KR20040096648A - Ozone mixing device and ozone mixing method - Google Patents
Ozone mixing device and ozone mixing method Download PDFInfo
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- KR20040096648A KR20040096648A KR10-2004-7013716A KR20047013716A KR20040096648A KR 20040096648 A KR20040096648 A KR 20040096648A KR 20047013716 A KR20047013716 A KR 20047013716A KR 20040096648 A KR20040096648 A KR 20040096648A
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- ozone
- ozone gas
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- supply pipe
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- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 title claims abstract description 143
- 238000000034 method Methods 0.000 title claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910021642 ultra pure water Inorganic materials 0.000 abstract description 33
- 239000012498 ultrapure water Substances 0.000 abstract description 33
- 239000007788 liquid Substances 0.000 abstract description 8
- 239000007789 gas Substances 0.000 description 71
- 230000000052 comparative effect Effects 0.000 description 12
- 238000004140 cleaning Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F21/00—Dissolving
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
- B01F23/2326—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles adding the flowing main component by suction means, e.g. using an ejector
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
- B01F25/3124—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow
- B01F25/31241—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characterised by the place of introduction of the main flow the main flow being injected in the circumferential area of the venturi, creating an aspiration in the central part of the conduit
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/30—Injector mixers
- B01F25/31—Injector mixers in conduits or tubes through which the main component flows
- B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
- B01F25/3125—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof characteristics of the Venturi parts
- B01F25/31252—Nozzles
- B01F25/312521—Adjustable Venturi nozzle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2215/00—Auxiliary or complementary information in relation with mixing
- B01F2215/04—Technical information in relation with mixing
- B01F2215/0413—Numerical information
- B01F2215/0436—Operational information
- B01F2215/0468—Numerical pressure values
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/784—Diffusers or nozzles for ozonation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
본 발명은 압력 손실을 작게 하고, 액가스비를 크게 하며, 가스압을 작게 하여도 소정 농도의 오존가스를 물에 용해시킬 수 있는 오존혼합장치 및 오존혼합방법을 제공한다. 오존혼합장치(1)는 가압수의 유입구(2)를 구비한 챔버(3), 챔버(3)와 연통된 디퓨저부(4), 및 챔버(3) 내에 삽입되는 디퓨저부(4)의 입구부 쪽으로 개구된 오존가스 공급관(5)을 포함하고, 오존가스 공급관(5)의 선단부가 디퓨저부(4)의 입구부로 통하는 유로를 좁히는 스로틀부재를 구비한다. 유입구(2)에 게이지 압력이 약 0.1 내지 0.3MPa인 초순수를 유입시키면서 오존가스 공급관(5)에, 게이지 압력이 약 0.05 내지 0.2MPa인 오존가스를 공급한다.The present invention provides an ozone mixing device and an ozone mixing method capable of dissolving ozone gas at a predetermined concentration in water even when the pressure loss is reduced, the liquid gas ratio is increased, and the gas pressure is reduced. The ozone mixing device 1 includes a chamber 3 having a pressurized water inlet 2, a diffuser portion 4 in communication with the chamber 3, and an inlet of the diffuser portion 4 inserted into the chamber 3. It includes an ozone gas supply pipe (5) opened toward the side, the front end portion of the ozone gas supply pipe (5) is provided with a throttle member for narrowing the flow path leading to the inlet of the diffuser portion (4). The ozone gas supply pipe 5 is supplied with ozone gas having a gauge pressure of about 0.05 to 0.2 MPa while introducing ultrapure water having a gauge pressure of about 0.1 to 0.3 MPa into the inlet 2.
Description
종래, 기액(氣液)혼합장치로서 이젝터가 알려져 있다. 일반적으로, 이젝터는 도2에 나타낸 바와 같이, 노즐(10), 흡인실(11), 및 디퓨저(12)로 구성되어, 고압의 액체를 노즐(10)로부터 흡인실(11)로 분사시켜 흡인실(11)의 압력을 낮춤으로써 상기 흡인실(11)에 설치된 기체 흡입구(11a)로부터 기체를 흡인실(11)로 흡인하고, 디퓨저(12)로부터 액체와 기체를 혼합한 상태에서 분출한다.Conventionally, an ejector is known as a gas-liquid mixing device. Generally, the ejector is composed of a nozzle 10, a suction chamber 11, and a diffuser 12, as shown in Fig. 2, to inject high pressure liquid from the nozzle 10 into the suction chamber 11 for suction. By lowering the pressure of the chamber 11, the gas is sucked into the suction chamber 11 from the gas suction port 11a provided in the suction chamber 11, and the liquid is ejected from the diffuser 12 in a mixed state with the liquid.
