玖、發明說明 (}月說明應欽明.發明所屬之技術領域先前技術、内容、實施方式及圓式簡舉說明） 【發明所屬技術領域】 發明領域 本發明係有關於一種用以將臭氧混合、溶解於超純水 而製造使用於半導體清洗等之臭氧水之臭氧混合裝置及臭 氧混合方法。发明 Description of the invention (The description of the month should be made clear. The prior art, content, embodiments, and brief description of the technical field to which the invention belongs) [Technical Field to which the Invention belongs] The present invention relates to a method for mixing ozone, An ozone mixing device and an ozone mixing method that dissolve in ultrapure water to produce ozone water used in semiconductor cleaning and the like.
L· jtyr J 發明背景 迄今，這種氣液混合裝置之喷射器係已知的。一般而 言’喷射器係如第2圖所示，由喷嘴1〇、吸引室u、及擴 散器12所構成，並藉使高壓之液體由喷嘴1〇喷射至吸引 室11，再減壓吸引室11之壓力，而可將氣體由設置於吸 引至11之氣體吸入口 11a吸引至吸引室η，並由擴散器 12在液體與氣體相混合之狀態下吐出。 近年來，在半導體製造領域中，半導體零件之清洗係 使用將臭氧混合、溶解於超純水之臭氧水，但為了提高清 洗等之臭氧處理效果，還有縮短處理時間，係將臭氧水之 臭氧濃度定在如20ppm以上之高濃度。 要使用喷射器製造如前述之高濃度臭氧水，為了要提 高臭氧之接觸比例，而增加臭氧流量對超純水流量之比例 ((臭氧流量/超純水流量），以下稱為「液·氣比」），同時 為了增加吸引至吸引室之臭氧量，而將臭氧之壓力提高到 0.3MPa 左右。 然而，習知之喷射器中，當增加氣體流量對液體流量 589226 玖、發明說明 之比例日τ，在擴散器之壓力損失會變大，且為了要彌補其 麼力損失’則必須增設加麼栗等。若增設加壓栗，當清洗 半導體等精密電子零件時，會有微粒（污染物）由栗混入超 純水之可能性、或超純水因金屬而受到污染之可能性增加 5 專問題。 又’為了提高臭氧之壓力，除了要求臭氧產生裝置之 耐壓構造，且使用電解法產生臭氧時，恐怕亦有於電解膜 產生小孔而使大量的臭氧侵入氧室等問題。 |[ Jj 10 發明之揭示 因此’本發明之目# ’即在提供—種可縮小壓力損失 、並放大液·氣比’且即使減少氣壓亦可將預定濃度之臭 氧溶解於水之臭氧混合裝置及臭氧混合方法。 15L. jtyr J BACKGROUND OF THE INVENTION So far, ejectors of such gas-liquid mixing devices are known. Generally speaking, the 'injector' is composed of a nozzle 10, a suction chamber u, and a diffuser 12, as shown in FIG. 2, and a high-pressure liquid is sprayed from the nozzle 10 to the suction chamber 11, and then suction is reduced in pressure. The pressure of the chamber 11 can suck the gas from the gas suction port 11a provided to the suction chamber 11 to the suction chamber η, and spit out the diffuser 12 in a state where the liquid and the gas are mixed. In recent years, in the field of semiconductor manufacturing, the cleaning of semiconductor parts uses ozone water that is mixed with ozone and dissolved in ultrapure water. However, in order to improve the ozone treatment effect of cleaning and the like, and to shorten the treatment time, it is the ozone of ozone water. The concentration is set to a high concentration such as above 20 ppm. To use the ejector to produce high-concentration ozone water as described above, in order to increase the exposure ratio of ozone, increase the ratio of ozone flow to ultrapure water flow ((ozone flow / ultrapure water flow), hereinafter referred to as "liquid · gas Ratio "), and in order to increase the amount of ozone attracted to the suction chamber, the ozone pressure was increased to about 0.3 MPa. However, in the conventional ejector, when increasing the gas flow rate to the liquid flow rate 589226 玖, the proportional day τ of the invention description, the pressure loss in the diffuser will increase, and in order to make up for its loss of force, you must add an additional pump. Wait. If a pressurized pump is added, when cleaning precision electronic parts such as semiconductors, there is a possibility that particles (contaminants) will be mixed into the ultrapure water from the pump, or the possibility that the ultrapure water will be contaminated by metal increases. 