WO2003074162A1 - Dispositif et procede de melange d'ozone - Google Patents

Dispositif et procede de melange d'ozone Download PDF

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Publication number
WO2003074162A1
WO2003074162A1 PCT/JP2003/002616 JP0302616W WO03074162A1 WO 2003074162 A1 WO2003074162 A1 WO 2003074162A1 JP 0302616 W JP0302616 W JP 0302616W WO 03074162 A1 WO03074162 A1 WO 03074162A1
Authority
WO
WIPO (PCT)
Prior art keywords
ozone
ozone gas
diffuser
water
pressure
Prior art date
Application number
PCT/JP2003/002616
Other languages
English (en)
Japanese (ja)
Inventor
Junji Mizutani
Original Assignee
Sasakura Engineering Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sasakura Engineering Co., Ltd. filed Critical Sasakura Engineering Co., Ltd.
Priority to KR10-2004-7013716A priority Critical patent/KR20040096648A/ko
Publication of WO2003074162A1 publication Critical patent/WO2003074162A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2326—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles adding the flowing main component by suction means, e.g. using an ejector
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • B01F25/3124—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow
    • B01F25/31241—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow the main flow being injected in the circumferential area of the venturi, creating an aspiration in the central part of the conduit
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • B01F25/3125—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characteristics of the Venturi parts
    • B01F25/31252—Nozzles
    • B01F25/312521—Adjustable Venturi nozzle
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2215/00—Auxiliary or complementary information in relation with mixing
    • B01F2215/04—Technical information in relation with mixing
    • B01F2215/0413—Numerical information
    • B01F2215/0436—Operational information
    • B01F2215/0468—Numerical pressure values
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/78—Details relating to ozone treatment devices
    • C02F2201/784—Diffusers or nozzles for ozonation

