WO2004012854A2 - Procede de preparation de composition de pate de nervure de protection photosensible destinee a la fabrication de panneau afficheur plasma - Google Patents

Procede de preparation de composition de pate de nervure de protection photosensible destinee a la fabrication de panneau afficheur plasma Download PDF

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Publication number
WO2004012854A2
WO2004012854A2 PCT/KR2003/001562 KR0301562W WO2004012854A2 WO 2004012854 A2 WO2004012854 A2 WO 2004012854A2 KR 0301562 W KR0301562 W KR 0301562W WO 2004012854 A2 WO2004012854 A2 WO 2004012854A2
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WO
WIPO (PCT)
Prior art keywords
barrier rib
powder
photosensitive
nano
recited
Prior art date
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PCT/KR2003/001562
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English (en)
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WO2004012854A3 (fr
Inventor
Lee Soon Park
Sang Won Yun
Sin Hye Paek
Hyung Suk Choi
Moo Shik Im
Sun Woo Park
Bong Chool Kim
Kyung Seok Shin
Hyo Shik Lee
Original Assignee
Ultra Plasma Display Corporation
Ildong Chemical Co. Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultra Plasma Display Corporation, Ildong Chemical Co. Ltd. filed Critical Ultra Plasma Display Corporation
Priority to AU2003248494A priority Critical patent/AU2003248494A1/en
Priority to JP2004525866A priority patent/JP2006502942A/ja
Publication of WO2004012854A2 publication Critical patent/WO2004012854A2/fr
Publication of WO2004012854A3 publication Critical patent/WO2004012854A3/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • the present invention relates to a method for fabricating a plasma display panel (PDP); and, more particularly, to a method for preparing a photosensitive barrier rib paste composition containing barrier rib powder whose surface is treated with nano-size fumed silica particles, and a method for fabricating PDP barrier ribs using the method.
  • PDP plasma display panel
  • a plasma display panel is a flat panel display device using the effect of vacuum ultraviolet rays (mostly in the wavelength of 147nm) changing into red, green, and blue rays in the range of visible rays, after colliding with a corresponding phosphor.
  • the vacuum ultraviolet rays are emitted from plasma generated during the discharge of gas, such as Ne or Xe, filled in a space between a front plate and a rear plate.
  • gas such as Ne or Xe
  • the structure is very simple, but has a shortcoming that it should equip external resistance to limit the current because the electrode is exposed in the discharge space.
  • an electrode In an AC-type PDP, an electrode is not exposed directly but covered with a dielectric substance, so displacement current flows. Since the electrode is covered with a dielectric substance, electric current can be limited naturally. Also, because the electrode can be protected from ion impact during the discharge, the lifetime of the AC-type PDP is longer than that of the DC-type PDP.
  • PDP is drawing public attention as a next-generation display along with high-definition television (HDTV), because PDP can embody full-color display and a large display device over 40 inches, and has quick response time and wide-angle vision.
  • HDMI high-definition television
  • Fig. 1 is a cross-sectional view showing a surface- discharging AC-type PDP.
  • a surface- discharging AC-type PDP comprises a rear plate and a front plate.
  • the rear plate is formed of a rear substrate 10, an address electrode 11, a white dielectric substance 12 and barrier ribs 13.
  • the front plate is formed of a front substrate 14, a transparent electrode 15, a bus electrode 16, a transparent dielectric 17, a dielectric protection film 18 and black stripes (not shown).
  • the phosphors (red, green, and blue) 19 for embodying colors in the PDP are placed between the barrier ribs 13 of the rear plate in the surface discharging AC-type PDP.
  • the barrier ribs is a structure formed on the rear substrate of the PDP for obtaining discharge space and preventing electric and optical cross talk between neighboring cells.
  • Detailed structure of barrier ribs is different according to the design of a PDP.
  • the barrier ribs In case of a stripe-shaped barrier rib, the barrier ribs has an upper width of 60 ⁇ 80 ⁇ m, a lower width of 80 ⁇ 110 ⁇ m, a height of 100 ⁇ 120 ⁇ m, and each barrier rib pattern is placed at an interval of 200 ⁇ 300 ⁇ m.
  • the structure of PDP is a significant factor affecting the image quality of display. Formation of barrier ribs for PDP consisted of two steps. The first step is obtaining a fine pattern of barrier ribs with predetermined geometrical structure by using a barrier rib paste.