최근, 반도체 제조분야에서는, 반도체 부품의 세정에 오존가스를 초순수에 혼합 용해시킨 오존수를 이용하고 있으나, 세정 등의 오존 처리효과를 향상시키거나, 처리 시간을 단축시키기 위해서 오존수의 오존 농도를, 예를 들면 20ppm이상의 고농도로 하고 있다.Recently, in the semiconductor manufacturing field, ozone water obtained by mixing and dissolving ozone gas in ultrapure water is used for cleaning semiconductor components. However, in order to improve the ozone treatment effect such as cleaning or to shorten the treatment time, the ozone concentration of ozone water may be reduced. For example, the concentration is more than 20ppm.
이젝터를 이용하여 상기와 같은 고농도의 오존수를 제조하기 위해서는, 오존가스의 접촉 비율을 높이기 위해서 초순수의 유량에 대한 오존가스의 유량의 비율((오존가스 유량/초순수 유량), 이하, 「액가스비」라고 함)을 크게 함과 동시에, 흡인실에 흡인되는 오존가스량을 증가시키기 위해, 오존가스의 압력을 0.3MPa 정도로 높였다.In order to manufacture the above-mentioned high concentration ozone water using an ejector, in order to increase the contact ratio of ozone gas, the ratio of the flow rate of ozone gas to the flow rate of ultrapure water ((ozone gas flow rate / ultra pure water flow rate), hereinafter referred to as "liquid gas ratio") In addition, the pressure of the ozone gas was raised to about 0.3 MPa in order to increase the amount of ozone gas sucked into the suction chamber.
그러나, 종래의 이젝터는 액체 유량에 대한 가스 유량의 비율을 크게 하면, 디퓨저에서의 압력 손실이 커지게 되고, 그 압력 손실을 보충하기 위해 가압 펌프를 증설하거나 했다. 가압 펌프를 증설하면, 반도체 등의 정밀전자부품을 세정할 경우, 펌프로부터 초순수 내에 파티클(오염물)이 혼입될 가능성과 초순수를 금속으로 오염시킬 가능성이 증가하는 문제점이 있었다.However, in the conventional ejector, when the ratio of the gas flow rate to the liquid flow rate is increased, the pressure loss in the diffuser increases, and a pressure pump is added to compensate for the pressure loss. When the pressure pump is expanded, when cleaning precision electronic components such as semiconductors, there is a problem that the possibility of mixing particles (contaminants) in the ultrapure water from the pump and the possibility of contaminating the ultrapure water with metal increase.
또한, 오존가스의 압력을 높이기 위한 오존가스 발생장치의 내압구조가 요구되기 때문에, 오존을 전해법에 의해 발생시키는 경우는 전해막에 핀홀이 발생하여 다량의 오존가스가 수소실에 침입될 우려가 있는 문제점도 있었다.In addition, since the internal pressure structure of the ozone gas generator to increase the pressure of the ozone gas is required, when ozone is generated by the electrolytic method, a pinhole may be generated in the electrolyte membrane, and a large amount of ozone gas may enter the hydrogen chamber. There was a problem.
본 발명은, 오존가스를 초순수(超純水)에 혼합, 용해시켜 반도체 세정 등에 이용되는 오존수를 제조하기 위한 오존혼합장치 및 오존 혼합 방법에 관한 것이다.The present invention relates to an ozone mixing device and an ozone mixing method for producing ozone water for mixing and dissolving ozone gas in ultrapure water for use in semiconductor cleaning and the like.
도1은 본 발명에 따른 오존혼합장치의 일 실시형태를 나타낸 단면도.1 is a cross-sectional view showing an embodiment of an ozone mixing device according to the present invention.
도2는 종래의 이젝터를 나타낸 단면도.Figure 2 is a cross-sectional view showing a conventional ejector.
본 발명은 압력손실을 적게 하고, 액가스비를 크게 하고, 또한 가스압을 작게 하더라도 소정 농도의 오존가스를 물에 용해시킬 수 있는 오존혼합장치 및 오존혼합방법을 제공하는 것을 목적으로 한다.An object of the present invention is to provide an ozone mixing device and an ozone mixing method capable of dissolving ozone gas at a predetermined concentration in water even when the pressure loss is reduced, the liquid gas ratio is increased, and the gas pressure is reduced.