Definitions

  • the present invention relates to an ozone mixing apparatus and an ozone mixing method for producing ozone water used for cleaning semiconductors by mixing and dissolving ozone gas in ultrapure water.
  • Ezek Yu is known as this kind of gas-liquid mixing device.
  • the ejector is generally composed of a nozzle 10, a suction chamber 11, and a diffuser 12, as shown in FIG. 2, and a high-pressure liquid is ejected from the nozzle 10 to the suction chamber 11 to suction the liquid.
  • a high-pressure liquid is ejected from the nozzle 10 to the suction chamber 11 to suction the liquid.
  • the gas is sucked into the suction chamber 11 from the gas suction port 11a provided in the suction chamber 11, and the liquid and the gas are discharged from the diffuser 12 in a mixed state. I do.
  • ozone water obtained by mixing and dissolving ozone gas in ultrapure water has been used for cleaning semiconductor components.However, ozone treatment effects such as cleaning have been improved, and the treatment time has been reduced.
  • the ozone concentration of ozone water is set to a high concentration of, for example, 20 ppm or more.
  • the ratio of the flow rate of the ozone gas to the flow rate of the ultrapure water ((ozone gas flow rate / ultra pure water flow rate) is required to increase the contact ratio of the ozone gas.
  • the “liquid-gas ratio” is increased, and the pressure of the ozone gas is increased to about 0.3 MPa in order to increase the amount of ozone gas sucked into the suction chamber.
  • a pressurizing pump is additionally provided to compensate for the pressure loss.
  • a pressurized pump is added, there is a possibility that particles (contaminants) may enter the ultrapure water from the pump and contaminate the ultrapure water with metal when cleaning precision electronic components such as semiconductors. There was a problem of increasing.
  • the present invention provides an ozone mixing apparatus and an ozone mixing method that can reduce the pressure loss, increase the liquid-to-gas ratio, and dissolve ozone gas of a predetermined concentration in water even when the gas pressure is reduced. With the goal.
  • An object of the present invention is to provide a chamber having an inlet for pressurized water, a diffuser portion communicating with the chamber, and an opening which is inserted into the chamber and opens toward the inlet of the diffuser portion.
  • An ozone gas supply pipe wherein the tip of the ozone gas supply pipe forms a throttle member for narrowing a flow path leading to an inlet of the diffuser section.
  • the ozone gas supply pipe is provided so as to be able to adjust a distance between a tip end thereof and an inlet of the diffuser so that the amount of throttle by the throttle member can be adjusted.
  • the tip of the ozone gas supply pipe has a conical outer shape
  • the champ has a frustoconical tapered flow passage that fits the tip, and the distal end of the tapered flow passage is formed of the diffuser. Preferably, it communicates with the inlet.
  • FIG. 1 is a sectional view showing an embodiment of an ozone mixing apparatus according to the present invention.
  • FIG. 2 is a cross-sectional view showing a conventional ejector. BEST MODE FOR CARRYING OUT THE INVENTION
  • the ozone mixing device 1 includes a chamber 13 having an inlet 2 for pressurized ultrapure water, a diffuser 4 communicating with the chamber 13, and an inlet 4 a of the diffuser 4 inserted into the chamber 13. And an ozone gas supply pipe 5 that opens toward the container.
  • the ozone gas supply pipe 5 is not for the purpose of ejecting the fluid at a high speed like the nozzle in the conventional ejector, but is merely for supplying the ozone gas at a constant flow rate. Accordingly, the flow path of the ozone gas supply pipe 5 forms a nozzle that is gradually narrowed in the illustrated example, but may be a through-hole having the same flow path cross section without a throttle.
  • the rear end of the ozone gas supply pipe 5 is connected to an ozone generator (not shown) by a tube (not shown), and the ozone gas is sent in the direction of arrow X in the figure.
  • O Zongasu from ozone generator for example, about 0. 0 5 to about 0. 2 MP a about 0. 4 to about 4 0 L N Z min and pressurized to (gauge pressure) (L N is the standard Sent in liters of state).
  • the tip 5a of the ozone gas supply pipe 5 has a conical outer shape in the illustrated example, and its top is open toward the inlet 4a of the diffuser 4.
  • the chamber 3 has a frusto-conical tapered channel portion 3a having a taper equivalent to the tip portion 5a, and the tapered channel portion 3a communicates with the inlet portion 4a of the diffuser portion 4. I have.
  • the distal end portion 5a of the ozone gas supply pipe 5 is inserted into the tapered flow channel portion 3a to form a throttle member that narrows the tapered flow channel portion 3a leading to the inlet portion 4a of the diffuser portion 4.
  • the pressurized water (ultra-pure water) flowing into the chamber 13 increases its flow velocity and decompresses when passing through the narrowed flow path, that is, the minute gap X, and is jetted to the diffuser section 4 to be decelerated at the diffuser section. Pressurized.
  • the ultrapure water sent to the inlet 2 is preferably about 0.1 to about 0.3 MPa (gauge pressure) and about 1 to about 100 L / min by a water pump (not shown). New
  • the minute gap X formed between the distal end portion 5a of the ozone gas supply pipe 5 and the tapered flow passage portion 3a gradually reduces the cross-sectional area of the flow passage. Make up. It is preferable that the fine gap X gradually reduces the cross-sectional area of the flow path as shown in the example in order to increase the speed of ultrapure water passing therethrough.
  • the ozone gas supply pipe 5 can adjust the amount of throttle by the tip 5a, that is, the size of the minute gap X. The distance between the tip 5a and the inlet 4a of the diffuser 4 can be adjusted. It is provided in.
  • a screw portion 5b is formed on an outer peripheral portion of the ozone gas supply pipe 5, and the screw portion 5b is screw-coupled to a support 6 supporting a part of the ozone gas supply pipe 5. . Therefore, if the ozone gas supply pipe 5 is rotated around the axis, the tip 5a moves in the axial direction corresponding to the pitch of the screw 5b, and the size of the minute gap X can be adjusted.
  • reference numeral 7 indicates an O-ring.
  • ultrapure water pressurized by a pump or the like enters the chamber 13 from the inlet 2 at a predetermined flow rate, passes through the minute gap X, and diffuses. Injected into one part 4.
  • the five ozone gas supply pipes discharge the ozone gas at a predetermined flow rate toward the inlet 4 a of the diffuser 4.
  • the pressure of ultrapure water that has passed through the small gap X decreases due to the nozzle action of the small gap. Therefore, by adjusting the minute gap X and reducing the pressure of the ultrapure water near the outlet of the ozone gas supply pipe 5 to a pressure equal to or less than the pressure of the ozone gas in the ozone gas supply pipe 5, the ozone gas supply pipe 5 Ozone gas is likely to be discharged and mixed easily.
  • the ozone gas is entrained and mixed in the ultrapure water jetted to the diffuser section 4 in a mist.
  • the state of the ozone gas spray can be optimized by adjusting the minute gap. That is, according to the flow rate and pressure of the ultrapure water, the flow rate of the ozone gas, etc., the amount of fine bubbles in the mist-blowing section 4 is increased, and the size of the minute gap X is adjusted. Promotes mixing. What Although the champer 3 constitutes a flow path of ultrapure water, it does not function as a suction chamber like a conventional ejector.
  • ozone water was produced under the following conditions. Throat diameter of the diff user part: 2.2 mm ⁇
  • Ozone gas concentration 210 g / m 3 N (m 3 N is a standard cubic meter)
  • Ozone gas flow rate 0.8 L N / min
  • the second embodiment is an example in which the flow rate of the ozone gas is increased as compared with the first embodiment.
  • Throat diameter of the diff user part 2.2 mm ⁇
  • Comparative Example 1 Using the conventional ejector shown in Fig. 2, ozone gas was mixed with ultrapure water under the following conditions.
  • the diffuser, nozzle and suction chamber of the ejector had the same dimensions as the corresponding parts of the ozone mixing device in Fig. 1.
  • Throat diameter of the diffuser 2.2 ⁇
  • Ozone concentration of ozone water 32 ppm
  • ozone water was produced under the following conditions.
  • Throat diameter of the diff user part 2.2 mm ⁇
  • Comparative Example 2 is an example in which the pressure of the ultrapure water was reduced as compared with Comparative Example 1 (the additional pressure pump was removed).
  • the ultrapure water flow rate was 3 L / min in Comparative Example 1, but was 1.5 in Comparative Example 2.
  • the ozone water has an ozone concentration of 2 Oppm or more, and the pressure loss is 0.2 MPa or less.
  • the pressure of the ozone gas was also 0.06 MPa and 0.08 MPa, and this level of pressure did not impede the ozone gas generator. No special pressure-resistant structure is required.
  • the pressure loss was reduced by making the pressure of the ultrapure water the same level as that of the example without the additional pressure pump, but the ozone concentration of the ozone water was 16 ppm, and the semiconductor 20 ppm required for washing has not been reached.
  • the pressure of the ultrapure water is suppressed to be lower than in the case of producing ozone water using a conventional ejector. Produce high-concentration ozone water by eliminating the increase in pressure equipment, suppressing ozone gas pressure and preventing damage to the ozone generator, and increasing the ratio of ozone gas flow to ultrapure water flow. Can be.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)

