WO2000045216A1 - Dispositif reflechissant a cristaux liquides et procede de fabrication correspondant - Google Patents

Dispositif reflechissant a cristaux liquides et procede de fabrication correspondant Download PDF

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Publication number
WO2000045216A1
WO2000045216A1 PCT/JP2000/000520 JP0000520W WO0045216A1 WO 2000045216 A1 WO2000045216 A1 WO 2000045216A1 JP 0000520 W JP0000520 W JP 0000520W WO 0045216 A1 WO0045216 A1 WO 0045216A1
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WO
WIPO (PCT)
Prior art keywords
substrate
liquid crystal
film
layer
display device
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Application number
PCT/JP2000/000520
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English (en)
Japanese (ja)
Inventor
Yuichi Akiba
Original Assignee
Citizen Watch Co., Ltd.
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Publication date
Application filed by Citizen Watch Co., Ltd. filed Critical Citizen Watch Co., Ltd.
Publication of WO2000045216A1 publication Critical patent/WO2000045216A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/02—Function characteristic reflective

Definitions

  • the present invention relates to a reflection type liquid crystal display device which uses natural light as a light source and selectively reflects incident natural light by a reflection film for display, and a method of manufacturing the same.
  • a reflective liquid crystal display device is a liquid crystal display device that uses natural light as a light source and does not require a light source such as a backlight, and includes a liquid crystal layer, a pair of transparent insulating substrates sandwiching the liquid crystal layer, a polarizing plate, and a metal reflecting plate. (Or film).
  • a conventional twisted nematic (TN) or super steered nematic (STN) liquid crystal display requires two polarizers and loses 3/4 of natural light. And the display becomes darker.
  • the position of the metal reflector since the position of the metal reflector must be located outside the polarizing plate, that is, outside the insulating substrate, if light is obliquely incident on the reflective liquid crystal display device, it is recognized as an image. There is a problem that the reflected light is reflected twice on the surface of one of the insulating substrates on the liquid crystal layer side and the surface of the metal reflector. Furthermore, since the pixels through which incident light passes and the pixels through which reflected light pass are different, when contrast is reduced or when color display is performed using a color filter, color mixing is caused. There was also a problem that reproducibility deteriorated.
  • TN or STN liquid crystal display devices that can display a single polarizing plate, phase-change guest-host liquid crystal display devices that can display without using a polarizing plate, etc.
  • the number of polarizing plates can be reduced or not used, so that the display can be brightened.
  • the black matrix can absorb light that has not been modulated by the liquid crystal layer between the pixels, so that a good black display can be obtained. And the contrast can be improved.
  • black matrices must be formed by precisely patterning chromium metal, chromium oxide, or black resin between adjacent surface elements.
  • a metal film such as aluminum, silver, or an alloy thereof, which provides a high reflectance, is used as a material of the metal reflection plate or the film.
  • the present invention has been made in order to solve the above-mentioned problems in the conventional reflection type liquid crystal display device, and can provide a bright display by using only one polarizing plate, and can reduce the patterning of the light absorbing layer. To have a function equivalent to that of black matrices without necessity, so that good black display and contrast enable good display, and also prevent corrosion and deterioration of the metal reflective film. With the goal. Disclosure of the invention
  • the present invention provides a reflective liquid crystal display device having the following configuration and a method for manufacturing the same.
  • a first substrate made of an insulating transparent substrate and a second substrate made of an insulating substrate face each other with a liquid crystal layer interposed therebetween.
  • a reflective liquid crystal display device in which a polarizing plate is disposed on the side opposite to the liquid crystal layer of the first substrate, and a region where the first electrode and the second electrode planarly overlap each other is a pixel. It is characterized by the point described above.
  • the metal reflection film is disposed with a gap between adjacent pixels, and a light absorption layer is provided on at least the entire display area of the second substrate on the side opposite to the liquid crystal layer with respect to the metal reflection film.
  • a transparent insulating film is provided on the liquid crystal layer side of the metal reflection film.
  • the insulating film may be a metal oxide film obtained by oxidizing the surface of the metal reflection film.
  • the second electrode can also serve as the metal reflection film.
  • the light absorbing layer is preferably provided on the surface of the second substrate on the liquid crystal layer side, but may be provided on the surface opposite to the liquid crystal layer when the second substrate is transparent.
  • the second substrate when the second substrate is a light-absorbing insulating substrate, the second substrate can also serve as the light-absorbing layer.
  • the metal reflection film is preferably provided only in a region to be a pixel.
  • the metal reflection film can be formed of aluminum or an aluminum alloy, or silver or a silver alloy.
  • a reflective color liquid crystal display device By providing a color filter layer on the liquid crystal layer side of the first substrate or the second substrate, a reflective color liquid crystal display device can be obtained.
  • the method for manufacturing a reflection type liquid crystal display device includes the following steps.
  • a transparent insulating film made of a metal oxide film is formed on the surface of each second electrode by anodizing. Forming,
  • the first substrate and the second substrate are bonded to each other so as to face each other so that the first electrode and the second electrode cross each other in a plane, and a predetermined gap is provided.
  • the second substrate on which the light absorption layer is provided on one surface is an insulating transparent substrate, and a second stripe electrode serving also as a metal reflection film is provided on the light absorption layer.
  • a step of forming a large number at predetermined intervals a step of forming a large number of striped second electrodes also serving as a metal reflection film at predetermined intervals on the other surface of the second substrate may be adopted. Good.
  • a light-absorbing insulating substrate is used as the second substrate, and stripe-shaped second electrodes also serving as a metal reflection film are arranged on one surface of the second substrate at predetermined intervals. It may be a process of forming a number.
  • the metal reflective film is formed by providing a gap between adjacent pixels only in a region to become each pixel on the light absorption layer provided on one surface of the second substrate. It may be formed.
  • the second electrode film is formed in a stripe shape by the transparent conductive film on the transparent insulating film formed on the metal reflection film. Then, when the first substrate and the second substrate are bonded to each other, the first electrode and the second electrode are opposed to each other so as to intersect with each other in a plane where each metal reflection film is provided. .
  • a metal reflective film layer is provided on the entire surface of the light absorbing layer, a transparent insulating film made of a metal oxide film is formed on the surface of the metal reflective film layer by anodizing treatment, and the metal reflective film layer is patterned.
  • a transparent insulating film made of a metal oxide film is formed on the surface of the metal reflective film layer by anodizing treatment, and the metal reflective film layer is patterned.
