WO2003095175A3 - Procede et appareil de gaufrage - Google Patents

Procede et appareil de gaufrage Download PDF

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Publication number
WO2003095175A3
WO2003095175A3 PCT/GB2003/002015 GB0302015W WO03095175A3 WO 2003095175 A3 WO2003095175 A3 WO 2003095175A3 GB 0302015 W GB0302015 W GB 0302015W WO 03095175 A3 WO03095175 A3 WO 03095175A3
Authority
WO
WIPO (PCT)
Prior art keywords
carrier film
surface profile
layer
fixable material
taking
Prior art date
Application number
PCT/GB2003/002015
Other languages
English (en)
Other versions
WO2003095175A2 (fr
Inventor
Richard Michael Amos
Guy Peter Bryan-Brown
Emma Louise Wood
John Clifford Jones
Philip Thomas Worthing
Original Assignee
Zbd Displays Ltd
Richard Michael Amos
Guy Peter Bryan-Brown
Emma Louise Wood
John Clifford Jones
Philip Thomas Worthing
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zbd Displays Ltd, Richard Michael Amos, Guy Peter Bryan-Brown, Emma Louise Wood, John Clifford Jones, Philip Thomas Worthing filed Critical Zbd Displays Ltd
Priority to CN038164604A priority Critical patent/CN1668440B/zh
Priority to EP03722845A priority patent/EP1503888B1/fr
Priority to AT03722845T priority patent/ATE545493T1/de
Priority to KR10-2004-7018254A priority patent/KR20050003445A/ko
Priority to AU2003230005A priority patent/AU2003230005A1/en
Priority to US10/512,877 priority patent/US7824516B2/en
Priority to JP2004503234A priority patent/JP2005525592A/ja
Publication of WO2003095175A2 publication Critical patent/WO2003095175A2/fr
Publication of WO2003095175A3 publication Critical patent/WO2003095175A3/fr
Priority to HK06102874.1A priority patent/HK1082934A1/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
    • B29C39/14—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length
    • B29C39/148—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor for making articles of indefinite length characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/22—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
    • B29C43/222—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length characterised by the shape of the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
    • B29C35/0894—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds provided with masks or diaphragms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29K—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00—Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0079—Liquid crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1002—Methods of surface bonding and/or assembly therefor with permanent bending or reshaping or surface deformation of self sustaining lamina
    • Y10T156/1007—Running or continuous length work
    • Y10T156/1023—Surface deformation only [e.g., embossing]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part
    • Y10T156/1712—Indefinite or running length work
    • Y10T156/1737—Discontinuous, spaced area, and/or patterned pressing

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Liquid Crystal (AREA)
  • Confectionery (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Abstract

L'invention concerne un procédé et un appareil de formation d'une couche structurée dont le profil de surface comporte des structures en relief à l'intérieur d'un dispositif électronique. Le procédé consiste à prendre un film support (50) comportant le négatif du profil de surface recherché formé sur un de ses côtés, à prendre une couche de matériau fixatif (54) disposée sur une substrat (52), à stratifier le film support (50) et le substrat (52) de façon que le film support permette la formation du profil de surface recherché dans la couche du matériau fixatif avec un décalage (épaisseur non structurée de la couche de matériau fixatif) déterminé, et à fixer le matériau fixatif. La stratification peut être réalisée au moyen de rouleaux (56, 58) ou d'un procédé sous vide. Le procédé est conçu afin que le décalage soit aussi faible que possible, de préférence inférieur à 150 nm.
PCT/GB2003/002015 2002-05-13 2003-05-13 Procede et appareil de gaufrage WO2003095175A2 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
CN038164604A CN1668440B (zh) 2002-05-13 2003-05-13 浮雕形成方法和设备
EP03722845A EP1503888B1 (fr) 2002-05-13 2003-05-13 Procede de gaufrage
AT03722845T ATE545493T1 (de) 2002-05-13 2003-05-13 Verfahren zum prägen
KR10-2004-7018254A KR20050003445A (ko) 2002-05-13 2003-05-13 엠보싱 방법 및 장치
AU2003230005A AU2003230005A1 (en) 2002-05-13 2003-05-13 Embossing method and apparatus
US10/512,877 US7824516B2 (en) 2002-05-13 2003-05-13 Embossing method and apparatus
JP2004503234A JP2005525592A (ja) 2002-05-13 2003-05-13 エンボス加工方法及び装置
HK06102874.1A HK1082934A1 (en) 2002-05-13 2006-03-06 Embossing method and apparatus

