WO2005013364A2 - Elektronisches bauteil und nutzen zur herstellung desselben - Google Patents
Elektronisches bauteil und nutzen zur herstellung desselben Download PDFInfo
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- WO2005013364A2 WO2005013364A2 PCT/DE2004/001488 DE2004001488W WO2005013364A2 WO 2005013364 A2 WO2005013364 A2 WO 2005013364A2 DE 2004001488 W DE2004001488 W DE 2004001488W WO 2005013364 A2 WO2005013364 A2 WO 2005013364A2
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- 239000004065 semiconductor Substances 0.000 claims abstract description 114
- 239000004020 conductor Substances 0.000 claims abstract description 59
- 239000004033 plastic Substances 0.000 claims abstract description 22
- 230000008901 benefit Effects 0.000 claims description 18
- 239000000853 adhesive Substances 0.000 claims description 16
- 230000001070 adhesive effect Effects 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 13
- 239000002131 composite material Substances 0.000 claims description 9
- 229910000679 solder Inorganic materials 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 38
- 150000001875 compounds Chemical class 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 3
- GLGNXYJARSMNGJ-VKTIVEEGSA-N (1s,2s,3r,4r)-3-[[5-chloro-2-[(1-ethyl-6-methoxy-2-oxo-4,5-dihydro-3h-1-benzazepin-7-yl)amino]pyrimidin-4-yl]amino]bicyclo[2.2.1]hept-5-ene-2-carboxamide Chemical compound CCN1C(=O)CCCC2=C(OC)C(NC=3N=C(C(=CN=3)Cl)N[C@H]3[C@H]([C@@]4([H])C[C@@]3(C=C4)[H])C(N)=O)=CC=C21 GLGNXYJARSMNGJ-VKTIVEEGSA-N 0.000 description 2
- 229940125758 compound 15 Drugs 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- YSUIQYOGTINQIN-UZFYAQMZSA-N 2-amino-9-[(1S,6R,8R,9S,10R,15R,17R,18R)-8-(6-aminopurin-9-yl)-9,18-difluoro-3,12-dihydroxy-3,12-bis(sulfanylidene)-2,4,7,11,13,16-hexaoxa-3lambda5,12lambda5-diphosphatricyclo[13.2.1.06,10]octadecan-17-yl]-1H-purin-6-one Chemical compound NC1=NC2=C(N=CN2[C@@H]2O[C@@H]3COP(S)(=O)O[C@@H]4[C@@H](COP(S)(=O)O[C@@H]2[C@@H]3F)O[C@H]([C@H]4F)N2C=NC3=C2N=CN=C3N)C(=O)N1 YSUIQYOGTINQIN-UZFYAQMZSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000003353 gold alloy Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
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- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
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- H01L23/495—Lead-frames or other flat leads
- H01L23/49537—Plurality of lead frames mounted in one device
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- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49575—Assemblies of semiconductor devices on lead frames
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- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
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Definitions
- the invention relates to an electronic component with stacked semiconductor chips and a use for producing the component.
- Stacking semiconductor chips of different sizes into a compact electronic component is cost-intensive and involves high risks with regard to the perfect interaction of the integrated circuits of the semiconductor chips.
- the high costs arise in particular by providing rewiring layers for each of the semiconductor chips to be stacked and by making electrical connections between the rewiring layers of each semiconductor chip.
- electrical connections have to be created which lead from the different rewiring layers to surface-mountable external contacts of an electronic component.
- an electronic component is specified that has a stack of semiconductor chips.
- the stack has at least a first semiconductor chip and a stacked second semiconductor chip.
- the semiconductor chips in turn have an active top side with contact areas with their integrated circuits and a back side.
- a flat conductor structure with a chip island and flat conductors surrounding the chip island are arranged in the electronic component. Contact columns are aligned orthogonally to the flat conductors on the flat conductors.
- the rear side of the stacked second semiconductor chip is fixed on the chip island of the flat conductor structure and its contact areas are electrically connected to the flat conductors surrounding the chip island via bond wires.
- the first semiconductor chip is arranged below the chip island and surrounded by the contact pillars of the flat conductor structure.
- the flat conductor structure with chip island and applied stacked second semiconductor chip, as well as the bond connections and the flat conductor surrounding the chip island, as well as the lateral surfaces of the contact columns, are embedded in a plastic housing compound.