  • a transparent overcoat film is formed on the color filter layer, and transparent stripe-shaped second electrodes are placed at predetermined positions on the overcoat film at positions matching the respective metal reflection films.
  • a large number of substrates are formed and a first substrate and a second substrate are opposed to each other so that the first electrode and the second electrode intersect with each other in a plane where the respective metal reflective films are provided.
  • a reflective color liquid crystal display device can be manufactured by providing a predetermined gap and laminating, and sealing a liquid crystal layer in the gap.
  • the second substrate is made of an insulating transparent substrate, and a light absorbing layer is provided on one surface thereof, and a metal reflection film is provided on the other surface.
  • the insulating substrate may be used as the light absorbing layer, and a metal reflective film may be provided on one surface of the second substrate.
  • each pixel portion has a metal reflection film, and a light absorption layer is provided on the opposite side of the metal reflection film from the liquid crystal layer, that is, on the entire surface behind the metal reflection film.
  • the light absorption layer also exists in the gap between the metal reflection films between adjacent pixels. Therefore, the light incident on the reflection type liquid crystal display device reaches the metal reflection film in the pixel portion and is reflected, so that it does not reach the light absorption layer. On the other hand, in the gap between adjacent pixels, the incident light reaches the light absorbing layer and is absorbed.
  • the light-absorbing layer functions in the same manner as a black matrix only in the gap between the pixels to obtain a good black display and display with good contrast. Can also.
  • the metal reflector is formed only in the pixel portion, the incident light is absorbed by the light absorbing layer in the entire periphery of the pixel portion, so that a better black display can be obtained.
  • the transparent insulating film is provided on the liquid crystal layer side of the metal reflection film, that is, on the surface of the metal reflection film, abnormal oxidation or corrosion of the metal constituting the metal reflection film is performed. Etc. can be prevented.
  • FIG. 1 is a schematic sectional view showing a part of a first embodiment of the reflective liquid crystal display device according to the present invention.
  • FIG. 2 is a plan view showing a planar arrangement relationship between a light absorbing layer, a first electrode, and a second electrode in FIG.
  • FIG. 3 is a schematic sectional view showing a part of a second embodiment of the reflection type liquid crystal display device according to the present invention.
  • FIG. 4 is a schematic sectional view showing a part of a third embodiment of the reflection type liquid crystal display device according to the present invention.
  • 5 to 9 are cross-sectional views sequentially showing the steps of manufacturing the reflective liquid crystal display device shown in FIG.
  • FIG. 10 is a plan view showing a planar arrangement relationship between the light absorbing layer and the second electrode (metal reflective film) in FIG.
  • FIG. 11 is a sectional view showing a step subsequent to FIG.
  • FIGS. 12 and 13 are cross-sectional views showing a part of the manufacturing process of the reflective liquid crystal display device shown in FIG.
  • FIG. 14 is a cross-sectional view showing a part of the manufacturing process of the reflective liquid crystal display device shown in FIG.
  • FIG. 15 is a schematic sectional view showing a part of a fourth embodiment of the reflection type liquid crystal display device according to the present invention.
  • FIG. 16 is a plan view showing a planar arrangement relationship between the light absorbing layer, the first electrode, the second electrode, and the metal reflection film in FIG.
  • FIG. 17 is a schematic sectional view showing a part of a fifth embodiment of the reflection type liquid crystal display device according to the present invention.
  • FIG. 18 is a schematic diagram showing a part of a sixth embodiment of the reflection type liquid crystal display device according to the present invention. It is a schematic sectional view.
  • FIG. 19 is a cross-sectional view showing a part of the manufacturing process of the reflective liquid crystal display device shown in FIG.
  • FIG. 20 is a plan view showing a planar arrangement relationship between the light absorption layer and the metal reflection film in FIG.
  • FIG. 21 and FIG. 22 are cross-sectional views sequentially showing the manufacturing process following FIG.
  • FIG. 23 is a schematic sectional view showing a part of a seventh embodiment of the reflection type liquid crystal display device according to the present invention.
  • FIG. 24 is a plan view showing a planar arrangement relationship between the light absorbing layer, the first electrode, and the second electrode and the metal reflection film in FIG.
  • FIG. 25 is a schematic sectional view showing a part of the eighth embodiment of the reflection type liquid crystal display device according to the present invention.
  • FIG. 26 is a schematic sectional view showing a part of the ninth embodiment of the reflective liquid crystal display device according to the present invention.
  • FIGS. 27 and 28 are cross-sectional views each showing a part of the manufacturing process of the reflective liquid crystal display device shown in FIG.
  • FIG. 29 is a plan view showing a planar arrangement relationship between the light absorption layer and the metal reflection film in FIG.
  • FIG. 30 to 32 are cross-sectional views sequentially showing the respective manufacturing steps following FIG. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIGS. 1 to 4 [First to third embodiments: FIGS. 1 to 4]
  • FIG. 1 is a schematic cross-sectional view showing a part of the reflection type liquid crystal display device
  • FIG. 2 is a plan view of the arrangement of the light absorbing layer and the first and second electrodes in FIG. It is a top view which shows a relationship.
  • the reflection type liquid crystal display device of the i-th embodiment includes a first substrate 11 made of a glass substrate which is an insulating transparent substrate, and a second substrate 1 made of an insulating substrate. Are opposed to each other with the liquid crystal layer 21 interposed therebetween, and a transparent first electrode 15 is provided on the liquid crystal layer 21 side of the first substrate 11, and a transparent first electrode 15 is provided on the liquid crystal layer 21 side of the second substrate 13. Two electrodes 17 are provided.
  • the second substrate 13 is the same glass substrate as the first substrate 11 in this example, but is not necessarily a transparent substrate.
  • the liquid crystal layer 21 is composed of a super twisted nematic liquid crystal having a twist orientation of 240 °, and is sealed in a gap between the upper substrate 29 and the lower substrate 31 whose periphery is bonded with a sealant (not shown).
  • the upper substrate 29 includes a first substrate 11 and a first electrode
  • the lower substrate 31 includes a second substrate 13, a second electrode 17, and a light absorbing layer 23 and a transparent insulating layer described later. It consists of membrane 25.
  • the second electrode 17 is made of an aluminum film and also serves as a metal reflection film. As shown in FIG. 2, a large number of first electrodes 15 and second electrodes 17 are provided in a stripe shape having a width of about 290 m in a direction orthogonal to each other. The overlapping areas (the square areas formed in matrix in FIG. 2) are pixels. Therefore, the second electrode 17 also serving as the metal reflection film has a gap of about 10 m between adjacent pixels.