본 발명의 상기 목적은, 가압수의 유입구를 갖는 챔버, 상기 챔버에 연통되는 디퓨저부, 및 상기 챔버 내에 삽입되고, 상기 디퓨저부의 입구부를 향해 개구된 오존가스 공급관을 구비하고, 상기 오존가스 공급관의 선단부가 상기 디퓨저부의입구부로 통하는 유로를 좁히는 스로틀부재를 구비한 오존혼합장치에 의해 달성된다.The object of the present invention includes a chamber having an inlet for pressurized water, a diffuser portion communicating with the chamber, and an ozone gas supply pipe inserted into the chamber and opened toward an inlet portion of the diffuser portion. The front end is achieved by an ozone mixing device having a throttle member for narrowing a flow path leading to the inlet of the diffuser.
상기 오존가스 공급관은, 상기 스로틀부재에 의해 압축량이 조절될 수 있도록, 그 선단부와 상기 디퓨저부의 입구부의 거리를 조절 가능하도록 설치하는 것이 바람직하다.The ozone gas supply pipe is preferably installed to be able to adjust the distance between the front end and the inlet of the diffuser so that the amount of compression can be adjusted by the throttle member.
상기 오존가스 공급관의 선단부가 원추대 형상의 외형을 가지고, 상기 챔버가 상기 선단부에 적합한 끝이 가는 원추대 형상의 유로부를 갖고, 상기 끝이 가는 유로부의 선단이 상기 디퓨저의 입구부와 연통되는 것이 바람직하다.It is preferable that the tip portion of the ozone gas supply pipe has an outer shape of a truncated cone shape, the chamber has a truncated cone shaped flow path portion suitable for the tip portion, and the tip portion of the thin flow path portion is in communication with the inlet portion of the diffuser. .
상기 유입구에 게이지 압력이 약 0.1 내지 약 0.3 MPa의 물을 유입시킴과 동시에 상기 오존가스 공급관에 게이지 압력이 약 0.05 내지 약 0.2 MPa의 오존가스를 공급하는 것이 바람직하다.It is preferable that the gauge pressure of about 0.1 to about 0.3 MPa is introduced into the inlet and the ozone gas having a gauge pressure of about 0.05 to about 0.2 MPa is supplied to the ozone gas supply pipe.
본 발명에 따른 오존혼합장치의 바람직한 실시형태에 대해 이하에 도1에 나타낸 단면도를 참조하여 설명한다.Preferred embodiments of the ozone mixing device according to the present invention will be described below with reference to the cross-sectional view shown in FIG.
오존혼합장치(1)는, 가압된 초순수의 유입구(2)를 가진 챔버(3), 상기 챔버(3)와 연통되는 디퓨저부(4), 및 상기 챔버(3) 내에 삽입되어 상기 디퓨저부(4)의 입구부(4a) 쪽으로 개구된 오존가스 공급관(5)을 포함한다.The ozone mixing device 1 includes a chamber 3 having an inlet port 2 of pressurized ultrapure water, a diffuser portion 4 in communication with the chamber 3, and a diffuser portion (3) inserted into the chamber 3. And ozone gas supply pipe 5 opened toward the inlet portion 4a of 4).
상기 오존가스 공급관(5)은, 종래의 이젝터에 있는 노즐에 의해서 유체를 고속으로 분출시키는 목적인 것이 아닌, 단순히 오존가스를 일정한 유량으로 공급하기 위한 것이다. 따라서, 도면에 나타낸 일 예의 상기 오존가스 공급관(5)의 유로는 점차 좁아지는 노즐을 형성하고 있으나, 좁아짐이 없는 동일한 유로 단면의 통공으로 하는 것도 바람직하다.The ozone gas supply pipe 5 is not intended to eject the fluid at high speed by a nozzle in a conventional ejector, but is simply for supplying ozone gas at a constant flow rate. Therefore, although the flow path of the said ozone gas supply pipe 5 of the example shown in the figure forms the gradually narrowing nozzle, it is also preferable to set it as the through-hole of the same flow path cross section without narrowing.
상기 오존가스 공급관(5)의 후단부는, 미도시의 오존발생장치와 튜브(미도시)에 의해 연결되어, 도면의 화살표 X방향으로 오존가스를 이송한다. 오존가스는, 오존발생장치로부터 예를 들면, 약 0.05 내지 0.2MPa(게이지 압력)의 압력으로 가압되어 약 0.4 내지 40LN/분(LN은, 표준 상태의 리터)의 유속으로 이송된다.The rear end of the ozone gas supply pipe 5 is connected by an ozone generating device (not shown) and a tube (not shown), and transports the ozone gas in the direction of arrow X in the figure. The ozone gas is pressurized from the ozone generator at a pressure of, for example, about 0.05 to 0.2 MPa (gauge pressure) and conveyed at a flow rate of about 0.4 to 40 L N / min (L N is the standard liter).