  • the barrier rib paste is composed of two parts.
  • One part is inorganic barrier rib powder including low melting glass frit and ceramic material such as alumina (Al 2 0 3 ) and titanium oxide (Ti0 2 ).
  • the ceramic material has function of increasing the mechanical property of the barrier rib after sintering while glass frit forms the amorphous matrix of barrier rib by melting at low temperature ranging of from about 530 ° C to about 550 °C .
  • the other part is organic material which has the function of making paste with the inorganic barrier rib powder and enabling a fine patterning of barrier ribs on the rear panel of PDP.
  • the barrier ribs of a PDP device can be patterned by various methods, such as screen printing, sandblasting, and photolithography.
  • the screen printing is a method for obtaining barrier ribs by printing a barrier rib paste on a glass substrate using a screen mask patterned with a predetermined barrier rib structure and drying to remove the solvent. This printing and drying process are repeated 8-10 times to get a dry barrier rib height of 200 ⁇ to 250 ⁇ m . This method takes long time and has a problem of low throughput. It is also hard to form uniform barrier rib pattern due to mis-alignment of screen mask by repeated process .
  • barrier ribs are formed by coating and drying a barrier rib paste in a thickness of 150 ⁇ 250 ⁇ m, laminating an anti-sanding dry film resist (DFR), forming patterns with the DFR by performing light exposure and development, and removing barrier rib particles by applying impact thereto with fine abrasive particles along with high-pressure air.
  • DFR anti-sanding dry film resist
  • the photolithographic method is performed by coating and drying a photosensitive barrier rib paste, exposing the paste to ultraviolet (UV) light through a photo mask, and removing the paste in the unexposed area by selectively dissolving it in developing solution.
  • the photolithography method has an advantage that it can form fine and clean barrier ribs.
  • barrier ribs over 100 ⁇ -high can hardly be formed, because the intensity of UV light is greatly reduced at the lower portion of the photosensitive barrier rib layer due to absorption, reflection and scattering of the light.
  • the inorganic barrier rib materials used for this purpose include P 2 0 5 , BiO,Na 2 0, Li 2 0 or K 2 0 in place of PbO in the conventional glass frit consisted of PbO-B 2 0 3 -Si0 2 .
  • This technology has a problem that the composition of the organic part of photosensitive barrier rib paste which has the function of inducing photocrosslinking reaction has to be changed according to the composition of the inorganic barrier rib materials with reduced refractive indices.
  • the color of the barrier ribs after sintering (or firing) process is usually darker than the one employing PbO in the glass frit.
  • the dark barrier ribs reduce the luminance intensity of the PDP due to increased absorption of red (R) , green (G) or blue (B) light emitted from the phosphor layer.
  • photosensitive barrier rib pastes in which PbO is replaced with other inorganic oxides are used in the formation of barrier ribs for PDP, usually higher sintering temperature is required than the one with PbO in the glass frit. The high sintering temperature is detrimental to the PDP manufacturing process because it induces cracking or warp of the PDP panel, resulting low yield in the production of PDP.
  • an object of the present invention to provide a photosensitive barrier rib paste that can enhance the efficiency of UV light exposure regardless of the various composition of glass frits when the barrier ribs of a plasma display panel (PDP) are formed with a photolithography method.
  • a method for preparing a photosensitive barrier rib paste comprising the steps of: mixing barrier rib powder including glass frit and ceramic material with nano-size (5nm ⁇ 200nm) silica particles, heat treating the mixture powder in an oven, pulverizing the mixture powder in a ball mill thus providing a barrier rib powder on which surface nano-size silica particles are adsorbed; and forming the photosensitive barrier rib paste by mixing the barrier rib powder of which surface is treated with the nano-size silica particles with the photosensitive vehicle.
  • a method for preparing a photosensitive vehicle including binder polymer, a first material selected from a group consisting of multifunctional monomer and multifunctional oligomer, photoinitiator and additives such as dispersing agent, polymerization inhibitor, photosensitizer , and leveling agent .
  • a method for forming barrier ribs of a plasma display panel comprising the steps of: providing a substrate: coating a photosensitive barrier rib paste including barrier rib powder of which surface is treated with fumed silica; drying the photosensitive barrier rib paste; and forming barrier pattern by exposing and developing the photosensitive barrier rib layer.
  • the surface of the inorganic barrier rib powder of the photosensitive barrier rib paste is treated with nano-size (the average diameter is 5-200nm) silica particles.