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP02253326.9 2002-05-13
EP02253326A EP1362682A1 (fr) 2002-05-13 2002-05-13 Appareil et méthode pour l'alignement de cristaux liquides
GB0227221.9 2002-11-21
GBGB0227221.9A GB0227221D0 (en) 2002-05-13 2002-11-21 Embossing method and apparatus

Publications (2)

Publication Number Publication Date
WO2003095175A2 WO2003095175A2 (fr) 2003-11-20
WO2003095175A3 true WO2003095175A3 (fr) 2004-02-19

Family

ID=8185683

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/GB2003/002015 WO2003095175A2 (fr) 2002-05-13 2003-05-13 Procede et appareil de gaufrage

Country Status (11)

Country Link
US (1) US7824516B2 (fr)
EP (2) EP1362682A1 (fr)
JP (1) JP2005525592A (fr)
KR (1) KR20050003445A (fr)
CN (1) CN1668440B (fr)
AT (1) ATE545493T1 (fr)
AU (1) AU2003230005A1 (fr)
GB (1) GB0227221D0 (fr)
HK (1) HK1082934A1 (fr)
TW (1) TW200405850A (fr)
WO (1) WO2003095175A2 (fr)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4936667B2 (ja) * 2002-11-29 2012-05-23 フラウンホファー ゲゼルシャフト ツール フェルドルンク デル アンゲヴァントテン フォルシュンク エー ファウ ウェーハ処理プロセス及び装置並びに中間層及びキャリヤー層を有するウェーハ
DE10330062A1 (de) * 2003-07-03 2005-01-27 Siemens Ag Verfahren und Vorrichtung zur Strukturierung von organischen Schichten
US9307648B2 (en) 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
US8435373B2 (en) * 2005-06-20 2013-05-07 Microcontinumm, Inc. Systems and methods for roll-to-roll patterning
GB0421169D0 (en) * 2004-09-23 2004-10-27 Securis Ltd Apparatus and process for the printing of microstructures
CN1830686B (zh) * 2005-03-09 2010-04-28 张航线 多彩激光镭射浮雕立线的复膜方法
GB2427509A (en) 2005-06-21 2006-12-27 Seiko Epson Corp Organic electronic device fabrication by micro-embossing
KR100616728B1 (ko) * 2005-07-07 2006-08-28 드림칼라(주) 필름표면에 스크래치 각인 장치 및 그 제조방법
KR101183928B1 (ko) * 2005-07-19 2012-10-11 삼성디스플레이 주식회사 액정표시장치의 제조방법
JP4530416B2 (ja) * 2005-10-25 2010-08-25 株式会社リコー シート保持方法、ディスク製造方法、シート保持装置、転写装置、スパッタ装置、スピンコート装置、２ｐ転写装置及びディスク製造装置
US20070204953A1 (en) * 2006-02-21 2007-09-06 Ching-Bin Lin Method for forming structured film as molded by tape die
CA2643510C (fr) 2006-02-27 2014-04-29 Microcontinuum, Inc. Formation d'outils de reproduction de motifs
US7678701B2 (en) * 2006-07-31 2010-03-16 Eastman Kodak Company Flexible substrate with electronic devices formed thereon
EP1906236B1 (fr) * 2006-08-01 2012-09-19 Samsung Electronics Co., Ltd. Appareil d'impression et procédé pour la formation d'un film résiduel sur un substrat
JP2008052940A (ja) * 2006-08-22 2008-03-06 Citizen Electronics Co Ltd 導光板及びその製造方法とその導光板を用いたバックライトユニット
KR101119446B1 (ko) * 2006-10-31 2012-03-15 소니 케미카루 앤드 인포메이션 디바이스 가부시키가이샤 적층형 연자성 시트의 제조 방법
US7880371B2 (en) * 2006-11-03 2011-02-01 Danfoss A/S Dielectric composite and a method of manufacturing a dielectric composite
KR101268961B1 (ko) * 2008-02-22 2013-05-29 엘지디스플레이 주식회사 도광판 제조 방법 및 이 도광판을 갖는 백라이트 유닛
GB0809062D0 (en) * 2008-05-19 2008-06-25 Zbd Displays Ltd Method for patterning a surface using selective adhesion
KR101120034B1 (ko) * 2008-10-08 2012-03-23 태양연마 주식회사 요철을 갖는 이형성 기재를 이용한 연마포지의 제조방법
TWI392898B (zh) * 2008-10-28 2013-04-11 Suregiant Technology Co Ltd An optical diaphragm manufacturing method and manufacturing apparatus thereof
TWI381255B (zh) * 2008-12-04 2013-01-01 Ind Tech Res Inst 雙面光學片滾壓對位量測系統及其方法
CN102301463B (zh) 2008-12-05 2015-12-02 流体科技公司 产生有图案的材料的方法
TWI371374B (en) * 2009-09-14 2012-09-01 Compal Electronics Inc Production method of three dimensional pattern
WO2011056496A2 (fr) * 2009-10-26 2011-05-12 3M Innovative Properties Company Appareil et procédé permettant de fournir une surface structurée sur un substrat
JP5609070B2 (ja) * 2009-11-06 2014-10-22 凸版印刷株式会社 画像形成体の製造方法及び画像形成体、並びに個人認証媒体の製造方法及び個人認証媒体
