Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
  • H01L21/67005—Apparatus not specifically provided for elsewhere
  • H01L21/67242—Apparatus for monitoring, sorting or marking
  • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
• • G—PHYSICS
  • G05—CONTROLLING; REGULATING
  • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
  • G05D16/00—Control of fluid pressure
  • G05D16/20—Control of fluid pressure characterised by the use of electric means
  • G05D16/2093—Control of fluid pressure characterised by the use of electric means with combination of electric and non-electric auxiliary power
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
  • H01L21/67005—Apparatus not specifically provided for elsewhere
  • H01L21/67011—Apparatus for manufacture or treatment
  • H01L21/67017—Apparatus for fluid treatment

Definitions

• the vacuum volume is controlled by changing the opening degree of the vacuum proportional closing valve so that the vacuum pressure in the vacuum vessel is changed at a target vacuum pressure change rate set by an external force or previously set to a controller. While slowly advancing the process of discharging the gas from the inside of the chamber to prevent the particles from rolling up in the vacuum chamber, when discharging the gas from the vacuum chamber, The rate of change in vacuum pressure can be freely controlled!
• a vacuum pressure value changed at a target vacuum pressure change rate acquired with respect to the vacuum pressure in the reaction chamber measured by the vacuum pressure sensor is sequentially generated as an internal command
• Feedback control is performed as follow-up control by setting the sequentially generated internal command as a target value of feedback control and sequentially changing the target value of feedback control.
• Patent Document 1 Japanese Patent Application Laid-Open No. 2000-163137
• the abnormality such as “abnormality of vacuum pressure sensor”, “leakage of reaction chamber”, “clogging of piping”, etc.
• the countermeasures will be implemented. In other words, there was a problem that the system itself could not detect abnormalities.
• the controller controls the opening of the vacuum proportional on-off valve based on the output of the vacuum pressure sensor, which measures the vacuum pressure in the vacuum vessel, and the vacuum pressure sensor. Reduce the pressure (see Figure 5).
• the controller stores the relationship between the output of the vacuum pressure sensor and the opening degree of the vacuum proportional on-off valve in such a normal state.
• the output of the vacuum pressure sensor is preset when the opening of the vacuum proportional on-off valve reaches the preset predetermined opening. If it is larger, it is considered that the system has an abnormality. Therefore, in this vacuum pressure control system, when performing the opening control of the vacuum proportional on-off valve based on the output of the vacuum pressure sensor, the opening degree of the vacuum proportional on-off valve has reached a predetermined opening set in advance. Sometimes, when the output of the vacuum pressure sensor is larger than a predetermined value set in advance, it is determined that an abnormality has occurred in the system. This enables early detection of system abnormalities.
• the controller when the controller detects an abnormality in the system or determines that an abnormality occurs in the system, the controller operates the system of the proportional proportional on-off valve. It is desirable to operate in the safe direction.
• the "valve opening”, “opening the valve”, or “to operate the vacuum proportional open / close valve in the safety direction of the system” One of “maintain the valve opening degree” corresponds. That is, in this vacuum pressure control system, the operation of the vacuum proportional on-off valve is controlled by the controller so as to enhance safety of each system at the time of abnormality. As a result, the system can be further enhanced in safety because measures can be taken automatically.
• FIG. 1 is a block diagram schematically showing a vacuum pressure control system according to an embodiment.
• FIG. 2 is a cross-sectional view when the vacuum proportional on-off valve is in a closed state.
• FIG. 3 is a cross-sectional view of the vacuum proportional on-off valve in an open state.
• Fig. 8 is a flowchart showing the contents of execution time processing in the vacuum pressure change rate control mode.
• FIG. 9 is a view showing an example of the pressure change of the reaction chamber and the change of the valve opening degree of the vacuum proportional on-off valve in the vacuum pressure change speed control mode at the normal time.
• FIG. 11 is a view showing an example of a change in pressure of the reaction chamber and a change in valve opening degree of the vacuum proportional on-off valve when abnormality is detected and abnormal processing is performed.