  • Light absorption made of an insulating black color resist is provided on at least the entire display area of the second substrate 13 on the side opposite to the liquid crystal layer 21 with respect to the second electrode 17 also serving as the metal reflection film.
  • Layer 23 is provided.
  • a transparent insulating film 25 is provided on the surface of the second electrode 17 also serving as the metal reflection film on the liquid crystal layer 21 side.
  • the second electrode 17 is made of an aluminum film.
  • the transparent insulating film 25 is made of an aluminum oxide film as the metal oxide film.
  • a polarizing plate 27 is provided on the side (outside) of the first substrate 11 opposite to the liquid crystal layer 21. Further, a retardation plate 26 is provided between the first substrate 11 and the polarizing plate 27 in order to prevent coloring of the liquid crystal layer 21 due to the birefringence effect, but this retardation plate 26 is indispensable. is not.
  • the voltage applied between the first electrode 15 and the second electrode 17 is varied (on / off) to change the liquid crystal layer. 21 is driven to phase-modulate the light passing through the liquid crystal layer 21.
  • the light enters the reflective liquid crystal display from the upper observer side (viewing side) in FIG.
  • the emission of the light reflected by the second electrode 17 also serving as a reflection film is switched for each pixel unit to display black and white.
  • the incident light a shown in FIG. 1 the reflected light from the second electrode 17 passes through the polarizing plate 26, and the pixel portion emitted to the viewing side has a white display, like the incident light b.
  • the pixel portion that does not pass through the polarizing plate 26 because the light reflected by the second electrode 17 cannot pass through the polarizing plate 26 displays black.
  • the incident light c that has reached the gap between the adjacent second electrodes 17 is absorbed by the light absorbing layer 23, and therefore, regardless of the phase modulation of the liquid crystal layer 21, In the gap between the electrodes 17, black is always displayed.
  • the peripheral portion of the pixel is also black, so that good black display can be obtained and contrast with white display is improved.
  • the light absorbing layer 23 is also formed below the second electrode 17, the light reaching the pixel portion is reflected by the second electrode 17 also serving as a metal reflection film, so that the light absorbing layer 23 is formed. Since it does not reach 23, it will not be absorbed.
  • the light absorption layer 23 can be formed with the black matrix without patterning accurately between pixels. The same function can be obtained, and a good black display and a high-quality display with good contrast can be obtained.
  • the transparent insulating film 25 made of an aluminum oxide film is provided on the surface of the second electrode 17 also serving as the metal reflection film, the liquid crystal layer 21 and the second electrode 17 are formed.
  • the liquid crystal layer 21 and the aluminum film do not come into direct contact with each other, so that the reflectance can be prevented from lowering due to coloring or corrosion caused by the interaction between the liquid crystal layer 21 and the aluminum film.
  • the second electrode 17 can be used. Since the surface of the first electrode 17 is covered with the transparent insulating film 25, the second electrode 17 made of an aluminum film does not come into direct contact with the atmosphere.
  • the second electrode made of the aluminum film does not corrode due to moisture in the air or the like, and there is no fear that a defect such as disconnection occurs.
  • the reflection type liquid crystal display device of this embodiment is superior in reliability.
  • the second electrode 17 also serving as a metal reflection film may be formed of an aluminum alloy.
  • the second electrode 17 may be formed of silver or a silver alloy.
  • the transparent insulating film is formed of a transparent resin or the like.
  • FIG. 3 a second embodiment of the reflection type liquid crystal display device according to the present invention will be described with reference to FIG. 3, and a third embodiment will be described with reference to FIG.
  • These embodiments differ from the first embodiment only in the position where the light absorbing layer is provided, or in the second substrate. 3 and 4, parts corresponding to those in FIG. 1 are denoted by the same reference numerals, and description thereof is omitted.
  • the second embodiment shown in FIG. 3 differs from the first embodiment shown in FIG. 1 in that a light absorbing layer 23 is provided on the second substrate 13 on the side opposite to the liquid crystal layer 21.
  • the second electrode 17 which also serves as a metal reflection film is directly provided on the liquid crystal layer 21 side of the second substrate 13.
  • the second substrate 13 needs to be an insulating transparent substrate.
  • the third embodiment shown in FIG. 4 differs from the first embodiment shown in FIG. 1 in that the second substrate 14 is a light absorbing insulating substrate, for example, a black resin substrate, and The only difference is that it also functions as an absorbent layer. In this case, since it is not necessary to separately provide a light absorbing layer, the second electrode 17 also serving as a metal reflection film is directly provided on the liquid crystal layer 21 side of the second substrate 14.
  • the same operation and effect as those of the reflection type liquid crystal display device of the first embodiment can be obtained, and the material of the second electrode 17 can be similarly changed. It is.
  • FIGS. 5 to 14 Manufacturing method according to first to third embodiments: FIGS. 5 to 14]
  • FIG. 1 First, a method for manufacturing the reflective liquid crystal display device of the first embodiment shown in FIGS. 1 and 2 will be described with reference to FIGS. 5 to 11.
  • FIG. 5 First, a method for manufacturing the reflective liquid crystal display device of the first embodiment shown in FIGS. 1 and 2 will be described with reference to FIGS. 5 to 11.
  • FIG. 5 First, a method for manufacturing the reflective liquid crystal display device of the first embodiment shown in FIGS. 1 and 2 will be described with reference to FIGS. 5 to 11.
  • a transparent conductive film made of an indium tin oxide film is formed with a film thickness of 110 nm by a sputtering method.
  • a positive photoresist is applied to the entire surface of the transparent conductive film by a spin coating method, and a photolithography process using an exposure process and a development process using a photomask is performed.
  • the electrode 15 is formed in a pattern shape. Thereafter, using the photoresist as an etching mask, patterning is performed by etching to form a plurality of first electrodes 15.
  • the etching of the transparent conductive film made of the indium tin oxide film is performed by wet etching using a mixed solution of ferric chloride and hydrochloric acid. Thereafter, the photoresist used as the etching mask is removed by a wet stripping method using a resist stripping solution, for example, N-320 (trade name) manufactured by Nagase & Co., Ltd. As shown in FIG. 2, the pattern shape of the first electrode 15 has a width of 290 m and an interval of 10 m. There are a number of striped patterns.
  • an alignment film (not shown) is formed so as to cover the first electrode 15, and an upper substrate 29 is formed.
  • At least one surface of the second substrate 13 which is an insulating substrate (a glass substrate in the illustrated example) shown in FIG. 6 is formed of an insulating black color resist on at least the entire display area.
  • the light absorption layer 23 is formed.