Abstract

L'invention concerne un dispositif et un procédé de mélange d'ozone, ce qui consiste à dissoudre une concentration prédéterminée d'ozone gazeux dans de l'eau avec une perte de pression moindre, même si le rapport liquide-gaz est augmenté et la pression gazeuse limitée. Ce dispositif (1) comprend une chambre (3) possédant un orifice d'entrée (2) de l'eau sous pression, un diffuseur (4) communicant avec la chambre (3) et un conduit d'alimentation (5) en ozone gazeux inséré dans la chambre (3) et débouchant sur l'orifice d'entrée du diffuseur (4), l'extrémité avant de ce conduit (5) créant un étranglement rétrécissant le conduit d'écoulement conduisant à l'orifice d'entrée du diffuseur (4). De ce fait, de l'eau ultra pure présentant une pression manométrique de 0,1 à 0,3 MPa peut pénétrer dans l'orifice d'entrée (2), tandis que l'ozone gazeux, dont la pression manométrique est entre 0,05 et 0,2 MPa alimente le conduit d'alimentation (5).
PCT/JP2003/002616 2002-03-07 2003-03-06 Dispositif et procede de melange d'ozone WO2003074162A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR10-2004-7013716A KR20040096648A (ko) 2002-03-07 2003-03-06 오존혼합장치 및 오존혼합방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002062470A JP4206676B2 (ja) 2002-03-07 2002-03-07 オゾン混合装置及びオゾン混合方法
JP2002/62470 2002-03-07