• FIG. 13 is a view showing an example of a change in pressure in a reaction chamber and a change in valve opening of a vacuum proportional on-off valve when an abnormality is detected and an abnormal process is performed.
• FIG. 14 is a view showing an outline of a CVD apparatus and its exhaust system.
• FIG. 1 shows a block diagram of a vacuum pressure control system according to the present embodiment, as compared with FIG. 14 shown in the column of the prior art.
• the vacuum pressure control system according to the present embodiment includes a controller 20, an air pressure control unit 30, a vacuum proportional on-off valve 16 which is an operation unit 40, and vacuum pressure sensors 14 and 15 which are a detection unit 60.
• the controller 20 includes an interface circuit 21, a vacuum pressure control circuit 22, and a sequence control circuit 23.
• An interface circuit 21 is provided on the front panel of the controller 20.
• the signal from the field input through the tongue and the signal from the remote input through the connector on the back panel of the controller 20 are converted into signals suitable for the vacuum pressure control circuit 22, the sequence control circuit 23, and the like.
• the controller 20 stores a constant relationship between the output of the vacuum pressure sensor and the opening degree of the vacuum proportional on-off valve at normal times, and this constant relationship and the actual condition of the vacuum pressure sensor. It compares the output with the actual opening degree of the vacuum proportional on / off valve to detect (determine) an abnormality in the system.
• the vacuum pressure control circuit 22 is a circuit that performs feedback control with respect to the vacuum pressure in the reaction chamber 10 of FIG. 14 by PID control.
• the sequence control circuit 23 is predetermined for the drive coil SV1 of the first solenoid valve 34 and the drive coil SV2 of the second solenoid valve 35 in the air pressure control unit 30 according to the operation mode given by the interface circuit 21. It is a circuit that operates.
• the pneumatic control unit 30 includes a position control circuit 31, a pulse drive circuit 32, a time opening / closing operation valve 33, a first solenoid valve 34, and a second solenoid valve 35.
• Position control circuit 31 has a valve opening degree command value given from vacuum pressure control circuit 22 and a valve opening degree measurement value given from potentiometer 18 provided on vacuum proportional on / off valve 16 through amplifier 19. And the position of the vacuum proportional on-off valve 16 is controlled.
• the pulse drive circuit 32 transmits a pulse signal to the time switching valve 33 based on the control signal from the position control circuit 31.
• the time opening / closing operation valve 33 incorporates an air supply side proportional valve and an exhaust side proportional valve (not shown), and according to the pulse signal from the pulse drive circuit 32, the air supply side proportional valve and the exhaust side
• the proportional valve is operated to open and close for a time, and the air pressure in the pneumatic cylinder 41 (see FIGS. 2 and 3 described later) of the vacuum proportional on-off valve 16 via the second solenoid valve 35 and the first solenoid valve 34.
• the vacuum proportional on-off valve 16 which is the operation unit 40 changes the conductance of the exhaust system from the reaction chamber 10 to the vacuum pump 13.
• Figures 2 and 3 show the cross sections of the vacuum ratio example on-off valve 16.
• a piston rod 43 is provided at the center thereof.
• the piston 44 is fixed inside the pneumatic cylinder 41 which is an upper portion of the vacuum proportional on-off valve 16 with respect to the piston rod 43, and a poppet valve in a bellows type poppet valve 42 which is a lower portion of the vacuum proportional on-off valve 16.
• Body 45 is fixed. Therefore, it is empty The poppet valve body 45 can be moved by the pneumatic cylinder 41.
• the pneumatic cylinder In the vacuum proportional on-off valve 16, when the compressed air is not supplied into the pneumatic cylinder 41 through the supply port 18A, and the inside of the pneumatic cylinder 41 communicates with the exhaust line through the exhaust port 18B, the pneumatic cylinder is a pneumatic cylinder. Since the downward biasing force by the return panel 46 in 41 acts on the piston 44, as shown in FIG. 2, the poppet valve body 45 is in close contact with the valve seat 47, and the vacuum proportional on / off valve 16 is shut off.
