WO2000077829A2 - Celula solar fotovoltaica de semiconductor de banda intermedia - Google Patents
Celula solar fotovoltaica de semiconductor de banda intermedia Download PDFInfo
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- WO2000077829A2 WO2000077829A2 PCT/ES2000/000209 ES0000209W WO0077829A2 WO 2000077829 A2 WO2000077829 A2 WO 2000077829A2 ES 0000209 W ES0000209 W ES 0000209W WO 0077829 A2 WO0077829 A2 WO 0077829A2
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- solar cell
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- intermediate band
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/032—Inorganic materials including, apart from doping materials or other impurities, only compounds not provided for in groups H01L31/0272 - H01L31/0312
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Definitions
- a solar cell capable of converting solar energy into electricity is described, which is based on a new operating principle capable of achieving efficiencies greater than those achieved with current solar cells. Therefore, this invention pertains to the field of semiconductor devices for electronic use, and more specifically, to the manufacture of solar cells.
- the cell contains a semiconductor (1) with an intermediate band (2) half full of electrons located between two layers of ordinary semiconductors (3) of type n and (4) of type p.
- a semiconductor (1) with an intermediate band (2) half full of electrons located between two layers of ordinary semiconductors (3) of type n and (4) of type p.
- electron-hole pairs are created, either by absorption of a photon (5) of the necessary energy or by the consecutive absorption of two of lower energy (6) and (7), which pump an electron from the valence band (8) to the intermediate band (2) and from there to the conduction band (9).
- From the semiconductor (3) of type n a flow of electrons mainly comes out, by the (4) of type p a flow of holes; thus an electric current is established that leaves on the p side and returns on the n side.
- the n (3) and p (4) layers also prevent the intermediate band (2) from being in contact with the external metal connections, which would result in a short circuit.
- Solar cells as they are today are manufactured with a semiconductor and are based on the following operating principle: The photons of light, when they hit the solar cell, are absorbed by it, giving their energy to the valence electrons of the semiconductor , and pulling them from the bonds that keep them linked to the nuclei of the atoms, being in a higher energetic state called conduction band, in which they can be easily moved by The semiconductor At the same time, the holes left by the torn electrons can jump from nucleus to nucleus, also constituting a second type of charge carriers, this time positive, which, located in the valence band also move easily.
- each photon absorbed in a useful way produces or generates an electron-hollow pair.
- electrons can only leave electrons in the region n since there are hardly any holes, while in the region p they can only leave holes because there are hardly any electrons with which, in the illuminated solar cell, electrons leave by its face n and hollows by its face po, which is the same, a current leaves by the face p and enters by the n.
- Fermi level is the energy level to which quantum states contain an electron at absolute zero. Above this level the states are empty. At temperatures other than absolute zero, in a semiconductor not excessively doped, the important relationships are fulfilled
- n and p are respectively the concentration of electrons and holes in the semiconductor
- Nc and Ny are constant characteristics of the semiconductor used, dependent on temperature
- k is the Boltzmann constant
- T is the absolute temperature of the semiconductor
- Ec and Ey are the levels of the minimum of the conduction band and the maximum of the valence band respectively
- E f is the Fermi level.
- the Fermi level has a very important thermodynamic meaning since it represents the chemical potential of the electrons in the solid, the current being proportional to its gradient. In a balanced semiconductor thermal, in which there are no currents, the Fermi level must have zero gradient, that is, be constant throughout the semiconductor.
- the Fermi level is separated into two Fermi pseudo-levels, one for the Ep n electrons and one for the Ep p holes.
- the main parts of a solar cell are: the emitter or upper n region, the lower base or region p, the rear metal contact and the grid-shaped upper metal contact to let light through.
- One of the disadvantages of solar cells is that they do not totally convert the energy of the photons they receive into electrical energy. Indeed, to begin with, the solar cell can only take advantage of the photons with an energy greater than that of the prohibited band E G ⁇ E C -E V , or distance that separates the minimum energy of the conduction band from the maximum level of Valencia band energy. For more energy photons, they also waste the excess energy that the photon brings.
- the best-used photons are those that have energies close to E G - That's why tandem solar cells are used. Tandem cells consist of two or more cells of different values of E G placed one on top of the other in decreasing order of E G so that the one with the highest E G remains on top. These cells are connected in series, usually through a tunnel junction that provides good ohmic contact between them; These unions are such that due to their high doping they form an electric field so high that the semiconductor is electrically perforated, producing a good current conduction through it.