JP5856071B2 (ja) 2009-12-18 2016-02-09 スリーエム イノベイティブ プロパティズ カンパニー サーモトロピック液晶ポリマーの成形及びそこから作製される物品
CN102971085B (zh) * 2010-04-02 2015-11-25 阿德文尼拉企业有限公司 辊涂机
SG184986A1 (en) 2010-04-28 2012-11-29 3M Innovative Properties Co Silicone-based material
JP5844798B2 (ja) 2010-04-28 2016-01-20 スリーエム イノベイティブ プロパティズ カンパニー ポリマーコーティングのためのナノシリカ系プライマーを含む物品及び方法
CN103154319B (zh) 2010-10-06 2016-08-10 3M创新有限公司 具有基于纳米二氧化硅的涂层和阻挡层的抗反射制品
US8845912B2 (en) 2010-11-22 2014-09-30 Microcontinuum, Inc. Tools and methods for forming semi-transparent patterning masks
JP5973561B2 (ja) * 2011-05-31 2016-08-23 スリーエム イノベイティブ プロパティズ カンパニー 相異するようにパターン硬化された微細構造化物品を作製する方法
CN103561927B (zh) 2011-05-31 2016-07-27 3M创新有限公司 用于制备具有不连续的形貌特征的微结构化工具的方法以及由所述工具制造的制品
CN103091747B (zh) 2011-10-28 2015-11-25 清华大学 一种光栅的制备方法
CN103086607B (zh) 2011-10-28 2015-08-26 清华大学 光栅的制备方法
TWI460478B (zh) * 2011-10-28 2014-11-11 Hon Hai Prec Ind Co Ltd 光柵
TW201325877A (zh) * 2011-12-19 2013-07-01 Hon Hai Prec Ind Co Ltd 成型滾輪製造系統及其製造方法
WO2013096779A1 (fr) * 2011-12-21 2013-06-27 Gentex Corporation Ensemble fenêtre à transparence variable commutable
US8891222B2 (en) 2012-02-14 2014-11-18 Danfoss A/S Capacitive transducer and a method for manufacturing a transducer
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
TW201341211A (zh) * 2012-04-12 2013-10-16 Inhon Internat Co Ltd 轉印膜的製作方法
DE102012110149B4 (de) * 2012-10-24 2019-02-07 Leonhard Kurz Stiftung & Co. Kg Heißprägevorrichtung
KR20140109624A (ko) * 2013-03-06 2014-09-16 삼성전자주식회사 대면적 임프린트 장치 및 방법
EP3396446B1 (fr) 2013-03-22 2020-06-03 Vlyte Innovations Limited Dispositif électrophorétique présentant un état lumineux transparent
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
US10324353B2 (en) 2013-10-22 2019-06-18 Vlyte Innovations Limited Wide operating temperature range electrophoretic device
US10996559B2 (en) * 2015-02-13 2021-05-04 Morphotonics Holding B.V. Method for texturing discrete substrates II
WO2016145056A1 (fr) 2015-03-09 2016-09-15 Gentex Corporation Système de fenêtre pourvu de marque
GB201506147D0 (en) 2015-04-10 2015-05-27 Hanna Moore & Curley A Micro-Fastened, Sealed Light Modulator
JP6489309B2 (ja) * 2015-05-14 2019-03-27 パナソニックＩｐマネジメント株式会社 インプリント方法およびインプリント装置
WO2016201112A1 (fr) 2015-06-09 2016-12-15 Gentex Corporation Lunette à pièces multiples pour ensemble fenêtre électro-optique
WO2016201087A1 (fr) 2015-06-09 2016-12-15 Gentex Corporation Retenue d'un ensemble hublot électro-optique
DE102015015407A1 (de) 2015-11-27 2017-06-01 Giesecke & Devrient Gmbh Prägeverfahren zum Prägen von Mikro- oder Nanostrukturen
JP6741440B2 (ja) * 2016-02-29 2020-08-19 住友化学株式会社 積層光学フィルムの製造方法、及び積層光学フィルムの製造装置
CN109076703A (zh) * 2016-04-15 2018-12-21 3M创新有限公司 通过粘合剂转移制备电子电路
FR3052097B1 (fr) * 2016-06-03 2019-07-12 Safran Procede de formation d'un riblet sur une piece et moule de riblet
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CN116736631A (zh) 2016-07-14 2023-09-12 莫福托尼克斯控股有限公司 用于使用柔性压模压印不连续基板的设备
US10754219B2 (en) 2017-06-29 2020-08-25 Gentex Corporation Addressable electro-optic device
US11078025B2 (en) * 2017-11-21 2021-08-03 Chemcut Holdings LLC Lightweight roller
CN109808192A (zh) * 2017-11-21 2019-05-28 汕头市昂斯鞋材有限公司 一种带有激光暗纹的纹理纸制备方法
CN111527448A (zh) 2018-01-26 2020-08-11 莫福托尼克斯控股有限公司 对不连续基底进行纹理化的方法和设备
KR20200138296A (ko) * 2018-03-28 2020-12-09 바스프 코팅스 게엠베하 엠보싱 구조를 코팅의 표면으로 전사시키는 방법 및 상기 코팅을 함유하는 화합물 구조
KR20210104020A (ko) 2018-10-12 2021-08-24 모포토닉스 홀딩 비.브이. 조절할 수 있는 높은 치수 안정성을 갖는 가요성 스탬프
CN110303699A (zh) * 2019-07-29 2019-10-08 浙江晶通塑胶有限公司 一种塑胶地板细腻、清晰纹路的成型方法
MX2023000585A (es) * 2020-07-16 2023-04-14 Bixby Int Corporation Micrograbado.
DE102022109727A1 (de) * 2022-04-22 2023-10-26 polyscale GmbH & Co. KG Verfahren zur Erzeugung einer Funktionsstruktur an einer Oberfläche eines Funktionskörpers