  • nano-size silica particles fumed silica is useful since fumed silica can be prepared easily with diameter in narrow distribution under specified nano-size.
  • fumed silica particles are amorphous and have high purity, fumed silica particles are transparent and have small light propagation loss.
  • Inorganic barrier rib powder whose surface is treated with nano-size fumed silica can be obtained by mixing nano-size fumed silica with inorganic barrier rib powder, the average size of which is 2-5 ⁇ m, using a ball mill, baking the powder mixture at a temperature of 50 ⁇ 150°C, and then re- pulverizing the baked powder mixture. Since the size of the fumed silica is nanometer scale, the silica particles are firmly adsorbed on the porous surface of the barrier rib powder whose size is in micrometer range.
  • the photosensitive barrier rib paste is prepared using the barrier rib powder whose surface is treated with nano-size silica particles, and the barrier rib pattern is formed with a photolithography method, the light-exposure efficiency of the photosensitive barrier rib paste is enhanced because the nano-size silica particles on the surface of the barrier rib powder can form a kind of light guide channels between the barrier rib powders for ultraviolet ray to penetrate into the dry photosensitive barrier rib layer.
  • Fig. 1 is a cross-sectional view showing a surface- discharging AC-type plasma display panel (PDP);
  • Fig. 2 is a flow chart illustrating a method for surface treating barrier rib powder in accordance with an embodiment of the present invention
  • Fig. 3 is a scanning electron microscope (SEM) photograph of barrier rib powder of which surface is treated with the nano-size silica particles;
  • Fig. 4 is a flow chart describing a method for preparing a photosensitive barrier rib paste in accordance with an embodiment of the present invention.
  • Fig. 2 is a flow chart illustrating a method for preparing barrier rib powder which is a mixture of glass frit and ceramic material in accordance with an embodiment of the present invention.
  • barrier rib powder and nano-size fumed silica are mixed together and pulverized with a ball mill.
  • the barrier rib powder could be mixture of glass frit of a PbO- Si0 2 -B 2 0 3 -group or other glass frit in which PbO is replaced with P 2 0 5 , BiO or alkalimetal oxide such as 2 0, Na 2 0 or Li 2 0 and ceramic powder which could be alumina (Al 2 0 3 ) or titanium oxide (Ti0 2 ).
  • the ball milling process is performed at a room temperature for 10-60 minutes, desirably.
  • the barrier rib powder of which is surface treated with nano-size fumed silica is baked in an oven at a temperature of 50 ⁇ 150°C for 10-30 minutes.
  • the baked barrier rib powder, which includes the fumed silica is re-pulverized using a ball mill. The pulverization is performed at a room temperature for 10-30 minutes, desirably.
  • the nano-size silica particles (the average diameter of which is 5 ⁇ 200nm) are firmly adsorbed on the barrier rib particles composed of glass frit and ceramic powder as shown in Fig.3.
  • Fig. 4 is a flow chart describing a method for preparing photosensitive barrier rib paste in accordance with an embodiment of the present invention.
  • binder polymers are dissolved in solvents to have an appropriate viscosity.
  • a photosensitive vehicle is prepared by mixing multifunctional monomer/oligomer having two or more double bonds, photoinitiator , and additives into the binder polymer solution.
  • the additives include dispersing agent, polymerization inhibitor, photosensitizer , and leveling agent .
  • the photosensitive vehicle and the barrier rib powder whose surface is treated with nano-size silica particles, which has been prepared through the process illustrated in Fig. 2, are mixed.
  • the above mixture is dispersed homogeneously, and the viscosity is controlled finally.
  • the photosensitive barrier rib paste composition of the present invention which has been prepared through the above process includes 5-20 wt% binder polymer, 8-20 wt% multifunctional monomer/ oligomer, 1-2 wt% photoinitiator, 0.1-1 wt% nano-size fumed silica, 40-60 wt% glass frit, 10-25 wt% ceramic powder, 1-5 wt% additives and 10-23 wt% solvent.
  • the additives include dispersing agent (0.1-1 wt%), polymerization inhibitor (0.1-1 wt%), photosensitizer (0.2-2 wt%), and leveling agent (0.1-1 wt%).
  • the above prepared photosensitive barrier rib paste has a viscosity of 10,000 - 100,000 cps, desirably. If the viscosity of the photosensitive barrier rib paste is not more than 10,000cps, it runs on the glass substrate too easily to coat the glass substrate. On the other hand, if the viscosity is more than 100,000 cps, the paste does not penetrate the screen meshes but blocks them up.
