WO2004081130A1 - 光触媒コーティング用組成物およびコーティング膜 - Google Patents
光触媒コーティング用組成物およびコーティング膜 Download PDFInfo
- Publication number
- WO2004081130A1 WO2004081130A1 PCT/JP2004/002740 JP2004002740W WO2004081130A1 WO 2004081130 A1 WO2004081130 A1 WO 2004081130A1 JP 2004002740 W JP2004002740 W JP 2004002740W WO 2004081130 A1 WO2004081130 A1 WO 2004081130A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- group
- titanium
- carbon atoms
- photocatalyst
- coating
- Prior art date
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- 239000011248 coating agent Substances 0.000 title claims abstract description 77
- 238000000576 coating method Methods 0.000 title claims abstract description 77
- 239000011941 photocatalyst Substances 0.000 title claims abstract description 72
- 239000000203 mixture Substances 0.000 title claims abstract description 52
- 230000001699 photocatalysis Effects 0.000 claims abstract description 64
- 239000008199 coating composition Substances 0.000 claims abstract description 42
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 35
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 32
- 125000005375 organosiloxane group Chemical group 0.000 claims abstract description 30
- 150000001282 organosilanes Chemical class 0.000 claims abstract description 29
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 23
- 150000003609 titanium compounds Chemical class 0.000 claims abstract description 23
- 239000013078 crystal Substances 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 claims abstract description 16
- -1 silane compound Chemical class 0.000 claims description 120
- 239000000126 substance Substances 0.000 claims description 56
- 125000004432 carbon atom Chemical group C* 0.000 claims description 45
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- 125000000217 alkyl group Chemical group 0.000 claims description 19
- 239000003960 organic solvent Substances 0.000 claims description 18
- 229920001296 polysiloxane Polymers 0.000 claims description 17
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 15
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- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 125000000962 organic group Chemical group 0.000 claims description 15
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- 239000002184 metal Substances 0.000 claims description 13
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- 125000004429 atom Chemical group 0.000 claims description 6
- 238000006482 condensation reaction Methods 0.000 claims description 5
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- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 4
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- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 1
- WPQJZUITFQDUQP-UHFFFAOYSA-N ethoxy(dipropyl)silane Chemical compound CCC[SiH](CCC)OCC WPQJZUITFQDUQP-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229960002449 glycine Drugs 0.000 description 1
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- JEGUKCSWCFPDGT-UHFFFAOYSA-N h2o hydrate Chemical compound O.O JEGUKCSWCFPDGT-UHFFFAOYSA-N 0.000 description 1
- ILPNRWUGFSPGAA-UHFFFAOYSA-N heptane-2,4-dione Chemical compound CCCC(=O)CC(C)=O ILPNRWUGFSPGAA-UHFFFAOYSA-N 0.000 description 1
- DGCTVLNZTFDPDJ-UHFFFAOYSA-N heptane-3,5-dione Chemical compound CCC(=O)CC(=O)CC DGCTVLNZTFDPDJ-UHFFFAOYSA-N 0.000 description 1
- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229930182817 methionine Natural products 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- GJYXGIIWJFZCLN-UHFFFAOYSA-N octane-2,4-dione Chemical compound CCCCC(=O)CC(C)=O GJYXGIIWJFZCLN-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- IFJYVNTXUVQYOU-UHFFFAOYSA-J pentanoate zirconium(4+) Chemical compound [Zr+4].CCCCC([O-])=O.CCCCC([O-])=O.CCCCC([O-])=O.CCCCC([O-])=O IFJYVNTXUVQYOU-UHFFFAOYSA-J 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920005646 polycarboxylate Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- KIWATKANDHUUOB-UHFFFAOYSA-N propan-2-yl 2-hydroxypropanoate Chemical compound CC(C)OC(=O)C(C)O KIWATKANDHUUOB-UHFFFAOYSA-N 0.000 description 1
- HTQDZHOOVXXKSL-UHFFFAOYSA-L propanoate;titanium(2+) Chemical compound [Ti+2].CCC([O-])=O.CCC([O-])=O HTQDZHOOVXXKSL-UHFFFAOYSA-L 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229940032159 propylene carbonate Drugs 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- YUVZWFKROIQRKD-UHFFFAOYSA-N silane triethoxysilane Chemical compound [SiH4].CCO[SiH](OCC)OCC YUVZWFKROIQRKD-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical compound CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- RCFVAODLMSHDAW-UHFFFAOYSA-L titanium(2+);dihydroxide Chemical compound O[Ti]O RCFVAODLMSHDAW-UHFFFAOYSA-L 0.000 description 1
- CMWCOKOTCLFJOP-UHFFFAOYSA-N titanium(3+) Chemical compound [Ti+3] CMWCOKOTCLFJOP-UHFFFAOYSA-N 0.000 description 1
- 125000005425 toluyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- HUZZQXYTKNNCOU-UHFFFAOYSA-N triethyl(methoxy)silane Chemical compound CC[Si](CC)(CC)OC HUZZQXYTKNNCOU-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- JSPLKZUTYZBBKA-UHFFFAOYSA-N trioxidane Chemical compound OOO JSPLKZUTYZBBKA-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterized by the type of post-polymerisation functionalisation
- C08G2650/16—Photopolymerisation
Definitions
- the present invention relates to a photocatalytic coating composition that exhibits a photocatalytic action by visible light, and a coating film comprising the photocatalytic coating composition.
- the present inventor has previously described, as a material that exhibits a photocatalytic action under a visible light environment, (i) a material in which a part of an oxygen site of a crystal of a metal oxide such as titanium oxide is substituted with a nitrogen atom, (ii) Doping of nitrogen atoms between lattices of metal oxide crystals such as titanium oxide, and (iii) polycrystalline aggregates of metal oxide crystals such as titanium oxide having nitrogen atoms at grain boundaries At least one kind of visible light responsive photocatalytic material selected from the group consisting of: (WO 01/1052 52 and Japanese Patent Application Laid-Open Publication No. 2000-2005) Publication).
- This photocatalytic material is a semiconductor, absorbs visible light, generates electrons and holes, and has a catalytic action and a bactericidal action in various chemical reactions such as decomposition of organic substances.
- a coating material containing fine metal particles or fine metal oxide particles can be widely used by being characterized by various functions of the fine metal particles or fine metal oxide particles.
- silane-based binders are preferably used under ultraviolet irradiation, high temperature, etc. due to their superior durability compared to organic binders.
- a method for producing a silane-based coating material containing metal oxide fine particles (1) fine particles of metal or metal oxide fine particles are dispersed and dispersed in a solvent having good compatibility to form a sol state; How to mix with
- the present invention is intended to solve the problems associated with the conventional technology as described above, and has an environment in which there is little spectral component of 400 nm or less and a large amount of visible light, for example, an indoor environment or an ultraviolet cut glass.
