number Publication date
KR20070048723A (ko) 2007-05-09
JP4847957B2 (ja) 2011-12-28
CN101018882A (zh) 2007-08-15
JP2008511434A (ja) 2008-04-17
DE102004042650B4 (de) 2007-07-19
DE102004042650A1 (de) 2006-03-23

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