WO2002024587A1 - Verre de silice pour rayons ultraviolets a courte longueur d'ondes, lampe a decharge comprenant ce verre, receptacle pour cette lampe et dispositif a rayonnement ultraviolet - Google Patents

Verre de silice pour rayons ultraviolets a courte longueur d'ondes, lampe a decharge comprenant ce verre, receptacle pour cette lampe et dispositif a rayonnement ultraviolet Download PDF

Info

Publication number
WO2002024587A1
WO2002024587A1 PCT/JP2001/008197 JP0108197W WO0224587A1 WO 2002024587 A1 WO2002024587 A1 WO 2002024587A1 JP 0108197 W JP0108197 W JP 0108197W WO 0224587 A1 WO0224587 A1 WO 0224587A1
Authority
WO
WIPO (PCT)
Prior art keywords
discharge lamp
quartz glass
ultraviolet
less
ultraviolet light
Prior art date
Application number
PCT/JP2001/008197
Other languages
English (en)
Japanese (ja)
Inventor
Koji Nakano
Original Assignee
Photoscience Japan Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Photoscience Japan Corporation filed Critical Photoscience Japan Corporation
Publication of WO2002024587A1 publication Critical patent/WO2002024587A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/30—Vessels; Containers
    • H01J61/302—Vessels; Containers characterised by the material of the vessel
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals

