WO2004092865A3 - 選出方法、露光方法、選出装置、露光装置、並びにデバイス製造方法 - Google Patents

選出方法、露光方法、選出装置、露光装置、並びにデバイス製造方法 Download PDF

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Publication number
WO2004092865A3
WO2004092865A3 PCT/JP2004/005474 JP2004005474W WO2004092865A3 WO 2004092865 A3 WO2004092865 A3 WO 2004092865A3 JP 2004005474 W JP2004005474 W JP 2004005474W WO 2004092865 A3 WO2004092865 A3 WO 2004092865A3
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WO
WIPO (PCT)
Prior art keywords
shot areas
sub
exposure
selection
error
Prior art date
Application number
PCT/JP2004/005474
Other languages
English (en)
French (fr)
Other versions
WO2004092865A1 (ja
WO2004092865A2 (ja
Inventor
Tarou Sugihara
Ayako Sukegawa
Original Assignee
Nippon Kogaku Kk
Tarou Sugihara
Ayako Sukegawa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku Kk, Tarou Sugihara, Ayako Sukegawa filed Critical Nippon Kogaku Kk
Priority to JP2005505475A priority Critical patent/JPWO2004092865A1/ja
Publication of WO2004092865A1 publication Critical patent/WO2004092865A1/ja
Publication of WO2004092865A2 publication Critical patent/WO2004092865A2/ja
Publication of WO2004092865A3 publication Critical patent/WO2004092865A3/ja
Priority to US11/250,435 priority patent/US20060033916A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PCT/JP2004/005474 2003-04-17 2004-04-16 選出方法、露光方法、選出装置、露光装置、並びにデバイス製造方法 WO2004092865A2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005505475A JPWO2004092865A1 (ja) 2003-04-17 2004-04-16 選出方法、露光方法、選出装置、露光装置、並びにデバイス製造方法
US11/250,435 US20060033916A1 (en) 2003-04-17 2005-10-17 Selection method, exposure method, selection unit, exposure apparatus, and device manufacturing method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003112933 2003-04-17
JP2003-112933 2003-04-17

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/250,435 Continuation US20060033916A1 (en) 2003-04-17 2005-10-17 Selection method, exposure method, selection unit, exposure apparatus, and device manufacturing method

Publications (3)

Publication Number Publication Date
WO2004092865A1 WO2004092865A1 (ja) 2004-10-28
WO2004092865A2 WO2004092865A2 (ja) 2004-10-28
WO2004092865A3 true WO2004092865A3 (ja) 2004-12-29

Family

ID=33296072

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2004/005474 WO2004092865A2 (ja) 2003-04-17 2004-04-16 選出方法、露光方法、選出装置、露光装置、並びにデバイス製造方法

Country Status (4)

Country Link
US (1) US20060033916A1 (ja)
JP (1) JPWO2004092865A1 (ja)
KR (1) KR20050118309A (ja)
WO (1) WO2004092865A2 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7305634B2 (en) * 2004-11-23 2007-12-04 Lsi Corporation Method to selectively identify at risk die based on location within the reticle
JP5194800B2 (ja) * 2006-01-26 2013-05-08 株式会社ニコン 重ね合わせ管理方法及び装置、処理装置、測定装置及び露光装置、デバイス製造システム及びデバイス製造方法、並びにプログラム及び情報記録媒体
JP4789194B2 (ja) * 2006-05-01 2011-10-12 国立大学法人東京農工大学 露光装置および方法ならびにデバイス製造方法
JP2009038055A (ja) * 2007-07-31 2009-02-19 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
KR20120000846A (ko) * 2010-06-28 2012-01-04 삼성전자주식회사 웨이퍼의 정렬 방법 및 공정 모니터링 방법
JP2014222386A (ja) * 2013-05-13 2014-11-27 キヤノン株式会社 移動体配置決定方法、測定装置、加工装置、およびプログラム
US9766559B2 (en) * 2013-10-30 2017-09-19 Taiwan Semiconductor Manufacturing Co., Ltd. Edge-dominant alignment method in exposure scanner system
JP6278833B2 (ja) * 2014-05-21 2018-02-14 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
US10401735B2 (en) 2015-11-30 2019-09-03 Asml Netherlands B.V. Lithographic method and apparatus
CN116165853B (zh) * 2023-04-26 2023-09-29 长鑫存储技术有限公司 套刻误差量测方法、校准方法及半导体测试结构

