WO2005008688A1 - 酸化物超電導線材の製造方法 - Google Patents
酸化物超電導線材の製造方法 Download PDFInfo
- Publication number
- WO2005008688A1 WO2005008688A1 PCT/JP2004/009331 JP2004009331W WO2005008688A1 WO 2005008688 A1 WO2005008688 A1 WO 2005008688A1 JP 2004009331 W JP2004009331 W JP 2004009331W WO 2005008688 A1 WO2005008688 A1 WO 2005008688A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal tape
- oxide superconducting
- target
- oxide
- layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 36
- 229910052751 metal Inorganic materials 0.000 claims abstract description 45
- 239000002184 metal Substances 0.000 claims abstract description 45
- 238000004519 manufacturing process Methods 0.000 claims description 26
- 239000012808 vapor phase Substances 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 6
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052788 barium Inorganic materials 0.000 claims description 3
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 150000002910 rare earth metals Chemical class 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 21
- 239000000758 substrate Substances 0.000 description 12
- 238000000151 deposition Methods 0.000 description 11
- 238000004804 winding Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910000856 hastalloy Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
- H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/0026—Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B12/00—Superconductive or hyperconductive conductors, cables, or transmission lines
- H01B12/02—Superconductive or hyperconductive conductors, cables, or transmission lines characterised by their form
- H01B12/06—Films or wires on bases or cores
Definitions
- the present invention relates to a method for manufacturing an oxide superconducting wire, and more particularly, to a method for manufacturing an oxide superconducting wire in which an oxide superconducting layer is deposited on a metal tape.
- the oxide superconducting wire compared with other superconductive material, characterized that obtained relatively high temperature (77K) in the critical current density CJC) the IMA / cm 2 or more, high expectations for future mass production Has been sent.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2001-357739
- Patent Document 2 Japanese Patent Application Laid-Open No. 2003-92036
- Patent Document 3 JP 2003-171764 A
- the present inventor has found an excellent manufacturing method as a result of a detailed investigation of the manufacturing conditions. That is, in the present invention, when producing an oxide superconducting layer on a metal tape by using a vapor phase method, the transport speed of the tape is 5 m / h or more, and the tape and a target for producing an oxide are used. Is less than 100mm. Film formation is possible even at a tape transport speed of less than 5 m / h, but in order to increase the Jc of the completed oxide superconducting wire, it is preferable to set the transport speed to 5 m / h or more. In addition, film formation is possible even if the distance between the metal tape and the target exceeds 100 mm. However, when the distance between the metal tape and the target is increased, the oxide thin film becomes thinner and Jc cannot be increased.
- the method for manufacturing an oxide superconducting wire includes a step of positioning a metal tape at a position at a distance of 100 mm or less from a target for forming an oxide, and a step of determining a distance between the metal tape and the target.
- PDL method laser deposition method
- Rel23; Re rare earth element, Y
- FIG. 1 is a schematic view of an apparatus for implementing a method for manufacturing an oxide superconducting wire according to the present invention.
- FIG. 2 is a sectional view of an oxide superconducting wire manufactured according to the present invention.
- FIG. 1 is a schematic view of an apparatus for implementing a method for manufacturing an oxide superconducting wire according to the present invention.
- a film forming apparatus 1 includes a supply unit 2 and a substrate winding unit 3.
- a film forming chamber 4 is disposed between the supply unit 2 and the substrate winding unit 3.
- the supply section 2, the winding section 3, and the film forming chamber 4 together form a closed space or a substantially closed space.
- the metal tape 6 drawn from the supply unit 2 is subjected to laser abrasion to produce an oxide superconducting thin film in the film forming chamber 4.
- a target 7 is arranged in the film forming chamber 4 so as to face a metal tape 6 as a substrate, and the target 7 is irradiated with a laser beam 8 from outside the film forming chamber 4.
- the target 7 contains a component of the oxide superconductor. From the target 7 irradiated with the laser beam 8, as shown by an arrow 9, particles composed of the constituents of the target 7 scatter, and these particles are deposited on the metal tape 6 so as to form an oxide superconducting layer. I do.
- the metal tape 6 on which the oxide superconducting layer is formed is wound in the winding section 3.
- Oxide superconductor wound in winding section 3 The metal tape 6 on which the conductive thin film is formed is then taken out from the winding section 3 and subjected to a heat treatment in an oxygen atmosphere in a heat treatment furnace. Thereby, an oxide superconducting wire in which the oxide superconducting layer is formed on the long metal tape 6 is obtained.
- FIG. 2 is a sectional view of an oxide superconducting wire manufactured according to the present invention.