  • CFPR—BK745S (trade name) manufactured by Tokyo Ohka Kogyo Co., Ltd. is applied to a thickness of 1.2 ⁇ m by spin coating. Apply to.
  • a reflection film made of an aluminum film 7 is formed on the entire surface of the light absorption layer 23 to a thickness of 200 nm by a sputtering method.
  • a positive photoresist is applied to the entire surface of the aluminum film 7 by a spin coating method, and a photolithography process is performed by an exposure process using a photomask and a developing process, so that the photo resist is changed to a second one.
  • the electrode 17 is formed in a pattern shape.
  • the pattern shape of the second electrode 17 is a large number of stripe-like patterns having a width of 290 ⁇ m and an interval of 10 m. Since the second electrode 17 is formed of a reflection film, it also functions as a metal reflection film.
  • the etching of the aluminum film 7 is performed by wet etching using a mixed solution of phosphoric acid, nitric acid and acetic acid. In this etching step, the black film forming the light absorbing layer 23 is formed in the region where the reflection film made of the aluminum film 7 is etched. Exposure of color register. Therefore, the light absorbing layer 23 is exposed in the gap between the second electrodes 17 also serving as the metal reflection film formed in a plurality of striped patterns, as shown in FIG.
  • the photoresist used as the etching mask is removed by a wet stripping method using a resist stripper, for example, N-320 (trade name) manufactured by Nagase & Co., Ltd.
  • a transparent insulating film 25 made of an aluminum oxide film is formed on the surface of the second electrode 17 by anodizing using an ammonium phosphate solution as an anodizing solution.
  • one end of each of the plurality of second electrodes 17 is all connected by a common electrode, and an anodic oxidation voltage is applied between the second electrodes 17 and a counter electrode spaced above the second substrate.
  • the anodizing voltage was set to 40 V, and the voltage was raised from 0 V at a rate of 1.5 V / min to reach the set voltage of 40 V. Then, the anodizing treatment was performed for 1 hour at the set voltage. Then, an aluminum oxide film is formed to a thickness of 50 nm.
  • an alignment film (not shown) is formed so as to cover the second electrode 17, and the lower substrate 31 is formed.
  • the upper substrate 29 of FIG. 5 and the lower substrate 31 of FIG. face each other. Further, as shown in FIG. 2, the stripe pattern of the first electrode 15 and the second electrode 17 A predetermined gap is provided so as to be orthogonal to the stripe pattern.
  • the liquid crystal layer 21 is made of a single nematic liquid crystal having a twist orientation of 240 °.
  • a retardation plate 26 and a polarizing plate 27 are arranged at the same position.
  • the retardation plate 26 is provided between the first substrate 11 and the polarizing plate 27 in order to prevent coloring of the liquid crystal layer 21 due to the birefringence effect, but this may be omitted.
  • the method of forming the upper substrate 29 is the same as that described above with reference to FIG.
  • the lower substrate 31 has an insulating black color resist on at least one surface of a second substrate 13 made of a glass substrate which is an insulating transparent substrate. Then, a light absorption layer 23 made of a metal is formed.
  • a reflection film made of an aluminum film is formed directly, and it is patterned as in the case described above to form a large number of striped third electrodes. 17 is patterned.
  • the method of forming the upper substrate 29 is the same as that described above with reference to FIG.
  • the lower substrate 31 is, as shown in FIG. 14, a direct aluminum substrate on at least one surface of a second substrate 14 made of a black resin substrate which is a light-absorbing insulating substrate.
  • a reflective film made of a film is formed, and it is compared with the case of the manufacturing method of the first embodiment. Similarly, patterning is performed to form a large number of striped second electrodes 17.
  • FIG. 15 the structure of the reflective liquid crystal display device according to the fourth embodiment of the present invention will be described with reference to FIGS. 15 and 16.
  • FIG. 15 the structure of the reflective liquid crystal display device according to the fourth embodiment of the present invention will be described with reference to FIGS. 15 and 16.
  • FIG. 15 is a schematic cross-sectional view showing a part of the reflection type liquid crystal display device.
  • FIG. 16 is a diagram showing the light absorbing layer and the first and second electrodes and the second electrode and the metal reflection in FIG.
  • FIG. 3 is a plan view showing a planar arrangement relationship of films.
  • the reflection type liquid crystal display device of the fourth embodiment has a first substrate 11 made of a glass substrate which is an insulating transparent substrate and a second substrate made of an insulating substrate.
  • the substrate 13 faces the liquid crystal layer 21 via the liquid crystal layer 21, and the transparent first electrode 15 is provided on the liquid crystal layer 21 side of the first substrate 11, and the liquid crystal layer 21 of the second substrate 13.
  • a transparent second electrode 18 is provided on each side.
  • the second substrate 13 is the same glass substrate as the first substrate 11 in this example, but is not necessarily a transparent substrate.
  • the liquid crystal layer 21 is 240. It is made of super twisted nematic liquid crystal having a twist alignment of the following, and is sealed in the gap between the upper substrate 29 and the lower substrate 31 whose periphery is bonded by a sealant (not shown).
  • the upper substrate 29 includes a first substrate 11 and a first electrode
  • the lower substrate 31 includes, in addition to the second substrate 13 and the second electrode 18, a light absorbing layer 2 described later. 3 and a metal reflective film 19 and a transparent insulating film 28.
  • a light absorbing layer 23 made of an insulating black color resist is provided on at least the entire surface of the display area on the liquid crystal layer 21 side of the second substrate 13, and the liquid crystal layer of the light absorbing layer 23 is provided.
  • a metal reflection film 19 made of an aluminum film is provided in a region corresponding to each pixel portion on the side surface. The pattern shape of the metal reflection film 19 is shown in FIG. It forms a large number of isolated square patterns with side lengths of 290 m and intervals of 10 ⁇ m.
  • a transparent insulating film 28 made of a transparent resin or the like is formed so as to have a flat surface so as to cover the light absorbing layer 23 and all the metal reflecting films 19 on the second substrate 13.
  • a transparent second electrode 18 is provided on the transparent insulating film 28 at a position matching each metal reflection film 19.
  • first electrodes 15 and second electrodes 18 are provided in a stripe shape having a width of about 2900 ⁇ in a direction orthogonal to each other, and they intersect. Then, the area that overlaps in a plane (each square area formed in a matrix in FIG. 16) becomes a pixel.
  • the metal reflective film 19 is provided only in each pixel portion, and a gap of about 10 m is provided between adjacent pixels on all four sides.
