WO2003036359A3 - Optisches element mit einer optischen achse - Google Patents

Optisches element mit einer optischen achse Download PDF

Info

Publication number
WO2003036359A3
WO2003036359A3 PCT/EP2002/011656 EP0211656W WO03036359A3 WO 2003036359 A3 WO2003036359 A3 WO 2003036359A3 EP 0211656 W EP0211656 W EP 0211656W WO 03036359 A3 WO03036359 A3 WO 03036359A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical
optical element
optical axis
extension
axis
Prior art date
Application number
PCT/EP2002/011656
Other languages
English (en)
French (fr)
Other versions
WO2003036359A2 (de
Inventor
Thomas Petasch
Hartmut Muenker
Bernhard Gellrich
Original Assignee
Zeiss Carl Semiconductor Mfg
Thomas Petasch
Hartmut Muenker
Bernhard Gellrich
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Semiconductor Mfg, Thomas Petasch, Hartmut Muenker, Bernhard Gellrich filed Critical Zeiss Carl Semiconductor Mfg
Priority to JP2003538798A priority Critical patent/JP2005506574A/ja
Priority to EP02782948A priority patent/EP1442329A2/de
Priority to US10/489,030 priority patent/US7295331B2/en
Publication of WO2003036359A2 publication Critical patent/WO2003036359A2/de
Publication of WO2003036359A3 publication Critical patent/WO2003036359A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Abstract

Ein optisches Element (1) mit einer optischen Achse (3), insbesondere für ein Belichtungsobjektiv in der Halbleiter-Lithographie, weist wenigstens einen Fortsatz (2,2') in Richtung der optischen Achse (3) auf. Eine Vorrichtung (11) dient zum Einleiten einer zwei- oder mehrwelligen Deformation in das optische Element (1). Dabei ist wenigstens eine Einrichtung (12) zum Einbringen einer Kraft in den Fortsatz (2,2') im Bereich des Fortsatzes (2,2') angeordnet.
PCT/EP2002/011656 2001-10-20 2002-10-18 Optisches element mit einer optischen achse WO2003036359A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2003538798A JP2005506574A (ja) 2001-10-20 2002-10-18 光軸を有する光学部品
EP02782948A EP1442329A2 (de) 2001-10-20 2002-10-18 Optisches element mit einer optischen achse
US10/489,030 US7295331B2 (en) 2001-10-20 2002-10-18 Optical element with an optical axis

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10151919A DE10151919B4 (de) 2001-10-20 2001-10-20 Belichtungsobjektiv in der Halbleiterlithographie
DE10151919.2 2001-10-20

Publications (2)

Publication Number Publication Date
WO2003036359A2 WO2003036359A2 (de) 2003-05-01
WO2003036359A3 true WO2003036359A3 (de) 2003-10-09

Family

ID=7703214

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/011656 WO2003036359A2 (de) 2001-10-20 2002-10-18 Optisches element mit einer optischen achse

Country Status (5)

Country Link
US (1) US7295331B2 (de)
EP (1) EP1442329A2 (de)
JP (1) JP2005506574A (de)
DE (1) DE10151919B4 (de)
WO (1) WO2003036359A2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4314054B2 (ja) * 2003-04-15 2009-08-12 キヤノン株式会社 露光装置及びデバイスの製造方法
DE102004035595B4 (de) 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Verfahren zur Justage eines Projektionsobjektives
US7436484B2 (en) * 2004-12-28 2008-10-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2006079537A2 (en) * 2005-01-26 2006-08-03 Carl Zeiss Smt Ag Optical assembly
JP4817702B2 (ja) * 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
US8194242B2 (en) * 2005-07-29 2012-06-05 Asml Netherlands B.V. Substrate distortion measurement
DE102005057325A1 (de) * 2005-12-01 2007-06-06 Carl Zeiss Smt Ag Vorrichtung zur Variation der Abbildungseigenschaften eines Spiegels
DE102005062401A1 (de) * 2005-12-23 2007-06-28 Carl Zeiss Smt Ag Vorrichtung zur Variation der Abbildungseigenschaften eines Spiegels
DE102006016376B4 (de) * 2006-04-05 2011-02-17 Odelo Gmbh Linsenverstellvorrichtung
JP2007304123A (ja) * 2006-05-08 2007-11-22 Sony Corp 変形可能ミラー装置
DE102006034755A1 (de) * 2006-07-24 2008-01-31 Carl Zeiss Smt Ag Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
DE102007010906A1 (de) * 2007-03-05 2008-09-11 Seereal Technologies S.A. Abbildungsvorrichtung zum Beeinflussen von auftreffendem Licht
FR2933782B1 (fr) * 2008-07-11 2010-08-13 Thales Sa Dispositif de correction des defauts optiques d'un miroir de telescope
DE102008032853A1 (de) 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
FR2980278B1 (fr) * 2011-09-16 2014-05-02 Thales Sa Miroir comprenant des moyens mecaniques de generation d'aberrations geometriques primaires
JP6501793B2 (ja) * 2014-04-04 2019-04-17 カール・ツァイス・エスエムティー・ゲーエムベーハー 変形装置を備えた光学モジュール及び光学素子を変形させる方法
DE102015223518A1 (de) * 2015-11-27 2017-05-18 Carl Zeiss Smt Gmbh Optische Vorrichtung sowie Lithographieanlage
DE102019208980A1 (de) 2019-06-19 2020-12-24 Carl Zeiss Smt Gmbh Optisches system, optische anordnung und lithographieanlage
DE102020211096A1 (de) 2020-09-02 2022-03-03 Carl Zeiss Smt Gmbh Feldfacette für einen Feldfacettenspiegel einer Projektionsbelichtungsanlage
DE102020214800A1 (de) 2020-11-25 2022-05-25 Carl Zeiss Smt Gmbh Feldfacettensystem und lithographieanlage
DE102020214798A1 (de) 2020-11-25 2022-05-25 Carl Zeiss Smt Gmbh Feldfacettensystem und lithographieanlage

Citations (5)

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Publication number Priority date Publication date Assignee Title
EP0938009A1 (de) * 1998-02-20 1999-08-25 Carl Zeiss Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
JP2000114143A (ja) * 1998-10-02 2000-04-21 Canon Inc 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie

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US4066343A (en) * 1976-04-15 1978-01-03 The Perkin-Elmer Corporation Configuration control apparatus
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0938009A1 (de) * 1998-02-20 1999-08-25 Carl Zeiss Optische Anordnung und Projektionsbelichtungsanlage der Mikrolithographie mit passiver thermischer Kompensation
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
DE19827603A1 (de) * 1998-06-20 1999-12-23 Zeiss Carl Fa Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie
JP2000114143A (ja) * 1998-10-02 2000-04-21 Canon Inc 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie

Non-Patent Citations (1)

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Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 07 29 September 2000 (2000-09-29) *

Also Published As

Publication number Publication date
DE10151919B4 (de) 2007-02-01
US20040257683A1 (en) 2004-12-23
US7295331B2 (en) 2007-11-13
DE10151919A1 (de) 2003-05-15
WO2003036359A2 (de) 2003-05-01
EP1442329A2 (de) 2004-08-04
JP2005506574A (ja) 2005-03-03

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