- tandem cells The performance with tandem cells is significantly higher than with single semiconductor cells, and it is in practice when the tandem is sufficiently developed.
- the present invention consists in using a semiconductor with an intermediate band as the origin of a new type of solar cells whose performance exceeds not only conventional solar cells but even tandem cells of two semiconductors all considered as ideal devices.
- a semiconductor has an intermediate band of energy as represented by (2) in Figure 2. It also has, like ordinary semiconductors, a conduction band (9) and a valence band (8).
- photons (5) can pump (16) electrons from the valence band (8) to the conduction band (9), creating electron-hollow pairs.
- photons (6) of less energy, that pump (27) electrons from the valence band (8) to the intermediate band (2) and there are also other photons (7) that pump (28) the electrons from the intermediate band to the conduction band (9).
- the concatenation of the processes (27) for pumping electrons from the valence band to the intermediate band and (28) from this to the conduction band complete the generation of an electron-hollow pair.
- the filling of the conduction band (9) occurs as the difference between the pumping that occurs through the processes (16) and (28) and the falls through the same processes in the opposite direction. This filling is translated only in a current of electrons extracted by the electrode (30).
- the filling of the valence band occurs as the difference between the pumping that occurs through the processes (16) and (27) and the falls through the same processes in the opposite direction. This filling is translated only in a current of holes extracted by the electrode (31). This is the principle on which the invention is based.
- the intermediate band semiconductor photovoltaic solar cell is characterized in that it contains a semiconductor with an energy band located in an intermediate position between the valence and conduction band, and located between two layers of ordinary semiconductors, without intermediate band, one of them type p and the other type n, which separate the semiconductor with intermediate band of the electrical contacts made in the solar cell to extract the current.
- the intermediate band solar cell object of our invention is schematically represented, in its most simplified form, in Figure 3 where (1) represents the semiconductor with the intermediate band, (3) the ordinary n-type semiconductor, (4) the ordinary semiconductor type p.
- the electrical contacts of the face or faces to be illuminated are shaped like a grid and let light through. These grilles could be replaced or reinforced by using a transparent conductor.
- Figure 3 it has been assumed that only one of the faces, the front, and therefore the contact (18) in this region is shaped like a grid while the back is made an ordinary electrical contact (17).
- the type p material is located in the drawing the type n material is located and where the type n material is located, the type p material is located.
- the previous layers either for manufacturing needs (thin layers) or for the mere fact of providing the structure of mechanical stiffness can be deposited on a substrate that serves as support.
- This substrate can be a semiconductor.
- a layer of semiconductor transparent to the useful radiation can be deposited in order to decrease the surface recombination rate of the cell that may or may not be perforated by grooves that facilitate contact between the Layers of ordinary semiconductor and metal grid.
- an antireflective layer can be deposited.
- some doping can be introduced into the intermediate band semiconductor, perhaps Zn, B, P, Be, Sn or Be, of the pon type, for example to increase its conductivity or to control the concentration of carriers in the intermediate band
- the intermediate band semiconductor it could be that it was formed by a composition of several ordinary semiconductors forming a matrix of quantum dots in which the confinement of electrons resulted in the appearance of new energy levels with respect to the ordinary semiconductors that cause the appearance of the intermediate band.
- the intermediate band solar cell with the simplest configuration, would then resemble that illustrated in Figure 4 in which (35) represents the semiconductor with which the dots are manufactured, (36) to the semiconductor material in the which are immersed or barrier material, (3) to the ordinary semiconductor region (n), (4) to the ordinary semiconductor region p, (17) to the rear contact and (18) to the front contact.
- the intermediate band solar cell can be grouped with others of the same type or other solar cells to form a tandem of several cells.
- the intermediate band base region is the region indicated by (1) and comprised between the vertical dashed lines.
- the emitter n is the region (3) also included between vertical dashed lines.
- the emitter p is the region (4) also included between vertical dashed lines.
- the intermediate band solar cell is characterized in that the intermediate band semiconductor has said half band full of electrons or has the Fermi level (10) of the semiconductor located within said band.
- the Fermi level which indicates how far, at the absolute zero of temperature, the possible quantum states for an electron are filled, crosses the intermediate band.
- the fact that the intermediate band is half full of electrons gives the corresponding solid certain metallic aspects, since it is the metals that have half bands filled to absolute zero. In this way, the dotted region (2) would indicate a range of energies in the almost empty band of electrons and the striped part (33), a range of energies almost full of electrons.