  • a polarizing plate 27 is provided on the side of the first substrate 11 opposite to the liquid crystal layer 21 (viewing side).
  • a retardation plate 26 is provided between the first substrate 11 and the polarizing plate 27 in order to prevent coloring of the liquid crystal layer 21 due to the birefringence effect. 6 is not required.
  • the second electrode 18 and the metal reflection film 19 separately have a function of applying a voltage to the liquid crystal layer 21 and a function of reflecting incident light.
  • it has the same display function as the reflection type liquid crystal display device of the first embodiment shown in FIGS. 1 and 2, and the same operation and effect can be obtained.
  • each metal reflection film 19 is provided only in each pixel portion, and a gap is provided between all adjacent pixels. Are all provided with a light-absorbing layer 23, so that all light reaching the gap is absorbed by the light-absorbing layer 23 and reflected to the viewer side, as in the incident light c shown in FIG. It is not emitted and is always displayed in black.
  • the transparent insulating film 28 on the metal reflection film 19 has the same effect of preventing corrosion and deterioration of the aluminum film constituting the metal reflection film 19.
  • the metal reflection film 19 may be formed of aluminum alloy, silver, or silver alloy.
  • FIG. 17 a fifth embodiment of the reflection type liquid crystal display device according to the present invention will be described with reference to FIG. 17, and a sixth embodiment will be described with reference to FIG. These embodiments differ from the fourth embodiment only in the position where the light absorbing layer is provided, or in the second substrate.
  • FIGS. 17 and 18 parts corresponding to those in FIG. 15 are denoted by the same reference numerals, and description thereof is omitted.
  • the fifth embodiment shown in FIG. 17 differs from the fourth embodiment shown in FIG. 15 in that the light absorption layer 23 is opposite to the liquid crystal layer 21 of the second substrate 13. The only difference is that the metal reflection film 18 and the transparent insulating film 28 are directly provided on the liquid crystal layer 21 side of the second substrate 13. In this case, the second substrate 13 needs to be an insulating transparent substrate.
  • the sixth embodiment shown in FIG. 18 differs from the fourth embodiment shown in FIG. 15 in that the second substrate 14 is a light-absorbing insulating substrate, for example, a black resin substrate. The only difference is that it also has the function of the light absorbing layer. In this case, since it is not necessary to separately provide a light absorbing layer, a metal reflective film 19 and a transparent insulating film 28 are directly provided on the liquid crystal layer 21 side of the second substrate 14.
  • the same operation and effect as those of the reflection type liquid crystal display device of the fifth embodiment described above can be obtained, and the material of the metal reflection film 19 can be similarly changed. is there.
  • the reflection type liquid crystal display device according to the fourth embodiment shown in FIGS.
  • the manufacturing method will be described with reference to FIGS. 19 to 22 and the drawings used to explain the manufacturing method of the first embodiment.
  • the method of forming the upper substrate 29 shown in FIG. 15 is the same as that of the manufacturing method of the first embodiment described with reference to FIG. 5, and one surface of the first substrate 11 is oxidized.
  • a transparent conductive film made of an indium tin film is formed into a film having a thickness of 110 nm by a sputtering method, and is patterned to form a first electrode 15.
  • the pattern shape of the first electrode 15 is, as shown in FIG. 16, a plurality of strip-shaped patterns having a width of 290 ⁇ m and an interval of 10 ⁇ m.
  • An alignment film (not shown) is formed so as to cover each of the first electrodes 15 to form an upper substrate 29.
  • the lower substrate 31 is prepared by the following steps. As shown in FIG. 19, first, a light absorbing layer 23 made of an insulating black color resist is formed on at least one display surface of a second substrate 13 made of an insulating substrate. To form The light absorbing layer 23 is applied by a spin coating method so as to have a thickness of 1.2 / zm.
  • the black color resist constituting the light absorbing layer 23 is heat-cured, and the materials included in the black color resist are included. Gasifies and removes unreacted substances not involved in light curing and heat curing.
  • a reflective film made of an aluminum film is formed on the light absorbing layer 23 to a thickness of 200 nm by a sputtering method.
  • a photoresist of a photoresist type is applied to the entire surface of the aluminum film by a spin coating method, and photolithography is performed by an exposure process using a photomask and a development process. It is formed into a pattern shape of 9.
  • patterning is performed by etching the aluminum film using the photoresist as an etching mask to form a metal reflection film 19.
  • This aluminum film is etched by a wet process using a mixture of phosphoric acid, nitric acid and acetic acid. This is performed by an etching process.
  • the pattern shape of the metal reflective film 19 is a plurality of isolated rectangular patterns each having a side length of 290 / m and an interval of 10 ⁇ m. Each of these plural rectangular patterns corresponds to a region to be a pixel. Then, the light absorbing layer 23 is exposed in the gap between the adjacent metal reflective films 19 (corresponding to the pixels).
  • the photoresist used as the etching mask is removed by a wet stripping method using a resist stripper.
  • a transparent insulating film 28 is formed on each metal reflection film 19 and on the entire surface of the light absorption layer 23 exposed in each gap therebetween.
  • the transparent insulating film 28 is formed, for example, by applying an Optoma SS6777 (trade name) manufactured by JSR to a film thickness of about 3 ⁇ by a spin coating method.
  • the upper surface of the transparent insulating film 28 is finished to be flat.
  • the transparent insulating film 28 is baked for 2 hours in a temperature range of 220 ° C. to 240 ° C. to thermally cure the transparent insulating film 28, and unreacted substances not involved in the thermal curing are gasified and removed.
  • a transparent conductive film made of an indium tin oxide film is formed on the entire surface of the transparent insulating film 28 to a thickness of 110 nm by a sputtering method.
  • a positive photoresist is applied to the entire surface of the transparent conductive film by a spin coating method, and a photolithography process is performed by an exposure process using a photomask and a development process, so that the photoresist is formed in the second direction.
  • the electrode 18 is formed in a pattern shape.
  • etching is performed using the photoresist as an etching mask to form a second electrode 18 as shown in FIG.
  • the etching of the transparent conductive film is performed by wet etching using a mixed solution of ferric chloride and hydrochloric acid.
  • the photoresist used as the etching mask is removed by a wet stripping method using a resist stripper.
  • This second electrode 18 has a width of 290 m and a large number of stripe-shaped patterns having an interval of 10 as shown in FIG. 16 and matches the rectangular pattern of the metal reflection film 19. Formed at the position where
  • an alignment film (not shown) is formed so as to cover the second electrode 18 to complete the lower substrate 31.