도면에 나타낸 일 예의 상기 오존가스 공급관(5)의 선단부(5a)는 원추대 형상의 외형으로 이루어지고, 그 정점부(頂部)가 상기 디퓨저부(4)의 입구부(4a) 쪽으로 개구되어 있다. 상기 챔버(3)는, 상기 선단부(5a)와 동일한 테이퍼를 가진 끝이 가는 원추대 형상의 유로부(3a)를 가지고, 상기 유로부(3a)는 상기 디퓨저부(4)의 입구부(4a)에 연통된다.The tip portion 5a of the ozone gas supply pipe 5 of the example shown in the drawing has an outer shape in the shape of a truncated cone, and its peak portion is opened toward the inlet portion 4a of the diffuser portion 4. The chamber 3 has a thin cone-shaped cone-shaped flow path portion 3a having the same taper as the tip portion 5a, and the flow path portion 3a has an inlet portion 4a of the diffuser portion 4. Is in communication with.
상기 오존가스 공급관(5)의 선단부(5a)는 상기 유로부(3a)에 삽입되어, 상기 디퓨저부(4)의 입구부(4a)로 통하는 상기 유로부(3a)를 좁히는 스로틀부재를 형성하고 있다. 상기 챔버(3)에 유입된 가압수(초순수)는, 그 좁혀진 유로, 즉 미소 간극 X를 통과할 때, 유속이 증가됨과 동시에 감압되어 상기 디퓨저부(4)로 분출되고, 상기 디퓨저부(4)에 있어서 감속되고 가압된다. 상기 유입구(2)로 이송되는 초순수는, 송수 펌프(미도시)에 의해 약 0.1 내지 0.3MPa(게이지 압력)의 압력, 및 약 1 내지 약 100L/분의 유속으로 이송되는 것이 바람직하다.The tip portion 5a of the ozone gas supply pipe 5 is inserted into the flow passage portion 3a to form a throttle member for narrowing the flow passage portion 3a leading to the inlet portion 4a of the diffuser portion 4, have. When the pressurized water (ultra pure water) introduced into the chamber 3 passes through the narrowed flow path, that is, the micro gap X, the flow rate is increased and the pressure is reduced and ejected to the diffuser part 4, and the diffuser part 4 Is decelerated and pressurized. The ultrapure water conveyed to the inlet 2 is preferably conveyed by a water pump (not shown) at a pressure of about 0.1 to 0.3 MPa (gauge pressure) and a flow rate of about 1 to about 100 L / min.
도면에 나타낸 일 예에서는, 상기 오존가스 공급관(5)의 선단부(5a)와 상기 유로부(3a) 사이에 형성되는 미소 간극 X는, 유로 단면적을 점차 축소시키고 있어실질적으로 노즐을 구성하고 있다. 상기 미소 간극 X는, 그를 통과하는 초순수의 유속을 증가시키기 위해, 도면에 나타낸 일 예와 같이 유로 단면적을 점차 축소하는 것이 바람직하다.In the example shown in the figure, the minute gap X formed between the tip portion 5a of the ozone gas supply pipe 5 and the flow passage portion 3a gradually reduces the cross-sectional area of the flow passage and substantially constitutes the nozzle. In order to increase the flow rate of the ultrapure water passing therethrough, it is preferable that the minute gap X gradually reduce the passage cross-sectional area as in the example shown in the figure.
상기 오존가스 공급관(5)은, 상기 선단부(5a)에 의한 압축량, 즉 미소 간극 X의 크기를 조절할 수 있도록, 상기 선단부(5a)와 상기 디퓨저부(4)의 입구부(4a)의 거리를 조절 가능하도록 설치된다.The ozone gas supply pipe 5 is a distance between the tip portion 5a and the inlet portion 4a of the diffuser portion 4 so that the amount of compression by the tip portion 5a, that is, the size of the micro gap X can be adjusted. It is installed to be adjustable.
도면에 나타낸 일 예에서는, 상기 오존가스 공급관(5)의 외주부에 나사부(5b)가 형성되고, 이 나사부(5b)는 상기 오존가스 공급관(5)의 일부를 지지하고 있는 지지체(6)와 나사 결합된다. 따라서, 상기 오존가스 공급관(5)을 축방향으로 회전시킬 경우, 상기 나사부(5b)의 피치에 대응해서 상기 선단부(5a)가 축선 방향으로 이동되고, 미소 간극(X)의 크기를 조절할 수 있다. 또한, 도면 중에서, 부호 7은 오링(O ring)을 나타낸다.In the example shown in the figure, a screw portion 5b is formed at an outer circumference of the ozone gas supply pipe 5, and the screw portion 5b is a support 6 and a screw that supports a part of the ozone gas supply pipe 5. Combined. Therefore, when the ozone gas supply pipe 5 is rotated in the axial direction, the tip portion 5a is moved in the axial direction corresponding to the pitch of the screw portion 5b, so that the size of the minute gap X can be adjusted. . In the drawings, reference numeral 7 denotes an O ring.