- a metal oxide crystal for example, a photocatalyst material such as a titanium oxide crystal in which nitrogen atoms are doped between lattices, titanium having a specific structure, etc.
- Coating film obtained from a photocatalyst coating composition containing a compound, a hydrolyzate of an organosilane having a specific structure, and an organosiloxane oligomer having a specific structure Force Normal fluorescence It shows sufficient photocatalytic action and excellent transparency even in an environment with a small spectrum component of 400 nm or less, such as a room illuminated by a lamp or a car room with an ultraviolet-cut glass, and has excellent transparency. The inventors have found that the dispersion of the composition has excellent storage stability, and have completed the present invention.
- composition for photocatalyst coating according to the present invention is, the composition for photocatalyst coating according to the present invention.
- At least one visible light-responsive photocatalytic material selected from the group consisting of nitrogen atoms arranged at the grain boundaries of polycrystalline aggregates of metal oxide crystals,
- R 1 represents an organic group having 1 to 8 carbon atoms, and when two or more are present, they may be the same or different, and R 2 is an alkyl group having 1 to 6 carbon atoms, Represents an organic group selected from the group consisting of an acyl group and a phenyl group having 1 to 6 carbon atoms, and when two or more are present, they may be the same or different; May be the same or different, and m is an integer from 0 to 3) At least one titanium compound selected from the group consisting of organotitanium and derivatives thereof,
- R 3 represents a monovalent organic group having 1 to 8 carbon atoms, and when two or more are present, they may be the same or different, and R 4 has 1 to 5 carbon atoms.
- R 4 represents an alkyl group or an acyl group having 1 to 6 carbon atoms, and when two or more are present, they may be the same or different, and R 3 and R 4 may be the same or different Well, n is an integer from 0 to 3)
- At least one silane compound selected from the group consisting of organosilanes and derivatives thereof,
- R 5 and R 6 represent an alkyl group having 1 to 5 carbon atoms, which may be the same or different, and R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
- p and q are numbers such that the value of p + q is 2 to 50
- the composition for photocatalyst coating further contains a catalyst (f) for promoting a hydrolysis / condensation reaction of the silane compound (c). Further, it is preferable that a nitrogen atom in the photocatalytic substance (a) and a metal atom of the metal oxide form a chemical bond. Further, the metal oxide is preferably titanium oxide.
- the coating film according to the present invention is a coating film obtained from the photocatalyst coating composition
- the photocatalytic substance (a) is adjacent to the polytitanoxane and dispersed in the siloxane through the polytitanoxane.
- Figure 1 is a graph showing the relationship between visible light irradiation time and the amount of carbon dioxide generated.
- the photocatalyst substance (a) used in the present invention includes: (i) a metal oxide in which a part of an oxygen site is substituted with a nitrogen atom; and (ii) a nitrogen atom in a lattice of a metal oxide crystal. And (iii) at least one visible light responsive photocatalyst selected from the group consisting of polycrystalline aggregates of metal oxides and nitrogen atoms arranged at grain boundaries.
- the “visible light-responsive photocatalytic substance” means a substance that absorbs and excites visible light and exhibits a photocatalytic action.
- metal oxide examples include titanium oxide, tin oxide, zinc oxide, strontium titanate, tungsten oxide, zirconium oxide, niobium oxide, iron oxide, copper oxide, iron titanate, nickel oxide, bismuth oxide, and calcium oxide. Element. Among these, titanium oxide is particularly preferably used.
- the photocatalytic substance (a) contains a nitrogen atom in the crystal lattice of the metal oxide, and a visible light in which a chemical bond is formed between the nitrogen atom and the metal atom of the metal oxide. It is preferably a responsive photocatalytic substance.
- a chemical bond between a metal atom and a nitrogen atom for example, by forming a structure in which a part of an oxygen site of a crystal of a metal oxide is replaced with nitrogen, the crystal structure becomes more stable, Photocatalytic performance is also stable for a longer period.
- the photocatalytic substance ( a ) may be a powder, an aqueous sol or colloid dispersed in water, or an organic solvent sol or colloid dispersed in a polar solvent such as alcohol or a non-polar solvent such as toluene. And the like.
- a polar solvent such as alcohol or a non-polar solvent such as toluene.
- the surface of the substance (a) may be treated before use.
- the primary particle diameter of the photocatalytic substance (a) is preferably not more than 200 nm, more preferably not more than 100 nm. If the primary particle size exceeds the above range, the transparency of the coating film may be reduced.
- Such a photocatalytic substance (a), for example, a photocatalytic substance (a) using titanium oxide as a metal oxide can be produced by any of the following methods.
- (I) A method of heat treating titanium oxide or hydrated titanium oxide in an atmosphere containing at least one gas selected from the group consisting of ammonia gas, nitrogen gas, and a mixed gas of nitrogen gas and hydrogen gas.
- (II) A method of heat-treating a titanium alkoxide solution in an atmosphere containing at least one gas selected from the group consisting of ammonia gas, nitrogen gas, and a mixed gas of nitrogen gas and hydrogen gas.
- (V) A method in which a titanium nitride crystal or a titanium oxynitride crystal is subjected to heat treatment or plasma treatment in an oxidizing atmosphere containing oxygen, ozone, water molecules, or a compound containing a hydroxyl group.
- the photocatalytic substance (a) using at least one compound selected from the group consisting of tungsten oxide, zirconium oxide, niobium oxide, iron oxide, copper oxide, iron titanate, nickel oxide, bismuth oxide and silicon oxide is It can be produced using a metal oxide, a hydroxide or alkoxide of each metal, or a metal salt.
- the photocatalytic substance (a) is contained in the composition for photocatalytic coating in an amount of 1% to 90% by weight, preferably 15 to 85% by weight, more preferably 2% by weight, based on the total solid content of the composition. Desirably, it is contained in an amount of 5 to 80% by weight.
- the photocatalytic action may not be exhibited. Chalking and the like may occur, resulting in poor film-forming properties.
- the titanium compound (b) used in the present invention has the following formula (1)
- R 1 represents an organic group having 1 to 8 carbon atoms, and when two or more are present, they may be the same or different, and R 2 is an alkyl group having 1 to 6 carbon atoms, Represents an organic group selected from the group consisting of an acyl group and a phenyl group having 1 to 6 carbon atoms. When two or more are present, they may be the same or different, and R 1 and R 2 are May be the same or different, m is an integer from 0 to 3)
- organotitanium or derivatives thereof examples include titanium alcoholate, titanium acylate and derivatives thereof.
- the derivative of titanium alcoholate include a hydrolyzate of the titanium alcoholate, a condensate of the titanium alcoholate, a chelate compound of the titanium alcoholate, Examples include a hydrolyzate of a chelate compound of titanium alcoholate and a condensate of the chelate compound of titanium alcoholate.