  • the upper substrate 29 and the lower substrate 31 are connected to the first electrode 15 on the first substrate 11 and the first electrode 15 on the second substrate 13.
  • the stripe pattern of the first electrode 15 and the stripe pattern of the second electrode 18 are orthogonal to each other, and The striped pattern of the electrode 15 and the square pattern of the metal reflector 19 are arranged so as to overlap with each other.
  • the liquid crystal layer 21 is sealed between the upper substrate 29 and the lower substrate 31 by a sealant (not shown).
  • the liquid crystal layer 21 is made of a super twisted nematic liquid crystal having a twist orientation of 240 °.
  • a retardation plate 26 and a polarizing plate 27 are arranged on the first substrate 11 1 on the side opposite to the liquid crystal layer 21 (viewing side) to complete a reflection type liquid crystal display device.
  • the method for manufacturing a reflective liquid crystal display device according to the fifth embodiment of the present invention shown in FIG. 17 uses an insulative transparent substrate as the second substrate 13 and a light absorbing layer 23 on the lower surface thereof. Only the process of forming and directly providing the metal reflection film 19 and the transparent insulating film 28 on the upper surface is different from the above-described manufacturing method.
  • the method is to use a light-absorbing insulating substrate, for example, a black resin substrate, as the second substrate 14, and make the second substrate 14 also serve as a light-absorbing layer. Only the step of directly providing the metal reflective film 19 and the transparent insulating film 28 on the liquid crystal layer 21 side of the fourth embodiment is different from the above-described manufacturing method.
  • FIG. 23 is a schematic cross-sectional view showing a part of the reflection type liquid crystal display device
  • FIG. 24 is a light absorption layer and the first electrode and the second electrode and the metal reflection film shown in FIG.
  • FIG. 3 is a plan view showing a planar arrangement relationship of films.
  • the reflective liquid crystal display device of the seventh embodiment includes a first substrate 11 made of a glass substrate, which is an insulating transparent substrate, and a second substrate made of an insulating substrate.
  • the substrate 13 faces the liquid crystal layer 21 via the liquid crystal layer 21, and the transparent first electrode 15 is provided on the liquid crystal layer 21 side of the first substrate 11, and the liquid crystal layer 21 of the second substrate 13.
  • a transparent second electrode 18 is provided on each side. Note that the second substrate 13 need not be a transparent substrate.
  • the liquid crystal layer 21 is made of a super nematic liquid crystal having a twist orientation of 240 °, and is sealed in the gap between the upper substrate 29 and the lower substrate 31 whose periphery is bonded by a sealant (not shown).
  • the upper substrate 29 includes a first substrate 11 and a first electrode
  • the lower substrate 31 includes, in addition to the second substrate 13 and the second electrode 18, a light absorbing layer 2 described later. 3, metal reflective film 19, transparent insulating film 25, color filter layer 33, and overcoat layer 35.
  • a light absorbing layer 23 made of an insulating black color resist is provided on at least the entire display area on the liquid crystal layer 21 side of the second substrate 13, and the liquid of the light absorbing layer 23 is provided.
  • a metal reflection film 19 made of an aluminum film is provided on the surface on the crystal layer 21 side. As shown by the broken line in FIG. 24, the pattern shape of this metal reflective film 19 is a large number of isolated sides each having a long side of 290 m, a short side of 90 ⁇ , and an interval of 10 ⁇ m. Form a rectangular pattern.
  • Each of the gaps is provided with a light absorbing layer in each of the gaps (shown by cross-hatching in FIG. 24).
  • a transparent insulating film 25 made of an aluminum oxide film or the like is formed on the surface of each metal reflection film 19 on the liquid crystal layer 21 side.
  • a color filter layer 33 is provided on each metal reflection film 19.
  • the color filter layer 33 is configured such that color filters of different colors are arranged for each metal reflection film 19 in one pixel region.
  • the color filters arranged in the order of red filter R, green filter G, and blue filter B from the left with respect to the three metal reflection films 19 provided in the one-plane element region are shown.
  • One filter layer 33 is provided.
  • the color filter layer 33 is formed so that the upper surface is flat, a transparent overcoat film 35 is provided on the upper surface (the surface on the liquid crystal layer 21 side), and the transparent second coat is formed on the liquid crystal layer 21 side. Electrodes 18 are provided. As shown in FIG. 24, the second electrode 18 has a width of 290 ⁇ m and a distance of 10 ⁇ m at a position matching the short side of each metal reflection film 19 on the light absorption layer 23. It is formed in a plurality of striped patterns. The region where the first electrode 15 of the upper substrate 29 intersects with the second electrode 18 of the lower substrate 31 and the region where each metal reflection film 19 is provided coincide with each other. It is formed. In this example, a square area of 290 ⁇ 2 90 ⁇ m in which three metal reflection films 19 and three color (R, G, B) color filter layers 33 are provided correspondingly. / 00520
  • the area constitutes one pixel.
  • a polarizing plate 27 is provided on the side of the first substrate 11 opposite to the liquid crystal layer 21 (viewing side).
  • a retardation plate 26 is provided between the first substrate 11 and the polarizing plate 27 in order to prevent coloring of the liquid crystal layer 21 due to the birefringence effect. 6 is not required.
  • the voltage applied between the first electrode 15 and the second electrode 18 The liquid crystal layer 21 is driven by varying (turning off) the light, and the light passing therethrough is phase-modulated.
  • the reflective liquid crystal display device enters from the upper viewing side in FIG. 23, and the liquid crystal layer 21 and the color filter layer The emission of the light reflected by the metal reflection layer 19 through 33 is switched to display a color and black.
  • the entire peripheral portion of the pixel is also black, so that good black display can be obtained.
  • the light absorbing layer 23 can function as a black matrix without accurately patterning between the pixel and the surface element. It is possible to display a solid black display and a color display with good contrast and no color mixture. Moreover, since only one polarizing plate 27 is required, a bright display is possible.
  • the transparent insulating film 25 is formed on the surface of the metal reflection film 19, the surface of the metal reflection film 19 is not corroded or deteriorated, and the reflectance is not reduced. So in addition, the same functions and effects as those of the reflective liquid crystal display devices of the first to sixth embodiments can be obtained. Also in this embodiment, an aluminum alloy film or a silver or silver alloy film can be used as the metal reflection film instead of the aluminum film.
  • FIG. 25 an eighth embodiment of the reflection type liquid crystal display device according to the present invention will be described with reference to FIG. 25, and a ninth embodiment will be described with reference to FIG.
  • FIGS. 25 and 26 parts corresponding to those in FIG. 24 are denoted by the same reference numerals, and description thereof is omitted.