Definitions

  • the present invention relates to an improvement of quartz glass used for an apparatus for decomposing organic substances by emitting ultraviolet energy in a wavelength range of 200 nm or less, and further relates to a discharge lamp, an ultraviolet irradiation apparatus and a method using the quartz glass.
  • a discharge lamp an ultraviolet irradiation apparatus and a method using the quartz glass.
  • FIG. 4 shows an example of a conventionally known closed type ultraviolet irradiation bath for liquid treatment.
  • the discharge lamp 30 is housed in an outer tube (protective tube) 20.
  • the discharge lamp 30 is housed in a stainless steel cylinder 1 and the liquid to be treated is introduced into the cylinder 1 and irradiated with ultraviolet rays emitted from the discharge lamp 30.
  • the discharge lamp 30 for example, a low-pressure mercury vapor discharge lamp that efficiently emits ultraviolet rays in a wavelength range of 185 nm is used.
  • the arc tube 10 of the discharge lamp 30 is also made of quartz glass having excellent ultraviolet transmittance.
  • the discharge lamp 30 is housed inside an outer tube (protective tube) 20 that transmits ultraviolet light, and the discharge lamp 30 is liquid-tightly isolated from the liquid to be treated.
  • the powerful outer tube 20 is also made of quartz glass with excellent ultraviolet transmittance! Both ends of the cylinder 1 are closed by flanges la and lb, and the liquid to be treated taken in from the water inlet lc is irradiated with ultraviolet rays while passing through the cylinder 11 and discharged from the water outlet Id.
  • the liquid to be treated flows in the cylinder 1 from the water inlet lc toward the water outlet Id.
  • Several pieces (five in the figure) of the liquid to be treated Flow plate le ⁇ Li is arranged. For the sake of convenience, FIG.
  • FIG. 5 illustrates a device equipped with only one discharge lamp 30, but in practice, a multi-lamp type large-capacity device is often used.
  • Ultraviolet light emitted from the discharge lamp 30 passes through the outer tube 20 and irradiates the liquid to be treated. Irradiated ultraviolet rays, for example, the organic matter present in the water in Succoth action decomposes were result into harmless CO, C0 2, H 2 0 as follows.
  • CnHmOk + OH radio cane ⁇ CO, C ⁇ 2 , H 2 O
  • FIG. 5 shows a configuration example of the discharge lamp 30.
  • Both ends of the quartz glass arc tube 10 are hermetically closed by glass stems 2a and 2b.
  • a pair of filaments 21a and 21b are coated with a barium oxide (BaO) emitter for the purpose of smooth discharge.
  • the filaments 21a and 21b are held on the glass stems 2a and 2b, respectively, and are connected to the terminals 31a to 31d of the bases 3a and 3b via inner leads 22a to 22d, molybdenum foils 24a to 24d, and outer leads 25a to 25d. It is electrically connected. Also, an appropriate amount of mercury and argon gas are sealed in the valve.
  • the electric discharge lamp 30 When the electric discharge lamp 30 is connected to a predetermined power supply (not shown) and power is applied, a discharge occurs between the filaments 21a and 21b, mercury is evaporated by the discharge heat, and ultraviolet rays are emitted by excitation of the mercury nuclear power. become.
  • the present inventor has sought to determine the causes of various viewpoints and to devise a solution to solve the powerful problem. And found that there was a cause. Then, they came up with a clear measure to improve the aging of the transparent quartz glass. Therefore, the present invention has been made in view of the above points, and provides quartz glass with improved aging of ultraviolet transmittance in a short wavelength range, and maintains ultraviolet intensity by using strong quartz glass. It is an object of the present invention to provide a high-density discharge lamp having a significantly improved efficiency, and to provide an energy-saving ultraviolet irradiation apparatus and method by using such a quartz glass or a discharge lamp.
  • the inventor of the present invention has found that the short-wavelength ultraviolet light emitted by the discharge lamp itself alters the quartz glass forming the tube of the discharge lamp, lowers the transmittance, and reduces the ultraviolet intensity. It was concluded that the cause was that the retention rate decreased over time. In other words, while the conventionally known low-density light source has a small absolute amount of ultraviolet light and thus does not cause significant deterioration, the high-density discharge lamp causes the deterioration with time. It is understood that it appeared as a phenomena. The present inventor has found a quartz glass composition that can significantly improve the ultraviolet intensity maintenance rate. That is, the facts discovered by the present inventors are mainly the following three points.
  • the first point is, in the silicon dioxide of the main component constituting the essence of silica glass (Si0 2), sodium (Na), potassium (K), when many impurities exist titanium (Ti) and iron (Fe) Short Absorption of ultraviolet light of a wavelength, causing a decrease in the transmittance of quartz glass. Numerous glass samples were investigated and analyzed in terms of short-wavelength UV transmittance, and the fact that the decrease in transmittance over time of quartz glass due to these impurities was identified using statistical methods. The second point is that, even if the transmittance is slightly reduced at the beginning, the quartz glass is degraded with time during use of the discharge lamp, and the force gradually leads to a significant decrease in transmittance. .
  • the above-mentioned alteration of quartz glass can be reduced by the presence of OH groups.
  • Alteration is a phenomenon that occurs because the “Si—O” bond of quartz glass is decomposed by ultraviolet energy and free silicon (Si) is generated, accompanied by a decrease in transmittance.