- the emitters present the characteristic band diagrams of the ordinary semiconductors. They have a Valencia band (8) and a driving band (9).
- the difference in energies (34) between the minimum of the valence band and the maximum of the conduction band, E G takes the same value in both emitters and in the base, but this does not necessarily have to be so, there may be some difference that would be saved with a small discontinuity in the bands located at the borders between base and emitters where there are vertical dotted lines, and that within limits it would not have pernicious effects and could even have them beneficial.
- photons such as (7) induce transitions (28) of the full part of the intermediate band; that is to say, of energies of the same one below the level of Fermi to the band of Valencia, almost empty.
- the succession of absorptions (27) and (28) also produces electron-hole pairs.
- the difference between the electrons that reach the conduction band through transitions (16) and (28) minus those that disappear through transitions in the opposite direction, that is, from the conduction band (9) to the valence band (8) or the intermediate band (2) has to match that of the electrons that leave that band as an electric current. But because of the scarce electrons in the emitter p (4) almost all electrons go out to the outer circuit through the emitter n (3) forming an incoming current.
- the Fermi level is separated into three different Fermi pseudo-levels (figure 6), one E Fschreib(12) for the electrons of the conduction band, another E Fp (13) for the holes in the valencia band and a third E Fm (29) for the electrically conductive electrons of the intermediate band.
- the pseudo-level of the metal intermediate band does not change its position with respect to the mentioned band due to the fact that there is lighting as it happens in metals, due to the abundant electrons existing in said band.
- the Fermi pseudo-levels of electrons and holes do change position as a result of being the product np greater in lighting than in thermal equilibrium. Since equation (E3) is also valid for this case it turns out that Ep n is everywhere above E Fp .
- the Fermi pseudo-level of electrons (12) is very close to the conduction band, since the electrons provided by the donors are very abundant.
- the Fermi pseudo-level of holes (13) is very close to the Valencia band, since the gaps provided by the acceptors are also very abundant. Although in most of the figure this is not visible, now Fermi pseudo-levels have some small gradient since there are currents of electrons and holes in the solar cell.
- one or both layers of ordinary semiconductors located on both sides of the intermediate band semiconductor layer are double, or contain a gradual doping, with the external part strongly doped and the internal part without doping or doped slightly.
- the low doping of the area near the border with the base is appropriate to avoid the formation of an electric perforation by tunnel effect.
- the high doping in the face Outside of the emitters it is convenient to facilitate contact with the connection metals.
- our invention By comparison to ordinary solar cells our invention produces photocurrent with photons of energy much less than E G while the voltage is governed by the width of E G - These photons, in ordinary cells are lost without any use. For a given voltage our invention can generate much more current, or conversely, for a given current our invention gives a higher voltage. The maximum yield that our invention could have, in the most ideal case, would be 63.1% compared to a conventional solar cell that would be
- Quantum dots (35) can be manufactured by surrounding a semiconductor of small prohibited bandwidth with a semiconductor of greater bandwidth (36). In order to reduce the density of defects, both semiconductors, (35) and (36), should have their crystalline networks coupled, that is, with values of their network constants very close.
- the shape of the "points" (35) is not relevant. Its volume can take any geometric shape. For example, its shape can be approximated by squares or also by spheres. Its precise size depends on the materials used for its manufacture.
- the points should have an effective diameter of about 70 amstrongs.
- the materials used to make the points or the material in which they are immersed could be Ga x In ⁇ - ⁇ As and P ⁇ -y and Al ⁇ Ga ⁇ - ⁇ As and Sb ⁇ . and being x and y, indices that vary between 0 and 1.
- the intermediate band would be reduced to a single energy level but with a high degeneration and equal to the density of points per unit volume (possibly in the order of 10 17 - 5xl0 18 cm "3 ) that would be achieved with a separation between points of about 100 amstrongs for the case in which the points are manufactured with the aforementioned materials.
- the semiconductor composition that gives rise to the structure of quantum dots some doping can be introduced to improve its properties.
- the semiconductor that surrounds the points (36) can be doped or not, depending on the degree of optimization of the structure, for example to be able to adjust the value of its work function and produce the desired band diagram structure.
- the set would be included between two ordinary semiconductors, one of type p (4) and one of type n (3) on which the electrical contacts (17) and (18) would be made.
- a combination of semiconductor growth techniques could be used by MOCVD or MBE with nano photolithography techniques as illustrated in Figures 7 to 12.