5 Special problems. In addition, in order to increase the pressure of ozone, in addition to the pressure-resistant structure of the ozone generating device, and when the ozone is generated by the electrolytic method, there may be problems such as the formation of small holes in the electrolytic membrane and a large amount of ozone invading the oxygen chamber. [[Jj 10 Invention of the invention Therefore 'the purpose of this invention #' is to provide-an ozone mixing device that can reduce pressure loss and enlarge liquid-to-air ratio "and can dissolve ozone of a predetermined concentration in water even if the air pressure is reduced And ozone mixing method. 15
本發明之前述目的可藉由臭氧混合裝置而達成，該臭 氧混合裝置之特徵在於：具有—設有加壓水之流入口之室 、-與前述室連通之擴散器、及—插人於前述室内且朝前 述擴散部之人Π部開σ之臭氧供給管，並且該臭氧供給管 之前端部形成有通過前述擴散部之人σ部之流 路之縮小構件。 20 ⑽地’前述臭氧供給管可調節其前端部與前述擴散 部之入口部之間的距離’以調節前述縮小構件之縮小量。 又較仏地，則述臭氧供給管之前端部具有圓錐狀之 外形，而前述室具有適合前述前端部之圓錐台狀之前細流 部，且該前細流部之前端係與前述擴散部之入口部連通。 6 589226 玖、發明說明 另’較佳地，使計示壓力約〇1〜約〇jMpa之水流入 前述流入口，並且將計示壓力約〇 〇5〜約〇 2MPa之臭氧供 給前述臭氧供給管。 圖式簡單說明 5 第1圖係顯示有關本發明之臭氧混合裝置之一實施形 態之截面圖。 第2圖係顯示習知之喷射器之截面圖。 【實施方式】 馨 發明實施之最佳形態 10 以下參照第1圖所示之截面圖說明有關本發明之臭氧 混合裝置之較佳實施形態。 臭氧混合裝置1包含有：一具有業經加壓之超純水之 流入口 2之室3、一與室3連通之擴散部4、及一插入於室 3内並朝擴散部4之入口部如開口之臭氧供給管5。 15 臭氧供給管5並非如習知之位於喷射器之喷嘴，以高 速喷出流體為目的者，而是單單以固定之流量供給臭氧者 · 。因此，臭氧供給管5之流路在圖示例中形成漸漸縮小之 喷嘴’但亦可作成無縮小之相同流路截面之通孔。 臭氧供給管5之後端部係藉管（未圖示）與圖外之臭氧 20產生裝置連接，並朝圖之箭頭X方向傳送臭氧。臭氧由臭 氧產生裝置加壓成如約〇·〇5〜約0.2MPa(計示壓力），且以 約0.4〜40 LN/分(Ln為標準狀態之公升）傳送。 圖示例中，臭氧供給管5之前端部5a係具有圓錐狀之 外形’且頂部朝擴散部4之入口部4a開口。室3則具有一 7 玖、發明說明 具2與前端部5a相同錐部之圓錐台狀之前細流路部3a， 且前細流路部3a連通於擴散部4之入口部4a。 而臭氧供給管5之前端部5a係插入前細流路部3a， ^形成有縮小通過擴散部4之入口部4a之前細流部仏之 縮J構件。流入室3之加廢水（超純水）在通過其縮小之流 路即微小間隙X時，會增加流速同時進行減壓，並於擴 政。卩4喷出，且在擴散部減速並進行加壓。送往流入口 2 之超純水宜利用送水泵（不圖示）以約〇丨〜約〇3Mpa(計示壓 力）而為約1〜約100 L /分。 圖不例中，臭氧供給管5之前端部5a與前細流路部 3a之間所形成之微小間隙X係漸漸縮小流路截面積，而構 成實質之噴嘴。為了使通過微小間隙Χ之超純水增速，微 h間隙X宜如圖示例，為漸漸地縮小流路截面積者。 又，設置有臭氧供給管5,係可調節前端部5a與擴散 邛4之入口部4a之間的距離，以調節前端部以之縮小量 ，即微小間隙X之大小。 圖不例中，於臭氧供給管5之外周部形成有螺絲部％ ，且该螺絲部5b係與支持臭氧供給管5之一部份之支持體 6螺合。因此，若使臭氧供給管在軸圈上轉動，則可對應 於螺絲部5b之螺距，使前端部5a往軸線方向移動，並可 調節微小間隙X之大小。再者，圖中，符號7係表示〇環 具有上述構造之臭氧混合裝置丨中，藉圖外之泵等加 壓之超純水係以固定流量由流入口 2進入室3内，並通過 坎、發明說明 小間隙X而往擴散部4喷射。另_方面，臭氧 θ q叫，天， 1由臭氧供給管5朝擴散部4之人口部4a排出. 、、，、通過微小間隙X之超純水係藉微小間隙之嘴嘴作用而 減少壓力。因此，可考慮若調節微小間隙X，|將臭氧供 給管5出π附近之超純水㈣力，降低至與純供給管: 内之臭乳壓力同等以下之壓力，則來自臭氧供給管5之臭 氧可輕易排出並輕易混合。 、 、如此，臭氧呈噴霧狀捲人於由擴散部4嘴出之超純水 三並加以混合。臭氧之喷霧狀態係可藉微小_ X之的調 節而達到最適化。g卩，依超純水之流量或壓力、臭氧之流 、等在擴政^ 4之嘴霧狀微泡會變多，然後調節微小間 Γ之幻並促進臭氧之混合。再者，室3構成超純水之 抓路’但不具有作為如習知之喷射器之吸引室的效用。 實施例1 係使用第1圖所示之臭氧混合裝置，且藉以下條件製 造臭氧水。 喷射部喉部之 臭氧供給管之 臭氧濃度： 臭氧流量： 臭氧壓力： 超純水流量： 超純水壓力： 口徑：2.2 mm 0 0徑·· 1·5 mm . 210 g/m n (m n為標準立方公尺) 0·8 Ln/分 0.06 MPa 3 L/分 0.2 MPa 589226 玖、發明說明 臭氧水之臭氧濃度：2 5 ppm 臭氧水壓力： 0.1 MPa 壓力損失： 0.1 MPa (壓力損失=〔超純水壓力〕一〔臭氧水壓力〕） 5 實施例2 係使用第1圖所示之臭氧混合裝置，且藉以下條件製 造臭氧水。實施例2係較實施例1增加臭氧流量之例。 喷射部喉部之口徑：2.2 mm 0 ·The foregoing object of the present invention can be achieved by an ozone mixing device, which is characterized by having a chamber provided with an inlet for pressurized water, a diffuser communicating with the aforementioned chamber, and-inserting a person into the aforementioned An ozone supply pipe of σ is opened indoors toward the person Π of the diffusion section, and a narrowing member of the flow path of the person σ section of the diffusion section is formed at the front end of the ozone supply tube. 20 ⑽ The 'the ozone supply pipe can adjust the distance between the front end portion and the entrance portion of the diffusion portion' to adjust the reduction amount of the reduction member. Also, the front end of the ozone supply pipe has a conical outer shape, and the chamber has a truncated cone-shaped front thin flow portion suitable for the front end portion, and the front end of the front thin flow portion is connected to the inlet portion of the diffusion portion. Connected. 