  • the eighth embodiment shown in FIG. 25 differs from the seventh embodiment shown in FIG. 24 in that the light absorption layer 23 is opposite to the liquid crystal layer 21 of the second substrate 13. The only difference is that the metal reflection film 19 and the color filter layer 33 are directly provided on the liquid crystal layer 21 side of the second substrate 13. In this case, the second substrate 13 needs to be an insulating transparent substrate.
  • the ninth embodiment shown in FIG. 26 differs from the seventh embodiment shown in FIG. 24 in that the second substrate 14 is a light-absorbing insulating substrate, for example, a black resin substrate. The only difference is that the second substrate 14 also functions as a light absorbing layer. In this case, since it is not necessary to separately provide a light absorption layer, the metal reflection film 19 and the color filter layer 33 are directly provided on the liquid crystal layer 21 side of the second substrate 14.
  • the same operation and effect as those of the reflection type liquid crystal display device of the seventh embodiment can be obtained, and the material of the metal reflection film 19 can be similarly changed. .
  • the empty filter layer 33 may be provided on the upper substrate 29 side, that is, on the surface of the first substrate 11 on the liquid crystal layer 21 side.
  • an overcoat film 35 made of a transparent resin is provided on the entire surface of the color filter layer 33 on the liquid crystal layer 21 side, and a stripe-shaped first electrode 15 is provided on the surface thereof.
  • the lower substrate 31 has a transparent insulating film 25 made of an anodized film and a color filter layer 3 on the light absorbing film 23 and the metal reflecting film 19 on the liquid crystal layer 21 side of the second substrate 13.
  • a transparent insulating film made of a transparent resin may be provided, and a strip-shaped second electrode 18 may be provided on the surface thereof.
  • the method of manufacturing the upper substrate 29 shown in FIG. 23 is the same as that of the manufacturing method of the first embodiment described with reference to FIG. 5, and is one of the first substrates 11 made of a glass substrate.
  • a transparent conductive film made of an indium tin oxide film is formed to a thickness of 110 nm on the surface by sputtering.
  • the transparent conductive film is patterned by etching to form a large number of first electrodes 15.
  • the first electrode 15 has a width of 90 / z m and forms a large number of strip-like patterns having an interval of 10 m.
  • An alignment film (not shown) is formed so as to cover the first electrode 15, thereby forming an upper substrate 29.
  • the lower substrate 31 is made of an insulating black color resist and is made of an insulating black color resist over at least one surface of the second substrate 13 made of an insulating substrate.
  • the light absorbing layer 23 is formed by applying a black color resist to a thickness of 1.2 ⁇ m by a spin coating method.
  • an aluminum film 9 having a thickness of 200 nm is formed as a reflective film on the light absorbing layer 23 by a sputtering method.
  • a transparent insulating film 25 made of an aluminum oxide film is formed on the entire upper surface of the aluminum film 9 by anodizing using an ammonium phosphate solution as an anodizing solution.
  • the anodic oxidation voltage applied between the aluminum film 9 and the counter electrode was set to 40 V, and the voltage was raised from OV at a rate of 1.5 VZ to reach the set voltage of 4 OV. Thereafter, anodizing treatment is performed at a constant voltage for 1 hour to form a transparent insulating film 25 of an aluminum oxide film so as to have a film thickness of 50 nm.
  • a positive photoresist is applied to the entire surface of the transparent insulating film 25 by a spin coating method, and a photolithography process is performed by an exposure process using a photomask and a developing process. It is formed in the pattern shape of the metal reflection film 19 shown in FIG.
  • the transparent insulating film 25 and the aluminum film 9 in FIG. 27 are patterned by an etching process using the photoresist as an etching mask, and as shown in FIG. A metal reflection film 19 provided with an insulating film is formed.
  • This etching is performed by wet etching using a mixture of phosphoric acid, nitric acid, and acetic acid, and the transparent insulating film 25 made of an aluminum oxide film and the aluminum film 9 are continuously etched.
  • These three metal reflective films 19 correspond to the three primary color regions constituting one pixel of color display.
  • the light absorbing layer 23 is exposed in the gap between the metal reflectors 19 forming the plurality of rectangular patterns.
  • the photoresist used as the etching mask is removed by a wet stripping method using a resist stripper.
  • a photosensitive pigment-dispersed red color resist V-255R (manufactured by Nippon Steel Chemical Co., Ltd.) (Product name) is applied to a thickness of 1.2 ⁇ m by spin coating, and exposure is performed using a photomask.
  • the color filter layer 33 shown in FIG. 30 is developed with an alkali developer so as to cover each one of the three metal reflective films 19 for each pixel region.
  • Filter R is patterned.
  • it is baked for 2 hours in a temperature range of 220 ° C. to 240 ° C. to thermally cure the red color resist constituting the red filter R, as well as light curing and curing included in the red color resist. Unreacted substances not involved in thermosetting are gasified and removed.
  • a green color register or a blue color register is provided so as to cover each different one of the three metal reflection films 19 in each pixel region. Is used to form a pattern.
  • a color filter layer 33 including a red filter R, a green filter G, and a blue filter B is formed as shown in FIG.
  • each color filter R, G, B of the color filter layer 3 3 is slightly larger than the metal reflection film 19, the long side length is 300 ⁇ , and the short side length is 1 It is a plurality of isolated rectangular patterns of 0 0 ⁇ m. Then, the center corresponds to the center of each metal reflection film 19, and is made parallel to the long side and the short side of the rectangular pattern of the metal reflection plate 19 formed in each pixel portion.
  • JSR Optoma SS 677 7 (trade name) is formed by a spin coating method.
  • This overcoat film 35 is formed to a thickness of 3 ⁇ m.
  • the overcoat film 35 plays a role in improving the chemical resistance, spattering resistance, and flatness of the color filter layer 33.
  • a transparent conductive film made of an indium tin oxide film is formed on the overcoat film 35 to a thickness of 110 nm by a sputtering method.
  • a positive photoresist is applied to the entire surface of the transparent conductive film by a spin coating method, and a photolithography process is performed by an exposure process using a photomask and a developing process. Formed in pattern 8
  • the transparent conductive film is patterned to form a second electrode 18 shown in FIG.
  • the etching of the transparent conductive film is performed by wet etching using a mixed solution of ferric chloride and hydrochloric acid. Thereafter, the photoresist used as the etching mask is removed by a wet stripping method using a resist stripper.