• the distance by which the poppet valve body 45 is separated from the valve seat 47 can be operated by supply and exhaust of compressed air to the pneumatic cylinder 41 as the lift amount of the valve.
• the distance at which the poppet valve body 45 is separated from the valve seat 47 is measured by the potentiometer 18 via the slide lever 48 connected to the piston 44 as the valve lift amount. It corresponds to an opening degree of 16.
• the vacuum pressure sensors 14 and 15, which are detection units, are capacitance manometers that measure the vacuum pressure in the reaction chamber 10 of FIG. Here, two capacitance manometers are used depending on the range of vacuum pressure to be measured.
• the sequence control circuit 23 controls the first solenoid valve. 34 and the second solenoid valve 35 are operated as shown in FIG. As a result, compressed air is not supplied into the pneumatic cylinder 41 and the inside of the pneumatic cylinder 41 communicates with the exhaust line, so the air pressure inside the pneumatic cylinder 41 becomes atmospheric pressure, and the vacuum proportional opening and closing valve 16 is shut off. It becomes.
• the sequence control circuit 23 operates the first solenoid valve 34 so that the time opening / closing operation valve 33 and the pneumatic cylinder 41 Communicate with
• the vacuum proportional opening and closing The air pressure in the pneumatic cylinder 41 of the valve 16 is adjusted, and the valve lift amount force can be operated by the pneumatic cylinder 41.
• the vacuum pressure control circuit 22 starts feedback control in which the target vacuum pressure value instructed by the on-site input or remote input is set as the target value. That is, in FIG. 14, the vacuum pressure value in the reaction chamber 10 is measured by the vacuum pressure sensors 14 and 15, and the valve of the vacuum proportional on-off valve 16 is adjusted according to the difference (control deviation) from the target vacuum pressure value. By operating the lift amount and changing the conductance of the exhaust system, the vacuum pressure in the reaction chamber 10 is kept constant at the target vacuum pressure value.
• the vacuum pressure control circuit 22 when the control deviation of the feedback control is large, the operation amount of the feedback control is maximized, so that the speed response of the feedback control is sufficiently secured.
• the control deviation of the feedback control when the control deviation of the feedback control is small, the vacuum pressure in the reaction chamber 10 can be maintained in a stable state because the time transition is made stepwise to the previously adjusted time constant.
• the value obtained by adjusting the vacuum pressure value in the reaction chamber 10 measured by the vacuum pressure sensors 14 and 15 by the proportional differentiation circuits 105 and 106 is a field input.
• the proportional derivative integration circuits 102, 103 After that, the integration circuit 104 connected in series outputs a voltage in the range of 0 to 5 V in order to output it to the position control circuit 31.
• the time constant of the integration circuit 104 is determined by the integration time adjustment circuit 101.
• the internal arithmetic circuit When the measured values of the vacuum pressure sensors 14 and 15 are apart from the target vacuum pressure value, the internal arithmetic circuit operates so as to minimize the integration time of the integration circuit.
• the integration circuit 104 functions as an amplification circuit having an almost infinite gain.
• the valve opening degree of the vacuum proportional on-off valve 16 can be reached in the shortest time to near the position for achieving the target vacuum pressure value.
• the integration time adjustment circuit 101 determined to have reached near the position for achieving the target vacuum pressure value holds the vacuum pressure in a stable state at that position. Perform an operation to shift to the time constant in stages.
• the vacuum pressure in the reaction chamber 10 is the target vacuum pressure. It is possible to control even the rate of change in vacuum pressure in the reaction chamber 10 when the vacuum pressure change rate control mode (SVAC) is selected by the controller 20 as the operation mode.
