WO2003036359A3 - Optisches element mit einer optischen achse - Google Patents
Optisches element mit einer optischen achse Download PDFInfo
- Publication number
- WO2003036359A3 WO2003036359A3 PCT/EP2002/011656 EP0211656W WO03036359A3 WO 2003036359 A3 WO2003036359 A3 WO 2003036359A3 EP 0211656 W EP0211656 W EP 0211656W WO 03036359 A3 WO03036359 A3 WO 03036359A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical
- optical element
- optical axis
- extension
- axis
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/003—Alignment of optical elements
- G02B7/005—Motorised alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003538798A JP2005506574A (ja) | 2001-10-20 | 2002-10-18 | 光軸を有する光学部品 |
EP02782948A EP1442329A2 (de) | 2001-10-20 | 2002-10-18 | Optisches element mit einer optischen achse |
US10/489,030 US7295331B2 (en) | 2001-10-20 | 2002-10-18 | Optical element with an optical axis |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10151919A DE10151919B4 (de) | 2001-10-20 | 2001-10-20 | Belichtungsobjektiv in der Halbleiterlithographie |
DE10151919.2 | 2001-10-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003036359A2 WO2003036359A2 (de) | 2003-05-01 |
WO2003036359A3 true WO2003036359A3 (de) | 2003-10-09 |
Family
ID=7703214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/011656 WO2003036359A2 (de) | 2001-10-20 | 2002-10-18 | Optisches element mit einer optischen achse |
Country Status (5)
Country | Link |
---|---|
US (1) | US7295331B2 (de) |
EP (1) | EP1442329A2 (de) |
JP (1) | JP2005506574A (de) |
DE (1) | DE10151919B4 (de) |
WO (1) | WO2003036359A2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4314054B2 (ja) * | 2003-04-15 | 2009-08-12 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
DE102004035595B4 (de) | 2004-04-09 | 2008-02-07 | Carl Zeiss Smt Ag | Verfahren zur Justage eines Projektionsobjektives |
US7436484B2 (en) * | 2004-12-28 | 2008-10-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006079537A2 (en) * | 2005-01-26 | 2006-08-03 | Carl Zeiss Smt Ag | Optical assembly |
JP4817702B2 (ja) * | 2005-04-14 | 2011-11-16 | キヤノン株式会社 | 光学装置及びそれを備えた露光装置 |
US8194242B2 (en) * | 2005-07-29 | 2012-06-05 | Asml Netherlands B.V. | Substrate distortion measurement |
DE102005057325A1 (de) * | 2005-12-01 | 2007-06-06 | Carl Zeiss Smt Ag | Vorrichtung zur Variation der Abbildungseigenschaften eines Spiegels |
DE102005062401A1 (de) * | 2005-12-23 | 2007-06-28 | Carl Zeiss Smt Ag | Vorrichtung zur Variation der Abbildungseigenschaften eines Spiegels |
DE102006016376B4 (de) * | 2006-04-05 | 2011-02-17 | Odelo Gmbh | Linsenverstellvorrichtung |
JP2007304123A (ja) * | 2006-05-08 | 2007-11-22 | Sony Corp | 変形可能ミラー装置 |
DE102006034755A1 (de) * | 2006-07-24 | 2008-01-31 | Carl Zeiss Smt Ag | Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung |
DE102007010906A1 (de) * | 2007-03-05 | 2008-09-11 | Seereal Technologies S.A. | Abbildungsvorrichtung zum Beeinflussen von auftreffendem Licht |
FR2933782B1 (fr) * | 2008-07-11 | 2010-08-13 | Thales Sa | Dispositif de correction des defauts optiques d'un miroir de telescope |
DE102008032853A1 (de) | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
FR2980278B1 (fr) * | 2011-09-16 | 2014-05-02 | Thales Sa | Miroir comprenant des moyens mecaniques de generation d'aberrations geometriques primaires |
JP6501793B2 (ja) * | 2014-04-04 | 2019-04-17 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 変形装置を備えた光学モジュール及び光学素子を変形させる方法 |
DE102015223518A1 (de) * | 2015-11-27 | 2017-05-18 | Carl Zeiss Smt Gmbh | Optische Vorrichtung sowie Lithographieanlage |
DE102019208980A1 (de) * | 2019-06-19 | 2020-12-24 | Carl Zeiss Smt Gmbh | Optisches system, optische anordnung und lithographieanlage |
DE102020211096A1 (de) | 2020-09-02 | 2022-03-03 | Carl Zeiss Smt Gmbh | Feldfacette für einen Feldfacettenspiegel einer Projektionsbelichtungsanlage |
DE102020214800A1 (de) | 2020-11-25 | 2022-05-25 | Carl Zeiss Smt Gmbh | Feldfacettensystem und lithographieanlage |