  • the dissociation energy of “Si— ⁇ ” is 145 kCal / mol, which corresponds to 200 nm ultraviolet energy. Therefore, when the quartz glass is exposed to ultraviolet light having a wavelength of 200 nm or less, dissociation of “Si-0” which causes a decrease in transmittance occurs. It is considered that the alteration relaxation is effective in suppressing the presence of free Si by free silicon (Si) being recombined with OH groups to form “Si—OHJ”.
  • the quartz glass for short-wavelength ultraviolet light is a quartz glass that is used by being exposed to ultraviolet light having a wavelength range of 200 nm or less.
  • the total content of the four elements, sodium (Na), potassium (K), titanium (Ti), and iron (Fe) is 2.5 ppm or less and OH groups of 10 ppm or more It is characterized by including.
  • the dissociation of “Si-0” in quartz glass hardly occurs with respect to ultraviolet rays in a wavelength range longer than 200 nm, and thus was excluded from the present invention.
  • the reason for setting the boundary value of the total content of the above four elements to “2.5 ppm or less” was set based on the experience of repeated experiments. For example, a total content of “4. Oppm” is clearly better than a total content of “3.06 ppm”. On the other hand, it was confirmed that those with a total content of “1.56 ppm” were good, and those with a total content of “1.20 ppm” were also good.
  • the discharge lamp according to the present invention is characterized in that a substance that emits ultraviolet light in a wavelength range of 200 nm or less is enclosed in a container made of quartz glass configured as described above, It is. With this structure, it is possible to provide a discharge lamp with significantly improved ultraviolet intensity maintenance rate. It becomes possible.
  • An ultraviolet irradiation device is provided with the discharge lamp configured as described above. This makes it possible to provide an ultraviolet irradiation device capable of maintaining a high ultraviolet transmittance for a long period of time, and to provide an energy-saving ultraviolet irradiation device with low running cost.
  • the quartz glass according to the present invention is not limited to the container (bulb) itself of the ultraviolet discharge lamp as described above, but can be used as a material for protecting the discharge lamp, that is, as a material of an outer tube or a protective tube. In this case, the same operation and effect as described above can be expected. Further, the quartz glass according to the present invention may be used not only for the container (bulb) of the ultraviolet discharge lamp itself but also as a material for protecting the discharge lamp, that is, as a material of an outer tube or a protective tube. Then, it is possible to provide an energy-saving ultraviolet irradiating apparatus with further lower running cost.
  • the ultraviolet irradiation method according to the present invention emits ultraviolet light in a wavelength range of 200 nm or less from a discharge lamp using a discharge tube made of quartz glass as a material as described above, and irradiates the object to be treated. By doing so, processing such as sterilization, disinfection, and decomposition of organic substances is performed.
  • a discharge lamp that emits ultraviolet light having a wavelength range of 200 nm or less is housed in a container made of quartz glass having the above-described structure, and the discharge lamp in the container is used.
  • treatment such as sterilization, disinfection, or decomposition of organic substances is performed.
  • FIG. 1 is a schematic partial cross-sectional view showing one embodiment of a discharge lamp according to the present invention
  • FIG. 2 shows various discharge lamps manufactured using the total content of sodium (Na), potassium (K), titanium (Ti), iron (Fe) and the content of OH groups as parameters of the composition of quartz glass.
  • FIG. 3 is a graph showing an ultraviolet intensity maintenance rate curve obtained by performing a lighting experiment over a long period of time. A graph showing the experimental results comparing the possible processing capacity with the processing flow rate per unit of power,
  • FIG. 4 is a diagram showing an example of a conventional liquid ultraviolet irradiation apparatus
  • FIG. 5 is a schematic partial sectional view showing an example of a conventional discharge lamp.
  • FIG. 1 shows an example of a discharge lamp L according to one embodiment of the present invention.
  • the discharge lamp L according to one embodiment of the present invention has a material strength of the arc tube bulb 11 and a discharge lamp L of the conventional discharge lamp 30. It differs from the material of the arc tube 10 only in that it is different. Other configurations may be the same as those in the related art, and thus detailed description thereof will be omitted.
  • the quartz glass constituting the material of the arc tube 11 of the discharge lamp L is made of natural quartz or quartz sand as a starting material, and includes sodium (Na), potassium), titanium, i) and iron.
  • the total content of the four elements of (Fe) is less than 2.5 ppm, and some contain OH groups of more than 10 ppm.
  • the inner diameter of the arc tube bulb 11 is 22 mm
  • the wall pressure is 1 mm
  • a pair of filaments 21 a and 21 b coated with a barium oxide emitter are arranged at both ends at intervals of 150 cm.
  • the discharge lamp L is configured to emit ultraviolet light in a wavelength range of 200 nm or less.
  • the quartz glass constituting the material of the arc tube 11 of the discharge lamp L there are four types of elements, namely, sodium (Na), potassium (K), titanium (Ti), and iron (Fe). Is not more than 2.5 ppm and contains not less than 10 ppm of OH groups, so that the aging of the quartz glass of the arc tube bulb 11 due to the short wavelength ultraviolet light emitted by the discharge lamp L is deteriorated. Can be considerably improved.