• the vacuum pressure change rate control mode As described above, in the vacuum pressure change rate control mode (SVAC), as shown in FIG. 5, the conductance (valve opening) of the vacuum proportional on-off valve 16 is changed by feedback control. The pressure in the reaction chamber 10 is reduced at a set constant speed. For this reason, in the vacuum pressure control system, when an abnormality such as “abnormality of the vacuum pressure sensor 14, 15”, “leakage of the reaction chamber 10”, or “clogging of piping” has occurred, the vacuum pressure is At a certain point in the change speed control mode (SVAC), the relationship between “valve opening of vacuum proportional on-off valve 16” and “value of vacuum pressure sensor 14, 15” does not become as shown in FIG. Then, using this phenomenon, the vacuum pressure control system according to the present embodiment detects the above-mentioned abnormality.
• SVAC vacuum pressure change rate control mode
• the vacuum pressure change rate control mode (SVAC) executes two subroutines, that is, preparation time processing and execution time processing, as shown in FIG. Then, when the vacuum pressure change rate control mode (SVAC) is selected by the controller 20, first, preparation time processing is executed.
• the current vacuum pressure in the reaction chamber 10 is obtained via the vacuum pressure sensors 14 and 15 (Sl).
• the current vacuum pressure in the reaction chamber 10 is the atmospheric pressure VO (see FIG. 9)
• the atmospheric pressure VO is obtained.
• the valve opening degree of the vacuum proportional on-off valve 16 is acquired via the potentiometer 18 (S 2). Then, it is determined whether the acquired valve opening degree has reached the set value XI (S3). At this time, if the valve opening has reached the set value XI (S3: YES), the current vacuum pressure in the reaction chamber 10 is acquired via the vacuum pressure sensors 14 and 15 (S4). Then, it is determined whether the obtained vacuum pressure in the reaction chamber 10 is equal to or less than the set value X2 (S5). At this time, if the current vacuum pressure in the reaction chamber 10 is larger than the set value X2 (S5: NO), it is determined that an abnormality has occurred, and the vacuum pressure change rate control mode (SV AC) is selected. The process is ended and an abnormal process is performed (S6).
• valve opening degree of the vacuum proportional on-off valve 16 is acquired via the potentiometer 18 (see FIG.
• the abnormal processing in S6 and S16 indicates that an abnormality has occurred in the system. Informing and operating the vacuum proportional control valve 16 in the safe direction. In the present embodiment, depending on the force system for operating the vacuum proportional control valve 16 in the closing direction, the valve may be operated in the opening direction or the current valve opening degree may be maintained. This is because the safety direction differs depending on the system. Therefore, in the abnormal state processing, it may be set so that the valve operation suitable for each system can be performed.
• “informative information” includes all things for hearing and visual sense etc. Informing by a single means (for example, only warning sound etc.) or in a compounding means (for example warning sound and warning etc. It may be offset, etc.).
• the valve opening degree of the vacuum proportional on-off valve 16 is acquired via the potentiometer 18 (S21). Then, it is determined whether the acquired valve opening has reached the set value XI (S22). At this time, if the valve opening has reached the set value XI (S22: YES), the current vacuum pressure in the reaction chamber 10 is acquired via the vacuum pressure sensors 14, 15 (S23). Then, it is determined whether the acquired current vacuum pressure in the reaction chamber 10 is less than or equal to the set value X2 (S24).
• the valve opening does not reach the set value XI (S22: NO), or when the current vacuum pressure in the reaction chamber 10 is less than the set value X2 (S24: YES),
• the target vacuum pressure value instructed by the site input or remote input is acquired (S26).
• the current vacuum pressure in the reaction chamber 10 is obtained via the vacuum pressure sensors 14 and 15 (S27). Then, it is determined whether or not the current vacuum pressure in the reaction chamber 10 has reached the target vacuum pressure value (S28). If the current vacuum pressure in the reaction chamber 10 has not reached the target vacuum pressure value (S28: NO), the target vacuum pressure change rate indicated by the on-site input or remote input is acquired (S29).