- the back of the first semiconductor chip and its edge sides are likewise surrounded by the plastic housing compound and arranged in the plastic housing compound in such a way that its active upper side is aligned coplanar with the top regions of the plastic housing compound and coplanar with the pillar surfaces of the contact pillars, and the coplanar oriented top sides form an overall top side.
- the basic areas of the contact columns are referred to as column contact surfaces.
- This overall top side advantageously offers the possibility both of the contact surfaces of the first semiconductor terchips, as well as to access the contact areas of the stacked second semiconductor chip via the contact columns, the flat conductors and the bond connections. All that is required for this is a rewiring layer on the entire upper side, which electrically connects the semiconductor chips to one another via rewiring lines.
- the invention thus advantageously combines a specially developed flat conductor structure which has metallic contact columns with a "universal package”.
- Via contacts can be produced due to the column structures of the flat conductor structure. Column contact surfaces and contact surfaces of the first semiconductor chip are arranged on the entire upper side, which can then be electrically connected in a cost-effective manner by means of microstructured rewiring.
- the assembly of the first semiconductor chip on a one-sided adhesive carrier and the assembly of the stacked second semiconductor chip on the chip island of the flat conductor structure can be carried out largely separately, which minimizes the assembly risk.
- the electronic component does not have an expensive multi-layer substrate, but only a single rewiring layer, which is arranged on the entire upper side.
- semiconductor chips with different designs can be flexibly combined and stacked on top of one another for the electronic component according to the invention, whereby semiconductor chips of the same or the same size are not excluded.
- the rewiring layer can have a rewiring layer which is arranged on the entire top side and has external contact areas. These external contact areas are electrically connected via the rewiring lines to column contact areas on the upper sides of the contact columns and / or to the contact areas of the first semiconductor chip. In this case, a rewiring layer is completely sufficient to provide electrical access to both semiconductor chips for the stacked semiconductor chips to work properly together.
- Solder balls and / or "stud bumps" can be arranged as external contacts on the external contact surfaces. This has the advantage that an application-specific form of external contacts can be implemented on the external contact surfaces.
- Another aspect of the invention relates to a benefit which has a flat conductor frame with component positions arranged in rows and columns. On such a panel, complete electronic components with the stacked semiconductor chips can already be present in the component positions, and the external contacts for each of the electronic components can already be attached to the panel.
- Such a benefit has the advantage that the production of electronic components according to the invention with stacked semiconductor chips is cheaper, so that electronic components can be made available at low cost.
- the form of the benefit can correspond in scope and circumferential markings to a standard semiconductor wafer. This has the advantage that process technologies that have proven themselves for semiconductor wafers can also be successfully carried out with such a “wafer benefit”.
- a method for producing a panel for several electronic components has the following method steps.
- a flat lead frame is manufactured with component positions arranged in rows and columns.
- a component position has a chip island and flat conductors surrounding the chip island.
- Contact columns are arranged on the flat conductors and aligned orthogonally to the flat conductors.
- Such a flat conductor frame with chip islands, flat conductors and contact columns arranged on them can be produced inexpensively by structural etching of a metal plate made of a copper alloy or a bronze alloy or by stamping and punching a metal foil.
- Bond wires made of a gold or an aluminum alloy works.
- the first semiconductor chips can be applied with their active upper sides to a carrier that is adhesive on one side.
- the semiconductor chips are arranged in rows and columns that correspond to the rows and columns of the component positions of the lead frame.
- the flat conductor frame with the stacked second semiconductor chip is then applied and aligned on the one-sided adhesive carrier with semiconductor chips arranged in rows and columns in such a way that the first semiconductor chips are arranged below the chip islands and are surrounded by contact columns.
- These contact columns stand with their base areas or column contact areas on the one-sided adhesive support and are thus coplanarly aligned with the active top sides and the contact areas of the first semiconductor chip on a common plane.
- the flat lead frame with stacked semiconductor chips and bond connections is then embedded in a plastic housing compound to form a composite plate on the carrier.
- the composite plate is cantilevered and the carrier can be removed from the active top sides of the first semiconductor chips, column contact surfaces of the plastic columns and an upper side of the plastic compound by exposing an entire top side.
- a rewiring layer is applied to the entire top side, forming rewiring lines and external contact areas on the composite body. The rewiring lines connect the external contact areas to the contact areas of the first semiconductor chip and / or to the column contact areas of the contact columns.