- titanium acylate derivative examples include a hydrolyzate of the titanium acylate, a condensate of the titanium acylate, a chelate compound of the titanium acylate, and a chelate compound of the titanium acylate.
- examples include a hydrolyzate and a condensate of the above-mentioned chelate compound of titanium acylate.
- R 1 is an organic group having 18 carbon atoms. Specifically, methyl, ethyl, n-propyl, i-propyl, n-butyl, sec-butyl Alkyl groups such as a group, t_butyl group, n-pentyl group, n-xyl group, n-heptyl group, n-octyl group and 2-ethylhexyl group;
- Acyl groups such as formyl group, acetyl group, propionyl group, butyryl group, norryl group, benzoyl group, trioil group and caproyl group;
- Examples include a bier group, an aryl group, a cyclohexyl group, a phenyl group, an epoxy group, a glycidyl group, a (meth) acryloxy group, a peridode group, an amide group, a fluoroacetamide group, and an isocyanate group.
- R 1 includes a substituted derivative of the above organic group.
- substituent of the substituted derivative of R 1 include a halogen atom, a substituted or unsubstituted amino group, a hydroxyl group, a mercapto group, an isocyanato group, a glycidoxy group, a 3,4-epoxycyclohexyl group, ) Acryloxy group, peridode group, ammonium base and the like.
- the number of carbon atoms of R 1 composed of these substituted derivatives is preferably 8 or less, including the carbon atoms in the substituent.
- R 1 When a plurality of R 1 are present in the formula (1), they may be the same or different.
- R 2 which is an alkyl group having 16 carbon atoms, for example, a methyl group, Butyl, n-propyl, i-propyl, n-butyl, i-butyl, sec_butyl, t-butyl, n-hexynole, n-heptyl, n-octyl And 2-ethylhexyl groups.
- R 2 carbon atoms from 1 to 6 Ashiru group, a formyl group, Asechi group, a propionyl group, Puchiriru group, Bruno Reriru group, Benzoiru group, Torioiru group, such as a force Puroiru group.
- R 2 When a plurality of R 2 are present in the formula (1), they may be the same or different.
- the chelate compound of titanium alcoholate is obtained from the above-mentioned titanium alcoholate, ⁇ -diketones, ketoesters, hydroxycarboxylic acid, hydroxycarbonate, hydroxycarboxylate, ketoalcohol and aminoalcohol.
- the compound can be obtained by reacting with at least one compound selected from the group consisting of (hereinafter, also referred to as a chelating agent).
- the chelate compound of titanium acylate can be obtained by reacting the titanium acylate with the chelating agent.
- these chelating agents ⁇ -diketones or i3-ketoesters are preferably used.
- acetyl aceton methyl acetoacetate, ethyl acetoacetate, acetoacetic acid-n-propyl pill, acetoacetic acid i-propyl, acetoacetic acid n-butyl, acetoacetic acid 1 sec-butynole, acetoacetic acid — T-butynole, 2,4-hexanedione, 2,4-heptanedion, 3,5-heptanedion, 2,4-octanedione, 2,4-nonanedione, 5-methane ⁇ -hexanedione, etc. Is used.
- Titanium alcoholate As a chelate compound of titanium alcoholate, specifically, tetra-i-propoxytitanium, tetra-n-butoxytitanium Gum, tetra-t-toxytitanium, g-I-propoxy 'bis (ethynoleacetate acetate) titanium, g-i-propoxy' bis (acetyl acetate) titanium, g-i-propoxy 'bis (latate titanium), g-i Bis (acetylacetate) titanium, di-n-butoxy.bis (triethanolaminate) titanium, di-n-butoxy-bis (acetylacetonato) titanium, tetrakis (2-ethylhexanol) Oxy) titanium and the like.
- tetra-i-propoxytitanium tetra-n-butoxytitanium, tetra-t-butoxytitanium, g-i-propoxy'bis (a-cetylacetonato) titanium, di-n-butoxy-bis (acetylacetonate) Titanium is preferred.
- titanium acylate and a chelate compound of titanium acylate examples include dihydroxy-titanium dibutylate, di-i-propoxy-titanium diacetate, and bis (acetyl acetatetonate) Tate, bis (a-cetylacetonate) ⁇ titanium dipropionate, di-i-propoxy.titanium dipropionate, di-i-propoxy-titanium dimallo-niate, di-i-epoxy pox -titanium dibenzoylate, di-i Examples include n-butoxy dinoconomyl acetate, di-i-propylaluminum monomaloniate. Of these, dihydroxy'titanium dibutyrate and G i-propoxy'titanium acetate are preferred.
- the hydrolyzate of titanium alcoholate, the hydrolyzate of a chelate compound of titanium alcoholate, the hydrolyzate of titanium acylate, or the hydrolyzate of a chelate compound of titanium acylate is titanium alcoholate or titanium anionate.
- rate may be at least one free Murrell OR 2 groups long been hydrolyzed, for example, with one Those ⁇ R 2 groups are hydrolyzed, those two or more OR 2 group is hydrolyzed, or may be a mixture thereof.
- Titanium alcoholate condensate, titanium anolecolate chelate compound condensate, titanium acylate condensate, and titanium acylate chelate compound condensate are titanium alcoholate and titanium alcoholate, respectively.
- the Ti-OH group in the hydrolyzate formed by the hydrolysis of the chelate compound of titanium, titanium acylate, and the chelate compound of titanium acylate is condensed to form a Ti-0-Ti bond. It was done.
- the condensate may be a condensate of a small part of the Ti-OH groups or a large part (including all) of the Ti-OH groups. Also included are those obtained by condensation of i-OH groups, and mixtures of condensates in which T i — ⁇ R groups and T i-OH groups are mixed.
- the titanium compound (b) is more preferably used as the condensate in order to control the reactivity and suppress gelation, and the degree of condensation of the condensate is from 10 to 10%.
- Mers are particularly preferred.
- the condensate is a titanium compound or a mixture of two or more titanium compounds selected from the group consisting of titanium alcoholate, a chelate compound of titanium alcoholate, titanium acylate, and a chelate compound of titanium acylate. May be used in advance by hydrolysis and condensation, or a commercially available condensate may be used.
- the condensate of titanium alcoholate or titanium acylate may be used as it is, or a product obtained by hydrolyzing a part or all of the OR 2 group contained in the condensate, or the above-described chelate of the condensate. It may be used as a condensate of a chelate compound of titanium alcoholate or titanium acylate obtained by reacting with an agent.
- Such a titanium compound (b) may be used alone or as a mixture of two or more.
- the amount of the titanium compound (b) used in the present invention is 1 to 50 parts by weight, preferably 2 to 45 parts by weight, in terms of a completely hydrolyzed condensate, based on 100 parts by weight of the solid content of the photocatalytic substance (a). More preferably, it is 3 to 40 parts by weight.