6 589226 发明 Description of the invention In addition, it is preferable that water having a gauge pressure of about 〇1 ~ about 0jMpa flows into the aforementioned inflow port, and ozone having a gauge pressure of about 005 ~ about MPa is supplied to the aforementioned ozone supply pipe. . Brief description of the drawings 5 Fig. 1 is a sectional view showing an embodiment of an ozone mixing device according to the present invention. Fig. 2 is a sectional view showing a conventional ejector. [Embodiment] The best mode for implementing the invention 10 Hereinafter, a preferred embodiment of the ozone mixing device according to the present invention will be described with reference to the sectional view shown in FIG. The ozone mixing device 1 includes a chamber 3 having an inlet 2 for pressurized ultrapure water, a diffusion part 4 communicating with the chamber 3, and an inlet part inserted into the chamber 3 and facing the diffusion part 4, such as Opened ozone supply pipe 5. 15 The ozone supply pipe 5 is not located at the nozzle of the ejector, as is conventionally known, for the purpose of ejecting fluid at high speed, but for supplying ozone at a fixed flow rate alone. Therefore, the flow path of the ozone supply pipe 5 is formed with a nozzle gradually reduced in the example shown in the figure, but a through hole having the same flow path cross section without reduction may be formed. The rear end of the ozone supply pipe 5 is connected to an ozone 20 generating device (not shown) through a pipe (not shown), and transmits ozone in the direction of arrow X in the figure. The ozone is pressurized by the ozone generating device to have a pressure of, for example, about 0.05 to about 0.2 MPa (calculated pressure), and is transmitted at about 0.4 to 40 LN / min (Ln is a liter in a standard state). In the example shown in the figure, the front end portion 5a of the ozone supply pipe 5 has a conical shape 'and the top portion opens toward the entrance portion 4a of the diffusion portion 4. The chamber 3 has a truncated cone-shaped front narrow flow path portion 3a having the same tapered portion as the front end portion 5a, and the front narrow flow path portion 3a communicates with the inlet portion 4a of the diffusion portion 4. On the other hand, the front end portion 5a of the ozone supply pipe 5 is inserted into the front thin flow path portion 3a, and a shrinkage member J is formed to narrow the narrow flow portion before passing through the inlet portion 4a of the diffusion portion 4. When the waste water (ultra-pure water) flowing into the chamber 3 passes through the narrow gap X, which is the small gap X, it will increase the flow rate and reduce the pressure at the same time, and expand it. Krypton 4 is ejected, decelerates and pressurizes at the diffusion portion. The ultrapure water sent to the inflow port 2 should be about 1 ~ about 100 L / min with a water pump (not shown) at about 〇 丨 ~ about 〇3Mpa (calculated pressure). In the example shown in the