DE102020214798A1 (de) | 2020-11-25 | 2022-05-25 | Carl Zeiss Smt Gmbh | Feldfacettensystem und lithographieanlage |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0938009A1 (de) * | 1998-02-20 | 1999-08-25 | Carl Zeiss | Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation |
DE19825716A1 (de) * | 1998-06-09 | 1999-12-16 | Zeiss Carl Fa | Baugruppe aus optischem Element und Fassung |
DE19827603A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
JP2000114143A (ja) * | 1998-10-02 | 2000-04-21 | Canon Inc | 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法 |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1910119A (en) * | 1932-05-23 | 1933-05-23 | De Witt T Moats | Automobile rear view reflector |
US4066343A (en) * | 1976-04-15 | 1978-01-03 | The Perkin-Elmer Corporation | Configuration control apparatus |
US4046462A (en) * | 1976-04-28 | 1977-09-06 | Nasa | Three-dimensional tracking solar energy concentrator and method for making same |
US4196972A (en) * | 1977-08-22 | 1980-04-08 | The Perkin-Elmer Corporation | Configuration control apparatus |
US4143946A (en) * | 1977-12-05 | 1979-03-13 | The United States Of America As Represented By The Secretary Of The Navy | Impingement cooled deformable laser mirror |
US4226507A (en) * | 1979-07-09 | 1980-10-07 | The Perkin-Elmer Corporation | Three actuator deformable specimen |
DE3405789C2 (de) * | 1983-02-19 | 1986-01-02 | Olympus Optical Co., Ltd., Tokio/Tokyo | Linsenglied |
US4647164A (en) * | 1985-11-21 | 1987-03-03 | The United States Of America As Represented By The United States Department Of Energy | Apparatus for and method of correcting for astigmatism in a light beam reflected off of a light reflecting surface |
JPS6479710A (en) * | 1987-09-21 | 1989-03-24 | Fuji Photo Film Co Ltd | Attaching method for plastic lens |
DE4308315B4 (de) * | 1991-11-23 | 2005-01-20 | Diehl Stiftung & Co.Kg | Deformierbarer Spiegel |
US5210653A (en) * | 1992-06-08 | 1993-05-11 | Schell John D | External actuator for a deformable mirror |
WO1993025929A1 (en) * | 1992-06-08 | 1993-12-23 | United Technologies Corporation | Coaxial integrated deformable mirror actuator/retraction arrangement |
US5680262A (en) * | 1993-02-12 | 1997-10-21 | Cummins Power Generation, Inc. | Stretched membrane mirror and method of making same |
US5365379A (en) * | 1993-03-30 | 1994-11-15 | The United States Of America As Represented By The United States Department Of Energy | Laser correcting mirror |
DE19628672C2 (de) * | 1996-07-16 | 1999-07-29 | Precitec Gmbh | Deformierbarer Spiegel |
DE19812021A1 (de) * | 1998-03-19 | 1999-09-23 | Zeiss Carl Fa | Aktiver Spiegel |
-
2001
- 2001-10-20 DE DE10151919A patent/DE10151919B4/de not_active Expired - Fee Related
-
2002
- 2002-10-18 EP EP02782948A patent/EP1442329A2/de not_active Withdrawn
- 2002-10-18 WO PCT/EP2002/011656 patent/WO2003036359A2/de not_active Application Discontinuation
- 2002-10-18 JP JP2003538798A patent/JP2005506574A/ja active Pending
- 2002-10-18 US US10/489,030 patent/US7295331B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0938009A1 (de) * | 1998-02-20 | 1999-08-25 | Carl Zeiss | Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation |
DE19825716A1 (de) * | 1998-06-09 | 1999-12-16 | Zeiss Carl Fa | Baugruppe aus optischem Element und Fassung |
DE19827603A1 (de) * | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
JP2000114143A (ja) * | 1998-10-02 | 2000-04-21 | Canon Inc | 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法 |
DE19859634A1 (de) * | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 07 29 September 2000 (2000-09-29) * |
Also Published As
Publication number | Publication date |
---|---|
US7295331B2 (en) | 2007-11-13 |
US20040257683A1 (en) | 2004-12-23 |
WO2003036359A2 (de) | 2003-05-01 |
EP1442329A2 (de) | 2004-08-04 |
DE10151919A1 (de) | 2003-05-15 |
JP2005506574A (ja) | 2005-03-03 |
DE10151919B4 (de) | 2007-02-01 |
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