- MOCVD or MBE alternative layers of the semiconductor material would be grown ( Figure 7) that it must constitute the point (42) and the material that will surround it (43).
- the purpose of depositing several layers is to manufacture as many points as possible with the least number of technological steps.
- nanophotolithography masks (37) would then be deposited (figure 8) to define what the quantum dots should then constitute (35).
- These masks can be made of photolithographic resin or any other material that resists the dry attack that is suggested in the subsequent technological process.
- some columns (38) would be defined which, depending on the starting structure, may contain several alternating layers, or only one, of the material that constitutes the point (42) and the material (43) that constitutes the surrounding medium or barrier material.
- the space between columns (39) would be filled with barrier material by MOCVD or MBE techniques.
- the process would probably produce a wavy surface (40) (figure 10) that could be flattened using some chemical attack of the barrier material.
- the smoothed surface (41) (figure 11) the process could be repeated to obtain a greater number of points (35), (figure 12).
- the intermediate band base is, for example, the gallium and germanium phosphoarsenide, P x As ⁇ - ⁇ Ga and Ge ⁇ - and , with any indexes being between 0 and 1, both inclusive.
- the gallium and germanium phosphoarsenide P x As ⁇ - ⁇ Ga and Ge ⁇ - and , with any indexes being between 0 and 1, both inclusive.
- An example is presented in figure 13 the calculation, by the LCAO method, of the bands of the PGao (5 Ge 0> 5.
- abscissa (44) the reciprocal vector of the crystalline network is represented and in ordinates (45) the energy.
- the bands filled to absolute zero and in thin line (47) are shown the empty ones.
- the vertical bar on the right a projection of the energy ranges of the bands is represented as it has been used in the diagrams of space bands used in Figs. 1, 2, 5 and 6.
- the intermediate band (2) is shown half full, the conduction band (9) and the valence band (8).
- the two emitters (3) and (4) are made of a current semiconductor. It should be chosen in such a way that the crystalline networks of the emitter and the base are almost equal to avoid the formation of dislocations that would produce undesirable recombinations. With respect to the value of E G in the emitters, several modalities fit into our invention, so that it is acceptable that the same is greater or slightly less than that of the base, but of course it should not be much smaller since this would reduce the voltage excessively.
- the two-sided layers of the intermediate band semiconductor could be formed by PGa x In ⁇ - x being x and any indexes between 0 and 1, both inclusive.
- the base was PGao, 5 Ge 0 ⁇ 5 and the emitters were PGao, Ino, ⁇ , doped with Zn the emitter py with Se the emitter n.
- the network constant of the GaP is exactly 5.43 ⁇ but with the addition of Ge it increases to somewhat above 5.5 ⁇ .
- the addition of In to the emitter has a similar network widening effect as long as it does not change E G , which would be in the range of 2.35 eV for the emitter, and slightly higher for the base.
- the process would be as follows: on a Sio monocrystalline substrate (48), 5Ge 0 ⁇ 5 type p, doped with B grown by the Czochralski method that has a network parameter close to that of the PGao, Ino, ⁇ se deposits a 3 micrometer p-type layer doped with Zn (49) in a MOCVD reactor that forms a network parameter adaptation layer to the back emitter. A 2 micrometer layer of PGao, 9 Ino, ⁇ strongly doped with Zn (50) is then deposited to form the part to be connected to the back emitter followed by a second layer (51) of 1 micrometer of the same material without doping to form the part where the space loading zone of the aforementioned emitter develops.
- a layer (52) of 10 micrometers of PGao, 5 Ge 0 ⁇ 5 forming the intermediate band base is deposited, and on it a layer (53) of 1 micrometer of PGao ; 9 Ir-Q, ⁇ without doping to which forms the space loading area of the front emitter.
- a layer (54) of 2 micrometers of PGao > Ino ⁇ type n doped with Se is deposited to form the area that makes contact with the front emitter.
- a layer of NA1 is deposited to form a window layer (26), of large E G and 0.5 micrometers thick, which, without impeding the passage of light, prevents recombination that would occur in the free bonds of a bare front emitter surface.
- the metal contacts are deposited under vacuum, using an Au-Ge alloy for the upper grid, which is photolithographically delineated on the grooves before said and a deposit (56) of Al and Ag on the back side of the substrate.