figure, the small gap X formed between the front end portion 5a of the ozone supply pipe 5 and the front thin flow path portion 3a gradually decreases the cross-sectional area of the flow path to form a substantial nozzle. In order to increase the speed of ultrapure water passing through the small gap X, the micro-h gap X should be as shown in the example, which is to gradually reduce the cross-sectional area of the flow path. In addition, an ozone supply pipe 5 is provided to adjust the distance between the front end portion 5a and the inlet portion 4a of the diffuser 邛 4 to adjust the amount by which the front end portion is reduced, that is, the size of the small gap X. In the example shown in the figure, a screw portion% is formed on the outer peripheral portion of the ozone supply pipe 5, and the screw portion 5b is screwed with a support 6 that supports a part of the ozone supply pipe 5. Therefore, if the ozone supply pipe is rotated on the shaft ring, the tip portion 5a can be moved in the axial direction corresponding to the pitch of the screw portion 5b, and the size of the minute gap X can be adjusted. In the figure, the symbol 7 indicates that in the ozone mixing device having the above-mentioned structure in the 0 ring, ultra-pure water pressurized by a pump such as the one shown in the figure enters the chamber 3 from the inlet 2 at a fixed flow rate and passes through the DESCRIPTION OF THE INVENTION The small gap X is ejected toward the diffusion portion 4. On the other hand, the ozone θ q is called, the day, 1 is discharged from the ozone supply pipe 5 to the population section 4a of the diffusion section 4. The ultrapure water passing through the micro gap X is reduced by the action of the mouth of the micro gap . Therefore, if the micro gap X is adjusted, it can be considered that the pressure of the ultrapure water near the π of the ozone supply pipe 5 is reduced to a pressure equal to or less than the pressure of the stinky milk in the pure supply pipe: Ozone can be easily emitted and easily mixed. In this way, the ozone is sprayed into the ultra-pure water 3 from the mouth of the diffuser 4 and mixed. The spray state of ozone can be optimized by adjusting the minor X. g 卩, according to the flow or pressure of ultrapure water, the flow of ozone, etc., the number of mist-like microbubbles in the mouth of the expansion ^ 4 will increase, and then adjust the magic of the small space Γ and promote the mixing of ozone. Furthermore, the chamber 3 constitutes a grasping path 'of ultrapure water, but does not function as a suction chamber of a conventional ejector. Example 1 uses the ozone mixing device shown in Fig. 1 and produces ozone water under the following conditions. The ozone concentration of the ozone supply pipe in the throat of the spraying section: Ozone flow rate: Ozone pressure: Ultrapure water flow rate: Ultrapure water pressure: Caliber: 2.2 mm 0 0 diameter ·· 1.5 mm. 210 g / mn (mn is the standard Cubic meters) 0 · 8 Ln / min 0.06 MPa 3 L / min 0.2 MPa 589226 玖, description of the ozone concentration of ozone water: 2 5 ppm ozone water pressure: 0.1 MPa pressure loss: 0.1 MPa (pressure loss = [ultra-pure Water pressure]-[Ozone water pressure]) 5 Example 2 The ozone mixing device shown in Fig. 1 was used, and ozone water was produced under the following conditions. Example 2 is an example of increasing the ozone flow rate as compared with Example 1. Diameter of jet throat: 2.2 mm 0 ·