  • the binder polymer combines barrier rib powder that forms the barrier ribs and controls the viscosity of the paste.
  • the binder polymer a polymer having good miscibility with other components of the barrier rib paste and preventing the generation of foams can be used.
  • the binder polymer includes materials of cellulose group and acrylate group.
  • the binder polymer of cellulose group includes cellulose derivatives, such as, hydroxyethyl cellulose, hydroxypropyl cellulose, and hydroxyethyl- hydroxypropyl cellulose.
  • the cellulose derivative has excellent miscibility with the inorganic barrier rib powder and has good wetting property to the glass substrate.
  • cellulose derivative for example, hydroxypropyl cellulose is used as a binder polymer in combination with a acrylic copolymer.
  • the cellulose derivative make it possible to perform sintering, which is the last process for forming barrier ribs, at a low temperature around 480°C ⁇ 550°C.
  • binder polymers of acrylate group a copolymer synthesized from a comonomer selected from methylmethacrylate , isobutylmethacrylate, benzylmethacrylate and another comonomer methacrylic acid can be used.
  • the molecular weight of copolymer is 5, 000-20, OOOg/mole.
  • the mole percent of methacrylic acid should be 10-30 mole % in the copolymer, which facilitates the development with aqueous alkali solution ofter exposure to UV light. It is also important to use the cellulose derivative and acrylate copolymer in combination as binder polymer because the former has effect on screen printing process such as good wetting and less foaming and the latter helps rheological property and development with aqueous alkaline solution.
  • Multifunctional monomer includes ethyleneglycol diacrylate, ethyleneglycol dimethacrylate, diethyleneglycol diacrylate, propyleneglycol diacrylate, 1 , 2 , 4-butanetriol triacrylate, 1 , 4-benzenediol diacrylate, Trimethylolpropane triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol hexaacrylate, and dipentaerythritol hexamethacrylate.
  • Multifunctional oligomer includes epoxy acrylate, urethane acrylate, and polyester acrylate, whose molecular weight is 200-800.
  • One of the multif nctional monomer and multif nctional oligomer can be selected and used. However, if both multifunctional monomer and oligomer are used together, the adhesion of the barrier ribs to rear panel of PDP on which dielectric layer (so called white back) is formed can be enhanced.
  • the UV oligomer of urethane acrylate type is especially good for this purpose, because it increases the so called time to clear (TTC) which is the time reguired for the complete development of the photosensitive barrier rib layer after UV-exposure.
  • TTC time to clear
  • ceramic powder that forms barrier ribs along with glass frit ofter sintering one selected from a group consisting of Al 2 0 3 , CaO, Cr 2 0 3 , CuO, Fe 2 0 3 , K 2 0, MnO, Na 2 0, NiO, PbO, Si0 2 , Sn0 2 , ZnO, Zr0 2 , B 2 0 3 , and Ti0 2 can be used.
  • the photoinitiator is a chemical whis is decomposed when exposed to light source, i.e., ultraviolet ray and forms free radicals to initiate photopolymerization.
  • any photoinitiator that shows excellent photoreaction in the ultraviolet ray wavelength(200 ⁇ 400nm) can be used as a photoinitiator.
  • 2 ,2-dimethoxy-2-phenyl acetophenone (DMPA) can be used as a photoinitiator, alone or mixed with other photoinitiators.
  • DMPA 2- ,2-dimethoxy-2-phenyl acetophenone
  • a photosensitizer such as isopropyl-9H- thioxanthen-9-one is used in the photosensitive barrier rib paste formulation.
  • a polymerization inhibitor such as hydroquinone to control the width of barrier rib within certain limit, i.e. 80 ⁇ m in case of standard definition PDP.
  • various additives, such as silicone antifoaming agent and leveling agent can be used to improve the screen printing or other coating characteristic of the photosensitive barrier rib paste.
  • barrier ribs of a PDP using the photosensitive barrier rib paste in which barrier rib powder is surface treated with nano-size silica particles is described in accordance with an embodiment of the present invention.
  • the photosensitive barrier rib paste is coated on a rear glass panel where address electrode and dielectric layer (not shown) have been formed using a screen printer or other coater to a thickness of 150 ⁇ 250 ⁇ m, and dried at a temperature of 50 - 130°C for 5 - 30 minutes. Subsequently, the dry photosensitive barrier rib layer is exposed to UV light through a photomask, wherein a desired barrier rib pattern is formed.