• the current vacuum pressure value in the reaction chamber 10 is acquired via the vacuum pressure sensors 14 and 15 (S30). Then, the controller 20 generates, as an internal command, the vacuum pressure value changed at the target vacuum pressure change rate acquired in S29 with respect to the current vacuum pressure value of the reaction chamber 10 acquired in S30. Then, the internal command is set as the target value of feedback control, and the target value of feedback control is changed (S31). Thereafter, feedback control is performed (S32) Specifically, as shown in the block diagram of FIG. 4, the target vacuum pressure value and the vacuum pressure change speed instructed by the on-site input or remote input are 0 to 5 V by the interface circuit 21 (see FIG. 1). , And is input to the internal command generation circuit 111. The internal command generation circuit 111 subtracts a predetermined vacuum pressure value from the current vacuum pressure value of the reaction chamber 10 according to the magnitude of the vacuum pressure change rate, and outputs that value as a target value for feedback control. .
• the target vacuum pressure value acquired in S26 is set as the target value of feedback control. Thereafter, feedback control is performed (S32).
• FIG. 11 is a view showing a state in which an abnormality occurs in the vacuum pressure sensors 14 and 15.
• FIG. 12 is a view showing a state of the reaction chamber 10 at the time of leak.
• FIG. 13 is a diagram showing a state in which the pipe is clogged.
• the valve opening of the vacuum proportional on-off valve 16 is set to the set value at time t4. Reach XI. At this time, the vacuum pressure of the reaction chamber 10 is not less than the set value X2.
• the vacuum pressure control system it is possible to rapidly detect an abnormality in the system, such as leaks in the vacuum pressure sensors 14 and 15, the reaction chamber 10, or clogging of piping. Then, when an abnormality is detected, the vacuum proportional on-off valve 16 is closed while notifying that effect. Therefore, it is possible to construct a very safe vacuum pressure control system.
• the set values XI and X2 set to detect each of the above-mentioned abnormalities may be obtained in advance by experiments or the like so that the respective abnormalities can be detected appropriately.
• a mechanism for detecting the degree of valve opening like the vacuum proportional on-off valve 16 (potentiometer 1 When using a valve that is not equipped with 8), use the operating voltage supplied to the valve or the operating air pressure supplied to the valve instead of using the valve opening to detect an abnormality in the system. Just do it. As a result, even if the system is constructed with a valve that does not have a mechanism for detecting the degree of opening of the valve, it is possible to detect system abnormality early.
• the vacuum pressure control system As described above, in the vacuum pressure control system according to the present embodiment, as described in detail above, when controller 20 reaches the set value XI that is set in advance, the valve opening degree of vacuum proportional on-off valve 16 If the vacuum pressure in the reaction chamber 10 is larger than the preset set value X2, it is determined that an abnormality has occurred in the system.
• the set values XI and X2 are obtained in advance by experiments so that each abnormality can be detected properly. Therefore, according to the vacuum pressure control system according to the present embodiment, it is possible to rapidly detect an abnormality in the system such as leaks of the vacuum pressure sensors 14 and 15, the reaction chamber 10, or clogging of piping. Then, when an abnormality is detected, the fact is notified and the vacuum ratio on / off valve 16 is closed. Therefore, a very safe vacuum pressure control system can be built.

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• Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• General Physics & Mathematics (AREA)
• Fluid Mechanics (AREA)
• Automation & Control Theory (AREA)
• Manufacturing & Machinery (AREA)
• Condensed Matter Physics & Semiconductors (AREA)
• Computer Hardware Design (AREA)
• Microelectronics & Electronic Packaging (AREA)
• Power Engineering (AREA)
• Control Of Fluid Pressure (AREA)
• Details Of Valves (AREA)
• Chemical Vapour Deposition (AREA)
• Testing And Monitoring For Control Systems (AREA)
• Indication Of The Valve Opening Or Closing Status (AREA)

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• 2004
  • 2004-07-05 JP JP2004198439A patent/JP4335085B2/ja active Active
• 2005
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