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3918875A (en) * 1973-11-22 1975-11-11 Decca Ltd Record making press
JPS58143348A (ja) * 1982-02-19 1983-08-25 Asahi Chem Ind Co Ltd 液状感光性樹脂の露光方法
WO1990015673A1 (fr) * 1989-06-12 1990-12-27 General Electric Company Unite d'impression laminaire de revêtement de substrats plats
US5554413A (en) * 1991-02-28 1996-09-10 Kabushiki Kaisha Toshiba Method of manufacturing electronic device and apparatus for manufacturing the same
US5804017A (en) * 1995-07-27 1998-09-08 Imation Corp. Method and apparatus for making an optical information record
US20010028426A1 (en) * 1995-10-16 2001-10-11 The Secretary Of State For Defence Bistable nematic liquid crystal device

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4127436A (en) * 1975-04-17 1978-11-28 E. I. Du Pont De Nemours And Company Vacuum laminating process
US4388137A (en) * 1978-12-07 1983-06-14 Mobil Oil Corporation Process for transfer coating with radiation-curable compositions
US4326010A (en) * 1979-06-15 1982-04-20 E. I. Du Pont De Nemours And Company Additive in a photopolymerizable composition for reducing its adhesion to a support film
JPS5835742A (ja) * 1981-08-21 1983-03-02 Victor Co Of Japan Ltd 情報記録媒体円盤の製作に用いられるスタンパの製作法
US4560578A (en) * 1981-11-12 1985-12-24 Scott Paper Company Method and apparatus for surface replication on a coated sheet material
US4601861A (en) * 1982-09-30 1986-07-22 Amerace Corporation Methods and apparatus for embossing a precision optical pattern in a resinous sheet or laminate
US4486363A (en) * 1982-09-30 1984-12-04 Amerace Corporation Method and apparatus for embossing a precision optical pattern in a resinous sheet
US4510593A (en) * 1982-10-18 1985-04-09 Minnesota Mining And Manufacturing Company Information disk of grooved, metal-coated crosslinked polymeric layer
US4758296A (en) * 1983-06-20 1988-07-19 Mcgrew Stephen P Method of fabricating surface relief holograms
US4512848A (en) * 1984-02-06 1985-04-23 Exxon Research And Engineering Co. Procedure for fabrication of microstructures over large areas using physical replication
US4790893A (en) * 1984-07-19 1988-12-13 Hallmark Cards, Inc. Replication of information carriers
GB8420182D0 (en) * 1984-08-08 1984-09-12 Pa Consulting Services Diffraction gratings
EP0228671A1 (fr) * 1985-12-23 1987-07-15 General Electric Company Procédé pour la fabrication d'un substrat revêtu, à caractéristiques de surface spécifiques
US5155604A (en) * 1987-10-26 1992-10-13 Van Leer Metallized Products (Usa) Limited Coated paper sheet embossed with a diffraction or holographic pattern
US4933120A (en) * 1988-04-18 1990-06-12 American Bank Note Holographics, Inc. Combined process of printing and forming a hologram
US5188863A (en) * 1989-06-30 1993-02-23 E. I. Du Pont De Nemours And Company Direct effect master/stamper for optical recording
US5279689A (en) * 1989-06-30 1994-01-18 E. I. Du Pont De Nemours And Company Method for replicating holographic optical elements
DE69022647D1 (de) * 1989-07-12 1995-11-02 Canon Kk Gerät zur Herstellung einer Substratschicht für optische Aufzeichnungsmedien, Verfahren zur Herstellung einer Substratschicht für optische Aufzeichnungsmedien, das Gebrauch davon macht, Gerät zur Herstellung eines optischen Aufzeichnungsmediums und Verfahren zur Herstellung eines optischen Aufzeichnungsmediums, das Gebrauch davon macht.