臭氧供給管之口徑：1.5mm 10 臭氧濃度·· 210 g/m3N 臭氧流量： 1.8 LN/分 臭氧壓力： 0.08 MPa 超純水流量： 3 L/分 超純水壓力： 0.25 MPa 臭氧水之臭氧濃度：33 ppm φ 臭氧水壓力： 0.1 MPa 壓力損失： 0.15 MPa 例 1 係使用第2圖所示之習知之喷射器，且藉以下條件混 合臭氧與超純水。喷射器之擴散器、喷嘴、及吸引室係使 用與第1圖之臭氧混合裝置之對應部分相同規格者。 噴射部喉部之口徑·· 2.2 mm 0 水噴射喷嘴之口徑：1.5mm 10 589226 玖、發明說明 臭氧濃度： 臭氧流量： 臭氧壓力： 超純水流量： 5 超純水壓力： 210 g/m3N(m3N為標準立方公尺) 1·7 LN/分 0.06 MPa 3 L/分 0.5 MPa 15 臭氧水之臭氧濃度：32 ppm 臭氧水壓力： 0.1 MPa 壓力損失： 0.4 MPa 比較例2 係使用與比較例1相同之習知之喷射器，且藉以下條 件製造臭氧水。 喷射部喉部之口徑：2.2 mm必 水喷射喷嘴之口徑·· 1.5 mm 210 g/m3N (m3N為標準立方公尺） 0.2 Ln/分 0.06 MPa 1·5 L/分 0.25 MPaDiameter of ozone supply pipe: 1.5mm 10 Ozone concentration · 210 g / m3N Ozone flow rate: 1.8 LN / min Ozone pressure: 0.08 MPa Ultrapure water flow rate: 3 L / min Ultrapure water pressure: 0.25 MPa Ozone concentration of ozone water : 33 ppm φ Ozone water pressure: 0.1 MPa Pressure loss: 0.15 MPa Example 1 The conventional ejector shown in Figure 2 was used, and ozone and ultrapure water were mixed under the following conditions. The diffuser, nozzle, and suction chamber of the ejector are those having the same specifications as the corresponding parts of the ozone mixing device in Fig. 1. The diameter of the throat of the spraying section ·· 2.2 mm 0 The diameter of the water spraying nozzle: 1.5mm 10 589226 玖, description of the invention ozone concentration: ozone flow rate: ozone pressure: ultrapure water flow rate: 5 ultrapure water pressure: 210 g / m3N ( m3N is the standard cubic meter) 1 · 7 LN / min 0.06 MPa 3 L / min 0.5 MPa 15 Ozone concentration of ozone water: 32 ppm Ozone water pressure: 0.1 MPa Pressure loss: 0.4 MPa Comparative Example 2 Use and Comparative Example 1 The same conventional ejector was used to produce ozone water under the following conditions. The diameter of the throat of the jetting section: 2.2 mm The diameter of the water jetting nozzle · 1.5 mm 210 g / m3N (m3N is the standard cubic meter) 0.2 Ln / min 0.06 MPa 1.5 L / min 0.25 MPa
臭氧濃度： 臭氧流量： 臭氧壓力： 超純水流量 超純水壓力Ozone concentration: Ozone flow: Ozone pressure: Ultrapure water flow Ultrapure water pressure
臭氧水之臭氧濃度：16 ppm 臭氧水壓力： 0.1 MPa 壓力損失： 0.15 MPa 比較例2與比較例1相比，係降低超純水壓例之例（避 11 20 玖、發明說明 開加壓泵增設部分） 超純水流量在比較例1中係3 L/分，但在比較例2中 係減少1.5 L/分，同時往臭氧之吸引室的吸入流量在比較 例1中係1.7 LN/分，但在比較例2中係降低至〇.2 LN/分。 5 此時’為了不超過〇·〇6 MPa之臭氧壓力而減少臭氧產生量 〇 若參照前述之實施例1與實施例2，可判斷臭氧水皆 確保20Ppm以上之臭氧濃度，而壓力損失在〇 2 MPa以下 〇 1〇 又’實施例1、2中，臭氧之壓力亦為〇.〇6 MPa、0.08 MPa，且該程度之壓力係不會對臭氧產生裝置造成故障之 程度’又，也是於臭氧產生裝置中不須特別的耐壓構造之 程度。 更進一步，即使在實施例i、2中將臭氧流量由〇 8 15 Ln/为增加為1.8 LN/分，實施例2之壓力損失亦在〇15 MPa ’與得到相同臭氧濃度之比較例1相比較亦非常小， 且為不需要為彌補壓力損失而增設加壓泵等之範圍。 相對於此，若參照比較例1，若作成欲得到與實施例2 相同等級之臭氧濃度之臭氧水，則必須增設加壓泵且增加 2〇超純水之壓力至0·5 MPa，此時會產生〇·4 MPa之壓力損失 〇 比較例2中則不增設加壓泵，將超純水之壓力作成與 實施例相同等級之壓力，並減少壓力損失，但臭氧水之臭 氧濃度為16ppm，未達到半導體清洗中必要之2〇ppm。 12 589226 玖、發明說明 由前述實施例可知，若根據本發明之臭氧混合裝置及 臭氧混合，與使用習知之喷射器製造臭氧水之情況比較， 可抑制超純水之壓力使之降低，且不須增加加壓設備，並 抑制臭氧之壓力且防止對臭氧產生裝置之損害，而且，可 5 增加相對於超純水流量之臭氧水流量之比率，且製造高濃 度之臭氧水。 【圖式簡單說明3 第1圖係顯示有關本發明之臭氧混合裝置之一實施形 態之截面圖。 10 第2圖係顯示習知之喷射器之截面圖。 【圖式之主要元件代表符號表】 11…吸引室 11a"·氣體吸入口 12···擴散器 X…微小間隙 1…臭氧混合裝置 2…(超純水)流入口 3···室 3a.··前細流部 4…繼部 4a. · ·入口部 5...