  • the un-exposed photosensitive barrier rib layer is removed in the developing process.
  • 0.3 - 2 wt% Na 2 C0 3 aqueous solution is used as developing solution.
  • the developing solution is sprayed for 1 - 3 minutes and then the panel is dried.
  • the sintering process is performed at 350 - 450°C for 20 - 30 minutes isothermally , after that the temperature is increased up to 480 - 550°C at a speed of 10°C/min for the complete combustion of organic materials.
  • the dry barrier rib layer can be exposed to UV light to a thickness of over 200 ⁇ m in one time. Therefore, the process time for forming barrier ribs can be reduced. Meanwhile, since the enhanced photosensitivity of barrier rib paste of the present invention is due to the surface treatment of barrier rib powder with nano-size fumed silica, it is another merit of this invention that either barrier rib powder based on conventional PbO-Si0 2 - B 2 0 3 glass frit or other so called ⁇ non-Pb barrier rib powder" can be used in the photosensitive barrier rib paste with minimal change in composition of the organic component of the paste which has the function of patterning the barrier ribs by the photolithographic process.
  • composition of the photosensitive barrier rib paste presented in the present invention is optimized values after many experiments. Some important experimental data are introduced as follows.
  • Table 1 shows the composition of the photosensitive barrier rib paste designated as Experiment 1 and 2.
  • the photosensitive vehicle was prepared as following.
  • poly (methylmethacrylate- co-methacrylic acid) abbreviated as poly (MMA-co-MAA) was dissolved in butyl carbitol acetate solvent and hydroxypropyl cellulose was dissolved in 3-methoxy-3- methylbutanol solvent, and then the two binder polymer [Table l] Photosensitive barrier rib pastes for Experiment land 2. solutions were mixed.
  • Second, to the binder polymer mixture solution were added multif nctional monomer, multifunctional oligomer, photoinitiator, and additives such as polymerization inhibitor, photosensitizer, dispersing agent, and leveling agent to make a photosensitive vehicle.
  • the glass frit and ceramic powder were mixed to the photosensitive vehicle prepared and then the mixture was dispersed in the 3-roller mill to obtain a photosensitive barrier rib paste according to the well known method in the industry.
  • nano-size fumed silica was added in addition to the glass frit and ceramic powder as in Experiment 1.
  • fumed silica was just added as powder without surface treatment to the barrier rib powder composed of glass frit and ceramic powder .
  • this barrier rib paste is a negative type photosensitive paste in which the multifunctional monomers are cross-linked by the free radicals generated from the photoinitiator by UV light.
  • the development of the unexposed area of barrier rib layer is, however, dependant on the binder polymer which is soluble to the aqueous alkali solution.
  • barrier rib powder composed of glass frit and ceramic powder with the nano-size fumed silica as shown in Table 3.
  • the mixture powder was then kept in the oven at 100°C for 20min and then pulverized in the ball mill.
  • Exp9 only Al 2 0 3 ceramic powder was used in stead of mixture of Al 2 0 3 and Ti0 2 as ceramic powder. The rest of the operation was same as Exp. 3-8.
  • optimum size of fumed silica for surface treatment of barrier rib is 5 - 200nm.
  • the size of fumed silica used in the surface treatment of barrier rib powder was over 200nm, the barrier ribs fall off in the development step of the photolithographic patterning of barrier ribs.
  • Exp9 suggests that the change of ceramic powder from Al 2 03 and Ti0 2 mixture to Al 2 0 3 alone does not affect the photolithographic process.
  • ExplO ⁇ Expl2 indicate that the surface treatment of barrier rib powder with nano-size silica particles of this invention is working regardless of the type of glass- frit i.e., connectional PbO-B 2 0 3 -Si0 2 group frit glass or so- called non-Pb type glass frit in which PbO is replaced with BiO, P 2 0 5 , or alkali metal oxide such as Li 2 0, Na 2 0 or K 2 0.
  • the tests using Expl3 to Expl6 show that the optimum amount of nano-size silica particles for surface treatment is in the range of 0.5 ⁇ 1.5wt% based on the total weight of. barrier rib powder.
  • Table 5 shows the effect of each components of photosensitive vehicle on the photolithographic patterning of barrier ribs.