US5116548A (en) * 1989-08-29 1992-05-26 American Bank Note Holographics, Inc. Replicaton of microstructures by casting in controlled areas of a substrate
US5037668A (en) * 1989-12-18 1991-08-06 Mobil Oil Corporation Radiation cure release coatings without silicone
US5147938A (en) * 1991-04-02 1992-09-15 Minnesota Mining And Manufacturing Company Acrylate adhesives containing polymerizable fluorochemical surfactants
US5465176A (en) * 1991-12-19 1995-11-07 Control Module Inc. Method of embossing repeating patterns on a substrate, the patterns having different rates of repetition
KR0148669B1 (ko) * 1994-06-24 1998-11-16 가다오까 마사다까 액정소자, 그의 제조방법, 액정소자배향막의 형성방법, 액정소자배향막형성용 전사형, 그의 제조방법 및 배향막에 대한 요철모양의 전사장치
US5575878A (en) * 1994-11-30 1996-11-19 Honeywell Inc. Method for making surface relief profilers
US5597613A (en) * 1994-12-30 1997-01-28 Honeywell Inc. Scale-up process for replicating large area diffractive optical elements
US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5861113A (en) * 1996-08-01 1999-01-19 The United States Of America As Represented By The Secretary Of Commerce Fabrication of embossed diffractive optics with reusable release agent
US6150024A (en) * 1997-11-25 2000-11-21 Rexam Release, Inc. Acrylate release compositions and sheet materials having a release coating formed of the same
US6159398A (en) * 1998-03-31 2000-12-12 Physical Optics Corporation Method of making replicas while preserving master
US6252253B1 (en) * 1998-06-10 2001-06-26 Agere Systems Optoelectronics Guardian Corp. Patterned light emitting diode devices
US6605172B1 (en) * 1999-09-30 2003-08-12 The Procter & Gamble Company Method of making a breathable and liquid impermeable web
US6954275B2 (en) * 2000-08-01 2005-10-11 Boards Of Regents, The University Of Texas System Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US6387787B1 (en) * 2001-03-02 2002-05-14 Motorola, Inc. Lithographic template and method of formation and use
US6964793B2 (en) * 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US6858253B2 (en) * 2001-05-31 2005-02-22 3M Innovative Properties Company Method of making dimensionally stable composite article

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3918875A (en) * 1973-11-22 1975-11-11 Decca Ltd Record making press
JPS58143348A (ja) * 1982-02-19 1983-08-25 Asahi Chem Ind Co Ltd 液状感光性樹脂の露光方法
WO1990015673A1 (fr) * 1989-06-12 1990-12-27 General Electric Company Unite d'impression laminaire de revêtement de substrats plats
US5554413A (en) * 1991-02-28 1996-09-10 Kabushiki Kaisha Toshiba Method of manufacturing electronic device and apparatus for manufacturing the same
US5804017A (en) * 1995-07-27 1998-09-08 Imation Corp. Method and apparatus for making an optical information record
US20010028426A1 (en) * 1995-10-16 2001-10-11 The Secretary Of State For Defence Bistable nematic liquid crystal device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 007, no. 262 (P - 238) 22 November 1983 (1983-11-22) *

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CN1668440B (zh) 2010-06-16
GB0227221D0 (en) 2002-12-24
US20050150589A1 (en) 2005-07-14
CN1668440A (zh) 2005-09-14
US7824516B2 (en) 2010-11-02
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ATE545493T1 (de) 2012-03-15
EP1503888B1 (fr) 2012-02-15

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