상기와 같은 구성을 가진 오존혼합장치(1)에서는, 미도시의 펌프 등에서 가압된 초순수가 소정의 유량으로 상기 유입구(2)로부터 챔버(3) 내로 유입되고, 미소 간극(X)을 거쳐 상기 디퓨저부(4)로 분사된다. 한편, 상기 오존가스 공급관(5)으로부터는, 오존가스가 소정의 유량으로 상기 디퓨저부(4)의 입구부(4a)를 향해 배출된다.In the ozone mixing device 1 having the above configuration, the ultrapure water pressurized by a pump or the like not shown is introduced into the chamber 3 from the inlet port 2 at a predetermined flow rate, and passes through the micro gap X to the diffuser. It is injected into the part (4). On the other hand, ozone gas is discharged from the ozone gas supply pipe 5 toward the inlet portion 4a of the diffuser portion 4 at a predetermined flow rate.
미소 간극(X)을 통과한 초순수는, 미소 간극의 노즐 작용에 의해 압력이 감소된다. 따라서, 상기 미소 간극(X)을 조절해서, 상기 오존가스 공급관(5)의 출구 부근에 있어서, 초순수의 압력을 오존가스 공급관(5) 내의 오존가스 압력과 같은 압력 이하까지 낮출 경우, 상기 오존가스 공급관(5)로부터의 오존가스가 배출이 용이해져, 혼합이 용이해진다.The ultrapure water passing through the microgap X is reduced in pressure due to the nozzle action of the microgap. Therefore, when the minute gap X is adjusted to lower the pressure of ultrapure water to the same pressure or less as the ozone gas pressure in the ozone gas supply pipe 5 near the outlet of the ozone gas supply pipe 5, the ozone gas Ozone gas from the supply pipe 5 is easily discharged, and mixing is facilitated.
따라서, 상기 디퓨저부(4)에 분출된 초순수에 오존가스가 분무 형상으로 말려들어 혼합된다. 오존가스의 분무 상태는, 미소 간극(X)의 조절에 의해 최적화될 수 있다. 즉, 초순수의 유량이나 압력, 및 오존가스의 유량 등에 따라서, 상기 디퓨저부(4)에서 분무 형상의 작은 기포가 많아지도록 하여, 미소 간극(X)의 크기를 조절하고, 오존가스의 혼합을 촉진시킨다. 또한, 챔버(3)는 초순수의 유로를 이루고 있지만, 종래의 이젝터와 같은 흡인실로서의 기능은 하지 않는다.Thus, ozone gas is rolled into the ultrapure water jetted into the diffuser unit 4 in a spray form and mixed. The spray state of the ozone gas can be optimized by adjusting the micro gap X. That is, according to the flow rate and pressure of ultrapure water, the flow rate of ozone gas, etc., the said diffuser part 4 makes small bubbles of a spray shape increase, the magnitude | size of the micro clearance X is adjusted, and the mixing of ozone gas is promoted. Let's do it. In addition, although the chamber 3 forms the flow path of ultrapure water, it does not function as a suction chamber like the conventional ejector.
실시예Example 1One
도1에 나타낸 오존혼합장치를 이용하여, 이하의 조건으로 오존수를 제조하였다.Using ozone mixing apparatus shown in Fig. 1, ozone water was prepared under the following conditions.
디퓨저부 목부분의 구경: 2.2mmφNeck diameter of diffuser part: 2.2mmφ
오존가스 공급관의 구경: 1.5mmDiameter of ozone gas supply pipe: 1.5mm
오존가스 농도: 210g/㎥N(㎥N은 표준 입방 미터)Ozone gas concentration: 210g / ㎥ N (㎥ N is the standard cubic meter)
오존가스 유량: 0.8LN/분Ozone gas flow rate: 0.8 L N / min
오존가스의 압력: 0.06MPaOzone gas pressure: 0.06 MPa
초순수의 유량: 3L/분Ultrapure water flow rate: 3 L / min
초순수의 압력: 0.2Ultrapure Water Pressure: 0.2 MPaMPa
오존수의 오존 농도: 25ppmOzone concentration of ozone water: 25ppm
오존수의 압력: 0.1MPaOzone water pressure: 0.1MPa
압력 손실: 0.1MPaPressure loss: 0.1MPa
(압력 손실= [초순수의 압력] - [오존수의 압력])(Pressure loss = [pressure of ultrapure water]-[pressure of ozone water])
실시예Example 22
도1에 나타낸 오존혼합장치를 이용하여, 이하의 조건으로 오존수를 제조하였다. 실시예2는, 실시예1에 비해 오존가스 유량을 증가시킨 예이다.Using ozone mixing apparatus shown in Fig. 1, ozone water was prepared under the following conditions. Example 2 is an example where the flow rate of ozone gas was increased compared with Example 1.