- the completely hydrolyzed condensate is defined as T i -OH group in which the OR 2 group in the formula (1) is hydrolyzed by 100% and further T i -OH group is completely condensed to T i -OH group.
- T i -OH group in which the OR 2 group in the formula (1) is hydrolyzed by 100% and further T i -OH group is completely condensed to T i -OH group.
- One is the one that forms an O-Ti structure.
- titanium compounds (b) are considered to have an effect of adsorbing and binding to the surface of the photocatalyst substance (a) to reduce the dispersed particle diameter of the photocatalyst substance (a) and to enhance the dispersibility.
- silane compound (c) used in the present invention has the following formula (2)
- R 3 represents a monovalent organic group having 1 to 8 carbon atoms, and when two or more are present, they may be the same or different, and R 4 has 1 to 5 carbon atoms.
- R 4 represents an alkyl group or an acyl group having 1 to 6 carbon atoms, and when two or more are present, they may be the same or different, and R 3 and R 4 may be the same or different Well, n is an integer from 0 to 3)
- organosilane (2) At least one silane compound selected from the group consisting of organosilane (hereinafter, referred to as “organosilane (2)”) and a derivative thereof.
- organosilane (2) examples include a hydrolyzate of the organosilane (2) and a condensate of the organosilane (2).
- the silane compound (c) used in the present invention is at least one silane compound selected from the group consisting of an organosilane (2), a hydrolyzate of the organosilane (2), and a condensate of the organosilane (2).
- Only one silane compound may be used, two arbitrary silane compounds may be mixed and used, or all three silane compounds may be used. Compounds may be used as a mixture.
- R 3 is a monovalent organic group having 1 to 8 carbon atoms, and specifically, a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group Alkyl groups such as i-butynole, sec-butynole, t-butynole, n-hexynole, n-heptyl, n-octyl, and 2-ethylhexyl; formyl, acetyl, propionyl , Butyryl, valeryl, benzoyl, trioil, caproyl and other acyl groups;
- Examples include a butyl group, an aryl group, a cyclohexyl group, a phenyl group, an epoxy group, a glycidyl group, a (meth) acryloxy group, a perido group, an amide group, a fluoroacetamide group, and an isocyanate group.
- R 3 includes a substituted derivative of the above organic group.
- substituent of the substituted derivative of R 3 include a halogen atom, a substituted or unsubstituted amino group, a hydroxyl group, a mercapto group, an isocyanato group, a glycidoxy group, a 3,4-epoxycyclohexyl group, ) Acryloxy group, peridode group, ammonium base and the like.
- the number of carbon atoms of R 3 composed of these substituted derivatives is preferably 8 or less including the carbon atoms in the substituent.
- R 3 When a plurality of R 3 are present in the formula (2), they may be the same or different.
- R 4 having an alkyl group having 1 to 5 carbon atoms for example, a methyl group, Butyl, n-propyl, i-propyl, n-butyl, sec-butyl, t-butyl, n-pentyl, and the like.
- a formyl group, an acetyl group, a propionyl group, a petyryl group, a valeryl group, a propyl group and the like can be used.
- R 2 a carbon number of 1-6 Ashiru groups include Ashiru group having 1 to 6 carbons described in (b) a titanium compound.
- R 4 When a plurality of R 4 are present in the formula (2), they may be the same or different.
- organosilane (2) examples include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, and tetra-n-butoxysilane;
- Totrilia alloxycoxy sisi silananes and didia allyl oxy xixissilananes are likely to be favorable, and more favorable.
- didialarcocoxoxysicilsilanes didimethytiryldidimetotoxoxysicilalane, and didimethitylludijetetoxysicilsilanane are desirable. .
- Oorurugaganonoshishiraran ((22)) used in the present invention is obtained by converting the above-mentioned oirurugaganoshinoshishiraran ((22))
- 11 kinds of species can be used alone, or more than 22 kinds can be mixed and used.
- the resulting cocoa coating film can be obtained. It can be softened and softened to improve and improve the resistance to Aaruluka kairi. .
- oorrugaganonossilalane ((22)) is used as it is.
- the hydrolyzed hydrolyzate and / or the remaining or condensed condensate of oorrugaganonossilalane ((22)) may be used. You can use it here and there. .
- the hydrolyzed hydrolyzate of Ooruruganaganoshishiranane ((22)) is contained in Ooruruganaganoshishiranane ((22)). It would be good if at least 11 of the OO RR 44 groups had been hydrolyzed and hydrolyzed.
- the condensed condensate of Ooruruganaganoshishiranane ((22)) is produced by the hydrolysis of Oorurugaganonoshishiranane ((22)) by hydrolysis and hydrolysis.
- the condensate includes those in which a small amount of silanol groups are condensed, those in which most (including all) silanol groups are condensed, and those mixtures thereof.
- Such a hydrolyzate Z or a condensate of the organosilane (2) can be produced by previously hydrolyzing and condensing the organosilane (2).
- the organosilane (2) is hydrolyzed and condensed with water to prepare a hydrolyzate and / or condensate of the organosilane (2).
- This water may be added independently, or water contained in a photocatalytic substance (a) or water (e) described later or an organic solvent may be used.
- the amount of the water is usually 0.5 to 3 mol, preferably 0.7 to 2 mol, per 1 mol of the organosilane (2).
- Such a condensate of organosilane (2) has a weight-average molecular weight in terms of polystyrene (hereinafter, referred to as “Mw”) force S, preferably from 300 to: L 0,000, more preferably 5 A condensate of 00 to 50,000 is used.
- Mw weight-average molecular weight in terms of polystyrene
- the above silane compound may be prepared, or a commercially available silane compound may be used.
- Commercially available silane compounds include MK C silicate manufactured by Mitsubishi Chemical Corporation, ethyl silicate manufactured by Colcoat, silicone resin manufactured by Toray 'Dauco Inging' Silicone, and GE Toshiba Silicone. Silicone resin manufactured by Shin-Etsu Chemical Co., Ltd .; silicone resin manufactured by Shin-Etsu Chemical Co., Ltd .; hydroxyl-containing polydimethylsiloxane manufactured by Dow Koung 'Asia Co., Ltd .; and silicone oligomer manufactured by Nippon Carr Co., Ltd. . These commercially available silane compounds may be used as they are or may be used after condensation.
- Such a silane compound (c) may be used alone or in combination of two or more.
- the silane compound (c) is preferably 5% by weight or more in terms of a completely hydrolyzed condensate, based on the solid content of the composition obtained by removing the photocatalytic substance (a) from the E composition for photocatalytic coating. Is 10% by weight or more, more preferably 20% by weight. It is desirable to use in an amount of / 0 or more.