  • Figure 2 shows various types of quartz glass manufactured using the total content of sodium (Na), potassium (K), titanium (Ti), and iron (Fe) and the content of the base group as parameters. It is an ultraviolet intensity maintenance rate curve obtained by performing a lighting experiment for a long period of time. The shape and dimensions of the discharge lamp are the same, the horizontal axis represents the lighting time, and the vertical axis represents the ultraviolet intensity of 185 nm wavelength when the initial value of the intensity of the discharge lamp according to the present invention is 100%.
  • the composition conditions of quartz glass in each discharge lamp corresponding to each song, B, C, D are as shown in the table below. [table 1]
  • Curve A is sodium (Na), potassium (K), titanium (Ti) and iron (Fe) as defined in the present invention
  • the total content of the four kinds of elements is 2.5 ppm
  • the following satisfies the condition that an OH group contains 10 ppm or more, and the curves B, C, and D do not satisfy the condition.
  • the curve HA it is clear from the curve HA that the best result is obtained, and it is clear that the impurities in quartz glass are sodium (Na), potassium (K), titanium (Ti), and iron (Fe).
  • ozone is generated by the reaction to ultraviolet light in the atmosphere, and if the generated ozone is interposed between the discharge lamp and the ultraviolet intensity meter, the measured value varies.
  • the measurement was performed by directly attaching to the outer surface of the lamp.
  • the system is generally designed assuming that the UV maintenance rate after use for one year is 70%. From that point of view, it is clear that quartz glass with a composition that gives the result of the curve in Fig. 2 is effective, and quartz glass with a composition that gives the result of curves B, C, and D is clearly not effective. As described above, the total content of the four elements of sodium (Na), potassium (K), titanium (Ti), and iron (Fe), which are impurities in quartz glass, is 2.5 ppm or less. For example, the UV maintenance rate after one year of use can be maintained at 70% or more. If we comment on the OH group content, less than 10 PPm is insufficient for the Si-OH recombination effect.
  • the present invention is also applied to a discharge lamp or the like in which a substance capable of emitting excimer light such as xenon (Xe), chlorine (C1), bromine (Br), and fluorine (F) is sealed.
  • a substance capable of emitting excimer light such as xenon (Xe), chlorine (C1), bromine (Br), and fluorine (F) is sealed.
  • the quartz glass made of the material according to the present invention is used not only in the arc tube of the discharge lamp itself, but also in any part or component used when exposed to ultraviolet rays in a wavelength range of 200 nm or less. be able to.
  • the quartz glass according to the present invention can be used as the material of the ultraviolet-transparent glass wall in the outer tube (protective tube) 20 as shown in FIG.
  • the shape of such an outer tube (protective tube) for accommodating the discharge lamp, that is, the container is not limited to a cylindrical shape, but may be any shape.
  • the discharge lamp L according to the embodiment of the present invention shown in FIG. 1 (the arc tube bulb 11 has an inner diameter of 22 mm, a wall thickness of lmm, a filament interval of 150 cm, and contains about 20 mg of mercury and 130 Pa of argon gas. )
  • a quartz glass outer tube made of a raw material according to the present invention hereinafter referred to as the device of the present invention
  • a conventional discharge lamp in a quartz glass outer tube according to the prior art a quartz glass outer tube made of a raw material according to the present invention
  • Fig. 3 shows the results of an experiment comparing the ability of a stored ultraviolet irradiation device (hereinafter referred to as a conventional device and a laser) to process over time.
  • FIG. 3 shows a comparison of the processing capacity per unit of electric power between the apparatus of the present invention and the conventional apparatus, which can reduce the raw water having a TOC concentration of lOppb to lppb or less. / kWH), and the horizontal axis indicates time.
  • the apparatus of the present invention and the conventional apparatus had the same configuration and dimensions except that the quartz glass used for the discharge lamp and the outer tube were different in material. From this figure, it can be seen that the capacity of the conventional device is reduced to about 40% after 8500 hours, which is a guideline for one year of use, while the device of the present invention maintains a capacity of nearly 80%. .
  • the object to be processed by the ultraviolet irradiation apparatus according to the present invention is not limited to a liquid, but may be a solid or a gas.
  • quartz glass having a good transmittance of ultraviolet rays artificial quartz glass called so-called synthetic quartz, which is manufactured using tetrachlorosilane silicon (SiC14) as a starting material, is known.
  • British glass is not limited to the four types of sodium (Na), potassium), titanium (Ti), and iron (Fe) described in the present invention.
  • the feature is that it is extremely small. However, their high cost makes them impractical in the field of the present invention. Therefore, they are out of the scope of the present invention.
  • natural quartz or quartz sand is used as a starting material in quartz glass used by being exposed to ultraviolet light in a wavelength range of 200 nm or less, and sodium quartz, titanium, titanium, and iron are used.
  • the total content of these elements is 2.5 ppm or less, and the composition is such that they contain OH groups of 10 ppm or less.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)