  • the pattern shape of the second electrode 18 is a plurality of stripe patterns having a width of 290 ⁇ m and an interval of 10 jum, and the long side and the rectangular pattern of the metal reflector 19 are provided. Are formed so that the short sides thereof overlap in parallel.
  • an alignment film (not shown) is formed so as to cover the second electrode 18 and the lower substrate
  • the upper substrate 29 and the lower substrate 31 created as described above are combined with the first electrode 15 on the first substrate 11 and the second substrate as shown in FIG.
  • the metal reflection film 19 formed in an isolated rectangular pattern is formed only in each pixel portion.
  • the liquid crystal layer 21 is sealed between the upper substrate 29 and the lower substrate 31 with a sealant (not shown).
  • the liquid crystal layer 21 is made of a neat liquid crystal having a part orientation of 240 °.
  • a retardation plate 26 and a polarizing plate 27 are arranged on the opposite side (viewing side) of the first substrate 11 from the liquid crystal layer 21 so that the reflection type liquid crystal display device shown in FIG. Complete.
  • the color filter layer 33 is directly formed on the metal reflection film 19. Therefore, in the developing process of the color filter layer 33, in the region where the color filter layer 33 is developed, the aluminum film constituting the metal reflection film 19 is exposed and corroded by the alkali developing solution. was there.
  • a transparent aluminum oxide film is formed so as to cover the surface of the metal reflection film 19.
  • An insulating film 25 is formed.
  • This aluminum oxide film has excellent chemical resistance to an alkali developing solution. Therefore, in the development process of the color filter layer 33, the metal reflection film 19 is not removed.
  • the method for manufacturing a reflective liquid crystal display device according to the eighth embodiment of the present invention shown in FIG. 25 uses an insulative transparent substrate as the second substrate 13 and has a light absorbing layer 23 on the lower surface thereof. Only the step of forming and directly providing the metal reflection film 19 and the color filter layer 33 on the upper surface is different from the above-described manufacturing method. Further, the method for manufacturing a reflective liquid crystal display device according to the ninth embodiment of the present invention shown in FIG. 26 uses a light-absorbing insulating substrate, for example, a black resin substrate, as the second substrate 14. However, only the step of providing the metal reflection film 19 and the color filter layer 33 directly on the liquid crystal layer 21 side of the second substrate 14 so that the second substrate 14 also functions as a light absorbing layer. Force Differs from the manufacturing method described above.
  • the light absorption layer is provided on the entire surface of the metal reflection film opposite to the liquid crystal layer arranged so as to provide a gap between adjacent pixels, the gap between the adjacent pixels is provided.
  • the arriving incident light is absorbed by the light absorbing layer, and the gap between adjacent pixels can always be in a black state regardless of the phase modulation of the liquid crystal layer. Therefore, even if the light absorbing layer is not patterned with high precision between pixels, it can be made to function similarly to a black matrix, and a good black display and a black-and-white display with good contrast or a solid display can be obtained. is there.
  • the transparent insulating film is provided on the liquid crystal layer side of each metal reflecting film, deterioration and corrosion of the metal film forming the metal reflecting plate can be prevented, and the reflectance does not decrease.
  • a highly reliable reflective liquid crystal display device that can maintain high display quality over a long period of time.
  • the reflection type liquid crystal display device can be widely used as a display device for portable devices such as a mobile phone, an electronic desk calculator, a clock, and other various electronic devices.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

Selon cette invention, une couche de cristaux liquides (21) est intercalée entre un premier substrat isolant (11) et un deuxième substrat isolant, opposés l'un à l'autre. Des premières électrodes (15) sont placées entre la couche de cristaux liquides (21) et le premier substrat (11), et des deuxièmes électrodes (18) ainsi que des réflecteurs métalliques (19) sont placés entre la couche de cristaux liquides (21) et le deuxième substrat. Les réflecteurs métalliques (19) créent des interstices entre les pixels adjacents. Le deuxième substrat (13) est pourvu d'une couche conductrice (23) absorbant la lumière qui recouvre sa surface opposée aux réflecteurs métalliques (19), chacun des réflecteurs métalliques (19) comportant un film isolant transparent (25) opposé à la couche de cristaux liquides (21). La couche (23) absorbant la lumière dans les interstices entre réflecteurs métalliques adjacents (19) fonctionne comme une matrice noire, et le film isolant transparent (25) protège la surface réfléchissante des réflecteurs métalliques (19) contre la corrosion et la dégradation.
PCT/JP2000/000520 1999-01-29 2000-01-31 Dispositif reflechissant a cristaux liquides et procede de fabrication correspondant WO2000045216A1 (fr)

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JP11/21538 1999-01-29

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7102709B2 (en) 2001-08-07 2006-09-05 Seiko Epson Corporation Color-filter substrate assembly, method for manufacturing the color-filter substrate assembly, electro-optical device, method for manufacturing the electro-optical device, and electronic apparatus
CN100361018C (zh) * 2002-06-13 2008-01-09 皇家飞利浦电子股份有限公司 改进的电光有源装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4939443U (fr) * 1972-07-06 1974-04-06
JPH046026U (fr) * 1990-04-26 1992-01-21
JPH06313890A (ja) * 1993-04-28 1994-11-08 Toppan Printing Co Ltd 液晶表示装置用背面電極板とその製造方法
JPH07287115A (ja) * 1994-04-20 1995-10-31 Toppan Printing Co Ltd 反射型カラーフィルタおよび液晶表示装置
JPH10148846A (ja) * 1996-11-20 1998-06-02 Semiconductor Energy Lab Co Ltd 液晶表示パネルおよび液晶表示パネルにおける光反射膜の作製方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4939443U (fr) * 1972-07-06 1974-04-06
JPH046026U (fr) * 1990-04-26 1992-01-21
JPH06313890A (ja) * 1993-04-28 1994-11-08 Toppan Printing Co Ltd 液晶表示装置用背面電極板とその製造方法
JPH07287115A (ja) * 1994-04-20 1995-10-31 Toppan Printing Co Ltd 反射型カラーフィルタおよび液晶表示装置
JPH10148846A (ja) * 1996-11-20 1998-06-02 Semiconductor Energy Lab Co Ltd 液晶表示パネルおよび液晶表示パネルにおける光反射膜の作製方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7102709B2 (en) 2001-08-07 2006-09-05 Seiko Epson Corporation Color-filter substrate assembly, method for manufacturing the color-filter substrate assembly, electro-optical device, method for manufacturing the electro-optical device, and electronic apparatus
CN100361018C (zh) * 2002-06-13 2008-01-09 皇家飞利浦电子股份有限公司 改进的电光有源装置

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