- This method has the advantage that a benefit with several components results from a single molding process and only a single layer of wiring is required in order to connect the stacked semiconductor chips or their integrated circuits to one another and to connect them to external contact areas. External contacts can then be applied to the external contact surfaces without already separating the benefits into individual components. For the production of individual electronic components, the only benefit is then to separate what can be done by sawing along sawing tracks between the component positions arranged in rows and columns.
- FIG. 1 shows a schematic cross section of an electronic component, according to an embodiment of the invention
- FIGS. 2 to 7 show schematic cross sections of intermediate products of individual process steps for producing a panel
- FIG. 2 shows a schematic cross section of a flat lead frame with four component positions for producing components according to FIG. 1,
- FIG. 3 shows a schematic cross section of the lead frame according to FIG. 2, which is equipped with a second stacked semiconductor chip in the component positions,
- FIG. 4 shows a schematic cross section of a single-sided adhesive carrier with first semiconductor chips
- FIG. 5 shows a schematic cross section of the lead frame according to FIG. 3, which is applied to the one-sided adhesive carrier according to FIG. 4,
- FIG. 6 shows a schematic cross section through a composite body made of plastic housing compound with an embedded lead frame, and first and second semiconductor chips,
- FIG. 7 shows a schematic cross section according to FIG. 6 with an applied wiring layer and external contacts, on an overall upper side of the panel.
- FIG. 1 shows a schematic cross section through an electronic component 1, according to an embodiment of the invention.
- the electronic component 1 has a stack 2 composed of a first semiconductor chip 3 and a stacked second semiconductor chip 4.
- the semiconductor chips 3 and 4 have active top sides 5 with contact areas 6.
- a rear side 7 of the stacked second semiconductor chip 4 is on one Chipinsel 9 arranged.
- the chip island 9 is part of a flat conductor structure 8 which surrounds the chip island 9 with flat conductors 10.
- Bond connections 12 extend from the contact areas 6 of the stacked second semiconductor chip 4 to the flat conductors 10.
- the flat conductors 10 extend to edge sides 29 and 30 of the electronic component 1.
- the flat conductors 10 have contact columns 11 which are arranged orthogonally to the flat conductors 10.
- the contact columns 11 extend up to an overall upper side 16, which is formed from the active upper side 5 of the first semiconductor chip 3, column contact surfaces 13 of the contact columns 11 and an upper side region 14 of a plastic housing compound 15.
- the flat conductor structure 8, the bond connections 12 and the stacked second semiconductor chip 4 are embedded in the plastic housing compound.
- the first semiconductor chip 3 is arranged below the chip island 9 in such a way that its active top side 5 forms a total top side with the contact surfaces 6 with the column contact surfaces 13 of the contact columns 11 and with top side regions of the plastic housing composition 15.
- the plastic housing compound 15 embeds the flat conductor structure 8, the bond connections 12, the stacked second semiconductor chip 4, and also the rear side 7 of the first semiconductor chip 3 and the edge sides 31 and 32 of the first semiconductor chip.
- a three-layer rewiring layer 17 is arranged on the overall top side 16.
- An insulation layer 33 with through contacts 34 is arranged directly on the entire top side. The through contacts 34 are electrically connected to the contact surfaces 6 of the first semiconductor chip 3 and the column contact surfaces 13 of the contact columns 11.
- the rewiring layer 17 comprises a rewiring layer 19, which consists of a structured metal layer exists and has rewiring lines 18 and external contact areas 20.
- the rewiring lines 18 connect the external contact areas 20 to one another and via the through contacts 34 to the contact areas 6 of the first semiconductor chip 3 and to the column contact areas 13 of the contact columns 11, which in turn via the flat conductors 10 and the bonding wires 12 to the contact areas 6 of the stacked second one Semiconductor chips 4 are electrically connected.
- a solder resist layer 37 is arranged on the rewiring layer 19, which protects the rewiring lines 18 and only leaves the external contact areas 20 free.
- Solder balls 21 are arranged as external contacts 28 of the electronic component 1 on the external contact surfaces 20.
- Such an electronic component can be produced inexpensively from a benefit with a few process steps, which are explained with FIGS. 2 to 7.
- FIG. 2 shows a schematic cross section of a flat lead frame 22 with four component positions 24 for producing components according to FIG. 1. Sawing along the dash-dotted line 35 results in the flat conductor structure 8 shown in FIG. 1 and embedded in plastic material 8. The component positions 24 are shown in FIG Rows and columns arranged so that such a flat conductor frame provides several flat conductor structures 8.
- a component position 24 of the flat conductor frame 22 has a chip island 9 which is surrounded by flat conductors 10, the chip island 9 being held in position by means of flat conductor webs 36.