Abstract

L'invention concerne un verre de silice conçu pour être exposé à un rayonnement ultraviolet présentant une longueur d'ondes égale ou inférieure à 200 nm. Ce verre est caractérisé en ce qu'il est produit à partir de cristal de roche ou de sable de silice naturels, présente une teneur globale en sodium, en potassium, en titane et en fer égale ou inférieure à 2,5 ppm, et contient un groupe OH à raison d'une proportion égale ou supérieure à 10 ppm. L'invention concerne également un dispositif de rayonnement ultraviolet dans lequel le verre de silice décrit est utilisé en tant que matériau composant l'enveloppe (11) du tube luminescent d'une lampe (L) à décharge à ultraviolets, ou en tant que matériau du tube externe ou du tube (20) protecteur entourant cette lampe à décharge à rayonnement ultraviolet. Le verre de silice a été amélioré de manière à abaisser le facteur de transmission du rayonnement ultraviolet dans la région des ondes courtes dans la durée, ce qui permet d'obtenir une lampe à décharge et un dispositif à rayonnement ultraviolet présentant un niveau de rétention fortement amélioré de la puissance du rayonnement ultraviolet, fonctionnant à moindres frais et permettant d'économiser l'énergie.
PCT/JP2001/008197 2000-09-21 2001-09-20 Verre de silice pour rayons ultraviolets a courte longueur d'ondes, lampe a decharge comprenant ce verre, receptacle pour cette lampe et dispositif a rayonnement ultraviolet WO2002024587A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000287260A JP2002097036A (ja) 2000-09-21 2000-09-21 短波長紫外線用石英ガラス、それを使用した放電灯、その収納容器および紫外線照射装置
JP2000-287260 2000-09-21

Publications (1)

Publication Number Publication Date
WO2002024587A1 true WO2002024587A1 (fr) 2002-03-28

Family

ID=18771035

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/008197 WO2002024587A1 (fr) 2000-09-21 2001-09-20 Verre de silice pour rayons ultraviolets a courte longueur d'ondes, lampe a decharge comprenant ce verre, receptacle pour cette lampe et dispositif a rayonnement ultraviolet

Country Status (2)

Country Link
JP (1) JP2002097036A (fr)
WO (1) WO2002024587A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005102950A2 (fr) * 2004-04-15 2005-11-03 Heraeus Quarzglas Gmbh & Co. Kg Composant en verre de quartz destine a une source de rayons ultraviolets et procede de production et de test d'aptitude de ce composant en verre de quartz

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100391858C (zh) * 2002-11-27 2008-06-04 株式会社日本光电科技 紫外线液体处理装置和处理方法
CN1864239A (zh) * 2003-04-10 2006-11-15 皇家飞利浦电子股份有限公司 灯具组件
JP6250920B2 (ja) * 2012-08-21 2017-12-20 岩崎電気株式会社 水処理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6230632A (ja) * 1985-08-01 1987-02-09 Shinetsu Sekiei Kk 高純度石英ガラスの製造方法
JPH06305767A (ja) * 1993-04-26 1994-11-01 Shinetsu Quartz Prod Co Ltd 耐失透性放電灯用シリカガラス
US5572091A (en) * 1992-09-15 1996-11-05 Patent-Treuhand-Gesellschaft f ur elektrische Gl uhlampen mbH Quartz glass with reduced ultraviolet radiation transmissivity, and electrical discharge lamp using such glass
JPH1160264A (ja) * 1997-08-07 1999-03-02 Shinetsu Quartz Prod Co Ltd 高出力真空紫外線用合成シリカガラス大型板材およびその製造方法
JP2000086259A (ja) * 1998-09-07 2000-03-28 Tosoh Corp 真空紫外線用光学材料

