WO2002052303A2 - Projektionsobjektiv - Google Patents

Projektionsobjektiv Download PDF

Info

Publication number
WO2002052303A2
WO2002052303A2 PCT/EP2001/014846 EP0114846W WO02052303A2 WO 2002052303 A2 WO2002052303 A2 WO 2002052303A2 EP 0114846 W EP0114846 W EP 0114846W WO 02052303 A2 WO02052303 A2 WO 02052303A2
Authority
WO
WIPO (PCT)
Prior art keywords
lens
refractive power
lens group
lenses
projection
Prior art date
Application number
PCT/EP2001/014846
Other languages
German (de)
English (en)
French (fr)
Other versions
WO2002052303A3 (de
Inventor
Karl-Heinz Schuster
Original Assignee
Carl Zeiss Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10126946A external-priority patent/DE10126946A1/de
Application filed by Carl Zeiss Smt Ag filed Critical Carl Zeiss Smt Ag
Priority to JP2002553149A priority Critical patent/JP2004524554A/ja
Priority to EP01989598A priority patent/EP1344112A2/de
Priority to US10/094,565 priority patent/US6954316B2/en
Publication of WO2002052303A2 publication Critical patent/WO2002052303A2/de
Publication of WO2002052303A3 publication Critical patent/WO2002052303A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Definitions

  • the fourth lens group LG4 through which a second waist is formed, consists of the lenses L15-L18.
  • the lens L15 is bent towards the object.
  • the lens L19, the lens group LG5 adjoining it, has lens surfaces which are bent and approximately parallel to the image.
  • the difference in the radii is less than 3% based on the smaller radius. In particular, the absolute radius difference is less than 4mm.
  • the refractive power of this lens L19 is, with f ⁇ > 4000, very low.
  • This lens arrangement 19 shown in FIG. 4 can be subdivided into six lens groups LG1-LG6.
  • the first lens group begins with a negative lens Ll, followed by the four positive lenses L2 - L5. This first lens group has positive refractive power.
  • the second lens group begins with a meniscus lens L6 of negative refractive power, which is curved toward the object. This negative lens is followed by two further negative lenses L 7 and L 8.
  • the following lens L9 is a meniscus lens with positive refractive power, which has a convex lens surface on the object side and is therefore curved toward the lens.
  • the last lens of the second lens group is a meniscus lens of negative refractive power which is curved toward the image and is aspherized on the convex lens surface arranged on the image side. This second lens group has negative refractive power.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
PCT/EP2001/014846 2000-12-22 2001-12-15 Projektionsobjektiv WO2002052303A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002553149A JP2004524554A (ja) 2000-12-22 2001-12-15 投射対物レンズ
EP01989598A EP1344112A2 (de) 2000-12-22 2001-12-15 Projektionsobjektiv
US10/094,565 US6954316B2 (en) 2000-12-22 2002-03-08 Projection objective

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10065944.6 2000-12-22
DE10065944 2000-12-22
DE10126946A DE10126946A1 (de) 2000-11-02 2001-06-01 Projektionsobjektiv
DE10126946.3 2001-06-01

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US10/094,565 Continuation-In-Part US6954316B2 (en) 2000-12-22 2002-03-08 Projection objective
US10/094,565 Continuation US6954316B2 (en) 2000-12-22 2002-03-08 Projection objective

Publications (2)

Publication Number Publication Date
WO2002052303A2 true WO2002052303A2 (de) 2002-07-04
WO2002052303A3 WO2002052303A3 (de) 2002-10-31

Family

ID=26008138

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/014846 WO2002052303A2 (de) 2000-12-22 2001-12-15 Projektionsobjektiv

Country Status (4)