Citations (7)

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JPH03153015A (ja) * 1989-11-10 1991-07-01 Nikon Corp 位置合わせ方法及び装置
JPH06232028A (ja) * 1993-02-08 1994-08-19 Nikon Corp 位置合わせ方法
JPH10303126A (ja) * 1997-02-28 1998-11-13 Nikon Corp 移動シーケンスの決定方法
JPH10312961A (ja) * 1997-03-11 1998-11-24 Nikon Corp 移動シーケンスの決定方法および位置合わせ装置
JP2001135559A (ja) * 1999-11-02 2001-05-18 Nikon Corp 位置計測方法及び露光方法
JP2001266142A (ja) * 2000-01-13 2001-09-28 Nikon Corp データ分類方法及びデータ分類装置、信号処理方法及び信号処理装置、位置検出方法及び位置検出装置、画像処理方法及び画像処理装置、露光方法及び露光装置、並びにデバイス製造方法
WO2002061505A1 (fr) * 2001-01-31 2002-08-08 Nikon Corporation Masque, procede de mesure de caracteristique optique, procede de reglage d'un appareil d'exposition, procede d'exposition et procede de fabrication du dispositif

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4780617A (en) * 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
US5561606A (en) * 1991-08-30 1996-10-01 Nikon Corporation Method for aligning shot areas on a substrate
US5525808A (en) * 1992-01-23 1996-06-11 Nikon Corporaton Alignment method and alignment apparatus with a statistic calculation using a plurality of weighted coordinate positions
JP3666051B2 (ja) * 1995-04-13 2005-06-29 株式会社ニコン 位置合わせ方法及び装置、並びに露光方法及び装置
JPH08316134A (ja) * 1995-05-24 1996-11-29 Nikon Corp 露光方法
US6885908B2 (en) * 1997-02-14 2005-04-26 Nikon Corporation Method of determining movement sequence, alignment apparatus, method and apparatus of designing optical system, and medium in which program realizing the designing method
EP1164352A4 (en) * 1999-02-17 2007-09-05 Nikon Corp POSITION DETECTION METHOD AND POSITION DETECTOR, EXPOSURE METHOD AND APPARATUS THEREFOR, DEVICE AND METHOD FOR MANUFACTURING THE SAME

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03153015A (ja) * 1989-11-10 1991-07-01 Nikon Corp 位置合わせ方法及び装置
JPH06232028A (ja) * 1993-02-08 1994-08-19 Nikon Corp 位置合わせ方法
JPH10303126A (ja) * 1997-02-28 1998-11-13 Nikon Corp 移動シーケンスの決定方法
JPH10312961A (ja) * 1997-03-11 1998-11-24 Nikon Corp 移動シーケンスの決定方法および位置合わせ装置
JP2001135559A (ja) * 1999-11-02 2001-05-18 Nikon Corp 位置計測方法及び露光方法
JP2001266142A (ja) * 2000-01-13 2001-09-28 Nikon Corp データ分類方法及びデータ分類装置、信号処理方法及び信号処理装置、位置検出方法及び位置検出装置、画像処理方法及び画像処理装置、露光方法及び露光装置、並びにデバイス製造方法
WO2002061505A1 (fr) * 2001-01-31 2002-08-08 Nikon Corporation Masque, procede de mesure de caracteristique optique, procede de reglage d'un appareil d'exposition, procede d'exposition et procede de fabrication du dispositif

Also Published As

Publication number Publication date
JPWO2004092865A1 (ja) 2006-07-06
US20060033916A1 (en) 2006-02-16
KR20050118309A (ko) 2005-12-16
WO2004092865A2 (ja) 2004-10-28

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