- the completely hydrolyzed condensate means that the OR 4 group in the formula (2) is hydrolyzed 100% to form a Si—OH group, and the Si—OH group is completely condensed to form a siloxane structure. Means what you do. When the content of the silane compound (c) is less than the above lower limit, the formed coating film is brittle, and chalking or the like may occur.
- the organosiloxane oligomer (d) used in the present invention has a Si—o bond, has a weight average molecular weight of 300 to 100,000, and has the following formula (3)
- R 5 and R 6 each independently represent an alkyl group having 1 to 5 carbon atoms
- R 7 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms
- p and q represent Each is independently a number such that the value of p + q is between 2 and 50
- Examples of the functional group represented by the above formula (3) include a polyoxyalkylene group such as a polyoxyethylene group, a polyoxypropylene group, and a poly (oxyethylene / oxypropylene) group.
- a polyoxyalkylene group such as a polyoxyethylene group, a polyoxypropylene group, and a poly (oxyethylene / oxypropylene) group.
- a hydroxyl group, a halogen atom In the main chain of the organosiloxane oligomer (d), a hydroxyl group, a halogen atom, Alternatively, a functional group containing an organic group having 1 to 15 carbon atoms may be substituted.
- halogen atom examples include fluorine and chlorine.
- Examples of the organic group having 1 to 15 carbon atoms include an alkyl group, an acyl group, an alkoxyl group, an alkoxysilyl group, a butyl group, an aryl group, an acetoxyl group, an acetyloxysilyl group, a cycloalkyl group, a phenyl group, and a glycidyl group.
- (Meth) Acryloxy group, perido group, amide group, fluoroacetamide group, isocyanate group and the like.
- alkyl group having 1 to 15 carbon atoms examples include a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, a sec-butyl group, a t-butyl group, and an n-alkyl group.
- Examples of the acryl group having 1 to 15 carbon atoms include formyl group, acetyl group, propionyl group, butyryl group, valeryl group, benzoyl group, and toluoyl group.
- alkoxyl group having 1 to 15 carbon atoms examples include a methoxy group, an ethoxy group, a propoxy group and a butoxy group.
- alkoxysilyl group having 1 to 15 carbon atoms examples include a methoxysilyl group, an ethoxysilyl group, a propoxysilyl group, and a butoxysilyl group. These groups may be partially hydrolyzed or condensed, or may be substituted derivatives.
- substituent of the substituted derivative include a halogen atom, a substituted or unsubstituted amino group, a hydroxyl group, a mercapto group, an isocyanate group, a glycidoxy group, a 3,4-epoxycyclohexyl group, and a (meth) acryloxy group.
- organosiloxane oligomers (d) containing a structure in which the silicon atom of a silyl group is bonded to a hydrolyzable group and z or a hydroxyl group are particularly preferably used, for example, a condensate of chlorosilane or an alkoxysilane. Condensates are used.
- Such an organosiloxane oligomer (d) is fixed by co-condensing with the titanium compound (b) and the silane compound (c) when the photocatalyst coating composition according to the present invention is cured. A stable coating film can be obtained.
- the weight average molecular weight (hereinafter also referred to as “Mw”) of the organosiloxane oligomer (d) in terms of polystyrene is from 300 to 100,000, preferably from 600 to 50,000. If the weight average molecular weight is less than the above lower limit, the obtained coating film may not have sufficient flexibility, and if it exceeds the above upper limit, the obtained coating composition may not have sufficient storage stability. There is.
- the organosiloxane oligomer (d) may be used alone or in combination of two or more.
- a mixture of two or more organosiloxane oligomers (d), a mixture of an organosiloxane oligomer having an Mw of 400 to 2,800 and an organosiloxane xanoligomer having an Mw of 3,000 to 50,000, or a different functional group A mixture of two types of organosiloxane oligomers having the following formula:
- organosiloxane oligomer in the present invention, a commercially available organosiloxane oligomer can be used as the organosiloxane oligomer (d).
- modified silicone oil manufactured by Toray * Dow Corning Silicone Co., Ltd., GE Toshiba Silicone Co., Ltd.
- Modified silicone oil manufactured by Shin-Etsu Chemical Co., Ltd. modified silicone oligomer manufactured by Shin-Etsu Chemical Co., Ltd. It is.
- organosiloxane oligomers may be used as they are, or may be used after condensation.
- the amount of the organosiloxane oligomer (d) used in the present invention is 1 to 200 parts by weight, preferably 5 to 100 parts by weight, based on 100 parts by weight of the solid content of the photocatalyst substance (a). More preferably, the amount is 10 to 80 parts by weight. If the amount of the organosiloxane oligomer (d) is less than the above lower limit, sufficient dispersion stability may not be obtained. If the amount exceeds the above upper limit, the formed coating film may be brittle and cause choking or the like. There is.
- the photocatalytic coating composition according to the present invention contains (e) water Z or an organic solvent.
- organic solvent known organic solvents can be used, and examples thereof include alcohols, aromatic hydrocarbons, ethers, ketones, and esters.
- alcohols such as methanol, ethanol, n-propynole alcohol, i-propyl alcohol, n-butynoleanol, sec-butynoleanol, t-butynoleanol, n —Hexyl alcohol, n-octanolanore, ethylene glycol, diethyleneglycore, triethylene glycol, ethylene glycol, monobutylinoleate, ethyleneglycorele monoethylene Acetate, diethylene glycolone monoethylenoate ether, propylene glycolone monomethyl ether, propylene monomethyl ethereal acetate, diacetone alcohol, and the like,
- aromatic hydrocarbons include benzene, toluene, xylene and the like.
- ethers include tetrahydrofuran and dioxane.
- ketones include acetone, methylethylketone, methylisobutylketone, and the like. Diisobutyl ketone and the like,
- esters include ethyl acetate, propyl acetate, butyl acetate, propylene carbonate, methyl lactate, ethyl lactate, normal propyl lactate, isopropyl lactate, methyl 3-ethoxypropionate, and ethyl 3-ethoxypropionate.
- organic solvents may be used alone or in combination of two or more.
- the photocatalyst coating composition according to the present invention preferably further contains a catalyst (f) for promoting the hydrolysis / condensation reaction of the silane compound (c).
- a catalyst (f) for promoting the hydrolysis / condensation reaction of the silane compound (c) examples include an acidic compound, an alkaline compound, a salt compound, an amine compound, an organometallic compound or a partial hydrolyzate thereof (hereinafter referred to as an organic metal compound and a Z compound). Or the partial hydrolysates thereof are collectively referred to as “organometallic compounds”).
- the acidic compound examples include acetic acid, hydrochloric acid, sulfuric acid, phosphoric acid, alkyl titanic acid, monotoluenesulfonic acid, and phthalic acid. Of these, acetic acid is preferable.