디퓨저부 목부분의 구경: 2.2mmφNeck diameter of diffuser part: 2.2mmφ
오존가스 공급관의 구경: 1.5mmDiameter of ozone gas supply pipe: 1.5mm
오존가스의 오존 농도: 210g/㎥N Ozone concentration of ozone gas: 210g / ㎥ N
오존가스 유량: 1.8LN/분Ozone gas flow rate: 1.8 L N / min
오존가스 압력: 0.08MPaOzone gas pressure: 0.08 MPa
초순수의 유량: 3L/분Ultrapure water flow rate: 3 L / min
초순수의 압력: 0.25Ultrapure Water Pressure: 0.25 MPaMPa
오존수의 오존 농도: 33ppmOzone concentration of ozone water: 33ppm
오존수의 압력: 0.1MPaOzone water pressure: 0.1MPa
압력 손실: 0.15MPaPressure loss: 0.15MPa
비교예Comparative example 1One
도2에 나타낸 종래의 이젝터를 이용하여, 이하의 조건으로 오존가스를 초순수에 혼합시켰다. 이젝터의 디퓨저, 노즐, 및 흡인실은, 도1의 오존혼합장치의 대응 부분과 동등한 치수의 것을 이용하였다.Using the conventional ejector shown in Fig. 2, ozone gas was mixed with ultrapure water under the following conditions. As the diffuser, the nozzle, and the suction chamber of the ejector, those having the same dimensions as those of the corresponding portion of the ozone mixing apparatus of FIG.
디퓨저부 목부분의 구경: 2.2mmφNeck diameter of diffuser part: 2.2mmφ
물분사 노즐의 구경: 1.5mmCaliber of Water Spray Nozzle: 1.5mm
오존가스의 오존 농도: 210g/㎥N Ozone concentration of ozone gas: 210g / ㎥ N
오존가스 유량: 1.7LN/분Ozone gas flow rate: 1.7 L N / min
오존가스 압력: 0.06MPaOzone Gas Pressure: 0.06MPa
초순수의 유량: 3L/분Ultrapure water flow rate: 3 L / min
초순수의 압력: 0.5Ultrapure Water Pressure: 0.5 MPaMPa
오존수의 오존 농도: 32ppmOzone concentration of ozone water: 32ppm
오존수의 압력: 0.1MPaOzone water pressure: 0.1MPa
압력 손실: 0.4MPaPressure loss: 0.4MPa
비교예Comparative example 22
비교예1과 동일한 종래의 이젝터를 이용하여, 이하의 조건으로 오존수를 제조하였다.Using conventional ejector similar to Comparative Example 1, ozone water was prepared under the following conditions.
디퓨저부 목부분의 구경: 2.2mmφNeck diameter of diffuser part: 2.2mmφ
물분사 노즐의 구경: 1.5mmCaliber of Water Spray Nozzle: 1.5mm
오존가스의 오존 농도: 210g/㎥NOzone concentration of ozone gas: 210g / ㎥N
오존가스 유량: 0.2LN/분Ozone gas flow rate: 0.2 L N / min
오존가스 압력: 0.06MPaOzone Gas Pressure: 0.06MPa
초순수의 유량: 1.5L/분Ultrapure water flow rate: 1.5 L / min
초순수의 압력: 0.25Ultrapure Water Pressure: 0.25 MPaMPa
오존수의 오존 농도: 16ppmOzone concentration of ozone water: 16ppm
오존수의 압력: 0.1MPaOzone water pressure: 0.1MPa
압력 손실: 0.15MPaPressure loss: 0.15MPa
비교예2는, 비교예1에 비해 초순수의 압력을 작게 한 예(가압 펌프 증설분을 제외함)이다.Comparative Example 2 is an example in which the pressure of ultrapure water is made smaller than that of Comparative Example 1 (except for the pressure pump extension).