- contact columns 11 are connected, which are aligned orthogonally to the flat conductors 10 and which have a column contact surface 13 The length of these contact columns 11 is between 0.1 and 0.9 mm. The contact columns 11 ensure that there is sufficient height below the chip island 9 to arrange a first semiconductor chip there.
- FIG. 3 shows a schematic cross section of the flat lead frame 22 according to FIG. 2, equipped with second stacked semiconductor chips 4, in the component positions 24.
- the rear sides 7 of the semiconductor chips 4 are fixed on the chip islands 9 by means of a conductive adhesive or eutectic solder.
- the contact areas 6 on the active top side 5 of the stacked second semiconductor chip 4 are connected to the flat conductors 10 via bond wires 12 of a gold alloy.
- the flat conductors 10 have a bondable coating on the bonding surfaces or on the contact surfaces of the bonding wire connections 12.
- the column contact areas 13 of the contact columns 11 are thus electrically connected to the contact areas 6 of the integrated circuit of the stacked second semiconductor chip 4 via the flat conductors 10 and the bond wire connections 12.
- FIG. 4 shows a schematic cross section of a single-sided adhesive carrier 25 with first semiconductor chips 3.
- the active top sides 5 of the first semiconductor chips 3 with their contact surfaces 6 are on the adhesive side of the carrier 25 glued.
- the rear sides 7 of the semiconductor chips 3 and the edge sides 31 and 32 of the first semiconductor chips 3 are freely accessible.
- the first semiconductor chips 3 are arranged on the carrier 25 in rows and columns corresponding to the rows and columns of the component positions 24 of the leadframe, as shown in FIGS. 2 and 3.
- FIG. 5 shows a schematic cross section of the lead frame 22 according to FIG. 3 with the column contact surfaces on the one-sided adhesive carrier 25 according to FIG
- the column contact surfaces 13 of the contact columns 11 are glued to the adhesive side of the carrier 25 such that the contact columns 11 surround the first semiconductor chip 3 on the carrier 25 and the chip island 9 is aligned with the stacked second semiconductor chip 4 above the first semiconductor chip 3.
- the length of the contact column 11 depends on the thickness of the first semiconductor chip 3, which in this embodiment of the invention is 100 ⁇ m, since the first semiconductor chip 3 is a thin-ground semiconductor chip. However, thicker semiconductor chips can also be used, since the length of the contact columns 11 can be varied between 0.1 and 0.9 mm for a flat conductor frame structured by etching.
- Figure 6 shows a schematic cross section through a
- Composite body 27 made of a plastic mass 26 with embedded flat conductor frame 22, as well as embedded first and second semiconductor chips 3 and 4.
- a molding process on the carrier 25 is required.
- the carrier 25 is removed and the entire upper side 16 of the self-supporting composite body 27 is exposed. Delaminating the carrier 25 from the composite body 27, can be done by heating the adhesive layer between the carrier and the entire upper side 16 if a thermoplastic is used as the adhesive.
- the carrier 25 is removed by laterally pulling the carrier off the composite body 27 when a rigid carrier 25 which is adhesive on one side is used. Unrolling of the carrier 25 is possible if a film is used as the one-sided adhesive carrier.
- a rewiring layer is applied to the now exposed total top side 16 in order to wire the first semiconductor chip 3 to the stacked second semiconductor chip 4.
- FIG. 7 shows a schematic cross section according to FIG. 6 with applied wiring layer 17 and external contacts 28 on an overall upper side 16 of the panel 23.
- a first insulation layer 33 has through contacts 34 which are connected to the column contact areas 13 of the contact columns 11 and to the contact areas 6 of the first semiconductor chip 3.
- a structured metal layer is arranged as rewiring layer 19 in the rewiring layer 17.
- This rewiring layer 17 has rewiring lines 18 between external contact areas 20 and in through contacts 34.
- a solder resist layer 37 is applied as the third layer of the rewiring layer 17, leaving only the outer contact areas of the rewiring layer 19 free.
- solder balls are applied to the exposed external contact surfaces 20 as external contacts 28.