- Examples of the above-mentioned alkaline compound include sodium hydroxide and hydroxide hydroxide. Of these, sodium hydroxide is preferable.
- the salt compound examples include alkali metal salts such as naphthenic acid, octylic acid, nitrous acid, sulfurous acid, aluminate, and carbonic acid.
- Examples of the amine compound include ethylenediamine, hexamethylenediamine, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, piperidine, piperazine, m-phenylenediamine, and p-feyure.
- modified amines used as curing agents for epoxy resins can be used. Of these, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, and 3- (2-aminoethyl) aminopropyltrimethoxysilane are preferred. '
- organometallic compounds for example, the following formula (4)
- M represents at least one metal atom selected from the group consisting of zirconium, titanium, and aluminum; R s and R 9 is each independently ethyl, n-propyl, i-propyl, butyl, sec-butyl, t-butynole, n-pentynole, n-hexyl, cyclohexyl, Represents a monovalent hydrocarbon group having 1 to 6 carbon atoms such as a ball group, and R 1 Q represents the monovalent hydrocarbon group having 1 to 6 carbon atoms, or a methoxy group or an ethoxy group.
- organic compound (4) J (Hereinafter referred to as “organometallic compound (4) J)”,
- organometallic compound of tin hereinafter, referred to as an "organotin compound"
- organotin compound a partial hydrolyzate of these compounds
- titanium compound (b) can be used as the organometallic compounds.
- organometallic compound (4) examples include, for example, tetra-n-butoxyzinoleconium, tree n-butoxyethylacetoacetate zirconium, di-n-butoxy'bis (ethylacetoacetate) zirconium, n- Butoxy 'tris (ethyl acetate) zirconium, tetrakis (n-propyl acetate) zirconium, tetrakis (acetyl acetate acetate) zirconium, tetrakis (ethyl acetate acetate) zirconium, etc. ;
- Organic titanium compounds such as tetra-i-propoxy-titanium, di-i-propoxy-bis (ethyl acetate acetate) titanium, g-i-propoxy bis (acetyl acetate) titanium, and g-i-propoxy bis (acetyl acetate) titanium;
- organometallic compounds (4) and their partial hydrolysates tri- ⁇ -butoxy 'ethylacetoacetate zirconium, g-i-propoxy' (Acetyl acetate) Titanium, G i-propoxy 'ethylinoacetate aluminum aluminum, Tris (ethyl acetate acetate) aluminum, or a partial hydrolyzate thereof is preferably used.
- organic tin compounds for example, (C 4 H 9 ) 2 Sn (OC ⁇ C u H 23 ) 2 ,
- Organo-tin compounds such as (C 4 H 9 ) S n (OCON a) 3 ;
- Mercaptide-type organotin compounds such as;
- Sulfide-type organotin compounds such as;
- Chloride-type organotin compounds such as (C 4 H 9 ) 2 SnC 1;
- Such a catalyst (f) may be used alone or as a mixture of two or more, or may be used as a mixture with a zinc compound or another reaction retarder.
- the catalyst (f) may be blended in the step of preparing the photocatalyst coating composition according to the present invention, or may be blended in the photocatalyst coating composition in the step of forming a coating film. You may mix
- the amount of the catalyst (f) used in the present invention is usually 10 mol or less, preferably 0.001 to 7 mol, more preferably 1 mol, per 1 mol of OR 4 group contained in the silane compound (c). 0.001 to 5 mol is desirable.
- the amount of the catalyst (f) exceeds the above upper limit, the storage stability of the photocatalyst coating composition may be reduced, or cracks may be generated in the coating film.
- the catalyst (f) promotes a hydrolysis-condensation reaction such as a silane compound (c) and an organosiloxane oligomer (d). Therefore, by using the catalyst (f), for example, the molecular weight of the polysiloxane resin produced by the polycondensation reaction of the organosiloxane oligomer (d) is increased, and the curing speed of the obtained coating film is improved and the strength is improved. It is possible to obtain a coating film that is excellent in durability and durability, and it is possible to increase the thickness of the coating film, thereby facilitating the painting operation.
- Stability improver :
- composition for photocatalyst coating according to the present invention can contain a stability improver (g) as necessary.
- the stability improver (g) used in the present invention has the following formula (5)
- R 11 is an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a sec-butynole group, a t-butynole group, an n-pentynole group, an n-hexynole group, a cyclohexyl
- R 12 represents a monovalent hydrocarbon group having 1 to 6 carbon atoms, or a methoxy group or an ethoxy group.
- a stability improver (g) examples include, for example, acetyl acetone, methyl acetoacetate, ethyl acetoacetate, acetoacetic acid ⁇ -propyl, acetoacetic acid i-propinole, acetoacetic acid n-butynole, acetoacetic acid acetic acid sec-butyl, mono-tert-butyl acetate, hexane-1,2 dione, heptane 1,2,4 dione, heptane 1,3,5-dione, octane 1,2,4 dione, nonane 1,2,4 dione, 5-Methylhexane mono 2,4-dione, malonic acid, oxalic acid, phthalic acid, glycolic acid, salicylic acid, aminoacetic acid, iminoacetic acid, ethylenediaminetetraacetic acid, glyconole, catechol, ethylenediamine, 2,2-bivir
- Such a stability improver (g) is particularly preferably used when an organometallic compound is used as the titanium compound (b) or the catalyst (f).
- the stability improver (g) may be used alone or as a mixture of two or more.
- the stability improver (g) coordinates to the metal atom of the organometallic compound, and this coordination is caused by the silane compound (c) and the organosiloxane oligomer (d). It is considered that the accelerating action of the organometallic compound on the co-condensation reaction can be appropriately adjusted, and the storage stability of the obtained photocatalyst coating composition can be further improved.
- the amount of the stability improver (g) used in the present invention is usually at least 2 moles, preferably at least 3 to 20 moles, per mole of the organic metal compound of the organometallic compound. . If the amount of the stability improver (g) is less than the above lower limit, the effect of improving the storage stability of the obtained composition may be insufficient in a composition for photocatalytic coating having a high solid content.
- composition for photocatalyst coating according to the present invention, if necessary,
- dehydrating agents such as methyl orthoformate, methyl orthoacetate and tetraethoxysilane
- Polyoxyethylene alkyl ether polyoxyethylene alkyl phenyl ether, polyoxyethylene fatty acid ester, polycarboxylic acid type polymer surfactant, polycarboxylate, polyphosphate, polyatarylate, polyamide ester salt, polyethylene Dispersants such as glycol
- a leveling agent can be blended.
- Such leveling agents include, for example, BM100 (trade name, hereinafter the same) of BM-CHEMIE, BM100; F72 of F-Chemicals, Kuroeisha Chemical Co., Ltd.'s Floren series; Sumitomo 3LM Co., Ltd.'s FC series; Toho Chemical Co., Ltd.'s Fluoral TF series, etc .;
- the finished appearance of the coating film can be improved and a uniform thin film can be prepared.