초순수 유량은 비교예1에서는 3L/분이었으나, 비교예2에서는 1.5L/분으로 감소됨과 동시에, 오존가스의 흡인실의 흡입 유량은, 비교예1에서는 1.7LN/분이었던 것을 비교예2에서는 0.2LN/분으로 저하시켰다. 이 때, 0.06MPa의 오존가스 압력을 초과하지 않도록 오존 발생량을 저감시켰다.The ultrapure water flow rate was 3 L / min in Comparative Example 1, but decreased to 1.5 L / min in Comparative Example 2, while the suction flow rate of the suction chamber of ozone gas was 1.7 L N / min in Comparative Example 1 in Comparative Example 2. It was reduced to 0.2 L N / min. At this time, the ozone generation amount was reduced so as not to exceed the ozone gas pressure of 0.06 MPa.
상기의 실시예1과 실시예2를 참조하면, 오존수는 모두 20ppm 이상의 오존 농도를 확보하고 있고, 압력 손실은 0.2MPa 이하인 것을 알 수 있다.Referring to Example 1 and Example 2 above, it can be seen that ozone water has secured an ozone concentration of 20 ppm or more, and the pressure loss is 0.2 MPa or less.
또한, 실시예1 및 실시예2에서는, 오존가스의 압력도 0.06MPa, 0.08MPa이고, 이 정도의 압력은, 오존가스 발생장치에 지장을 주지 않을 정도이며, 오존가스 발생장치에 특별한 내압구조를 필요로 하지 않는 정도이다.In addition, in Example 1 and Example 2, the pressure of ozone gas is also 0.06 MPa and 0.08 MPa, and this pressure does not interfere with an ozone gas generator, and has a special pressure-resistant structure for an ozone gas generator. It is not necessary.
또한, 실시예1 및 실시예2에서 오존가스의 유량을 0.8LN/분에서 1.8LN/분으로 증가시켜도, 실시예2에서의 압력 손실은 0.15MPa이고, 같은 오존 농도를 얻고 있는 비교예1과 비교해도 충분히 작고, 압력 손실을 보충하기 위해 가압 펌프의 증설 등이 불필요한 범위이다.In addition, even if the flow rate of ozone gas was increased from 0.8L N / min to 1.8L N / min in Examples 1 and 2, the pressure loss in Example 2 was 0.15 MPa, and the comparative example obtained the same ozone concentration. Even if it is small compared with 1, in order to compensate for a pressure loss, expansion of a pressure pump etc. is unnecessary range.
이에 대하여, 비교예1을 참조하면, 실시예2와 동일한 레벨의 오존 농도의 오존수를 얻으려고 할 경우, 가압 펌프를 증설하여 초순수의 압력을 0.5MPa까지 올려야 하고, 이 때 0.4MPa의 압력 손실이 발생된다.On the other hand, referring to Comparative Example 1, when trying to obtain ozone water at the same level of ozone concentration as in Example 2, a pressure pump should be added to increase the pressure of ultrapure water to 0.5 MPa, and a pressure loss of 0.4 MPa would be observed. Is generated.
비교예2에서는, 가압 펌프를 증설하지 않고, 초순수의 압력을 실시예와 동일한 레벨의 압력으로 하고, 압력 손실을 작게 하고 있지만, 오존수의 오존 농도가 16ppm이고, 반도체 세정에 필요한 20ppm에 도달되고 있지 않다.In Comparative Example 2, the pressure of ultrapure water was set to the same level as in the example without increasing the pressure pump, and the pressure loss was reduced. However, the ozone concentration of ozone water was 16 ppm, and 20 ppm required for semiconductor cleaning was not reached. not.
상기 실시예에서 알 수 있듯이, 본 발명에 따른 오존혼합장치 및 오존 혼합 방법에 의하면, 종래의 이젝터를 이용하여 오존수를 제조하는 경우에 비해, 초순수의 압력을 낮게 억제하여 가압 설비의 증가를 없애고, 오존가스의 압력을 억제하여 오존발생장치의 장해를 방지하고, 또한 초순수의 유량에 대한 오존가스의 유량의 비율을 증가시켜, 고농도의 오존수를 제조할 수 있다.As can be seen in the above embodiment, according to the ozone mixing device and the ozone mixing method according to the present invention, compared to the case of producing ozone water using a conventional ejector, the pressure of the ultrapure water is lowered to eliminate the increase in the pressurized equipment, By suppressing the pressure of the ozone gas to prevent the failure of the ozone generating device, and increasing the ratio of the flow rate of the ozone gas to the flow rate of the ultrapure water, high concentration ozone water can be produced.