臭氧供給管 5a…前端部 5b· · ·螺絲部 6· · ·支持體 7···0 環 10···喷嘴 13Ozone concentration of ozone water: 16 ppm Ozone water pressure: 0.1 MPa Pressure loss: 0.15 MPa Comparative Example 2 is an example of reducing the ultrapure water pressure compared to Comparative Example 1 (avoid 11 20 玖, description of the invention opens the pressure pump) (Additional part) The flow rate of ultrapure water was 3 L / min in Comparative Example 1, but it was reduced by 1.5 L / min in Comparative Example 2. At the same time, the suction flow rate into the ozone suction chamber was 1.7 LN / min in Comparative Example 1. However, in Comparative Example 2, it was reduced to 0.2 LN / min. 5 At this time, 'to reduce the ozone generation amount so as not to exceed an ozone pressure of 0.06 MPa. If referring to the foregoing Example 1 and Example 2, it can be judged that the ozone water ensures an ozone concentration of 20 Ppm or more, and the pressure loss is 〇 2 MPa or less 〇 In the examples 1 and 2, the ozone pressure is also 0.06 MPa and 0.08 MPa, and the pressure of this level is such that the failure of the ozone generating device will not cause a failure. The ozone generating device does not require a special pressure-resistant structure. Furthermore, even when the ozone flow rate was increased from 0 8 15 Ln / to 1.8 LN / min in Examples i and 2, the pressure loss in Example 2 was still at 0.15 MPa ', which is the same as that in Comparative Example 1 where the same ozone concentration was obtained. The comparison is also very small, and there is no need to add a pressure pump or the like to compensate for the pressure loss. On the other hand, if you refer to Comparative Example 1, if you want to obtain ozone water with the same level of ozone concentration as in Example 2, you must add a pressure pump and increase the pressure of 20 ultrapure water to 0.5 MPa. A pressure loss of 0.4 MPa will be generated. In Comparative Example 2, a pressure pump is not added, the pressure of ultrapure water is made to the same level as in the example, and the pressure loss is reduced, but the ozone concentration of the ozone water is 16 ppm. It does not reach 20 ppm necessary for semiconductor cleaning. 12 589226 发明 Description of the invention It can be known from the foregoing embodiments that if the ozone mixing device and the ozone mixing according to the present invention are compared with the case of producing ozone water using a conventional ejector, the pressure of ultrapure water can be suppressed and reduced, and It is necessary to increase the pressurization equipment and suppress the ozone pressure and prevent damage to the ozone generating device. Moreover, the ratio of the ozone water flow rate to the ultrapure water flow rate can be increased, and high-concentration ozone water can be produced. [Brief Description of Drawings 3] Fig. 1 is a cross-sectional view showing an embodiment of an ozone mixing device according to the present invention. 10 Figure 2 is a cross-sectional view showing a conventional ejector. [Representative symbol table of main components of the figure] 11 ... suction chamber 11a " gas suction port 12 ... diffuser X ... micro gap 1 ... ozone mixing device 2 ... (ultra-pure water) inlet 3 ... chamber 3a ······························································································································································································---- 13