- an anneal of contacts is made and the deposit of an antireflective layer (57) of titanium oxide by CVD at low temperature or a double of SZn-MgF 2 under vacuum. This concludes the solar cell.
- One of them refers to the possibility of using a transparent conductor, such as the SnO, or the ITO thus avoiding the upper contact grid and, in part, the anti-reflective layer.
- Fig. 1 represents the band diagram of the intermediate band solar cell.
- Fig. 2 represents the principle of operation of the intermediate band solar cell.
- Fig. 3 schematically represents the structure of said cell.
- Fig. 4 schematically represents the structure of said cell using quantum dot technology.
- Fig. 5 represents the band diagram of the equilibrium intermediate band solar cell.
- Fig. 6 represents the band diagram of the illuminated intermediate band solar cell.
- Fig. 7 represents the first step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 8 represents the second step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 9 represents the third step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 10 represents the fourth step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 11 represents the fifth step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 12 represents the sixth step proposed for the manufacture of the intermediate band solar cell by quantum dot technology.
- Fig. 13 represents the appearance of an intermediate band by means of a calculation of energy bands.
- Fig. 14 represents a structure of an intermediate band solar cell with several auxiliary layers.
- the described invention is capable of having a wide industrial application, in particular, in all those industrial processes that in general are used to manufacture solar cells with the adaptations that, for example, have been described in the section of preferred embodiments.
- the intermediate band could replace silicon wafers in the industrial manufacturing processes of cells of this material. If the material were capable of being manufactured by metalorganics, it could be incorporated into industrial processes such as those conventionally used to make cells of compounds III-V such as gallium arsenide.
- the invention would find immediate application, with superior efficiency, in all industrial applications of solar cells: manufacturing of photovoltaic modules, obtaining electrical energy in autonomous systems, obtaining electrical energy in systems connected to the network, power supply Small household electrical appliances (clocks, calculators, battery chargers), concentration photovoltaic systems, power supply of space satellites, receivers in energy teletransmission systems, radiation sensors, photovoltaic patterns and photodetectors.
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- Electromagnetism (AREA)
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
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Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/762,438 US6444897B1 (en) | 1999-06-09 | 2000-06-09 | Intermediate band semiconductor photovoltaic solar cell |
EP00936909A EP1130657A2 (en) | 1999-06-09 | 2000-06-09 | Intermediate band semiconductor photovoltaic solar cell |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ES009901278A ES2149137B1 (es) | 1999-06-09 | 1999-06-09 | Celula solar fotovoltaica de semiconductor de banda intermedia. |
ESP9901278 | 1999-06-09 |
Publications (2)
Publication Number | Publication Date |
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WO2000077829A2 true WO2000077829A2 (es) | 2000-12-21 |
WO2000077829A3 WO2000077829A3 (es) | 2001-04-12 |
Family
ID=8308772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/ES2000/000209 WO2000077829A2 (es) | 1999-06-09 | 2000-06-09 | Celula solar fotovoltaica de semiconductor de banda intermedia |
Country Status (4)
Country | Link |
---|---|
US (1) | US6444897B1 (es) |
EP (1) | EP1130657A2 (es) |
ES (1) | ES2149137B1 (es) |
WO (1) | WO2000077829A2 (es) |
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GB0917747D0 (en) | 2009-10-09 | 2009-11-25 | Univ Glasgow | Intermediate band semiconductor photovoltaic devices, uses thereof and methods for their manufacture |
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TWI418969B (zh) * | 2010-12-01 | 2013-12-11 | Ind Tech Res Inst | 自驅動型熱電電耗偵測裝置及方法 |
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KR101918737B1 (ko) * | 2012-03-19 | 2019-02-08 | 엘지전자 주식회사 | 태양 전지 |
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- 2000-06-09 WO PCT/ES2000/000209 patent/WO2000077829A2/es active Application Filing
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WO2010094817A1 (es) * | 2009-02-19 | 2010-08-26 | Universidad Politécnica de Madrid | Método para la fabricación de una célula solar de silicio de banda intermedia |
ES2810599A1 (es) * | 2019-09-06 | 2021-03-08 | Univ Madrid Autonoma | Dispositivo semiconductor |
Also Published As
Publication number | Publication date |
---|---|
ES2149137A1 (es) | 2001-01-01 |
EP1130657A2 (en) | 2001-09-05 |
WO2000077829A3 (es) | 2001-04-12 |
US6444897B1 (en) | 2002-09-03 |
ES2149137B1 (es) | 2001-11-16 |
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