Country Link
US (1) US6954316B2 (enrdf_load_stackoverflow)
EP (1) EP1344112A2 (enrdf_load_stackoverflow)
JP (1) JP2004524554A (enrdf_load_stackoverflow)
WO (1) WO2002052303A2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
US7551361B2 (en) * 2003-09-09 2009-06-23 Carl Zeiss Smt Ag Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US6906866B2 (en) * 2003-10-15 2005-06-14 Carl Zeiss Smt Ag Compact 1½-waist system for sub 100 nm ArF lithography
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
CN101387736B (zh) * 2007-09-13 2012-05-23 鸿富锦精密工业（深圳）有限公司 投影镜头
TWI390244B (zh) * 2009-06-12 2013-03-21 Largan Precision Co Ltd 攝影鏡頭
DE102015218328B4 (de) * 2015-09-24 2019-01-17 Carl Zeiss Smt Gmbh Optisches System zur Feldabbildung und/oder Pupillenabbildung

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DE68916451T2 (de) 1988-03-11 1994-11-17 Matsushita Electric Ind Co Ltd Optisches Projektionssystem.
US5164750A (en) * 1990-11-08 1992-11-17 Yoshi Adachi Aspheric surface topographer
KR100213181B1 (ko) * 1992-07-31 1999-08-02 윤종용 투영광학장치
JP3291818B2 (ja) * 1993-03-16 2002-06-17 株式会社ニコン 投影露光装置、及び該装置を用いる半導体集積回路製造方法
JP3360387B2 (ja) * 1993-11-15 2002-12-24 株式会社ニコン 投影光学系及び投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3454390B2 (ja) 1995-01-06 2003-10-06 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3819048B2 (ja) 1995-03-15 2006-09-06 株式会社ニコン 投影光学系及びそれを備えた露光装置並びに露光方法
JP3624973B2 (ja) * 1995-10-12 2005-03-02 株式会社ニコン 投影光学系
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
US6018424A (en) * 1996-12-11 2000-01-25 Raytheon Company Conformal window design with static and dynamic aberration correction
JP3823436B2 (ja) 1997-04-03 2006-09-20 株式会社ニコン 投影光学系
DE19818444A1 (de) 1997-04-25 1998-10-29 Nikon Corp Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren
US5990926A (en) 1997-07-16 1999-11-23 Nikon Corporation Projection lens systems for excimer laser exposure lithography
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
US6075650A (en) * 1998-04-06 2000-06-13 Rochester Photonics Corporation Beam shaping optics for diverging illumination, such as produced by laser diodes
US5986824A (en) 1998-06-04 1999-11-16 Nikon Corporation Large NA projection lens system with aplanatic lens element for excimer laser lithography
US5969803A (en) 1998-06-30 1999-10-19 Nikon Corporation Large NA projection lens for excimer laser lithographic systems
US6298084B1 (en) 1998-11-24 2001-10-02 Motorola, Inc. Bad frame detector and turbo decoder
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1006388A3 (de) * 1998-11-30 2002-05-02 Carl Zeiss Reduktions-Projektionsobjektiv der Mikrolithographie
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
EP1094350A3 (en) * 1999-10-21 2001-08-16 Carl Zeiss Optical projection lens system
EP1242843B1 (de) * 1999-12-29 2006-03-22 Carl Zeiss SMT AG Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
KR20030072568A (ko) * 2000-12-22 2003-09-15 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 하나 이상의 비구면 렌즈를 갖는 대물렌즈
DE10152528A1 (de) 2001-10-24 2003-05-08 Delphi Tech Inc Radar-Sicherungssystem

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009104184A (ja) * 2002-07-04 2009-05-14 Nikon Corp 投影光学系、露光装置、およびデバイス製造方法
WO2005001543A1 (ja) * 2003-06-26 2005-01-06 Nikon Corporation 投影光学系、露光装置、およびデバイス製造方法

Also Published As

Publication number Publication date
WO2002052303A3 (de) 2002-10-31
EP1344112A2 (de) 2003-09-17
US20030048547A1 (en) 2003-03-13
US6954316B2 (en) 2005-10-11
JP2004524554A (ja) 2004-08-12

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