- the repelling agent is used in an amount of preferably 0.01 to 5% by weight, more preferably 0.02 to 3% by weight, based on the total composition.
- the method for blending the leveling agent may be blended in the step of preparing the photocatalyst coating composition according to the present invention, or may be blended in the photocatalyst coating composition in the step of forming a coating film, Furthermore, it may be blended in both the step of preparing the composition for photocatalytic coating and the step of forming the coating film.
- the production method of the photocatalyst coating composition according to the present invention comprises at least a photocatalytic substance (a), a titanium compound (b) and an organosiloxane oligomer (d).
- a method of hydrolyzing and condensing the silane compound (c) in the presence is preferred. Specifically, the following method can be used.
- the components (b) to (f) may be added all at once or sequentially.
- components having low compatibility with the photocatalyst substance (a) are preferably added sequentially.
- batch addition means that one kind of component is added at a time
- simultaneous addition means that one kind of component is added over an arbitrary time.
- components (b) to (f) may be added all at once, but the compatibility with the photocatalytic substance is taken into account. Then, each component may be added independently.
- Examples of the dispersing machine used in the production method (1) include an ultrasonic dispersing machine, a Beaus-Nore mill, a sand mill (beads mill), a homogenizer, an ultrasonic homogenizer, a nanomizer, a propeller mixer, and a high shear mixer.
- the total solid content in the photocatalyst coating composition according to the present invention is usually 1 to 5 0 weight. / o, preferably 3 to 40% by weight. If the total solid content exceeds the above upper limit, the storage stability may decrease.
- the photocatalyst coating composition according to the present invention can be usually further appropriately prepared according to the purpose of use. be able to.
- the coating film according to the present invention can be formed by, for example, forming the photocatalyst coating composition on the following substrate.
- the base material examples include metals such as iron, aluminum, and stainless steel; cement, concrete, lightweight concrete (ALC), flexible boards, mortar, slate, gypsum, ceramics, bricks, and other inorganic ceramic materials; phenolic resins, epoxy resins Plastic molded products such as acrylic resin, polyester, polycarbonate, polyethylene, polypropylene, ABS resin (acrylonitrile-tagene-styrene resin), thermoplastic norbornene resin;
- Examples include inorganic materials such as silicon wafers, quartz glass, and glass, as well as wood, paper, and nonwoven fabric.
- These substrates may be subjected to a surface treatment in advance for the purpose of adjusting the base, improving the adhesion, filling the porous substrate, smoothing, and patterning. Polishing, degreasing, plating, chromating, flame treatment, coupling, etc.
- blast treatment As a surface treatment for plastic base materials, blast treatment, chemical treatment, degreasing, flame treatment, oxidation treatment, steam treatment, corona discharge treatment, ultraviolet irradiation treatment, plasma treatment, ion treatment, etc .;
- the method of forming a coating film according to the present invention includes, for example, a method of forming a film of the composition for photocatalyst coating on a substrate and then drying the coating film.
- a method of forming the photocatalyst coating composition on a substrate for example, a hair coater, a rhono recorder, a bar coater, a flow coater, a centrifugal coater, an ultrasonic coater, a (micro) gravure coater and the like are used. Dip coating; Flow coating; Spray; Screen process; Electrodeposition; After forming the photocatalyst coating composition on a substrate by these methods, the film is dried at room temperature or by heating at a temperature of about 30 to 200 ° C.
- the dry film thickness is about 0.05 to 20 ⁇ in the case of single coating, and the dry film thickness is 0.1 to 40 in the case of double coating.
- a coating film of about ⁇ m can be formed.
- the coating film according to the present invention comprises the photocatalytic substance (a), and a polytitanoxa. And polysiloxane.
- This polytitanoxane is presumed to be derived from the titanium compound (b).
- the polysiloxane is considered to be derived from the silane compound (c) and / or the organosiloxane oligomer (d).
- the photocatalytic substance (a) is dispersed in the polysiloxane adjacent to the polytitanoxane and via the polytitanoxane. It is considered that the photocatalytic substance (a) has an effect of reducing the dispersed particle diameter of the photocatalytic substance (a) and an effect of increasing dispersibility by binding to the polysiloxane through the polytitanoxane. Further, the polysiloxane has a function of stabilizing the coating film.
- polytitanoxane is generally used in an amount of 1 to 50 parts by weight, preferably 2 to 45 parts by weight, more preferably 3 to 100 parts by weight of the solid content of the photocatalytic substance (a). It is desirable to contain ⁇ 40 parts by weight. If the content of the polytitanoxane is less than the above lower limit, bond stability and dispersibility may be poor, and if the content exceeds the above upper limit, the photocatalytic function with visible light may be impaired. Further, it is desirable that the polysiloxane is contained in the coating film in an amount of usually 1 to 200 parts by weight, preferably 5 to 100 parts by weight, more preferably 10 to 80 parts by weight. . If the polysiloxane content is less than the above lower limit, sufficient dispersion stability may not be obtained, and if it exceeds the above upper limit, the formed coating film may be brittle and cause chalking or the like.
- the composition for photocatalyst coating was sealed in a polyethylene bottle at room temperature for one month, and the presence or absence of gelation was visually determined. Viscosity of the non-gelled product was measured using a BM type viscometer manufactured by Tokyo Keiki Co., Ltd. The storage stability of the photocatalyst coating composition was evaluated according to the following criteria.
- the photocatalyst coating composition was diluted with i-propyl alcohol to a solid concentration of 5%, and applied onto quartz glass using a ROD.NO.3 bar coater to a dry film thickness of 0.2 m. After that, it was dried at 150 ° C for 1 hour.
- the total light transmittance of the coating film was measured using a haze tester (haze-gard plus illuminant CIE-C) manufactured by Gardner.
- the transparency of the coating film was evaluated according to the following criteria.
- composition for photocatalyst coating was coated on a nonwoven fabric.
- This nonwoven fabric was placed in a glass container having a volume of 1 liter, and acetoaldehyde was introduced at 6 OO ppm.
- Fluorescent lamp FL 10N, manufactured by Matsushita Electric Industrial Co., Ltd.
- SC42 manufactured by Fuji Photo Film Co., Ltd.
- UV light 410 nm or less
- acetaldehyde at a temperature of 25 ° C. was decomposed.
- the concentration of carbon dioxide generated by the decomposition of acetoaldehyde was measured by gas chromatography with a metanizer (manufactured by Shimadzu Corporation, trade name: GC-14B, MTN-1).
- Tianium oxide powder with a next particle size of 7 nm (ST 01, manufactured by Ishihara Sangyo Co., Ltd.) is heat-treated at 600 ° C. in an atmosphere containing ammonia to obtain a visible light responsive photocatalyst powder A (1 Secondary particle diameter of 19 nm).