  • the barrier rib powder was surfaced treated one as in Exp4 of Table 3.
  • the photosensitive barrier rib pastes prepared with the composition of photosensitive vehicles in Table 5 gave different results in the photolithographic patterning of barrier ribs .
  • Exp22 paste gave wide (about lOO ⁇ m) barrier rib although the photomask had slit of 80 ⁇ m for UV light irradiation. This result suggests that the effect of polymerization inhibitor is to stop polymerization in the unexposed area thus controlling the width of barrier rib in the photolithographic process.
  • Exp23 paste resulted in uneven barrier ribs after photolithographic patterning of barrier ribs. This phenomenon could be explained by poor dispersion of barrier rib paste when dispersing agent was not employed in the paste formulation
  • BCA Butyl carbitol acetate
  • 3MMB 3-methoxy-3-methyl butanol
  • PETA pentaerythriol tetracrylate
  • EB204 Urethane acrylate

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Abstract

La présente invention concerne un procédé de préparation d'une pâte de nervure de protection photosensible, qui consiste à prendre une poudre de nervure de protection dont la surface est traitée avec des particules de silice d'une taille nanométrique par mélange, cuisson et pulvérisation d'une poudre de nervure de protection avec une silice fumée de taille nanométrique, et à former cette pâte de nervure de protection photosensible en mélangeant la poudre de nervure de protection dont la surface est traitée avec les particules de silice de taille nanométrique avec un liant photosensible.
PCT/KR2003/001562 2002-08-02 2003-08-02 Procede de preparation de composition de pate de nervure de protection photosensible destinee a la fabrication de panneau afficheur plasma WO2004012854A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU2003248494A AU2003248494A1 (en) 2002-08-02 2003-08-02 Method for preparing photosensitive barrier rib paste composition for fabricating plasma display pannel
JP2004525866A JP2006502942A (ja) 2002-08-02 2003-08-02 プラズマ・ディスプレイ・パネルにおける感光性隔壁ペースト製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2002-0045812 2002-08-02
KR10-2002-0045812A KR100497763B1 (ko) 2002-08-02 2002-08-02 퓸드 실리카 입자로 표면 처리된 격벽 분말을 포함하는감광성 격벽 페이스트 조성물 및 그의 제조방법, 그리고그를 사용한 플라즈마 디스플레이 패널의 격벽 형성방법

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WO2004012854A2 true WO2004012854A2 (fr) 2004-02-12
WO2004012854A3 WO2004012854A3 (fr) 2008-03-13

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1742246A2 (fr) * 2005-07-01 2007-01-10 LG Electronics Inc. Panneau d'affichage à plasma et son procédé de fabrication
EP1796122A2 (fr) 2005-12-06 2007-06-13 LG Electronics Inc. Composition de bouillie, feuille verte a et procédé de fabrication des nervures barriere d'un panneau d'affichage à plasma [2006/40]
EP1798747A2 (fr) * 2005-12-14 2007-06-20 LG Electronics Inc. Procédé de fabrication d'une couche diélectrique d'un panneau d'affichage à plasma
EP1803692A1 (fr) * 2005-12-29 2007-07-04 LG Electronics Inc. Composition de pâte et feuille verte pour la préparation des nervures d'isolation dans un panneau d'affichage à plasma, et un panneau d'affichage à plasma faisant appel à cette dernière
EP2082994A1 (fr) * 2008-01-22 2009-07-29 Samsung SDI Co., Ltd. Composition de pâte photosensible, nervures de barrière préparée en utilisant une composition et panneau d'affichage à plasma comprenant les nervures de barrière
EP2377829A3 (fr) * 2010-04-16 2012-11-21 Christine Hardman Revêtement photosensible réversible et son procédé de fabrication

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EP2082994A1 (fr) * 2008-01-22 2009-07-29 Samsung SDI Co., Ltd. Composition de pâte photosensible, nervures de barrière préparée en utilisant une composition et panneau d'affichage à plasma comprenant les nervures de barrière
EP2377829A3 (fr) * 2010-04-16 2012-11-21 Christine Hardman Revêtement photosensible réversible et son procédé de fabrication

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KR100497763B1 (ko) 2005-08-03
CN1791561A (zh) 2006-06-21
AU2003248494A8 (en) 2004-02-23
JP2006502942A (ja) 2006-01-26
AU2003248494A1 (en) 2004-02-23
KR20040012298A (ko) 2004-02-11

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