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6230632A (ja) * 1985-08-01 1987-02-09 Shinetsu Sekiei Kk 高純度石英ガラスの製造方法
US5572091A (en) * 1992-09-15 1996-11-05 Patent-Treuhand-Gesellschaft f ur elektrische Gl uhlampen mbH Quartz glass with reduced ultraviolet radiation transmissivity, and electrical discharge lamp using such glass
JPH06305767A (ja) * 1993-04-26 1994-11-01 Shinetsu Quartz Prod Co Ltd 耐失透性放電灯用シリカガラス
JPH1160264A (ja) * 1997-08-07 1999-03-02 Shinetsu Quartz Prod Co Ltd 高出力真空紫外線用合成シリカガラス大型板材およびその製造方法
JP2000086259A (ja) * 1998-09-07 2000-03-28 Tosoh Corp 真空紫外線用光学材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005102950A2 (fr) * 2004-04-15 2005-11-03 Heraeus Quarzglas Gmbh & Co. Kg Composant en verre de quartz destine a une source de rayons ultraviolets et procede de production et de test d'aptitude de ce composant en verre de quartz
WO2005102950A3 (fr) * 2004-04-15 2006-03-02 Heraeus Quarzglas Composant en verre de quartz destine a une source de rayons ultraviolets et procede de production et de test d'aptitude de ce composant en verre de quartz

Also Published As

Publication number Publication date
JP2002097036A (ja) 2002-04-02

Similar Documents

Publication Publication Date Title
JP2001332216A (ja) 放電ランプ、光照射装置、殺菌装置、液体処理装置および空気清浄装置
KR100854564B1 (ko) 방전등, 자외선 조사 장치 및 그 운용 방법
Sosnin et al. A bactericidal barrier-discharge KrBr excilamp
WO2002005311A1 (fr) Appareil de traitement par les uv
WO2002024587A1 (fr) Verre de silice pour rayons ultraviolets a courte longueur d'ondes, lampe a decharge comprenant ce verre, receptacle pour cette lampe et dispositif a rayonnement ultraviolet
CN101585574A (zh) 去除水中溴酸盐的方法和装置
JP2891997B1 (ja) 紫外線ランプ
TW570816B (en) Ultraviolet ray irradiation device and operation method thereof
JP4865965B2 (ja) 紫外線による液体処理装置及び方法
JP6728962B2 (ja) 水処理装置
JP2001083083A (ja) 全窒素の測定方法及び測定装置
JP6788842B2 (ja) 水処理装置
CN100391858C (zh) 紫外线液体处理装置和处理方法
JPH1021880A (ja) 放電ランプ、照射装置、殺菌装置および水処理装置
JP4959072B2 (ja) 光化学反応処理装置および光化学反応処理方法
WO2023243288A1 (fr) Procédé de génération de gaz contenant de l'ozone et système de génération de gaz contenant de l'ozone
KR20040046862A (ko) 자외선에 의한 액체 처리 장치 및 방법
JP4432321B2 (ja) エキシマ照射装置の初期調整方法
JP2003059453A5 (fr)
JPH09199033A (ja) 誘電体バリア放電ランプの製造方法
JPH08115705A (ja) 水銀ランプとそれを用いた物質処理方法
JP4603991B2 (ja) ランプ封入ガス及びガス封入ランプの製造方法
KR100764332B1 (ko) 광화학 반응 처리 장치 및 광화학 반응 처리 방법
JPH1190370A (ja) 表面処理装置及びその処理方法
JPH05198283A (ja) 紫外線ランプ

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): CN DE KR SG US

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
REG Reference to national code

Ref country code: DE

Ref legal event code: 8642