- a mixture of titanium oxide powder (ST01, manufactured by Ishihara Sangyo Co., Ltd.) with a primary particle size of 7 nm and urea adsorbed on titanium oxide at room temperature is heated at a temperature in the range of 250-350 ° C.
- a visible light responsive photocatalyst powder B was produced.
- Photocatalytic coating composition B having a solid content of about 20% in the same manner as in Example 1 except that 60 parts of visible light responsive photocatalyst powder B prepared in Synthesis Example 2 was used as photocatalytic substance (a). Got.
- the composition B obtained had a storage stability of “A” and a transparency of “AJ”.
- photocatalyst substance (a) 60 parts
- silane compound (c) as methinoretrimethoxysilane 200 parts
- organosiloxane oligomer (d) as MAC-2101 41 parts
- 44 parts of i-propyl alcohol as an organic solvent (e) were added, and 300 parts of zircon beads having a particle diameter of 0.3 mm were added, and the mixture was stirred and dispersed at 1500 rpm for 1 hour using a bead mill. . Thereafter, 545 parts of i-propyl alcohol was added as an organic solvent (e), and beads were removed.
- the present invention shows a sufficient photocatalytic action even in an environment having a small spectral component of 400 nm or less and a large amount of visible light, for example, in an indoor environment or a vehicle interior having ultraviolet light glass, and has high transparency.
- An excellent coating film can be obtained, and a composition for photocatalyst coating having excellent storage stability of a dispersion can be obtained. Further, a coating film obtained from such a photocatalyst coating composition can be suitably used for a wide range of applications utilizing photocatalytic performance such as organic substance decomposition.
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Abstract
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JP2005503494A JPWO2004081130A1 (ja) | 2003-03-11 | 2004-03-04 | 光触媒コーティング用組成物およびコーティング膜 |
US10/548,483 US20060264525A1 (en) | 2003-03-11 | 2004-03-04 | Composition for photocatalyst coating and coating film |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006198466A (ja) * | 2005-01-18 | 2006-08-03 | Jsr Corp | 光触媒性シートおよびこれを用いた照明装置 |
JP2007277505A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2007277072A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2007277073A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2010254887A (ja) * | 2009-04-28 | 2010-11-11 | Shin-Etsu Chemical Co Ltd | 光応答性に優れる光触媒薄膜を与える光触媒塗工液及び該光触媒薄膜 |
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US20050202241A1 (en) | 2004-03-10 | 2005-09-15 | Jian-Ku Shang | High surface area ceramic coated fibers |
WO2006031012A1 (en) * | 2004-09-15 | 2006-03-23 | Lg Chem, Ltd. | Films or structural exterior materials using coating composition having self-cleaning property and preparation method thereof |
WO2006138628A2 (en) * | 2005-06-16 | 2006-12-28 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Method for activating nitride surfaces for amine-reactive chemistry |
EP2104556B1 (en) * | 2006-12-22 | 2019-10-09 | 3M Innovative Properties Company | Coated roofing granule |
EP2106288B1 (en) * | 2006-12-22 | 2021-03-31 | 3M Innovative Properties Company | A coated roofing granule, a method of making a coated roofing granule and a base roofing material in which said coated roofing material is partially embedded |
US7919425B2 (en) * | 2008-03-26 | 2011-04-05 | Toto Ltd. | Photocatalyst-coated body and photocatalytic coating liquid for the same |
JP4092714B1 (ja) * | 2007-03-26 | 2008-05-28 | Toto株式会社 | 光触媒塗装体およびそのための光触媒コーティング液 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001205094A (ja) * | 2000-01-26 | 2001-07-31 | Toyota Central Res & Dev Lab Inc | 光触媒物質および光触媒体 |
JP2002003785A (ja) * | 2000-04-13 | 2002-01-09 | Jsr Corp | コーティング組成物およびその製造方法 |
JP2002161238A (ja) * | 2000-09-14 | 2002-06-04 | Matsushita Electric Works Ltd | コーティング材組成物およびその塗装品 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5786414A (en) * | 1995-12-22 | 1998-07-28 | Toto Ltd. | Building rubber members and method for imparting hydrophilic surface thereto |
DE69826342T2 (de) * | 1997-02-06 | 2005-10-06 | Shin-Etsu Chemical Co., Ltd. | Beschichtungszusammensetzungen, hydrophiler Film und mit hydrophilem Film beschichtete Gegenstände |
US6376057B1 (en) * | 1998-11-19 | 2002-04-23 | Fuji Photo Film, Co., Ltd. | Packaging material for photographic photosensitive material |
US20020155279A1 (en) * | 2001-02-14 | 2002-10-24 | Chunping Dai | Method of manufacturing dimensionally stable cellulosic fibre-based composite board and product |
US6551656B1 (en) * | 2001-05-18 | 2003-04-22 | Ensci Inc. | Process for producing thin film metal oxide coated substrates |
KR100746067B1 (ko) * | 2002-11-13 | 2007-08-03 | 닛뽕소다 가부시키가이샤 | 금속-산소 결합을 갖는 분산질, 금속산화물막 및 단분자막 |
US20060096614A1 (en) * | 2004-11-08 | 2006-05-11 | Krisko Annette J | Surface treating methods, compositions and articles |
WO2006062102A1 (ja) * | 2004-12-06 | 2006-06-15 | Nippon Sheet Glass Company, Limited | 光触媒機能および熱線反射機能を有するガラス部材、ならびに、それを用いた複層ガラス |
-
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- 2004-03-04 JP JP2005503494A patent/JPWO2004081130A1/ja active Pending
- 2004-03-04 WO PCT/JP2004/002740 patent/WO2004081130A1/ja active Application Filing
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001205094A (ja) * | 2000-01-26 | 2001-07-31 | Toyota Central Res & Dev Lab Inc | 光触媒物質および光触媒体 |
JP2002003785A (ja) * | 2000-04-13 | 2002-01-09 | Jsr Corp | コーティング組成物およびその製造方法 |
JP2002161238A (ja) * | 2000-09-14 | 2002-06-04 | Matsushita Electric Works Ltd | コーティング材組成物およびその塗装品 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006198466A (ja) * | 2005-01-18 | 2006-08-03 | Jsr Corp | 光触媒性シートおよびこれを用いた照明装置 |
JP2007277505A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2007277072A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2007277073A (ja) * | 2006-03-16 | 2007-10-25 | Jsr Corp | 酸化物微粒子分散体およびその製造方法 |
JP2010254887A (ja) * | 2009-04-28 | 2010-11-11 | Shin-Etsu Chemical Co Ltd | 光応答性に優れる光触媒薄膜を与える光触媒塗工液及び該光触媒薄膜 |
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US20060264525A1 (en) | 2006-11-23 |
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