Publications (1)

Publication Number Publication Date
WO2003074162A1 true WO2003074162A1 (fr) 2003-09-12

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/002616 WO2003074162A1 (fr) 2002-03-07 2003-03-06 Dispositif et procede de melange d'ozone

Country Status (4)

Country Link
JP (1) JP4206676B2 (fr)
KR (1) KR20040096648A (fr)
TW (1) TW589226B (fr)
WO (1) WO2003074162A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418156A (en) * 2004-09-17 2006-03-22 Biotek Technology Corp Pressurized gas-water mixer
WO2012096719A1 (fr) * 2011-01-14 2012-07-19 Earthclean Corporation Système éducteur

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004033908A (ja) * 2002-07-03 2004-02-05 Fuji Electric Holdings Co Ltd オゾン散気装置
ES2283158B1 (es) * 2003-11-10 2008-09-16 Universidad De Sevilla Procedimiento y dispositivo para la generacion de espumas y emulsiones mediante pares de tubos enfrentados.
US7622509B2 (en) * 2004-10-01 2009-11-24 Velocys, Inc. Multiphase mixing process using microchannel process technology
EP1647325A1 (fr) * 2004-10-12 2006-04-19 Biotek Technology Corp. Mélangeur gas-eau pressurisé
US8568018B2 (en) 2007-12-20 2013-10-29 Rave N.P., Inc. Fluid injection assembly for nozzles
FR2944218B1 (fr) * 2009-04-09 2012-06-15 Total Sa Dipositif ejecteur pour former un melange sous pression de liquide et de gaz, et compresseur de gaz comprenant un tel dispositif ejecteur
KR101127077B1 (ko) * 2009-12-15 2012-03-22 위성수 마이크로 버블 디퓨져
TWI458559B (zh) * 2011-02-09 2014-11-01 China Steel Corp 氣液混合式噴嘴裝置
EP2554273A1 (fr) * 2011-08-02 2013-02-06 Omya Development AG Dispositif de buse d'atomisation et son utilisation
CN103990394B (zh) * 2014-04-30 2016-06-15 重庆优楷科技有限公司 一种用于污水处理过程中的离心射流装置
CN105152304A (zh) * 2015-07-24 2015-12-16 长春黄金研究院 一种采用臭氧法处理尾矿浆或废水的反应器
EP3546059B8 (fr) * 2018-03-28 2023-06-21 L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude Appareil et système pour introduire un gaz dans un milieu principal en particulier dans le traitement des eaux usées

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378673U (fr) * 1976-12-03 1978-06-30
JPH0348023U (fr) * 1989-09-19 1991-05-08
JPH03238032A (ja) * 1990-02-14 1991-10-23 Takuo Mochizuki 異種流体接触混合溶解量調節装置
JPH11197475A (ja) * 1997-10-28 1999-07-27 Idec Izumi Corp 気液溶解混合装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5378673U (fr) * 1976-12-03 1978-06-30
JPH0348023U (fr) * 1989-09-19 1991-05-08
JPH03238032A (ja) * 1990-02-14 1991-10-23 Takuo Mochizuki 異種流体接触混合溶解量調節装置
JPH11197475A (ja) * 1997-10-28 1999-07-27 Idec Izumi Corp 気液溶解混合装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418156A (en) * 2004-09-17 2006-03-22 Biotek Technology Corp Pressurized gas-water mixer
WO2012096719A1 (fr) * 2011-01-14 2012-07-19 Earthclean Corporation Système éducteur

Also Published As

Publication number Publication date
TW200303784A (en) 2003-09-16
TW589226B (en) 2004-06-01
KR20040096648A (ko) 2004-11-16
JP2003260342A (ja) 2003-09-16
JP4206676B2 (ja) 2009-01-14

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