Claims (4)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2002-00062470 | 2002-03-07 | ||
| JP2002062470A JP4206676B2 (en) | 2002-03-07 | 2002-03-07 | Ozone mixing apparatus and ozone mixing method |
| PCT/JP2003/002616 WO2003074162A1 (en) | 2002-03-07 | 2003-03-06 | Ozone mixing device and ozone mixing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20040096648A true KR20040096648A (en) | 2004-11-16 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR10-2004-7013716A KR20040096648A (en) | 2002-03-07 | 2003-03-06 | Ozone mixing device and ozone mixing method |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4206676B2 (en) |
| KR (1) | KR20040096648A (en) |
| TW (1) | TW589226B (en) |
| WO (1) | WO2003074162A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101127077B1 (en) * | 2009-12-15 | 2012-03-22 | 위성수 | Micro Bubble Diffuser for Improvement of Dissolved Oxygen |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004033908A (en) * | 2002-07-03 | 2004-02-05 | Fuji Electric Holdings Co Ltd | Ozone diffuser |
| ES2283158B1 (en) * | 2003-11-10 | 2008-09-16 | Universidad De Sevilla | PROCEDURE AND DEVICE FOR THE GENERATION OF FOAMS AND EMULSIONS THROUGH PAIRS OF FACED TUBES. |
| TWM268347U (en) * | 2004-09-17 | 2005-06-21 | Biotek Technology Corp | Structure for pressure-type gas-liquid mixer |
| CA2582378C (en) * | 2004-10-01 | 2013-12-10 | Velocys, Inc. | Multiphase mixing process using microchannel process technology |
| EP1647325A1 (en) * | 2004-10-12 | 2006-04-19 | Biotek Technology Corp. | Pressurized gas-water mixer |
| JP2011507685A (en) * | 2007-12-20 | 2011-03-10 | レイブ・エヌ・ピー・インコーポレーテッド | Fluid ejection assembly for nozzle |
| FR2944218B1 (en) * | 2009-04-09 | 2012-06-15 | Total Sa | EJECTOR DIPOSITIVE FOR FORMING PRESSURE MIXTURE OF LIQUID AND GAS, AND GAS COMPRESSOR COMPRISING SUCH AN EJECTOR DEVICE |
| WO2012096719A1 (en) * | 2011-01-14 | 2012-07-19 | Earthclean Corporation | Eductor system |
| TWI458559B (en) * | 2011-02-09 | 2014-11-01 | China Steel Corp | Gas-liquid nozzle device |
| EP2554273A1 (en) * | 2011-08-02 | 2013-02-06 | Omya Development AG | Atomizing nozzle device and use of the same |
| CN103990394B (en) * | 2014-04-30 | 2016-06-15 | 重庆优楷科技有限公司 | A kind of for the centrifugal mjector in sewage disposal process |
| CN105152304A (en) * | 2015-07-24 | 2015-12-16 | 长春黄金研究院 | Reactor for treating tailing slurry or waste water by virtue of ozone method |
| EP3546059B8 (en) | 2018-03-28 | 2023-06-21 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Apparatus and arrangement for introducing a gas into a main medium in particular in waste water treatment |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS561378Y2 (en) * | 1976-12-03 | 1981-01-13 | ||
| JPH0751543Y2 (en) * | 1989-09-19 | 1995-11-22 | タキロン株式会社 | Panel connection structure |
| JPH0647068B2 (en) * | 1990-02-14 | 1994-06-22 | ▲たく▼夫 望月 | Different fluid contact mixing dissolution amount adjusting device |
| JP4298824B2 (en) * | 1997-10-28 | 2009-07-22 | Ｉｄｅｃ株式会社 | Gas-liquid dissolution and mixing equipment |
-
2002
- 2002-03-07 JP JP2002062470A patent/JP4206676B2/en not_active Expired - Fee Related
-
2003
- 2003-03-06 WO PCT/JP2003/002616 patent/WO2003074162A1/en active Application Filing
- 2003-03-06 KR KR10-2004-7013716A patent/KR20040096648A/en not_active Application Discontinuation
- 2003-03-06 TW TW092104844A patent/TW589226B/en not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101127077B1 (en) * | 2009-12-15 | 2012-03-22 | 위성수 | Micro Bubble Diffuser for Improvement of Dissolved Oxygen |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200303784A (en) | 2003-09-16 |
| JP4206676B2 (en) | 2009-01-14 |
| TW589226B (en) | 2004-06-01 |
| WO2003074162A1 (en) | 2003-09-12 |
| JP2003260342A (en) | 2003-09-16 |
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