- thin-film intermediate layer 11 is formed on metal tape 6.
- the oxide superconducting layer 12 is formed on the intermediate layer 11.
- distance L between target 7 and metal tape 6 is kept at 100 mm or less.
- the transport speed of the metal tape 6 in the direction indicated by the arrow 5 is set to 5 mZh or more.
- a metal tape that is easily elongated is used as the base material of the oxide superconducting wire.
- the material of the metal tape 6 it is preferable to use a Ni—Fe alloy, stainless steel, a composite material of an alloy containing Ni, or the like.
- the intermediate layer 11 on the metal tape 6 rather than directly depositing the oxide superconducting layer 12.
- yttria-stabilized zirconia (YSZ), Ce, or the like can be selected for the purpose of promoting the crystal orientation of the oxide superconducting layer 12.
- the means for depositing the intermediate layer 11 on the metal tape 6 can be implemented in various ways. In order to maintain the orientation of the oxide superconducting layer 12 over a long length, the orientation of the intermediate layer 11 must be adjusted. It greatly affects performance.
- a substrate inclined film forming method ISD method
- a reverse ISD method obtained by further improving the method is preferably used.
- the reverse ISD method is a method in which the intermediate layer is once deposited with a thickness of half the designed value, and the other half is manufactured under the reverse inclination condition.
- the crystal misalignment angle can be corrected, so that the oxide superconducting layer is deposited with better orientation, and as a result, Jc can be increased.
- an oriented substrate is used as the metal tape. It is preferable to form an intermediate layer on the oriented substrate for the purpose of preventing element diffusion and improving lattice matching with the oxide superconducting layer.
- the production method of the present invention is a method of depositing a superconducting layer on a metal tape on which the above-described intermediate layer is deposited.
- a vapor phase method is used as a means for depositing.
- the transport speed of the metal tape is increased, so that the deposition thickness is reduced. It cannot be secured enough. Therefore, the distance between the target and the tape containing the intermediate layer to be deposited must be 100 mm or less.
- the transport speed of the metal tape is set to 5 mZh or more. At a transport speed of less than 5 m / h, the critical current density (Jc) cannot be increased. The reason is that the value of Jc is affected by the heat history applied to the intermediate layer and the metal tape due to the atmosphere heated during the deposition of the oxide superconducting layer. If the transport speed is low, the degree of the thermal history is large, and if the transport speed exceeds 5 m / h, the thermal history has no significant effect on the preparation of the oxide superconducting layer.
- the method for producing an oxide superconducting wire includes a step of positioning metal tape 6 at a position where distance L from oxide production target 7 is 100 mm or less, and a step of positioning metal tape 6 and target 7 Forming the oxide superconducting layer 12 on the metal tape 6 using the vapor phase method while transporting the metal tape 6 at a transport speed of 5 m / h or more while keeping the distance L to 100 mm or less. .
- an oriented substrate of Ni-base alloy (thickness 0.1 mm x width 10 mm x length 50 m) on which yttria-stabilized zirconia (YSZ) was deposited at a thickness of 1 zm was prepared. This is HoBa Cu
- O (HoBCO) oxide superconducting layer was deposited.
- a laser evaporation method was used, and the laser energy was set to 600 mJ.
- Oxygen is used as the deposition gas and the gas pressure is 26.7 k Pa (200 Torr), and the distance between the adherend (metal tape) and the target was kept at 80 mm.
- the irradiation area on the target was 4 mm X 6 mm to form a rectangular plume.
- the above-mentioned hastelloy tape was applied to the plume and transported, and the film was formed by adjusting the laser frequency so that the desired thickness would be 0.25 zm.
- a superconducting film was deposited without transporting the hastelloy tape, that is, at a transport speed of 0, and a tape having a desired thickness of 0.25 x m was prepared.
- a HoBCO film was deposited on the Ni-based alloy oriented substrate on which the intermediate layer was deposited, which was used in Example 1, in the same manner as in Example 1.
- the manufacturing conditions were as follows: the distance between the object to be adhered (metal tape) and the target was changed to 60 mm, and the condensing lens was used to set the irradiation area on the target to 0.6 mm ⁇ 40 mm line plume. All other conditions were the same as in Example 1.
- Example 2 Under the four conditions of 1.7 m / h, 2.5 m / h, 5 m / h, and 6.6 m / h in Example 2, a sample was obtained by preparing an oxide superconducting layer. Was. Critical current values (Ic) were measured for these samples. The critical current density (Cic) was measured using the obtained Ic. The results are shown in Table 2. Table 2 shows that, in Example 2, as in Example 1, the higher the transport speed, the larger Jc. In particular, when the transport speed was 5 mZh or more, the result showed that the value of Jc increased.