- a benefit 23 constructed in this way with component positions 24 has a stack 2 of a first and a second semiconductor chip 3 and 4 at the component positions 24 and can be separated into individual components after the external contacts 28 have been attached along the dash-dotted line 35.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Wire Bonding (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US10/529,565 US7524699B2 (en) | 2003-07-28 | 2004-07-08 | Electronic component and a panel |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE10334575A DE10334575B4 (de) | 2003-07-28 | 2003-07-28 | Elektronisches Bauteil und Nutzen sowie Verfahren zur Herstellung derselben |
DE10334575.2 | 2003-07-28 |
Publications (2)
Publication Number | Publication Date |
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WO2005013364A2 true WO2005013364A2 (de) | 2005-02-10 |
WO2005013364A3 WO2005013364A3 (de) | 2005-03-24 |
Family
ID=34111723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2004/001488 WO2005013364A2 (de) | 2003-07-28 | 2004-07-08 | Elektronisches bauteil und nutzen zur herstellung desselben |
Country Status (3)
Country | Link |
---|---|
US (1) | US7524699B2 (de) |
DE (1) | DE10334575B4 (de) |
WO (1) | WO2005013364A2 (de) |
Cited By (1)
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US20150214446A1 (en) * | 2012-06-28 | 2015-07-30 | Osram Opto Semiconductors Gmbh | Electrical component and method of producing electrical components |
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JP2010262992A (ja) * | 2009-04-30 | 2010-11-18 | Sanyo Electric Co Ltd | 半導体モジュールおよび携帯機器 |
US8383457B2 (en) | 2010-09-03 | 2013-02-26 | Stats Chippac, Ltd. | Semiconductor device and method of forming interposer frame over semiconductor die to provide vertical interconnect |
US8169058B2 (en) * | 2009-08-21 | 2012-05-01 | Stats Chippac, Ltd. | Semiconductor device and method of stacking die on leadframe electrically connected by conductive pillars |
USRE48111E1 (en) | 2009-08-21 | 2020-07-21 | JCET Semiconductor (Shaoxing) Co. Ltd. | Semiconductor device and method of forming interposer frame over semiconductor die to provide vertical interconnect |
US8466543B2 (en) | 2010-05-27 | 2013-06-18 | International Business Machines Corporation | Three dimensional stacked package structure |
US20120049334A1 (en) * | 2010-08-27 | 2012-03-01 | Stats Chippac, Ltd. | Semiconductor Device and Method of Forming Leadframe as Vertical Interconnect Structure Between Stacked Semiconductor Die |
CN103050436B (zh) * | 2011-10-17 | 2017-10-10 | 新科金朋有限公司 | 形成具有扩展基底的导电柱的半导体器件和方法 |
US9824923B2 (en) * | 2011-10-17 | 2017-11-21 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming conductive pillar having an expanded base |
ITVI20120145A1 (it) * | 2012-06-15 | 2013-12-16 | St Microelectronics Srl | Struttura comprensiva di involucro comprendente connessioni laterali |
US11325828B2 (en) * | 2013-02-22 | 2022-05-10 | Vibrant Composites Inc. | High-volume millimeter scale manufacturing |
DE102014209357B4 (de) | 2013-07-02 | 2023-02-16 | Vitesco Technologies Germany Gmbh | Leiterplatte und Verfahren zur Herstellung einer Leiterplatte |
TWI623486B (zh) * | 2017-03-28 | 2018-05-11 | 思鷺科技股份有限公司 | 封裝結構 |
US9859193B2 (en) * | 2014-06-24 | 2018-01-02 | Ibis Innotech Inc. | Package structure |
US9601467B1 (en) | 2015-09-03 | 2017-03-21 | Invensas Corporation | Microelectronic package with horizontal and vertical interconnections |
CN108346639B (zh) * | 2017-09-30 | 2020-04-03 | 中芯集成电路(宁波)有限公司 | 一种晶圆级系统封装方法以及封装结构 |
CN108109985B (zh) * | 2017-12-26 | 2024-02-13 | 合肥矽迈微电子科技有限公司 | 多芯片堆叠封装方法及封装体 |
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US20150214446A1 (en) * | 2012-06-28 | 2015-07-30 | Osram Opto Semiconductors Gmbh | Electrical component and method of producing electrical components |
US9209367B2 (en) * | 2012-06-28 | 2015-12-08 | Osram Opto Semiconductors Gmbh | Electrical component and method of producing electrical components |
Also Published As
Publication number | Publication date |
---|---|
US20060125042A1 (en) | 2006-06-15 |
DE10334575B4 (de) | 2007-10-04 |
WO2005013364A3 (de) | 2005-03-24 |
DE10334575A1 (de) | 2005-03-17 |
US7524699B2 (en) | 2009-04-28 |
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