- the transport speed is increased and the critical current density is a sufficiently large value. This is an effective method for manufacturing.
- the present invention can be applied in the field of a method for producing an oxide superconducting wire.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/562,793 US20070116859A1 (en) | 2003-07-16 | 2004-07-01 | Method of manufacturing oxide superconductive wire |
EP04746800A EP1662514A4 (en) | 2003-07-16 | 2004-07-01 | PROCESS FOR PRODUCING OXID SUPERCONDITIONING WIRE |
AU2004258371A AU2004258371A1 (en) | 2003-07-16 | 2004-07-01 | Process for producing oxide superconductive wire |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003197498A JP2005038632A (ja) | 2003-07-16 | 2003-07-16 | 酸化物超電導線材の製造方法 |
JP2003-197498 | 2003-07-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005008688A1 true WO2005008688A1 (ja) | 2005-01-27 |
Family
ID=34074340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/009331 WO2005008688A1 (ja) | 2003-07-16 | 2004-07-01 | 酸化物超電導線材の製造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20070116859A1 (ja) |
EP (1) | EP1662514A4 (ja) |
JP (1) | JP2005038632A (ja) |
KR (1) | KR20060036455A (ja) |
CN (1) | CN1823393A (ja) |
AU (1) | AU2004258371A1 (ja) |
TW (1) | TW200514102A (ja) |
WO (1) | WO2005008688A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4690246B2 (ja) | 2006-05-19 | 2011-06-01 | 住友電気工業株式会社 | 超電導薄膜材料およびその製造方法 |
CN102560378B (zh) * | 2010-12-21 | 2014-03-05 | 北京有色金属研究总院 | 一种提高连续制备ybco带材临界电流的方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02307808A (ja) * | 1989-05-19 | 1990-12-21 | Sumitomo Electric Ind Ltd | 酸化物超電導線材の製造方法および装置 |
JP2000128528A (ja) * | 1998-10-16 | 2000-05-09 | Toshiba Corp | 超電導薄膜の製造方法 |
JP2001357739A (ja) * | 1990-03-29 | 2001-12-26 | Sumitomo Electric Ind Ltd | 酸化物超電導線材の製造方法および装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1332324C (en) * | 1987-03-30 | 1994-10-11 | Jun Shioya | Method for producing thin film of oxide superconductor |
US5426092A (en) * | 1990-08-20 | 1995-06-20 | Energy Conversion Devices, Inc. | Continuous or semi-continuous laser ablation method for depositing fluorinated superconducting thin film having basal plane alignment of the unit cells deposited on non-lattice-matched substrates |
EP1271666A3 (en) * | 2001-06-22 | 2006-01-25 | Fujikura Ltd. | Oxide superconductor layer and its production method |
US20050005846A1 (en) * | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
-
2003
- 2003-07-16 JP JP2003197498A patent/JP2005038632A/ja active Pending
-
2004
- 2004-07-01 US US10/562,793 patent/US20070116859A1/en not_active Abandoned
- 2004-07-01 CN CNA2004800203284A patent/CN1823393A/zh active Pending
- 2004-07-01 EP EP04746800A patent/EP1662514A4/en not_active Withdrawn
- 2004-07-01 KR KR1020067000947A patent/KR20060036455A/ko not_active Application Discontinuation
- 2004-07-01 WO PCT/JP2004/009331 patent/WO2005008688A1/ja active Application Filing
- 2004-07-01 AU AU2004258371A patent/AU2004258371A1/en not_active Abandoned
- 2004-07-15 TW TW093121128A patent/TW200514102A/zh unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02307808A (ja) * | 1989-05-19 | 1990-12-21 | Sumitomo Electric Ind Ltd | 酸化物超電導線材の製造方法および装置 |
JP2001357739A (ja) * | 1990-03-29 | 2001-12-26 | Sumitomo Electric Ind Ltd | 酸化物超電導線材の製造方法および装置 |
JP2000128528A (ja) * | 1998-10-16 | 2000-05-09 | Toshiba Corp | 超電導薄膜の製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1662514A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1662514A4 (en) | 2008-07-02 |
AU2004258371A1 (en) | 2005-01-27 |
US20070116859A1 (en) | 2007-05-24 |
CN1823393A (zh) | 2006-08-23 |
JP2005038632A (ja) | 2005-02-10 |
KR20060036455A (ko) | 2006-04-28 |
EP1662514A1 (en) | 2006-05-31 |
TW200514102A (en) | 2005-04-16 |
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